JPH0875902A - Multilayer reflection preventing film - Google Patents

Multilayer reflection preventing film

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Publication number
JPH0875902A
JPH0875902A JP6239371A JP23937194A JPH0875902A JP H0875902 A JPH0875902 A JP H0875902A JP 6239371 A JP6239371 A JP 6239371A JP 23937194 A JP23937194 A JP 23937194A JP H0875902 A JPH0875902 A JP H0875902A
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Prior art keywords
refractive index
lt
index layer
layer
low
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Japanese (ja)
Inventor
Kenji Ando
Riyuuji Hiroo
Yasuyuki Suzuki
謙二 安藤
竜二 枇榔
康之 鈴木
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Canon Inc
キヤノン株式会社
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Priority to JP6239371A priority Critical patent/JPH0875902A/en
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Abstract

PURPOSE: To produce a reflection preventing film having a low optical absorption in visible ray region, excellent reflection preventing property and excellent adhesion to a substrate at a low temp. by laminating alternately a low refractive index layer, which contains SiO2 , and a high refractive index layer, which contains TiO2 , so as to have 6 layers successively from the air side and specifying the refractive index of the low refractive index layer. CONSTITUTION: The low refractive index layers L and the high refractive index layers H are alternately laminated on the substrate G successively from the air side so as to have 6 layers in total. When the low refractive index layer L contains SiO2 , the high refractive index layer H contains TiO2 and when each refractive index of the high refractive index layer H and the low refractive index layer L with respect to 600nm wave length is denoted respectively by NH and NL, NH and NL are set to 2.40<=NH<=2.80 and 1.39<=NL<=1.48. Particularly when the 6 layers are counted successively from the air side to make a i-th layer and the optical film thickness of the i-th layer is expressed by Di (unit nm), then the Di satisfies 95<=D1<=145, 30<=D2<=50, 10<=D3<=22, 170<=D4<=270, 20<=D5<=47 and 25<=D6<=45.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は、反射防止膜に関し、特にガラスやプラスチック等、透明な材質からなる光学素子基板の表面に所定の屈折率層を複数積層した反射防止膜に関するものである。 The present invention relates to relates to an antireflection film, is particularly glass or plastic, to a transparent antireflection film a predetermined refractive index layer on the surface of the optical element substrate stacking a plurality of made of a material.

【0002】 [0002]

【従来の技術】従来よりTiO 2を含む高屈折率層とSiO 2を含む低屈折率層を透明基板面上に交互に複数積層した赤外光用の反射防止膜が例えば、特開平2-69701 号公報で提案されている。 BACKGROUND ART antireflection film conventionally plurality alternately laminating a low refractive index layer on a transparent substrate surface including the high refractive index layer and the SiO 2 containing TiO 2 were infrared light, for example, JP-2- It proposed in 69701 JP. 同公報で提案されている赤外光用の反射防止膜は、カメラ等で要求される波長が400nm 以上で Antireflection film for infrared light, which is proposed in this publication, at a wavelength required by the camera or the like is 400nm or more
700nm 以下の可視光域では反射防止性能を有していない。 700nm or less of the visible light region do not have the anti-reflection performance.

【0003】 [0003]

【発明が解決しようとする課題】一般に反射防止膜は次の事項が要求されている。 Generally an antireflection film [0008] are required following items. 反射率、吸収率が極力低く、透過率が極力高いこと。 Reflectance, absorptance as low as possible, the transmittance can as high as possible. 上記特性を所望の波長範囲で発揮すること。 To exert the properties at a desired wavelength range.

【0004】まずの要求特性の内吸収率に関しては、 [0004] With respect to First inner absorption rate of the required characteristics of,
膜を構成する諸材料例えばTiO 2 ,Y 2 O 3 ,Ta 2 O 5 ,HfO 2 ,ZrO 2 Various materials such as TiO 2 constituting the membrane, Y 2 O 3, Ta 2 O 5, HfO 2, ZrO 2
などの単層膜は全て可視光域で吸収の発生は見られなく、膜の材料として性能の差異は無い。 Monolayer film all not observed the occurrence of absorption in the visible regions, such as, the difference in performance as a material of the film is not. 低反射率の反射防止膜を構成するには高屈折率材と低屈折率材を交互に積層すれば良いことが知られている。 To configure the antireflection film of low reflectance is known to a high refractive index material and the low refractive index material may be alternately stacked. そこで低反射率、 So low reflectance,
高透過率性能がどうであるかは、高屈折率材と低屈折率材を交互に堆積させたときの多層膜の性能で判断しなければならない。 Are either if high transmittance performance, must determine by the performance of the multilayer film when the high refractive index material and the low refractive index material deposited alternately.

