JP2003136268A - Method for drilling printed board - Google Patents

Method for drilling printed board

Info

Publication number
JP2003136268A
JP2003136268A JP2001340196A JP2001340196A JP2003136268A JP 2003136268 A JP2003136268 A JP 2003136268A JP 2001340196 A JP2001340196 A JP 2001340196A JP 2001340196 A JP2001340196 A JP 2001340196A JP 2003136268 A JP2003136268 A JP 2003136268A
Authority
JP
Japan
Prior art keywords
layer
hole
laser
outer conductor
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001340196A
Other languages
Japanese (ja)
Inventor
Kunio Arai
邦夫 荒井
Yasuhiko Kita
泰彦 北
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Via Mechanics Ltd
Original Assignee
Hitachi Via Mechanics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Via Mechanics Ltd filed Critical Hitachi Via Mechanics Ltd
Priority to JP2001340196A priority Critical patent/JP2003136268A/en
Publication of JP2003136268A publication Critical patent/JP2003136268A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To control the shape of a hole drilled in a resin film layer, a surface- roughened external conductor copper layer, and an insulating resin layer in this order from above, which are different from each other in materials. SOLUTION: By making a laser beam pulse to-hat shaped and controlling a pulse width, these can be controlled diameters of the lower part of the hole of the resin film layer, of the hole of the external conductor layer, and of the upper part of the hole of the insulating resin layer.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はプリント基板のレー
ザ加工による穴あけ方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of drilling a printed circuit board by laser processing.

【0002】[0002]

【従来の技術】携帯電話等で半導体ICの高密度実装に
用いられるプリント配線基板(以下プリント基板とい
う)は、一般にガラス繊維入り絶縁樹脂層と銅の導体層
の多層構造になっている。その実装配線密度は年々急激
に増大し、現在プリント基板への穴あけ技術として、特
にビルドアップ層のブラインドホール(底付き穴)の径
に対する要求がきびしく、100μmφ以下とされている。
2. Description of the Related Art A printed wiring board (hereinafter referred to as a printed board) used for high-density mounting of semiconductor ICs in a mobile phone or the like generally has a multi-layer structure of an insulating resin layer containing glass fiber and a conductor layer of copper. The mounting wiring density has rapidly increased year by year, and as a technique for drilling holes in printed circuit boards, the diameter of blind holes (holes with a bottom) in the build-up layer is particularly demanding, and it is set to 100 μmφ or less.

【0003】このような微小径の穴をあける方法とし
て、炭酸ガスレーザを用いたレーザ加工方法が採用され
てきているが、炭酸ガスレーザの波長(9.3〜10.6μm)
に対する外層導体層に用いる銅の反射率が高いため、予
め他の方法(ドリル、化学エッチング等)で部分的に除
去し、レーザが絶縁樹脂層を直接照射するための窓をあ
けておかなければならなかった。
A laser processing method using a carbon dioxide gas laser has been adopted as a method for making a hole having such a minute diameter. The wavelength of the carbon dioxide gas laser (9.3 to 10.6 μm)
Since the copper used for the outer conductor layer has a high reflectance, it must be partially removed by another method (drill, chemical etching, etc.) in advance and a window for directly irradiating the insulating resin layer with the laser must be opened. did not become.

【0004】炭酸ガスレーザで外層導体銅層に穴あけす
る手段として、特開平9-107168号公報や特開2000-15338
4号公報に開示されているように銅層の表面を粗化処理
することにより、銅層表面の吸収率を高めて穴あけ加工
する方法が提案されているが、銅層、ガラス繊維や樹脂
のデブリが穴の周囲に飛び散って付着するという問題が
あった。また、この場合の銅層にあく穴径が下の絶縁樹
脂層の穴径より小さくなり、銅層の一部がオーバーハン
グした形状になるという問題もあった。
As means for making holes in the outer conductor copper layer with a carbon dioxide laser, Japanese Patent Laid-Open Nos. 9-107168 and 2000-15338 are available.
By roughening the surface of the copper layer as disclosed in Japanese Patent Publication No. 4, a method of making a hole to increase the absorptivity of the copper layer surface is proposed, but the copper layer, glass fiber or resin There was a problem that debris was scattered around the hole and adhered. In addition, in this case, the hole diameter of the copper layer is smaller than the hole diameter of the insulating resin layer below, which causes a problem that a part of the copper layer is overhanged.

【0005】このデブリの付着の防止と外層導体銅層の
オーバーハングを除去するため、特開2001-244604号公
報に開示されているように粗化処理した銅層の表面に感
光性レジスト膜を形成してレーザ穴あけ加工を行ってデ
ブリの付着から銅層表面を保護し、そのレジスト膜を付
けたまま化学エッチングを行って、銅層のオーバーハン
グ部分を除去するという方法が提案されている。
In order to prevent the adhesion of debris and remove the overhang of the outer conductor copper layer, a photosensitive resist film is formed on the surface of the roughened copper layer as disclosed in JP 2001-244604 A. A method has been proposed in which the copper layer surface is formed and laser drilling is performed to protect the surface of the copper layer from adhesion of debris, and chemical etching is performed with the resist film still attached to remove the overhanging portion of the copper layer.

