JP2003217865A - Lighting system, method of manufacturing lighting system, and display using lighting system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a lighting system suitable for illuminating a liquid crystal display or the like, in particular, the lighting system suitable for a front light. <P>SOLUTION: In this lighting system 30, a positive electrode 303 constituted of a transparent electrode is patterned linearly, a luminous layer 311 and an alkaline earth metal layer 307 are laid all over the illumination area in top view, and a reflection electrode layer 308 and a photo-absorbing layer 309 are substantially conformed to the linear pattern of the positive electrode 303. A light emitting part 300 is allowed thereby to be patterned linearly, in particular, the positive electrode 303 is patterned by a photo-process, fine patterning is allowed thereby, and this is used as the front light for a liquid crystal panel 20 to realize the liquid crystal display 10 in which a trouble of bringing visible a linear shadow caused by pattern formation in the light emitting part or the like is hardly generated. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lighting device, a method for manufacturing the lighting device, and a display device using the lighting device,
In particular, the present invention relates to a lighting device applicable as a front light arranged on the observation side of a display device.

[0002]

2. Description of the Related Art Conventionally, in an electro-optical display device such as a liquid crystal display device, external light such as sunlight is incident on the electro-optical panel such as a liquid crystal panel from the viewer side, and the incident light is 2. Description of the Related Art There is known a reflective display device of a type in which reflected light that is reflected is emitted to an observer side. However, in a reflective display device, it may be difficult to visually recognize the display in a dark place. Therefore, a reflective display device equipped with an illumination device as a front light on the viewer side (observation side or viewing side) of the electro-optical panel is not available. Proposed.

As such a front light, there are known a lateral arrangement type in which a light source is arranged on the side of the electro-optical panel and a front arrangement type in which the light source is arranged on the visible side of the electro-optical panel. Of these, the former side-disposed front light is a light source arranged on the visible side of the electro-optical panel and a light source arranged on the visible side of the electro-optical panel for emitting light emitted from the light source to the electro-optical panel. And a light guide plate for irradiating the side. On the other hand, the front type front light of the latter has a light emitting portion formed of a light emitting element provided on a transparent substrate, and has a structure in which the light emitting direction of the light emitting element is directed to the electro-optical panel side.

[0004]

By the way, as an illuminating device applied to such a front light, there is an illuminating device in which a light emitting portion is provided with a light emitting layer interposed between a cathode and an anode, for example. Specifically, the light emitting layer is mainly composed of an electroluminescent material such as EL, and light emission in the light emitting layer is realized by generating an electric field between the cathode and the anode. The light thus emitted from the light emitting portion is incident on the electro-optical panel described above and then reflected by the electro-optical panel, and the reflected light passes through the gap between the light emitting portions formed in a stripe shape, for example. And is emitted to the observer side. Therefore, the front light in which the light emitting portions are arranged in a stripe shape in this manner can be applied as a front surface arrangement type.

By the way, in order to realize a light emitting portion having a stripe-shaped fine structure, for example, a structure in which a cathode is finely patterned in a stripe shape is conceivable, but as a cathode material, for example, the efficiency of electron injection from the cathode to the light emitting layer. Increase
To maintain the stability as a cathode and to secure the reflectance,
When an alkaline earth metal such as Ca having a small work function is included, the reactivity of the alkaline earth metal is extremely high, and thus it is extremely difficult to form a fine pattern by photoetching. Therefore, there is a method of finely patterning the cathode and the like by mask vapor deposition, but the line width of the stripe is at least 6
For example, when it is used as a front light of the front surface arrangement type, stripe-shaped shadows may be visually recognized, and good display may not be obtained.

The present invention has been made in view of the above problems, and is an illumination device suitable for illuminating an electro-optical display device such as a liquid crystal display device as an illuminated object, and particularly, the electro-optical display device. It is an object of the present invention to provide a lighting device suitable as a front light of the. Another object of the present invention is to provide a manufacturing method suitable for manufacturing such an illuminating device, and further a display device such as a liquid crystal display device including the illuminating device.

[0007]

In order to solve the above problems, an illuminating device of the present invention is an illuminating device having a light emitting portion between a pair of substrates, the light emitting portion including at least a cathode and a light emitting layer. , And an anode laminated in this order, the cathode is provided with an alkaline earth metal layer mainly composed of alkaline earth metal, and the anode is a transparent electrode, which is patterned into a predetermined shape in the plane of the substrate. Is characterized by.

