JP2000025156A - Protective film - Google Patents

Protective film

Info

Publication number
JP2000025156A
JP2000025156A JP10197453A JP19745398A JP2000025156A JP 2000025156 A JP2000025156 A JP 2000025156A JP 10197453 A JP10197453 A JP 10197453A JP 19745398 A JP19745398 A JP 19745398A JP 2000025156 A JP2000025156 A JP 2000025156A
Authority
JP
Japan
Prior art keywords
photocatalyst
protective film
film
polysilazane
ceramic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10197453A
Other languages
Japanese (ja)
Inventor
Minoru Yamanaka
稔 山中
Mitsuo Yoshida
光男 吉田
Takashi Koide
崇 小出
Yozo Nakamura
洋三 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Jushi Corp
Original Assignee
Sekisui Jushi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Jushi Corp filed Critical Sekisui Jushi Corp
Priority to JP10197453A priority Critical patent/JP2000025156A/en
Publication of JP2000025156A publication Critical patent/JP2000025156A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a protective film capable of easily imparting self-cleaning properties by bonding the protective film to a member to keep them over a long period of time. SOLUTION: A siliceous ceramics layer 2 comprising polysilazane or a modified matter thereof is formed on a base material 1 and a photocatalyst- containing layer 3 is formed on the outer surface of the ceramics layer 2. By bonding this protective film to a member, even if dust is bonded to the surface of the protective film or a pollutant of exhaust gas of a vehicle is bonded thereto since the surface of the protective film is made hydrophilic by the photocatalyst of the photocatalyst-containing layer 3, the pollutant is effectively washed. Since the protective film is used only by bonding the film to a member, this film can impart self-cleaning properties extremely easily even after it is bonded to the member and can also protect the member.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えば、屋外に設
置される橋梁、防護柵、高欄、照明灯、防音壁、道路標
識、視線誘導装置等の道路用工作物又は建築物の内外装
等に使用されるあらゆる部材に貼着されて自浄性を付与
することのできる保護フイルムに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the interior and exterior of road works or buildings, such as bridges installed outdoors, protective fences, railing, lighting, sound barriers, road signs, and gaze guidance devices. The present invention relates to a protective film that can be adhered to any member used in the above-mentioned method and can impart self-cleaning properties.

【0002】[0002]

【従来の技術】例えば、屋外に設置される防音壁や道路
標識、視線誘導装置等の道路用工作物等は、常に車両の
排気ガスや塵埃にさらされているために、時々洗浄しな
いとこれら排気ガスや塵埃等が表面に付着して汚れ、著
しくその機能や美感を低下させる問題がある。しかしな
がら人手によって洗浄するのは大変面倒であり且つ手間
であることから、二酸化チタン等の光触媒を含む光触媒
含有層を工作物等の部材の表面に形成し、光触媒によっ
て表面を親水化することによって自浄性を付与すること
が提案されている。
2. Description of the Related Art For example, soundproof walls, road signs, and road works such as gaze guidance devices which are installed outdoors are constantly exposed to vehicle exhaust gas and dust, and therefore must be cleaned occasionally. There is a problem that exhaust gas, dust, and the like adhere to the surface and become dirty, which significantly lowers its function and beauty. However, since cleaning by hand is very troublesome and troublesome, a photocatalyst-containing layer containing a photocatalyst such as titanium dioxide is formed on the surface of a member such as a workpiece, and the surface is hydrophilized by the photocatalyst to perform self-cleaning. It has been proposed to impart properties.

【0003】すなわち二酸化チタン等の光触媒は、紫外
線を照射することにより活性化されてその表面は強い酸
化力が発現されると共に高度に親水化され、塵埃や車両
の排気ガス等の汚染物質が表面に付着しても、汚染物質
を分解すると共に、親水化された表面によって、表面に
付着する汚染物質と表面との間に水が割り込んで汚染物
質を浮かせるために付着しにくく、また付着しても降雨
等により容易に洗い流されて除去されるため、汚染物質
が堆積しにくくなるのである。
That is, a photocatalyst such as titanium dioxide is activated by irradiating ultraviolet rays, and its surface exhibits strong oxidizing power and is highly hydrophilized, and contaminants such as dust and vehicle exhaust gas are exposed to the surface. Even if it adheres to the surface, it decomposes the contaminants, and due to the hydrophilic surface, water breaks in between the contaminants adhering to the surface and the surface to float the contaminants. Is easily washed off and removed by rainfall or the like, and contaminants are not easily deposited.

【0004】[0004]

【発明が解決しようとする課題】しかしながらかかる光
触媒含有層を工作物等の部材の表面に形成し、それを長
期間維持させるためには、部材と光触媒含有層との間に
中間層を設ける等して密着性を高めておく必要があり、
また部材がプラスチックスのような有機物である場合
は、光触媒の分解作用から部材を保護するために、シリ
コーン等の無機系の保護層を部材と光触媒含有層との間
に形成しておく必要があり、しかもこれらの光触媒含有
層や中間層又は保護層については屋外等に設置された後
に形成するのは困難であり、予め工場等で形成しておく
必要があるために、工場製作時においてはこれら光触媒
含有層、中間層、保護層の形成工程が加わるために、大
変な手間であった。
However, in order to form such a photocatalyst-containing layer on the surface of a member such as a workpiece and maintain it for a long period of time, an intermediate layer is provided between the member and the photocatalyst-containing layer. It is necessary to improve the adhesion by doing
When the member is an organic material such as plastics, it is necessary to form an inorganic protective layer such as silicone between the member and the photocatalyst containing layer in order to protect the member from the decomposition action of the photocatalyst. In addition, it is difficult to form these photocatalyst-containing layers, intermediate layers, or protective layers after being installed outdoors or the like, and it is necessary to form them in advance in a factory or the like. Since the steps of forming the photocatalyst-containing layer, the intermediate layer, and the protective layer are added, it is very troublesome.

