TW594320B - Manufacturing method and structure of copper lines for a liquid crystal panel - Google Patents
Manufacturing method and structure of copper lines for a liquid crystal panel Download PDFInfo
- Publication number
- TW594320B TW594320B TW92108854A TW92108854A TW594320B TW 594320 B TW594320 B TW 594320B TW 92108854 A TW92108854 A TW 92108854A TW 92108854 A TW92108854 A TW 92108854A TW 594320 B TW594320 B TW 594320B
- Authority
- TW
- Taiwan
- Prior art keywords
- copper
- liquid crystal
- crystal panel
- substrate
- forming
- Prior art date
Links
Landscapes
- Liquid Crystal (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
594320 五、發明說明(1) 一、 【發明所屬之技術領域】 本發明係有關於液晶面板的導線之形成方法及結構,特別 是有關於利用銅膠帶來形成液晶面板的銅導線之形成方法 及結構。 二、 【先前技術】 液晶顯示器擁有百萬計的薄膜電晶體,透過這些薄膜電晶 體,可以控制各個薄膜電晶體對應的液晶之排列方式,因 而決定了各個薄膜電晶體對應的畫素之亮度,而顯示出影 像。每個薄膜電晶體連接兩個導線,一為閘極線,另一為 資料線。閘極線用以控制薄膜電晶體的開關,使薄膜電晶 體於特定時間開啟並接受影像的資料。資料線為用以傳遞 影像的資料。這些薄膜電晶體所連接的導線極其相關的連 接線的電性反應影響了液晶顯示器的解析度及反應速率。 大 為導金 越 #的的 及:W佳他。 間器心較其線 時示彳有和導 應顯Η及金的 反晶t低合板 的液I價鋁面 快式^本或晶 越陣I成鋁液 向矩的的者為 朝動Is或作 乃主J1為,來 勢C 因鋁式 液晶顯示器目前的發展趨 的尺寸。傳統上,大尺寸 TFT-LCD的面板尺寸20吋 導線的基本材料,主要是 電性。一般上,以單層的 屬所構成的雙層金屬的方594320 V. Description of the invention (1) 1. [Technical field to which the invention belongs] The present invention relates to a method and structure for forming a lead of a liquid crystal panel, and more particularly to a method for forming a copper lead of a liquid crystal panel using a copper tape and structure. 2. [Previous technology] Liquid crystal displays have millions of thin film transistors. Through these thin film transistors, the arrangement of the liquid crystal corresponding to each thin film transistor can be controlled, thus determining the brightness of the pixels corresponding to each thin film transistor. The image is displayed. Each thin film transistor is connected to two wires, one is the gate line, and the other is the data line. The gate line is used to control the switching of the thin film transistor, so that the thin film transistor is turned on at a specific time and receives image data. The data line is the data used to transmit the image. The electrical response of the wires connected to these thin film transistors is extremely related to the resolution and response rate of the liquid crystal display. Most of the guide Jin Yue # 's and: W Jia he. When the interstitial center is lower than its line, the liquid crystal with low valence aluminum surface of the low-ply platen and the transduction crystal of gold is shown. The one with the liquid crystal valence aluminum surface or the crystal cross array I forming aluminum liquid moment is the moving Is. Maybe the master J1 is the size of Lai C due to the current development trend of aluminum-type LCDs. Traditionally, the basic material of large-size TFT-LCD panel size 20-inch wires is mainly electrical. Generally, a double-layered metal
594320594320
3 Γ ί 5大尺寸的液晶顯示器具有更高的解析度,且更快 線的i電Ϊ i i ί是液晶電視)的要求下,在傳統的紹導 材斜,電生無法犬破瓶頸的情況下,勢必需尋找新的導線 / 以達到更高解析度及更快的反應速率之要求。 二=i在半導體積體電路工業,一般以具有更好導電性的 ,導線來取代艇導線,以解決鋁導線的導電性瓶頸的問 遞L,由於鋼並沒有適當的蝕刻液,因此,銅導線的製程 過私是有相當的難度的。首先,如第一圖所示,在一底材 10上形成凹槽20。然後,如第二A圖所示,於底材10的表 面形成一層薄而連續的銅種晶層(c〇pper seed layer) 30 ’藉以提高銅導線的附著力並促進後績電鍍過程銅的生 長。此銅種晶層3 0也必須同時覆蓋於凹槽2 0的表面,如此 銅種晶層3 0能夠沿著凹槽2 0結構促進電鍍時銅結晶生長, 而且銅種晶層3 0也必須薄、均勻而且連續,如此充填銅時 才不會產生空隙。但是,當有銅因擴散至其他結構層而導 致漏電之疑慮時,必須加一阻障層4 0,如第二B圖所示, 以預防銅藉由擴散方式進入他層結構之中而造成漏電,同 時也可避免銅與矽產生反應。因此,在形成銅種晶層30之 前,有時需先形成一層阻障層4 0以防止漏電問題之產生。 