JP2003121623A - High reflective mirror and high reflective mirror optical system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a high reflective mirror which has excellent adhesion property and anticorrosion property of a metal film to a glass substrate and a resin substrate while keeping the high reflectance intrinsic to the metal film such as Ag, which can be improved in the light resistance, and which makes heating of the substrate unnecessary to improve the productivity. SOLUTION: The high reflective mirror is constituted by depositing a SiOx film 11 (first layer), UV shielding Al film 12 (second layer), metal oxide film 13 (third layer) and Ag film 14 as a reflection film (fourth layer) in this order on a substrate 10 and further forming a protective film or a reflection enhancing film 15, 16 thereon. By shielding UV rays from transmitting through the Ag film 14 by the shielding effect of the Al film 12 against UV rays, the corrosion resistance is improved, and preferable adhesion property and appearance and improved light resistance are obtained while keeping the high reflectance intrinsic to the metal film such as Ag. Heating of the substrate is made unnecessary, which simplifies the manufacturing process, improves the productivity and decreases the production cost.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a camera, a copying machine,
The present invention relates to a high-reflection mirror and a high-reflection mirror optical system suitable for a high-performance optical device such as a printer, and particularly to a high-reflection mirror excellent in adhesion, corrosion resistance and light resistance while making use of the high reflectance of a metal film. The present invention relates to a high reflection mirror optical system.

[0002]

2. Description of the Related Art In reflection mirrors used in optical devices such as cameras, copying machines and printers, it has been generally known that metals such as silver, copper, gold and aluminum having a high reflectance are used as a reflection film. As a reflection mirror that makes the best use of the characteristics of this type of metal film, for example, in JP-A-2-109003, an intermediate layer made of a metal oxide is provided on a substrate, and a metal reflection layer is formed thereon. There is disclosed a reflection mirror in which a metal film is laminated and, if necessary, a protective film is laminated on the metal reflective film. In this reflection mirror, by using a metal oxide such as chromium, titanium, tungsten, tin, indium and aluminum as the metal oxide of the intermediate layer, a glass of a metal reflection film made of aluminum, gold, silver, copper or the like. It is said that the film can be firmly attached to a substrate or a resin substrate (plastic substrate) to have excellent environment resistance and high productivity.

However, in the above-mentioned structure of the reflection mirror, when the substrate is made of plastic and the reflection mirror produced by using silver having the highest reflectance in the visible region as the metal reflection film is subjected to the light resistance test, the temperature is high. Even if there is no problem in a durability test such as high humidity, silver that constitutes the reflective film transmits in the ultraviolet range, so corrosion occurs due to a photochemical reaction between the substrate and silver, causing film peeling, etc. Problems such as problems in terms of sex remain.

[0004]

Therefore, the present invention has been made in view of the above-mentioned unsolved problems of the prior art, and while utilizing the high reflectance inherent to a metal film such as Ag,
Provided with a high-reflection mirror and a high-reflection mirror optical system, which have excellent adhesion and corrosion resistance to glass substrates and resin substrates, can improve light resistance, and can improve productivity without requiring substrate heating. The purpose is to do.

[0005]

In order to achieve the above object, in the high-reflection mirror of the present invention, the first layer is made of Si from the substrate side.
The Ox film, the second layer is an Al film, the third layer is a metal oxide, the fourth layer is an Ag film as a metal reflection film, and a protective film or a reflection-increasing film is further laminated thereon in this order. It is characterized by

In the high reflection mirror of the present invention, a metal oxide such as Ti, Al, Si, Ta or Zr can be used as the third layer metal oxide, and a protective film is not necessary. Accordingly, in consideration of spectral characteristics, it is possible to stack the low refractive index material and the high refractive index material in alternate layers.

The high reflection mirror of the present invention is provided on both sides of the substrate,
The first layer is a SiOx film, the second layer is an Al film, and the third layer is
The layer is a metal oxide, the fourth layer is an Ag film as a metal reflection film,
Further, it is characterized in that a protective film or a reflection enhancing film is laminated thereon in this order.

Further, the high reflection mirror optical system of the present invention is
At least a metal oxide film and A as a metal reflection layer on the substrate
The g-film is laminated in this order, and a protective film or an increased reflection layer is further laminated on the g-film, and an optical component for shielding ultraviolet rays is combined with the high-reflection mirror.

