JP2018120017A - Gamma ray-resistant reflection film - Google Patents

Gamma ray-resistant reflection film Download PDF

Info

Publication number
JP2018120017A
JP2018120017A JP2017009466A JP2017009466A JP2018120017A JP 2018120017 A JP2018120017 A JP 2018120017A JP 2017009466 A JP2017009466 A JP 2017009466A JP 2017009466 A JP2017009466 A JP 2017009466A JP 2018120017 A JP2018120017 A JP 2018120017A
Authority
JP
Japan
Prior art keywords
metal
gamma ray
film
layer
gamma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017009466A
Other languages
Japanese (ja)
Other versions
JP6870341B2 (en
Inventor
直文 丸山
Naofumi Maruyama
直文 丸山
直樹 三須
Naoki Misu
直樹 三須
叙夫 平川
Nobuo Hirakawa
叙夫 平川
仁美 笹尾
Hitomi Sasao
仁美 笹尾
務 竹内
Tsutomu Takeuchi
務 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Seikan Group Holdings Ltd
Original Assignee
Toyo Seikan Group Holdings Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Seikan Group Holdings Ltd filed Critical Toyo Seikan Group Holdings Ltd
Priority to JP2017009466A priority Critical patent/JP6870341B2/en
Publication of JP2018120017A publication Critical patent/JP2018120017A/en
Application granted granted Critical
Publication of JP6870341B2 publication Critical patent/JP6870341B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Optical Elements Other Than Lenses (AREA)
  • Endoscopes (AREA)
  • Laminated Bodies (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a gamma ray-resistant reflection film having resistance to gamma rays.SOLUTION: A gamma ray-resistant reflection film has a reflection film 2 formed on the top of a quartz glass base material 1. The reflection film 2 has a metal reflection layer 22, and a protection layer 24 formed on the metal reflection layer 22 and composed of a metal or alloy with 0.799 V or more of standard electrode potential.SELECTED DRAWING: Figure 1

Description

本発明は、耐ガンマ線反射膜に関し、より詳細には、石英ガラス基材のような基材の一部表面に形成され、ガンマ線照射に対して耐性を有する耐ガンマ線反射膜に関する。   The present invention relates to a gamma ray reflective film, and more particularly to a gamma ray reflective film formed on a partial surface of a substrate such as a quartz glass substrate and having resistance to gamma ray irradiation.

医学分野では、標準的な滅菌方法として、ガンマ線照射による医療機器の滅菌処理が行われている。ガンマ線照射により滅菌可能な光ファイバの一例が、特許文献1に記載されている。この特許文献1に記載の光ファイバには、水素含有光ファイバから外部への水素の拡散を抑制するために金属のコーティングが施されている。また、光ファイバの端面には、酸化アルミニウムなどの金属酸化物のコーティングが施されている。   In the medical field, as a standard sterilization method, medical devices are sterilized by gamma irradiation. An example of an optical fiber that can be sterilized by gamma irradiation is described in Patent Document 1. The optical fiber described in Patent Document 1 is coated with a metal in order to suppress diffusion of hydrogen from the hydrogen-containing optical fiber to the outside. The end face of the optical fiber is coated with a metal oxide such as aluminum oxide.

また、ガンマ線滅菌される医療機器の一例として、光干渉断層撮影法(OCT,Optical Coherence Tomography)に使用される光プローブが挙げられる。OCTでは、患者の体内に挿入した光プローブの先端から側方にコヒーレント光を出射するとともに反射光を受光し、器官内の断層画像を生成する。
なお、光プローブの多くは、器官が傷つくことを防止するため、耐薬品性が高く摩擦の少ないフッ素樹脂製のチューブで被覆されている。
An example of a medical device to be sterilized with gamma rays is an optical probe used for optical coherence tomography (OCT). In OCT, coherent light is emitted laterally from the tip of an optical probe inserted into a patient's body, and reflected light is received to generate a tomographic image in the organ.
Many of the optical probes are covered with a fluororesin tube having high chemical resistance and low friction in order to prevent the organ from being damaged.

