JP2003170060A - Surface-treated product having photocatalytic function - Google Patents

Surface-treated product having photocatalytic function

Info

Publication number
JP2003170060A
JP2003170060A JP2001375807A JP2001375807A JP2003170060A JP 2003170060 A JP2003170060 A JP 2003170060A JP 2001375807 A JP2001375807 A JP 2001375807A JP 2001375807 A JP2001375807 A JP 2001375807A JP 2003170060 A JP2003170060 A JP 2003170060A
Authority
JP
Japan
Prior art keywords
film
substrate
photocatalytic
photocatalyst
treated product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001375807A
Other languages
Japanese (ja)
Inventor
Yasushi Takebayashi
恭志 竹林
Masayuki Hanazaki
昌幸 花崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP2001375807A priority Critical patent/JP2003170060A/en
Publication of JP2003170060A publication Critical patent/JP2003170060A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D

Abstract

<P>PROBLEM TO BE SOLVED: To provide a surface-treated product having a photocatalytic function not developing an interference color of light even if a primer film and a photocatalyst film are formed on the surface of a substrate and capable of keeping the design effect of the substrate without damaging the picture, pattern, hue, character or the like applied to the surface of the substrate itself. <P>SOLUTION: In the surface-treated product having the primer film formed by coating the surface of the substrate with a substrate treatment agent containing perhydropolysilazane and the photocatalyst film laminated on the primer film, the thicknesses of both of the primer film and the photocatalyst film are controlled to 0.01-0.5 μm. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】この発明は、基体の表面にペ
ルヒドロポリシラザンを含む下地処理剤を塗布して形成
された下地皮膜と、この下地皮膜の上に積層された光触
媒皮膜とを有する表面処理製品に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment comprising a base film formed by applying a base treatment agent containing perhydropolysilazane on the surface of a substrate, and a photocatalytic film laminated on the base film. It is about products.

【0002】[0002]

【従来の技術】酸化チタンに代表される光触媒は、防汚
性、抗菌性、脱臭性、親水性、曇り止め等の効果を有し
た物品や、高速道路等におけるNOx、SOx除去を目
的とした環境汚染防止用途への応用が検討され、室内外
物品として、既にそのいくつかは実用化されている。こ
れらの物品の基体表面に、酸化チタン等の光触媒を固定
する方法としては、例えば、チタニウムアルコキシドや
チタンニウムキレート等のゾル液を塗布し乾燥した後、
熱処理するゾル−ゲル法や、酸化チタン微粒子をバイン
ダーと称する無機系樹脂やフッ素系樹脂の中に分散さ
せ、これを塗布するバインダー法等が一般的に用いられ
ている。
2. Description of the Related Art A photocatalyst represented by titanium oxide is intended for removing NOx and SOx on articles having an antifouling property, antibacterial property, deodorizing property, hydrophilic property, antifogging effect and the like, and on highways and the like. Application to environmental pollution prevention applications has been studied, and some of them have already been put into practical use as indoor and outdoor articles. As a method of fixing a photocatalyst such as titanium oxide to the substrate surface of these articles, for example, after applying and drying a sol liquid such as titanium alkoxide or titanium chelate,
A sol-gel method of performing a heat treatment, a binder method of dispersing titanium oxide fine particles in an inorganic resin or a fluororesin called a binder, and applying the dispersion are generally used.

【0003】ところが、光触媒を固定させる基体が、ポ
リエチレン樹脂、ポリプロピレン樹脂、ポリスチレン樹
脂等の比較的耐候性に劣る基体である場合、これらの基
体表面に光触媒を直接固定させると、光触媒による酸化
作用により基体が分解され、その結果、固定した光触媒
が基体の表面から脱落することがある。この問題を解決
するために、特開2000−17229号公報では、ゾ
ル−ゲル法を用いて、シリコンアルコキシドとSiO2
微粒子との混合物から基体の表面にシリカ(SiO2
を主成分とする光触媒皮膜用の下地皮膜を形成し、その
表面に光触媒皮膜を形成させる方法を提案している。し
かし、シリコンアルコキシドを利用して形成した光触媒
皮膜用の下地皮膜は、製膜時の硬化反応に長時間を要す
るほか、ゾル−ゲル法を用いて形成しているため、反応
時における膜の体積減少率が大きく、皮膜にクラックが
発生し、皮膜が白濁する等の問題があり、更に、シリコ
ンアルコキシド中に含まれた有機質官能基が、形成され
た皮膜中に残存するため、皮膜中に含まれた有機質官能
基が光触媒により分解され、皮膜の劣化を引き起こす等
の問題もある。
However, when the substrate on which the photocatalyst is fixed is a substrate having relatively poor weather resistance, such as a polyethylene resin, a polypropylene resin, or a polystyrene resin, if the photocatalyst is directly fixed on the surface of the substrate, the oxidizing action of the photocatalyst causes The substrate is decomposed, and as a result, the fixed photocatalyst may fall off the surface of the substrate. In order to solve this problem, Japanese Patent Application Laid-Open No. 2000-17229 discloses that silicon alkoxide and SiO 2 are formed by using a sol-gel method.
Silica (SiO 2 ) from the mixture with fine particles to the surface of the substrate
A method has been proposed in which a base film for a photocatalyst film mainly composed of is formed and a photocatalytic film is formed on the surface. However, the base film for photocatalytic film formed using silicon alkoxide requires a long time for the curing reaction at the time of film formation, and since it is formed using the sol-gel method, the volume of the film at the time of the reaction is large. There is a problem that the rate of decrease is large, cracks are generated in the film, the film becomes cloudy, and the organic functional groups contained in the silicon alkoxide remain in the formed film, so that they are contained in the film. There is also a problem that the organic functional group thus obtained is decomposed by the photocatalyst, causing deterioration of the film.

【0004】そこで、これらの問題を解決するために、
特開2000−189795号公報では、シリコンアル
コキシドを用いてシリカ膜(下地皮膜)を形成させるの
ではなく、ペルヒドロポリシラザンを出発原料に用いる
方法を提案している。即ち、基体表面にペルヒドロポリ
シラザンを塗布し、次いでその上層に光触媒コーティン
グ液を塗布した後、紫外線を照射させることでペルヒド
ロポリシラザンを酸化させてシリカ膜(下地皮膜)を得
る方法、及び、基体に塗布したペルヒドロポリシラザン
の表面に、加熱した水分子を反応させてシリカ膜を形成
し、その上層に光触媒コーティング液を塗布する方法を
提案している。これらの方法によれば、ペルヒドロポリ
シラザンを用いることで、シリコンアルコキシドと比較
して短時間でシリカ膜を得ることができ、また、ペルヒ
ドロポリシラザンは、シリカ膜を形成する際の体積収縮
が少ないことから欠陥の少ない膜を得ることができる。
[0004] In order to solve these problems,
Japanese Patent Application Laid-Open No. 2000-189795 proposes a method in which perhydropolysilazane is used as a starting material instead of forming a silica film (undercoat) using silicon alkoxide. That is, a method of applying perhydropolysilazane to the surface of a substrate, then applying a photocatalyst coating solution to an upper layer thereof, and irradiating ultraviolet rays to oxidize the perhydropolysilazane to obtain a silica film (undercoat), and A method has been proposed in which heated water molecules are allowed to react with the surface of perhydropolysilazane applied to a silica film to form a silica film, and a photocatalyst coating solution is applied on the silica film. According to these methods, by using perhydropolysilazane, a silica film can be obtained in a shorter time than silicon alkoxide, and perhydropolysilazane has less volume shrinkage when forming a silica film. Therefore, a film with few defects can be obtained.