In the high reflection mirror optical system of the present invention,
PMMA can be used as an optical component that blocks ultraviolet rays, and metal oxides such as Ti, Al, and S can be used.
A metal oxide such as i, Ta, or Zr can be used, and the protective film can be laminated with alternating layers of a low refractive index material and a high refractive index material in consideration of spectral characteristics, if necessary.

Further, the optical apparatus of the present invention is characterized in that it further comprises another optical component before and / or after the optical component including the above-mentioned high-reflection mirror or the above-mentioned high-reflection mirror optical system.

[0011]

According to the present invention, the SiOx film (first
Layer), an Al film (second layer), a metal oxide (third layer), and an Ag film (fourth layer) as a metal reflection film are laminated in this order, and further a protective film or a reflection increasing film is laminated thereon. By configuring a high-reflecting mirror, the reflectance is approximately 97% or more in the visible range, and in the light resistance test, corrosion can be prevented by the ultraviolet shielding effect of the Al film of the second layer. Further, it is possible to realize a high-reflection mirror having good adhesion and excellent light resistance, and further having a low manufacturing cost.

Further, a PMMA for shielding ultraviolet rays from a high-reflection mirror constructed by laminating at least a metal oxide film and an Ag film as a metal reflecting film in this order on a substrate and further laminating a protective film or a reflection increasing film thereon. By configuring the high reflection mirror optical system by combining optical components such as the above, the high reflectance of the metal reflection film is maintained, and while the high reflectance of the metal reflection film is maintained, the ultraviolet ray shielding effect of the optical components such as PMMA causes a gap between the substrate and the metal reflection film. It is possible to realize a high-reflection mirror optical system which can prevent corrosion, have good appearance and adhesion, and have excellent light resistance.

Further, the above-described high-reflection mirror and high-reflection mirror optical system do not require a substrate heating step, so that the manufacturing process is simple, the manufacturing cost is low, and the manufacturing cost is low. It is suitable for high-performance optical equipment such as machines and printers.

Further, by providing another optical component before and after the optical component including the high-reflecting mirror or the high-reflecting mirror optical system, it is possible to secure better quality as a whole.

[0015]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

A high-reflection mirror according to an embodiment of the present invention, as shown in FIG. 1, has an S layer as a first layer on a substrate 10.
iOx film 11, Al film 12 as second layer, metal oxide film 13 as third layer, and A as metal reflection film as fourth layer
g film 14 is sequentially laminated, and an Al ₂ O ₃ film 15 and a TiO ₂ film 16 are further formed thereon as a protective film or a reflection enhancing film.
Are laminated in this order.

The substrate 10 may be made of a material conventionally used in optical components, such as a glass substrate,
Alternatively, a resin substrate (plastic substrate) such as a polycarbonate substrate or an acrylic substrate can be used.

First, a SiOx layer 11 (first layer) having SiO as a starting material is formed on the substrate 10. This Si
When forming the Ox layer, oxygen is introduced during film formation. Then, the Al layer 12 (second layer) is formed on the SiOx layer 11. The Al layer 12 has a shielding effect against ultraviolet ray transmission of the Ag film 14 as a metal reflection film to be formed later, and a film thickness of about 100 to 200 nm is sufficient. Metal oxide film 13 formed on Al layer 12
As the (third layer), a metal oxide such as Al, Ti, Si, Ta, or Zr can be used. For example, an Al ₂ O ₃ film can be used as the metal oxide film 13, and a film thickness can be used. Is about λ / 4 to λ (λ: design dominant wavelength).

An Ag film 14 (fourth layer) as a metal reflection layer is formed on the metal oxide film (Al ₂ O ₃ film) 13. Although normal resistance heating may be used for forming the Ag film 14, if EB (Electron Beam) vapor deposition is used, the film forming time is remarkably short. 150-200n as film thickness
m is suitable.

An Al ₂ O ₃ film 15 is formed on the Ag film 14. The Al ₂ O ₃ film 15 is formed on the TiO ₂ film formed later.
It has an effect as a protective film together with the film 16, and also has a function similar to that of the low refractive index dielectric layer in the enhanced reflection structure.
Since the Al ₂ O ₃ film 15 is a dense film as conventionally known, it is resistant to water and scratches and can be stably formed. As a film forming method, a usual vacuum vapor deposition method or a sputtering method can be applied. And Al ₂
On the O ₃ film 15, a TiO ₂ film 16 which is a high refractive index dielectric layer in the increased reflection structure is formed. This TiO ₂ film 1
In No. 6, since a high refractive index can be obtained by forming the film at room temperature without heating the substrate, two layers superposed with the Al ₂ O ₃ film 15 can sufficiently exhibit the reflection enhancing effect. The protective film may be formed by stacking appropriate alternating layers of a low-refractive index material and a high-refractive index material in consideration of spectral characteristics, if necessary.