【0005】かかる多層膜を構成する場合、高屈折率材料と低屈折率材料との屈折率差が大きい程、低反射率、 [0005] In such a case constituting the multilayer film, as the refractive index difference between the high and low index materials is large, low reflectance,
高透過率の性能を得易く、又の要求にも応え易い。 Easy to obtain the performance of high transmittance, easily meet to also request. つまり望ましい反射防止特性を得易くなる。 That is, easy to obtain the desired anti-reflection characteristics.

【0006】特に、どちらかといえば、高屈折率材料の屈折率の高低が反射防止特性の良否を支配するので、40 [0006] In particular, if anything, since high and low refractive index of the high refractive index material will dominate the quality of the anti-reflective properties, 40
0nm から700nm のような広範囲で良好な反射防止特性を実現するには、できるだけ高屈折率材料を使うことが望ましい。 To achieve a wide range with a good anti-reflective properties, such as 700nm from 0 nm, it is desirable to use as much as possible high refractive index material. この点からはTa 2 O 5 ,HfO 2 ,ZrO 2はTiO 2と比較して屈折率が低いので、特に良好な反射防止特性は得難い。 Since from this point Ta 2 O 5, HfO 2, ZrO 2 has a lower refractive index compared to TiO 2, particularly good anti-reflective properties difficult to obtain.

【0007】一方、低屈折率材料としてよく使用される On the other hand, it is often used as a low refractive index material
MgF 2は、SiO 2よりも若干屈折率が低く、前記の事情から低反射率、かつ高透過率の特性を得るには好都合の材料である。 MgF 2 has a lower slightly refractive index than SiO 2, low reflectance from the circumstances, and is advantageous for the material to obtain the characteristics of high transmittance. しかし、常温の基板上にMgF 2を成膜すると、これは基板との密着性が悪く膜がはがれ易い。 However, when forming the MgF 2 on the ambient temperature of the substrate, which is easy peeling adhesion is poor film to the substrate. これを解決するには基板を加熱すれば良いが、そうすると成膜装置に加熱機構を設けたり、成膜プロセス自体にも加熱のプロセスを入れなければならなくなり、コストが上昇する。 May be heating the substrate to solve this problem, but then may be provided a heating mechanism to the film forming apparatus, it MUST also put process heating deposition process itself, the cost is increased. 更に、場合によっては加熱による光学素子の表面形状の変化が起きるため、例えばプラスチックスのような低融点材料からなる基板には加工することが難しかった。 Further, since if the change in the surface shape of the optical element due to heating occurs by, on the substrate, for example made of a low-melting-point material such as plastics it is difficult to process.

【0008】また、これらTiO 2やSiO 2膜は可視域で光学的吸収が発生しないというものの、厳密には極微量ではあるが存在するため、幾層も積層すると光学的吸収が顕著に現れる。 [0008] Although these TiO 2 and SiO 2 film rather have optical absorption in the visible region does not occur, because strictly speaking it is a very small amount is present, also the optical absorption noticeable when stacking several layers. また膜と膜との界面で吸収が発生することもあるため、これらの見地から鑑みると積層数は少ない方が良好な膜が得られる。 Further, since the absorption at the interface between the film and the film is sometimes generated, the number of stacked layers and light of these aspects are good film can be obtained lesser. しかし、積層数を少なくすると上記の要求に応えにくい、即ち所望の反射防止特性を得にくくなる。 However, to reduce the number of stacked layers hardly meet the above requirements, that is difficult to obtain the desired anti-reflection characteristics. であるから反射防止膜は、良好な反射防止特性と光学的吸収がないことの両方を満たす積層数及びその膜厚を最適化する事が望まれる。 Antireflection film since it is, it is desired to optimize the number of stacked layers and thickness satisfy both that there is no satisfactory anti-reflection characteristics and optical absorption.

【0009】本発明の目的は、波長400nm から700nm の可視光域で光学的吸収が少く、良好な反射防止特性を有し、基板との密着性が優れ、かつ低温で製造できる反射防止膜を提供することである。 An object of the present invention, the optical absorption is less in the visible light region of 700nm wavelength 400 nm, have a good anti-reflective properties, excellent adhesion to the substrate, and an antireflection film can be produced at low temperatures it is to provide.

