JP3446225B2 - Cyclopentane derivative and method for producing the same - Google Patents

Cyclopentane derivative and method for producing the same

Info

Publication number
JP3446225B2
JP3446225B2 JP23999892A JP23999892A JP3446225B2 JP 3446225 B2 JP3446225 B2 JP 3446225B2 JP 23999892 A JP23999892 A JP 23999892A JP 23999892 A JP23999892 A JP 23999892A JP 3446225 B2 JP3446225 B2 JP 3446225B2
Authority
JP
Japan
Prior art keywords
group
butyl
halogenated
formula
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP23999892A
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Japanese (ja)
Other versions
JPH0665194A (en
Inventor
克明 宮地
史衛 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
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Nissan Chemical Corp
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Filing date
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Priority to JP23999892A priority Critical patent/JP3446225B2/en
Publication of JPH0665194A publication Critical patent/JPH0665194A/en
Application granted granted Critical
Publication of JP3446225B2 publication Critical patent/JP3446225B2/en
Anticipated expiration legal-status Critical
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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、医農薬又はその中間
体、特に強力な生理活性を有するプロスタグランジン類
又はその中間体として有用なα及びβ位置換シクロペン
タン誘導体及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an α- and β-position-substituted cyclopentane derivative useful as a pharmaceutical or agricultural chemical or an intermediate thereof, particularly a prostaglandin having a strong physiological activity or an intermediate thereof, and a method for producing the same.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】シクロ
ペンタン誘導体類は医薬品の中間体として注目されてお
り、特に強力な生理活性を有するプロスタグランジン類
の中間体として有用である。
BACKGROUND OF THE INVENTION Cyclopentane derivatives have attracted attention as intermediates for pharmaceuticals, and are particularly useful as intermediates for prostaglandins having strong physiological activity.

【0003】従来、シクロペンタン誘導体類の製造は、
例えば下記化合物(VI)を合成する場合、下記反応式
のように行われていた(テトラヘドロン・レター,Vo
l.31, No. 24, 3425頁,199
0)。
Conventionally, the production of cyclopentane derivatives has been
For example, when synthesizing the following compound (VI), it was carried out according to the following reaction formula (tetrahedron letter, Vo.
l. 31, No. 24, p. 3425, 199
0).

【0004】[0004]

【化5】 [Chemical 5]

【0005】即ち、上記式(VII)のコレイラクトン
(Corey lactone)から9段階反応で上記
式(VIII)で示されるアルデヒドを合成し、次いで
このアルデヒドに対してウィッティヒ反応(Witti
ng reaction)を行った後、還元反応を進め
ることにより上記式(IX)で示されるアルコールを合
成し、更に5段階の反応を経て式(VI)の化合物が製
造されていた。
That is, the aldehyde represented by the above formula (VIII) is synthesized from the corey lactone of the above formula (VII) by a 9-step reaction, and then the Wittig reaction (Witti reaction) is performed on this aldehyde.
ng reaction), and then proceed with a reduction reaction to synthesize the alcohol represented by the above formula (IX), and then the compound of the formula (VI) was produced through 5 steps of reaction.

【0006】しかしながら、上記方法では、プロスタグ
ランジンの5,6位の二重結合をシス配置にするため、
式(VIII)のアルデヒドをウィッティヒ反応させる
際に入手困難な(CF3CH2O)2P(O)CH2CO2
CH3,毒性を有する18−Croum−6及びKN
〔Si(CH332といった特殊な試剤を使用しなけ
ればならない(テトラヘドロン・レター,Vol. 2
4, No. 41, 4405頁,1983参照)と
いう欠点があった。
However, in the above method, since the double bonds at the 5th and 6th positions of prostaglandin are in the cis configuration,
(CF 3 CH 2 O) 2 P (O) CH 2 CO 2 which is difficult to obtain in the Wittig reaction of the aldehyde of formula (VIII)
CH 3 , toxic 18-Croom-6 and KN
[Si (CH 3) 3] must be used 2, such as a special reagent (Tetrahedron Letters, Vol. 2
4, No. 41, 4405, 1983).

【0007】更に、上述の試剤を使用しても5,6位の
二重結合がトランス配置の副生物が10%程度副生して
しまうため、その分離が煩雑となり、しかも目的化合物
の収率が低下してしまうという問題があった。
Furthermore, even if the above-mentioned reagents are used, the by-products of trans configuration of the double bond at the 5th and 6th positions are by-produced by about 10%, so that the separation thereof becomes complicated and the yield of the target compound is also increased. However, there was a problem that

【0008】従って、上述した問題がなく工業的に有利
に製造でき、しかも光学活性なプロスタグランジン類又
はその中間体として有用なシクロペンタン誘導体及びそ
の製造方法の開発が望まれる。
Therefore, it is desired to develop a cyclopentane derivative which can be produced industrially advantageously without the above-mentioned problems and which is useful as an optically active prostaglandin or its intermediate, and a production method thereof.

【0009】[0009]

【課題を解決するための手段及び作用】本発明者は上記
要望に応えるため鋭意検討を重ねた結果、下記一般式
(I)及び(II)で示されるシクロペンタン誘導体が
光学活性なプロスタグランジン類又はその合成中間体と
して有効であり、しかも工業的に非常に有利に製造でき
ることを見い出した。
Means for Solving the Problems The present inventors have conducted extensive studies in order to meet the above demands, and as a result, cyclopentane derivatives represented by the following general formulas (I) and (II) are optically active prostaglandins. It has been found that they are effective as compounds or synthetic intermediates thereof and can be produced industrially very advantageously.

【0010】[0010]

【化6】 (但し、式中R1はメチル基、エチル基、n−プロピル
基、i−プロピル基、n−ブチル基、i−ブチル、t−
ブチル基、アミル基、ヘキシル基、ヘプチル基、オクチ
ル基、ノニル基、デシル基、2−メチルヘキシル基、2
−ヘキシル基、シクロペンチル基、シクロヘキシル基、
シクロヘキシルメチル基、ヘキサ−4−イン−2−イル
基、ヘプタ−4−イン−2−イル基、2,6−ジメチル
−ヘプタ−5−エン−1−イル基、ペンタ−1−エン−
1−イル基、ペンタ−2−エン−1−イル基、ヘキサ−
1−エン−2−イル基、3−エトキシ−2−メチル−プ
ロパン−2−イル基、エトキシエチル基、5−メトキシ
ヘキシル基、2−(トリメチルシリルオキシ)−2-ヘ
キシル基、ハロゲン化メチル基、ハロゲン化n−ブチル
基、ハロゲン化n−ペンチル基、ハロゲン化ノニル基、
フェニル基、ベンジル基、ハロゲン化フェニル基、n−
ペンチルオキシメチル基、1−エトキシ−2−メチル−
プロパン−2−イル基、フェノキシメチル基、ベンジロ
キシメチル基、p−クロルフェノキシメチル基、2−フ
ェニルエチル基、ベンジロキシエチル基、p−フルオロ
フェノキシメチル基、フェニルアセチレニル基、m−ク
ロルフェノキシメチル基、m−トリフルオロメチル−フ
ェノキシメチル基、1−ブチル−シクロプロピル基、3
−エチル−シクロペンチル基、ベンゾチオフェノン−5
−イル基、2−オクテニル基、3−メトキシカルボニル
プロピル基又はビニル基、R2,R3はそれぞれ水酸基の
保護基、R4は水素原子又は水酸基の保護基である。)
[Chemical 6] (However, in the formula, R 1 is a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl, a t-
Butyl group, amyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, 2-methylhexyl group, 2
-Hexyl group, cyclopentyl group, cyclohexyl group,
Cyclohexylmethyl group, hexa-4-in-2-yl group, hepta-4-in-2-yl group, 2,6-dimethyl-hepta-5-en-1-yl group, penta-1-ene-
1-yl group, penta-2-en-1-yl group, hexa-
1-en-2-yl group, 3-ethoxy-2-methyl-propan-2-yl group, ethoxyethyl group, 5-methoxyhexyl group, 2- (trimethylsilyloxy) -2-hexyl group, methyl halide group A halogenated n-butyl group, a halogenated n-pentyl group, a halogenated nonyl group,
Phenyl group, benzyl group, halogenated phenyl group, n-
Pentyloxymethyl group, 1-ethoxy-2-methyl-
Propan-2-yl group, phenoxymethyl group, benzyloxymethyl group, p-chlorophenoxymethyl group, 2-phenylethyl group, benzyloxyethyl group, p-fluorophenoxymethyl group, phenylacetylenyl group, m-chloro group Phenoxymethyl group, m-trifluoromethyl-phenoxymethyl group, 1-butyl-cyclopropyl group, 3
-Ethyl-cyclopentyl group, benzothiophenone-5
-Yl group, 2-octenyl group, 3-methoxycarbonylpropyl group or vinyl group, R 2 and R 3 are each a hydroxyl group-protecting group, and R 4 is a hydrogen atom or a hydroxyl group-protecting group. )