If necessary, the uppermost layer is made of SiO 2.
The layers may be provided so thin that they do not affect the spectral characteristics. This makes it possible to obtain a mirror having higher durability.

According to the present embodiment configured as described above, it is possible to realize a high-performance high-reflection mirror having an extremely high reflectance by making use of the high-reflection characteristics of the Ag film 14 having a high reflectance. Has a high reflectance of about 97% or more. Further, in the high-reflection mirror according to the present embodiment, even in the light resistance test, it is possible to prevent corrosion due to the ultraviolet shielding effect of the Al film 12 of the second layer, the appearance and the adhesion are good, and the high light resistance is excellent. A reflective mirror can be obtained. Further, since the substrate heating process is not required when manufacturing the high-reflection mirror, the manufacturing process is simple, and the resin substrate, which is difficult to heat the substrate, has high adhesion and no problem in terms of durability.

Next, a high reflection mirror optical system according to another embodiment of the present invention will be described. The high-reflection mirror optical system in the present embodiment is configured as shown in FIG. 3, in which a metal oxide film 31 and an Ag film 32 as a metal reflection layer are laminated in this order on a substrate 30, and a protective film is formed thereon. Or, a member that blocks (does not transmit) ultraviolet rays, for example, an optical component 35 such as PMMA is arranged on the front surface of a reflection mirror 35 that is formed by laminating an Al ₂ O ₃ film 33 as a reflection enhancing film and a TiO ₂ film 34. Configure.

The substrate 30 is similar to the substrate 10 described above.
The materials that have been conventionally used for optical parts can be used.
For example, a glass substrate or a resin substrate (plastic substrate) such as a polycarbonate substrate or an acrylic substrate can be used, and as the metal oxide film 31, T
A metal oxide such as i, Al, Si, Ta or Zr is used.
FIG. 3 shows an example in which a TiO ₂ film is used as the metal oxide 31. As the metal reflection film, an Ag film having the highest reflectance in the visible range is used. Further, the protective film or the increased reflection film formed on the Ag film 33 as the metal reflection film is
Since it is the same as the above-described embodiment, its details are omitted.

In the high-reflection mirror optical system according to this embodiment, an optical component 36 such as PMMA for blocking ultraviolet rays is used.
By disposing the metal film (Ag), it is possible to prevent corrosion between the substrate 30 and the metal reflection film 32 due to the ultraviolet ray shielding effect of the optical component 36, and to have a good appearance and adhesion, and to have a high reflectance. By utilizing the original characteristics of the film, it is possible to realize a high reflection mirror optical system having excellent light resistance. further,
Similar to the high-reflection mirror in the above-described embodiment, it is possible to obtain a high-performance high-reflection mirror optical system that has high adhesion even on a resin substrate where it is difficult to heat the substrate and has no problem in terms of durability. In the present embodiment, it is possible to combine an optical component such as PMMA with a high-reflecting mirror in which an Al film that shields ultraviolet rays is laminated in the film structure similarly to the high-reflecting mirror of the above-described embodiments. Needless to say.

In the above-mentioned high-reflection mirror and high-reflection mirror optical system, an example in which the film structure shown in FIGS. 1 and 3 is formed only on one surface of the substrate is explained. Reflecting mirrors may be formed on both surfaces of the substrate by forming similar films.

The high-reflecting mirror and the high-reflecting mirror optical system configured as described above are excellent in adhesion, corrosion resistance, and light resistance, and have high productivity, and are high in cameras, copying machines, printers, and the like. It is suitable for functional optical equipment. Further, another optical component may be arranged before and / or after the optical component including the high-reflecting mirror or the high-reflecting mirror optical system to configure an optical device that ensures higher quality as a whole. .

[0028]

Next, the high-reflection mirror and the high-reflection mirror optical system according to the present invention will be described in more detail with reference to specific examples. However, the present invention is not limited to these.

(Embodiment 1) The film structure of the high-reflection mirror of this embodiment is configured as shown in FIG.