【0010】 [0010]

【課題を解決するための手段】本発明の反射防止膜の構成は、 (1−1)透明な基板の上に空気側から順に低屈折率層と高屈折率層を交互に全体として6層積層する際、該低屈折率層はSiO 2を含み、該高屈折率層はTiO 2を含み、波長600nm に対する該高屈折率層と該低屈折率層の屈折率を各々N H ,N Lとする時、 2.40≦N H ≦2.80 1.39≦N L ≦1.48 であることを特徴としている。 Configuration of the antireflection film SUMMARY OF THE INVENTION The present invention, (1-1) 6-layer as a whole from the air side alternately a low refractive index layer and a high refractive index layer in this order on a transparent substrate when stacking, low refractive index layer comprises SiO 2, the high refractive index layer comprises TiO 2, each N H refractive index of the high refractive index layer and the low refractive index layer with respect to the wavelength 600 nm, N L when a is characterized by a 2.40 ≦ N H ≦ 2.80 1.39 ≦ N L ≦ 1.48.

【0011】特に、(1−1−1)前記6層を空気側から順に数えて第i層(i=1〜6)とし、第i層の光学的膜厚をDi(単位nm)とするとき、 95≦D1≦145 30≦D2≦ 50 10≦D3≦ 22 170≦D4≦270 20≦D5≦ 47 25≦D6≦ 45 を満たすこと等を特徴としている。 [0011] In particular, (1-1-1) the 6-layer and the i-th layer counting from the air side in order and (i = 1 to 6), the optical film thickness of the i layer and Di (unit nm) when is characterized such that satisfying 95 ≦ D1 ≦ 145 30 ≦ D2 ≦ 50 10 ≦ D3 ≦ 22 170 ≦ D4 ≦ 270 20 ≦ D5 ≦ 47 25 ≦ D6 ≦ 45.

【0012】 [0012]

【実施例】図1は本発明の実施例1の要部断面概略図である。 DETAILED DESCRIPTION FIG. 1 is a fragmentary cross-sectional schematic view of a first embodiment of the present invention. 本実施例の反射防止膜は基板G面上に低屈折率層と高屈折率層を相互に全体として6層積層した多層膜より成っており、このときの6層は空気側から基板G側にかけて順に数えたとき第1、第3、第5層がSiO 2を含む低屈折率層(L)、空気側から順に第2、第4、第6層がTiO 2を含む高屈折率層(H)で構成している。 Antireflection film of this example is made from a multilayer film as a whole six-layer laminate a low refractive index layer and the high refractive index layer on the substrate surface G to each other, 6-layer substrate G side from the air side of the case first when counted in order toward the third low refractive index layer is a fifth layer comprising SiO 2 (L), the second from the air side in order, fourth, high refractive index layer the sixth layer comprises TiO 2 ( It is constituted by H).

【0013】そして高屈折率層Hと低屈折率層Lの波長 [0013] The wavelength of the high refractive index layer H and the low refractive index layer L
600nm の光に対する屈折率を各々N H ,N Lとするとき、 2.40≦N H ≦2.80 (1) 1.39≦N L ≦1.48 (2) なる条件を満たしている。 Each N H refractive index for light of 600 nm, when the N L, satisfies 2.40 ≦ N H ≦ 2.80 (1 ) 1.39 ≦ N L ≦ 1.48 (2) following condition. そして本実施例では低屈折率層LをSiO 2を主として含む層としたことにより、基板G And in this embodiment by a low refractive index layer L was a layer containing SiO 2 mainly substrate G
を加熱せずとも密着性の優れた反射防止膜が得られている。 Excellent antireflection film adhesion without heating is obtained a.

【0014】これにより、波長400nm から700nm の可視光域で良好な反射防止特性を有し、基板との密着性が優れ、かつ低温で製造できる反射防止膜を達成している。 [0014] Thus, a good anti-reflection characteristics in the visible light region of 700nm wavelength 400 nm, excellent adhesion to the substrate, and has achieved an antireflection film can be produced at low temperatures.

【0015】更に、本実施例の反射防止膜を構成する6 Furthermore, constituting the antireflection film of this example 6
層は空気側から順に第1層から第6層とし、その光学的膜厚(屈折率x幾何学的膜厚nm)を各々D1,D2, Layer and the sixth layer from the first layer from the air side in order, the optical film thickness (refractive index x geometrical thickness nm) each D1, D2,
D3,D4,D5,D6としたとき、 95≦D1≦145 (3) 30≦D2≦ 50 (4) 10≦D3≦ 22 (5) 170≦D4≦270 (6) 20≦D5≦ 47 (7) 25≦D6≦ 45 (8) を満たしている。 D3, D4, D5, when a D6, 95 ≦ D1 ≦ 145 (3) 30 ≦ D2 ≦ 50 (4) 10 ≦ D3 ≦ 22 (5) 170 ≦ D4 ≦ 270 (6) 20 ≦ D5 ≦ 47 (7 ) meets the 25 ≦ D6 ≦ 45 (8).