In this case, the light emitting portion can be patterned into a predetermined shape according to the anode patterned into the predetermined shape within the surface of the substrate, and it can be used, for example, as a front light of an illuminated object. That is, the reflected light of the illuminated object can be emitted from the gap between the patterned anodes (light emitting portions) to the front side, that is, the side opposite to the illuminated object of the illumination device, and used for display. Becomes In this case, the anode is, for example, ITO.
(Indium-Tin-Oxide) or IZO (Indium-Zinc-Oxid)
Since it is a transparent electrode such as e), it is possible to perform patterning by a photo process and form a fine pattern. That is, as compared with a case where an alkaline earth metal layer such as Ca and Mg, which is difficult to perform a photo process, is formed by patterning, for example, mask evaporation, or a light emitting layer is formed by patterning, for example, by application, a fine pattern, for example, 50 μm is surely obtained. The following pattern formation can be realized. Therefore,
For example, when the illumination device is used as a front light of an illuminated object and reflected light from the illuminated object is emitted from a gap between the patterned anodes (light emitting portions), display is also performed.
For example, it is difficult for a defect such as the shadow of the pattern shape to be visually recognized.

The anode may be patterned into a plurality of linear shapes within the surface of the substrate. In this case, the illuminating device can be used as a front light of an illuminated object, and reflected light from the illuminated object can be emitted from the gap between the plurality of linearly patterned anodes for display. Also in this case, as described above, it is less likely that a defect such as a line-shaped shadow being visually recognized will occur. In addition, specifically, the anode can be patterned in a line shape having a line width of 5 to 20 μm. For example, when the alkaline earth metal layer is patterned by mask vapor deposition (the line width is small, about 60 μm).
It is possible to significantly reduce the size compared to the above. Further, in the present invention, the area ratio of the patterning formation in the light emitting portion, that is, the ratio of the patterned elements to the substrate surface is about 5 to 20%. This makes it possible to realize sufficient light emission in the light emitting section and transmission of reflected light.

The light emitting layer may include a hole transport layer, a light emitting main body layer, and a buffer layer, which are laminated in this order between the anode and the cathode.
Although it is often difficult to finely pattern such a hole transport layer, a light emitting main body layer, and a buffer layer, in the present invention, since the anode is patterned, when it is used as a front light. It is said that it is possible to realize a light emitting portion having a fine pattern that is not visually recognized.

The hole transport layer is, for example, PEDT.
A conductive polymer such as (polyethylenedioxythiophene) may be mainly used as the light emitting body layer, for example, a polymer EL, and a buffer layer may be mainly made of, for example, LiF. In this case, the hole transport layer and the light emitting main body layer can be formed by application by spin coating, printing, etc., and the buffer layer can be formed by mask vapor deposition such as vacuum vapor deposition.

Further, the hole transport layer, the light emitting main body layer, the buffer layer, and the alkaline earth metal layer may be formed so as to extend over the individual patterned anodes. That is, while the anode is patterned in a linear shape or the like, the hole transport layer, the light emitting main body layer, the buffer layer, and the alkaline earth metal layer are not patterned in the surface of the substrate but are non-patterned in a solid shape in the surface. The light emitting portion can be finely patterned with a simple structure. The hole transport layer, the light emitting body layer, the buffer layer, and the alkaline earth metal layer may be formed in a substantially plate shape over the entire illumination region.

Further, the cathode comprises an alkaline earth metal layer mainly composed of Ca, Mg, etc. and Al or A, respectively.
a substrate having a structure in which a reflective electrode layer mainly composed of g is laminated, an alkaline earth metal layer is formed closer to the anode than the reflective electrode layer, and the reflective electrode layer has substantially the same shape as the anode. It may be patterned in-plane. By providing the reflective electrode layer in this way, the irradiation efficiency of light to the illuminated body is improved, but since the reflective electrode layer is non-transparent, it has substantially the same shape as the above-mentioned anode in the plane of the substrate. It becomes necessary to perform patterning, and it becomes possible to form a patterned light emitting portion by such patterning of the reflective electrode layer. The alkaline earth metal layer can have a layer thickness of 2 to 40 nm. With such a layer thickness, the alkaline earth metal layer can be formed transparently, and the layer thickness is preferably 2
It is good to set it to 10 nm.