【0011】即ち、上記式(I)のシクロペンタン誘導
体(シクロペンタノン誘導体)は、本発明者が先に光学
活性なプロスタグランジン中間体として工業的に有利に
製造できるものとして特開平2−128号公報に提案し
た下記一般式(III)で示されるシクロペンテノン誘
導体と、下記一般式(V)で示される求核試剤とを反応
させ、必要に応じてR4の保護基を脱保護基化すること
により合成することができ、更に上記式(II)のシク
ロペンタン誘導体(シクロペンタノール誘導体)は上記
式(I)のシクロペンタノン誘導体に還元剤を反応させ
ることにより合成することができるものである。
That is, the cyclopentane derivative (cyclopentanone derivative) of the above formula (I) can be industrially advantageously produced by the present inventor as an optically active prostaglandin intermediate before. No. 128, a cyclopentenone derivative represented by the following general formula (III) is reacted with a nucleophilic reagent represented by the following general formula (V), and the protecting group of R 4 is deprotected as necessary. The cyclopentane derivative of formula (II) (cyclopentanol derivative) can be synthesized by reacting the cyclopentanone derivative of formula (I) with a reducing agent. It is possible.

【0012】[0012]

【化7】 (但し、式中R1〜R3は上記と同様の意味を示す。) (但し、式中R4は前記と同様の意味を示す。)[Chemical 7] (However, in the formula, R 1 to R 3 have the same meanings as described above.) (However, in the formula, R 4 has the same meaning as described above.)

【0013】これらの方法によれば、少ない反応段数
で、かつ特殊な試剤を用いることなく入手容易で安全性
の高い試剤を使用して、しかも3位に酸素原子を有し、
5,6位の二重結合が完全にシス配向である式(I)又
は(II)のシクロペンタン誘導体を選択的に分離操作
不要で高収率に合成できることを知見し、本発明をなす
に至った。
According to these methods, an easily available and highly safe reagent is used with a small number of reaction steps and without using a special reagent, and further, an oxygen atom is at the 3-position,
It was found that the cyclopentane derivative of the formula (I) or (II) in which the double bond at the 5- and 6-positions has a completely cis orientation can be selectively synthesized in a high yield without a separation operation, and thus the present invention is made. I arrived.

【0014】従って、本発明は、 (1)上記式(I)又は(II)で示されるシクロペン
タン誘導体、 (2)上記式(III)のシクロペンテノン誘導体と上
記式(V)の求核試剤とを反応させ、必要に応じてR4
の保護基を脱保護基化する上記式(I)のシクロペンタ
ン誘導体の製造方法、 (3)上記式(III)のシクロペンテノン誘導体と上
記式(V)の求核試剤とを反応させて得られた上記式
(I)のシクロペンタン誘導体に還元剤を作用させ、必
要に応じてR4の保護基を脱保護基化する上記式(I
I)のシクロペンタノン誘導体の製造方法を提供する。
Accordingly, the present invention provides (1) a cyclopentane derivative represented by the above formula (I) or (II), (2) a cyclopentenone derivative represented by the above formula (III) and a nucleophilic compound represented by the above formula (V). React with reagent and R 4 if necessary
A method for producing a cyclopentane derivative of the above formula (I), wherein the protecting group of the above formula is deprotected, (3) reacting the cyclopentenone derivative of the above formula (III) with a nucleophilic reagent of the above formula (V) A reducing agent is allowed to act on the obtained cyclopentane derivative of the above formula (I), and if necessary, the protecting group of R 4 is deprotected to form the above formula (I
A method for producing the cyclopentanone derivative of I) is provided.

【0015】以下、本発明について更に詳述すると、本
発明のシクロペンタノン誘導体は、上記一般式(I)又
は(II)で示されるものである。
The present invention will be described in more detail below. The cyclopentanone derivative of the present invention is represented by the above general formula (I) or (II).

【0016】[0016]

【0017】ここで、式中のR1は炭素数1〜15、好
ましくは3〜7の置換もしくは非置換のアルキル基、又
は置換もしくは非置換のフェニル基であり、例えばメチ
ル基、エチル基、n−プロピル基、i−プロピル基、n
−ブチル基、i−ブチル基、t−ブチル基、アミル基、
ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシ
ル基、2−メチルヘキシル基、2−ヘキシル基、シクロ
ペンチル基、シクロヘキシル基、シクロヘキシルメチル
基、ヘキサ−4−イン−2−イル基、ヘプタ−4−イン
−2−イル基、2,6−ジメチル−ヘプタ−5−エン−
1−イル基、ペンタ−1−エン−1−イル基、ペンタ−
2−エン−1−イル基、ヘキサ−1−エン−2−イル
基、3−エトキシ−2−メチル−プロパン−2−イル
基、エトキシエチル基、5−メトキシヘキシル基、2−
(トリメチルシリルオキシ)−2−ヘキシル基、ハロゲ
ン化メチル基、ハロゲン化n−ブチル基、ハロゲン化n
−ペンチル基、ハロゲン化ノニル基、フェニル基、ベン
ジル基、ハロゲン化フェニル基、n−ペンチルオキシメ
チル基、1−エトキシ−2−メチル−プロパン−2−イ
ル基、フェノキシメチル基、ベンジロキシメチル基、p
−クロルフェノキシメチル基、2−フェニルエチル基、
ベンジロキシエチル基、p−フルオロフェノキシメチル
基、フェニルアセチレニル基、m−クロルフェノキシメ
チル基、m−トリフルオロメチル−フェノキシメチル
基、1−ブチル−シクロプロピル基、3−エチル−シク
ロペンチル基、ベンゾチオフェノン−5−イル基、2−
オクテニル基、3−メトキシカルボニルプロピル基、ビ
ニル基等が挙げられ。
Here, R 1 in the formula is a substituted or unsubstituted alkyl group having 1 to 15 carbon atoms, preferably 3 to 7 carbon atoms, or a substituted or unsubstituted phenyl group, for example, a methyl group, an ethyl group, n-propyl group, i-propyl group, n
-Butyl group, i-butyl group, t-butyl group, amyl group,
Hexyl group, heptyl group, octyl group, nonyl group, decyl group, 2-methylhexyl group, 2-hexyl group, cyclopentyl group, cyclohexyl group, cyclohexylmethyl group, hexa-4-in-2-yl group, hepta-4 -In-2-yl group, 2,6-dimethyl-hept-5-ene-
1-yl group, penta-1-en-1-yl group, penta-
2-en-1-yl group, hexa-1-en-2-yl group, 3-ethoxy-2-methyl-propan-2-yl group, ethoxyethyl group, 5-methoxyhexyl group, 2-
(Trimethylsilyloxy) -2-hexyl group, halogenated methyl group, halogenated n-butyl group, halogenated n
-Pentyl group, halogenated nonyl group, phenyl group, benzyl group, halogenated phenyl group, n-pentyloxymethyl group, 1-ethoxy-2-methyl-propan-2-yl group, phenoxymethyl group, benzyloxymethyl group , P
-Chlorphenoxymethyl group, 2-phenylethyl group,
Benzyloxyethyl group, p-fluorophenoxymethyl group, phenylacetylenyl group, m-chlorophenoxymethyl group, m-trifluoromethyl-phenoxymethyl group, 1-butyl-cyclopropyl group, 3-ethyl-cyclopentyl group, Benzothiophenon-5-yl group, 2-
Examples thereof include an octenyl group, a 3-methoxycarbonylpropyl group and a vinyl group.

