JP2003124176A - Automatic wafer-carrier cleaning apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance cleaning-work efficiency by realizing the best handling property while achieving minimization of a clean room in automating wafer- carrier cleaning. SOLUTION: A wafer carrier 1 comprises a front-opened container body 2 and a door 3 which is attached/detached to/from the container body 2 with a locking mechanism. In a clean room, the door 3 is detached from the container body 2, and the both are held in a cleaning machine 6 and are cleaned with a cleaning liquid. Then the door 3 is attached to the container body 2 with the locking mechanism, and the wafer carrier 1 is transferred to the outside of the clean room. The clean room is provided with a loader-unloader unit 10 that rotatively holds the wafer carrier, the cleaning machine 6, and a robot 20 installed between the both. The robot has a first hand part 23 for the container base body and a second hand part 30 for the door. The robot is capable of detaching/attaching the door 3 from/to the container body 2 in the loader- unloader unit 10, and simultaneously transfers the container body 2 and the door 3 between the loader-unloader unit and the cleaning machine.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automatic wafer carrier used to store and transport a large number of wafers in the manufacture of semiconductor wafers, glass substrates, etc. (hereinafter collectively referred to as wafers). It relates to cleaning equipment.

[0002]

2. Description of the Related Art In wafer manufacturing, a target wafer is housed in a wafer carrier and sequentially transferred from an initial process to a next process or stored as needed. The wafer carrier is becoming larger in size as the diameter of the wafer becomes larger, and due to the minimal orientation of the clean room, the open cassette system is being changed to a front opening unified pod system that shields the wafer from the external atmosphere. Wafer carrier 1 of the latter
Is called a FOUP, and is composed of a container body 2 that stores a large number of wafers as shown by the imaginary line in FIG. 7B, and a door 3 that is attached to and detached from the front opening of the container body 2 via a lock mechanism. . The container body 2 has a grip portion 4 provided on the upper surface, and can be automatically conveyed by using the grip portion 4 and the like in a state of being sealed by the door 3. The door 3 has a lock hole 5 and a lock bar 3a that form a lock mechanism, and by inserting a dedicated key into the lock holes 5 at two locations and rotating the door, the door body 3 is inserted through the lock bar 3a. Detachable. The washing machine 6 is installed in a clean room and
This is a structure in which individual wafer carriers 1 are simultaneously cleaned and dried. That is, in the cleaning operation, after the wafer carrier 1 is separated into the container main body 2 and the door 3, the main body holding portions 8a, 8b are provided at fixed positions, that is, two positions, provided on the left and right sides of the tank of the cleaning machine 6.
And the door holding portions 9a and 9b are set, and with the upper cover 7 closed, a cleaning liquid is sprayed from a nozzle (not shown) to clean the liquid, and a drying process is performed. After the cleaning process, the top cover 7
The container body 2 and the door 3 are opened, the door 3 is attached to the container body 2, and the original sealed wafer carrier 1 is transferred from the clean room to a predetermined process.

[0003]

As described above, in the conventional structure, in the clean room in which the cleaning machine 6 is arranged, the operator can attach the target wafer carrier 1 to the container body 2 of the target wafer carrier 1.
To remove the door 3 from the
Since the door 3 was again attached to the container body 2, the working time required for handling was longer than the actual cleaning time, making it difficult to shorten the overall processing time. There was a risk of pollution. The present applicants have completed the present invention as a result of repeated studies to enable more rapid handling in order to unmanned the cleaning of the wafer carrier (FOUP) from such a background. . That is, the object of the present invention is to provide a wafer carrier (FOU).
In the case of automating the cleaning of P), it is to realize the best handling property while achieving further minimization of the clean room, improve the cleaning work efficiency and reduce the cost.