特開平11−343144号公報JP-A-11-343144

金属反射膜を蒸着した光ファイバ等の医療機器にガンマ線を照射すると、金属反射膜が変質し、剥離したように見える現象(以下、「剥離現象」と称する。)が発生することがある。この剥離現象について本願に係る発明者は種々の実験及び検討を重ねた結果、この剥離現象が、医療機器を被覆するフッ素樹脂製のチューブ等が存在する場合にのみ発生することを見出した。また、フッ素樹脂にガンマ線を照射したところ、フッ化物が検出された。さらに、金属反射膜が変質した部分の付着物をラマン分光測定したところ、フッ化アルミニウムのラマンスペクトルと同様に158cm−1にピークを有するスペクトルが観測された。これらの結果から、剥離現象は、ガンマ線照射によりフッ素樹脂が僅かに分解され、発生したフッ素ラジカルが金属反射膜と反応したことによって発生したものであると考えられる。 When gamma rays are irradiated to a medical device such as an optical fiber on which a metal reflection film is deposited, the metal reflection film may be altered and a phenomenon that appears to be peeled off (hereinafter referred to as “peeling phenomenon”) may occur. As a result of repeated experiments and studies on the peeling phenomenon, the inventors of the present application have found that this peeling phenomenon occurs only when there is a fluororesin tube or the like covering the medical device. Moreover, when the fluororesin was irradiated with gamma rays, fluoride was detected. Furthermore, when the spectroscopic measurement of the deposit on the part where the metal reflective film was altered was performed, a spectrum having a peak at 158 cm −1 was observed, similar to the Raman spectrum of aluminum fluoride. From these results, it is considered that the peeling phenomenon is caused by the fact that the fluorine resin is slightly decomposed by gamma ray irradiation and the generated fluorine radicals react with the metal reflecting film.

本発明は、かかる事情に鑑みてなされたものであり、ガンマ線照射に対して耐性を有する耐ガンマ線反射膜の提供を目的としている。   The present invention has been made in view of such circumstances, and an object of the present invention is to provide a gamma ray reflective film having resistance to gamma ray irradiation.

本発明に係る耐ガンマ線反射膜は、基材の一部表面上に形成された反射膜を備え、前記反射膜は、金属反射層と、前記金属反射層の上側に形成された0.799ボルト以上の標準電極電位を有する金属又は合金で形成された保護層と
を有することを特徴としている。
The anti-gamma ray reflective film according to the present invention includes a reflective film formed on a partial surface of a substrate, and the reflective film has a metal reflective layer and 0.799 volts formed on the metal reflective layer. And a protective layer formed of a metal or alloy having the above standard electrode potential.

本発明の耐ガンマ線反射膜は、金属反射層の上側に、0.799ボルト以上の標準電極電位を有するイオン化傾向の低い金属又は合金で形成された保護層を有する。このようにイオン化傾向の小さい金属で保護層を形成することにより、金属反射層と、ガンマ線照射により発生したフッ素ラジカルとの反応を抑制し、ガンマ線の照射による反射膜のダメージを抑制することができる。   The gamma ray reflective film of the present invention has a protective layer made of a metal or alloy having a standard electrode potential of 0.799 volts or more and a low ionization tendency on the upper side of the metal reflective layer. By forming the protective layer with a metal having a low ionization tendency in this way, it is possible to suppress the reaction between the metal reflection layer and fluorine radicals generated by gamma ray irradiation, and to suppress damage to the reflection film due to gamma ray irradiation. .

本発明の実施形態に係る耐ガンマ線反射膜の断面模式図である。It is a cross-sectional schematic diagram of the gamma ray resistant reflective film which concerns on embodiment of this invention.

以下、本発明の好ましい実施形態について、図面を参照しつつ説明する。   Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

図1に、本発明に係る耐ガンマ線反射膜の断面模式図を示す。同図に示すように、本実施形態の耐ガンマ線反射膜は、石英ガラス基材1の上面に形成された反射膜2を備えている。   FIG. 1 is a schematic cross-sectional view of a gamma-resistant reflective film according to the present invention. As shown in the figure, the anti-gamma ray reflective film of this embodiment includes a reflective film 2 formed on the upper surface of a quartz glass substrate 1.