【0018】また、R2,R3はそれぞれ水酸基の保護基
であり、具体的にはベンジル基,p−メトキシベンジル
基等のアリールメチル基、トリメチルシリル基,t−ブ
チルジメチルシリル基等のトリアルキルシリル基、メト
キシメチル基,エトキシエチル基等のアルコキシアルキ
ル基、ベンジルオキシメチル基等のアラルキルオキシア
ルキル基、トリチル基、テトラヒドロピラニル(TH
P)基などが例示される。
R 2 and R 3 are each a hydroxyl group-protecting group, and specifically, arylmethyl groups such as benzyl group and p-methoxybenzyl group, trialkyl groups such as trimethylsilyl group and t-butyldimethylsilyl group. Alkoxyalkyl groups such as silyl groups, methoxymethyl groups, ethoxyethyl groups, aralkyloxyalkyl groups such as benzyloxymethyl groups, trityl groups, tetrahydropyranyl (TH
P) group etc. are illustrated.

【0019】R4は水素原子又は水酸基の保護基であ
り、水酸基の保護基としては上記R2,R3と同様の基が
例示され、R4はR2,R3と同一の基であっても異なる
基であってもよい。
R 4 is a hydrogen atom or a hydroxyl-protecting group, and examples of the hydroxyl-protecting group include the same groups as the above R 2 and R 3, and R 4 is the same group as R 2 and R 3. Or they may be different groups.

【0020】本発明の上記式(I)で示されるシクロペ
ンタン誘導体(シクロペンタノン誘導体)は、下記一般
式(III)で示されるシクロペンテノン誘導体と下記
一般式(V)で示される求核試剤とを反応させ、必要に
応じて脱保護基化することにより合成することができ
る。
The cyclopentane derivative (cyclopentanone derivative) represented by the above formula (I) of the present invention comprises a cyclopentenone derivative represented by the following general formula (III) and a nucleophilic compound represented by the following general formula (V). It can be synthesized by reacting with a reagent and optionally deprotecting.

【0021】[0021]

【化9】 (但し、式中R1〜R3は上記と同様の意味を示す。) (但し、式中R4は前記と同様の意味を示す。)[Chemical 9] (However, in the formula, R 1 to R 3 have the same meanings as described above.) (However, in the formula, R 4 has the same meaning as described above.)

【0022】この場合、上記式(III)のシクロペン
テノン誘導体は、本発明者が先に特開平2−128号公
報に提案した方法で製造することができる。
In this case, the cyclopentenone derivative of the above formula (III) can be produced by the method previously proposed by the present inventor in JP-A-2-128.

【0023】[0023]

【0024】[0024]

【0025】[0025]

【0026】[0026]

【0027】[0027]

【0028】本発明においては、上記式(III)のシ
クロペンテノン誘導体に対して上記式(V)の求核試剤
を0.5〜4当量、特に0.8〜1.2当量用いること
が好ましい。求核試剤の使用量が0.5当量に満たない
と原料が大量に残る場合があり、4当量を超えると副生
成物を生じる場合がある。
In the present invention, the nucleophilic reagent of the above formula (V) is used in an amount of 0.5 to 4 equivalents, particularly 0.8 to 1.2 equivalents, relative to the cyclopentenone derivative of the above formula (III). preferable. If the amount of the nucleophilic reagent used is less than 0.5 equivalent, a large amount of raw material may remain, and if it exceeds 4 equivalents, by-products may be produced.

【0029】また、上記式(III)の化合物と求核試
剤との反応は溶媒の存在下で行うことができ、溶媒とし
ては反応を阻害しないものであればよく、例えばテトラ
ヒドロフラン、ヘキサン、ペンタン、ジエチルエーテル
等が挙げられる。
The reaction of the compound of formula (III) with the nucleophilic reagent can be carried out in the presence of a solvent, and any solvent may be used as long as it does not inhibit the reaction, for example, tetrahydrofuran, hexane, pentane, Diethyl ether and the like can be mentioned.

【0030】なお、反応温度は通常−100〜50℃、
好ましくは−80〜0℃であり、反応時間は通常5分〜
50時間である。
The reaction temperature is usually -100 to 50 ° C,
It is preferably -80 to 0 ° C, and the reaction time is usually 5 minutes to
50 hours.

【0031】更に、R4の保護基の脱保護基化は、化合
物(I)の他の部分を損なわない条件下で行えばよく、
例えばp−トルエンスルホン酸、ピリジニウム・p−ト
ルエンスルホネートなどの弱酸性触媒、或いはnBu4
Fで代表されるフッ素イオンなどの存在下で行うことが
できる。
Further, the deprotection of the protecting group of R 4 may be carried out under the condition that the other part of the compound (I) is not damaged,
For example, a weak acidic catalyst such as p-toluenesulfonic acid or pyridinium p-toluenesulfonate, or n Bu 4 N
It can be carried out in the presence of a fluorine ion represented by F.

【0032】また、上記式(II)で示されるシクロペ
ンタノール誘導体は、上記式(I)で示されるシクロペ
ンタノン誘導体に還元剤を反応させることにより合成す
ることができる。
The cyclopentanol derivative represented by the above formula (II) can be synthesized by reacting the cyclopentanone derivative represented by the above formula (I) with a reducing agent.

【0033】ここで還元剤としては、例えばNaB
4,LiAlH4,NaBH3CN,(iBu)2Al
H,KB〔CH(CH3)C253H,KB〔CH(C
3)CH(CH323H,LiB〔CH(CH3)C2
5 Hなどが挙げられる。
Here, the reducing agent is, for example, NaB.
HFour, LiAlHFour, NaBH3CN, (iBu)2Al
H, KB [CH (CH3) C2HFive]3H, KB [CH (C
H3) CH (CH3)2]3H, LiB [CH (CH3) C2
HFive] H and the like.

【0034】上記還元剤の使用量は、式(I)のシクロ
ペンタノン誘導体に対して0.1〜10当量、特に0.
3〜3当量することが好ましい。
The reducing agent is used in an amount of 0.1 to 10 equivalents relative to the cyclopentanone derivative of formula (I), especially 0.1.
It is preferable to use 3 to 3 equivalents.

【0035】上記還元反応は溶媒の存在下で行うことが
好ましく、溶媒としては例えばテトラヒドロフラン、ヘ
キサン、ペンタン、ジエチルエーテル、メタノール、エ
タノール、ジクロロメタン、ジクロロエチレン等が挙げ
られる。
The above reduction reaction is preferably carried out in the presence of a solvent, and examples of the solvent include tetrahydrofuran, hexane, pentane, diethyl ether, methanol, ethanol, dichloromethane, dichloroethylene and the like.

【0036】また反応条件は別に限定されないが、−5
0〜20℃で0.1〜5時間反応させることが望まし
い。
The reaction conditions are not particularly limited, but -5
It is desirable to react at 0 to 20 ° C. for 0.1 to 5 hours.

【0037】[0037]

【発明の効果】本発明のシクロペンタン誘導体、即ち式
(I)のシクロペンタノン誘導体及び式(II)のシク
ロペンタノール誘導体は、医農薬又はその中間体、特に
下記式A,Bで示される3位に酸素原子を有するプロス
タグランジン類の合成中間体として有用である。更に本
発明の製造方法によれば、上記シクロペンタン誘導体を
少ない反応段数で、かつ特殊な試剤を用いることもな
く、しかも3位に酸素原子を有し、5,6位の二重結合
がシス配合であるものを簡単な操作で高収率に合成する
ことができる。
INDUSTRIAL APPLICABILITY The cyclopentane derivative of the present invention, that is, the cyclopentanone derivative of the formula (I) and the cyclopentanol derivative of the formula (II) are represented by pharmaceuticals and agricultural chemicals or intermediates thereof, especially by the following formulas A and B. It is useful as a synthetic intermediate for prostaglandins having an oxygen atom at the 3-position. Further, according to the production method of the present invention, the above cyclopentane derivative is used in a small number of reaction steps, without using a special reagent, and has an oxygen atom at the 3-position, and the double bond at the 5- and 6-positions is cis. The compound can be synthesized in a high yield by a simple operation.

【0038】[0038]

【化12】 [Chemical 12]

【0039】[0039]

【実旋例】以下、実旋例及び参考例を挙げて本発明をよ
り具体的に説明するが、本発明は下記実旋例に制限され
るものではない。なお、EEはエトキシエチル基、TB
Sはt−ブチルジメチルシリル基、t−Buはt−ブチ
ル基、n−Buはn−ブチル基である。
[Examples of Actual Rotation] Hereinafter, the present invention will be described more specifically with reference to examples of actual rotation and reference examples, but the present invention is not limited to the following examples of actual rotation. EE is an ethoxyethyl group, TB
S is a t-butyldimethylsilyl group, t-Bu is a t-butyl group, and n-Bu is an n-butyl group.