[0004]

In order to achieve the above object, the wafer carrier automatic cleaning equipment of the present invention is, as illustrated in the drawings, a container body 2 in which a wafer carrier 1 is opened on the front side, and the container body. The door 3 is attached to and detached from the opening 2 through a lock mechanism (lock bar 3a on the door side),
In the clean room C / R, the lock mechanism is released, the door 3 is separated from the container body 2 and held in the washing machine 6 to perform the liquid washing process, and then the door 3 is removed from the container body 2.
In the cleaning equipment which is attached to the above through the lock mechanism and can be transported to a predetermined location, the clean room CR
A loader / unloader unit 10 that holds the wafer carrier 1 in a rotatable manner, the cleaning machine 6 arranged to face the loader / unloader unit 10, the loader / unloader unit 10 and the cleaning machine 6. Robot 2 with 4 or more axes installed (between 4 and more drive axes)
0, the robot 20 includes a container body first hand portion 23 and a door second hand portion 30, and the loader / unloader portion 10 separates the door 3 from the container body 2. The container body 2 and the door 3 (that is, the separated container body and door) are simultaneously transferred between the loader / unloader unit 10 and the washing machine 6.

In the above automatic cleaning equipment, the wafer carrier 1 to be cleaned has a loader / unloader section 10 (holding table 11A) with the door 3 attached to the container body 2.
It is rotatably held with respect to 2 parts of 11D. For the wafer carrier 1 held on the loader / unloader unit 10, the robot 20 releases the lock mechanism of the door 3 by the second hand unit 30 to separate the door from the container body 2 as in the embodiment. After holding, first
The container body 2 is held by the hand portion 23, and the door and the container body are simultaneously transferred to fixed positions in the tank of the washing machine 6 (body holding portions 8a and 8b and door holding portions 9a and 9b in FIG. 7), and the container body 3 Is set in the main body holding portion, and the door 3 is set in the holding portion. Then, the washing machine 6 automatically performs the washing process as in the conventional case. After the cleaning, the robot 20 holds the door 3 from the inside of the tank of the cleaning machine 6 with the second hand part 30 and then the first hand part 2
After holding the container main body 2 by 3, the door and the container main body are simultaneously transferred to the loader / unloader unit 10, and the container main body is moved to a predetermined position of the loader / unloader unit (holding table 1
After being rotatably held in a vacant place of 1A to 11D, the door 3 is attached to the container body 2 via a lock mechanism. Therefore, according to the present invention, the time required for the handling performed in the cleaning process can be significantly reduced. This is to separate the door 3 from the container body 2 by the first and second hand parts 23 and 30 of the robot 20, simultaneously transfer and set the door and the container body to the washing machine, and after the cleaning, the door and the container body. This is because at the same time, it was transferred to the loader / unloader section to hold the container body and install the door.

Each of the above inventions is preferably embodied as claimed in claims 2 to 4. Firstly, the first hand part 23 is composed of a sandwiching mechanism (24, 26) capable of attaching and detaching the grip part 4 provided on the upper surface of the container body 2, and the second hand part 3
0 is a door opening / closing mechanism (35, 36, which is inserted into the lock hole 5 of the door 3 to release or lock the lock mechanism).
40) and a holding mechanism (33 etc.) for holding the door 3. This is especially true for the second hand part 3
Since 0 has a door opening / closing mechanism and can unlock or lock the lock mechanism of the door 3 (the lock bar 3a on the door side that constitutes the lock mechanism), the door can be unlocked and locked. It can be automated including the door holding portion 9a, 9b of the washing machine 6 by holding the door on the washing machine side only by adopting the same structure as the locking mechanism between the door 3 and the container body 2 (holding by the locking mechanism). There is an advantage that can be simplified. Secondly, the second hand portion 30 has a holding plate 31 having an internal cavity, and the door opening / closing mechanism has a piston 36 swingably arranged in the holding plate, and one end of an extension rod 38 of the piston. And a link 40 having a key member 35 projecting from the other end, the key member 5 protruding from the through hole of the holding plate 31, and the lock position via the telescopic rod 38 and the link 40. The configuration is such that the rotation is switched to the release position. This is because, in the type in which the lock mechanism between the door and the container body rotates the key member, the piston 36 and the ring 40 are used as the door opening / closing mechanism, which makes it easy to downsize the second hand portion. It was devised. Thirdly, the cleaning machine 6 can process two wafer carriers 1 at the same time, and the loader / unloader unit 10 can hold at least four wafer carriers. This is meaningful in that the loader / unloader unit 10 is designed in accordance with the processing capacity of the cleaning machine 6 from the viewpoint of unitizing the automatic cleaning equipment of the present invention.

