JP2003140351A5 - - Google Patents
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- JP2003140351A5 JP2003140351A5 JP2001341933A JP2001341933A JP2003140351A5 JP 2003140351 A5 JP2003140351 A5 JP 2003140351A5 JP 2001341933 A JP2001341933 A JP 2001341933A JP 2001341933 A JP2001341933 A JP 2001341933A JP 2003140351 A5 JP2003140351 A5 JP 2003140351A5
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- compound
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- general formula
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001341933A JP3963708B2 (ja) | 2001-11-07 | 2001-11-07 | ポジ型レジスト組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001341933A JP3963708B2 (ja) | 2001-11-07 | 2001-11-07 | ポジ型レジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003140351A JP2003140351A (ja) | 2003-05-14 |
JP2003140351A5 true JP2003140351A5 (enrdf_load_stackoverflow) | 2005-04-07 |
JP3963708B2 JP3963708B2 (ja) | 2007-08-22 |
Family
ID=19155878
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001341933A Expired - Fee Related JP3963708B2 (ja) | 2001-11-07 | 2001-11-07 | ポジ型レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3963708B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4510695B2 (ja) * | 2005-05-10 | 2010-07-28 | 東京応化工業株式会社 | ポジ型レジスト組成物およびレジストパターン形成方法 |
US8962779B2 (en) * | 2013-07-16 | 2015-02-24 | Dow Global Technologies Llc | Method of forming polyaryl polymers |
US9410016B2 (en) * | 2013-07-16 | 2016-08-09 | Dow Global Technologies Llc | Aromatic polyacetals and articles comprising them |
US20180282466A1 (en) * | 2014-10-31 | 2018-10-04 | Horiba Stec, Co., Ltd. | Polymer material for self-assembly, self-assembled film, method of producing self-assembled film, and projection and depression pattern |
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2001
- 2001-11-07 JP JP2001341933A patent/JP3963708B2/ja not_active Expired - Fee Related