接著,通上電源進行銅的電化學電鍍(electrical plating)步驟,將銅電鍍膜50鍍在銅種晶層30上’使銅 電鍍膜50可連續、平滑、良好地覆蓋於銅種晶層30之上’3 Γ ί 5 large-size LCD monitors have higher resolutions and faster lines (i TVs ii ii are LCD TVs), under the requirements of traditional Shao guide materials, electricity can not break the bottleneck situation Therefore, it is necessary to find new wires / to achieve the requirements of higher resolution and faster response rate. Two = i In the semiconductor integrated circuit industry, generally, the conductive wire is used to replace the boat wire to solve the problem of the conductivity bottleneck of the aluminum wire. Because steel does not have a suitable etching solution, copper It is quite difficult to make the wire too privately. First, as shown in the first figure, a groove 20 is formed on a substrate 10. Then, as shown in FIG. 2A, a thin and continuous copper seed layer 30 'is formed on the surface of the substrate 10 to improve the adhesion of the copper wire and promote the copper plating process. Grow. The copper seed layer 30 must also cover the surface of the groove 20 at the same time, so the copper seed layer 30 can promote the copper crystal growth during electroplating along the groove 20 structure, and the copper seed layer 30 must also It is thin, uniform and continuous so that no voids are created when filling copper. However, when there is a concern about leakage of copper due to diffusion to other structural layers, a barrier layer 40 must be added, as shown in Figure B, to prevent copper from entering the other layer structure by diffusion. Leakage can also prevent copper and silicon from reacting. Therefore, before forming the copper seed layer 30, it is sometimes necessary to first form a barrier layer 40 to prevent leakage problems. Next, the copper is electroplated by applying a power source to the copper plating layer 50 on the copper seed layer 30, so that the copper plating film 50 can continuously, smoothly and well cover the copper seed layer 30. Above '
594320 五、發明說明(3) 並填滿凹槽2 0而無任何空洞或缺陷之現象,如第三圖所示 (未顯示阻障層4 0 )。最後,進行化學機械研磨之步驟, 將凹槽20以外的底材10之上的銅金屬磨除至底材10之表面 為止,而僅留下填充於凹槽20部分的銅金屬,如第四圖所 示。如此,即完成了銅導線之形成。 但是,上述的銅導線製程方式,應用於TFT-LCD主動矩陣 式液晶顯不的銅導線之形成並不可行。主要原因就是液 晶面板之尺寸大小,相較於半導體工業的1 2吋晶圓而言, 面積仍大上太多。因此,銅種晶層30的形成上,其厚度的 均一性就難以控制在範圍内,而容易出現空洞的情況。或 者,於電鍍過程,銅沈積速率的控制上就必須更精確,使 各區域的沈積速率能大致相同。但這些問題的難度會隨著 尺寸的增大而增高。因此,對於大尺寸的面板而言,這些 問題是很難加以克服的。 三、【發明内容】 鑑於上述之發明背景中,習知技藝的銅導線的製程,對於 大面積的銅導線之形成上,有種晶層的均一性,及電鍍時 的均勻性上的問題。本發明之主要目的在於提供一新的銅 導線製程,避免大面積的銅導線之形成上會遭遇種晶層的 均一性的問題。594320 V. Description of the invention (3) Fill the groove 20 without any voids or defects, as shown in the third figure (the barrier layer 40 is not shown). Finally, a step of chemical mechanical polishing is performed, the copper metal on the substrate 10 other than the groove 20 is ground to the surface of the substrate 10, and only the copper metal filled in the groove 20 is left, such as the fourth As shown. In this way, the formation of the copper wire is completed. However, the above-mentioned copper wire manufacturing method is not applicable to the formation of copper wires for TFT-LCD active matrix liquid crystal display. The main reason is the size of the liquid crystal panel. Compared with the 12-inch wafers in the semiconductor industry, the area is still too large. Therefore, in the formation of the copper seed layer 30, it is difficult to control the thickness uniformity within the range, and it is easy to cause voids. Or, in the electroplating process, the control of the copper deposition rate must be more precise, so that the deposition rate in each area can be approximately the same. However, the difficulty of these problems will increase as the size increases. Therefore, for large-size panels, these problems are difficult to overcome. III. [Summary of the Invention] In view of the above-mentioned background of the invention, the manufacturing process of copper wires with conventional techniques has problems with the uniformity of the seed layer and the uniformity of plating during the formation of large-area copper wires. The main purpose of the present invention is to provide a new copper wire manufacturing process to avoid the problem of uniformity of the seed layer in the formation of large-area copper wires.