【0006】[0006]

【発明が解決しようとする課題】材質の異なる複数の層
をレーザで加工する場合、レーザの照射条件が穴の形状
に大きく影響することが知られているが、本発明に係る
ような外層導体層の上に付加した樹脂フィルム層、表面
粗化された外層導体銅層、絶縁樹脂層に加工する穴の形
状をコントロールすることが困難であった。
It is known that when a plurality of layers made of different materials are processed by a laser, the irradiation condition of the laser has a great influence on the shape of the hole. It has been difficult to control the shape of the holes formed in the resin film layer added on the layer, the surface-roughened outer conductor copper layer, and the insulating resin layer.

【0007】また、従来レーザ加工に用いられているビ
ーム内のエネルギ分布がガウス分布形の炭酸ガスレーザ
パルスを用いた場合、樹脂フィルム層の穴下部径が絶縁
樹脂層の穴上部径の170%以上にもなり、その樹脂フィ
ルム層を付けたまま化学エッチングを行って外層導体銅
層のオーバーハング部分を除去すると、外層導体銅層の
除去部分も大きくなってしまうため、後の銅メッキを施
して外層導体銅層に配線パターンを形成する際に、配線
パターンを大きくせざるを得ないという問題があった。
さらに、外層導体層を除去して露出された絶縁樹脂層の
表面に銅メッキした場合、剥がれ易いという問題にもな
っていた。
Further, when a carbon dioxide laser pulse having a Gaussian distribution type energy distribution in the beam used in conventional laser processing is used, the diameter of the lower hole of the resin film layer is 170% or more of the upper diameter of the hole of the insulating resin layer. Also, if you perform chemical etching with the resin film layer attached to remove the overhang portion of the outer conductor copper layer, the removed portion of the outer conductor copper layer will also become large, so apply the subsequent copper plating. When forming a wiring pattern on the outer conductor copper layer, there was a problem that the wiring pattern had to be enlarged.
Further, when the outer conductor layer is removed and the exposed surface of the insulating resin layer is plated with copper, there is a problem that it is easily peeled off.

【0008】また、内層導体上の穴底の隅部分に厚く絶
縁樹脂層が残ってしまうため、それを除去しようとレー
ザパルスの幅を広げて長時間照射すると、絶縁樹脂層が
オーバーエッチングされてバレル(樽)状に絶縁樹脂層
の穴が広がってしまうという問題があった。さらに、レ
ーザビームのエネルギ分布を通常のガウス分布形を用い
た場合、極端な場合は内層導体層の穴中心部を損傷する
ことさえあった。
Further, since a thick insulating resin layer remains at the corner portion of the hole bottom on the inner layer conductor, if the laser pulse width is widened for a long time to remove it, the insulating resin layer is over-etched. There was a problem that the holes of the insulating resin layer spread in a barrel shape. Furthermore, when the normal Gaussian distribution is used as the energy distribution of the laser beam, the center of the hole of the inner conductor layer may be damaged even in an extreme case.

【0009】一方、外層導体銅層の表面に付加する樹脂
フィルム層を感光性のレジスト剤とした場合、レーザ加
工の前に露光しておかなければ膜質の斑が出来てしま
い、加工特性に影響してしまうという問題があった。
On the other hand, when the resin film layer added to the surface of the outer conductor copper layer is made of a photosensitive resist agent, unevenness in the film quality will occur unless it is exposed before laser processing, which affects processing characteristics. There was a problem of doing.

【0010】さらに、デブリ(特に比重の大きい銅の飛
散物)の飛散性に対する考慮がなされていないため、レ
ーザ光を集光するためのfθレンズの表面を汚してしま
うという問題もあった。
Further, since no consideration has been given to the scattering of debris (particularly copper scattered matter having a large specific gravity), there is a problem that the surface of the fθ lens for condensing the laser light is soiled.

【0011】本発明は、上記従来技術の問題点を解決す
ることを課題とする。
An object of the present invention is to solve the above problems of the prior art.

