JP2002372784A5 - - Google Patents
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- Publication number
- JP2002372784A5 JP2002372784A5 JP2002101333A JP2002101333A JP2002372784A5 JP 2002372784 A5 JP2002372784 A5 JP 2002372784A5 JP 2002101333 A JP2002101333 A JP 2002101333A JP 2002101333 A JP2002101333 A JP 2002101333A JP 2002372784 A5 JP2002372784 A5 JP 2002372784A5
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- hydrocarbon group
- formula
- positive resist
- composition according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002253 acid Substances 0.000 claims 2
- 125000002723 alicyclic group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 150000007514 bases Chemical class 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002101333A JP4090773B2 (ja) | 2001-04-05 | 2002-04-03 | ポジ型レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001107304 | 2001-04-05 | ||
| JP2001-107304 | 2001-04-05 | ||
| JP2002101333A JP4090773B2 (ja) | 2001-04-05 | 2002-04-03 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002372784A JP2002372784A (ja) | 2002-12-26 |
| JP2002372784A5 true JP2002372784A5 (enExample) | 2005-09-15 |
| JP4090773B2 JP4090773B2 (ja) | 2008-05-28 |
Family
ID=26613143
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002101333A Expired - Fee Related JP4090773B2 (ja) | 2001-04-05 | 2002-04-03 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4090773B2 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002338627A (ja) * | 2001-05-22 | 2002-11-27 | Daicel Chem Ind Ltd | フォトレジスト用高分子化合物及び感光性樹脂組成物 |
| TWI314943B (en) * | 2002-08-29 | 2009-09-21 | Radiation-sensitive resin composition | |
| US7452655B2 (en) | 2002-11-05 | 2008-11-18 | Jsr Corporation | Acrylic copolymer and radiation-sensitive resin composition |
| JP5162290B2 (ja) | 2007-03-23 | 2013-03-13 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
| JP5997873B2 (ja) * | 2008-06-30 | 2016-09-28 | 富士フイルム株式会社 | 感光性組成物及びそれを用いたパターン形成方法 |
| JP5900340B2 (ja) | 2010-09-17 | 2016-04-06 | Jsr株式会社 | 感放射線性樹脂組成物及びレジストパターン形成方法 |
| JP5723648B2 (ja) * | 2011-03-25 | 2015-05-27 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法 |
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2002
- 2002-04-03 JP JP2002101333A patent/JP4090773B2/ja not_active Expired - Fee Related