JP2003188077A5 - - Google Patents
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- Publication number
- JP2003188077A5 JP2003188077A5 JP2001386424A JP2001386424A JP2003188077A5 JP 2003188077 A5 JP2003188077 A5 JP 2003188077A5 JP 2001386424 A JP2001386424 A JP 2001386424A JP 2001386424 A JP2001386424 A JP 2001386424A JP 2003188077 A5 JP2003188077 A5 JP 2003188077A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- main body
- hot air
- apparatus main
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001386424A JP4224235B2 (ja) | 2001-12-19 | 2001-12-19 | 基板乾燥装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001386424A JP4224235B2 (ja) | 2001-12-19 | 2001-12-19 | 基板乾燥装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003188077A JP2003188077A (ja) | 2003-07-04 |
JP2003188077A5 true JP2003188077A5 (de) | 2005-07-28 |
JP4224235B2 JP4224235B2 (ja) | 2009-02-12 |
Family
ID=27595580
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001386424A Expired - Fee Related JP4224235B2 (ja) | 2001-12-19 | 2001-12-19 | 基板乾燥装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4224235B2 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3718688B2 (ja) * | 2003-06-17 | 2005-11-24 | 東京エレクトロン株式会社 | 加熱装置 |
JP4662479B2 (ja) * | 2006-05-30 | 2011-03-30 | 東京エレクトロン株式会社 | 熱処理装置 |
JP5144299B2 (ja) * | 2008-02-12 | 2013-02-13 | 光洋サーモシステム株式会社 | 減圧乾燥装置 |
JP5786487B2 (ja) * | 2011-06-22 | 2015-09-30 | 東京エレクトロン株式会社 | 熱処理装置及び熱処理方法 |
CN104681402B (zh) * | 2015-03-16 | 2018-03-16 | 京东方科技集团股份有限公司 | 基板加热装置和基板加热方法 |
KR102426224B1 (ko) * | 2017-11-15 | 2022-07-28 | 주식회사 케이씨텍 | 기판 가열 장치 및 이를 구비한 기판 처리 시스템 |
CN110207470A (zh) * | 2019-05-27 | 2019-09-06 | 武汉华星光电半导体显示技术有限公司 | 干燥装置 |
-
2001
- 2001-12-19 JP JP2001386424A patent/JP4224235B2/ja not_active Expired - Fee Related
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