【0012】[0012]

【課題を解決するための手段】樹脂フィルム層、表面粗
化された外層導体銅層、絶縁樹脂層に加工する穴の形状
をコントロールすることが困難なことを解決するために
は、外層導体層と絶縁樹脂層および内層導体層からなる
プリント基板に、外層導体層の表面にレーザ光吸収率を
高めるために表面に粗化処理を施し、外層導体層表面に
レーザ加工性の良い樹脂フィルム層(以下、単に樹脂フ
ィルム層という)を付加し、炭酸ガスレーザによりブラ
インドホール加工する方法において、レーザ光パルスを
トップハット形にし、パルス幅を制御することにより樹
脂フィルム層の穴下部径、外層導体層の穴径、および絶
縁樹脂層の穴上部径をコントロールすることを特徴とす
るレーザ穴あけ方法を用いると良いことがわかった。
In order to solve the difficulty of controlling the shapes of holes processed in a resin film layer, a surface-roughened outer conductor copper layer, and an insulating resin layer, an outer conductor layer is formed. A printed circuit board consisting of an insulating resin layer and an inner conductor layer, the outer conductor layer is subjected to a roughening treatment to increase the laser light absorption rate, and the outer conductor layer has a resin film layer with good laser processability ( (Hereinafter, simply referred to as a resin film layer), in the method of blind hole processing with a carbon dioxide gas laser, the laser light pulse is made into a top hat shape, and the diameter of the lower hole of the resin film layer and the outer conductor layer are controlled by controlling the pulse width. It has been found that it is preferable to use a laser drilling method characterized by controlling the hole diameter and the hole upper diameter of the insulating resin layer.

【0013】本発明は、炭酸ガスレーザパルスをビーム
内のエネルギ分布が均一なトップハット形(例えば特願
2001-138204号明細書参照)にし、後述するように、そ
のパルス幅と穴形状との関係を詳細に検討したところ、
穴形状をコントロールできることを見出したことによ
る。
According to the present invention, a carbon dioxide laser pulse has a top-hat type in which the energy distribution in the beam is uniform (for example, Japanese Patent Application No.
2001-138204 specification), and as described later, when the relationship between the pulse width and the hole shape was examined in detail,
This is due to the finding that the hole shape can be controlled.

【0014】さらに、樹脂フィルム層の穴下部径、外層
導体層の穴径、および絶縁樹脂層の穴上部径をコントロ
ールするレーザ光パルスに続けて、パルス幅の狭い複数
のレーザ光パルスを照射することにより、内層導体上の
穴底の隅部分に厚く絶縁樹脂層が残ることない形状に整
形できる。
Further, a plurality of laser light pulses having a narrow pulse width are irradiated following the laser light pulse for controlling the diameter of the lower hole of the resin film layer, the diameter of the outer conductor layer, and the diameter of the upper hole of the insulating resin layer. As a result, a thick insulating resin layer can be formed in the corner portion of the hole bottom on the inner layer conductor.

【0015】ここで、樹脂フィルム層として厚さ10〜60
μmのアクリルフィルム、ポリエチレンフィルム、塩化
ビニルフィルム、又はこれらのフィルムを複数層構造に
した粘着性フィルムを用いることにより解決できる。こ
れにより、樹脂フィルム層を感光性のレジスト剤とした
場合のように、レーザ加工の前に露光しておかなければ
膜質の斑が出来てしまい、加工特性に影響してしまうと
いう問題を解決でき、露光工程を省略できる。
Here, the resin film layer has a thickness of 10 to 60.
This can be solved by using a μm acrylic film, polyethylene film, vinyl chloride film, or an adhesive film having a multilayer structure of these films. As a result, it is possible to solve the problem that when the resin film layer is used as a photosensitive resist agent, the quality of the film becomes uneven unless it is exposed to light before laser processing, which affects processing characteristics. The exposure step can be omitted.

【0016】また、樹脂フィルム層の穴下部径が絶縁樹
脂層の穴上部径の170%以上にも大きくなるという問題
を解決するには、炭酸ガスレーザパルスをビーム内のエ
ネルギ分布が均一なトップハット形にし、パルス幅を制
御することにより樹脂フィルム層の穴下部径、外層導体
層の穴径、および絶縁樹脂層の穴上部径をコントロール
するとよいことがわかった。これは、後述するように、
そのパルス幅と穴形状との関係を詳細に検討したとこ
ろ、樹脂フィルム層の穴下部径を絶縁樹脂層の穴上部径
の140〜160%に抑えることができることを見出したこと
による。
In order to solve the problem that the diameter of the lower hole of the resin film layer becomes 170% or more of the diameter of the upper hole of the insulating resin layer, the carbon dioxide gas laser pulse has a top hat with a uniform energy distribution in the beam. It was found that the diameter of the hole in the resin film layer, the diameter of the hole in the outer conductor layer, and the diameter of the upper hole in the insulating resin layer should be controlled by controlling the pulse width. This is as described below
By examining the relationship between the pulse width and the hole shape in detail, it was found that the lower hole diameter of the resin film layer can be suppressed to 140 to 160% of the upper hole diameter of the insulating resin layer.