【0040】[0040]

【化13】 [Chemical 13]

【0041】上記式(1)の(Z)−1−ヨード−3−
(1−エトキシエチルオキシ)−1−プロペン(1.6
6g,6.48m mol)のエーテル(13ml)溶
液に−78℃でtert−ブチルリチウムのペンタン溶
液(7.6ml,0.7M,12.97m mol)を
滴下し、40分間撹拌した後、(2−チエニル)Cu
(CN)LiのTHF(テトラヒドロフラン)溶液(3
3.7ml,0.25M,8.43m mol)を加え
た。−78℃で15分間撹拌した後、上記式(2)の
(3R,4R)−2−メチレン−3−〔(S,E)−3
−シクロヘキシル−3−(tert−ブチルジメチルシ
ロキシ)−1−プロペン−1−イル〕−4−(tert
−ブチルジメチルシロキシ)シクロペンタン−1−オン
(2.07g、4.32m mol)のエーテル(15
ml)溶液を滴下した。撹拌しながら約1時間かけて室
温に昇温した後、反応液をヘキサン(10ml)と飽和
NaCO3水溶液(100ml)の混合溶液中に撹拌し
ながら注いだ、有機層を分離し、水層をヘキサン(50
ml)で抽出した。得られた有機層をMgSO4で乾燥
し、濾過した。濾液を減圧下で濃縮して得られた粗生成
物をシリカゲルカラムクロマトグラフィーにより精製し
たところ、上記式(3)の化合物1.79gが収率68
%で得られた。なお、式(3)の化合物のNMR及びR
f値の測定結果は、以下の通りである。
(Z) -1-iodo-3-of the above formula (1)
(1-Ethoxyethyloxy) -1-propene (1.6
To a solution of 6 g (6.48 mmol) in ether (13 ml) was added dropwise a solution of tert-butyllithium in pentane (7.6 ml, 0.7M, 12.97 mmol) at -78 ° C, and the mixture was stirred for 40 minutes, and then ( 2-thienyl) Cu
(CN) Li in THF (tetrahydrofuran) solution (3
3.7 ml, 0.25M, 8.43 mmol) was added. After stirring at -78 ° C for 15 minutes, (3R, 4R) -2-methylene-3-[(S, E) -3 of the above formula (2) was used.
-Cyclohexyl-3- (tert-butyldimethylsiloxy) -1-propen-1-yl] -4- (tert
-Butyldimethylsiloxy) cyclopentan-1-one (2.07 g, 4.32 mmol) ether (15
ml) solution was added dropwise. After the temperature was raised to room temperature over about 1 hour with stirring, the reaction solution was poured into a mixed solution of hexane (10 ml) and a saturated aqueous solution of NaCO 3 (100 ml) with stirring, the organic layer was separated, and the aqueous layer was separated. Hexane (50
ml). The organic layer obtained was dried over MgSO 4 and filtered. The crude product obtained by concentrating the filtrate under reduced pressure was purified by silica gel column chromatography to obtain 1.79 g of the compound of the above formula (3) in a yield of 68.
Obtained in%. The NMR and R of the compound of formula (3)
The measurement results of the f value are as follows.

【0042】[0042]

【化14】 1H NMR (CDCl3,300 MHz)δ:−
0.01,0.03,0.04及び0.05(4s,1
2H),0.87及び0.89(2s,18H),1.
20(t,J=7.1 Hz,3H),1.31(d,
J=5,4 Hz,3H),0.93−1.82(m,
11H),2.00−2.08(m,1H),2.15
(dd,J=8.2,18.2 Hz,1H),2.2
4−2.57(m,3H),2.63(dd,J=6.
9,18.2 Hz,1H),3.41−3.69
(m,2H),3.80−3.87(m,1H),4.
00−4.20(m,3H),4.70(q,J=5.
4 Hz,1H),5.40−5.67(m,4H) Rf:0.50(ヘキサン/エーテル=4/1)
[Chemical 14] 1 H NMR (CDCl 3 , 300 MHz) δ:-
0.01, 0.03, 0.04 and 0.05 (4s, 1
2H), 0.87 and 0.89 (2s, 18H), 1.
20 (t, J = 7.1 Hz, 3H), 1.31 (d,
J = 5,4 Hz, 3H), 0.93-1.82 (m,
11H), 2.00-2.08 (m, 1H), 2.15
(Dd, J = 8.2, 18.2 Hz, 1H), 2.2
4-2.57 (m, 3H), 2.63 (dd, J = 6.
9, 18.2 Hz, 1H), 3.41-3.69
(M, 2H), 3.80-3.87 (m, 1H), 4.
00-4.20 (m, 3H), 4.70 (q, J = 5.
4 Hz, 1H), 5.40-5.67 (m, 4H) Rf: 0.50 (hexane / ether = 4/1)

【0043】[0043]

【化15】 [Chemical 15]

【0044】実旋例1で合成した上記式(3)の1,
2,3,16,17,18,19,20−オクタノイル
−4−(1−エトキシエチルオキシ)−15−シクロヘ
キシルPGE211,15−ビス(tert−ブチルジ
メチルシリル)エーテル(1.66g,2.73m m
ol)のTHF(13.6ml)溶液を−78℃に冷却
し、L−Selectride〔LiB〔CH(C
3 25〕H〕(3.55ml,1MのTHF溶
液,3.55m mol)を滴下した。−78℃で1時
間撹拌した後、約1時間かけて室温に昇温した。35%
過酸化水素水溶液(3ml)を滴下した後、室温で15
分間撹拌した。飽和NH4Cl水溶液(50ml)とエ
ーテル(50ml)を加えた後、有機層を分離し、水層
をエーテル(30ml)で抽出した。得られた有機層を
MgSO4を用いて乾燥した後、濾過した。濾液を減圧
下で濃縮し、得られた粗精製物をシリカゲルカラムクロ
マトグラフィーにより精製したところ、上記式(4)の
化合物1.12gが収率67%で得られた。NMR測定
結果は以下の通りであった。
1 of the above formula (3) synthesized in the actual rotation example 1
2,3,16,17,18,19,20-octanoyl
-4- (1-ethoxyethyloxy) -15-cyclohe
Kicil PGE211,15-bis (tert-butyldi)
Methylsilyl) ether (1.66 g, 2.73 mm
ol) in THF (13.6 ml) cooled to -78 ° C.
L-Select [LiB [CH (C
H3) C2HFive] H] (3.55 ml, 1M in THF
Liquid, 3.55 mmol) was added dropwise. 1 hour at -78 ° C
After stirring for 1 hour, the temperature was raised to room temperature over about 1 hour. 35%
After dropping hydrogen peroxide solution (3 ml) at room temperature,
Stir for minutes. Saturated NHFourCl aqueous solution (50 ml) and
Ether (50 ml), then the organic layer is separated and the aqueous layer is separated.
Was extracted with ether (30 ml). The obtained organic layer
MgSOFourAfter drying with a filter, it was filtered. Reduce the pressure of the filtrate
The crude product obtained by concentrating under
When purified by means of the matography, the product of the above formula (4)
1.12 g of the compound was obtained with a yield of 67%. NMR measurement
The results were as follows.

【0045】[0045]

【化16】 1H NMR (CDCl3,300 MHz)δ:−
0.01,0.02,0.05及び0.10(4s,1
2H),0.87及び0.89(2s,18H),1.
21(t,J=7.0 Hz,3H),1.32(d,
J=5.2 Hz,3H),0.90−1.35(m,
6H),1.38−2.50(m,11H),3.43
−3.69(m,2H),3.74−3.80(m,1
H),3.98−4.25(m,4H),4.74
(q,J=5.2 Hz,1H),5.32(dd,J
=8.8,15.4 Hz,1H),5.45(dd,
J=6.0,15.4 Hz,1H),5.52−5.
68(m,2H).
[Chemical 16] 1 H NMR (CDCl 3 , 300 MHz) δ:-
0.01, 0.02, 0.05 and 0.10 (4s, 1
2H), 0.87 and 0.89 (2s, 18H), 1.
21 (t, J = 7.0 Hz, 3H), 1.32 (d,
J = 5.2 Hz, 3H), 0.90-1.35 (m,
6H), 1.38-2.50 (m, 11H), 3.43.
-3.69 (m, 2H), 3.74-3.80 (m, 1)
H), 3.98-4.25 (m, 4H), 4.74.
(Q, J = 5.2 Hz, 1H), 5.32 (dd, J
= 8.8, 15.4 Hz, 1H), 5.45 (dd,
J = 6.0, 15.4 Hz, 1H), 5.52-5.
68 (m, 2H).