The reflective electrode layer can be composed mainly of an alloy of Al and Ag, for example. In addition, a light absorbing layer made of, for example, a resin black layer or a chrome layer can be formed between the cathode and the substrate, and in this case, for example, it is possible to prevent light reflected by the cathode toward the viewer side. The visibility is improved.

Next, the lighting device as described above can be manufactured by the following method. That is, the manufacturing method of the illumination device of the present invention, between the pair of substrates, at least a cathode,
A method of manufacturing a lighting device, comprising a light emitting portion including a light emitting layer and an anode laminated in this order, wherein at least a transparent electrode is formed on a first substrate by patterning in a predetermined shape in a substrate surface. A step of forming an anode, a step of forming a light emitting layer on the formed anode, and a step of forming an alkaline earth metal layer on the formed light emitting layer as a part of a constituent member of the cathode A first substrate forming step including a step, a second substrate forming step including a cathode forming step of forming at least a residual layer of a constituent member of the cathode on the second substrate, and a first substrate forming step The first substrate and the second
And a substrate bonding step of bonding the second substrate formed in the substrate forming step.

With such a manufacturing method, it becomes possible to easily provide the illuminating device having the above structure in which the anode is patterned into a predetermined shape. In this case, in the anode forming step, the transparent electrode may be formed into a film by vacuum vapor deposition, sputtering, ion plating or the like, and then patterned into a predetermined shape by photoetching. In this case, the etching or the resist peeling is
It can be performed either wet or dry.

Further, in the light emitting layer forming step, for example, a hole transporting layer forming step of forming a hole transporting layer mainly composed of a conductive polymer and a light emitting main body layer mainly composed of a polymer EL are provided. The light emitting main body layer forming step and the buffer layer forming step of forming a buffer layer mainly composed of LiF may be included. In the hole transport layer forming step and the light emitting main body layer forming step, each layer can be formed by spin coating or printing, and in the buffer layer forming step, the buffer layer can be formed by LiF vacuum deposition. . Further, in the alkaline earth metal layer forming step, the alkaline earth metal layer can be formed by vacuum vapor deposition of the alkaline earth metal. The first substrate on which each layer is formed is preferably stored in an inert gas atmosphere or a vacuum atmosphere in order to prevent corrosion, for example.

In the anode forming step, the transparent electrode is patterned into a plurality of linear patterns within the surface of the substrate, whereby the linearly patterned anode can be formed. Further, in the light emitting layer forming step and the alkaline earth metal layer forming step, the light emitting layer and the alkaline earth metal layer may be formed over the entire linearly patterned anode. It becomes possible to form each layer of non-patterned solid.

Further, the cathode formed on the second substrate may be patterned so as to substantially match the pattern shape of the anode. As a result, the cathode is made of Al or Ag.
It is possible to obtain a patterned light emitting portion even when it is configured with the reflective electrode such as. In the cathode forming step, a component mainly composed of Al or Ag or an alloy thereof may be formed into a film by vacuum vapor deposition, sputtering, ion plating or the like, and patterned into a predetermined shape by photoetching. Even when the above-mentioned light absorption layer is formed on the second substrate, it is possible to obtain a patterned light emitting unit by forming a pattern in a predetermined shape. In this case, for example, when the light absorption layer is formed mainly of resin black, it can be patterned into a predetermined shape by performing mask exposure, development, and post-baking after applying the resin black. In addition,
The second substrate after forming the cathode is also preferably stored in an inert gas atmosphere or a vacuum atmosphere, for example, to prevent corrosion.

The substrate bonding step may be performed under vacuum or reduced pressure, or in an inert gas atmosphere, and the periphery of both substrates may be sealed with a sealing material such as epoxy resin.

Next, the display device of the present invention is characterized by including the illumination device having the above-mentioned configuration as a light source. As described above, in the display device including the illumination device of the present invention as the light source, for example, when the light source is used as the front light and the reflected light is reflected and displayed from the illuminated object, a minute shadow or the like may be visually recognized. It is possible to realize good display characteristics.

That is, the illuminating device of the present invention is preferably disposed as a light source on the display viewing side of the display device of the illuminated object, and in this case, a front light type display device can be provided. In such a display device, for example, an illuminating device serving as a light source is provided on the display-viewing side of the display device of the illuminated object, and reflective display can be performed by the reflected light from the illuminated object. In this case, as the illuminated object,
An electro-optical display device such as a liquid crystal display device can be exemplified. Further, the lighting device of the present invention can be used as a light source for an exhibit in which, for example, paintings, photographs, etc. are stored in the forehead.