【0017】また、外層導体層と絶縁樹脂層および内層
導体層からなるプリント基板に、外層導体層の表面にレ
ーザ光吸収率を高めるために表面に粗化処理を施し、外
層導体層表面にレーザ加工性の良い樹脂フィルム層を付
加し、炭酸ガスレーザによりブラインドホール加工にお
いて、樹脂フィルム層をレーザ加工性の良い樹脂フィル
ム層を吸収率の高い材料と、吸収率がその2分の1程度
に低い材料の複数層構造とすることを特徴とするレーザ
穴あけ方法とすることにより、デブリの飛散が抑制さ
れ、fθレンズの汚れを防止できることがわかった。こ
れは、吸収率の低い層の温度上昇が抑制されて粘度が高
い状態であり、下の外層導体銅層部の溶融蒸発の勢いを
吸収するために飛散が抑制されることによる。
Further, a printed board consisting of an outer conductor layer, an insulating resin layer, and an inner conductor layer is subjected to a roughening treatment on the surface of the outer conductor layer in order to increase the absorption rate of laser light, and the surface of the outer conductor layer is laser-treated. A resin film layer with good workability is added, and in blind hole processing with a carbon dioxide laser, the resin film layer is a resin film layer with good laser workability that is a material with a high absorption rate, and the absorption rate is about half that low. It was found that the laser drilling method, which is characterized by a multi-layer structure of the material, can suppress the scattering of debris and prevent the fθ lens from being contaminated. This is because the temperature rise of the layer having a low absorptance is suppressed and the viscosity is high, and the scattering is suppressed because the momentum of the melt evaporation of the lower outer conductor copper layer is absorbed.

【0018】[0018]

【発明の実施の形態】以下、図面を使って本発明の実施
の形態を説明する。図2は、本発明に係るプリント基板
にブラインドホールを形成する方法を工程順に示す。
A)はビルドアップ後基板状態であり、1は銅からなる
外層導体層、2は絶縁樹脂層、3は銅からなる内層導体
層である。B)は外層導体層の表面を粗化処理した後の
状態、C)は外層導体層の表面に樹脂フィルム層4をコ
ートした後の状態、D)はレーザ穴あけ後の状態であ
り、ここでDrtは樹脂フィルム層4の穴上部径、Drbは樹
脂フィルム層4の穴下部径、Dcは外層導体層1の穴径、
を示す。E)は化学エッチングで外層導体層1のオーバ
ーハング部分と穴上の一部を除去した状態、F)樹脂フ
ァイルム層4を剥離した状態、G)デスミア処理により
穴底に一部残留していた絶縁樹脂層2を除去した状態、
H)ソフトエッチングにより外層導体層1と内層導体層
3の表面の凹凸を除去した状態、I)銅メッキした後の
状態、J)外層導体層に配線パターンを形成した後の状
態を示す。本発明はこの中で、特にC)とD)の工程に
係る。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 2 shows a method of forming blind holes in a printed circuit board according to the present invention in the order of steps.
A) is a substrate state after buildup, 1 is an outer conductor layer made of copper, 2 is an insulating resin layer, 3 is an inner conductor layer made of copper. B) is a state after the surface of the outer conductor layer is roughened, C) is a state after the resin film layer 4 is coated on the surface of the outer conductor layer, and D) is a state after laser drilling. Drt is the hole upper diameter of the resin film layer 4, Drb is the hole lower diameter of the resin film layer 4, Dc is the hole diameter of the outer conductor layer 1,
Indicates. E) shows a state in which the overhang portion of the outer conductor layer 1 and a part on the hole are removed by chemical etching, F) a state in which the resin fume layer 4 is peeled off, and G) a part remains at the bottom of the hole by the desmear treatment. With the insulating resin layer 2 removed,
H) shows a state where irregularities on the surfaces of the outer conductor layer 1 and the inner conductor layer 3 are removed by soft etching, I) a state after copper plating, and J) a state after a wiring pattern is formed on the outer conductor layer. Among them, the present invention relates to the steps C) and D).