【0016】総層数を6層にすることにより光学的吸収量を極微量にとどめ、そして各層の光学的膜厚が条件式(3)〜(8)を満たすことにより、1%以下の低反射率を400nmから700nmという広範囲の波長域で実現している。 [0016] By satisfying kept to a very small amount of optical absorption by the total number of layers 6 layers and the optical thickness of each layer is conditional expression (3) to (8), less than 1% low It is realized in a wide wavelength range of 700nm reflectance from 400 nm.

【0017】ところでこれらTiO 2膜やSiO 2膜を成膜する方法としては、真空蒸着法、スパッタ法などが挙げられるが、いずれの成膜方法においても成膜時に不純物の混入は避けられなく、本実施例では例えばスパッタ法では窒素、アルゴン、鉄、ニッケル等が混入し、真に純粋な意味でのTiO 2膜やSiO 2膜は得難く、それらを含んだ膜となっている。 [0017] By the way as a method of forming these TiO 2 film or SiO 2 film, a vacuum deposition method, a sputtering method and the like, contamination of impurities during the deposition in any of the film forming method is not inevitable, nitrogen by a sputtering method for example, in this embodiment, argon, iron, nickel, etc. is mixed, truly pure TiO 2 film or SiO 2 film in the sense has become difficult to obtain, including their membrane. しかしそれらの混入量は通常微量で、上記(1)、(2)の条件を満たす限り反射防止効果を損なうことは殆どなく、顕著な光学的吸収も発生しない。 However mixed amount thereof is usually small amount, the (1), (2) it is hardly impairing the reflection preventing effect as long as conditions are met, and does not occur significant optical absorption.

【0018】表1は本発明の実施例1の多層膜構成のデータであり、図2は本実施例の反射特性図である。 [0018] Table 1 is a data of the multilayer film structure of Example 1 of the present invention, FIG 2 is a reflection characteristic diagram of this embodiment. 本実施例はガラスBK7 (商品名)を基板として用い、その面上にスパッタ法を用いて波長400nm から700nm の可視光域に対して反射防止効果を有するようにしている。 This embodiment uses a glass BK7 (trade name) as a substrate, and to have an antireflection effect to visible light region of 700nm wavelength 400nm by sputtering on the surface. 表1 Table 1
中の屈折率は波長600nm の光に対するものであり、又光学的膜厚とは屈折率x幾何学的膜厚(単位はnm)である。 Refractive index in is for light having a wavelength of 600 nm, also the optical thickness is the refractive index x geometrical film thickness (unit: nm).

【0019】 [0019]

【表1】 [Table 1] 本実施例の分光反射率は図2に示すように波長410nm 〜 Spectral reflectance of this example the wavelength 410nm, as shown in FIGS. 2 to
680nm にわたって最高で0.4 %であり、優れた反射防止膜であることをしめしている。 0.4% up at over 680 nm, indicating that an excellent anti-reflection film.

【0020】表2は本発明の実施例2の多層膜構成のデータであり、図3は本実施例の反射特性図である。 [0020] Table 2 is a data of a multi-layer film structure of Example 2 of the present invention, FIG. 3 is a reflection characteristic diagram of this embodiment. 本実施例はガラスBK7 (商品名)を基板として用い、その面上に真空蒸着法を用いて波長400nm から700nm の可視光域に対して反射防止効果を有するようにしている。 This embodiment is designed to have an antireflection effect with respect to the glass BK7 (trade name) as the substrate, a visible light region of 700nm wavelength 400nm by vacuum evaporation on the surface. 表2 Table 2
中の屈折率は波長600nm の光に対するものである。 Refractive index in are those for light having a wavelength of 600 nm.

【0021】 [0021]

【表2】 [Table 2] 以上の構成データにおいて高屈折率層Hと低屈折率層L High refractive index layer H and the low refractive index layer L above configuration data
の屈折率が同様な材料を用いても表1の場合と異なるのは表1の場合はスパッタ法を用いて加工し、表2の場合は真空蒸着法によって加工する違いによって生じるものである。 If the refractive index is shown in Table 1 even by using the same material is different from of the case of Table 1 were processed by a sputtering method, in the case of Table 2 is caused by the difference of processing by a vacuum deposition method.