In the present specification, "mainly"
The component means the component with the highest content among the constituent components.

[0024]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. First, a structure of a liquid crystal display device including an illumination device according to an embodiment of the present invention will be described with reference to FIGS. 1 to 3. 1 is an exploded perspective view of the liquid crystal display device of the present embodiment, and FIG. 2 is a partial schematic cross-sectional view of the liquid crystal display device of the present embodiment. In the present embodiment, as an example of the liquid crystal display device, an active matrix reflection type liquid crystal display device using a TFT element as a switching element will be taken up and described. Further, in each drawing, in order to make each layer and each member recognizable in the drawing, the scale is different for each layer and each member.

First, the overall structure of a liquid crystal display device including the illumination device of this embodiment will be described with reference to FIGS. 1 and 2. 1 and 2, reference numeral 10 indicates the liquid crystal display device of the present embodiment, reference numeral 20 indicates the liquid crystal panel (illumination target), and reference numeral 30 indicates the illumination device of the present embodiment.
1 and 2, a liquid crystal panel 20 (liquid crystal display device 1
The upper side of (0) in the figure is the side on which the display is viewed (viewing side, that is, the observer side), and the lighting device 30 of the present embodiment is provided on the viewing side of the liquid crystal panel 20, and the liquid crystal panel 20 and the lighting device 3 are provided.
And 0 are integrated to form the liquid crystal display device 10. That is, in the present embodiment, the lighting device 30 is
The front light is configured to illuminate the liquid crystal panel 20 from the viewing side.

As shown in FIGS. 1 and 2, the liquid crystal panel 20.
Is an element substrate (lower substrate) 21 having a TFT element 28, a pixel electrode 29, etc. formed on the inner surface thereof, and a counter substrate (upper substrate) 22 having a common electrode 24 formed on the inner surface thereof. A liquid crystal layer (electro-optical material layer) 23 is sandwiched between a counter substrate 21 and a counter substrate 22, and a polarizer 25 such as a polarizing plate is attached to the upper side of the counter substrate 22 in the drawing. As a basic configuration in which the liquid crystal layer 23 is sandwiched between the substrates 21 and 22, a sealing material (not shown) is interposed on the peripheral side of the substrates 21 and 22, and the substrates 21 and 22 are actually
The liquid crystal layer 23 is sandwiched between the liquid crystal layer 22 and the sealing material. On the other hand, in FIG. 1, the display of the polarizer 25 and the liquid crystal layer 23 is omitted. Further, in FIG. 2, the TFT element 2 formed on the inner surfaces of the element substrate 21 and the counter substrate 22.
8, the display of the pixel electrode 29, the common electrode 24, etc. is omitted.

Next, in the present embodiment, the element substrate 2
1. The “inner surface” of the counter substrate 22 means the “surface on the liquid crystal layer side” of the element substrate 21 and the counter substrate 22. As shown in FIG. 1, a large number of source lines 26 (data lines) and a large number of gate lines 27 are formed on the inner surface of the element substrate 21.
They are arranged in a matrix so that (scan lines) intersect each other. A TFT element 28 is formed near the intersection of each source line 26 and each gate line 27, and a pixel electrode 29 is connected to each line via each TFT element 28. On the other hand, on the inner surface side of the counter substrate 22, a transparent common electrode 24 made of ITO (Indium Tin Oxide) or the like is formed so as to correspond to the display region.

In the liquid crystal panel 20, the area in which the individual pixel electrodes 29 are formed is the pixel 2. Further, in a normal liquid crystal display device, color filters for displaying red, green, and blue are provided on the inner surface of the element substrate 21, but in the present embodiment, the color filters are omitted and the liquid crystal panel 2 is omitted.
0 is configured as a monochrome display type.

In this embodiment, the pixel electrode 29 is made of a light-reflective metal material and functions as a reflective electrode. Then, when the place of use is a bright place, the lighting device 30 is not turned on, and external light such as sunlight or fluorescent light enters the liquid crystal panel 20 from the viewing side, and the pixel electrode 29 formed on the inner surface of the element substrate 21.
The image is displayed by being reflected by and emitted again to the observer side (viewing side: above the drawing). On the other hand, when the place of use is a dark place, the lighting device 30 is turned on, and the light emitted to the liquid crystal panel 20 side by the lighting device 30 is reflected by the pixel electrode 29 formed on the inner surface of the element substrate 21, and the lighting device is again illuminated. Display is performed by passing the light through 30 to the viewer side (viewing side: above the drawing). Instead of using the pixel electrode 29 as a reflective layer, it is of course possible to provide a reflective layer on the inner surface of the element substrate 21 separately from the pixel electrode 29.