【0005】またかかる中間層や保護層を形成するに
は、従来では一般にゾルゲル法によりアルコシランの加
水分解物を重合させることにより形成されるが、このゾ
ルゲル法では緻密な被膜として形成され難く多孔質な被
膜となるために、光触媒の分解作用から部材を保護する
には充分でなく、また耐熱性、耐屈曲性、耐磨耗性等で
も充分なものは得られていない。
Conventionally, such an intermediate layer or a protective layer is generally formed by polymerizing a hydrolyzate of an alkoxysilane by a sol-gel method. However, in this sol-gel method, it is difficult to form a dense film and it is difficult to form a porous film. However, it is not enough to protect the member from the decomposition action of the photocatalyst, and sufficient heat resistance, bending resistance, abrasion resistance and the like have not been obtained.

【0006】そこで本発明は上記の如き問題を解決し、
部材等に貼着することにより容易に自浄性を付与するこ
とができ、且つその自浄性を長期にわたって維持するこ
とのできる保護フイルムを提供せんとするものである。
Accordingly, the present invention solves the above-mentioned problems,
It is an object of the present invention to provide a protective film that can easily impart self-cleaning property by sticking to a member or the like, and can maintain the self-cleaning property for a long time.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
に、本発明は次のような構成としている。すなわち、本
発明に係る保護フイルムは、基材にポリシラザン又はそ
の変成物からなるシリカ質セラミックス層が形成され、
外面に光触媒含有層が形成されていることを特徴とする
ものである。
In order to achieve the above object, the present invention has the following arrangement. That is, the protective film according to the present invention has a substrate in which a siliceous ceramic layer made of polysilazane or a modified product thereof is formed,
The photocatalyst-containing layer is formed on the outer surface.

【0008】本発明による保護フイルムは、外面に二酸
化チタン等の光触媒を含む光触媒含有層が形成されてい
るので、この保護フイルムを部材等に貼着することによ
り、保護フイルムの表面に塵埃や車両の排気ガス等の汚
染物質が表面に付着しても、光触媒によって保護フイル
ムの表面が親水化されているので、汚染物質が効果的に
洗浄される。しかもこの保護フイルムを部材等に貼着す
るだけでよいので、部材表面に直接光触媒含有層、中間
層、保護層を形成する必要があった従来に比べて極めて
容易であり、且つ設置後においても自浄性を付与するこ
とができ、さらにフイルムとしての部材の保護をも兼ね
備えている。
The protective film according to the present invention has a photocatalyst containing layer containing a photocatalyst such as titanium dioxide formed on its outer surface. By sticking this protective film to a member or the like, dust or vehicle Even if contaminants such as exhaust gas adhere to the surface, the surface of the protective film is hydrophilized by the photocatalyst, so that the contaminants are effectively cleaned. Moreover, since it is only necessary to attach this protective film to the member or the like, it is much easier than in the past where it was necessary to form a photocatalyst containing layer, an intermediate layer, and a protective layer directly on the member surface, and even after installation. It can provide self-cleaning properties and also protects the members as a film.

【0009】また本発明による保護フイルムは、基材と
外面の光触媒含有層との間に、ポリシラザン又はその変
成物からなるシリカ質セラミックス層が形成されてい
る。二酸化チタン等の光触媒は、上記のように強い酸化
力を有しているため基材にポリカーボネートやアクリ
ル、PET、ウレタン等の合成樹脂や酸化に弱い金属を
使用した場合は、その基材までも酸化分解し、その耐久
性が損なわれる。そこで光触媒含有層と基材との間に、
シリコーン系の被膜を形成することによって耐久性を向
上させることができる。このシリコーン系の被膜は従来
技術のゾルゲル法によりアルコキシシランの加水分解物
を重合させることにより得られるが、この方法では塗膜
形成過程で重量が減少し、収縮が大きいために、緻密な
被膜が形成され難く多孔質な被膜として形成されるため
に光触媒の酸化分解作用から基材を保護するには十分で
はなく、また耐熱性、耐屈曲性、耐摩耗性等でも十分な
ものは得られない。それに対して本発明保護フイルムに
おいて、光触媒含有層と基材との間に形成されたポリシ
ラザン又はその変成物からなるシリカ質セラミックス層
の被膜は、塗膜形成過程で重量が増加し、収縮が小さい
ために、非常に緻密な被膜として形成され、光触媒の分
解作用からあらゆる材質の基材を効果的に保護し、また
耐熱性、耐屈曲性、耐摩耗性に優れ、薄膜でも高い塗膜
硬度を有しているものである。
Further, in the protective film according to the present invention, a siliceous ceramic layer made of polysilazane or a modified product thereof is formed between the substrate and the photocatalyst-containing layer on the outer surface. If a photocatalyst such as titanium dioxide has a strong oxidizing power as described above, if a base material is made of a synthetic resin such as polycarbonate, acrylic, PET, or urethane, or a metal that is weak in oxidation, even the base material may be used. It is oxidatively decomposed and its durability is impaired. Therefore, between the photocatalyst containing layer and the substrate,
By forming a silicone-based coating, durability can be improved. This silicone-based film is obtained by polymerizing a hydrolyzate of an alkoxysilane by a conventional sol-gel method. However, in this method, the weight is reduced during the film formation process and the shrinkage is large, so that a dense film is formed. Since it is difficult to form and is formed as a porous film, it is not enough to protect the substrate from the oxidative decomposition action of the photocatalyst, and sufficient heat resistance, bending resistance, abrasion resistance, etc. cannot be obtained. . On the other hand, in the protective film of the present invention, the coating of the siliceous ceramic layer made of polysilazane or a modified product thereof formed between the photocatalyst-containing layer and the base material increases in weight in the process of forming the coating and has a small shrinkage. Therefore, it is formed as a very dense coating, effectively protecting the base material of all materials from the decomposition action of the photocatalyst, and has excellent heat resistance, bending resistance, abrasion resistance and high coating hardness even in thin films. It is what you have.