【0022】本実施例の分光反射率は図3に示すように波長400nm 〜680nm にわたって最高で0.4 %程度であり、優れた反射防止膜であることをしめしている。 The spectral reflectance in this example is up to about 0.4 percent over the wavelength 400 nm ~680Nm 3, shows that an excellent anti-reflection film.

【0023】表3は本発明の実施例3の多層膜構成のデータであり、図4は本実施例の反射特性図である。 [0023] Table 3 is a data of the multilayer film structure of Example 3 of the present invention, FIG. 4 is a reflection characteristic diagram of this embodiment. 本実施例はガラスLah5(商品名)を基板として用い、その面上にスパッタ法を用いて波長400nm から700nm の可視光域に対して反射防止効果を有するようにしている。 This embodiment uses a glass Lah5 (trade name) as a substrate, and to have an antireflection effect to visible light region of 700nm wavelength 400nm by sputtering on the surface. 表3 Table 3
中の屈折率は波長600nm の光に対するものである。 Refractive index in are those for light having a wavelength of 600 nm.

【0024】 [0024]

【表3】 [Table 3] 本実施例の分光反射率は図4に示すように波長400nm 〜 Spectral reflectance of this example the wavelength 400nm, as shown in FIGS. 4 to
680nm にわたって最高で0.4 %程度であり、優れた反射防止膜であることをしめしている。 Highest in the order of 0.4% over 680 nm, indicating that an excellent anti-reflection film.

【0025】表4は本発明の実施例4の多層膜構成のデータであり、図5は本実施例の反射特性図である。 [0025] Table 4 is a data of the multilayer structure of the embodiment 4 of the present invention, FIG 5 is a reflection characteristic diagram of this embodiment. 本実施例はガラスLah5(商品名)を基板として用い、その面上に真空蒸着法を用いて波長400nm から700nm の可視光域に対して反射防止効果を有するようにしている。 This embodiment is designed to have an antireflection effect with respect to the glass using Lah5 (trade name) as the substrate, a visible light region from a wavelength 400 nm 700 nm of using a vacuum deposition method on the surface. 表4 Table 4
中の屈折率は波長600nm の光に対するものである。 Refractive index in are those for light having a wavelength of 600 nm.

【0026】 [0026]

【表4】 [Table 4] 本実施例の分光反射率は図5に示すように波長400nm 〜 Spectral reflectance of this example the wavelength 400nm, as shown in FIGS. 5 to
690nm にわたって最高で0.35%程度であり、優れた反射防止膜であることをしめしている。 Highest in the order of 0.35% over 690 nm, indicating that an excellent anti-reflection film.

【0027】 [0027]

【発明の効果】本発明の反射防止膜は以上の構成により、 (2−1)400nm から700nm の広い可視光域にわたって光学的吸収が少なく、良好な反射防止特性を発揮する。 Antireflection film of the present invention exhibits the above configuration, the optical absorption is small, exhibit good anti-reflection characteristics over a wide visible light region of 700nm from (2-1) 400 nm. (2−2)基板と膜との密着性が優れている。 (2-2) adhesion to the substrate and the film is excellent. (2−3)常温で成膜可能なため、加熱機構や加熱プロセス等が不要であり、低コストで加工できる。 (2-3) for possible film formation at normal temperature, is not required such as a heating mechanism or heating processes can be processed at low cost. 等の効果を達成している。 We have achieved the effect of equal.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】 本発明の実施例1の要部断面概略図 Fragmentary cross-sectional schematic view of an embodiment 1 of the present invention

【図2】 本発明の実施例1の分光反射特性図 [Figure 2] spectral reflection characteristic diagram of the first embodiment of the present invention

【図3】 本発明の実施例2の分光反射特性図 Spectral reflection characteristic diagram of the second embodiment of the present invention; FIG

【図4】 本発明の実施例3の分光反射特性図 Spectral reflection characteristic diagram of the third embodiment of the present invention; FIG

【図5】 本発明の実施例4の分光反射特性図 [5] spectral reflectance characteristic diagram of the fourth embodiment of the present invention