[0007]

The present invention will be further described with reference to the drawings. 1A and 1B schematically show the entire configuration of an automatic cleaning facility to which the present invention is applied. FIG. 1A is a schematic view seen from above, and FIG. 1B is a schematic view seen from a side. 2A and 2B schematically show the hand of the robot. FIG. 2A is a side view, FIG. 2B is a view of FIG. 2A from above, and FIG. 2C is a view of A from below. is there. 3A and 3B schematically show a state in which a door and a container body are held by a robot hand, FIG. 3A is a side view, and FIG. 3B is a first hand unit shown along line AA in FIG. FIG. FIG. 4 shows the second hand part, FIG. 4 (a) is a configuration diagram in which a part of the holding plate is broken, FIG. 4 (b) is an enlarged sectional view showing the main part, and FIG. 4 (c) and FIG. It is a figure which shows operation | movement of a mechanism. 5 and 6 schematically show an example of handling performed in the cleaning step as viewed from above. In addition, in the embodiment, the cleaning machine and the wafer carrier are shown in FIG.
The same type is assumed. In the explanation below,
After describing the automatic cleaning equipment of the present invention together with the basic operation, details of the handling performed in the cleaning process will be referred to.

(Cleaning Equipment) The automatic cleaning equipment of the embodiment is installed in a clean room C / R as shown in FIG. 1, in which the loader / unloader section 10 and the cleaning machine 6 face each other. A robot 20 is installed between the loader / unloader unit 10 and the cleaning machine 6. The loader / unloader unit 10 includes three holding tables 11A to 11C provided on the lower side and one holding table 11D provided on the upper side, and the wafer carrier 1 is not illustrated by an automatic carrier. When it is sent through the load port, it is positioned and held on a holding table at an appropriate position, and after cleaning, the wafer carrier 1 (having a door 3 attached to the container body 2) is held to pass outside the clean room 10 through the load port. It is a place to be transported to. Holding table 1
1A to 11D (11) can position and hold the container body 2 and can be rotated at an arbitrary angle by a rotation mechanism. In this case, the clean room C / R has a size of (vertical) 2000 mm × (horizontal) 3000 mm × (height) 2
The holding table 11D is arranged at a position one step higher than the holding tables 11A to 11C because the holding table 11D is minimized to about 800 mm. Reference numeral 13 is a clean room C.
This is an air conditioning facility installed on the R ceiling 14.

The cleaning machine 6 is a type capable of cleaning two wafer carriers 1 (that is, two separated container bodies 2 and two doors 3) at the same time. , 6b. Each of the cleaning units 6a and 6b has a body holding unit 8a capable of positioning and holding the container body 2.
8b and a door holding portion 9a capable of positioning and holding the door 1.
9b is provided, and a plurality of liquid jet nozzles (not shown), hot air jetting means for drying, etc. are provided corresponding to the main body holding portions 8a, 8b and the door holding portions 9a, 9b. Further, the door holding portions 9a and 9b have a structure in which the door 3 is attached and detached by a similar lock mechanism when the door 3 is attached to the container body 2 through the lock mechanism. The cleaning machine 6 only needs to be capable of automatically processing the two wafer carriers 1, and the cleaning processing mechanism itself may be that of JP 2001-929A or the like. The wafer carrier 1 is, for example, of a type having a diameter of 300 mm and storing 25 wafers.

