JP2003188093A5 - - Google Patents

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Publication number
JP2003188093A5
JP2003188093A5 JP2002301360A JP2002301360A JP2003188093A5 JP 2003188093 A5 JP2003188093 A5 JP 2003188093A5 JP 2002301360 A JP2002301360 A JP 2002301360A JP 2002301360 A JP2002301360 A JP 2002301360A JP 2003188093 A5 JP2003188093 A5 JP 2003188093A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002301360A
Other versions
JP2003188093A (ja
Filing date
Publication date
Priority claimed from DE10151309A external-priority patent/DE10151309A1/de
Application filed filed Critical
Publication of JP2003188093A publication Critical patent/JP2003188093A/ja
Publication of JP2003188093A5 publication Critical patent/JP2003188093A5/ja
Pending legal-status Critical Current

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JP2002301360A 2001-10-17 2002-10-16 λ＜２００ｎｍ用のマイクロリソグラフィの投影露光装置 Pending JP2003188093A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10151309.7 2001-10-17
DE10151309A DE10151309A1 (de) 2001-10-17 2001-10-17 Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm

Publications (2)

Publication Number Publication Date
JP2003188093A JP2003188093A (ja) 2003-07-04
JP2003188093A5 true JP2003188093A5 (ja) 2005-11-24

Family

ID=7702835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002301360A Pending JP2003188093A (ja) 2001-10-17 2002-10-16 λ＜２００ｎｍ用のマイクロリソグラフィの投影露光装置

Country Status (4)

Country Link
US (1) US6788471B2 (ja)
EP (1) EP1304594A3 (ja)
JP (1) JP2003188093A (ja)
DE (1) DE10151309A1 (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
US7203007B2 (en) * 2000-05-04 2007-04-10 Carl Zeiss Smt Ag Projection exposure machine comprising a projection lens
JP2005017734A (ja) * 2003-06-26 2005-01-20 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6906866B2 (en) * 2003-10-15 2005-06-14 Carl Zeiss Smt Ag Compact 1½-waist system for sub 100 nm ArF lithography
US7070301B2 (en) * 2003-11-04 2006-07-04 3M Innovative Properties Company Side reflector for illumination using light emitting diode
US7090357B2 (en) * 2003-12-23 2006-08-15 3M Innovative Properties Company Combined light source for projection display
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7427146B2 (en) * 2004-02-11 2008-09-23 3M Innovative Properties Company Light-collecting illumination system
US7300177B2 (en) * 2004-02-11 2007-11-27 3M Innovative Properties Illumination system having a plurality of light source modules disposed in an array with a non-radially symmetrical aperture
US7246923B2 (en) * 2004-02-11 2007-07-24 3M Innovative Properties Company Reshaping light source modules and illumination systems using the same
US7101050B2 (en) * 2004-05-14 2006-09-05 3M Innovative Properties Company Illumination system with non-radially symmetrical aperture
JP5769356B2 (ja) 2004-05-17 2015-08-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 中間像を有するカタジオプトリック投影対物レンズ
US7390097B2 (en) * 2004-08-23 2008-06-24 3M Innovative Properties Company Multiple channel illumination system
DE102004063314A1 (de) 2004-12-23 2006-07-13 Carl Zeiss Smt Ag Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung
WO2006114294A2 (en) * 2005-04-26 2006-11-02 Carl Zeiss Smt Ag Illumination system for a microlithgraphic exposure apparatus
US7996805B2 (en) 2008-01-08 2011-08-09 National Semiconductor Corporation Method of stitching scan flipflops together to form a scan chain with a reduced wire length
CN102981249B (zh) * 2012-09-21 2015-01-28 中国科学院光电技术研究所 一种投影光学系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
KR20010031779A (ko) 1997-11-07 2001-04-16 오노 시게오 투영 노광 장치, 투영 노광 방법 및 그 장치의 제조 방법
DE19855106A1 (de) 1998-11-30 2000-05-31 Zeiss Carl Fa Beleuchtungssystem für die VUV-Mikrolithographie
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
EP1139138A4 (en) * 1999-09-29 2006-03-08 Nikon Corp PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM
KR100854052B1 (ko) * 1999-12-29 2008-08-26 칼 짜이스 에스엠테 아게 인접한 비구면 렌즈 표면을 구비한 투사 대물 렌즈

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