【0010】従って本発明によれば、前記の如くポリシ
ラザン又はその変成物からなるシリカ質セラミックス層
は、非常に緻密な被膜であるために、薄膜でも光触媒の
酸化分解作用から基材が保護されると共に、且つ耐熱性
に優れているために、光触媒含有層の焼成時においても
クラックが発生せず、また耐屈曲性に優れているため
に、湾曲させてもクラックが発生せず、あらゆる形状の
部材等に容易に貼着することができ、さらに耐久性に優
れ、且つ薄膜でも高い塗膜硬度を有しているために、基
材は傷付きにくい。
Therefore, according to the present invention, since the siliceous ceramic layer made of polysilazane or a modified product thereof as described above is a very dense film, the substrate can be protected from the oxidative decomposition action of the photocatalyst even in a thin film. In addition, because of its excellent heat resistance, no cracks are generated even when the photocatalyst-containing layer is fired, and because of its excellent bending resistance, no cracks are generated even when it is curved. Since it can be easily attached to a member or the like, and has excellent durability and high coating film hardness even in a thin film, the substrate is hardly damaged.

【0011】上記の如く本発明においては、基材はポリ
シラザン又はその変成物からなるシリカ質セラミックス
層により光触媒の酸化分解作用から保護されるので、保
護フイルムの基材の材質は特に限定されず、ポリカーボ
ネートやアクリル、PET、ウレタン等の任意の合成樹
脂や金属等が使用できるが、一般的には部材に貼着され
た状態で、貼着されていることが判らないように透明で
薄く且つあらゆる形状に対応可能なように柔軟性に富ん
だ合成樹脂フイルムが好ましい。かように基材は、あら
ゆる形状に対応可能な所謂フイルム状のものが好ましい
が、しかしながら基材の厚みは特に限定されず、一般に
フイルム状より肉厚の範疇に入るシート状と称されるご
ときものであってもよく、また貼着される部材によって
は柔軟性を特に具備しないものであってもよい。
As described above, in the present invention, since the base material is protected from the oxidative decomposition of the photocatalyst by the siliceous ceramic layer made of polysilazane or a modified product thereof, the material of the base material of the protective film is not particularly limited. Polycarbonate, acrylic, PET, any synthetic resin such as urethane, metal, etc. can be used, but in general, in a state of being attached to a member, it is transparent and thin so that it is not known that it is attached. A synthetic resin film which is rich in flexibility so as to conform to the shape is preferable. As described above, the base material is preferably a so-called film-shaped one that can correspond to any shape, but the thickness of the base material is not particularly limited, and is generally referred to as a sheet-like shape that is in the category of a wall thickness more than a film-like shape. It may be one that does not particularly have flexibility depending on the member to be attached.

【0012】本発明におけるポリシラザンは特に限定さ
れるものではないが、分子内に少なくともSi−H結
合、あるいはN−H結合を有するものが好ましく、ポリ
シラザン単独であってもよいし、ポリシラザンと他のポ
リマーとの共重合体やポリシラザンと他の化合物との混
合物でもよく、またポリシラザンは、鎖状であってもよ
いし、環状、架橋構造を有するものでもよく、さらに分
子内にこれら複数の構造を同時に有するものでもよく、
これらが単独でもよいし、混合物で用いられていてもよ
い。
The polysilazane in the present invention is not particularly limited, but preferably has at least a Si—H bond or an N—H bond in the molecule. Polysilazane may be used alone, or polysilazane and another polysilazane may be used. It may be a copolymer with a polymer or a mixture of polysilazane and another compound, and the polysilazane may be a chain, a ring, or a compound having a crosslinked structure. You may have at the same time,
These may be used alone or as a mixture.

【0013】このポリシラザン又はその変成物からなる
シリカ質セラミックス層の膜厚は、0.02〜5μmが
好ましく、好適には0.05〜2μmであり、5μmを
超えると、ポリシラザンをシリカ質セラミックス層に転
化した際にクラックが入ることがある。このシリカ質セ
ラミックス層を形成するには、ポリシラザン又はその変
成物からなる塗膜形成用組成物を基材にスプレーコー
ト、ディップコート、スピンコート、フローコート、ロ
ールコート、あるいはこれらの組合わせ等、適宜方法で
塗布し、シリカ質セラミックス層に転化すればよい。な
お前記塗布は1回でもよいし、2回以上塗布してもよ
い。
The thickness of the siliceous ceramic layer made of polysilazane or a modified product thereof is preferably 0.02 to 5 μm, more preferably 0.05 to 2 μm, and if it exceeds 5 μm, the polysilazane is converted to a siliceous ceramic layer. Cracks may occur when converted to. To form the siliceous ceramic layer, a film-forming composition comprising polysilazane or a modified product thereof is spray-coated on a substrate, dip-coated, spin-coated, flow-coated, roll-coated, or a combination thereof. What is necessary is just to apply by an appropriate method and to convert it into a siliceous ceramic layer. The application may be performed once or two or more times.