【0005】ところが、基体の表面にシリカ膜と光触媒
皮膜の2種の皮膜を形成すると、皮膜を形成した基体表
面に、光の干渉色が発現し、基体そのものの表面に付さ
れている絵柄、模様、色調、文字等を損ねてしまい、基
体が有した意匠性を維持することができないという別の
問題が生じる。また、これらの皮膜をポリエチレン樹
脂、ポリプロピレン樹脂、ポリスチレン樹脂、ポリカー
ボネート樹脂、フタル酸樹脂、エポキシ樹脂等の単体又
はこれらの変性樹脂から選ばれた1種又は2種以上から
なる樹脂混合物等の比較的耐候性に劣る非耐候性基体に
適用すると、基体は紫外線による影響を受けてその表面
が劣化し、この基体表面からシリカ膜や光触媒皮膜が比
較的容易に剥離してしまうという問題もある。
However, when two types of films, a silica film and a photocatalytic film, are formed on the surface of the substrate, interference colors of light appear on the surface of the substrate on which the film is formed, and a pattern attached to the surface of the substrate itself, Another problem arises in that the pattern, color tone, characters and the like are impaired, and the design property of the substrate cannot be maintained. In addition, these films may be made of a relatively simple resin such as a polyethylene resin, a polypropylene resin, a polystyrene resin, a polycarbonate resin, a phthalic acid resin, an epoxy resin, or a resin mixture of one or more selected from these modified resins. When applied to a non-weather resistant substrate having poor weather resistance, there is a problem that the surface of the substrate deteriorates due to the influence of ultraviolet rays, and the silica film and the photocatalytic film are relatively easily peeled off from the surface of the substrate.

【0006】[0006]

【発明が解決しようとする課題】そこで、本発明者ら
は、このような問題を解決すべく鋭意検討した結果、基
体の表面にペルヒドロポリシラザンを含む下地処理剤を
塗布して形成された下地皮膜と、この下地皮膜の上に積
層された光触媒皮膜とを有する表面処理製品において、
上記下地皮膜及び光触媒皮膜の膜厚を共に0.01〜0.
5μmの範囲内に制御することにより、光の干渉色の問
題を解決することができ、更に、下地処理剤中に紫外線
吸収剤を添加することで皮膜の剥離の問題を解決するこ
とができることを見出し、本発明を完成させた。
The inventors of the present invention have conducted intensive studies to solve such problems, and as a result, have found that a substrate formed by applying a substrate treating agent containing perhydropolysilazane to the surface of a substrate is formed. In a surface treatment product having a film and a photocatalytic film laminated on the undercoat,
The thickness of the undercoating film and the photocatalytic film are both 0.01 to 0.1.
By controlling it within the range of 5 μm, it is possible to solve the problem of interference color of light, and further, it is possible to solve the problem of peeling of the film by adding an ultraviolet absorber to the undercoating agent. Heading, the present invention has been completed.

【0007】従って、本発明の目的は、基体の表面に下
地皮膜と光触媒皮膜を形成しても、光の干渉色の発現が
なく、基体そのものの表面に付されている絵柄、模様、
色調、文字等を損ねることなく、基体の意匠性を維持す
ることができる光触媒機能を有した表面処理製品を提供
することにある。また、本発明の他の目的は、基体の表
面に下地皮膜と光触媒皮膜を形成しても、光の干渉色の
発現がないことに加えて、非耐候性基体に適用した場合
に皮膜の剥離を可及的に防止できる光触媒機能を有した
表面処理製品を提供することにある。
[0007] Accordingly, an object of the present invention is to provide a base film and a photocatalyst film on the surface of a substrate, without the appearance of interference colors of light, and the pattern, pattern,
An object of the present invention is to provide a surface-treated product having a photocatalytic function capable of maintaining the design of a base without impairing color tone, characters, and the like. Another object of the present invention is to provide an undercoating film and a photocatalytic film on the surface of a substrate, in addition to the absence of light interference color, and the peeling of the film when applied to a non-weatherproof substrate. It is an object of the present invention to provide a surface-treated product having a photocatalytic function capable of preventing as much as possible.

【0008】[0008]

【課題を解決するための手段】すなわち、本発明は、基
体の表面にペルヒドロポリシラザンを含む下地処理剤を
塗布して形成された下地皮膜と、この下地皮膜の上に積
層された光触媒皮膜とを有する表面処理製品において、
上記下地皮膜及び光触媒皮膜の膜厚が共に0.01〜0.
5μmの範囲内に制御されていることを特徴とする光触
媒機能を有する表面処理製品である。
That is, the present invention relates to a base coat formed by applying a base treatment agent containing perhydropolysilazane to the surface of a substrate, and a photocatalytic coat laminated on the base coat. In the surface treatment product having
The film thickness of both the undercoat film and the photocatalytic film is 0.01 to 0.1.
It is a surface-treated product having a photocatalytic function, which is controlled within a range of 5 μm.

【0009】また、本発明は、ペルヒドロポリシラザン
を含む下地処理剤が、無機系紫外線吸収剤を含有し、こ
の下地処理剤を塗布して形成された下地皮膜と、この下
地皮膜の上に積層された光触媒皮膜とを有する表面処理
製品において、上記下地皮膜及び光触媒皮膜の膜厚が共
に0.01〜0.5μmの範囲内に制御されていることを
特徴とする光触媒機能を有する表面処理製品である。
Further, the present invention provides an undercoating agent containing a perhydropolysilazane, which contains an inorganic ultraviolet absorber, and a base coat formed by applying the base treatment agent, and a base coat formed on the base coat. A surface treatment product having a photocatalytic function, wherein both the thickness of the undercoat film and the thickness of the photocatalyst film are controlled within the range of 0.01 to 0.5 μm. It is.

【0010】本発明における光触媒機能を有する表面処
理製品は、基体の表面に形成された下地皮膜と、この下
地皮膜の上に積層された光触媒皮膜とを有したものであ
る。上記下地皮膜は、光触媒皮膜に含まれた光触媒の機
能により基体が劣化されないように、基体を保護する目
的で形成するものである。
The surface treated product having a photocatalytic function according to the present invention has an undercoat formed on the surface of a substrate and a photocatalytic film laminated on the undercoat. The base coat is formed for the purpose of protecting the base so that the base is not deteriorated by the function of the photocatalyst included in the photocatalyst coat.