The robot 20 is installed in a substantially central portion of the clean room C / R, and the robot hand 21 has a first position.
It has a hand part 23 and a second hand part 30. As the robot body itself, for example, a clean robot (YR-CR20-A00) manufactured by Yasukawa Electric Co., Ltd. is used.
The main operation is from the viewpoint of minimizing the clean room CR.
It is preferable to have five or more operating shafts. In the structure of FIG. 1, a vertical multi-joint type 6-axis structure is used, and as an operating range, the S-axis rotates (± 180 °) and the L-axis rotates the lower arm (+120).
°, -90 °), U axis is the upper arm (+ 90 °, -80 °),
R-axis is wrist swing (± 165 °), B-axis is wrist swing (+2)
30 °, −50 °), and T axis is wrist rotation (± 360 °). The first hand unit 23 and the second hand unit 30 are attached to the T-axis at the tip as the robot hand 21.

The first hand portion 23 is composed of a holding mechanism to which the grip portion 4 provided on the upper surface of the container body 2 can be attached and detached, as shown in FIGS. That is, in this structure, the pair of holding plates 24 are swingably connected to the base portion 22 connected to the T-axis, and both holding plates 24 are separated and contacted by the piston 26. Each sandwiching plate 24 has a U-shaped groove 24a formed on the opposite side surface thereof, and a base end side thereof is pivotally supported by the base portion 22 via a pivot shaft 25 including a bolt and a nut. The cylinder 26 is attached to one of the sandwiching plates 24 while the piston 26 is arranged on the base end side of the sandwiching plates 24.
The tip end of the telescopic rod 28 is pivotally supported on the other holding plate 24 via the mounting member 29b. Therefore, the above first hand portion 23 is located directly below the second hand portion 30 in the state of FIG. 2 (a), and the both gripping portions 24 move the piston 26 as shown by the solid line in FIG. 3 (b). In a non-parallel state (hereinafter, referred to as a non-holding state) with a space between them, after being lowered toward the container body 2 and positioned between the rectangular gripping portions 4 protruding on the upper surface of the container body 2. By being moved substantially parallel to each other via the piston 26 as shown by an imaginary line, the gripping portion 4 is sandwiched in the U-shaped grooves 24a on both sides in a fitted state (hereinafter, referred to as a holding state). First hand part 2
The holding of the container main body 2 held by No. 3 is released by controlling the piston 26, and the container main body 2 is detached by being moved up and down with respect to the above holding tables 11A to 11D and the main body holding portions 8a and 8b. It has become. However, as such a holding mechanism, it is also possible to attach / detach the gripping portion 4 by driving the holding plates 24 to separate / contact in parallel by a unitized piston mechanism.

The second hand section 30 holds the door opening / closing mechanism for locking and unlocking the door 3 and the door 3 on the container body 2 (and the door holding sections 9a, 9b) as shown in FIGS. The door holding mechanism is attached to the holding plate 31, and the holding plate 31 is connected to the T axis of the robot 20 via the base portion 32. Here, the holding plate 31 is in the shape of a flat plate having an internal cavity slightly smaller than the door 3. On the upper surface, four suction cups 33 and two key members 35 that are in the middle portion and project left and right are provided.
Of these, the suction cup 33 constitutes a door holding mechanism, and the central portion thereof is a tubular air supply / exhaust portion 34. The air supply / exhaust section 34 is projected into the holding plate 31, and is connected to a gas supply / exhaust hose (not shown) introduced from the base section 32 into the holding plate 31. Further, in this structure, the door 3 separated from the container body 2 is on a diagonal line with the next door opening / closing mechanism.
It is sucked and held by the individual suction cups 33. That is, two holes are provided on the outer surface of the door 3 along with the left and right key holes 5 on a diagonal line. Each suction cup 33 is provided corresponding to the hole of the door 3, and even if the wafer carriers 1 are arranged in different directions, the two suction cups 33 are always designed to overlap the holes.