さらに、石英ガラス基材1は、不図示のフッ素樹脂製のチューブで被覆されている。フッ素樹脂としては、例えば、ポリテトラフルオロエチレン(PTFE)、四フッ化エチレン・六フッ化プロピレン共重合体(FEP)、及び、ポリフッ化ビニリデン(PVDF)が挙げられるが、これらに限定されない。   Further, the quartz glass substrate 1 is covered with a fluororesin tube (not shown). Examples of the fluororesin include, but are not limited to, polytetrafluoroethylene (PTFE), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), and polyvinylidene fluoride (PVDF).

石英ガラス基材1は、光ファイバや屈折率分布(Gradient Index,GRIN)レンズのような光伝播部材で構成されるのがよい。また、耐ガンマ線反射膜2は、石英ガラス基材1の鏡面研磨した表面に形成されるのがよく、耐ガンマ線反射膜2は、石英ガラス基材1の内部を伝播してきた光を反射してもよいし、外部からの光を反射してもよい。   The quartz glass substrate 1 is preferably composed of a light propagation member such as an optical fiber or a refractive index distribution (Gradient Index, GRIN) lens. The anti-gamma ray reflecting film 2 is preferably formed on the mirror-polished surface of the quartz glass substrate 1, and the anti-gamma ray reflecting film 2 reflects light propagating through the inside of the quartz glass substrate 1. Alternatively, light from the outside may be reflected.

反射膜2は、石英ガラス基材1の上面に、アンダーコート層21、金属反射層22、中間コート層23、保護層24、及びトップコート層25を順次に蒸着することにより形成された積層構造を有している。   The reflection film 2 is formed by sequentially depositing an undercoat layer 21, a metal reflection layer 22, an intermediate coat layer 23, a protective layer 24, and a topcoat layer 25 on the upper surface of the quartz glass substrate 1. have.

アンダーコート層21は、例えば、厚さ100nmのAlの蒸着膜で形成され、金属反射層22と石英ガラス基材1との接着性を高める効果を有することが好ましい。 The undercoat layer 21 is preferably formed of, for example, a deposited film of Al 2 O 3 having a thickness of 100 nm, and has an effect of improving the adhesion between the metal reflective layer 22 and the quartz glass substrate 1.

金属反射層22は、例えば、厚さ100nmのアルミニウム(Al)の蒸着膜で形成される。なお、金属反射層22は、アルミニウムに限定されず、例えば、銀(Ag)の蒸着膜を形成してもよい。   The metal reflection layer 22 is formed of, for example, a vapor deposition film of aluminum (Al) having a thickness of 100 nm. In addition, the metal reflective layer 22 is not limited to aluminum, For example, you may form the vapor deposition film of silver (Ag).

また、中間コート層23は、例えば、厚さ100nmのSiOの蒸着膜で形成され、金属反射層22と保護層24との接着性を高める効果を有することが好ましい。 The intermediate coat layer 23 is formed of, for example, SiO 2 deposited film with a thickness of 100 nm, it is preferable to have an effect of enhancing the adhesion between the protective layer 24 and the metal reflective layer 22.

さらに、トップコート層25は、例えば、厚さ50nmのTiやMgFの蒸着膜で形成され、反射膜2の反射量増加の効果を有することが好ましい。 Furthermore, the topcoat layer 25 is preferably formed of, for example, a deposited film of Ti 3 O 5 or MgF 2 having a thickness of 50 nm, and has an effect of increasing the amount of reflection of the reflective film 2.

ここで、表1に、保護層24として、種々の材料で厚さ150nmの蒸着膜を形成した場合のガンマ線耐性の試験結果を示す。ガンマ線耐性の試験にあたっては、50kGyのガンマ線を照射し、さらに、気温55℃かつ湿度95%のチャンバ内での6時間の高温高湿試験を経た後、反射膜2を観察して耐性を評価した。   Here, Table 1 shows a test result of gamma ray resistance when a deposited film having a thickness of 150 nm is formed of various materials as the protective layer 24. In the gamma ray resistance test, 50 kGy gamma ray was irradiated, and after a high temperature and high humidity test for 6 hours in a chamber with an air temperature of 55 ° C. and a humidity of 95%, the reflection film 2 was observed to evaluate the resistance. .