Next, the structure of the illumination device 30 of this embodiment provided in the liquid crystal display device 10 will be described. Figure 1,
As shown in FIG. 2, the lighting device 30 of the present embodiment includes a pair of transparent substrates 301, 30 made of glass, transparent resin, or the like.
2 and a light emitting unit 300 sandwiched between these substrates 301 and 302. Of the pair of substrates, the substrate 301 disposed on the liquid crystal panel 20 side (lower side in the drawing) is the lower substrate, and the substrate 302 disposed on the viewing side (upper side in the drawing) of the liquid crystal display device 10 is the upper substrate. And

The light emitting section 300 includes an anode 303, a light emitting layer 311, and a cathode 310, which are laminated in this order from the lower substrate 301 side. The anode 303 is a transparent electrode made of ITO (indium tin oxide),
1 is patterned so as to have a plurality of linear shapes in a plan view. In this embodiment, the patterned anode 303 has a line width of about 5 to 20 μm, and the total area of the linear anode 303 is 5 to 2 with respect to the entire area of the illumination region.
It is about 0%.

The light emitting layer 311 includes a hole transport layer 304, a light emitting main body layer 305, and a buffer layer 306 which are laminated in this order from the side of the anode 303, and is patterned into a plurality of linear shapes. It is formed across each of the anodes 303. More specifically, the hole transport layer 304, the light emitting main body layer 305, and the buffer layer 306 are formed in a solid shape in plan view over the entire illumination region of the illumination device 30 of the present embodiment.

Further, the cathode 310 includes an alkaline earth metal layer 307, a reflective electrode layer 308, and a light absorption layer 309 laminated in this order from the light emitting layer 311 side, and the alkaline earth metal layer 307. Are formed to be solid in a plan view across a plurality of anodes 303, that is, across the entire illumination region. On the other hand, the reflective electrode layer 308 and the light absorption layer 309 are patterned in a linear shape that substantially matches the linear pattern of the anode 303, and are aligned with the anode 303 in the substrate stacking direction.

Hereinafter, each layer constituting the lighting device 30 will be described in detail. First, the anode 303 is made of ITO as described above, and is patterned into a predetermined shape such as a linear shape, and the layer thickness of each patterned linear electrode is about 0.1 to 0.2 μm. There is. The anode 30
3 can also be composed of, for example, a transparent electrode mainly composed of IZO (indium zinc oxide).

The hole transport layer 304 has a function of transporting holes injected from the anode 303 to the light emitting body layer 305,
For example, it is mainly composed of polyethylenedioxythiophene (conductive polymer), and its layer thickness is 0.05 to 0.
It is set to about 2 μm.

The light emitting body layer 305 is, for example, a polymer EL.
(Electroluminescence: organic electroluminescent material) as a main constituent electroluminescent material with a layer thickness of 0.05
It is set to about 0.2 μm. Such a polymer EL
In the light emitting main body layer 305 configured as described above, it is possible to emit light at a low voltage and also to emit light with high brightness. As the polymer material forming the polymer EL, for example, a fluorene-based polymer derivative, a polyparaphenylene vinylene derivative, a polyphenylene derivative, a polyfluorene derivative, polyvinylcarbazole, a polythiophene derivative, or the like can be used.

The buffer layer 306 functions as a buffer layer for promoting the injection of electrons from the cathode 310 to the light emitting main body layer 305, is mainly composed of LiF, and has a layer thickness of 0.5 to 5 nm. The degree has been.

The alkaline earth metal layer 307 which constitutes a part of the cathode 310 is mainly composed of Ca or Mg and is formed as a thin film for imparting transparency, and its layer thickness is 0.2 to 40 nm. Degree (preferably 0.2-10 nm
It is said that. Similarly, the reflective electrode layer 308 which also constitutes the cathode 310 is mainly composed of Al, and the layer thickness thereof is about 0.1 to 0.2 μm.
The reflective electrode layer 308 is made of, for example, Al alloy or A
It is also possible to mainly configure g or Ag alloy. Further, the light absorption layer 309 has a function of preventing reflected light from the reflective electrode 308 toward the viewer side,
It is composed mainly of resin black and its layer thickness is 0.5.
It is set to about 2 μm. The light absorption layer 309 is
It is also possible to mainly configure chrome.