Each key member 35 constitutes a door opening / closing mechanism for releasing or locking the lock mechanism of the door 3 with respect to the container body 2 by being inserted into the corresponding key hole 5 of the door 3 and rotated. This drive mechanism is a set of a piston 36 and a link 40 as shown in FIG. That is, the pistons 36 are disposed in the holding plate 31 in the left-right direction, and the cylinder 37 is pivotally supported at the rear end thereof via the mounting member 39. The telescopic rod 38 has
The jig 38a is coupled to the tip, and the link 4 is attached to the jig 38a.
One end of 0 is rotatably connected via a connection pin 41. A key member 35 is projectingly provided at the other end of the link 40, and the key member 35 is projected outward from a through hole 31b provided in the holding plate 31 and the auxiliary base portion 31a. That is,
In this structure, since the positions of the cylinder 37 and the key member 35 are regulated with respect to the holding plate 31, the retractable rod 38 is switched from the contracted state as shown in FIG. 4C to the extended state as shown in FIG. 4C. In the process of being moved, the link 40 is moved while the cylinder 37 swings to move the key member 35 to the position shown in FIG.
The release position of (c) is switched to the lock position of (d). When the expansion rod 38 of the cylinder 37 is controlled to contract, the key member 35 is switched from the locked position to the unlocked position by the movements of the expansion rod 38 and the link 40. A method of applying a driving mechanism such as a motor and a gear can be applied to such a door opening / closing mechanism, but the method of the embodiment is excellent in that it is simple and the thickness of the holding plate 31 can be suppressed. There is.

(Handling Example) An operation example of the automatic cleaning apparatus of the present invention described above will be described. 5 and 6 show an example in which the wafer carrier 1 on the loader / unloader section 10 is set in each of the cleaning sections 6a and 6b of the cleaning machine 6. It is assumed that the loader / unloader unit 10 holds the wafer carrier 1 on two holding tables 11 by AGVs (automatic transfer machines) not shown. In FIG. 5, in this handling, first, the holding table 11 is rotated 90 degrees clockwise from the initial state (a) to the state (b).
At the same time, the robot 20 is driven and the robot hand 2
The first second hand unit 30 is arranged so as to face the door 3. When the robot hand 21 approaches the door 3, the key member 35
Is inserted into the key hole 7 (see FIG. 7) of the door 3. The door 3 is sucked and held by the holding plate 31 via the suction cup 34, and the piston 36 is operated to switch the key member 35 from the lock position to the release position. In the robot hand 21, the door 3 has the container body 2
After being moved in the direction away from, the door 3 is turned up by 90 degrees in the direction of the arrow (b), that is, counterclockwise so as to be horizontal. By this turning, the first and second hand portions 23, 30 are horizontally arranged, and the holding table 11 is rotated 180 degrees from the state (b) to the state (c). Next, the first hand portion 23 is lowered to position the gripping portion 4 of the container body 2 between the two holding plates 24 in the non-holding state, and then the holding state is switched to gripping as shown in (d). Hold the part 4. In this state, as shown in FIG. 3A, the door 3 is held by the second hand portion 30 on the upper side, and the container body 2 is held by the first hand portion 23 on the lower side. Next, the robot hand 21 moves 9 in the direction of the arrow in (d), that is, clockwise.
The container body 2 is swung only 0 degrees so that the front opening is downward,
The door 3 is switched to the state (e) with the side face up. After that, the robot hand 21 operates the cleaning unit 6 of the cleaning machine 6.
When the container body 2 is swung to a,
The door 3 is held by the door holding portion 9a. The holding mechanism of the container main body 2 with respect to the main body holding portions 8a and 8b of the washing machine 6 and the holding mechanism itself of the door 3 with respect to the door holding portions 9a and 9b by the lock bar 3a are the same as the conventional ones. However, in this structure, the container body 2 is held by the first hand portion 23, and the downward movement of the robot hand 21 with respect to the body holding portion 8a and the first hand portion 2 are performed.
It is installed and held by switching to the non-holding state of No. 3. The door 3 is held by the second hand portion 30 and is positioned by the lateral movement of the robot hand 21 with respect to the door holding portion 9a, and by switching the key member 35 to the lock position, the door holding portion 9a is held. After being locked, after being locked, the holding by the suction cup 33 of the door holding mechanism is released, and the key member 35 is pulled out from the key hole 5 by the movement of the robot hand 21.