Figure 2018120017
Figure 2018120017

上記の表1に示すように、保護層24を、1.5Vの標準電極電位を有する金(Au)、又は0.799Vの標準電極電位を有する銀(Ag)の蒸着膜として形成した場合には、試験後も反射膜2がきれいに残っていた。
一方、保護層24を設けなかった場合、及び、保護層24を、0.345Vの標準電極電位を有する銅(Cu)、又は−0.146Vの標準電極電位を有する錫(Sn)の蒸着膜として形成した場合には、試験後に反射膜2の剥離現象が発生した。
As shown in Table 1 above, when the protective layer 24 is formed as a vapor deposition film of gold (Au) having a standard electrode potential of 1.5 V or silver (Ag) having a standard electrode potential of 0.799 V The reflective film 2 remained clean even after the test.
On the other hand, when the protective layer 24 is not provided, and the protective layer 24 is a deposited film of copper (Cu) having a standard electrode potential of 0.345V or tin (Sn) having a standard electrode potential of -0.146V. As a result, the peeling phenomenon of the reflective film 2 occurred after the test.

上記の試験結果から、0.799ボルト以上の標準電極電位を有するイオン化傾向の低い金属で保護層24を形成した場合に、剥離現象の発生が回避されている。したがって、剥離現象の発生を回避するためには、耐ガンマ線反射膜の保護層24は、0.799ボルト以上の標準電極電位を有する金属で形成することが望ましい。
なお、保護層24は、0.799ボルト以上の標準電極電位を有する、金、銀、パラジウム又は白金をベースとした合金で形成してもよい。
From the above test results, the occurrence of the peeling phenomenon is avoided when the protective layer 24 is formed of a metal having a standard electrode potential of 0.799 volts or more and a low ionization tendency. Therefore, in order to avoid the occurrence of the peeling phenomenon, it is desirable to form the protective layer 24 of the anti-gamma ray reflective film with a metal having a standard electrode potential of 0.799 volts or more.
The protective layer 24 may be formed of an alloy based on gold, silver, palladium, or platinum having a standard electrode potential of 0.799 volts or more.

以上、本発明の実施形態を説明したが、本発明は、上述した実施形態に限定されるものではなく、本発明の範囲で種々の変更実施が可能である。例えば、上述した実施形態では、石英ガラス基材上に耐ガンマ線反射膜を形成した例を説明したが、本発明では、基材の材料はこれに限定されず、種々の材料を採用することができる。また、基材の形態も限定されない。特に、反射膜を形成する光伝播部材の表面は平面に限定されず、曲面であってもよい。   Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications can be made within the scope of the present invention. For example, in the above-described embodiment, an example in which a gamma-ray reflective film is formed on a quartz glass substrate has been described. However, in the present invention, the material of the substrate is not limited to this, and various materials can be adopted. it can. Further, the form of the substrate is not limited. In particular, the surface of the light propagation member forming the reflective film is not limited to a flat surface, and may be a curved surface.

本発明は、光干渉断層撮影法(Optical Coherence Tomography, OCT)用の光プローブをはじめとする、ガンマ線照射による滅菌処理が必要な種々の医療機器に適用して好適である。また、本発明は、ガンマ線により被曝することが予想される原子炉周辺で測定等に使用される機器や、宇宙空間において使用される機器にも適用して好適である。   The present invention is suitable for application to various medical devices that require sterilization by gamma irradiation, such as optical probes for optical coherence tomography (OCT). The present invention is also suitable for application to equipment used for measurement around a nuclear reactor that is expected to be exposed to gamma rays, and equipment used in outer space.

1 石英ガラス基材
2 反射膜
21 アンダーコート層
22 金属反射層
23 中間コート層
24 保護層
25 トップコート層
DESCRIPTION OF SYMBOLS 1 Quartz glass base material 2 Reflective film 21 Undercoat layer 22 Metal reflective layer 23 Intermediate coat layer 24 Protective layer 25 Topcoat layer

Claims (5)

基材の一部表面上に形成された反射膜を備え、
前記反射膜は、
金属反射層と、
前記金属反射層の上側に形成された0.799ボルト以上の標準電極電位を有する金属又は合金で形成された保護層と
を有することを特徴とする、耐ガンマ線反射膜。
A reflective film formed on a part of the surface of the substrate;
The reflective film is
A metal reflective layer;
And a protective layer made of a metal or alloy having a standard electrode potential of 0.799 volts or more formed on the metal reflective layer.
前記基材は、光伝播部材であり、
前記反射膜は、前記光伝搬部材内を伝播してきた光を反射する
ことを特徴とする、請求項1記載の耐ガンマ線反射膜。
The base material is a light propagation member,
2. The anti-gamma ray reflection film according to claim 1, wherein the reflection film reflects light propagating through the light propagation member.
前記基材の少なくとも一部が、フッ素樹脂で被覆されている
ことを特徴とする、請求項1又は2記載の耐ガンマ線反射膜。
The gamma ray reflective film according to claim 1 or 2, wherein at least a part of the substrate is coated with a fluororesin.
前記金属反射層は、アルミニウムの蒸着膜である
ことを特徴とする、請求項1〜3のいずれか一項に記載の耐ガンマ線反射膜。
The gamma-ray reflective film according to claim 1, wherein the metal reflective layer is an aluminum vapor deposition film.
前記保護層は、金又は銀の蒸着膜である
ことを特徴とする、請求項1〜4のいずれか一項に記載の耐ガンマ線反射膜。
The said protective layer is a vapor deposition film | membrane of gold | metal | money or silver, The gamma-ray reflective film as described in any one of Claims 1-4 characterized by the above-mentioned.
JP2017009466A 2017-01-23 2017-01-23 Gamma-ray resistant film Active JP6870341B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2017009466A JP6870341B2 (en) 2017-01-23 2017-01-23 Gamma-ray resistant film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017009466A JP6870341B2 (en) 2017-01-23 2017-01-23 Gamma-ray resistant film

Publications (2)

Publication Number Publication Date
JP2018120017A true JP2018120017A (en) 2018-08-02
JP6870341B2 JP6870341B2 (en) 2021-05-12

Family

ID=63044986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017009466A Active JP6870341B2 (en) 2017-01-23 2017-01-23 Gamma-ray resistant film

Country Status (1)

Country Link
JP (1) JP6870341B2 (en)

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713406A (en) * 1980-06-26 1982-01-23 Nhk Spring Co Ltd Reflecting mirror and its manufacture
JPH01105901U (en) * 1988-01-07 1989-07-17
JP2000019019A (en) * 1998-07-03 2000-01-21 Omron Corp Infrared detector
JP2001264523A (en) * 2000-03-15 2001-09-26 Olympus Optical Co Ltd Reflection mirror
JP2002214418A (en) * 2001-01-17 2002-07-31 Morita Mfg Co Ltd Reflecting mirror and hollow waveguide
JP2002341155A (en) * 2001-05-16 2002-11-27 Machida Endscope Co Ltd Hollow optical fiber and method for manufacturing the same
JP2003121623A (en) * 2001-10-12 2003-04-23 Canon Inc High reflective mirror and high reflective mirror optical system
JP2007258647A (en) * 2006-03-27 2007-10-04 Nichia Chem Ind Ltd Semiconductor light emitting device, and semiconductor light emitting element
JP2010014466A (en) * 2008-07-02 2010-01-21 National Institute Of Advanced Industrial & Technology Light utilizing type plasma torch and plasma torch holder
JP2010204380A (en) * 2009-03-03 2010-09-16 Kyocera Optec Co Ltd Light reflecting mirror and method of manufacturing the same
JP2011228104A (en) * 2010-04-19 2011-11-10 Panasonic Electric Works Co Ltd Illumination fixture
KR101375238B1 (en) * 2013-10-14 2014-03-18 신창핫멜트 주식회사 Reflective film with two metal reflective components
JP2014071321A (en) * 2012-09-28 2014-04-21 Fujifilm Corp Film mirror and composite film used for the same
JP2016095456A (en) * 2014-11-17 2016-05-26 旭硝子株式会社 Video display transparent member, video display system, and video display method
JP2016214376A (en) * 2015-05-15 2016-12-22 アンリツ株式会社 Photodynamic treatment device for endoscope

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5713406A (en) * 1980-06-26 1982-01-23 Nhk Spring Co Ltd Reflecting mirror and its manufacture
JPH01105901U (en) * 1988-01-07 1989-07-17
JP2000019019A (en) * 1998-07-03 2000-01-21 Omron Corp Infrared detector
JP2001264523A (en) * 2000-03-15 2001-09-26 Olympus Optical Co Ltd Reflection mirror
JP2002214418A (en) * 2001-01-17 2002-07-31 Morita Mfg Co Ltd Reflecting mirror and hollow waveguide
JP2002341155A (en) * 2001-05-16 2002-11-27 Machida Endscope Co Ltd Hollow optical fiber and method for manufacturing the same
JP2003121623A (en) * 2001-10-12 2003-04-23 Canon Inc High reflective mirror and high reflective mirror optical system
JP2007258647A (en) * 2006-03-27 2007-10-04 Nichia Chem Ind Ltd Semiconductor light emitting device, and semiconductor light emitting element
JP2010014466A (en) * 2008-07-02 2010-01-21 National Institute Of Advanced Industrial & Technology Light utilizing type plasma torch and plasma torch holder
JP2010204380A (en) * 2009-03-03 2010-09-16 Kyocera Optec Co Ltd Light reflecting mirror and method of manufacturing the same
JP2011228104A (en) * 2010-04-19 2011-11-10 Panasonic Electric Works Co Ltd Illumination fixture
JP2014071321A (en) * 2012-09-28 2014-04-21 Fujifilm Corp Film mirror and composite film used for the same
KR101375238B1 (en) * 2013-10-14 2014-03-18 신창핫멜트 주식회사 Reflective film with two metal reflective components
JP2016095456A (en) * 2014-11-17 2016-05-26 旭硝子株式会社 Video display transparent member, video display system, and video display method
JP2016214376A (en) * 2015-05-15 2016-12-22 アンリツ株式会社 Photodynamic treatment device for endoscope

Also Published As

Publication number Publication date
JP6870341B2 (en) 2021-05-12

Similar Documents

Publication Publication Date Title
Follette et al. Mapping H-band scattered light emission in the mysterious SR21 transitional disk
CN111295602B (en) Method for producing light absorber
JPWO2016159290A1 (en) Antireflection film and method for manufacturing the same
Siddiqui et al. Airway wall geometry in asthma and nonasthmatic eosinophilic bronchitis
WO2014148479A1 (en) Structure provided with antifouling amorphous carbon film and method for forming antifouling amorphous carbon film
Dominic et al. Facile fabrication of superhydrophobic brass surface for excellent corrosion resistance
JP6870340B2 (en) Gamma-ray resistant film
JP6870341B2 (en) Gamma-ray resistant film
Bohorquez et al. Wavelength and intensity based lossy mode resonance breathing sensor
Lepojević et al. Characterisation of NiTi orthodontic archwires surface after the simulation of mechanical loading in CACO2-2 cell culture
Sharma et al. Validation of columnar CsI x‐ray detector responses obtained with hybridMANTIS, a CPU‐GPU Monte Carlo code for coupled x‐ray, electron, and optical transport
JP2013181916A (en) Radiation absorbing grid for radiographic imaging, manufacturing method thereof, and radiographic imaging system
Ahangar et al. The effect of adsorbed volatile organic compounds on an ultrathin water film measurement
Brindha et al. Evaluation of tensile strength and surface topography of orthodontic wires after infection control procedures: An: in vitro: study
Chaturvedi Corrosion of orthodontic brackets in different spices: In vitro: study
EP3124227A1 (en) Gas-barrier film and process for producing gas-barrier film
Xu et al. Semiparametric estimation of time‐varying intervention effects using recurrent event data
Matsuura et al. Soft-x-ray hollow fiber optics with inner metal coating
Yang et al. Transparent and ultra-flexible PEDOT: PSS/ITO/Ag/ITO on Parylene thin films with tunable properties
Vera et al. Wear resistance of anodic titanium dioxide films produced on Ti-6Al-4V alloy
WO2023038023A1 (en) Article provided with anti-viral microstructure, method for transferring anti-viral microstructure, and method for inactivating virus
Tantradi et al. Role of bitewing in enhancing the assessment of DMFS index in a group of Indian adolescents
Vacas-Jacques et al. Forward-calculated analytical interferograms in pass-through photon-based biomedical transillumination
JP6177466B2 (en) Endoscope
JP2002214418A (en) Reflecting mirror and hollow waveguide

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20191211

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200916

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200923

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20201113

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20210316

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20210329

R150 Certificate of patent or registration of utility model

Ref document number: 6870341

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150