【0019】図1は炭酸ガスレーザパルスのパルス幅と
樹脂フィルム層4の穴上部径Drt(○)、樹脂フィルム
層4の穴下部径Drb(△)、外層導体層1の穴径Dc
(□)、絶縁樹脂層の穴上部径Dit(●)及び絶縁樹脂
層の穴底径Dib(■)との関係を示す。ここで、炭酸ガ
スレーザの波長は9.36μm、矩形パルスのピーク出力は1
000W一定、ビーム形状は特願2001-138204号明細書記載
のようなトップハット形でありビーム径は120μmφであ
る。本実験には樹脂付き銅板(又は通称プリプレグと銅
箔を積層したもの)を用いた。絶縁樹脂層2は約70μ
m、外層導体層1は厚さ約8μmで表面をMultiBond処理
(MacDermid社)で粗さ1.0〜2.0μmに粗化して光の吸収
率を高めた。ここで、表面の粗化処理としては、この他
に既存の黒化処理、エッチボンド処理(メック社)、α
-Prep処理(αMetal社)、あるいはBond Film処理(Ato
tech社)を用いても全く同等である。樹脂フィルム層4
は感光性ドライフィルム約30μmを貼り付け、露光処理
したものである。このように炭酸ガスレーザパルスのパ
ルス幅を増加させても穴径Drt、Drb、Dcがほぼ飽和する
ことから、パルス幅を14μs以上にしておけばレーザビ
ーム径で各層の穴径が決定し、コントロールが容易にな
ることがわかる。また、パルス幅14μsのところで比較
すると、樹脂フィルム層4の穴径Drt及びDrbが絶縁樹脂
層の穴上部径Ditより大きくできることがわかる。尚、
樹脂フィルム層4の穴径Drt及びDrbがレーザビーム径よ
り大きくなっているのは、熱拡散又は粗化した外層導体
層1からの乱反射によるものと推定される。
FIG. 1 shows the pulse width of the carbon dioxide laser pulse, the hole upper diameter Drt (◯) of the resin film layer 4, the hole lower diameter Drb (Δ) of the resin film layer 4, and the hole diameter Dc of the outer conductor layer 1.
The relationship between (□), the hole top diameter Dit (●) of the insulating resin layer and the hole bottom diameter Dib (■) of the insulating resin layer is shown. Here, the wavelength of the carbon dioxide laser is 9.36 μm, and the peak output of the rectangular pulse is 1
The beam shape is a top hat shape as described in Japanese Patent Application No. 2001-138204 and the beam diameter is 120 μmφ. In this experiment, a copper plate with resin (or what is commonly called a laminate of prepreg and copper foil) was used. Insulating resin layer 2 is about 70μ
The outer conductor layer 1 has a thickness of about 8 μm and its surface is roughened to a roughness of 1.0 to 2.0 μm by MultiBond treatment (MacDermid) to increase the light absorption rate. Here, as the surface roughening treatment, in addition to this, existing blackening treatment, etch bond treatment (Mech Co.), α
-Prep processing (αMetal) or Bond film processing (Ato
(tech company) is also completely equivalent. Resin film layer 4
Is a light-sensitive dry film of about 30 μm attached and exposed. Since the hole diameters Drt, Drb, and Dc are almost saturated even when the pulse width of the carbon dioxide laser pulse is increased in this way, if the pulse width is set to 14 μs or more, the hole diameter of each layer is determined by the laser beam diameter, and control is performed. It will be easy to understand. Further, when compared at the pulse width of 14 μs, it can be seen that the hole diameters Drt and Drb of the resin film layer 4 can be made larger than the hole upper diameter Dit of the insulating resin layer. still,
It is presumed that the hole diameters Drt and Drb of the resin film layer 4 are larger than the laser beam diameter due to diffuse reflection from the outer conductor layer 1 that has been thermally diffused or roughened.

【0020】ここで、レーザビームのエネルギ分布を通
常のガウス分布形で行うと、樹脂フィルム層4の穴径が
穴下部径Drbで180μmφ以上となり絶縁樹脂層上部径Dit
の170%以上になるが、トップハット形の場合、図1の
パルス幅14μsのところで比較することでもわかるが、1
40〜160%程度の大きさに抑えることができる。
Here, when the energy distribution of the laser beam is performed by a normal Gaussian distribution type, the hole diameter of the resin film layer 4 becomes 180 μmφ or more in the hole lower diameter Drb, and the insulating resin layer upper diameter Dit
It is 170% or more of the above, but in the case of the top hat type, it can be seen by comparing at the pulse width of 14 μs in FIG.
It can be reduced to about 40 to 160%.

【0021】また、ガウス分布の場合、エネルギがビー
ム中央部に集中するためにこのような飽和現象は現れ
ず、パルス幅を増加するにつれてどんどん穴径は増加す
るため適切なパルス幅の選定が困難になる。極端な場合
は、絶縁樹脂層2との接着性を向上するために表面が粗
化処理されている内層導体層3の穴中心部を損傷するこ
とさえある。
Further, in the case of the Gaussian distribution, such a saturation phenomenon does not appear because the energy is concentrated in the central portion of the beam, and the hole diameter gradually increases as the pulse width increases, so it is difficult to select an appropriate pulse width. become. In an extreme case, it may even damage the central portion of the hole of the inner conductor layer 3 whose surface is roughened to improve the adhesion with the insulating resin layer 2.

【0022】樹脂フィルム層4としてアクリルフィル
ム、ポリエチレンフィルム、塩化ビニルフィルム又はこ
れらのフィルムを複数層構造にした粘着性フィルムでも
同様に穴系をコントロールすることができた。この場
合、感光性ドライフィルムを用いた場合と異なり、露光
処理が不要になるという利点がある。但し、アクリルフ
ィルムや塩化ビニルフィルムの粘着性フィルムを用いた
場合、後工程の化学エッチングに耐えられないため、ま
ずポリエチレンフィルムを下に貼ると良い。また、ポリ
エチレンフィルムは吸収率が低いためにレーザ加工性に
劣るが、上記のような複数層構造にすることより加工性
を改善することができる。
As the resin film layer 4, an acrylic film, a polyethylene film, a vinyl chloride film or an adhesive film having a multi-layer structure of these films can control the hole system in the same manner. In this case, unlike the case where a photosensitive dry film is used, there is an advantage that the exposure process is unnecessary. However, when an adhesive film such as an acrylic film or a vinyl chloride film is used, it cannot withstand the chemical etching in the subsequent step, and therefore a polyethylene film may be attached below. Further, the polyethylene film is inferior in laser processability due to its low absorptivity, but the processability can be improved by adopting the above-mentioned multi-layer structure.