【0011】本願発明においては、上記下地皮膜を形成
するためにペルヒドロポリシラザンを含む下地処理剤を
塗布する。ペルヒドロポリシラザンは、Si−N結合及
びSi−H結合のみから形成され、C−C結合、C−O
結合等からなる有機系官能基を有さず、また、大気中の
酸素や水分により酸化されると、Si−O結合のみから
なるSiO2ケイ素化合物となる。即ち、ペルヒドロポ
リシラザンにより形成された皮膜は、光触媒機能による
分解を受け易いC−C結合やC−O結合等からなる有機
系官能基等の有機物を含まないため、光触媒による劣化
を受けることがない下地皮膜を形成することができる。
また、ペルヒドロポリシラザンは、SiO2ケイ素化合
物への転化時の体積変化率が少ないため、皮膜を形成す
る際にクラックの発生が少なく、欠陥の少ない下地皮膜
を形成することができる。
In the present invention, an undercoating agent containing perhydropolysilazane is applied to form the undercoating. Perhydropolysilazane is formed only from Si—N bonds and Si—H bonds, and includes C—C bonds, C—O
When it is oxidized by oxygen or moisture in the air without an organic functional group consisting of a bond or the like, it becomes a SiO 2 silicon compound consisting only of a Si—O bond. That is, since the film formed of perhydropolysilazane does not contain organic substances such as organic functional groups such as CC bonds and CO bonds that are susceptible to decomposition by the photocatalytic function, it may be deteriorated by the photocatalyst. No undercoating can be formed.
In addition, since perhydropolysilazane has a small volume change rate at the time of conversion to a SiO 2 silicon compound, it is possible to form an undercoat film with few cracks and few defects when forming a film.

【0012】更に、本発明における下地処理剤に含まれ
るペルヒドロポリシラザンをSiO 2 ケイ素化合物へと
転化して硬化させるための温度は、常温で可能であるた
め、下地皮膜を形成させる基体について、特に耐熱性の
基体に限定されることはない。また、本発明の下地処理
剤に含まれるペルヒドロポリシラザンは、水素Hや窒素
Nが酸化されて、ケイ素化合物に転化した場合、透明な
皮膜を形成することができる。即ち、基体の表面に下地
皮膜を形成しても、基体の表面に付されている絵柄、模
様、色調、美観等を損ねることがない。
Further, the temperature for converting the perhydropolysilazane contained in the undercoating agent into the SiO 2 silicon compound and curing it at room temperature is possible. It is not limited to a heat-resistant substrate. Further, the perhydropolysilazane contained in the undercoating agent of the present invention can form a transparent film when hydrogen H or nitrogen N is oxidized and converted into a silicon compound. That is, even if a base coat is formed on the surface of the base, the pattern, pattern, color tone, aesthetic appearance, and the like attached to the surface of the base are not impaired.

【0013】本発明における下地処理剤は、上記に示し
たペルヒドロポリシラザン以外に、トルエン、キシレ
ン、ベンゼン等の水酸基−OHを有さない芳香族炭化水
素、n−ヘキサン、オクタン、ノナン、デカン等の水酸
基を有さない脂肪族炭化水素、シクロペンタン、シクロ
ヘキサン、メチルシクロペンタン等の水酸基を有さない
環状脂肪族炭化水素等の有機溶媒を含むことができる。
また、下地処理剤におけるこれらの割合については、ペ
ルヒドロポリシラザンが固形分濃度として通常0.1〜
5質量%、好ましくは0.1〜3質量%の範囲となると
共に、水酸基を有さない有機溶媒が通常95〜99.1
質量%、好ましくは97〜99.1質量%の範囲となる
ように調製される。この際のペルヒドロポリシラザンの
濃度が0.1質量%より少ないと硬化後の膜厚が薄くな
り、重ね塗り等が必要となり効率を低下させ、反対に5
質量%を超えると硬化時間が早くなり作業性が悪化す
る。尚、ペルヒドロポリシラザンを含む下地処理剤の具
体例として、クラリアントジャパン(株)製商品名:N−
P110、クラリアントジャパン(株)製商品名:N−P
140等を例示することができる。
In addition to the above-mentioned perhydropolysilazane, the undercoating agent used in the present invention includes aromatic hydrocarbons having no hydroxyl group such as toluene, xylene and benzene, n-hexane, octane, nonane and decane. And organic solvents such as non-hydroxyl-containing aliphatic hydrocarbons, such as cyclopentane, cyclohexane, and methylcyclopentane.
As for these proportions in the undercoating agent, the perhydropolysilazane usually has a solid concentration of 0.1 to 0.1%.
The content is in the range of 5% by mass, preferably 0.1 to 3% by mass, and the organic solvent having no hydroxyl group is usually 95 to 99.1.
%, Preferably 97 to 99.1% by mass. If the concentration of perhydropolysilazane at this time is less than 0.1% by mass, the film thickness after curing becomes thin, and it becomes necessary to repeatedly coat and the like, which lowers the efficiency.
If the amount is more than 10% by mass, the curing time is shortened and the workability is deteriorated. In addition, as a specific example of the surface treatment agent containing perhydropolysilazane, Clariant Japan Co., Ltd. product name: N-
P110, manufactured by Clariant Japan Co., Ltd .: NP
140 and the like.

【0014】本発明の光触媒機能を有する表面処理製品
において、用いられる基体は、比較的耐候性に優れた耐
候性基体でも、比較的耐候性に劣る非耐候性基体でもよ
く、また、これらの混合物や積層物からなる基体であっ
てもよい。比較的耐候性に優れた耐候性基体としては、
金属、ガラス、石材等の無機物や、フッ素樹脂、ポリウ
レタン樹脂、アクリル樹脂、ポリエステル樹脂等の単体
又はこれらの変性樹脂から選ばれた1種又は2種以上か
らなる樹脂混合物を例示することができる。また、比較
的耐候性に劣る非耐候性基体としては、ポリエチレン樹
脂、ポリプロピレン樹脂、ポリスチレン樹脂、ポリカー
ボネート樹脂、フタル酸樹脂、エポキシ樹脂等の単体又
はこれらの変性樹脂から選ばれた1種又は2種以上から
なる樹脂混合物、又は、上記のような耐候性基体、非耐
候性基体の表面に、顔料、塗料、フィルム等のような耐
候性に劣るものからなる層が形成されたものを例示する
ことができる。
In the surface-treated product having a photocatalytic function of the present invention, the substrate used may be a weather-resistant substrate having relatively excellent weather resistance, a non-weather-resistant substrate having relatively poor weather resistance, or a mixture thereof. Or a substrate made of a laminate. As a weather-resistant substrate having relatively excellent weather resistance,
Examples thereof include inorganic substances such as metals, glass, and stones, simple substances such as fluororesins, polyurethane resins, acrylic resins, and polyester resins, and resin mixtures of one or more selected from modified resins thereof. Further, as the non-weather resistant substrate having relatively poor weather resistance, one or two kinds selected from a single substance such as a polyethylene resin, a polypropylene resin, a polystyrene resin, a polycarbonate resin, a phthalic acid resin, an epoxy resin or a modified resin thereof are used. Examples of the resin mixture comprising the above, or those in which a layer made of a poorly weatherable material such as a pigment, a paint, or a film is formed on the surface of the above-mentioned weatherable substrate or non-weatherproof substrate, Can be.

