JP2003140348A5 - - Google Patents
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- Publication number
- JP2003140348A5 JP2003140348A5 JP2001339364A JP2001339364A JP2003140348A5 JP 2003140348 A5 JP2003140348 A5 JP 2003140348A5 JP 2001339364 A JP2001339364 A JP 2001339364A JP 2001339364 A JP2001339364 A JP 2001339364A JP 2003140348 A5 JP2003140348 A5 JP 2003140348A5
- Authority
- JP
- Japan
- Prior art keywords
- compound
- general formula
- group
- substituent
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 150000001875 compounds Chemical class 0.000 claims 7
- 239000002253 acid Substances 0.000 claims 4
- 125000001424 substituent group Chemical group 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical group S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000003513 alkali Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- -1 vinyl ether compound Chemical class 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001339364A JP3907165B2 (ja) | 2001-11-05 | 2001-11-05 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001339364A JP3907165B2 (ja) | 2001-11-05 | 2001-11-05 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003140348A JP2003140348A (ja) | 2003-05-14 |
| JP2003140348A5 true JP2003140348A5 (enrdf_load_stackoverflow) | 2005-04-07 |
| JP3907165B2 JP3907165B2 (ja) | 2007-04-18 |
Family
ID=19153720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001339364A Expired - Fee Related JP3907165B2 (ja) | 2001-11-05 | 2001-11-05 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3907165B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011104127A1 (en) | 2010-02-24 | 2011-09-01 | Basf Se | Latent acids and their use |
| JP6035887B2 (ja) * | 2011-06-21 | 2016-11-30 | セントラル硝子株式会社 | ポジ型レジスト組成物 |
| US8900797B2 (en) * | 2012-09-26 | 2014-12-02 | Az Electronic Materials (Luxembourg) S.A.R.L. | Developable bottom anti-reflective coating |
| US20180282466A1 (en) * | 2014-10-31 | 2018-10-04 | Horiba Stec, Co., Ltd. | Polymer material for self-assembly, self-assembled film, method of producing self-assembled film, and projection and depression pattern |
| CN107207456B (zh) | 2015-02-02 | 2021-05-04 | 巴斯夫欧洲公司 | 潜酸及其用途 |
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2001
- 2001-11-05 JP JP2001339364A patent/JP3907165B2/ja not_active Expired - Fee Related