【0046】[0046]

【化17】 [Chemical 17]

【0047】実旋例2で合成した上記式(4)の1,
2,3,16,17,18,19,20−オクタノイル
−4−(1−エトキシエチルオキシ)−15−シクロヘ
キシルPGF(2α)11,15−ビス(tert−ブ
チルジメチルシリル)エーテル(318.8mg,0.
52m mol)のイソプロピルアルコール(2.6m
l)とエーテル(2.6ml)との溶液に、ピリジウム
p−トルエンスルホネート(13.1mg,0.052
m mol)を加え、室温で20時間撹拌した。エーテ
ル(10ml)、続いて飽和NaHCO3水溶液(15
ml)を加えた後、エーテル(2×10ml)で抽出し
た。得られた有機層をMgSO4で乾燥した後、濾過し
た。濾液を減圧下で濃縮し、得られた粗生成物をシリカ
ゲルカラムクロマトグラフィーにより精製したところ、
上記式(5)の化合物250mgが収率89%で得られ
た。NMR、IR、旋光度及びRf値の測定結果は以下
の通りであった。
1 of the above formula (4) synthesized in the actual rotation example 2
2,3,16,17,18,19,20-Octanoyl-4- (1-ethoxyethyloxy) -15-cyclohexyl PGF (2α) 11,15-bis (tert-butyldimethylsilyl) ether (318.8 mg , 0.
52 mmol of isopropyl alcohol (2.6 m
l) and ether (2.6 ml) in a solution of pyridinium p-toluenesulfonate (13.1 mg, 0.052).
(m mol) and the mixture was stirred at room temperature for 20 hours. Ether (10 ml), followed by saturated aqueous NaHCO 3 (15
(ml) and then extracted with ether (2 × 10 ml). The obtained organic layer was dried over MgSO 4 and then filtered. The filtrate was concentrated under reduced pressure, the resulting crude product was purified by silica gel column chromatography,
250 mg of the compound of the above formula (5) was obtained with a yield of 89%. The results of measurement of NMR, IR, optical rotation and Rf value were as follows.

【0048】1H NMR (CDCl3,300 MH
z)δ:−0.01,0.03,0.06及び0.07
(4s,12H),0.88及び0.89(2s,18
H),1.02−1.41(m,6H),1.43−
1.92(m,8H),2.03(dt,J=13.
7,3.8 Hz,1H),2.20(dt,J=2.
0,7.1 Hz,1H),2.29(t,J=8.5
Hz,1H),2.52−2.80(m,3H),
3.73−3.90(m,2H),4.10(brs,
2H),4.33−4.47(m,1H),5.34
(dd,J=8.7,15.3 Hz,1H),5.4
5(dd,J=6.1,15.3 Hz,1H),5.
55(dt,J=4.9,11.0 Hz,1H),
5.70−5.89(m,1H).13 C NMR(CDCl3,75 MHz)δ:13
3.1,132.4,131.1,129.2,80.
2,74.5,57.4,56.7,52.0,44.
9,42.6,29.0,28.7,26.7,26.
3,25.9,25.8,18.2,17.9,−4.
1,−4.6,−4.8,−4.9. IR(neat):3340,2940,2860,1
740,1658,1463,1390,1385,1
300,1255,1110,1050,1010,9
70,950,900,840,775cm-1. 〔α〕26 D:+22.70(c 0.80,CHC
3). Rf:0.43(ヘキサン/AcOEt=2/1)
1 H NMR (CDCl 3 , 300 MH
z) δ: −0.01, 0.03, 0.06 and 0.07
(4s, 12H), 0.88 and 0.89 (2s, 18
H), 1.02-1.41 (m, 6H), 1.43-
1.92 (m, 8H), 2.03 (dt, J = 13.
7, 3.8 Hz, 1H), 2.20 (dt, J = 2.
0, 7.1 Hz, 1H), 2.29 (t, J = 8.5)
Hz, 1H), 2.52-2.80 (m, 3H),
3.73-3.90 (m, 2H), 4.10 (brs,
2H), 4.33-4.47 (m, 1H), 5.34.
(Dd, J = 8.7, 15.3 Hz, 1H), 5.4
5 (dd, J = 6.1, 15.3 Hz, 1H), 5.
55 (dt, J = 4.9, 11.0 Hz, 1H),
5.70-5.89 (m, 1H). 13 C NMR (CDCl 3 , 75 MHz) δ: 13
3.1, 132.4, 131.1, 129.2, 80.
2,74.5,57.4,56.7,52.0,44.
9, 42.6, 29.0, 28.7, 26.7, 26.
3, 25.9, 25.8, 18.2, 17.9, -4.
1, -4.6, -4.8, -4.9. IR (neat): 3340, 2940, 2860, 1
740, 1658, 1463, 1390, 1385, 1
300,1255,1110,1050,1010,9
70,950,900,840,775 cm -1 . [Α] 26 D : +22.70 (c 0.80, CHC
l 3 ). Rf: 0.43 (hexane / AcOEt = 2/1)

【0049】[0049]

【化18】 [Chemical 18]

【0050】上記式(5)の1,2,3,16,17,
18,19,20−オクタノイル−4−ヒドロキシ−1
5−シクロヘキシルPGF(2α)11,15−ビス
(tert−ブチルジメチルシリル)エーテル(49
2.7mg,0.914m mol)とBu4N・HS
4(31mg,0.091m mol)のトルエン
(5ml)/NaOH水溶液(5ml)の溶液に、2−
ブロモ酢酸t−ブチルエステル(0.37ml,2.2
9m mol)を加え、室温で4時間撹拌した。有機層
を分離し、水層をヘキサン(15ml)で抽出した。得
られた有機層を飽和NH4Cl水溶液(10ml)で洗
浄し、MgSO4で乾燥した後、濾過した。濾液を減圧
下で濃縮し、得られた粗生成物をシリカゲルカラムクロ
マトグラフィーにより精製したところ、上記式(6)の
化合物480.4mgが収率80.5%で得られた。N
MR、IR、旋光度及びRf値の測定結果は以下の通り
であった。
1, 2, 3, 16, 17, in the above equation (5),
18,19,20-Octanoyl-4-hydroxy-1
5-Cyclohexyl PGF (2α) 11,15-bis (tert-butyldimethylsilyl) ether (49
2.7 mg, 0.914 mmol) and Bu 4 N.HS
A solution of O 4 (31 mg, 0.091 mmol) in toluene (5 ml) / aqueous NaOH solution (5 ml) was added with 2-
Bromoacetic acid t-butyl ester (0.37 ml, 2.2
(9 mmol) was added, and the mixture was stirred at room temperature for 4 hours. The organic layer was separated, and the aqueous layer was extracted with hexane (15 ml). The obtained organic layer was washed with saturated aqueous NH 4 Cl solution (10 ml), dried over MgSO 4 , and then filtered. The filtrate was concentrated under reduced pressure, and the obtained crude product was purified by silica gel column chromatography to obtain 480.4 mg of the compound of the above formula (6) in a yield of 80.5%. N
The measurement results of MR, IR, optical rotation and Rf value were as follows.

【0051】[0051]

【化19】 1H NMR (CDCl3,300 MHz)δ:−
0.01,0.03,0.05及び0.06(4s,1
2H),0.87及び0.88(2s,18H),1.
48(s,9H),1.10−1.98(m,14
H),2.15(dt,J=5.1,14.1 Hz,
1H),2.30(dt,J=2.7,8.7Hz,1
H),2.35−2.52(m,1H),3.74−
3.81(m,1H),3.95(s,2H),3.9
8−4.50(m,2H),4.12(dd,J=5.
8,11.6 Hz,1H),4.22(dd,J=
6.3,11.6 Hz,1H),5.32(dd,J
=8.8,15.2 Hz,1H),5.44(dd,
J=6.0,15.2 Hz,1H),5.50−5.
74(m,2H).13 C NMR(CDCl3,75 MHz)δ:16
9.5,133.5,133.2,131.4,12
5.6,81.4,79.7,73.9,67.7,6
6.6,56.1,51.3,44.8,42.8,2
9.0,28.6,28.0,26.8,26.6,2
6.2,25.8,25.7,18.1,17.8,−
4.1,−4.7,−4.8. IR(neat):3500,2940,2850,1
750,1665,1468,1375,1300,1
255,1170,1130,1060cm-1.〔α〕
21 D:+11.80(c 1.061,CHCl3). Rf:0.45(ヘキサン/AcOEt=4/1)
[Chemical 19] 1 H NMR (CDCl 3 , 300 MHz) δ:-
0.01, 0.03, 0.05 and 0.06 (4s, 1
2H), 0.87 and 0.88 (2s, 18H), 1.
48 (s, 9H), 1.10-1.98 (m, 14
H), 2.15 (dt, J = 5.1, 14.1 Hz,
1H), 2.30 (dt, J = 2.7, 8.7 Hz, 1
H), 2.35-2.52 (m, 1H), 3.74-
3.81 (m, 1H), 3.95 (s, 2H), 3.9
8-4.50 (m, 2H), 4.12 (dd, J = 5.
8, 11.6 Hz, 1H), 4.22 (dd, J =
6.3, 11.6 Hz, 1H), 5.32 (dd, J
= 8.8, 15.2 Hz, 1H), 5.44 (dd,
J = 6.0, 15.2 Hz, 1H), 5.50-5.
74 (m, 2H). 13 C NMR (CDCl 3 , 75 MHz) δ: 16
9.5, 133.5, 133.2, 131.4, 12
5.6, 81.4, 79.7, 73.9, 67.7, 6
6.6, 56.1, 51.3, 44.8, 42.8, 2
9.0, 28.6, 28.0, 26.8, 26.6, 2
6.2, 25.8, 25.7, 18.1, 17.8,-
4.1, -4.7, -4.8. IR (neat): 3500, 2940, 2850, 1
750, 1665, 1468, 1375, 1300, 1
255, 1170, 1130, 1060 cm -1 . [Α]
21 D: +11.80 (c 1.061, CHCl 3). Rf: 0.45 (hexane / AcOEt = 4/1)

【0052】[0052]

【化20】 [Chemical 20]

【0053】上記式(6)の化合物(273.4mg,
0.419m mol)の塩化メチレン溶液(1.1m
l)に0℃でDMAP(N,N−ジメチルアミノピリジ
ン)(153.6mg,1.67m mol)及びp−
TsCl(p−トルエンスルホニルクロリド)(23
9.6mg,1.26m mol)を加え、室温に昇温
して5時間撹拌した。飽和NaHCO3水溶液(10m
l)及びヘキサン(15ml)を加え、10分間撹拌し
た後、有機層を分離した。得られた有機層をMgSO4
で乾燥した後、濾過した。濾液を減圧下で濃縮し、得ら
れた粗生成物を短いシリカゲルカラムクロマトグラフィ
ーに通した。これを濃縮し、得られた生成物をそのまま
次の反応に用いた。
The compound of the above formula (6) (273.4 mg,
0.419 mmol of methylene chloride solution (1.1 m
1) at 0 ° C. to DMAP (N, N-dimethylaminopyridine) (153.6 mg, 1.67 mmol) and p-
TsCl (p-toluenesulfonyl chloride) (23
9.6 mg, 1.26 mmol) was added, the temperature was raised to room temperature, and the mixture was stirred for 5 hours. Saturated NaHCO 3 aqueous solution (10 m
1) and hexane (15 ml) were added, the mixture was stirred for 10 minutes, and then the organic layer was separated. The obtained organic layer is MgSO 4
After drying in, it was filtered. The filtrate was concentrated under reduced pressure and the resulting crude product was passed through a short silica gel column chromatography. This was concentrated, and the obtained product was directly used in the next reaction.

【0054】上記反応で得られた粗生成物のDMF(4
ml)溶液にn−Bu4NCl(582mg,2.10
m mol)を加え、40℃で5時間撹拌した。飽和食
塩水(10ml)を加えた後、ヘキサン(2×10m
l)で抽出した。得られた有機層をMgSO4を用いて
乾燥した後、濾過した。濾液を減圧下で濃縮して得られ
た粗生成物を短いシリカゲルカラムクロマトグラフィー
に通した。これを濃縮して得られた生成物をそのまま次
の反応に用いた。
The crude product DMF (4
ml) solution with n-Bu 4 NCl (582 mg, 2.10).
(m mol) and the mixture was stirred at 40 ° C. for 5 hours. After adding saturated saline (10 ml), hexane (2 x 10 m
Extracted in l). The obtained organic layer was dried using MgSO 4 and then filtered. The crude product obtained by concentrating the filtrate under reduced pressure was passed through a short silica gel column chromatography. The product obtained by concentrating this was directly used in the next reaction.

【0055】上記反応で得られた粗生成物のアセトニト
リル(14.1ml)溶液に0℃でピリジン(0.83
ml)及び(HF) n・ピリジン(0.7ml)を加
え、室温に昇温しながら4時間撹拌した。反応液を酢酸
エチル(15ml)/飽和NaHCO3水溶液(15m
l)中に撹拌しながら注いだ後、有機層を分離し、水層
を酢酸エチル(10ml)で抽出した。得られた有機層
をMgSO4を用いて乾燥した後、濾過した。濾液を減
圧下で濃縮して得られた粗生成物をシリカゲルカラムク
ロマトグラフィー(トルエン/イソプロピルアルコール
を溶媒に使用)で精製したところ、上記式(7)の化合
物75.4mgが3段階の収率40.6%で得られた。
NMR及びIR測定結果は以下の通りであった。なおこ
の際、下記式(8)の化合物39.1mg(収率22.
9%)が副生した。
Acetonite of the crude product obtained in the above reaction
Pyridine (0.83 ml) was added to the ril (14.1 ml) solution at 0 ° C.
ml) and (HF) n・ Add pyridine (0.7ml)
Then, the mixture was stirred for 4 hours while warming to room temperature. Acetic acid as the reaction solution
Ethyl (15 ml) / saturated NaHCO3Aqueous solution (15m
l) with stirring, then the organic layer was separated and the aqueous layer was separated.
Was extracted with ethyl acetate (10 ml). Obtained organic layer
To MgSOFourAfter drying with a filter, it was filtered. Reduce filtrate
The crude product obtained by concentrating under pressure is purified by silica gel column chromatography.
Romanography (toluene / isopropyl alcohol
Was used as a solvent) to obtain a compound of the formula (7) above.
75.4 mg of the product was obtained in a three-step yield of 40.6%.
The NMR and IR measurement results were as follows. Naoko
In this case, 39.1 mg of the compound of the following formula (8) (yield 22.
9%) was a byproduct.

【0056】[0056]

【化21】 [Chemical 21]

【0057】[0057]

【化22】 1H NMR (CDCl3,300 MHz)δ:0.
82−1.46,(m,6H),1.48(s,9
H),1.59−1.90(m,5H),1.95−
2.42(m,6H),3.74(t,J=7.1 H
z,1H),3.96(s,2H),3.92−4.1
0(m,2H),4.11(d,J=5.7Hz,2
H),5.43(dd,J=7.8,15.2 Hz,
1H),5.52(dd,J=15.2, 7.4 H
z,1H),5.55−5.75(m,2H).13 C NMR(CDCl3,75 MHz)δ:16
9.6,134.5,133.2,130.1,12
7.6,81.7,77.5,75.0,67.8,6
6.5,59.5,56.1,53.2,43.4,4
3.2,28.8,28.7,28.1,26.4,2
6.0,25.9. IR(neat):3400,2990,2940,2
860,1740,1450,1400,1375,1
310,1240,1160,1130,1000,9
75,895,845,760cm-1
[Chemical formula 22] 1 H NMR (CDCl 3 , 300 MHz) δ: 0.
82-1.46, (m, 6H), 1.48 (s, 9
H), 1.59-1.90 (m, 5H), 1.95-
2.42 (m, 6H), 3.74 (t, J = 7.1H
z, 1H), 3.96 (s, 2H), 3.92-4.1.
0 (m, 2H), 4.11 (d, J = 5.7Hz, 2
H), 5.43 (dd, J = 7.8, 15.2 Hz,
1H), 5.52 (dd, J = 15.2, 7.4H
z, 1H), 5.55-5.75 (m, 2H). 13 C NMR (CDCl 3 , 75 MHz) δ: 16
9.6, 134.5, 133.2, 130.1, 12
7.6, 81.7, 77.5, 75.0, 67.8, 6
6.5, 59.5, 56.1, 53.2, 43.4, 4
3.2, 28.8, 28.7, 28.1, 266.4, 2
6.0, 25.9. IR (neat): 3400, 2990, 2940, 2
860, 1740, 1450, 1400, 1375, 1
310, 1240, 1160, 1130, 1000, 9
75,895,845,760 cm -1 .