594320 五、發明說明(4) 本發明的另一目的為,利用本發明的銅導線之形成方法, 可避免大面積的銅導線之形成上,電鍍均勻性上的問題。 本發明的再一目的為,利用銅膠帶直接貼附於基板上的方 式,可取代種晶層及電鍍的步驟,減少製程步驟,降低製 程成本。 本發明的又一目的為,以銅膠帶所形成銅導線,可有效避 免空洞、缺陷,而提升形成之銅導線的均勻度。 本發明的另一目的為,以銅導線取代鋁導線,以減少液晶 面板導線的RC延遲時間。 根據以上所述之目的,本發明揭露了 一種液晶面板的銅導 線之結構。此液晶面板的銅導線之結構包含一底材,該底 材之一表面具有複數條溝渠;以及複數條銅導線,該複數 條銅導線係以一銅膠帶貼附於該底材之上,再進行化學機 械研磨,使該銅膠帶位於該複數條溝渠之外之部分完全移 除而形成。 再者,本發明也同時揭露了一種液晶面板的銅導線之形成 方法。本發明之形成方法包含形成複數條溝渠於一基板之 上;貼附一銅膠帶於該基板及該複數條溝渠之上;以及進 行化學機械研磨,使該銅膠帶位於該複數條溝渠之外之部594320 V. Description of the invention (4) Another object of the present invention is to use the method of forming the copper wire of the present invention to avoid problems in the formation of large-area copper wires and the uniformity of plating. Yet another object of the present invention is to use a method of directly attaching a copper tape to a substrate, which can replace the seed layer and electroplating steps, reduce process steps, and reduce process costs. Yet another object of the present invention is that a copper wire formed by a copper tape can effectively avoid voids and defects and improve the uniformity of the formed copper wire. Another object of the present invention is to replace the aluminum wires with copper wires to reduce the RC delay time of the wires of the liquid crystal panel. According to the above-mentioned purpose, the present invention discloses a structure of a copper wire of a liquid crystal panel. The structure of the copper wire of the liquid crystal panel includes a substrate, a surface of which has a plurality of trenches; and a plurality of copper wires, the plurality of copper wires are attached to the substrate with a copper tape, and Chemical mechanical polishing is performed to form the copper tape completely outside the plurality of trenches. Furthermore, the present invention also discloses a method for forming a copper wire of a liquid crystal panel. The forming method of the present invention includes forming a plurality of trenches on a substrate; attaching a copper tape to the substrate and the plurality of trenches; and performing chemical mechanical polishing so that the copper tape is located outside the plurality of trenches. unit
594320 五、發明說明(5) 分完全移除。 由於銅膠帶本身的厚度差異十分小,且其空洞或缺陷的問 題相較於習知技藝先形成種晶層再以電鍍方式填滿凹槽的 方式更容易控制,因此可避免習知技藝中的不均勻或空洞 等的問題。而且銅導線的製程步驟也相較於習知技藝的為 少,可降低製程成本。而在基板及銅膠帶之間,也可先形 成不同的結構層,以配合不同製程的要求。而且,以銅導 線取代铭導線,可減少液晶面板導線的R C延遲時間,使大 尺寸液晶面板的解析度與反應速率不因鋁的導電瓶頸而受 限。 四、【實施方式】 本發明的一些實施例會詳細描述如下。然而,除了詳細描 述外,本發明還可以廣泛地在其他的實施例施行,且本發 明的範圍不受限定,其以之後的專利範圍為準。 各尺以 内關, 示相出 圖他繪 ,其全 明與完 發寸未 本尺也 解些分 理某部 易,節 更圖細 及繪之 述寸關 描尺相 的對不 楚相; 清其張 更照誇。 供依被潔 提有經簡 為沒已的 ,並比示 者分相圖 再部度求594320 Fifth, the description of the invention (5) is completely removed. Because the thickness difference of the copper tape itself is very small, and the problem of voids or defects is easier to control than the method of forming a seed layer and filling the groove by electroplating in the conventional technique, it can avoid the problem in the conventional technique. Problems such as unevenness or voids. In addition, the number of copper wire manufacturing steps is less than that of conventional techniques, which can reduce manufacturing costs. Between the substrate and the copper tape, different structural layers can be formed first to meet the requirements of different processes. In addition, replacing copper wires with copper wires can reduce the RC delay time of the liquid crystal panel wires, so that the resolution and response rate of large-size liquid crystal panels are not limited by the conductive bottleneck of aluminum. 