【0023】上記のように最適な穴あけパルス幅が判明
したが、炭酸ガスレーザによる穴加工において良く知ら
れているように、穴底の隅部分は図3の矢印部のように
厚いままである。そこで、次のパルス間隔500μs(繰返
し周波数2kHz)でパルス幅の短い(3〜6μs)のパルス
を照射すると、図3の点線のように隅部分まで除去さ
れ、穴を整形することができる。場合により、さらに次
のパルス間隔でより短いパルス幅のパルスを照射しても
よい。
Although the optimum drilling pulse width has been found as described above, as is well known in drilling with a carbon dioxide laser, the corner portion of the hole bottom remains thick as shown by the arrow in FIG. Then, when a pulse with a short pulse width (3 to 6 μs) is irradiated at the next pulse interval of 500 μs (repetition frequency 2 kHz), the corner portion is removed as shown by the dotted line in FIG. 3, and the hole can be shaped. In some cases, a pulse having a shorter pulse width may be emitted at the next pulse interval.

【0024】また、樹脂フィルム層4として、レーザ加
工性の良い樹脂フィルム層を吸収率の高い材料と、吸収
率がその2分の1程度に低い材料の複数層構造とするこ
とを特徴とするレーザ穴あけ方法とすることにより、デ
ブリの飛散が抑制され、fθレンズの汚れを防止できる
ことがわかった。これは、吸収率の低い層の温度上昇が
抑制されて粘度が高い状態であり、下の外部導体銅層1
の溶融蒸発の勢いを吸収するために飛散が抑制されるこ
とによる。
Further, as the resin film layer 4, a resin film layer having good laser processability has a multi-layer structure of a material having a high absorptivity and a material having an absorptivity as low as about one half thereof. It was found that the laser drilling method can suppress the scattering of debris and prevent the fθ lens from being soiled. This is a state in which the temperature rise of the layer having a low absorptance is suppressed and the viscosity is high, and the lower outer conductor copper layer 1
Because the momentum of the melt evaporation of is absorbed, the scattering is suppressed.

【0025】[0025]

【実施例】本発明のレーザ穴あけ方法による具体的な加
工結果を説明する。
EXAMPLE A concrete processing result by the laser drilling method of the present invention will be described.

【0026】図4は、本発明により加工した穴の走査電
子顕微鏡による断面写真であり、図2のD)に相当する
ものである。1は銅からなる外層導体層、2は絶縁樹脂
層、3は銅からなる内層導体層、4は樹脂フィルム層で
ある。ここで、炭酸ガスレーザの波長は9.36μm、矩形
パルスのピーク出力は1000W一定、ビーム形状はトップ
ハット形でありビーム径は約120μmφである。プリント
基板の絶縁樹脂層2は約70μm、外層導体層1は厚さ約8
μmで表面をMultiBond処理(MacDermid社)で粗さ1.0〜
2.0μmに粗化してある。樹脂フィルム層4は感光性ドラ
イフィルム約30μmを貼り付け、露光処理したものであ
る。本実施例は、最初のパルス幅を25μsとし、その1
パルスサイクル(500μs)後にパルス幅3μsのパルスを
照射して形成したものである。このように穴底まで角張
った形状を持ち、絶縁樹脂層の穴径が約100μmφであ
り、かつ樹脂層の穴下部径が約150μmφで150%しか増
加していない穴をあけることができた。
FIG. 4 is a cross-sectional photograph of a hole machined according to the present invention by a scanning electron microscope, and corresponds to D) of FIG. 1 is an outer conductor layer made of copper, 2 is an insulating resin layer, 3 is an inner conductor layer made of copper, and 4 is a resin film layer. Here, the wavelength of the carbon dioxide laser is 9.36 μm, the peak output of the rectangular pulse is 1000 W, the beam shape is top hat, and the beam diameter is about 120 μmφ. The insulating resin layer 2 of the printed circuit board is about 70 μm, and the outer conductor layer 1 is about 8 μm thick.
Roughness 1.0 ~ by MultiBond treatment (MacDermid) on the surface with μm
It is roughened to 2.0 μm. The resin film layer 4 is formed by attaching a photosensitive dry film of about 30 μm and subjecting it to an exposure treatment. In this embodiment, the first pulse width is set to 25 μs, and
It is formed by irradiating a pulse with a pulse width of 3 μs after a pulse cycle (500 μs). In this way, it was possible to form a hole having a square shape up to the bottom of the hole, the hole diameter of the insulating resin layer was about 100 μmφ, and the lower hole diameter of the resin layer was about 150 μmφ, which was increased by only 150%.