The polycarbonate substrate 20 is replaced with a nitrogen
After cleaning with a vacuum cleaner, 1 x 10 with a vacuum evaporation system^-FourP
After exhausting to the pressure of a, from the reaction gas introduction line
Introduce oxygen gas and heat SiO by resistance heating,
Λ in optical film thickness₁ / 2 (λ₁ : Design dominant wavelength) SiOx film
21 was deposited by reactive vapor deposition. Then Al is EB
To vapor-deposit 150 nm by heating to block ultraviolet rays
Al film 22 is formed, and then oxygen gas
Was introduced and the electron gun was used to₂ O₃ Λ₂ / 2 (λ₂ :
Design main wavelength) Al film is formed₂ O₃ The film 23 was formed. This
Al₂ O₃ Ag on the membrane 23 by EB heating to 150
nm to form an Ag film 24. Then, same as above
Oxygen gas is introduced, and the electron gun is used to₂ O₃ Λ₃ 
/ 4 (λ ₃ : Designed main wavelength) Al film is formed₂ O₃ Membrane 25
Formed. This Al₂ O₃ Al on the film 25₂ O₃ Same as
Similarly, with the same vacuum degree, TiO₂ Λ_Four / 4
(Λ _Four : Design dominant wavelength) TiO is formed into a film₂ Forming the membrane 26
It was

By producing the high reflection mirror as described above, the vapor deposition of the undercoat, the Ag film and the reflection enhancing film could all be continuously performed without heating the substrate.

As shown in FIG. 5, the spectral reflectance characteristics of the high reflection mirror thus obtained have wavelengths of 400 to 70.
It was confirmed to be approximately 97% or more in the 0 nm region.

(Embodiment 2) High-reflection mirror optics of this embodiment
As shown in FIG. 3, the system blocks the reflection mirror 35 and ultraviolet rays.
It is composed of an optical component 36 such as PMMA for shielding.
Therefore, the film structure of the reflection mirror 35 is formed as follows.
That is, the substrate 30 made of polycarbonate is blown with nitrogen.
After cleaning with a vacuum evaporation system, 1x10^-FourPa
After exhausting to the pressure of
Introduce elementary gas and use an electron gun to produce TiO 2. ₂ Heat the optics
Λ in film thickness₁ / 2 (λ₁ : Design dominant wavelength) TiO₂ Membrane 31
Is formed into a film, and then Ag is evaporated to 150 nm by EB heating.
Then, the Ag film 32 was formed. On top of that, acid
Introduce elementary gas and use an electron gun to Al₂ O₃ Λ₂ / 4
(Λ₂ : Designed main wavelength) Al film is formed₂ O₃ Form the film 33
And this Al₂ O₃ Al on the film 33₂ O₃ As well as electronic
TiO by gun₂ Λ₃ / 4 (λ₃ : Design dominant wavelength) Deposition
Then TiO₂ The film 34 was formed.

By producing the reflection mirror 35 as described above, the vapor deposition of the undercoat, the Ag film and the reflection enhancing film could all be continuously carried out without heating the substrate.

A high reflection mirror optical system is constructed by disposing optical components 36 such as PMMA that do not transmit ultraviolet rays in front of and behind the reflection mirror 35. In this example as well, a high reflectance could be obtained as in Example 1.

Next, as a comparative example with respect to the above-described Examples 1 and 2, the reflecting mirrors described below were produced to be Comparative Examples 1 and 2, and obtained in Examples 1 and 2 and Comparative Examples 1 and 2. A light resistance test was performed and evaluated for the reflection mirror and the optical system.

(Comparative Example 1) As shown in FIG. 4, a reflection mirror as Comparative Example 1 is a substrate 20 made of polycarbonate.
The Al film (22) was formed by the same procedure as in Example 1 described above.
Only the layers were removed and laminated in the same manner.

(Comparative Example 2) The reflective mirror as Comparative Example 2 has the film structure of the reflective mirror 35 shown in FIG. 3, and is formed on the polycarbonate substrate 30 by the same procedure as in Example 2 described above. In the same manner, the reflection mirror 35 was manufactured by stacking. In Comparative Example 2, the PMM shown in FIG.
Instead of disposing the optical component 35 such as A, light including ultraviolet rays was directly incident.

Embodiment 1 constructed as described above
And 2, and the high-reflection mirrors of Comparative Examples 1 and 2 and the high-reflection mirror optical system were subjected to a light resistance test and evaluated. The results of the evaluation test are summarized in Table 1.

[0040]

[Table 1]

Both the high-reflecting mirror of Example 1 and the high-reflecting mirror optical system of Example 2 were good in both the reflectance measurement after the light resistance test and the adhesion evaluation by the tape test.
Furthermore, no abnormalities such as spiders, film cracks, and film peeling were observed on the appearance.