4. [Embodiments] Some embodiments of the present invention will be described in detail as follows. However, in addition to the detailed description, the present invention can also be widely implemented in other embodiments, and the scope of the present invention is not limited, which is subject to the scope of subsequent patents. Each ruler is within the gate, showing the picture and drawing it, and the full Ming and the finished inch are not the same as the ruler, but some solutions are necessary to understand the details and the description of the ruler. Qing Qizhang even more boast. The confession of the confession is simply endless, and it is more demanding than the phase-separation diagram shown.
第9頁 594320 五、發明說明(6) 1 1 0上形成複數個凹槽1 2 0。其形成凹槽1 2 0的方法為:在 基板1 1 0之上塗佈光阻,然後以一光罩對光阻曝光後顯 影,以除去凹槽1 2 0區域上方的光阻。再來以顯影後的光 阻為遮罩,對基板1 1 0進行蝕刻,以形成凹槽1 2 0。一般以 濕蝕刻方式進行基板1 1 0的蝕刻動作,較佳的蝕刻液可以 是氫氧化鈉(NaOH)、氫氟酸(HF )或氫氟酸與氟化銨 (NH4F )的混合液。 然後,如第六圖所示,將銅膠帶1 6 0貼附於凹槽1 2 0的上 方,並填滿凹槽1 2 0而無產生空洞等問題。為確保銅膠帶 160能容易並確實填滿凹槽120,並與基板110完全密合, 可以對銅膠帶1 6 0施以高溫、高壓或同時施以高溫高壓, 以加強銅膠帶160與凹槽120的附著程度。 最後,對已貼有銅膠帶160的基板110進行化學機械研磨至 基板110的表面為止,將填入凹槽120以外的銅去除,如第 七圖所示,而填滿凹槽1 2 0的銅部分即為銅導線。 本發明適用任何基板,尤其是大尺寸的基板,例如:大尺 寸的液晶面板。再者,銅導線也可以形成於其他結構層之 上,而非限定僅能形成於液晶面板的玻璃基板之上。例 如,銅導線也可以形成於氮化矽(S i Nx )層之上。氮化矽 具有較低的溶點的特性,故適合用於以玻璃為基板的液晶 面板之上。Page 9 594320 V. Description of the Invention (6) A plurality of grooves 1 2 0 are formed on 1 1 0. The method for forming the groove 120 is: coating a photoresist on the substrate 110, and then exposing the photoresist with a photomask to develop the photoresist to remove the photoresist above the area of the groove 120. Then, using the developed photoresist as a mask, the substrate 110 is etched to form a groove 120. Generally, the substrate 1 10 is etched by a wet etching method. A preferred etching solution may be sodium hydroxide (NaOH), hydrofluoric acid (HF), or a mixed solution of hydrofluoric acid and ammonium fluoride (NH4F). Then, as shown in the sixth figure, a copper tape 160 is attached above the groove 120, and the groove 120 is filled up without problems such as voids. In order to ensure that the copper tape 160 can easily and surely fill the groove 120 and completely adhere to the substrate 110, the copper tape 160 can be subjected to high temperature, high pressure, or at the same time, to strengthen the copper tape 160 and the groove. 120 degree of adhesion. Finally, the substrate 110 on which the copper tape 160 has been attached is chemically and mechanically polished to the surface of the substrate 110, and copper other than the groove 120 is removed, as shown in the seventh figure, and the groove 1 2 0 is filled. The copper part is the copper wire. The present invention is applicable to any substrate, especially a large-sized substrate, such as a large-sized liquid crystal panel. In addition, the copper wire may be formed on other structural layers, and is not limited to being formed only on the glass substrate of the liquid crystal panel. For example, copper wires can also be formed on a silicon nitride (S i Nx) layer. Silicon nitride has a relatively low melting point, making it suitable for use on glass-based liquid crystal panels.