As described above, in the lighting device 30 of the present embodiment, the anode 303 mainly composed of ITO is formed by linear patterning, and the light emitting layer 311 and the alkaline earth metal layer 307 are formed over the entire lighting region. In addition to being configured to be solid across the plane, the reflective electrode layer 308 and the light absorption layer 309 are configured to substantially match the linear pattern of the anode 303. Therefore, it becomes possible to configure the light emitting unit 300 in a linear pattern, and by using this as a front light of the liquid crystal panel 20, there is a problem that a linear shadow or the like due to the pattern formation of the light emitting unit is visually recognized. The liquid crystal display device 10 that hardly occurs is realized. Further, when the anode 303, the reflective electrode layer 308, and the light absorption layer 309 are patterned, a photo process can be used, and it is difficult to perform the photo process. The hole transport layer 304, the light emitting main body layer 305, the buffer layer. 306, patterning with a smaller line width can be realized as compared with the case where the alkaline earth metal layer is patterned linearly. Therefore, the lighting device 30 of the present embodiment is configured to include the light emitting unit 300 having a finer pattern.

Next, an example of a method of manufacturing the illumination device 30 of the present embodiment provided in the liquid crystal display device 10 will be described. First, as shown in FIG. 3, a transparent electrode (anode) 303 is linearly patterned within the substrate surface on a glass substrate 301 serving as a lower substrate (anode forming step). in this case,
After ITO (indium tin oxide) is formed on the substrate 301 by a predetermined film forming method such as vacuum deposition, sputtering, or ion plating, resist is applied, and mask exposure, development, etching, and resist removal are performed. The photo process is adopted. Therefore, the patterned anode 303 has a fine line width of 20 μm or less. It should be noted that the etching and resist removing steps may be either wet or dry.

Next, as shown in FIG. 4, polyethylenedioxythiophene (PEDT) is applied so as to be solid in a plan view across each of the linearly patterned anodes 303 to form a hole transport layer 304. (Hole transport layer forming step). The coating formation in this case is performed by spin coating or printing. Further, as shown in FIG. 5, a fluorene polymer derivative as a polymer EL material is applied to the upper layer of the hole transport layer 304 by spin coating or printing to form a light emitting main body layer 305 (light emission). Main body layer forming step). Further, as shown in FIG. 6, LiF is vacuum-deposited on the upper layer of the light emitting main body layer 305 to form the buffer layer 306 (buffer layer forming step). The light emitting layer 311 is formed by the hole transport layer forming step, the light emitting main body layer forming step, and the buffer layer forming step (light emitting layer forming step).

Further, as shown in FIG. 7, the buffer layer 3
Ca (alkaline earth metal) is vacuum-deposited on the upper layer of 06 to form an alkaline earth metal layer 307 (alkaline earth metal layer forming step). In the hole transport layer forming step, the light emitting main body layer forming step, the buffer layer forming step, and the alkaline earth metal layer forming step, each layer is simply formed by coating or vapor-depositing each layer over the entire illumination region. There is. Through the above steps, the lower substrate 301, the anode 303,
Hole transport layer 304, light emitting body layer 305, buffer layer 30
6. A first substrate including the alkaline earth metal layer 307 is formed (first substrate forming step). The formed first substrate is stored in an inert gas atmosphere or a vacuum atmosphere.

On the other hand, as shown in FIG. 8, a resin black layer as a light absorbing layer is linearly formed on the glass substrate 302 serving as the upper substrate in the plane of the substrate (light absorbing layer forming step).
In this case, after the resin black is applied, mask exposure, development, and post-baking are performed to obtain a resin black having a linear pattern.

Further, as shown in FIG. 9, the glass substrate 30
The reflective electrode layer 308 is formed by stacking Al on the light absorption layer 309 formed in 2. In this case, Al is vacuum-deposited,
The glass substrate 30 is formed by a predetermined film forming method such as sputtering.
2 to the light absorption layer 309, a resist is applied, mask exposure, development, etching, and resist removal are performed to obtain the reflective electrode layer 308 having a linear pattern laminated on the light absorption layer 309. To be It should be noted that the etching and resist removing steps may be either wet or dry. Through the above steps, the second substrate including the upper substrate 302, the light absorption layer 309, and the reflective electrode layer 308 is formed (second substrate forming step). The formed second substrate is stored in an inert gas atmosphere or a vacuum atmosphere.