Claims (2)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 透明な基板の上に空気側から順に低屈折率層と高屈折率層を交互に全体として6層積層する際、 1. A time of overall 6-layer laminate from the air side alternately a low refractive index layer and a high refractive index layer in this order on a transparent substrate,
    該低屈折率層はSiO 2を含み、該高屈折率層はTiO 2を含み、波長600nm に対する該高屈折率層と該低屈折率層の屈折率を各々N H ,N Lとする時、 2.40≦N H ≦2.80 1.39≦N L ≦1.48 であることを特徴とする反射防止膜 When low refractive index layer comprises SiO 2, the high refractive index layer which comprises TiO 2, respectively, and N H, N L refractive index of the high refractive index layer and the low refractive index layer with respect to the wavelength 600 nm, 2.40 ≦ N H ≦ 2.80 1.39 ≦ N antireflection film, which is a L ≦ 1.48
  2. 【請求項2】 前記6層を空気側から順に数えて第i層(i=1〜6)とし、第i層の光学的膜厚をDi(単位nm)とするとき、 95≦D1≦145 30≦D2≦ 50 10≦D3≦ 22 170≦D4≦270 20≦D5≦ 47 25≦D6≦ 45 を満たすことを特徴とする請求項1の反射防止膜。 Wherein the 6-layer from the air side the i layer counting starting with (i = 1 to 6), when the optical film thickness of the i layer and Di (unit nm), 95 ≦ D1 ≦ 145 antireflection coating according to claim 1, characterized in that satisfy 30 ≦ D2 ≦ 50 10 ≦ D3 ≦ 22 170 ≦ D4 ≦ 270 20 ≦ D5 ≦ 47 25 ≦ D6 ≦ 45.
JP6239371A 1994-09-07 1994-09-07 Multilayer reflection preventing film Pending JPH0875902A (en)

Priority Applications (1)

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JP6239371A JPH0875902A (en) 1994-09-07 1994-09-07 Multilayer reflection preventing film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6239371A JPH0875902A (en) 1994-09-07 1994-09-07 Multilayer reflection preventing film

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JPH0875902A true JPH0875902A (en) 1996-03-22

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WO1998052074A1 (en) * 1997-05-16 1998-11-19 Hoya Kabushiki Kaisha Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform
AU774079B2 (en) * 1997-05-16 2004-06-17 Hoya Kabushiki Kaisha Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
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DE112009002574T5 (en) 2008-10-17 2012-01-19 Ulvac, Inc. Film-forming process for an anti-reflection film, anti-reflection film and film-forming device
WO2012157706A1 (en) 2011-05-17 2012-11-22 キヤノン電子株式会社 Optical filter, optical device, electronic device, and antireflection complex
WO2012157719A1 (en) 2011-05-17 2012-11-22 キヤノン電子株式会社 Optical filter and optical device
US8665520B2 (en) 2006-08-30 2014-03-04 Canon Denshi Kabushiki Kaisha Neutral density optical filter and image pickup apparatus
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US6250758B1 (en) 1997-05-16 2001-06-26 Hoya Corporation Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
AU741691B2 (en) * 1997-05-16 2001-12-06 Hoya Kabushiki Kaisha Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform
AU774079B2 (en) * 1997-05-16 2004-06-17 Hoya Kabushiki Kaisha Plastic optical devices having antireflection film and mechanism for equalizing thickness of antireflection film
AU741691C (en) * 1997-05-16 2004-08-12 Hoya Kabushiki Kaisha Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform
WO1998052074A1 (en) * 1997-05-16 1998-11-19 Hoya Kabushiki Kaisha Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform
JP4612827B2 (en) * 2004-10-25 2011-01-12 キヤノン株式会社 Anti-reflection coating
JP2006119525A (en) * 2004-10-25 2006-05-11 Canon Inc Antireflection film
US8665520B2 (en) 2006-08-30 2014-03-04 Canon Denshi Kabushiki Kaisha Neutral density optical filter and image pickup apparatus
DE112009002574T5 (en) 2008-10-17 2012-01-19 Ulvac, Inc. Film-forming process for an anti-reflection film, anti-reflection film and film-forming device
WO2012157719A1 (en) 2011-05-17 2012-11-22 キヤノン電子株式会社 Optical filter and optical device
WO2012157706A1 (en) 2011-05-17 2012-11-22 キヤノン電子株式会社 Optical filter, optical device, electronic device, and antireflection complex
US9316766B2 (en) 2011-05-17 2016-04-19 Canon Denshi Kabushiki Kaisha Optical filter, optical device, electronic device and anti-reflection composite
US9588266B2 (en) 2011-05-17 2017-03-07 Canon Denshi Kabushiki Kaisha Optical filter and optical apparatus
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