第10頁 594320 五、發明說明(7) 另 之 明 Γι' 發11 本板 ,基 此一 因在 如 為 例 施 實 佳 較 成 形 上 之 層 矽 化 氮 先層 首矽 , 化 示氮 所於 圖後 八然 第, 形 層 矽 化 氮 ο阻 12光 槽佈 凹塗 個上 數之 複70 成 在後 :光 為曝 法阻 方光 的對 20罩 1 凹 成 形 其 以 後 然 除罩# 以遮濕 ,為以 影阻般 顯光一 去 刻 的 ο 後2 影槽 顯凹。 以成作 來形動 再以刻 。,# 阻刻的 光蝕70 的行1 罾 方進 Jlo 矽 J:7 匕 域1彳 區層氮 G矽行 12化進 槽氮式 凹對方 示ο 所12 圖槽 九凹 第滿 如填 ,並 後, 然方 帶 膠 銅 將 洞 空 生 產 無 槽題 凹問 於等 附隙 貼空 ο , 6 的 保 確 為 6合 1 帶密 膠全 銅完 ο ο 溫 12高 槽以 凹施 滿 填 實 確 並 易 容 能 6 11 帶 膠 銅 對 以 可 槽 凹 與 ο 6 11 帶 膠 銅 強 加 以 壓。 高度 溫程 高合 Q以密 1施的 @曰 涛ο 矽 7 石同1 t或罾ί 二 與Κ化 並 氮 研去 械銅 機的 學外 化以 行20 進 ο槽 17凹 層入 矽填 化將 氮 , 的止 60為 7面 帶 銅ο 有17 貼層 以矽 對化 , 氮 後至 最磨 導 銅 為 即 分 部 銅 的 ο 2 11 槽 凹 滿 填 而 示 所 圖 十 第 如 f ο 除線 散銅成 擴在形 由於或 經須性 會必著 銅就附 或,強 ,題加 好問層 夠等接 不電連 ri漏層 著成一 附造成 的而形 10中間i之之 溝ο 基 1 —吉1 與纟板 罾 ο /基 6te声 膠進6 銅式帶 若方膠Page 10 594320 V. Description of the invention (7) Another note Γι 'hair 11 This board is based on the fact that in the case of Shi Shijia, for example, the first layer of silicon silicide is formed first, and the silicon is shown in the figure. After that, the shape of the layer of silicon silicide is blocked by 12 light grooves, and the coating is 70% of the number on the back. The light is exposed to the square light, and then it is recessed into 20 hoods. , 2 shadow grooves are concave after engraving with a shadow-like light. Use the masterpiece to shape and then to carve. , # 刻刻 的 photoetching 70 rows 1 罾 Fang Jin Jlo silicon J: 7 layer 1 G layer nitrogen G silicon 12 rows into the groove nitrogen concave recession shown in the figure 12 So the 12 grooves are filled as shown in the nine recesses, After the integration, then the rectangular copper tape will be used to produce holes without holes in the hollow. It is required to fill the gaps with gaps. 6 is guaranteed to be 6-in-1 with dense copper and complete copper. Ο 12 high grooves are filled with concave filling. It is true and easy to hold the 6 11 taped copper to the grooved recess and ο 6 11 taped copper. High temperature, high temperature, high temperature, high density, high density, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high temperature, high density Nitrogen is only 60 on 7 sides with copper. There are 17 cladding layers with silicon, and after nitrogen, the most conductive copper is the copper of the branch. 2 11 The groove is completely filled and the tenth figure is shown as f ο In addition to the wire scattered copper into the shape due to the or will be subject to copper will be attached to the strong, strong, add a good question layer enough to wait for the electrical layer ri leakage layer to form a groove caused by the shape of the middle i ο Base 1 —Ji 1 and 纟 罾 ο / Base 6te sound glue into 6 copper tape with square glue
第11頁 594320 五、發明說明(8) 一層阻障層防止銅擴散。其連接層或阻障層的形成方法為 先形成連接層或阻障層於凹槽及基板之上,然後再將銅膠 帶1 6 0貼附於連接層或阻障層之上。因此上述之較佳實施 例都可以依此形成方法來形成連接層或阻障層。而連接層 的要求為必須對基板1 1 0或銅膠帶1 6 0都有不錯的附著性。 而對阻障層的要求為必須能夠防止銅的擴散及對基板11 0 以及銅膠帶1 6 0的附著性皆良好。 本發明之液晶面板的銅導線之形成方法及結構,適用於形 成液晶面板的非顯示區域的導線,以避免銅導線對液晶面 板光源模組所發出的光源於顯示區造成遮蔽或反光的情 況。因此本發明也適用於將晶片在玻璃基板上作封裝 (c h i ρ ο n g 1 a s s,C 0 G )的液晶面板。若顯示區的陣列部 分導線經適當的處理(例如:導線的周邊形成抗反射層, 以減少反光),則陣列的導線亦可以依本發明來形成銅導 線。 綜合以上所述,本發明揭露了液晶面板的銅導線之形成方 法及結構。本發明係利用銅膠帶貼附的方式來取代習知技 藝中的形成種晶層再電鍍調滿凹槽的方式。由於銅膠帶厚 度的均勻性十分良好,且其空洞或缺陷的問題相較於習知 技藝先形成種晶層再以電鍍方式填滿凹槽的方式更不容易 產生,因此可避免習知技藝中的不均勻或空洞等的問題。 