The first substrate and the second substrate obtained by the above steps are bonded as shown in FIG. 10 to obtain the illuminating device 30. Specifically, in the bonding step, bonding is performed by pressure bonding each substrate in an inert gas atmosphere and sealing the periphery of each pressure bonded substrate with a sealing material such as epoxy resin. ing. In addition to the inert gas atmosphere, the pressure bonding may be performed in a reduced pressure atmosphere.

With such a manufacturing method, it is possible to provide the illuminating device of the above-described embodiment, that is, the illuminating device including the light emitting portion having a fine pattern. This is because the anode made of a transparent electrode such as ITO was patterned in the photo process step. In the lighting device 30 of the present embodiment, the light emitting portion is linearly patterned based on the linear patterning of the anode. There is.

Next, specific examples of electronic equipment including the liquid crystal display device 10 of the above embodiment will be described. Figure 11
(A) is a perspective view showing an example of a mobile phone. Figure 1
In 1 (a), reference numeral 500 indicates a mobile phone body,
Reference numeral 501 denotes a liquid crystal display unit using the liquid crystal display device 10 of the above embodiment. FIG. 11B shows a word processor,
It is a perspective view showing an example of a portable information processing device such as a personal computer. In FIG. 11B, reference numeral 600 is an information processing apparatus, reference numeral 601 is an input unit such as a keyboard, and reference numeral 6
Reference numeral 603 denotes an information processing apparatus main body, and reference numeral 602 denotes a liquid crystal display unit using the liquid crystal display device 10 of the above embodiment. FIG. 11C is a perspective view showing an example of a wrist watch type electronic device. In FIG. 11C, reference numeral 700 indicates a watch body, and reference numeral 701 indicates the liquid crystal display device 10 of the above embodiment.
The liquid crystal display part using is shown. 11 (a)-
Since each of the electronic devices shown in (c) includes the liquid crystal display section using the liquid crystal display device 10 of the above-described embodiment, it is possible to always perform bright reflection display by the front light, and particularly the front light. Based on the pattern shape of the light emitting section, it is difficult for a display defect such as a visible shadow to occur.

In the above-described embodiments, the example in which the lighting device of the present invention is applied to the liquid crystal display device has been described, but the lighting device of the present invention is not limited to the lighting device for the liquid crystal display device. Of course. That is, for example, as an illuminating device for illuminating an exhibition such as a picture or a picture contained in a frame, the illuminating device of the present invention can be applied alone to illuminate other members or places.

[0049]

As described above, the lighting device of the present invention is an IT
The anode made of a transparent electrode such as O is linearly patterned to configure the light emitting layer and the alkaline earth metal layer to be solid over the entire illumination region in a plan view, and the reflective electrode layer and the light absorbing layer are configured to be solid. It was configured so as to substantially match the linear pattern of the anode. Therefore, it becomes possible to configure the light emitting portion composed of the anode, the light emitting layer, and the cathode in a linear pattern,
By using this as a front light of a liquid crystal panel, it becomes possible to realize a liquid crystal display device in which a defect such as a line shadow or the like due to the pattern formation of the light emitting portion is less likely to occur.

Further, a photo process can be used in the step of patterning the anode, the reflective electrode layer and the light absorption layer, and the hole transport layer, the light emitting main body layer, the buffer layer and the alkaline earth metal layer are linearly formed. Compared to patterning,
It becomes possible to realize patterning with a smaller line width. Therefore, the illuminating device of the present invention is configured to include the light emitting portion having a further miniaturized pattern, and it becomes more difficult for problems such as visual recognition of linear shadows based on the pattern to occur.

[Brief description of drawings]

FIG. 1 is an exploded perspective view schematically showing an example of a liquid crystal display device including an illumination device according to an embodiment of the invention.

2 is a schematic partial cross-sectional view of the liquid crystal display device of FIG.

FIG. 3 is an explanatory diagram showing a method of manufacturing the lighting device of FIG. 1.