【0015】基体が比較的耐候性に劣る非耐候性基体の
場合には、基体表面に塗布する下地処理剤に紫外線吸収
剤を添加する必要がある。これは、非耐候性基体を使用
する場合には、基体が紫外線による影響を受けてその表
面が劣化され、この基体表面の劣化により、その表面に
形成した下地皮膜や光触媒皮膜が比較的容易に剥離して
しまう問題を解消するためであり、紫外線吸収剤が含ま
れた下地皮膜を形成することにより、基体表面に形成さ
れた光触媒皮膜を透過した紫外線は、下地皮膜に含まれ
た紫外線吸収剤により吸収され、下地皮膜と光触媒皮膜
表面とが形成された基体が非耐候性基体であっても、紫
外線による基体表面の劣化を防止することができる。
When the substrate is a non-weatherproof substrate having relatively poor weather resistance, it is necessary to add an ultraviolet absorber to the undercoating agent applied to the substrate surface. This is because when a non-weatherproof substrate is used, the surface of the substrate is deteriorated due to the influence of ultraviolet rays, and the undercoat or photocatalytic film formed on the surface is relatively easily formed due to the deterioration of the surface of the substrate. In order to solve the problem of peeling, the ultraviolet light transmitted through the photocatalytic film formed on the substrate surface by forming the undercoat film containing the ultraviolet absorbent is absorbed by the ultraviolet absorbent contained in the undercoat film. Thus, even if the substrate on which the base film and the photocatalytic film surface are formed is a non-weatherproof substrate, deterioration of the substrate surface due to ultraviolet rays can be prevented.

【0016】上記で使用する紫外線吸収剤については、
好ましくは、無機系紫外線吸収剤である。有機系紫外線
吸収剤を使用した場合では、下地皮膜に含まれた有機系
紫外線吸収剤が、この下地皮膜の上層に形成された光触
媒皮膜の光触媒機能により分解されてしまい、下地皮膜
の劣化を引き起こす原因となるが、無機系紫外線吸収剤
を使用すれば光触媒機能により分解されることがない。
このような無機系紫外線吸収剤の具体例としては、酸化
亜鉛、ルチル型酸化チタン、酸化クロム等を挙げること
ができるが、下地皮膜を形成した際に、透明な下地皮膜
を得ることができる酸化亜鉛、ルチル型酸化チタンが好
ましい。また、有機物の分解や透明性の観点によれば酸
化亜鉛がより好ましい。
With respect to the ultraviolet absorber used above,
Preferably, it is an inorganic ultraviolet absorber. When an organic UV absorber is used, the organic UV absorber contained in the undercoat is decomposed by the photocatalytic function of the photocatalytic film formed on the undercoat, causing deterioration of the undercoat. As a cause, if an inorganic ultraviolet absorber is used, it will not be decomposed by the photocatalytic function.
Specific examples of such an inorganic ultraviolet absorber include zinc oxide, rutile-type titanium oxide, chromium oxide, and the like. However, when an undercoat is formed, an oxide capable of obtaining a transparent undercoat can be obtained. Zinc and rutile type titanium oxide are preferred. In addition, zinc oxide is more preferable from the viewpoint of decomposition of organic substances and transparency.

【0017】本発明における下地処理剤に対して、上記
無機系紫外線吸収剤を添加する割合については、使用す
る無機系紫外線吸収剤によっても異なるが、例えば、紫
外線吸収剤が酸化亜鉛の場合では、下地処理剤に対して
通常0.1〜10質量%、好ましくは、0.1〜5質量
%の範囲となるように調製するのがよい。この酸化亜鉛
の割合が、0.1質量%より少ないと紫外線吸収効果が
十分に得られず、反対に10質量%より多くなると粒子
が多いために皮膜の強度が低下し、下地皮膜が破壊され
やすくなり、基体又は光触媒層との密着性が低下する恐
れがある。尚、上記のような無機系紫外線吸収剤を含有
した下地処理剤の具体例として、クラリアントジャパン
(株)製商品名:U−P110等を例示することができ
る。
The ratio of the inorganic ultraviolet absorber added to the undercoating agent in the present invention varies depending on the inorganic ultraviolet absorber used. For example, when the ultraviolet absorber is zinc oxide, The amount is usually adjusted to 0.1 to 10% by mass, preferably 0.1 to 5% by mass based on the undercoating agent. If the proportion of this zinc oxide is less than 0.1% by mass, the effect of absorbing ultraviolet light cannot be sufficiently obtained, and if it exceeds 10% by mass, the strength of the film is reduced due to the large number of particles, and the underlying film is destroyed. And the adhesion to the substrate or the photocatalyst layer may be reduced. In addition, as a specific example of the surface treatment agent containing the inorganic ultraviolet absorber as described above, Clariant Japan
(Trade name) UP-110 or the like manufactured by K.K.

【0018】本発明において、上記下地処理剤を基体表
面に塗布して形成する下地皮膜の膜厚は、0.01μm
以上0.5μm以下、好ましくは0.01μm以上0.
2μm以下、より好ましくは0.01μm以上0.1μ
m未満の範囲内に制御したものである。先に説明したよ
うに、本発明におけるペルヒドロポリシラザンを含む下
地処理剤を塗布すると、透明な皮膜を得ることができ
る。しかし、この基体の表面に形成される透明な下地皮
膜の膜厚を厚くしていくと、可視光線の波長の1/2に
相当する膜厚で当該下地皮膜の表面における反射光と下
地皮膜の底面における反射光とが干渉を起こしてしま
う。この干渉色の発現は、基体表面に付された絵柄、模
様、色調、文字等を損ねてしまうため、基体そのものが
有した意匠性を維持することができなくなる。本発明に
おける基体の表面に形成させる下地皮膜では、この膜厚
が0.5μmを越えると、下地皮膜に光の干渉色が明確
に発現してしまう。この膜厚が0.2μm以下であれ
ば、可視領域の波長の1/2以下の膜厚であるため基体
に付された絵柄の濃淡等に関係なく、はっきりと基体の
意匠性を維持することができる。反対に、この下地皮膜
の膜厚が0.01μm未満では、基体の保護としての効
果を充分に得ることができず、また、連続した下地皮膜
を形成するのが困難となる。
In the present invention, the thickness of the undercoat formed by applying the above-mentioned undercoating agent on the surface of the substrate is 0.01 μm.
≧ 0.5 μm, preferably ≧ 0.01 μm
2 μm or less, more preferably 0.01 μm or more and 0.1 μm
It is controlled within the range of less than m. As described above, a transparent film can be obtained by applying the undercoating agent containing perhydropolysilazane in the present invention. However, as the thickness of the transparent undercoat formed on the surface of the substrate is increased, the reflected light on the surface of the undercoat and the thickness of the undercoat are reduced to a thickness corresponding to half the wavelength of visible light. The reflected light on the bottom surface causes interference. The appearance of the interference color impairs the design, pattern, color tone, characters, and the like provided on the surface of the base, and thus the design of the base itself cannot be maintained. In the case of the undercoat film formed on the surface of the substrate according to the present invention, if the thickness exceeds 0.5 μm, the interference color of light clearly appears on the undercoat film. If the film thickness is 0.2 μm or less, the thickness of the film is 1 / of the wavelength in the visible region or less, so that the design of the substrate is clearly maintained regardless of the shading of the pattern applied to the substrate. Can be. On the other hand, if the thickness of the undercoat is less than 0.01 μm, the effect of protecting the substrate cannot be sufficiently obtained, and it is difficult to form a continuous undercoat.

【0019】また、本発明における光触媒皮膜について
は、基体表面に形成された下地皮膜の上に積層するもの
である。この光触媒皮膜に含まれる光触媒としては、酸
化チタン、酸化亜鉛、酸化タングステン、酸化鉄、硫化
亜鉛、硫化カドミウム、チタン酸ストロンチウム等を例
示することができるが、光触媒活性が高く、また、耐薬
品性に優れることから酸化チタンが好ましい。
The photocatalyst film of the present invention is laminated on a base film formed on the surface of a substrate. Examples of the photocatalyst contained in the photocatalyst film include titanium oxide, zinc oxide, tungsten oxide, iron oxide, zinc sulfide, cadmium sulfide, strontium titanate, etc., and have high photocatalytic activity and chemical resistance. Titanium oxide is preferred because of its excellent properties.