而且銅導線的製程步驟也相較於習知技藝的為少,可降低Page 11 594320 V. Description of the invention (8) A barrier layer prevents copper diffusion. The connection layer or the barrier layer is formed by first forming the connection layer or the barrier layer on the groove and the substrate, and then attaching the copper tape 160 to the connection layer or the barrier layer. Therefore, in the above-mentioned preferred embodiments, a connection layer or a barrier layer can be formed according to the formation method. The requirement of the connection layer is that it must have good adhesion to the substrate 110 or copper tape 160. The barrier layer is required to be able to prevent the diffusion of copper and have good adhesion to the substrate 110 and the copper tape 160. The method and structure for forming copper wires of a liquid crystal panel of the present invention are suitable for forming wires in a non-display area of a liquid crystal panel, so as to prevent the copper wires from shielding or reflecting the light source emitted from the light source module of the liquid crystal panel in the display area. Therefore, the present invention is also applicable to a liquid crystal panel in which a chip is packaged on a glass substrate (c h i ρ ο n g 1 a s s, C 0 G). If the array part of the wires in the display area is properly processed (for example, an anti-reflection layer is formed around the wires to reduce light reflection), the wires of the array can also be formed into copper wires according to the present invention. In summary, the present invention discloses a method and structure for forming a copper wire of a liquid crystal panel. The present invention uses a method of attaching a copper tape to replace the conventional method of forming a seed layer and then electroplating a full groove. The uniformity of the thickness of the copper tape is very good, and the problem of voids or defects is less likely to occur than in the conventional technique of forming a seed layer and then filling the groove by electroplating, so it can be avoided Problems such as unevenness or voids. Moreover, the manufacturing process of copper wires is less than that of conventional techniques, which can reduce
第12頁 594320 五、發明說明(9) 製程成本。而在基板及銅膠帶之間,也可先形成不同的結 構層,以配合不同製程的要求。而且,以銅導線取代鋁導 線,可減少液晶面板導線的R C延遲時間,使大尺寸液晶面 板的解析度與反應速率不因鋁的導電瓶頸而受限。 以上所述僅為本發明之較佳實施例而已,並非用以限定本 發明之申請專利範圍;凡其他為脫離本發明所揭示之精神 下所完成之等效改變或修飾,均應包含在下述之申請專利 範圍。Page 12 594320 V. Description of the invention (9) Process cost. Between the substrate and the copper tape, different structural layers may be formed first to meet the requirements of different processes. Moreover, replacing copper wires with aluminum wires can reduce the RC delay time of the liquid crystal panel wires, so that the resolution and response rate of large-sized liquid crystal panels are not limited by the conductive bottleneck of aluminum. The above is only a preferred embodiment of the present invention, and is not intended to limit the scope of patent application of the present invention; all other equivalent changes or modifications made without departing from the spirit disclosed by the present invention shall be included in the following The scope of patent application.