FIG. 4 is an explanatory view showing the manufacturing method of the lighting device, following FIG. 3;

FIG. 5 is an explanatory view showing the manufacturing method of the lighting device, following FIG. 4;

FIG. 6 is an explanatory view showing the manufacturing method of the lighting device, following FIG. 5;

FIG. 7 is an explanatory view showing the manufacturing method of the lighting device, following FIG. 6;

FIG. 8 is an explanatory diagram that shows the manufacturing method of the lighting device, following FIG. 7.

FIG. 9 is an explanatory diagram that shows the manufacturing method of the lighting device, following FIG. 8.

FIG. 10 is an explanatory diagram that shows the manufacturing method of the lighting device, following FIG. 9.

FIG. 11 is a perspective view showing some examples of electronic devices including the liquid crystal display device of the above embodiment.

[Explanation of symbols]

10 Liquid crystal display device 20 LCD panel 30 lighting equipment 300 light emitting part 301 Lower substrate 302 upper substrate 303 Anode 304 Hole transport layer 305 Light-emitting body layer 306 buffer layer 307 Alkaline earth metal layer 308 reflective electrode layer 309 Light absorbing layer 310 cathode 311 light emitting layer

Claims (14)

[Claims] 1. A lighting device comprising a light emitting portion between a pair of substrates, wherein the light emitting portion includes at least a cathode, a light emitting layer, and an anode laminated in this order, and the cathode is alkaline earth. An illuminating device comprising an alkaline earth metal layer mainly composed of a similar metal, wherein the anode is a transparent electrode and is patterned into a predetermined shape within the surface of the substrate. 2. The lighting device according to claim 1, wherein the anode is patterned into a plurality of linear shapes within the surface of the substrate. 3. The lighting device according to claim 2, wherein the anode is patterned in a linear shape having a line width of 5 to 20 μm. 4. The light emitting layer includes a hole transport layer, a light emitting main body layer, and a buffer layer, which are laminated in this order between the anode and the cathode. The lighting device according to any one of 1 to 3. 5. The hole transport layer, the light emitting main body layer, the buffer layer, and the alkaline earth metal layer are formed so as to extend over the individual patterned anodes. The illumination device according to item 4. 6. The hole transport layer, the light emitting main body layer, the buffer layer, and the alkaline earth metal layer are formed in a substantially plate shape over the entire illumination region. The illumination device according to 4 or 5. 7. The light emitting main body layer is mainly composed of a polymer EL.
The illumination device according to any one of 1. 8. The cathode has a structure in which the alkaline earth metal layer and a reflective electrode layer containing Al or Ag as a main component are laminated, and the alkaline earth metal layer is more than the reflective electrode layer. 8. The reflective electrode layer is formed on the side of the anode, and the reflective electrode layer is patterned in the surface of the substrate so as to have substantially the same shape as that of the anode. Lighting equipment. 9. The alkaline earth metal layer has a layer thickness of 2 to
It is 40 nm, The illuminating device of any one of Claim 1 thru | or 8 characterized by the above-mentioned. 10. At least a cathode between a pair of substrates,
A method of manufacturing a lighting device, comprising a light emitting portion including a light emitting layer and an anode laminated in this order, wherein at least a transparent electrode is patterned into a predetermined shape on a surface of the first substrate. An anode forming step of forming, a light emitting layer forming step of laminating a light emitting layer on the formed anode, and an alkaline earth metal layer laminating an alkaline earth metal layer as a part of a constituent member of the cathode on the formed light emitting layer A first substrate forming step including a forming step; and a second substrate forming step including a cathode forming step of forming at least a residual layer of a cathode constituent member on the second substrate, and the first substrate forming step. A method of manufacturing an illuminating device, comprising: a substrate bonding step of bonding the first substrate formed by the above and the second substrate formed in the second substrate forming step. 11. The method of manufacturing an illumination device according to claim 10, wherein in the anode forming step, the transparent electrode is patterned and formed into a plurality of linear shapes within the surface of the substrate. 12. The light emitting layer and the alkaline earth metal layer forming step in the light emitting layer forming step and the alkaline earth metal layer forming step are formed over the whole of the linearly patterned anode. The method for manufacturing a lighting device according to claim 11. 13. A display device comprising the illuminating device according to claim 1 as a light source. 14. A display device comprising the illumination device according to any one of claims 1 to 9 as a light source, wherein the illumination device is disposed on a display viewing side of an illuminated object of the display device. A display device characterized by the following.