【0020】本発明の下地皮膜の上に上記のような光触
媒を含んだ光触媒皮膜を積層させる方法としては、含ま
せる光触媒の種類や基体の耐熱温度によっても異なる
が、例えば、光触媒が酸化チタン微粒子である場合、こ
の酸化チタン微粒子を酸化ケイ素、リン酸チタン、過酸
化チタン等の無機物、あるいは、シリコーン系樹脂、フ
ッ素系樹脂等の光触媒による劣化が少ない樹脂中、ある
いは、シリコンアルコキシド等のゾル液に分散させ、こ
れを塗布するバインダー法、チタンアルコキシド、チタ
ニウムキレート等のゾル液を塗布後焼成し、酸化チタン
からなる皮膜を形成するゾル−ゲル法等を例示すること
ができる。上記において、好ましくは、バインダーの硬
化温度にもよるが酸化ケイ素、リン酸チタン、過酸化チ
タン等の常温硬化が可能なバインダーを用いる方法であ
る。この方法により形成する光触媒皮膜は、製膜する際
の温度が通常、常温〜200℃程度であるため、この光
触媒皮膜を形成させる基体が、特に耐熱性の基体に限定
されることがない。
The method of laminating the photocatalyst film containing the above photocatalyst on the undercoat film of the present invention varies depending on the type of the photocatalyst to be contained and the heat resistance temperature of the substrate. In the case of, the titanium oxide fine particles are used in an inorganic substance such as silicon oxide, titanium phosphate, and titanium peroxide, or in a resin that is less deteriorated by a photocatalyst such as a silicone resin or a fluorine resin, or a sol solution such as a silicon alkoxide. And a sol-gel method in which a sol solution of titanium alkoxide, titanium chelate or the like is applied and fired to form a film made of titanium oxide. In the above, it is preferable to use a binder that can be cured at room temperature, such as silicon oxide, titanium phosphate, or titanium peroxide, although it depends on the curing temperature of the binder. The temperature at which the photocatalytic film formed by this method is usually formed is from room temperature to about 200 ° C., and thus the substrate on which the photocatalytic film is formed is not particularly limited to a heat-resistant substrate.

【0021】上記のような方法により形成した本発明に
おける光触媒皮膜は、光触媒の機能による分解を受けや
すいC−C結合やC−O結合等からなる有機物を含まな
いため、光触媒による劣化を受けることがなく、また、
上記光触媒皮膜は、透明な皮膜であるため、基体表面に
形成した下地皮膜の上層にこの光触媒皮膜を積層して
も、基体の表面に付された絵柄、模様、色調、文字等を
損ねることがない。
The photocatalyst film of the present invention formed by the method described above does not contain an organic substance such as a C—C bond or a C—O bond which is easily decomposed by the function of the photocatalyst. Without,
Since the photocatalyst film is a transparent film, even if this photocatalyst film is laminated on the underlayer film formed on the surface of the substrate, the pattern, pattern, color tone, characters, etc. attached to the surface of the substrate may be damaged. Absent.

【0022】本発明において、基体表面に形成した下地
皮膜の上層に積層する光触媒皮膜の膜厚は、0.01μ
m以上0.5μm以下、好ましくは0.01μm以上
0.2μm以下の範囲内に制御したものである。光触媒
皮膜形成剤を塗布して形成した光触媒皮膜は、透明な皮
膜となるが、この基体表面に形成した下地皮膜の上層に
積層する透明な光触媒皮膜の膜厚が厚くなると、可視光
線の波長の1/2に相当する膜厚で当該光触媒皮膜の表
面における反射光と下地皮膜の底面における反射光とが
干渉を起こしてしまう。この干渉色の発現は、基体表面
に付された絵柄、模様、色調、文字等を損ねてしまうた
め、基体そのものが有した意匠性を維持することができ
なくなる。本発明における光触媒皮膜では、この膜厚が
0.5μmを越えると、光触媒皮膜に光の干渉色が明確
に発現してしまう。この膜厚が0.2μm以下であれ
ば、可視領域の波長の1/2以下の膜厚であるためであ
るため基体に付された絵柄の濃淡等に関係なく、はっき
りと基体の意匠性を維持することができる。反対に、こ
の光触媒皮膜の膜厚が0.01μm未満では、光触媒の
効果を充分に得ることができず、また、連続した下地皮
膜を形成するのが困難となる。
In the present invention, the photocatalytic film laminated on the undercoat formed on the substrate surface has a thickness of 0.01 μm.
It is controlled within a range from m to 0.5 μm, preferably from 0.01 μm to 0.2 μm. The photocatalytic film formed by applying the photocatalytic film forming agent becomes a transparent film, but when the thickness of the transparent photocatalytic film laminated on the undercoat film formed on the surface of the substrate is increased, the wavelength of visible light is reduced. At a film thickness corresponding to 1 /, the reflected light on the surface of the photocatalytic film and the reflected light on the bottom surface of the base film interfere with each other. The appearance of the interference color impairs the design, pattern, color tone, characters, and the like provided on the surface of the base, and thus the design of the base itself cannot be maintained. In the photocatalytic film according to the present invention, if the film thickness exceeds 0.5 μm, the interference color of light clearly appears on the photocatalytic film. If the film thickness is 0.2 μm or less, the thickness of the film is 1 / of the wavelength in the visible region or less. Can be maintained. On the other hand, if the thickness of the photocatalyst film is less than 0.01 μm, the effect of the photocatalyst cannot be sufficiently obtained, and it is difficult to form a continuous undercoat film.

【0023】本発明における下地処理剤を基体の表面に
塗布する方法、及び光触媒皮膜形成剤を下地皮膜に塗布
する方法については、特に制限はなく、スプレーコー
ト、ロールコート、ディップコート、スピンコート、刷
毛塗り等の一般的な方法を採用することができる。上記
各皮膜の膜厚は各々最大でも0.5μmであり、基体の
成形加工性は維持されるため、製品の加工、組立前に塗
装するプレコート法を採用することもできる。また、本
発明における下地皮膜及び光触媒皮膜は、それぞれの皮
膜が常温〜200℃程度で製膜可能であり、また、皮膜
が硬化するまでに要する時間も数十秒〜数分程度である
ことから、製品組立後のポストコートや、既存建築物、
屋内外設備等を適用対象とした現場塗装も可能である。
The method for applying the undercoating agent to the surface of the substrate and the method for applying the photocatalytic film-forming agent to the undercoating in the present invention are not particularly limited, and include spray coating, roll coating, dip coating, spin coating, and the like. A general method such as brush coating can be employed. The thickness of each of the above-mentioned films is at most 0.5 μm, and the moldability of the substrate is maintained, so that a pre-coating method of painting before processing and assembling the product can also be adopted. In addition, the undercoating film and the photocatalytic film in the present invention can be formed at room temperature to about 200 ° C., and the time required for the film to cure is about several tens of seconds to several minutes. , Post-coat after product assembly, existing buildings,
On-site painting for indoor and outdoor equipment is also possible.