第13頁 594320 圖式簡單說明 第一圖係習知技藝銅製程中,於底材上形成凹槽之步驟示 意圖, 第二A圖係習知技藝銅製程中,於底材及凹槽上形成銅種 晶層之步驟不意圖, 第二B圖係習知技藝銅製程中,於底材及凹槽上形成阻障 層及銅種晶層之步驟示意圖;Page 594320 Schematic illustration of the first picture is a schematic diagram of the steps of forming grooves on the substrate in the copper process of the conventional art, and the second picture A is formed of the substrate and the grooves in the copper process of the conventional art. The steps of the copper seed layer are not intended. Figure 2B is a schematic diagram of the steps of forming a barrier layer and a copper seed layer on the substrate and the groove in the copper process of the conventional art;
第三圖係習知技藝銅製程中,進行電鍍使銅填滿及底材表 面之步驟示意圖; 第四圖係習知技藝銅製程中,進行化學機械研磨,以去除 非凹槽之上的銅以形成銅導線之步驟示意圖; 第五圖係本發明之一較佳實施例中,於基板上形成凹槽之 步驟示意圖; 第六圖係本發明之一較佳實施例中,於基板及凹槽上貼附 銅膠帶之步驟示意圖;The third picture is a schematic diagram of the steps of performing copper plating and the surface of the substrate in the copper process of the conventional technique; the fourth picture is the chemical mechanical grinding in the conventional copper process of the technique to remove the non-groove copper The fifth diagram is a schematic diagram of a step of forming a groove on a substrate in a preferred embodiment of the present invention. The sixth diagram is a schematic diagram of a substrate and a recess in a preferred embodiment of the present invention. Schematic diagram of the steps of attaching copper tape to the groove;
第七圖係本發明之一較佳實施例中,進行化學機械研磨, 以去除非凹槽之上的銅以形成銅導線之步驟示意圖;The seventh diagram is a schematic diagram of a step of performing chemical mechanical polishing to remove copper on non-grooves to form copper wires in a preferred embodiment of the present invention;
第14頁 594320 圖式簡單說明 第八圖係本發明之另一較佳實施例中,於基板上形成氮化 矽層,並於氮化矽層上形成凹槽之步驟示意圖; 第九圖係本發明之另一較佳實施例中,於氮化矽層及凹槽 上貼附銅膠帶之步驟示意圖;以及 第十圖係本發明之另一較佳實施例中,進行化學機械研 磨,以去除非凹槽之上的銅以形成銅導線之步驟示意圖。 主要部分之代表符號: 10底材 20 凹槽 30 銅種晶層 4 0 阻障層 50銅電鍍膜 110 基板 120 凹槽 160 銅膠帶 170 氮化矽層Page 594320 Brief Description of the Drawings The eighth diagram is a schematic diagram of a step of forming a silicon nitride layer on a substrate and forming a groove on the silicon nitride layer in another preferred embodiment of the present invention. The ninth diagram is In another preferred embodiment of the present invention, a schematic diagram of a step of attaching a copper tape on a silicon nitride layer and a groove; and the tenth diagram is a chemical mechanical polishing in another preferred embodiment of the present invention to Schematic diagram of the steps to remove copper from the grooves to form copper wires. Representative symbols of the main parts: 10 substrates 20 grooves 30 copper seed layer 4 0 barrier layer 50 copper plating film 110 substrate 120 groove 160 copper tape 170 silicon nitride layer
第15頁Page 15
Claims (1)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92108854A TW594320B (en) | 2003-04-16 | 2003-04-16 | Manufacturing method and structure of copper lines for a liquid crystal panel |
JP2003385178A JP3902175B2 (en) | 2003-04-16 | 2003-11-14 | Method for forming copper line in liquid crystal panel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW92108854A TW594320B (en) | 2003-04-16 | 2003-04-16 | Manufacturing method and structure of copper lines for a liquid crystal panel |
Publications (2)
Publication Number | Publication Date |
---|---|
TW594320B true TW594320B (en) | 2004-06-21 |
TW200422742A TW200422742A (en) | 2004-11-01 |