【0014】なお前記塗膜形成用組成物を塗布した後、
この塗膜をシリカ質セラミックス層に転化するには、高
温で加熱して焼成することにより行ってもよいが、基材
をポリカーボネートやアクリル等の合成樹脂から形成す
る場合は、加熱温度に限界があり、出来るだけ合成樹脂
の変形や劣化の生じない低温でシリカ質セラミックス層
に転化できる次の方法が好ましい。
After applying the coating composition,
In order to convert this coating film into a siliceous ceramic layer, heating and baking may be performed at a high temperature. However, when the substrate is formed from a synthetic resin such as polycarbonate or acrylic, the heating temperature is limited. The following method is preferred because it can be converted into a siliceous ceramic layer at a low temperature that does not cause deformation or deterioration of the synthetic resin as much as possible.

【0015】すなわち、ポリシラザン又はその変成物
に、アミン類又は/及び酸類が添加された塗膜形成用組
成物から形成するか、あるいはポリシラザン又はその変
成物に、アミン類又は/及び酸類が添加された塗膜形成
用組成物を水蒸気と接触させることにより形成すれば、
70度程度の低温焼成が可能となり、且つ高速でシリカ
質セラミックス層に転化することができる。
That is, a polysilazane or a modified product thereof is formed from a film-forming composition in which an amine or / and an acid is added, or an amine or / and an acid is added to the polysilazane or a modified product thereof. If the formed film-forming composition is formed by contacting with steam,
Low-temperature baking at about 70 ° C. is possible, and conversion to a siliceous ceramic layer can be performed at high speed.

【0016】外面に二酸化チタン等の光触媒を含有する
光触媒含有層を形成するには、二酸化チタン等の粉末を
溶融させて吹き付ける溶射法、化学反応を介して二酸化
チタンを析出させるCVD(化学的製膜法)、二酸化チ
タン等をスパッタ蒸発させて沈着させるスパッタ蒸着
法、真空蒸着法等の適宜方法によって形成してもよい
が、バインダーに二酸化チタン等を分散させて塗料組成
物とし、それをディッピングやスプレー、フローコータ
ー等により塗布すれば、均一且つ平滑な被膜が形成され
るので好ましい。
In order to form a photocatalyst-containing layer containing a photocatalyst such as titanium dioxide on the outer surface, a thermal spraying method in which a powder such as titanium dioxide is melted and sprayed, or a CVD (chemically-produced) in which titanium dioxide is deposited through a chemical reaction. It may be formed by a suitable method such as a film method), a sputter evaporation method in which titanium dioxide or the like is sputter-evaporated and deposited, or a vacuum evaporation method. It is preferable to apply by a spray, a flow coater, or the like, since a uniform and smooth film is formed.

【0017】かかる方法により光触媒含有層を形成する
場合は、バインダーとしてシリコーン系化合物を用いる
のが好ましい。シリコーン系化合物を用いることによ
り、得られる光触媒含有層は表面硬度が高くなって傷付
きにくくなり、またシロキサン結合によって耐薬品性、
耐汚染性に優れるために活性化された二酸化チタン等に
よっても劣化されにくく、また汚染物質も付着しにくく
なる。
When the photocatalyst-containing layer is formed by such a method, it is preferable to use a silicone compound as a binder. By using a silicone-based compound, the resulting photocatalyst-containing layer has a high surface hardness and is not easily damaged, and also has chemical resistance due to a siloxane bond.
Because of its excellent stain resistance, it is hardly deteriorated even by activated titanium dioxide or the like, and also hardly causes contaminants to adhere thereto.

【0018】なおバインダーとしてシリコーン系化合物
を用いて光触媒含有層を形成する場合は、例えば一例と
して、オルガノポリシロキサン又はテトラエトキシシラ
ン等のアルコキシシランの加水分解物とチタニアゾルと
の混合物とからなる塗料組成物を塗布し、50度〜20
0度で加熱することにより形成することができる。
When the photocatalyst-containing layer is formed by using a silicone compound as a binder, for example, a coating composition comprising a mixture of a hydrolyzate of an alkoxysilane such as an organopolysiloxane or tetraethoxysilane and a titania sol is used as an example. Apply the object, 50 degrees ~ 20
It can be formed by heating at 0 degrees.

【0019】光触媒としての二酸化チタンは、ルチル型
でもよいが、活性の高さからアナターゼ型のものが好ま
しく、この二酸化チタンに波長領域が300〜400n
m付近の紫外光を照射することによって活性化され、そ
の活性化によって強い酸化力が発現されて、表面に付着
した汚染物質は分解されると共に、活性化によってその
表面は水との接触角でほぼ0〜20度程度まで親水化さ
れ、かかる親水化によって汚染物質は付着しにくくな
り、例え付着しても降雨等によって容易に洗い流される
ようになる。
Titanium dioxide as a photocatalyst may be of rutile type, but is preferably of anatase type because of its high activity. This titanium dioxide has a wavelength range of 300 to 400 nm.
m is activated by irradiating ultraviolet light around m. The activation causes a strong oxidizing power to be developed, contaminants attached to the surface are decomposed, and the activation causes the surface to have a contact angle with water. Hydrophilization is performed to about 0 to about 20 degrees, and contaminants are less likely to adhere due to the hydrophilicity, and even if they adhere, they can be easily washed away by rainfall or the like.

【0020】[0020]

【発明の実施の形態】次に、本発明の実施の形態につい
て図面を参照し、具体的に説明する。すなわち図1は本
発明の実施の一形態を示す断面図である。
Next, an embodiment of the present invention will be specifically described with reference to the drawings. That is, FIG. 1 is a sectional view showing an embodiment of the present invention.

【0021】図面において、1はポリカーボネートやア
クリル、PET、ウレタン等の合成樹脂、アルミニウ
ム、ステンレス等の金属等からなる基材である。2はそ
の基材1上に形成されたシリカ質セラミックス層であ
り、3はその外面に形成された二酸化チタン等の光触媒
が含有された光触媒含有層3である。前記シリカ質セラ
ミックス層2は基材1上に直接形成されていてもよい
し、他の層を介して形成されていてもよい。また光触媒
含有層3は外面に形成されていれば、シリカ質セラミッ
クス層2上に直接形成されていてもよいし、他の層を介
して形成されていてもよい。
In the drawings, reference numeral 1 denotes a substrate made of a synthetic resin such as polycarbonate, acrylic, PET, urethane, or the like, or a metal such as aluminum or stainless steel. Reference numeral 2 denotes a siliceous ceramic layer formed on the substrate 1, and reference numeral 3 denotes a photocatalyst containing layer 3 formed on the outer surface thereof and containing a photocatalyst such as titanium dioxide. The siliceous ceramic layer 2 may be formed directly on the base material 1 or may be formed via another layer. If the photocatalyst containing layer 3 is formed on the outer surface, it may be formed directly on the siliceous ceramic layer 2 or may be formed via another layer.

【0022】そして光触媒含有層3に紫外線を照射する
ことにより光触媒が活性化されてその表面が親水化さ
れ、降雨等によって表面に付着した汚染物質が洗浄され
るようになされている。なお基材1の裏面には容易に部
材に貼着できるように、接着剤層が形成されていてもよ
いし、熱ラミネートにより貼着されるようになされてい
てもよい。また基材1には適宜着色されていてもよい
が、貼着される部材の色調を隠蔽せず、且つ目立たない
ように透明にするのが好ましい。基材1を透明にする場
合は、光触媒含有層3は基材1の透視性能を損なわない
ようにできるだけ薄く形成するのが好ましい。
By irradiating the photocatalyst containing layer 3 with ultraviolet rays, the photocatalyst is activated and the surface thereof is made hydrophilic, and contaminants attached to the surface due to rainfall or the like are washed. Note that an adhesive layer may be formed on the back surface of the base material 1 so as to be easily attached to the member, or may be attached by thermal lamination. The substrate 1 may be appropriately colored, but is preferably transparent so as not to obscure the color tone of the member to be stuck and to be inconspicuous. When the base material 1 is made transparent, the photocatalyst containing layer 3 is preferably formed as thin as possible so as not to impair the see-through performance of the base material 1.

【0023】光触媒を活性化させる紫外線は、屋外にお
いて太陽光から受けるようになされていてもよいが、予
め工場等において、ブラックライト等により紫外線を照
射し、光触媒が活性化されて光触媒含有層3の表面が親
水化されている状態にしておいてもよい。
Ultraviolet rays for activating the photocatalyst may be received from sunlight outdoors. However, the photocatalyst is activated by irradiating the photocatalyst with ultraviolet rays in a factory or the like using black light or the like. May be in a state where the surface is made hydrophilic.

【0024】[0024]

【実施例】以下、本発明の実施例について説明する。Embodiments of the present invention will be described below.

【0025】(実施例)ポリカーボネートからなる透明
合成樹脂フィルム(厚み0.5mm)に以下のコーティ
ング剤を塗布した。ペルヒドロポリシラザンをデカヒド
ロナフタレンに溶解し、20wt%の濃度に調整した。
この溶液10gに攪拌しながらトリ−n−ペンチルアミ
ン200mgを室温で徐々に添加した。これを大気中で
上記ポリカーボネート上にフローコートで塗装した。こ
れを100℃、相対湿度90%で1時間加熱することに
よりシリカ質セラミックス層を得た。このシリカ質セラ
ミックス層の膜厚は0.5μmであった。
(Example) The following coating agent was applied to a transparent synthetic resin film (thickness: 0.5 mm) made of polycarbonate. Perhydropolysilazane was dissolved in decahydronaphthalene and adjusted to a concentration of 20% by weight.
200 mg of tri-n-pentylamine was gradually added to 10 g of this solution at room temperature with stirring. This was applied on the polycarbonate in the atmosphere by flow coating. This was heated at 100 ° C. and a relative humidity of 90% for 1 hour to obtain a siliceous ceramic layer. The thickness of this siliceous ceramic layer was 0.5 μm.

【0026】次に、アナターゼ型酸化チタンゾル(日産
化学、TA−15、固形分15wt%)56重量部と、
シリカゾル(日本合成ゴム、グラスカA液、固形分20
wt%)33重量部を混合後、メチルトリメトキシシラ
ン(日本合成ゴム、グラスカB液)11重量部とエタノ
ールを添加し、さらに2時間攪拌し、メチルトリメトキ
シシランを部分的に加水分解反応と脱水縮重合反応させ
ることにより調整した。これをフローコートにより前記
シリカ質セラミックス層の上に光触媒含有層を形成し
た。
Next, 56 parts by weight of an anatase type titanium oxide sol (Nissan Chemical Co., Ltd., TA-15, solid content 15 wt%),
Silica sol (Nippon Synthetic Rubber, Glasca A solution, solid content 20
After mixing 33 parts by weight), 11 parts by weight of methyltrimethoxysilane (Nippon Synthetic Rubber, Glasca B solution) and ethanol were added, and the mixture was further stirred for 2 hours to partially hydrolyze methyltrimethoxysilane. It was adjusted by a dehydration condensation polymerization reaction. This was flow-coated to form a photocatalyst-containing layer on the siliceous ceramic layer.

【0027】次に得られたサンプルの表面にブラックラ
イトブルー蛍光灯を用いて1平方cm当たり1.5mw
の照度で48時間紫外線を照射した。その後表面の水に
対する接触角を測定すると平均して5度以下であった。
また得られたフィルムの全光線透過率は93%であり、
ヘイズは0.2%であった。
Next, the surface of the obtained sample was irradiated with 1.5 mw / cm 2 using a black light blue fluorescent lamp.
UV light was irradiated at an illuminance of 48 hours. Thereafter, the contact angle of the surface with water was measured and found to be 5 degrees or less on average.
In addition, the total light transmittance of the obtained film was 93%,
The haze was 0.2%.

【0028】(比較例)ポリカーボネートからなる透明
合成樹脂フィルム(厚み0.5mm)に以下のコーティ
ング剤を塗布した。シリカゾル(日本合成ゴム、グラス
カA液、固形分20wt%)3重量部を混合後、メチル
トリメトキシシラン(日本合成ゴム、グラスカB液)1
重量部とエタノールを添加し、さらに2時間攪拌し、メ
チルトリメトキシシランを部分的に加水分解反応と 脱
水縮重合反応させることにより調整した。これを上記ポ
リカーボネートにフローコートにより塗布し、120
℃、50分加熱することにより従来技術であるゾルゲル
法によるシリカ質セラミックス層を得た。このシリカ質
セラミックス層の膜厚は1.0μmであった。
(Comparative Example) The following coating agent was applied to a transparent synthetic resin film (thickness: 0.5 mm) made of polycarbonate. After mixing 3 parts by weight of silica sol (Nippon Synthetic Rubber, Glasca A solution, solid content 20 wt%), methyltrimethoxysilane (Nippon Synthetic Rubber, Glasca B solution) 1
A part by weight and ethanol were added, and the mixture was further stirred for 2 hours, and adjusted by partially subjecting methyltrimethoxysilane to a hydrolysis reaction and a dehydration-condensation polymerization reaction. This was applied to the above polycarbonate by flow coating, and 120
By heating at 50 ° C. for 50 minutes, a siliceous ceramic layer was obtained by a sol-gel method as a conventional technique. The thickness of this siliceous ceramic layer was 1.0 μm.

【0029】次に、アナターゼ型酸化チタンゾル(日産
化学、TA−15、固形分15wt%)56重量部と、
シリカゾル(日本合成ゴム、グラスカA液、固形分20
wt%)33重量部を混合後、メチルトリメトキシシラ
ン(日本合成ゴム、グラスカB液)11重量部とエタノ
ールを添加し、さらに2時間攪拌し、メチルトリメトキ
シシランを部分的に加水分解反応と脱水縮重合反応させ
ることにより調整した。これをフローコートにより前記
ゾルゲル法によるシリカ質セラミックス層の上に光触媒
含有層を形成した。
Next, 56 parts by weight of an anatase type titanium oxide sol (Nissan Chemical Co., TA-15, solid content 15 wt%),
Silica sol (Nippon Synthetic Rubber, Glasca A solution, solid content 20
After mixing 33 parts by weight), 11 parts by weight of methyltrimethoxysilane (Nippon Synthetic Rubber, Glasca B solution) and ethanol were added, and the mixture was further stirred for 2 hours to partially hydrolyze methyltrimethoxysilane. It was adjusted by a dehydration condensation polymerization reaction. This was flow-coated to form a photocatalyst-containing layer on the siliceous ceramic layer by the sol-gel method.

【0030】次に得られたサンプルの表面にブラックラ
イトブルー蛍光灯を用いて1平方cm当たり1.5mw
の照度で48時間紫外線を照射した。その後表面の水に
対する接触角を測定すると平均して5度以下であった。
得られたフィルムの全光線透過率は89%であり、ヘイ
ズは0.7%であった。
Next, the surface of the obtained sample was 1.5 mw / cm 2 using a black light blue fluorescent lamp.
UV light was irradiated at an illuminance of 48 hours. Thereafter, the contact angle of the surface with water was measured and found to be 5 degrees or less on average.
The resulting film had a total light transmittance of 89% and a haze of 0.7%.

【0031】上記実施例と比較例を以下の試験で塗膜性
能比較した。
The coating properties of the above Examples and Comparative Examples were compared by the following tests.