【0024】[0024]

【発明の実施の形態】以下、実施例及び比較例に基づい
て、本発明の好適な実施の形態を具体的に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be specifically described below based on examples and comparative examples.

【0025】〔実施例1〜5及び比較例1〜3〕基体と
して、ポリエステル塗料を30μmの塗膜となるように
塗布した塗装鋼板(150mm×70mm×0.4m
m)を用い、前処理として基体表面をエタノールで脱脂
処理し、その後室温で1時間乾燥させた。上記前処理を
した基体表面に下地皮膜を形成するため、クラリアント
ジャパン(株)製商品名:N−P110(ペルヒドロポリ
シラザン 1重量%濃度)をバーコーターにて塗布した
後、110℃、10分間乾燥させ、それぞれ表1に示す
膜厚を形成した。
Examples 1 to 5 and Comparative Examples 1 to 3 A coated steel plate (150 mm × 70 mm × 0.4 m) coated with a polyester coating so as to form a 30 μm coating film was used as a substrate.
m), the substrate surface was degreased with ethanol as a pretreatment, and then dried at room temperature for 1 hour. In order to form a base coat on the surface of the pretreated substrate, Cl-Ant Japan Co., Ltd. product name: N-P110 (1% by weight of perhydropolysilazane) is applied by a bar coater, and then 110 ° C. for 10 minutes. It dried and each formed the film thickness shown in Table 1.

【0026】次に、酸化チタン濃度5.3重量%、リン
酸チタン3.8重量%(無水和物換算)、及び水を組成
とした市販のテイカ(株)製商品名:TKC−304(固
形分濃度合計9.1重量%組成物)を純水で6倍に希釈
し、固形分濃度1.5重量%水溶液としたものに、下地
皮膜への濡れ性を向上させるため、界面活性剤であるテ
イカ(株)製商品名:テイカライトA1225(硫酸アル
キルアンモニウム 25重量%含有組成物)を固形分濃
度0.2重量%に成るように添加し、光触媒皮膜形成塗
料とした。この光触媒皮膜形成塗料を基体の表面に形成
した下地皮膜の上層にバーコーターを用いて塗布し、そ
れぞれ110℃で30分間乾燥させ、表1に示す膜厚の
光触媒皮膜を形成し、実施例1〜5及び比較例1〜3の
試験片を得た。
Next, a commercial product of TKC-304 (trade name: TKC-304) having a titanium oxide concentration of 5.3% by weight, a titanium phosphate of 3.8% by weight (in terms of anhydrate), and water. The solid content concentration of 9.1% by weight) was diluted 6 times with pure water to prepare a 1.5% by weight solid content aqueous solution. (Takelite Co., Ltd., trade name: TAIKELITE A1225, a composition containing 25% by weight of alkyl ammonium sulfate) was added so as to have a solid concentration of 0.2% by weight to obtain a photocatalytic film forming paint. This photocatalyst film forming paint was applied to the upper layer of the base film formed on the surface of the substrate using a bar coater, and dried at 110 ° C. for 30 minutes to form a photocatalyst film having a film thickness shown in Table 1. To 5 and Comparative Examples 1 to 3 were obtained.

【0027】〔実施例6〕基体としてポリカーボネート
樹脂板(150mm×70mm×2mm)を用い、前処
理として、基体の表面をエタノールで脱脂し、その後室
温で1時間乾燥させた。上記前処理をした基体表面に下
地皮膜を形成するため、紫外線吸収剤を含むクラリアン
トジャパン(株)製商品名:U−P110(ペルヒドロポ
リシラザン 1重量%濃度、酸化亜鉛 1重量%濃度)を
バーコーターにて塗布した後、25℃、30分間乾燥さ
せ、表1に示す膜厚を形成した。
Example 6 A polycarbonate resin plate (150 mm × 70 mm × 2 mm) was used as a substrate, and as a pretreatment, the surface of the substrate was degreased with ethanol, and then dried at room temperature for 1 hour. In order to form a base coat on the surface of the pretreated base, a UV-absorbent-containing trade name: UP110 (1% by weight of perhydropolysilazane, 1% by weight of zinc oxide) manufactured by Clariant Japan K.K. After coating with a coater, the coating was dried at 25 ° C. for 30 minutes to form a film having the thickness shown in Table 1.

【0028】次に、実施例1〜5及び比較例1〜3の場
合と同様に調製した光触媒皮膜形成塗料を用いて、上記
の基体表面に形成した下地皮膜の上層にバーコーターを
用いて塗布し、110℃で30分間乾燥させ、表1に示
す膜厚の光触媒皮膜を形成し、実施例6の試験片を得
た。
Next, using a coating material for forming a photocatalyst film prepared in the same manner as in Examples 1 to 5 and Comparative Examples 1 to 3, a bar coater was applied to the upper layer of the undercoat film formed on the substrate surface. Then, it was dried at 110 ° C. for 30 minutes to form a photocatalytic film having a film thickness shown in Table 1, and a test piece of Example 6 was obtained.

【0029】〔比較例4〕基体としてポリカーボネート
樹脂板(150mm×70mm×2mm)を用いた以外
は、実施例1〜5及び比較例1〜3と同様にして、表1
に示した膜厚を有する下地皮膜と光触媒皮膜を基体表面
に形成し、比較例4の試験片を得た。
Comparative Example 4 Table 1 was prepared in the same manner as in Examples 1 to 5 and Comparative Examples 1 to 3, except that a polycarbonate resin plate (150 mm × 70 mm × 2 mm) was used as the base.
Was formed on the surface of the substrate to obtain a test piece of Comparative Example 4.

【0030】〔干渉色の確認〕上記方法により得たそれ
ぞれの試験片を室内の蛍光灯下で目視により干渉色の発
現を確認し、◎:まったく発現しない、○:目視の向き
により僅かに青色を呈することがあるが支障がない、
△:目視の向きにより若干色を呈する、×:明確に発現
する(虹色を呈する)、の四段階による評価を行った。
結果を表1に示す。
[Confirmation of Interference Color] Each test piece obtained by the above-mentioned method was visually observed under a fluorescent lamp in the room to confirm the appearance of interference color. し な い: No expression at all, :: Slightly blue depending on visual direction May present, but no problem,
Δ: The color was slightly evaluated depending on the visual direction, and X: clearly expressed (showed a rainbow color).
Table 1 shows the results.

【0031】〔促進耐候性試験〕上記方法により得たそ
れぞれの試験片について、JIS K 5400に基づき
サンシャインウエザーメーターを用いて3000時間暴
露した後、基体の劣化を確認し、○:変化無し、△:若
干の白亜化、×:白亜化、チョーキングが見られる、の
三段階による評価を行った。結果を表1に示す。
[Accelerated weathering test] Each test piece obtained by the above method was exposed for 3000 hours using a sunshine weather meter based on JIS K 5400, and then the deterioration of the substrate was confirmed. : Slight chalking, ×: chalking and chalking were evaluated. Table 1 shows the results.

【0032】〔ガス分解性能の確認〕上記方法により得
た実施例1〜6、及び比較例1〜4のそれぞれの試験片
について、光触媒皮膜を形成した後に一夜暗所にて保管
した場合と、上記促進耐候性試験における目視評価後に
一夜暗所にて保管した場合について、NO2ガス分解性
能試験を行った。
[Confirmation of Gas Decomposition Performance] For each of the test pieces of Examples 1 to 6 and Comparative Examples 1 to 4 obtained by the above method, a photocatalyst film was formed and stored in a dark place overnight. After the visual evaluation in the accelerated weather resistance test, the storage in a dark place overnight was performed on the NO 2 gas decomposition performance test.