【0027】[0027]

【発明の効果】本発明により、トップハット形の炭酸ガ
スレーザパルスのパルス幅により穴形状をコントロール
できるようになった。
According to the present invention, the hole shape can be controlled by the pulse width of the top hat type carbon dioxide gas laser pulse.

【0028】また、銅層の表面に付加する樹脂層を接着
剤を付けたレーザ加工性の良い樹脂フィルム層とするこ
とにより、露光工程を除去できた。
Further, the exposure step could be eliminated by using a resin film layer having good laser processability with an adhesive as the resin layer added to the surface of the copper layer.

【0029】外層導体層上の樹脂フィルム層の穴下部径
を絶縁樹脂層の穴上部径の160%以下にすることによ
り、配線パターンを細くすることができた。
By setting the diameter of the lower hole of the resin film layer on the outer conductor layer to be 160% or less of the upper diameter of the hole of the insulating resin layer, the wiring pattern could be made thin.

【0030】また、レーザ加工性の良い樹脂フィルム層
を吸収率の高い材料と、吸収率がその2分の1程度に低
い材料の複数層構造とすることにより、デブリの飛散が
抑制され、fθレンズの汚れを防止できた。
Further, by forming the resin film layer having good laser processability into a multi-layer structure of a material having a high absorptivity and a material having an absorptivity as low as about one half thereof, scattering of debris is suppressed and fθ I was able to prevent the lens from getting dirty.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るパルス幅と穴径との関係を示すグ
ラフである。
FIG. 1 is a graph showing a relationship between a pulse width and a hole diameter according to the present invention.

【図2】本発明に係る穴加工プロセスの全工程の概略を
順に示す図である。
FIG. 2 is a diagram sequentially showing an outline of all steps of a hole drilling process according to the present invention.

【図3】本発明の加工方法による穴底の隅部分の図であ
る。
FIG. 3 is a view of a corner portion of a hole bottom according to the processing method of the present invention.

【図4】本発明の加工方法により加工した穴の走査電子
顕微鏡による断面写真である。
FIG. 4 is a cross-sectional photograph of a hole processed by the processing method of the present invention by a scanning electron microscope.

【符号の説明】[Explanation of symbols]

1・・・外層導体層 2・・・絶縁樹脂層 3・・・内層導体層 4・・・樹脂フィルム層 1 ... Outer conductor layer 2 ... Insulating resin layer 3 ... Inner conductor layer 4 ... Resin film layer

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // B23K 101:42 B23K 101:42 Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) // B23K 101: 42 B23K 101: 42

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】外層導体層と絶縁樹脂層および内層導体層
からなるプリント基板に、外層導体層の表面にレーザ光
吸収率を高めるために表面に粗化処理を施し、外層導体
層表面にレーザ加工性の良い樹脂フィルム層を付加し、
炭酸ガスレーザによりブラインドホール加工する方法に
おいて、レーザ光パルスをトップハット形にし、パルス
幅を制御することにより外層導体層上の樹脂フィルム層
の穴下部径、外層導体層の穴径、および絶縁樹脂層の穴
上部径をコントロールすることを特徴とするレーザ穴あ
け方法。
1. A printed circuit board comprising an outer conductor layer, an insulating resin layer, and an inner conductor layer is subjected to a roughening treatment on the surface of the outer conductor layer in order to increase the absorption rate of laser light, and a laser is applied to the surface of the outer conductor layer. By adding a resin film layer with good workability,
In the method of blind hole processing with a carbon dioxide gas laser, by making the laser light pulse into a top hat shape and controlling the pulse width, the hole lower diameter of the resin film layer on the outer conductor layer, the hole diameter of the outer conductor layer, and the insulating resin layer Laser drilling method characterized by controlling the diameter of the upper part of the hole.
【請求項2】樹脂フィルム層の穴下部径、外層導体層の
穴径、および絶縁樹脂層の穴上部径をコントロールする
レーザ光パルスに続けて、パルス幅の狭い複数のレーザ
光パルスを照射することにより、内層導体層上の穴底部
分の形状を整形することを特徴とする請求項1記載のレ
ーザ穴あけ方法。
2. A laser light pulse for controlling the diameter of the lower hole of the resin film layer, the diameter of the hole of the outer conductor layer, and the upper diameter of the hole of the insulating resin layer is irradiated with a plurality of laser light pulses having a narrow pulse width. The laser drilling method according to claim 1, wherein the shape of the hole bottom portion on the inner conductor layer is shaped by doing so.
【請求項3】樹脂フィルム層が厚さ10〜60μmのアクリ
ルフィルム、ポリエチレンフィルム、塩化ビニルフィル
ム、又はこれらのフィルムを複数層構造にした粘着性フ
ィルムであることを特徴とする請求項1記載のレーザ穴
あけ方法。
3. The resin film layer is an acrylic film, a polyethylene film, a vinyl chloride film having a thickness of 10 to 60 μm, or an adhesive film having a multi-layer structure of these films. Laser drilling method.
【請求項4】樹脂フィルム層の穴下部径を絶縁樹脂層の
穴上部径の160%以下にすることを特徴とする請求項1
記載のレーザ穴あけ方法。
4. The diameter of the lower hole of the resin film layer is 160% or less of the upper diameter of the upper hole of the insulating resin layer.
The laser drilling method described.
【請求項5】外層導体層と絶縁樹脂層および内層導体層
からなるプリント基板に、外層導体層の表面にレーザ光
吸収率を高めるために表面に粗化処理を施し、外層導体
層表面にレーザ加工性の良い樹脂フィルム層を付加し、
炭酸ガスレーザによりブラインドホール加工において、
レーザ加工性の良い樹脂フィルム層を吸収率の高い材料
と、吸収率がその2分の1程度に低い材料の複数層構造
とすることを特徴とするレーザ穴あけ方法。
5. A printed circuit board comprising an outer conductor layer, an insulating resin layer and an inner conductor layer is subjected to a roughening treatment on the surface of the outer conductor layer in order to increase the absorption rate of laser light, and a laser is applied to the surface of the outer conductor layer. By adding a resin film layer with good workability,
In blind hole processing with carbon dioxide laser,
A laser drilling method, characterized in that a resin film layer having good laser processability has a multi-layer structure of a material having a high absorptivity and a material having an absorptivity as low as about one half thereof.
JP2001340196A 2001-11-06 2001-11-06 Method for drilling printed board Pending JP2003136268A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001340196A JP2003136268A (en) 2001-11-06 2001-11-06 Method for drilling printed board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001340196A JP2003136268A (en) 2001-11-06 2001-11-06 Method for drilling printed board