On the other hand, in the reflecting mirrors of Comparative Examples 1 and 2, corrosion occurred, the appearance was not good, and the reflecting mirrors were easily peeled off by the adhesion test after the durable extraction, and the adhesion was poor. This is A that constitutes the metal reflection layer.
Since the g film transmits in the ultraviolet region, the ultraviolet light that has passed through the Ag film causes corrosion due to a photochemical reaction between the substrate and the Ag film, and this corrosion causes poor adhesion, resulting in poor adhesion. It was easily peeled off by the test, and spiders and film cracks appeared on the appearance.

As described above, the high-reflection mirror optical system of the first embodiment and the high-reflection mirror optical system of the second embodiment are made of Al in the film structure.
Corrosion can be prevented by the UV shielding effect of the film, or by the arrangement of optical components such as PMMA that block UV rays, and the appearance and adhesion are good, and the high reflectance and high The reflectance did not decrease with time and was excellent in light resistance. Further, since the substrate heating process is not required, the adhesiveness is good even on a resin substrate where it is difficult to heat the substrate, and the manufacturing process is simple and the manufacturing cost is low. An optical system can be provided.

[0044]

As described above, according to the present invention,
Due to the UV shielding effect of the Al film or the arrangement of optical components such as PMMA that shields UV rays, the corrosion resistance can be improved and the adhesiveness is good, and the high light resistance and high An inexpensive high-reflection mirror that has reflectivity and durability, and that the high reflectivity does not decrease with time and the substrate heating process is not required, so the manufacturing process is simple and the manufacturing cost is low. Alternatively, a high reflection mirror optical system can be realized.

[Brief description of drawings]

FIG. 1 is a diagram showing a film configuration of a high-reflection mirror according to an embodiment of the present invention.

FIG. 2 is a diagram showing a film structure of Example 1 of the high-reflection mirror of the present invention.

FIG. 3 is a diagram showing a high-reflection mirror optical system according to another embodiment of the present invention.

FIG. 4 is a diagram showing a film structure of Comparative Example 1.

FIG. 5 is a graph showing the spectral reflectance of Example 1 of the high-reflection mirror of the present invention.

[Explanation of symbols]

10, 20 Substrate 11, 21 SiOx film 12, 22 Al film 13, 23 Al ₂ O ₃ film (metal oxide film) 14, 24 Ag film (metal reflective film) 15, 25 Al ₂ O ₃ film 16, 26 TiO ₂ Film 30 Substrate 31 TiO ₂ Film 32 Ag Film 33 Al ₂ O ₃ Film 34 TiO ₂ Film 35 High Reflection Mirror 36 Optical Components (PMMA) for Shielding Ultraviolet Light

Claims (9)

[Claims] 1. From the substrate side, the first layer is a SiOx film, the second layer is an Al film, the third layer is a metal oxide, the fourth layer is an Ag film as a metal reflection film, and a protective film or an additional film thereon. A high-reflection mirror characterized in that a reflection film is laminated in this order. 2. The metal oxide of the third layer is Ti,
The high reflection mirror according to claim 1, which is a metal oxide of Al, Si, Ta, or Zr. 3. The high reflection film according to claim 1, wherein the protective film is laminated with alternating layers of a low refractive index material and a high refractive index material in consideration of spectral characteristics, if necessary. mirror. 4. The first layer is formed on both sides of the substrate by Si, respectively.
An Ox film, a second layer is an Al film, a third layer is a metal oxide, a fourth layer is an Ag film as a metal reflection film, and a protective film or an increased reflection layer is further stacked in this order on the Ag film. A high-reflection mirror characterized in that 5. An optical for shielding ultraviolet rays from a high reflection mirror which is formed by laminating at least a metal oxide film and an Ag film as a metal reflection layer on a substrate in this order, and further laminating a protective film or a reflection increasing film thereon. A high-reflection mirror optical system characterized by being configured by combining parts. 6. The high-reflection mirror optical system according to claim 5, wherein the optical component for blocking ultraviolet rays is PMMA. 7. The metal oxide is Ti, Al, S
7. The high reflection mirror optical system according to claim 5, which is a metal oxide of i, Ta, or Zr. 8. The protective film is formed by stacking alternating layers of a low refractive index material and a high refractive index material in consideration of spectral characteristics, if necessary. The high-reflection mirror optical system described in the item. 9. A high reflection mirror according to any one of claims 1 to 4 or an optical component including the high reflection mirror optical system according to any one of claims 5 to 8 and / or Alternatively, an optical device further including another optical component later.