【0033】上記NO2ガス分解性能試験は、容積2リ
ットルの試験室、容積2リットルのバッファータンク、
及び容積5リットルのクッションタンクからなる合計容
積9リットルの試験装置を用いて行った。また、上記の
試験室、及び各タンクには循環ポンプがホースを介して
接続されており、評価用のNO2ガスを試験装置内に充
填させた場合に、上記循環ポンプにより試験室及び各タ
ンク内をガスが循環できる構造になっている。更に、こ
の試験装置には、試験室内に設置する試験片に対して紫
外線照射が行えるように15Wのブラックライトが2灯
備え付けられている。尚、この試験装置は暗室内に設置
した。
The above-mentioned NO 2 gas decomposition performance test was carried out in a 2 liter test chamber, a 2 liter buffer tank,
The test was performed using a test device having a total volume of 9 liters and a cushion tank having a volume of 5 liters. In addition, a circulation pump is connected to the test chamber and each tank via a hose, and when NO 2 gas for evaluation is charged into the test apparatus, the test chamber and each tank are moved by the circulation pump. It has a structure that gas can circulate inside. Further, this test apparatus is provided with two 15 W black lights so that a test piece installed in the test chamber can be irradiated with ultraviolet rays. In addition, this test apparatus was installed in a dark room.

【0034】上記の試験室に各試験片を設置し、試験装
置内の空気を真空ポンプで76cmHgまで排気した
後、濃度10ppmのNO2ガスを充填させ、大気圧と
した後に5リットル/分の循環量でNO2ガスを循環さ
せた。尚、試験片に対し紫外線を照射するためのブラッ
クライトは、照射を開始する30分前から点灯させてお
いたが、紫外線照射開始までは試験片に紫外線が当たら
ないように遮蔽板で光を遮断した。NO2ガスの充填か
ら2時間放置した後に遮蔽板を外し、各試験片に対する
紫外線照射を開始した。この際、試験片表面に照射され
る紫外線量は1mW/cm2となるようにした。
Each test piece was set in the test chamber, and the air in the test apparatus was evacuated to 76 cmHg by a vacuum pump. Then, the atmosphere was filled with 10 ppm NO 2 gas, and the pressure was adjusted to atmospheric pressure. NO 2 gas was circulated in a circulating amount. The black light for irradiating the test piece with ultraviolet light was turned on 30 minutes before the start of irradiation, but until the start of ultraviolet light irradiation, light was shielded by a shielding plate so that the test piece was not irradiated with ultraviolet light. Cut off. After leaving for 2 hours from the filling of the NO 2 gas, the shielding plate was removed, and ultraviolet irradiation was started on each test piece. At this time, the amount of ultraviolet light irradiated on the surface of the test piece was set to 1 mW / cm 2 .

【0035】上記試験室内のNO2ガスの濃度測定につ
いては、サンプリングバルブからガスを採取し、ガス検
知管を使用した。このNO2ガス濃度の測定は、ガス充
填後1時間毎に行い、ガス充填後8時間経過まで行っ
た。尚、ガス充填後2時間経過時の濃度測定は、試験片
に対する紫外線照射の開始前に行った。また、NO2
スの自然減少量を測定するために、上記試験装置と同じ
もので、紫外線照射を行わない以外は上記と同じ環境に
した、試験片を設置しない空の試験装置を用意した。こ
のような条件下で試験片を設置しない空の試験室につい
て、NO2ガス濃度測定を上記と同じタイミングで行っ
た。
For the measurement of the concentration of NO 2 gas in the test chamber, gas was sampled from a sampling valve and a gas detection tube was used. The measurement of the NO 2 gas concentration was performed every hour after gas filling, and was continued until 8 hours after gas filling. In addition, the concentration measurement at the lapse of 2 hours after gas filling was performed before the start of ultraviolet irradiation on the test piece. In order to measure the amount of NO 2 gas spontaneously reduced, an empty test apparatus was used which was the same as the above test apparatus, except that no UV irradiation was performed, and which had the same environment as above and had no test piece installed. Under such conditions, the measurement of NO 2 gas concentration was performed at the same timing as above in an empty test room where no test piece was installed.

【0036】上記のようにして行ったNO2ガス分解性
能試験において、紫外線照射6時間後の試験片を設置し
た試験室のNO2ガス濃度測定値(X)と、試験片を設
置しない試験室のNO2ガス濃度測定値(Y)とを比較
して、XがYよりも小さければ、試験片がガスを分解除
去したと判断できるとし、○:XがYの1/2以下、△:
XがYより小さいがYの1/2よりは大きい、×:XとY
が変わらない、の三段階による評価を行った。結果を表
1に示す。
In the NO 2 gas decomposition performance test performed as described above, the measured value of the NO 2 gas concentration (X) in the test room in which the test piece was placed 6 hours after the irradiation with the ultraviolet light was compared with the test room in which the test piece was not placed. By comparing with the measured NO 2 gas concentration value (Y), if X is smaller than Y, it can be determined that the test piece has decomposed and removed the gas. ○: X is 1/2 or less of Y, Δ:
X is smaller than Y but larger than 1/2 of Y. X: X and Y
Was not changed. Table 1 shows the results.

【0037】[0037]

【表1】 [Table 1]

【0038】各試験片における干渉色の発現について、
比較例に示したように下地皮膜又は光触媒皮膜が0.3
μmであると若干の干渉色が確認され、これが0.5μ
mを越えると、はっきりと干渉色が発現した。これに対
し実施例1〜6では、干渉色は確認されず、特に実施例
1及び2の場合では干渉色が全く確認されなかった。
With respect to the appearance of interference color in each test piece,
As shown in the comparative example, the undercoating or photocatalytic coating was 0.3
μm, a slight interference color was confirmed, which was 0.5 μm.
Above m, an interference color was clearly developed. On the other hand, in Examples 1 to 6, no interference color was confirmed, and particularly in Examples 1 and 2, no interference color was confirmed.

【0039】促進耐候性試験では、下地皮膜が形成され
ない場合では(比較例3)、基体に塗布したポリエステ
ル塗膜が劣化し、光触媒皮膜が一部脱落した。また、下
地皮膜が紫外線吸収剤を含まない比較例4では、基体で
あるポリカーボネート樹脂がやや白化したのに対し、紫
外線吸収剤を含む実施例5の場合では基体は白化せずに
良好であった。
In the accelerated weathering test, when the undercoat was not formed (Comparative Example 3), the polyester coating applied to the substrate deteriorated, and a part of the photocatalytic coating dropped off. In Comparative Example 4 in which the undercoat did not contain the ultraviolet absorber, the polycarbonate resin as the substrate was slightly whitened, whereas in Example 5 in which the underlayer contained the ultraviolet absorber, the substrate was good without whitening. .

【0040】NO2ガス分解性能について、光触媒皮膜
形成後では全試験片でNO2ガス分解が確認できた。し
かし、促進耐候性試験後では光触媒皮膜の脱落が認めら
れた比較例3のNO2ガス分解量が若干減少した。
Regarding the NO 2 gas decomposition performance, after the formation of the photocatalytic film, NO 2 gas decomposition was confirmed in all the test pieces. However, after the accelerated weathering test, the amount of NO 2 gas decomposed in Comparative Example 3, in which the photocatalyst film had fallen off, was slightly reduced.