Publications (1)

Publication Number Publication Date
JP2003136268A true JP2003136268A (en) 2003-05-14

Family

ID=19154435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001340196A Pending JP2003136268A (en) 2001-11-06 2001-11-06 Method for drilling printed board

Country Status (1)

Country Link
JP (1) JP2003136268A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203074A (en) * 2005-01-21 2006-08-03 Sumitomo Bakelite Co Ltd Circuit board and manufacturing method thereof
US20120050954A1 (en) * 2010-08-27 2012-03-01 Sanyo Electric Co., Ltd. Solid electrolytic capacitor and a method for manufacturing the same
WO2015136948A1 (en) * 2014-03-14 2015-09-17 株式会社アマダミヤチ Laser processing method
CN113395832A (en) * 2021-05-11 2021-09-14 李康树 Through-hole resin current-limiting and processing device before secondary drilling of circuit board

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10224041A (en) * 1997-01-31 1998-08-21 Nippon Carbide Ind Co Inc Multilayer wiring board and its manufacturing method
JPH10322027A (en) * 1997-02-03 1998-12-04 Ibiden Co Ltd Printed wiring board and its manufacture
JPH1177343A (en) * 1997-09-09 1999-03-23 Mitsubishi Electric Corp Laser working method and laser working device for laminated member
JPH11254171A (en) * 1998-03-13 1999-09-21 Mitsubishi Electric Corp Laser beam machining device for wiring board
JPH11320155A (en) * 1998-05-08 1999-11-24 Matsushita Electric Ind Co Ltd Laser beam machining method, machining equipment, and work
JP2001068816A (en) * 1999-08-24 2001-03-16 Mitsui Mining & Smelting Co Ltd Copper plated laminated board and laser processing method used therefor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10224041A (en) * 1997-01-31 1998-08-21 Nippon Carbide Ind Co Inc Multilayer wiring board and its manufacturing method
JPH10322027A (en) * 1997-02-03 1998-12-04 Ibiden Co Ltd Printed wiring board and its manufacture
JPH1177343A (en) * 1997-09-09 1999-03-23 Mitsubishi Electric Corp Laser working method and laser working device for laminated member
JPH11254171A (en) * 1998-03-13 1999-09-21 Mitsubishi Electric Corp Laser beam machining device for wiring board
JPH11320155A (en) * 1998-05-08 1999-11-24 Matsushita Electric Ind Co Ltd Laser beam machining method, machining equipment, and work
JP2001068816A (en) * 1999-08-24 2001-03-16 Mitsui Mining & Smelting Co Ltd Copper plated laminated board and laser processing method used therefor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006203074A (en) * 2005-01-21 2006-08-03 Sumitomo Bakelite Co Ltd Circuit board and manufacturing method thereof
US20120050954A1 (en) * 2010-08-27 2012-03-01 Sanyo Electric Co., Ltd. Solid electrolytic capacitor and a method for manufacturing the same
WO2015136948A1 (en) * 2014-03-14 2015-09-17 株式会社アマダミヤチ Laser processing method
CN113395832A (en) * 2021-05-11 2021-09-14 李康树 Through-hole resin current-limiting and processing device before secondary drilling of circuit board

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