In FIG. 6, this handling is shown in FIG.
Basically the same as, but with the following changes. Door 3
At the time of holding, the holding table 11 is rotated 90 degrees (counterclockwise) from the initial (a) to the state (b) in the opposite direction to the above. At the same time, the robot 20 is driven so that the second hand unit 30 of the robot hand 21 moves to the door 3
It is arranged opposite to. When the robot hand 21 approaches the door 3, the key member 35 is inserted into the key hole 5 of the door 3, and the lock position is switched to the release position as described above. After the door 3 is moved in the direction away from the container body 2, the second hand unit 30 is rotated by 90 degrees in the arrow direction (clockwise) opposite to the above (b). And the first
The hand part 23 is lowered and both holding plates 24 are moved in the same manner as described above.
The gripping part 4 is held as shown in FIG. Next, the robot hand 21 is turned by 90 degrees in the direction (counterclockwise) indicated by arrow (d), which is the opposite of the above, so that the container body 2 has its front opening down and its door 3 with its side up. The state is switched to the state (e). The robot hand 21 is pivotally moved to the cleaning unit 6b of the cleaning machine 6, the container body 2 is held by the body holding unit 8b, and the door 3 is held by the door holding unit 9b.
Held in. In this way, after the container body 2 and the door 3 are set in both the cleaning units 6a and 6b, the upper cover 7 of the cleaning machine 6 is closed, the cleaning liquid is sprayed from the nozzle to wash off the adhered substances, and , Hot air is sprayed and dried. This cleaning process takes about 15 to 25 minutes.

After cleaning, the container body 2 of the cleaning units 6a and 6b
And the door 3 is in the reverse order of the handling at the time of setting,
Holding the door 3 by the second hand portion 30, the first hand portion 2
After the container main body 2 is held by 3, the door 3 and the container main body 2 are transferred to the empty holding table 11 by the pivotal movement of the robot hand 21, and then the container main body 2 is held on the holding table 11. The door 3 is assembled to the wafer carrier 1 which is locked and sealed by the container body 2 by the operation of the door opening / closing mechanism. The wafer carrier 1 is transferred from the loader / unloader section 10 to a target location by an AGV (automatic transfer machine) not shown.

The present invention is not limited to the above-mentioned embodiment, but can be variously modified within the scope of the requirements specified in claim 1. As an example, the robot 20 may have four or more actuation axes or drive axes. This is to achieve the desired handling in the clean room C / R with the smallest space. When the washing machine 6 has three washing units, at least six holding tables 11 of the loader / unloader unit 10 are installed. That is, the number of holding tables 11 is twice or more that of the cleaning unit of the cleaning machine 6.

[0018]

As described above, the automatic wafer carrier cleaning equipment according to the present invention locks the door from the container body by the first and second hand parts of the robot when the handling performed in the cleaning process is unmanned. After releasing and separating, transfer the door and container body to the washing machine at the same time for setting, or transfer the door and container body to the loader / unloader section at the same time after cleaning, or lock the door to the container body to lock the wafer carrier. Since it can be assembled into a clean room, it is possible to achieve the best handling while achieving further minimization of the clean room, and improve the cleaning work efficiency and cleaning quality (this is due to eliminating the risk of contamination due to unmanned operation). In addition to being able to do so, it is possible to easily reduce costs.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of automatic cleaning equipment shown as an embodiment of the present invention.