【0041】[0041]

【発明の効果】本発明における表面処理製品は、基体の
表面に下地皮膜と光触媒皮膜を形成しても、光の干渉色
の発現がなく、基体そのものの表面に付されている絵
柄、模様、色調、文字等を損ねることなく、基体の意匠
性を維持することができる光触媒機能を有した表面処理
製品である。また、本発明における光触媒機能を有する
表面処理製品を適用する基体が、比較的耐候性に劣る非
耐候性基体の場合でも、下地処理剤に無機系紫外線吸収
剤を添加することで、皮膜の剥離を可及的に防止でする
ことができる。本発明の光触媒機能を有した表面処理製
品は、劣化を受け難い皮膜から形成された耐久性に優れ
たものであるため、防汚性、抗菌性、脱臭性、親水性、
曇り止め等の効果を有した新たな物品の開発や、高速道
路等におけるNOx、SOx除去を目的とした環境汚染
防止対策の促進の面で有用である。
According to the surface-treated product of the present invention, even if an undercoating film and a photocatalytic film are formed on the surface of the substrate, no interference color of light is exhibited, and the pattern, pattern, It is a surface-treated product having a photocatalytic function that can maintain the design of the base without impairing the color tone, characters, and the like. Further, even when the substrate to which the surface-treated product having a photocatalytic function according to the present invention is applied is a non-weather-resistant substrate having relatively poor weather resistance, the coating is peeled off by adding an inorganic UV absorber to the undercoating agent. Can be prevented as much as possible. The surface-treated product having a photocatalytic function of the present invention has excellent durability formed from a film that is not easily deteriorated, so that it has antifouling properties, antibacterial properties, deodorizing properties, hydrophilic properties,
It is useful in the development of new articles having the effect of preventing fogging and the like, and in promoting environmental pollution prevention measures for removing NOx and SOx on expressways and the like.

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C09D 5/00 C23C 28/04 B01D 53/36 J 183/16 102D C23C 28/04 ZAB Fターム(参考) 4D048 AA06 AB03 BA06X BA07X BA41X EA01 4G069 AA03 AA08 BA04B BA48A CA01 CA12 CA13 CA17 CD10 DA06 EB15X EB15Y ED02 EE10 FA01 FA03 FB23 4J038 DM021 HA166 HA216 HA356 KA04 KA08 KA12 NA05 NA19 PA07 PC08 4K044 AA02 AA06 AA12 AA13 AA16 BA18 BA19 BB03 BC02 CA53Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat II (reference) C09D 5/00 C23C 28/04 B01D 53/36 J 183/16 102D C23C 28/04 ZAB F-term (reference) 4D048 AA06 AB03 BA06X BA07X BA41X EA01 4G069 AA03 AA08 BA04B BA48A CA01 CA12 CA13 CA17 CD10 DA06 EB15X EB15Y ED02 EE10 FA01 FA03 FB23 4J038 DM021 HA166 HA216 HA356 KA04 KA08 KA12 NA05 NA19 PA07 PC02 A02A02 A02 A02 BC

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基体の表面にペルヒドロポリシラザンを
含む下地処理剤を塗布して形成された下地皮膜と、この
下地皮膜の上に積層された光触媒皮膜とを有する表面処
理製品において、上記下地皮膜及び光触媒皮膜の膜厚が
共に0.01〜0.5μmの範囲内に制御されていること
を特徴とする光触媒機能を有する表面処理製品。
1. A surface-treated product having a base film formed by applying a base treatment agent containing perhydropolysilazane to the surface of a substrate, and a photocatalytic film laminated on the base film. And a photocatalytic film having a photocatalytic function, wherein both the thickness of the photocatalytic film and the thickness of the photocatalytic film are controlled within the range of 0.01 to 0.5 μm.
【請求項2】 下地皮膜及び光触媒皮膜の膜厚が共に
0.01〜0.2μmの範囲内に制御されている請求項1
に記載の光触媒機能を有する表面処理製品。
2. The film thickness of both the undercoat film and the photocatalyst film is controlled within the range of 0.01 to 0.2 μm.
A surface-treated product having a photocatalytic function according to item 1.
【請求項3】 下地処理剤が無機系紫外線吸収剤を含有
する請求項1又は2に記載の光触媒機能を有する表面処
理製品。
3. The surface-treated product having a photocatalytic function according to claim 1, wherein the undercoating agent contains an inorganic ultraviolet absorber.
【請求項4】 基体が比較的耐候性に優れた耐候性基体
である請求項1〜3のいずれかに記載の光触媒機能を有
する表面処理製品。
4. The surface-treated product having a photocatalytic function according to claim 1, wherein the substrate is a weather-resistant substrate having relatively excellent weather resistance.
【請求項5】 基体が比較的耐候性に劣る非耐候性基体
である請求項3に記載の光触媒機能を有する表面処理製
品。
5. The surface-treated product having a photocatalytic function according to claim 3, wherein the substrate is a non-weather-resistant substrate having relatively poor weather resistance.
JP2001375807A 2001-12-10 2001-12-10 Surface-treated product having photocatalytic function Pending JP2003170060A (en)

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Family

ID=19184115

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Country Link
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004001288A1 (en) * 2004-01-07 2005-08-11 Clariant International Limited Hydrophilic polysilazane-based coating
DE102004011213A1 (en) * 2004-03-04 2005-09-22 Clariant International Limited Coatings for metal surfaces, process for their preparation and their use as self-cleaning protective layer, especially for car rims
JP2008519870A (en) * 2004-11-12 2008-06-12 クラリアント・インターナシヨナル・リミテッド Using polysilazane for coating metal strips.
JP2009057313A (en) * 2007-08-31 2009-03-19 Coronet:Kk Plant processing method
JP2009515019A (en) * 2005-11-10 2009-04-09 ピーピージー・ベー・ブイ Epoxy based paint
JP2010115581A (en) * 2008-11-12 2010-05-27 Otsuka Chem Co Ltd Photocatalyst supporting member and method of manufacturing the same
JP2013019041A (en) * 2011-07-14 2013-01-31 Toppan Printing Co Ltd Method for forming zinc oxide film

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004001288A1 (en) * 2004-01-07 2005-08-11 Clariant International Limited Hydrophilic polysilazane-based coating
DE102004011213A1 (en) * 2004-03-04 2005-09-22 Clariant International Limited Coatings for metal surfaces, process for their preparation and their use as self-cleaning protective layer, especially for car rims
JP2008519870A (en) * 2004-11-12 2008-06-12 クラリアント・インターナシヨナル・リミテッド Using polysilazane for coating metal strips.
JP2009515019A (en) * 2005-11-10 2009-04-09 ピーピージー・ベー・ブイ Epoxy based paint
JP2009057313A (en) * 2007-08-31 2009-03-19 Coronet:Kk Plant processing method
JP2010115581A (en) * 2008-11-12 2010-05-27 Otsuka Chem Co Ltd Photocatalyst supporting member and method of manufacturing the same
JP2013019041A (en) * 2011-07-14 2013-01-31 Toppan Printing Co Ltd Method for forming zinc oxide film

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