【0058】[0058]

【化23】 [Chemical formula 23]

【0059】上記式(7)の化合物(75.4mg,
0.171m mol)のメタノール(5.7ml)/
水(0.57ml)溶液にLiOH・H2O(水酸化リ
チウム−水和物)(35.9mg)を加え、室温で4時
間撹拌した。酢酸エチル(5ml)を加えた後、0.1
N塩酸を少しずつ加えてpH6.5にした。これに(N
42SO4(2g)を加えた後、酢酸エチル(2×7
ml)で抽出した。得られた有機層をMgSO4を用い
て乾燥した後、濾過した。濾液を減圧下で濃縮し、得ら
れた粗生成物をシリカゲルカラムクロマトグラフィー
(酢酸エチル/メタノールを溶媒に使用)により精製し
たところ、上記式(9)の化合物58.6mgが収率8
9%で得られた。NMRの測定結果は以下の通りであっ
た。
The compound of the above formula (7) (75.4 mg,
0.171 mmol of methanol (5.7 ml) /
LiOH.H 2 O (lithium hydroxide-hydrate) (35.9 mg) was added to the water (0.57 ml) solution, and the mixture was stirred at room temperature for 4 hours. After adding ethyl acetate (5 ml), add 0.1
N hydrochloric acid was added little by little to bring the pH to 6.5. To this (N
H 4 ) 2 SO 4 (2 g) was added, followed by ethyl acetate (2 x 7
ml). The obtained organic layer was dried using MgSO 4 and then filtered. The filtrate was concentrated under reduced pressure, and the obtained crude product was purified by silica gel column chromatography (using ethyl acetate / methanol as a solvent) to obtain 58.6 mg of the compound of the above formula (9) in a yield of 8
Obtained in 9%. The NMR measurement results were as follows.

【0060】[0060]

【化24】 1H NMR (CDCl3,300 MHz)δ:0.
85−1.45,(m,6H),1.57−1.92
(m,5H),1.95−2.43(m,6H),3.
77−3.85(m,1H),4.09(s,2H),
4.01−4.35(m,7H),5.48(dd,J
=8.5,15.5 Hz,1H),5.56(dd,
J=15.5,6.0 Hz,1H),5.58−5.
75(m,2H).
[Chemical formula 24] 1 H NMR (CDCl 3 , 300 MHz) δ: 0.
85-1.45, (m, 6H), 1.57-1.92
(M, 5H), 1.95-2.43 (m, 6H), 3.
77-3.85 (m, 1H), 4.09 (s, 2H),
4.01-4.35 (m, 7H), 5.48 (dd, J
= 8.5, 15.5 Hz, 1H), 5.56 (dd,
J = 15.5, 6.0 Hz, 1H), 5.58-5.
75 (m, 2H).

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭48−67257(JP,A) 特表 平2−502009(JP,A) J.Am.Chem.Soc.,1975 年,97(21),6260−6261 J.Am.Chem.Soc.,1975 年,97(16),4745−4746 (58)調査した分野(Int.Cl.7,DB名) C07C 405/00 CA(STN) REGISTRY(STN)─────────────────────────────────────────────────── ─── Continuation of the front page (56) References Japanese Patent Laid-Open No. 48-67257 (JP, A) Tokuhyo 2-502009 (JP, A) J. Am. Chem. Soc. , 1975, 97 (21), 6260-6261 J. Am. Chem. Soc. , 1975, 97 (16), 4745-4746 (58) Fields investigated (Int.Cl. 7 , DB name) C07C 405/00 CA (STN) REGISTRY (STN)

