JP2003140351A5 - - Google Patents
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- Publication number
- JP2003140351A5 JP2003140351A5 JP2001341933A JP2001341933A JP2003140351A5 JP 2003140351 A5 JP2003140351 A5 JP 2003140351A5 JP 2001341933 A JP2001341933 A JP 2001341933A JP 2001341933 A JP2001341933 A JP 2001341933A JP 2003140351 A5 JP2003140351 A5 JP 2003140351A5
- Authority
- JP
- Japan
- Prior art keywords
- compound
- group
- general formula
- substituent
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001341933A JP3963708B2 (ja) | 2001-11-07 | 2001-11-07 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001341933A JP3963708B2 (ja) | 2001-11-07 | 2001-11-07 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003140351A JP2003140351A (ja) | 2003-05-14 |
| JP2003140351A5 true JP2003140351A5 (enExample) | 2005-04-07 |
| JP3963708B2 JP3963708B2 (ja) | 2007-08-22 |
Family
ID=19155878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001341933A Expired - Fee Related JP3963708B2 (ja) | 2001-11-07 | 2001-11-07 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3963708B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4510695B2 (ja) * | 2005-05-10 | 2010-07-28 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
| US8962779B2 (en) | 2013-07-16 | 2015-02-24 | Dow Global Technologies Llc | Method of forming polyaryl polymers |
| US9410016B2 (en) | 2013-07-16 | 2016-08-09 | Dow Global Technologies Llc | Aromatic polyacetals and articles comprising them |
| WO2016068261A1 (ja) * | 2014-10-31 | 2016-05-06 | 株式会社堀場エステック | 自己組織化用高分子材料、自己組織化膜、自己組織化膜の製造方法及び凹凸パターン |
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2001
- 2001-11-07 JP JP2001341933A patent/JP3963708B2/ja not_active Expired - Fee Related