Family
ID=33476197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW92108854A TW594320B (en) | 2003-04-16 | 2003-04-16 | Manufacturing method and structure of copper lines for a liquid crystal panel |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3902175B2 (en) |
TW (1) | TW594320B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101485585B1 (en) | 2008-02-14 | 2015-01-23 | 삼성디스플레이 주식회사 | Display apparatus and method of manufacturing the same |
-
2003
- 2003-04-16 TW TW92108854A patent/TW594320B/en not_active IP Right Cessation
- 2003-11-14 JP JP2003385178A patent/JP3902175B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3902175B2 (en) | 2007-04-04 |
TW200422742A (en) | 2004-11-01 |
JP2004318065A (en) | 2004-11-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW464927B (en) | Metal bump with an insulating sidewall and method of fabricating thereof | |
CN106972030B (en) | A kind of production method of flexible display panels, display device and flexible display panels | |
CN105304649B (en) | Array substrate and preparation method thereof, display panel, display device | |
WO2018119927A1 (en) | Method for manufacturing thin film transistor | |
US20100163883A1 (en) | Manufacturing method of electro line for liquid crystal display device | |
CN1164970C (en) | Liquid crystal display, wiring substrate and making method thereof | |
CN1877448A (en) | Etchant, method for fabricating a wire using the etchant, and method for fabricating a thin film transistor substrate using the etchant | |
KR20090078529A (en) | Method for manufacturing metal line and method for manufacturing display panel having the metal line | |
US11121068B2 (en) | Array substrate, display device, method for manufacturing them, and spliced display device | |
CN1402066A (en) | Substrate with embedded structure, display device comprising same, method for mfg. said substrate and method for mfg. display device | |
CN105655359A (en) | Method for manufacturing TFT (thin-film transistor) substrates | |
WO2018157573A1 (en) | Gate electrode structure and manufacturing method therefor, and display device | |
WO2020220532A1 (en) | Array substrate and manufacturing method therefor | |
CN109713019A (en) | OLED display panel and preparation method thereof | |
TW200525258A (en) | Liquid crystal display and manufacturing method of liquid crystal display including substrate | |
JP2003195329A (en) | Display device and its manufacturing method | |
CN109616443A (en) | The production method and array substrate of array substrate | |
WO2018176880A1 (en) | Method for manufacturing array substrate | |
TW594320B (en) | Manufacturing method and structure of copper lines for a liquid crystal panel | |
WO2016061995A1 (en) | Preparation method for array substrate, array substrate and display device | |
JP2003222905A (en) | Method for manufacturing liquid crystal display device and repairing method therefor | |
US20050164592A1 (en) | Manufacturing method and structure of copper lines for a liquid crystal panel | |
CN107863320B (en) | VA type thin-film transistor array base-plate and preparation method thereof | |
TW487958B (en) | Manufacturing method of thin film transistor panel | |
WO2021208215A1 (en) | Array substrate and manufacturing method therefor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |