JP2003146979A - Method for producing lactone - Google Patents

Method for producing lactone

Info

Publication number
JP2003146979A
JP2003146979A JP2001349159A JP2001349159A JP2003146979A JP 2003146979 A JP2003146979 A JP 2003146979A JP 2001349159 A JP2001349159 A JP 2001349159A JP 2001349159 A JP2001349159 A JP 2001349159A JP 2003146979 A JP2003146979 A JP 2003146979A
Authority
JP
Japan
Prior art keywords
producing
lactone
reaction
alcohol
reducing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001349159A
Other languages
Japanese (ja)
Inventor
Yuji Okago
祐二 大篭
Hiroko Takahashi
裕子 高橋
Takako Takahashi
孝子 高橋
Taketoshi Naito
威敏 内藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP2001349159A priority Critical patent/JP2003146979A/en
Publication of JP2003146979A publication Critical patent/JP2003146979A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing a lactone in high yield under mild conditions in reducing an acid anhydride raw material compound having a specific structure. SOLUTION: This method for producing the lactone comprises adding a primary alcohol and/or a secondary alcohol to the reaction system in reducing the acid anhydride derived from a norbornenecarboxylic acid derivative with the specific structure.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は特定の酸無水物原料
化合物を水素化ホウ素ナトリウム等の還元剤で還元し,
対応するラクトン構造を有する化合物を製造する方法に
関する。
TECHNICAL FIELD The present invention reduces a specific acid anhydride raw material compound with a reducing agent such as sodium borohydride,
It relates to a method for producing a compound having a corresponding lactone structure.

【0002】[0002]

【従来の技術】本発明により得られるラクトン化合物
は,医薬,農薬などの機能性化学品の原料として広く用
いられる。特に本発明で得られる化合物は活性な炭素−
炭素二重結合を有しており,ここに例えば(メタ)アク
リル酸のような重合性カルボン酸を付加させることが可
能である。こうして得られたラクトン構造を含有する
(メタ)アクリル酸エステルをモノマーとする高分子化
合物をベース樹脂としたレジスト材料は,高エネルギー
線に感応し,感度,解像性,エッチング耐性に優れてい
るため,電子線や遠紫外線による微細加工に有用であ
る。特にArFエキシマレーザー,KrFエキシマレー
ザーの露光波長での吸収が小さいため,微細でしかも基
板に対して垂直なパターンを容易に形成することができ
るという特徴を有する。さらに本発明で得られるラクト
ン化合物の活性な二重結合を利用して,開環重合やビニ
ル重合を行うと,ラクトンが主鎖にペンダント型に結合
した樹脂が得られる。これらの樹脂はポリオレフィンで
ありながら,極性官能基の性質もあわせ持った新しい樹
脂として様々な分野で有用な樹脂として利用される。
The lactone compound obtained by the present invention is widely used as a raw material for functional chemicals such as medicines and agricultural chemicals. In particular, the compound obtained in the present invention is
It has a carbon double bond to which a polymerizable carboxylic acid such as (meth) acrylic acid can be added. The resist material obtained by using a polymer compound containing a lactone structure-containing (meth) acrylic acid ester as a monomer in this way is sensitive to high-energy rays and has excellent sensitivity, resolution, and etching resistance. Therefore, it is useful for fine processing with electron beams or deep ultraviolet rays. In particular, since the absorption at the exposure wavelength of ArF excimer laser and KrF excimer laser is small, it has a feature that a fine pattern can be easily formed perpendicular to the substrate. Further, ring-opening polymerization or vinyl polymerization is carried out using the active double bond of the lactone compound obtained in the present invention to obtain a resin in which the lactone is pendantly bonded to the main chain. Although these resins are polyolefins, they are useful as resins that are useful in various fields as new resins that also have the properties of polar functional groups.

【0003】同一分子内に炭素−炭素二重結合を有する
酸無水物の還元によって,その二重結合を残したままで
酸無水物のみを選択的に還元し,ラクトンに導くための
還元剤としては,水素化ホウ素ナトリウム/ジメチルホ
ルムアミド(DMF)系や水素化リチウムアルミニウム
などが知られている(M.M.Kayserら, Canadian Journal
of Chemistry, 56, p.1524 (1978); E.M.Mangnusら, S
ynthetic Communications, 22, p.783 (1992); J.Haslo
uinら, Tetrahedron Letters, p.4651 (1976)など)。
これらの反応系では目的物の収率が80%以上という比
較的高い結果が得られているが,前者の反応系では溶媒
としてDMFを使用しているために生成物の効率的な単
離に煩雑な操作を必要とする。また、後者の反応系では
−78℃という過酷な反応条件を選択せねばならず,工
業的な実施には不利な技術である。
As a reducing agent for reducing an acid anhydride having a carbon-carbon double bond in the same molecule to selectively reduce only the acid anhydride while leaving the double bond, thereby leading to a lactone. , Sodium borohydride / dimethylformamide (DMF) system and lithium aluminum hydride are known (MMKayser et al., Canadian Journal
of Chemistry, 56, p. 1524 (1978); EM Mangnus et al., S
ynthetic Communications, 22, p.783 (1992); J. Haslo
uin et al., Tetrahedron Letters, p. 4651 (1976)).
In these reaction systems, the yield of the target compound is 80% or higher, which is relatively high. However, in the former reaction system, DMF is used as a solvent, so that the product can be efficiently isolated. It requires complicated operations. Further, in the latter reaction system, a severe reaction condition of -78 ° C must be selected, which is a disadvantageous technique for industrial implementation.

【0004】一方,同様の反応において、水素化ホウ素
ナトリウムを還元剤として使用する際の一般的な溶媒と
しては、テトラヒドロフラン(THF)やエタノールな
どが知られている。前者のTHF溶媒では、本発明の比
較例に示すように目的物の収率が50%程度と低い。ま
た、後者のエタノール溶媒系は、Tetrahedron Letters,
Vol.35, No.8, pp. 1165-1168 (1994)に開示されてい
るが、還元剤が比較的速やかに加溶媒分解されるため
に,過剰量の還元剤が必要となるなど,工業的な実施に
は適さない。
On the other hand, tetrahydrofuran (THF), ethanol and the like are known as general solvents when sodium borohydride is used as a reducing agent in the same reaction. In the former THF solvent, the yield of the target product is as low as about 50% as shown in the comparative example of the present invention. In addition, the latter ethanol solvent system, Tetrahedron Letters,
Vol.35, No.8, pp. 1165-1168 (1994), the reducing agent undergoes solvolysis relatively quickly, so an excessive amount of reducing agent is required. Not suitable for practical implementation.

【0005】[0005]

【発明が解決しようとする課題】本発明は上記事情に鑑
みなされたもので,従来技術には開示されていない特定
の構造の酸無水物原料化合物を、温和な反応条件下で,
合理的な量の還元剤により,高い収率で目的とするラク
トン化合物を製造できる方法を提供することを目的とす
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an acid anhydride raw material compound having a specific structure, which has not been disclosed in the prior art, is added under mild reaction conditions.
It is an object of the present invention to provide a method capable of producing a desired lactone compound in a high yield with a reasonable amount of a reducing agent.

【0006】[0006]

【課題を解決するための手段】本発明者らは、本発明の
特定の構造を有する酸無水物原料化合物を還元する際
に、特定のアルコールを反応系に添加することにより、
温和な反応条件下で,合理的な量の還元剤により,高い
収率で目的とするラクトン化合物を製造できることを見
出し、本発明に到達した。
The present inventors have added a specific alcohol to a reaction system when reducing an acid anhydride raw material compound having a specific structure of the present invention.
The present inventors have found that the desired lactone compound can be produced in a high yield with a reasonable amount of a reducing agent under mild reaction conditions, and have arrived at the present invention.

【0007】即ち、本発明の要旨は、下記反応式(1)
の原料化合物(A)及び/又は反応式(2)の原料化合
物(B)を、還元剤の存在下に還元し、反応式(1)の
(a1)及び/又は(a2)、或いは、反応式(2)の(b
1)及び/又は(b2)で表されるラクトン類を製造する
方法において、反応系中に第一級アルコール及び/又は
第二級アルコールを添加することを特徴とするラクトン
類の製造方法、に存する。
That is, the gist of the present invention is to provide the following reaction formula (1)
Of the starting compound (A) and / or the starting compound (B) of the reaction formula (2) in the presence of a reducing agent, and then (a1) and / or (a2) of the reaction formula (1), or the reaction (B in equation (2)
1) and / or a method for producing a lactone represented by (b2), which comprises adding a primary alcohol and / or a secondary alcohol to the reaction system, Exist.

【0008】[0008]

【化2】 [Chemical 2]

【0009】(反応式(1)及び(2)中、R1〜R
8は、各々独立に水素原子、置換されていてもよい炭素
数1〜8の直鎖状、分岐状または脂環式アルキル基を指
す。)
(In the reaction formulas (1) and (2), R 1 to R 1
Each 8 independently represents a hydrogen atom or an optionally substituted linear, branched or alicyclic alkyl group having 1 to 8 carbon atoms. )

【0010】[0010]

【発明の実施の形態】(酸無水物原料化合物)本発明で
使用する原料化合物は、下記一般式(A)及び/又は
(B)で示されるノルボルネンカルボン酸誘導体由来の
酸無水物である。
BEST MODE FOR CARRYING OUT THE INVENTION (Acid Anhydride Raw Material Compound) The raw material compound used in the present invention is an acid anhydride derived from a norbornenecarboxylic acid derivative represented by the following general formula (A) and / or (B).

【0011】[0011]

【化3】 [Chemical 3]

【0012】一般式(A)中のR1〜R6及び一般式
(B)中のR1〜R8は、水素原子、炭素数1〜8の直鎖
状,分岐状及び脂環式アルキル基から選ばれる基であ
る。中でも、反応式(1)においては、R1〜R3が水素
原子であり,R4〜R6が水素原子またはメチル基である
のが好ましく、特には、R1〜R6の全てが水素原子であ
るのが好ましい。また、反応式(2)においては、R1
〜R8が全て水素原子であるのが好ましい。これら反応
式(1)又は(2)のR1〜R6のアルキル基は更に置換
されていてもよく、その置換基としては、フェニル基,
トルイル基等のアリール基;ヒドロキシル基,メトキシ
基,エトキシ基等のアルコキシル基,メトキシカルボニ
ル基,エトキシカルボニル基等のカルボアルコキシル基
等が挙げられる。具体的には5−ノルボルネン−2,3
−ジカルボン酸無水物,2−メチルノルボルネン−2,
3−ジカルボン酸無水物,シクロペンタジエンと無水イ
タコン酸との Diels-Alder 付加物などが挙げられる。
R 1 to R 6 in the general formula (A) and R 1 to R 8 in the general formula (B) are a hydrogen atom, a linear, branched or alicyclic alkyl group having 1 to 8 carbon atoms. A group selected from the group. Among them, in the reaction formula (1), it is preferable that R 1 to R 3 are hydrogen atoms and R 4 to R 6 are hydrogen atoms or a methyl group, and particularly, all of R 1 to R 6 are hydrogen. It is preferably an atom. In reaction formula (2), R 1
It is preferred that all of R 8 are hydrogen atoms. The alkyl group of R 1 to R 6 in these reaction formulas (1) or (2) may be further substituted, and as the substituent, a phenyl group,
An aryl group such as a toluyl group; an alkoxyl group such as a hydroxyl group, a methoxy group and an ethoxy group, and a carboalkoxyl group such as a methoxycarbonyl group and an ethoxycarbonyl group. Specifically, 5-norbornene-2,3
-Dicarboxylic acid anhydride, 2-methylnorbornene-2,
Examples thereof include 3-dicarboxylic anhydride, Diels-Alder adduct of cyclopentadiene and itaconic anhydride, and the like.

【0013】原料化合物の濃度(重量百分率)は、滴下
終了時基準で、反応液に対して1〜70wt%,好まし
くは3〜50wt%,さらに好ましくは5〜40wt%
の範囲である。 (第一級又は第二級アルコール)本発明で使用できる第
一級又は第二級アルコールとしては、炭素数1〜8の直
鎖状,分岐状の脂肪族または脂環式の第一級または第二
級アルコールが好ましく用いられる。具体的にはメタノ
ール,エタノール,n−プロパノール,イソプロパノー
ル,n−ブタノール,イソブタノール,第二ブタノー
ル,n−アミルアルコール,イソアミルアルコール,n
−ヘキサノール,シクロヘキサノール,n−ヘプタノー
ル,n−オクタノール,2−エチルヘキサノールなどが
挙げられる。中でも、メタノール,エタノール,n−プ
ロパノール,イソプロパノール,n−ブタノール,イソ
ブタノール,1−メチルプロパノールからなる群から選
ばれる炭素数1〜4のアルコールが好ましく、特にはメ
タノール,エタノールまたはイソプロパノールから選ば
れるアルコールが好ましい。特には第一級アルコールが
よい。
The concentration (weight percentage) of the raw material compound is 1 to 70% by weight, preferably 3 to 50% by weight, and more preferably 5 to 40% by weight based on the reaction liquid at the end of dropping.
Is the range. (Primary or Secondary Alcohol) Examples of the primary or secondary alcohol that can be used in the present invention include linear or branched aliphatic or alicyclic primary or C1-8 or Secondary alcohols are preferably used. Specifically, methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, secondary butanol, n-amyl alcohol, isoamyl alcohol, n
-Hexanol, cyclohexanol, n-heptanol, n-octanol, 2-ethylhexanol and the like. Among them, alcohols having 1 to 4 carbon atoms selected from the group consisting of methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, and 1-methylpropanol are preferable, and particularly alcohols selected from methanol, ethanol or isopropanol. Is preferred. Particularly, primary alcohol is preferable.

【0014】アルコールの好ましい使用量は使用するア
ルコールの種類によって変化するが,一般的には還元剤
に対するモル比で0.01〜50,好ましくは0.1〜
20,さらに好ましくは0.5〜10の範囲である。 (溶媒)還元反応に使用する溶媒は、原料化合物を溶解
する非プロトン性の溶媒が好ましい。例えばヘキサンや
ベンゼンなどの脂肪族又は芳香族炭化水素類、ジエチル
エーテル,THF,ジオキサンなどのエーテル類、酢酸
メチル,酢酸エチルなどのエステル類、γ−ブチロラク
トン,δ−バレロラクトンなどのラクトン類などが好ま
しく使用できる。 (還元剤)還元剤としては、アルカリ金属ボロハイドラ
イドや水素化リチウムアルミニウム等の公知の還元剤が
使用できる。中でもアルカリ金属ボロハイドライドが好
ましく、アルカリ金属としては、リチウムやナトリウム
が挙げられる。また、特には水素化ホウ素ナトリウムが
好ましい。
The preferred amount of alcohol used varies depending on the type of alcohol used, but generally, the molar ratio to the reducing agent is 0.01 to 50, preferably 0.1 to 50.
20 and more preferably 0.5 to 10. (Solvent) The solvent used for the reduction reaction is preferably an aprotic solvent that dissolves the starting compound. For example, aliphatic or aromatic hydrocarbons such as hexane and benzene, ethers such as diethyl ether, THF and dioxane, esters such as methyl acetate and ethyl acetate, lactones such as γ-butyrolactone and δ-valerolactone. It can be preferably used. (Reducing agent) As the reducing agent, known reducing agents such as alkali metal borohydride and lithium aluminum hydride can be used. Among them, alkali metal borohydride is preferable, and examples of the alkali metal include lithium and sodium. Further, sodium borohydride is particularly preferable.

【0015】還元剤の使用量は原料化合物に対するモル
比で0.5〜4,好ましくは0.7〜3,さらに好まし
くは1〜2の範囲である。 (反応方法)本発明においては、還元反応が開始する前
に、予め還元剤とアルコールを接触させない方法で酸無
水物原料化合物と還元剤及びアルコールを接触させるの
がよい。例えば、第一級及び/又は第二級アルコールと
原料化合物(A)及び/又は(B)との混合溶液を予め
調製し、この混合溶液を還元剤を含む液と混合する方法
を採用するのがよい。
The amount of the reducing agent used is in the range of 0.5 to 4, preferably 0.7 to 3, and more preferably 1 to 2 in terms of molar ratio with respect to the raw material compound. (Reaction Method) In the present invention, it is preferable to bring the acid anhydride raw material compound into contact with the reducing agent and alcohol by a method in which the reducing agent and alcohol are not brought into contact with each other before the reduction reaction starts. For example, a method of preparing a mixed solution of the primary and / or secondary alcohol and the starting compound (A) and / or (B) in advance and mixing the mixed solution with a liquid containing a reducing agent is adopted. Is good.

【0016】一般的には反応器に還元剤を含む懸濁液を
仕込み,ここに反応器に仕込んだ溶媒と同一の溶媒に溶
解した酸無水物原料化合物を連続的又は間欠的に滴下す
ることによって反応を進行させる。この際,原料溶液に
予め設定量のアルコールを共存させるのが簡便である
が,必要に応じてアルコールは別途滴下しても良い。ま
た,原料およびアルコール溶液を反応器に仕込み,還元
剤又はその懸濁液を滴下しても構わない。 (反応条件)反応温度は原料溶液の滴下速度や濃度によ
って最適温度が変化するが,一般的には−50〜100
℃,好ましくは−40〜70℃,さらに好ましくは−3
0〜50℃の範囲である。反応時間は滴下速度と同一で
あり,0.1時間から30時間,好ましくは0.2〜2
0時間,さらに好ましくは0.5〜10時間の範囲であ
る。必要に応じて滴下終了後に20時間以内の熟成時間
を設けることもできる。反応は水分の混入を可能な限り
避けながら行う。そのためには,反応器および原料溶液
の受器を不活性ガス雰囲気としておくことが好ましい。
不活性ガスとしては、反応の円滑な進行を阻害しないも
のであれば何でも良いが,水素,ヘリウム,窒素,アル
ゴン,メタンなどが例示できる。 (生成物の単離精製)反応終了後,反応生成液を塩酸等
の適当な酸で酸性とし、トルエンなどの有機溶媒で抽出
した後,蒸留,再結晶,クロマトグラフィーなどの方法
により目的物を精製できるが,一般には抽出液を濃縮す
ることにより十分に高い純度の生成物が取得できる。 ((メタ)アクリル酸エステルの製造)このようにして
合成した本発明のラクトン化合物は、その炭素−炭素二
重結合部分に(メタ)アクリル酸等の重合性カルボン酸
を、硫酸等の酸触媒の存在下、定法により付加させるこ
とにより、ラクトン構造を有するカルボン酸エステル、
特に(メタ)アクリル酸エステルを製造することができ
る。
Generally, a suspension containing a reducing agent is charged into a reactor, and the acid anhydride raw material compound dissolved in the same solvent as the solvent charged in the reactor is continuously or intermittently added dropwise thereto. To drive the reaction. At this time, it is easy to make a preset amount of alcohol coexist in the raw material solution, but alcohol may be dropped separately if necessary. Further, the raw material and the alcohol solution may be charged into a reactor and the reducing agent or its suspension may be dropped. (Reaction conditions) The reaction temperature varies depending on the dropping rate and concentration of the raw material solution, but the optimum temperature is generally -50 to 100.
℃, preferably -40 to 70 ℃, more preferably -3
It is in the range of 0 to 50 ° C. The reaction time is the same as the dropping rate and is 0.1 to 30 hours, preferably 0.2 to 2
It is 0 hour, more preferably 0.5 to 10 hours. If necessary, an aging time of 20 hours or less can be set after the dropping. The reaction is carried out while avoiding contamination with water as much as possible. For that purpose, it is preferable to keep the reactor and the receiver of the raw material solution in an inert gas atmosphere.
Any inert gas may be used as long as it does not hinder the smooth progress of the reaction, and hydrogen, helium, nitrogen, argon, methane and the like can be exemplified. (Isolation and purification of product) After completion of the reaction, the reaction product solution is acidified with a suitable acid such as hydrochloric acid, extracted with an organic solvent such as toluene, and then the target product is obtained by a method such as distillation, recrystallization and chromatography. Although it can be purified, in general, a sufficiently high purity product can be obtained by concentrating the extract. (Production of (meth) acrylic acid ester) The lactone compound of the present invention thus synthesized has a polymerizable carboxylic acid such as (meth) acrylic acid at its carbon-carbon double bond portion and an acid catalyst such as sulfuric acid. In the presence of, by a conventional method, a carboxylic acid ester having a lactone structure,
In particular, (meth) acrylic acid esters can be produced.

【0017】[0017]

【実施例】以下に実施例により本発明を詳細に説明する
が、本発明はその要旨を超えない限り、以下の実施例に
限定されるものではない。 (実施例1)容量200mlの側管付き滴下ロート,温
度計および逆流冷却器を付した容量1Lの四頸丸底フラ
スコ(反応器)に磁気撹拌子を入れ,窒素ガスを流しな
がら加熱乾燥した。ここに順次THF350mlと水素化ホ
ウ素ナトリウム18.15g(0.48mol)を仕込んだ。滴下ロー
トに、メタノール 15.38g(0.48mol)を加えた5−ノルボ
ルネン−2,3−ジカルボン酸無水物 (化合物(A)
において、R1〜R6が全て水素原子である化合物に相
当)78.80g(0.48mol)のTHF(250ml)溶液を仕込んだ。
反応器を氷/食塩浴で−10℃に冷却し,撹拌しつつ滴
下ロートより酸無水物原料化合物を含む溶液を1時間で
滴下した。その間反応液の温度は8℃以下に保たれた。
EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited to the following examples as long as the gist thereof is not exceeded. (Example 1) A four-necked round-bottomed flask (reactor) with a capacity of 200 L, equipped with a dropping funnel with a side tube, a thermometer, and a backflow condenser was equipped with a magnetic stirrer and heated and dried while flowing nitrogen gas. . To this, 350 ml of THF and 18.15 g (0.48 mol) of sodium borohydride were sequentially charged. 5-Norbornene-2,3-dicarboxylic acid anhydride prepared by adding 15.38 g (0.48 mol) of methanol to the dropping funnel (compound (A)
In the above, a solution of 78.80 g (0.48 mol) of THF (250 ml) corresponding to a compound in which R1 to R6 are all hydrogen atoms was charged.
The reactor was cooled to −10 ° C. in an ice / salt bath, and a solution containing the acid anhydride raw material compound was added dropwise from a dropping funnel over 1 hour while stirring. During that time, the temperature of the reaction solution was kept at 8 ° C or lower.

【0018】滴下終了後、2規定の塩酸水溶液(280m
l)を注意深く加えたところ,無色透明の2層の溶液と
なった。これを分液し,THF層と水層(1)を得た.
THF層の溶媒を減圧下に留去し,トルエン 200mlを加
え,十分撹拌した後に不溶分をろ過によって除いたとこ
ろ,トルエン層と水層の二層溶液が得られた。このニ層
を分液し,水層をトルエン(100ml)で抽出し,トルエ
ン層と水層(2)に分け,トルエン層は上記のトルエン
層に合わせた。水層(1)と(2)を合わせ,トルエン
(300ml)で抽出し,抽出液を上記のトルエン層に合わ
せた。この合わせたトルエン層を飽和炭酸水素ナトリウ
ム 50mlで4回洗浄し,次いで純水 50mlで3回洗浄し
た。無水硫酸マグネシウム上で乾燥した後,トルエンを
減圧下に留去したところ,白色結晶 62.47g(0.416mol)
が得られた。この結晶はNMRおよびガスクロマトグラ
フィーによる分析の結果,3−オキソ−4−オキサトリ
シクロ[5.2.1.02,6]デセン−8(式(a1)に
おいて、R1〜R6が全て水素原子である化合物に相
当)であることが明らかとなった。原料の5−ノルボル
ネン−2,3−ジカルボン酸無水物 に対する収率は8
6.7%であった。 (実施例2)実施例1において,原料として5−ノルボ
ルネン−2,3−ジカルボン酸無水物に代えて5−ノル
ボルネン−2,2−ジカルボン酸無水物(化合物(B)
において、R1〜R8が全て水素原子である化合物に相
当)を使用した以外は実施例1と同様の反応操作及び後
処理操作を行った。その結果、目的生成物ビシクロ
[2.2.1]ヘプタン−2−エン−6−スピロ(2’
−オキソ−3’−オキサ)シクロペンタン(式(b1)に
おいて、R1〜R6が全て水素原子である化合物に相
当)が白色結晶として63.86g(0.389mol)得られた。原料
5−ノルボルネン−2,2−ジカルボン酸無水物に対す
る収率は81.0%であった。 (比較例1)実施例1においてメタノールを使用しなか
った以外は,実施例1と同様の反応操作及び後処理操作
を行った。その結果、目的生成物3−オキソ−4−オキ
サトリシクロ[5.2.1.02,6]デセン−8(式(a
1)において、R1〜R6が全て水素原子である化合物
に相当)の収量は40.35g(0.269mol)であった。原料5−
ノルボルネン−2,2−ジカルボン酸無水物に対する収
率は56.0%であった。 (実施例3)3−オキソ−4−オキサトリシクロ[5.
2.1.02,6]デカン−8−イルメタクリレートおよ
び5−オキソ−4−オキサトリシクロ[5.2.1.0
2,6]デカン−8−イルメタクリレートの製造;100
mlのナス型フラスコ中で,上記実施例1で得られた3
−オキソ−4−オキサトリシクロ[5.2.1.
2,6]デカン−8−エン13.12g(87.4mm
ol)および4−メトキシフェノール30mgを,メタ
クリル酸30.09g(350mmol)に溶解した.
ここに95%濃硫酸3.62g(35mmol)を加
え,内容物を撹拌しつつ油浴上で120℃で3時間加熱
した。室温に冷却の後,炭酸ナトリウム4gを水100
mlに溶解した水溶液に,上記で得た反応生成液を注意
深く投入し,室温で30分間撹拌した.トルエン100
mlを加えた後,水層を分離し,70℃の水浴上で減圧
下に内容物重量が22.5gとなるまで濃縮した。ここ
にトルエン100mlを加え,50ml毎の飽和炭酸水
素ナトリウム水溶液で4回洗浄し,生成した茶色固形物
をろ過することによって除去した後,50ml毎の純水
で3回洗浄した。無水硫酸マグネシウム上で乾燥し,減
圧下にトルエンを留去することによって,17.31g
の粘調な生成物を得た。これをシリカゲルカラムクロマ
トグラフィー(溶離液:酢酸エチル:トルエン=1:1
容量比)に付し,99%以上の純度で3−オキソ−4−
オキサトリシクロ[5.2.1.02,6]デカン−8−
イルメタクリレートおよび5−オキソ−4−オキサトリ
シクロ[5.2.1.02,6]デカン−8−イルメタク
リレートの混合物15.69g(66.4mmol)が
得られた.原料3−オキソ−4−オキサトリシクロ
[5.2.1.02,6]デカン−8−エンに対する収率
は76%であった。 (実施例4)ビシクロ[2.2.1]ヘプタン−スピロ
−(2’−オキソ−3’−オキサ)シクロペンタン−2
−イルメタクリレートおよびビシクロ[2.2.1]ヘ
プタン−スピロ−(2’−オキソ−3’−オキサ)シク
ロペンタン−3−イルメタクリレートの製造;100ml
ナス型フラスコ中で、実施例2で得られたビシクロ
[2.2.1]ヘプタン−2−エン−スピロ−(2’−
オキソ−3’−オキサ)シクロペンタン12.15g(74.0mmo
l)、メタクリル酸 25.50g(296.2mmol)、および4−メト
キシフェノール14.6mgを混合し均一溶液とした。ここに
95%濃硫酸1.943g(18.8mmol)を加え、攪拌しながら油
浴上で120℃、2時間加熱攪拌を続けた。反応液を室
温に冷却した後、炭酸ナトリウム2.02g(19.06mmol)の水
溶液(20ml)を加え、攪拌、放置後水層を分離し、得られ
たトルエン溶液を70℃/10mmHgの減圧加熱条件で1
時間処理し、トルエンおよびメタクリル酸を留去した。
各20mlの飽和炭酸水素ナトリウム水溶液で4回洗浄し、
さらに有機層を各10mlの純水で4回洗浄した。無水硫酸
マグネシウム上で乾燥の後、トルエン30mlとクロマト用
シリカゲルを加え、この縣濁液を室温で1時間攪拌し、
シリカゲルをろ別、トルエン洗浄してろ液と洗浄液を合
わせた。これから溶媒を留去したところ15.60gの油状黄
色透明な生成物を得た。この生成物は室温に放置すると
大半が結晶化した。キャピラリークロマトグラフによっ
て展開すると、少なくとも8種の類似保持時間を示す化
合物からなることが分かった。収率は84.2%であった。
After completion of the dropping, 2N hydrochloric acid aqueous solution (280 m
When l) was added carefully, it became a colorless and transparent two-layer solution. This was separated to obtain a THF layer and an aqueous layer (1).
The solvent of the THF layer was distilled off under reduced pressure, 200 ml of toluene was added, and after sufficient stirring, the insoluble matter was removed by filtration, and a two-layer solution of the toluene layer and the aqueous layer was obtained. The two layers were separated, the aqueous layer was extracted with toluene (100 ml), and separated into a toluene layer and an aqueous layer (2), and the toluene layer was combined with the above toluene layer. The aqueous layers (1) and (2) were combined, extracted with toluene (300 ml), and the extract was combined with the above toluene layer. The combined toluene layers were washed 4 times with 50 ml of saturated sodium hydrogen carbonate and then 3 times with 50 ml of pure water. After drying over anhydrous magnesium sulfate, toluene was distilled off under reduced pressure to yield 62.47 g (0.416 mol) of white crystals.
was gotten. This crystal was analyzed by NMR and gas chromatography, and as a result, 3-oxo-4-oxatricyclo [5.2.1.0 2,6 ] decene-8 (in formula (a1), R 1 to R 6 are all hydrogen). Corresponding to a compound that is an atom). The yield based on the starting material, 5-norbornene-2,3-dicarboxylic acid anhydride, was 8
It was 6.7%. (Example 2) In Example 1, instead of 5-norbornene-2,3-dicarboxylic acid anhydride as a raw material, 5-norbornene-2,2-dicarboxylic acid anhydride (compound (B)) was used.
In (corresponding to a compound in which R1 to R8 are all hydrogen atoms), the same reaction operation and post-treatment operation as in Example 1 were performed. As a result, the desired product bicyclo [2.2.1] heptane-2-ene-6-spiro (2 '
63.86 g (0.389 mol) of -oxo-3'-oxa) cyclopentane (corresponding to the compound in which R1 to R6 in the formula (b1) are all hydrogen atoms) was obtained as white crystals. The yield based on the starting material 5-norbornene-2,2-dicarboxylic acid anhydride was 81.0%. Comparative Example 1 The same reaction operation and post-treatment operation as in Example 1 were carried out except that methanol was not used in Example 1. As a result, the desired product 3-oxo-4-oxatricyclo [5.2.1.0 2,6 ] decene-8 (formula (a
The yield of 1) was 40.35 g (0.269 mol), which corresponds to a compound in which R1 to R6 are all hydrogen atoms). Raw material 5-
The yield based on norbornene-2,2-dicarboxylic anhydride was 56.0%. (Example 3) 3-oxo-4-oxatricyclo [5.
2.1.0 2,6 ] Decan-8-ylmethacrylate and 5-oxo-4-oxatricyclo [5.2.1.0]
Preparation of 2,6 ] decane-8-yl methacrylate; 100
3 ml obtained in Example 1 above in a ml eggplant-shaped flask
-Oxo-4-oxatricyclo [5.2.1.
0 2,6 ] decane-8-ene 13.12 g (87.4 mm
ol) and 30 mg of 4-methoxyphenol were dissolved in 30.09 g (350 mmol) of methacrylic acid.
To this was added 3.62 g (35 mmol) of 95% concentrated sulfuric acid, and the contents were heated on an oil bath at 120 ° C. for 3 hours while stirring. After cooling to room temperature, 4 g of sodium carbonate was added to 100 parts of water.
The reaction product solution obtained above was carefully added to an aqueous solution dissolved in ml and stirred at room temperature for 30 minutes. Toluene 100
After adding ml, the aqueous layer was separated and concentrated under reduced pressure on a water bath at 70 ° C. until the content weight became 22.5 g. Toluene (100 ml) was added thereto, washed with 50 ml of a saturated aqueous sodium hydrogencarbonate solution four times, and the produced brown solid was removed by filtration, and then washed with 50 ml of pure water three times. By drying over anhydrous magnesium sulfate and distilling off toluene under reduced pressure, 17.31 g
Viscous product was obtained. This was subjected to silica gel column chromatography (eluent: ethyl acetate: toluene = 1: 1).
Volume ratio), and with a purity of 99% or higher, 3-oxo-4-
Oxatricyclo [5.2.1.0 2,6 ] decane-8-
15.69 g (66.4 mmol) of a mixture of ilmethacrylate and 5-oxo-4-oxatricyclo [5.2.1.0 2,6 ] decan-8-ylmethacrylate was obtained. The yield based on the raw material 3-oxo-4-oxatricyclo [5.2.1.0 2,6 ] decane-8-ene was 76%. Example 4 Bicyclo [2.2.1] heptane-spiro- (2'-oxo-3'-oxa) cyclopentane-2
Preparation of -ylmethacrylate and bicyclo [2.2.1] heptane-spiro- (2'-oxo-3'-oxa) cyclopentan-3-ylmethacrylate; 100 ml.
In a round bottom flask, the bicyclo [2.2.1] heptane-2-ene-spiro- (2′-obtained in Example 2 was obtained.
Oxo-3'-oxa) cyclopentane 12.15g (74.0mmo
l), methacrylic acid 25.50 g (296.2 mmol), and 4-methoxyphenol 14.6 mg were mixed to form a uniform solution. To this was added 1.943 g (18.8 mmol) of 95% concentrated sulfuric acid, and the mixture was heated with stirring on an oil bath at 120 ° C. for 2 hours while stirring. After cooling the reaction solution to room temperature, an aqueous solution (20 ml) of sodium carbonate 2.02 g (19.06 mmol) was added, and after stirring and standing, the aqueous layer was separated, and the obtained toluene solution was heated under reduced pressure of 70 ° C / 10 mmHg. 1
After treatment for a time, toluene and methacrylic acid were distilled off.
Wash 4 times with 20 ml of saturated aqueous sodium hydrogen carbonate solution,
Furthermore, the organic layer was washed 4 times with 10 ml of pure water each time. After drying over anhydrous magnesium sulfate, 30 ml of toluene and silica gel for chromatography were added, and this suspension was stirred at room temperature for 1 hour,
The silica gel was filtered off and washed with toluene, and the filtrate and the washing solution were combined. When the solvent was distilled off from this, 15.60 g of an oily yellow transparent product was obtained. Most of the product crystallized when left at room temperature. Expanded by capillary chromatography, it was found to consist of at least 8 compounds with similar retention times. The yield was 84.2%.

【0019】[0019]

【発明の効果】本発明の方法によって,医薬,農薬およ
び機能性樹脂の原料となるラクトン化合物を、温和な条
件下、高収率で製造することが可能となる。
Industrial Applicability According to the method of the present invention, it is possible to produce a lactone compound, which is a raw material for medicines, agricultural chemicals and functional resins, under mild conditions and in high yield.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 高橋 孝子 神奈川県横浜市青葉区鴨志田町1000番地 三菱化学株式会社横浜総合研究所内 (72)発明者 内藤 威敏 神奈川県横浜市青葉区鴨志田町1000番地 三菱化学株式会社横浜総合研究所内 Fターム(参考) 4C037 UA03 UA05 WA10    ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Takako Takahashi             1000 Kamoshida-cho, Aoba-ku, Yokohama-shi, Kanagawa             Mitsubishi Chemical Corporation Yokohama Research Institute (72) Inventor Taketoshi Naito             1000 Kamoshida-cho, Aoba-ku, Yokohama-shi, Kanagawa             Mitsubishi Chemical Corporation Yokohama Research Institute F-term (reference) 4C037 UA03 UA05 WA10

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 下記反応式(1)の原料化合物(A)及
び/又は反応式(2)の原料化合物(B)を、還元剤の
存在下に還元し、反応式(1)の(a1)及び/又は(a
2)、或いは、反応式(2)の(b1)及び/又は(b2)
で表されるラクトン類を製造する方法において、反応系
中に第一級アルコール及び/又は第二級アルコールを添
加することを特徴とするラクトン類の製造方法。 【化1】 (反応式(1)及び(2)中、R1〜R8は、各々独立に
水素原子、置換されていてもよい炭素数1〜8の直鎖
状、分岐状または脂環式アルキル基を指す。)
1. A starting compound (A) of the following reaction formula (1) and / or a starting compound (B) of the reaction formula (2) is reduced in the presence of a reducing agent to give (a1) of the reaction formula (1). ) And / or (a
2), or (b1) and / or (b2) of reaction formula (2)
In the method for producing a lactone represented by, a primary alcohol and / or a secondary alcohol is added to the reaction system. [Chemical 1] (In the reaction formulas (1) and (2), R 1 to R 8 each independently represent a hydrogen atom, or an optionally substituted linear, branched or alicyclic alkyl group having 1 to 8 carbon atoms. Point)
【請求項2】 還元剤が、アルカリ金属ボロハイドライ
ドである請求項1に記載のラクトン類の製造方法。
2. The method for producing a lactone according to claim 1, wherein the reducing agent is an alkali metal borohydride.
【請求項3】 還元反応が開始する前に、予め還元剤と
アルコールを接触させない請求項1又は2に記載のラク
トン類の製造方法。
3. The method for producing a lactone according to claim 1, wherein the reducing agent and the alcohol are not brought into contact with each other before the reduction reaction is started.
【請求項4】 第一級及び/又は第二級アルコールと原
料化合物(A)及び/又は(B)との混合溶液を予め調
製し、この混合溶液を還元剤を含む液と混合することに
より還元反応を行なう請求項3に記載のラクトン類の製
造方法。
4. A mixed solution of a primary and / or secondary alcohol and a starting compound (A) and / or (B) is prepared in advance, and this mixed solution is mixed with a liquid containing a reducing agent. The method for producing a lactone according to claim 3, wherein a reduction reaction is performed.
【請求項5】 反応式(1)及び(2)中のR1〜R8
水素原子、メチル基及びエチル基からなる群からそれぞ
れ独立に選ばれるものである請求項1〜4のいずれかに
記載のラクトン類の製造方法。
5. R 1 to R 8 in the reaction formulas (1) and (2) are each independently selected from the group consisting of a hydrogen atom, a methyl group and an ethyl group. The method for producing a lactone according to 1.
【請求項6】 第一級及び/又は第二級アルコールが、
炭素数1〜8のアルコールである請求項1〜5のいずれ
かに記載のラクトン類の製造方法。
6. The primary and / or secondary alcohol is
The method for producing a lactone according to any one of claims 1 to 5, which is an alcohol having 1 to 8 carbon atoms.
【請求項7】 反応式(1)中のR1〜R3が水素原子で
あり,R4〜R6が水素原子またはメチル基である請求項
1〜6のいずれかに記載のラクトン類の製造方法。
7. The lactone according to claim 1, wherein R 1 to R 3 in the reaction formula (1) are hydrogen atoms, and R 4 to R 6 are hydrogen atoms or methyl groups. Production method.
【請求項8】 反応式(2)中のR1〜R8が水素原子で
ある許請求項1〜6のいずれかに記載のラクトン類の製
造方法。
8. The method for producing a lactone according to claim 1, wherein R 1 to R 8 in the reaction formula (2) are hydrogen atoms.
【請求項9】 該アルコールがメタノール,エタノール
またはイソプロパノールから選ばれる請求項1〜8のい
ずれかに記載のラクトン類の製造方法。
9. The method for producing a lactone according to claim 1, wherein the alcohol is selected from methanol, ethanol or isopropanol.
【請求項10】 原料化合物に対し、添加する該アルコ
ールのモル比が0.1〜10の範囲である請求項1〜8
のいずれかに記載のラクトン類の製造方法。
10. The molar ratio of the alcohol to be added to the raw material compound is in the range of 0.1 to 10.
The method for producing a lactone according to any one of 1.
【請求項11】 請求項1〜10のいずれかに記載され
た方法により得られるラクトン類を(メタ)アクリル酸
と反応させることにより、(メタ)アクリル酸エステル
を製造する方法。
11. A method for producing a (meth) acrylic acid ester by reacting a lactone obtained by the method according to claim 1 with a (meth) acrylic acid.
JP2001349159A 2001-11-14 2001-11-14 Method for producing lactone Pending JP2003146979A (en)

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WO2005003193A1 (en) * 2003-07-07 2005-01-13 Tokyo Ohka Kogyo Co., Ltd. Positive resist composition and method for forming resist pattern using same
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WO2012173209A1 (en) * 2011-06-14 2012-12-20 三菱レイヨン株式会社 Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same

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* Cited by examiner, † Cited by third party
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WO2004096787A1 (en) * 2003-04-28 2004-11-11 Mitsubishi Chemical Corporation Polycyclic lactones, (meth)acrylates having polycyclic lactone structures, and process for production thereof
WO2005003193A1 (en) * 2003-07-07 2005-01-13 Tokyo Ohka Kogyo Co., Ltd. Positive resist composition and method for forming resist pattern using same
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