【0032】(試験1) 光触媒含有層に対する抗分解
性 実施例で得られたサンプルと比較例で得られたサンプル
に超エネルギー照射試験機(スガ試験機UE−1DEc
型)で紫外線を240時間照射した。その結果、比較例
でのシリカ質セラミックス層にはクラックが認められた
のに対して、実施例でのシリカ質セラミックス層に異常
は認められなかった。
(Test 1) Anti-decomposition property for photocatalyst-containing layer A sample obtained in the example and a sample obtained in the comparative example were subjected to a super energy irradiation tester (Suga tester UE-1DEc).
UV light for 240 hours. As a result, cracks were observed in the siliceous ceramic layer in the comparative example, but no abnormality was observed in the siliceous ceramic layer in the example.

【0033】(試験2) 耐熱性 実施例で得られたサンプルと比較例で得られたサンプル
を130度で2時間加熱した結果、比較例でのシリカ質
セラミックス層にクラックが認められたのに対して、実
施例でのシリカ質セラミックス層に異常は認められなか
った。
(Test 2) Heat Resistance The sample obtained in the example and the sample obtained in the comparative example were heated at 130 ° C. for 2 hours. As a result, cracks were observed in the siliceous ceramic layer in the comparative example. In contrast, no abnormality was observed in the siliceous ceramic layer in the examples.

【0034】(試験3) 耐屈曲性 実施例で得られたサンプルと比較例で得られたサンプル
を半径2000mmに湾曲させた状態でサンシャインウ
ェザーメーター試験を行った。その結果、比較例のサン
プルでは100時間で表面に微細なクラックが認められ
たのに対して、実施例では500時間経過した時点で異
常は認められない。
(Test 3) Bending Resistance A sunshine weather meter test was performed on the sample obtained in the example and the sample obtained in the comparative example while being bent to a radius of 2000 mm. As a result, in the sample of the comparative example, fine cracks were observed on the surface after 100 hours, whereas in the example, no abnormality was observed after 500 hours.

【0035】(試験4) 耐摩耗性 実施例で得られたサンプルと比較例で得られたサンプル
の耐摩耗性を比較するために鉛筆硬度試験を行った。そ
の結果、比較例のサンプルでは鉛筆硬度F〜Hであった
のに対して、実施例では2H〜3Hであった。
(Test 4) Abrasion Resistance A pencil hardness test was performed to compare the abrasion resistance of the sample obtained in the example with the sample obtained in the comparative example. As a result, the sample of the comparative example had a pencil hardness of F to H, whereas the example had a pencil hardness of 2H to 3H.

【0036】以上より、ポリシラザン又はその変成物か
らなるシリカ質セラミックス層は非常に緻密な被膜であ
るため、光触媒の分解作用から基材を保護する機能およ
び耐熱性、耐屈曲性、耐摩耗性に優れ、また薄膜にでき
ることから光線透過率においても優れ、保護フイルムに
好適であることが確認される。
As described above, since the siliceous ceramic layer made of polysilazane or a modified product thereof is a very dense film, it has a function of protecting the base material from the decomposition action of the photocatalyst and has a high heat resistance, bending resistance, and abrasion resistance. It is excellent, and since it can be made into a thin film, it also has excellent light transmittance, and it is confirmed that it is suitable for a protective film.

【0037】[0037]

【発明の効果】本発明による保護フイルムは、外面に二
酸化チタン等の光触媒を含む光触媒含有層が形成されて
いるので、この保護フイルムを部材等に貼着することに
より、保護フイルムの表面に塵埃や車両の排気ガス等の
汚染物質が表面に付着しても、光触媒によって保護フイ
ルムの表面が親水化されているので、汚染物質が効果的
に洗浄される。しかもこの保護フイルムを部材等に貼着
するだけでよいので、部材表面に直接光触媒含有層、中
間層、保護層を形成する必要があった従来に比べて極め
て容易であり、且つ設置後においても自浄性を付与する
ことができ、さらにフイルムとしての部材の保護をも兼
ね備えている。
The protective film according to the present invention has a photocatalyst-containing layer containing a photocatalyst such as titanium dioxide formed on its outer surface. By sticking this protective film to a member or the like, the surface of the protective film is exposed to dust. Even if contaminants such as vehicle and vehicle exhaust gas adhere to the surface, the surface of the protective film is hydrophilized by the photocatalyst, so that the contaminants are effectively cleaned. Moreover, since it is only necessary to attach this protective film to the member or the like, it is much easier than in the past where it was necessary to form a photocatalyst containing layer, an intermediate layer, and a protective layer directly on the member surface, and even after installation. It can provide self-cleaning properties and also protects the members as a film.

【0038】また本発明は、基材と光触媒含有層との間
にポリシラザン又はその変成物からなるシリカ質セラミ
ックス層が形成され、このポリシラザン又はその変成物
からなるシリカ質セラミックス層は、非常に緻密な被膜
であるために、薄膜でも光触媒の酸化分解作用から基材
が保護されると共に、且つ耐熱性に優れているために、
光触媒含有層の焼成時においてもクラックが発生せず、
また耐屈曲性に優れているために、湾曲させてもクラッ
クが発生せず、あらゆる形状の部材等に容易に貼着する
ことができ、さらに耐久性に優れ、且つ薄膜でも高い塗
膜硬度を有しているために、基材は傷付きにくい。
Further, according to the present invention, a siliceous ceramic layer made of polysilazane or a modified product thereof is formed between a substrate and a photocatalyst-containing layer, and the siliceous ceramic layer made of polysilazane or a modified product thereof is very dense. Because it is a thin film, the base material is protected from the oxidative decomposition action of the photocatalyst even in a thin film, and because it has excellent heat resistance,
No cracks occur even during firing of the photocatalyst containing layer,
In addition, since it has excellent flex resistance, it does not crack even when it is curved, can be easily attached to members of any shape, etc., has excellent durability, and has high coating hardness even in a thin film. The base material is less likely to be scratched.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の一形態を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 基材 2 シリカ質セラミックス層 3 光触媒含有層 Reference Signs List 1 base material 2 siliceous ceramic layer 3 photocatalyst containing layer