2 is a configuration diagram showing the robot hand of FIG. 1. FIG.

FIG. 3 is a configuration diagram showing first and second hand parts of the robot hand.

FIG. 4 is a configuration diagram showing details of the second hand unit.

FIG. 5 is a schematic operation diagram showing an example of handling in the automatic cleaning equipment.

FIG. 6 is a schematic operation diagram showing a handling example similar to FIG.

FIG. 7 is a schematic view showing a wafer carrier and a cleaning machine therefor.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Wafer carrier 2 ... Container main body (4 is a holding | grip part) 3 ... Door (5 is a key hole) 6 ... Cleaning machine (7 is an upper cover, 6a, 6b is a cleaning part) 8a, 8b ... Main body holding parts 9a, 9b. ... door holding unit 10 ... loader / unloader unit (11, 11A to 11)
D is a holding table 20 ... Robot (S, L, U, R, B, T are driving axes) 21 ... Robot hand 23 ... First hand part (22 is a base part, 24 is a holding plate,
26 is a piston 30 ... 2nd hand part (31 is a holding plate, 32 is a base part) 33 ... Sucker (door holding mechanism) 35 ... Key member (door opening / closing mechanism) 36 ... Piston (door opening / closing mechanism) 40 ... Link ( Door opening / closing mechanism) C / R ... Clean room

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) B65G 49/07 B65G 49/07 GH01L 21/68 H01L 21/68 AB (72) Inventor Otsuki Kazufumi 1-6-1, Kanda-Jimbocho, Chiyoda-ku, Tokyo N.S. Tech Co., Ltd. (72) Inventor Katsuhiro Kurusu 1-6-1-1, Kanda-Jimbocho, Chiyoda-ku, Tokyo F-Term (Reference) 3C007 AS24 AS25 BS12 DS05 ES03 ET03 EU18 FS01 FT11 5F031 CA20 DA01 DA08 EA11 EA14 EA20 FA03 FA22 GA03 GA08 GA10 GA15 GA25 GA43 GA45 HA50 KA11 KA12 KA17 KA20 NA02 PA24 PA30

Claims (4)

[Claims] 1. A wafer carrier comprises a container body having a front opening, and a door that is attached to and detached from the container body through a lock mechanism. The lock mechanism is released in a clean room to separate the door from the container body. In the cleaning equipment that holds the door in the cleaning machine and performs the liquid cleaning process, and then attach the door to the container body through the lock mechanism so that the door can be transported to a predetermined location, the clean room can rotate the wafer carrier. A loader and unloader unit held in the same, a cleaning machine disposed opposite to the loader and unloader unit, and a robot having four or more axes installed between the loader and unloader unit and the cleaning machine. The robot has a first hand part for a container body and a second hand part for a door, and the container main body is a loader / unloader part. The door with the a or attachable separation, wafer carrier automatic washing installation, characterized in that the transfer between said container body and at the same time the loader and unloader part with the washer door to. 2. The first hand part comprises a gripping mechanism capable of detaching a gripping part provided on the upper surface of the container body, and the second hand part is inserted into a lock hole of the door to release the lock mechanism. The automatic wafer carrier cleaning equipment according to claim 1, further comprising a door opening / closing mechanism that locks and locks and a holding mechanism that holds the door. 3. A piston in which the second hand portion has a holding plate having an internal cavity, and the door opening / closing mechanism is swingably arranged in the holding plate, and one end of which is pivotally supported by a telescopic rod of the piston. And a link having a key member protruding from the other end, the key member protruding from the through hole of the holding plate and being pivotally switched between a lock position and a release position via the telescopic rod and the link. Wafer carrier automatic cleaning equipment described in. 4. The cleaning machine can process two wafer carriers at the same time, and the loader / unloader section can hold at least four wafer carriers. Wafer carrier automatic cleaning equipment.