JP4090773B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4090773B2
JP4090773B2 JP2002101333A JP2002101333A JP4090773B2 JP 4090773 B2 JP4090773 B2 JP 4090773B2 JP 2002101333 A JP2002101333 A JP 2002101333A JP 2002101333 A JP2002101333 A JP 2002101333A JP 4090773 B2 JP4090773 B2 JP 4090773B2
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Japan
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group
embedded image
carbon atoms
alkyl group
examples
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Expired - Fee Related
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JP2002101333A
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English (en)
Japanese (ja)
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JP2002372784A5 (enExample
JP2002372784A (ja
Inventor
健一郎 佐藤
一也 上西
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP2002101333A priority Critical patent/JP4090773B2/ja
Publication of JP2002372784A publication Critical patent/JP2002372784A/ja
Publication of JP2002372784A5 publication Critical patent/JP2002372784A5/ja
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Publication of JP4090773B2 publication Critical patent/JP4090773B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002101333A 2001-04-05 2002-04-03 ポジ型レジスト組成物 Expired - Fee Related JP4090773B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002101333A JP4090773B2 (ja) 2001-04-05 2002-04-03 ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-107304 2001-04-05
JP2001107304 2001-04-05
JP2002101333A JP4090773B2 (ja) 2001-04-05 2002-04-03 ポジ型レジスト組成物

Publications (3)

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JP2002372784A JP2002372784A (ja) 2002-12-26
JP2002372784A5 JP2002372784A5 (enExample) 2005-09-15
JP4090773B2 true JP4090773B2 (ja) 2008-05-28

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ID=26613143

Family Applications (1)

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JP2002101333A Expired - Fee Related JP4090773B2 (ja) 2001-04-05 2002-04-03 ポジ型レジスト組成物

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JP (1) JP4090773B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2141544A1 (en) 2008-06-30 2010-01-06 Fujifilm Corporation Photosensitive composition and pattern forming method using same

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002338627A (ja) * 2001-05-22 2002-11-27 Daicel Chem Ind Ltd フォトレジスト用高分子化合物及び感光性樹脂組成物
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
ATE481430T1 (de) 2002-11-05 2010-10-15 Jsr Corp Acrylcopolymer und strahlungsempfindliche harzzusammensetzung
JP5162290B2 (ja) 2007-03-23 2013-03-13 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
KR20130114095A (ko) 2010-09-17 2013-10-16 제이에스알 가부시끼가이샤 감방사선성 수지 조성물, 중합체 및 레지스트 패턴 형성 방법
JP5723648B2 (ja) * 2011-03-25 2015-05-27 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2141544A1 (en) 2008-06-30 2010-01-06 Fujifilm Corporation Photosensitive composition and pattern forming method using same
JP2010033031A (ja) * 2008-06-30 2010-02-12 Fujifilm Corp 感光性組成物及びそれを用いたパターン形成方法

Also Published As

Publication number Publication date
JP2002372784A (ja) 2002-12-26

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