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F100 AA21 AD00A AD04A AD09A AK45 AL06A AT00C BA03 CC00 EJ01 EJ54 EJ58 EJ91 GB07 GB08 GB90 JL06 JL08B JM01 JN01  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4F100 AA21 AD00A AD04A AD09A AK45 AL06A AT00C BA03 CC00 EJ01 EJ54 EJ58 EJ91 GB07 GB08 GB90 JL06 JL08B JM01 JN01

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 基材にポリシラザン又はその変成物から
なるシリカ質セラミックス層が形成され、外面に光触媒
含有層が形成されていることを特徴とする保護フイル
ム。
1. A protective film comprising: a base material, a siliceous ceramic layer made of polysilazane or a modified product thereof formed thereon, and a photocatalyst-containing layer formed on an outer surface.
【請求項2】 シリカ質セラミックス層は、ポリシラザ
ン又はその変成物に、アミン類又は/及び酸類が添加さ
れた塗膜形成用組成物から形成されていることを特徴と
する請求項1記載の保護フイルム。
2. The protection according to claim 1, wherein the siliceous ceramic layer is formed from a composition for forming a coating film in which amines and / or acids are added to polysilazane or a modified product thereof. Film.
【請求項3】 シリカ質セラミックス層は、ポリシラザ
ン又はその変成物に、アミン類又は/及び酸類が添加さ
れた塗膜形成用組成物を水蒸気と接触させることにより
形成されていることを特徴とする請求項1記載の保護フ
イルム。
3. The siliceous ceramic layer is formed by contacting a film-forming composition obtained by adding amines and / or acids to polysilazane or a modified product thereof with water vapor. The protective film according to claim 1.
JP10197453A 1998-07-13 1998-07-13 Protective film Pending JP2000025156A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10197453A JP2000025156A (en) 1998-07-13 1998-07-13 Protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10197453A JP2000025156A (en) 1998-07-13 1998-07-13 Protective film

Publications (1)

Publication Number Publication Date
JP2000025156A true JP2000025156A (en) 2000-01-25

Family

ID=16374771

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000189795A (en) * 1998-12-26 2000-07-11 Toto Ltd Surface treating agent for forming photocatalytic film and formation of photocatalytic film using the same
GB2400717A (en) * 2003-04-05 2004-10-20 Royal British Legion Ind Ltd A method of temporarily concealing information displayed by a sign.
JP2005206229A (en) * 2004-01-26 2005-08-04 Mosho Tei Bottle-shaped container with protective film
DE102004011213A1 (en) * 2004-03-04 2005-09-22 Clariant International Limited Coatings for metal surfaces, process for their preparation and their use as self-cleaning protective layer, especially for car rims
JP2005296471A (en) * 2004-04-14 2005-10-27 Aruze Corp Game machine
JP2009274924A (en) * 2008-05-15 2009-11-26 National Institute Of Advanced Industrial & Technology Gelatinous clay film or dried clay film made therefrom
WO2012169761A2 (en) * 2011-06-07 2012-12-13 (주)엘지하우시스 Method for manufacturing a flame-resistant and transparent film, and flame-resistant and transparent film manufactured using same
JP2016117881A (en) * 2014-12-19 2016-06-30 三星エスディアイ株式会社SAMSUNG SDI Co., LTD. Composition for forming silica based layer, method for manufacturing silica based layer, and electronic device including said silica based layer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000189795A (en) * 1998-12-26 2000-07-11 Toto Ltd Surface treating agent for forming photocatalytic film and formation of photocatalytic film using the same
GB2400717A (en) * 2003-04-05 2004-10-20 Royal British Legion Ind Ltd A method of temporarily concealing information displayed by a sign.
JP2005206229A (en) * 2004-01-26 2005-08-04 Mosho Tei Bottle-shaped container with protective film
DE102004011213A1 (en) * 2004-03-04 2005-09-22 Clariant International Limited Coatings for metal surfaces, process for their preparation and their use as self-cleaning protective layer, especially for car rims
JP2005296471A (en) * 2004-04-14 2005-10-27 Aruze Corp Game machine
JP2009274924A (en) * 2008-05-15 2009-11-26 National Institute Of Advanced Industrial & Technology Gelatinous clay film or dried clay film made therefrom
WO2012169761A2 (en) * 2011-06-07 2012-12-13 (주)엘지하우시스 Method for manufacturing a flame-resistant and transparent film, and flame-resistant and transparent film manufactured using same
WO2012169761A3 (en) * 2011-06-07 2013-03-07 (주)엘지하우시스 Method for manufacturing a flame-resistant and transparent film, and flame-resistant and transparent film manufactured using same
KR101405638B1 (en) * 2011-06-07 2014-06-13 (주)엘지하우시스 Method of manufacturing fireproofing treated transparent film and the fireproofing treated transparent film using the same
JP2016117881A (en) * 2014-12-19 2016-06-30 三星エスディアイ株式会社SAMSUNG SDI Co., LTD. Composition for forming silica based layer, method for manufacturing silica based layer, and electronic device including said silica based layer

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