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下記一般式(I)又は(II)で示され
るシクロペンタン誘導体。 【化1】 (但し、式中R1はメチル基、エチル基、n−プロピル
基、i−プロピル基、n−ブチル基、i−ブチル、t−
ブチル基、アミル基、ヘキシル基、ヘプチル基、オクチ
ル基、ノニル基、デシル基、2−メチルヘキシル基、2
−ヘキシル基、シクロペンチル基、シクロヘキシル基、
シクロヘキシルメチル基、ヘキサ−4−イン−2−イル
基、ヘプタ−4−イン−2−イル基、2,6−ジメチル
−ヘプタ−5−エン−1−イル基、ペンタ−1−エン−
1−イル基、ペンタ−2−エン−1−イル基、ヘキサ−
1−エン−2−イル基、3−エトキシ−2−メチル−プ
ロパン−2−イル基、エトキシエチル基、5−メトキシ
ヘキシル基、2−(トリメチルシリルオキシ)−2−ヘ
キシル基、ハロゲン化メチル基、ハロゲン化n−ブチル
基、ハロゲン化n−ペンチル基、ハロゲン化ノニル基、
フェニル基、ベンジル基、ハロゲン化フェニル基、n−
ペンチルオキシメチル基、1−エトキシ−2−メチル−
プロパン−2−イル基、フェノキシメチル基、ベンジロ
キシメチル基、p−クロルフェノキシメチル基、2−フ
ェニルエチル基、ベンジロキシエチル基、p−フルオロ
フェノキシメチル基、フェニルアセチレニル基、m−ク
ロルフェノキシメチル基、m−トリフルオロメチル−フ
ェノキシメチル基、1−ブチル−シクロプロピル基、3
−エチル−シクロペンチル基、ベンゾチオフェノン−5
−イル基、2−オクテニル基、3−メトキシカルボニル
プロピル基又はビニル基、R2,R3はそれぞれ水酸基の
保護基、R4は水素原子又は水酸基の保護基である。)
1. A cyclopentane derivative represented by the following general formula (I) or (II). [Chemical 1] (However, in the formula, R 1 is a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl, a t-
Butyl group, amyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, 2-methylhexyl group, 2
-Hexyl group, cyclopentyl group, cyclohexyl group,
Cyclohexylmethyl group, hexa-4-in-2-yl group, hepta-4-in-2-yl group, 2,6-dimethyl-hepta-5-en-1-yl group, penta-1-ene-
1-yl group, penta-2-en-1-yl group, hexa-
1-en-2-yl group, 3-ethoxy-2-methyl-propan-2-yl group, ethoxyethyl group, 5-methoxyhexyl group, 2- (trimethylsilyloxy) -2-hexyl group, halogenated methyl group A halogenated n-butyl group, a halogenated n-pentyl group, a halogenated nonyl group,
Phenyl group, benzyl group, halogenated phenyl group, n-
Pentyloxymethyl group, 1-ethoxy-2-methyl-
Propan-2-yl group, phenoxymethyl group, benzyloxymethyl group, p-chlorophenoxymethyl group, 2-phenylethyl group, benzyloxyethyl group, p-fluorophenoxymethyl group, phenylacetylenyl group, m-chloro group Phenoxymethyl group, m-trifluoromethyl-phenoxymethyl group, 1-butyl-cyclopropyl group, 3
-Ethyl-cyclopentyl group, benzothiophenone-5
-Yl group, 2-octenyl group, 3-methoxycarbonylpropyl group or vinyl group, R 2 and R 3 are each a hydroxyl group-protecting group, and R 4 is a hydrogen atom or a hydroxyl group-protecting group. )
【請求項2】 下記一般式(III)で示されるシクロ
ペンテノン誘導体と下記一般式(V)で示される求核試
剤とを反応させ、必要に応じてR4の保護基を脱保護基
化する下記一般式(I)で示されるシクロペンタン誘導
体の製造方法。 【化2】 (但し、式中R1はメチル基、エチル基、n−プロピル
基、i−プロピル基、n−ブチル基、i−ブチル、t−
ブチル基、アミル基、ヘキシル基、ヘプチル基、オクチ
ル基、ノニル基、デシル基、2−メチルヘキシル基、2
−ヘキシル基、シクロペンチル基、シクロヘキシル基、
シクロヘキシルメチル基、ヘキサ−4−イン−2−イル
基、ヘプタ−4−イン−2−イル基、2,6−ジメチル
−ヘプタ−5−エン−1−イル基、ペンタ−1−エン−
1−イル基、ペンタ−2−エン−1−イル基、ヘキサ−
1−エン−2−イル基、3−エトキシ−2−メチル−プ
ロパン−2−イル基、エトキシエチル基、5−メトキシ
ヘキシル基、2−(トリメチルシリルオキシ)−2−ヘ
キシル基、ハロゲン化メチル基、ハロゲン化n−ブチル
基、ハロゲン化n−ペンチル基、ハロゲン化ノニル基、
フェニル基、ベンジル基、ハロゲン化フェニル基、n−
ペンチルオキシメチル基、1−エトキシ−2−メチル−
プロパン−2−イル基、フェノキシメチル基、ベンジロ
キシメチル基、p−クロルフェノキシメチル基、2−フ
ェニルエチル基、ベンジロキシエチル基、p−フルオロ
フェノキシメチル基、フェニルアセチレニル基、m−ク
ロルフェノキシメチル基、m−トリフルオロメチル−フ
ェノキシメチル基、1−ブチル−シクロプロピル基、3
−エチル−シクロペンチル基、ベンゾチオフェノン−5
−イル基、2−オクテニル基、3−メトキシカルボニル
プロピル基又はビニル基、R2,R3はそれぞれ水酸基の
保護基である。) (但し、式中R4は水素原子又は水酸基の保護基であ
る。) (但し、式中R1〜R4は前記と同様の意味を示す。)
2. A cyclopentenone derivative represented by the following general formula (III) is reacted with a nucleophilic reagent represented by the following general formula (V), and the protecting group of R 4 is deprotected as necessary. A method for producing a cyclopentane derivative represented by the following general formula (I): [Chemical 2] (However, in the formula, R 1 is a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl, a t-
Butyl group, amyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, 2-methylhexyl group, 2
-Hexyl group, cyclopentyl group, cyclohexyl group,
Cyclohexylmethyl group, hexa-4-in-2-yl group, hepta-4-in-2-yl group, 2,6-dimethyl-hepta-5-en-1-yl group, penta-1-ene-
1-yl group, penta-2-en-1-yl group, hexa-
1-en-2-yl group, 3-ethoxy-2-methyl-propan-2-yl group, ethoxyethyl group, 5-methoxyhexyl group, 2- (trimethylsilyloxy) -2-hexyl group, halogenated methyl group A halogenated n-butyl group, a halogenated n-pentyl group, a halogenated nonyl group,
Phenyl group, benzyl group, halogenated phenyl group, n-
Pentyloxymethyl group, 1-ethoxy-2-methyl-
Propan-2-yl group, phenoxymethyl group, benzyloxymethyl group, p-chlorophenoxymethyl group, 2-phenylethyl group, benzyloxyethyl group, p-fluorophenoxymethyl group, phenylacetylenyl group, m-chloro group Phenoxymethyl group, m-trifluoromethyl-phenoxymethyl group, 1-butyl-cyclopropyl group, 3
-Ethyl-cyclopentyl group, benzothiophenone-5
-Yl group, 2-octenyl group, 3-methoxycarbonylpropyl group or vinyl group, and R 2 and R 3 are each a hydroxyl group-protecting group. ) (However, in the formula, R 4 is a hydrogen atom or a hydroxyl-protecting group.) (However, in the formula, R 1 to R 4 have the same meanings as described above.)
【請求項3】 下記一般式(III)で示されるシクロ
ペンテノン誘導体と下記一般式(V)で示される求核試
剤とを反応させて得られた下記一般式(I)で示される
シクロペンタン誘導体に還元剤を作用させ、必要に応じ
てR4の保護基を脱保護基化する下記一般式(II)で
示されるシクロペンタン誘導体の製造方法。 【化3】 (但し、式中R1はメチル基、エチル基、n−プロピル
基、i−プロピル基、n−ブチル基、i−ブチル、t−
ブチル基、アミル基、ヘキシル基、ヘプチル基、オクチ
ル基、ノニル基、デシル基、2−メチルヘキシル基、2
−ヘキシル基、シクロペンチル基、シクロヘキシル基、
シクロヘキシルメチル基、ヘキサ−4−イン−2−イル
基、ヘプタ−4−イン−2−イル基、2,6−ジメチル
−ヘプタ−5−エン−1−イル基、ペンタ−1−エン−
1−イル基、ペンタ−2−エン−1−イル基、ヘキサ−
1−エン−2−イル基、3−エトキシ−2−メチル−プ
ロパン−2−イル基、エトキシエチル基、5−メトキシ
ヘキシル基、2−(トリメチルシリルオキシ)−2−ヘ
キシル基、ハロゲン化メチル基、ハロゲン化n−ブチル
基、ハロゲン化n−ペンチル基、ハロゲン化ノニル基、
フェニル基、ベンジル基、ハロゲン化フェニル基、n−
ペンチルオキシメチル基、1−エトキシ−2−メチル−
プロパン−2−イル基、フェノキシメチル基、ベンジロ
キシメチル基、p−クロルフェノキシメチル基、2−フ
ェニルエチル基、ベンジロキシエチル基、p−フルオロ
フェノキシメチル基、フェニルアセチレニル基、m−ク
ロルフェノキシメチル基、m−トリフルオロメチル−フ
ェノキシメチル基、1−ブチル−シクロプロピル基、3
−エチル−シクロペンチル基、ベンゾチオフェノン−5
−イル基、2−オクテニル基、3−メトキシカルボニル
プロピル基又はビニル基、R2,R3はそれぞれ水酸基の
保護基である。) (但し、式中R4は水素原子又は水酸基の保護基であ
る。) (但し、式中R1〜R4は前記と同様の意味を示す。) (但し、式中R1〜R4は前記と同様の意味を示す。)
3. A cyclopentane represented by the following general formula (I) obtained by reacting a cyclopentenone derivative represented by the following general formula (III) with a nucleophilic reagent represented by the following general formula (V). A method for producing a cyclopentane derivative represented by the following general formula (II), wherein a reducing agent is allowed to act on the derivative, and the protective group for R 4 is deprotected as necessary. [Chemical 3] (However, in the formula, R 1 is a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl, a t-
Butyl group, amyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, 2-methylhexyl group, 2
-Hexyl group, cyclopentyl group, cyclohexyl group,
Cyclohexylmethyl group, hexa-4-in-2-yl group, hepta-4-in-2-yl group, 2,6-dimethyl-hepta-5-en-1-yl group, penta-1-ene-
1-yl group, penta-2-en-1-yl group, hexa-
1-en-2-yl group, 3-ethoxy-2-methyl-propan-2-yl group, ethoxyethyl group, 5-methoxyhexyl group, 2- (trimethylsilyloxy) -2-hexyl group, halogenated methyl group A halogenated n-butyl group, a halogenated n-pentyl group, a halogenated nonyl group,
Phenyl group, benzyl group, halogenated phenyl group, n-
Pentyloxymethyl group, 1-ethoxy-2-methyl-
Propan-2-yl group, phenoxymethyl group, benzyloxymethyl group, p-chlorophenoxymethyl group, 2-phenylethyl group, benzyloxyethyl group, p-fluorophenoxymethyl group, phenylacetylenyl group, m-chloro group Phenoxymethyl group, m-trifluoromethyl-phenoxymethyl group, 1-butyl-cyclopropyl group, 3
-Ethyl-cyclopentyl group, benzothiophenone-5
-Yl group, 2-octenyl group, 3-methoxycarbonylpropyl group or vinyl group, and R 2 and R 3 are each a hydroxyl group-protecting group. ) (However, in the formula, R 4 is a hydrogen atom or a hydroxyl-protecting group.) (However, in the formula, R 1 to R 4 have the same meanings as described above.) (However, in the formula, R 1 to R 4 have the same meanings as described above.)
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J.Am.Chem.Soc.,1975年,97(16),4745−4746
J.Am.Chem.Soc.,1975年,97(21),6260−6261

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