JP2003118026A - Gas-permeable layer-laminated material and part using the material - Google Patents
Gas-permeable layer-laminated material and part using the materialInfo
- Publication number
- JP2003118026A JP2003118026A JP2001317731A JP2001317731A JP2003118026A JP 2003118026 A JP2003118026 A JP 2003118026A JP 2001317731 A JP2001317731 A JP 2001317731A JP 2001317731 A JP2001317731 A JP 2001317731A JP 2003118026 A JP2003118026 A JP 2003118026A
- Authority
- JP
- Japan
- Prior art keywords
- gas permeable
- layer
- gas
- permeable layer
- laminated material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Abstract
Description
【０００１】[0001]
【発明が属する技術分野】本発明は、支持層と中間層と
ガス透過層とを複数層積層したガス透過層積層材および
ガス透過層積層材を用いた部品に関する。TECHNICAL FIELD The present invention relates to a gas permeable layer laminated material in which a plurality of supporting layers, an intermediate layer and a gas permeable layer are laminated, and a component using the gas permeable layer laminated material.
【０００２】[0002]
【従来の技術】近年、燃料電池システムの開発が進むに
つれて、高純度水素を得るための改質器用途に水素透過
膜を用いた水素透過装置が注目されてきており、これに
適用される各種の水素透過部品が提案されている。例え
ば、特開平７−１２４４５３号公報では、金属支持体に
電気メッキ法を用いて水素透過膜を積層させて、エッチ
ング法を用いて前記金属支持体に多数の細孔を設けるこ
とにより水素透過部品を形成している。しかし、金属支
持体をエッチング加工して開口部を設けて水素透過膜を
露出させるする際に、水素透過膜にピンホールなどの悪
影響を生じ、ガス分離機能を害するなどの問題点があっ
た。2. Description of the Related Art In recent years, as fuel cell systems have been developed, hydrogen permeation devices using hydrogen permeation membranes have been attracting attention for reformer applications for obtaining high-purity hydrogen. Hydrogen permeation parts have been proposed. For example, in Japanese Unexamined Patent Publication No. 7-124453, a hydrogen permeable component is formed by laminating a hydrogen permeable film on a metal support using an electroplating method and providing a large number of pores in the metal support using an etching method. Is formed. However, when exposing the hydrogen permeable film by forming an opening by etching the metal support, there is a problem that the hydrogen permeable film is adversely affected such as pinholes and the gas separation function is impaired.
【０００３】[0003]
【発明が解決しようとする課題】本発明は、上記の技術
的問題に鑑みて、支持層のエッチング加工時にガス透過
層に悪影響を与えないような支持層と中間層とガス透過
層とを複数層積層したガス透過層積層材および水素透過
装置などに適用できるガス透過層積層材を用いた部品を
提供することを課題とする。In view of the above technical problems, the present invention provides a plurality of support layers, intermediate layers and gas permeable layers that do not adversely affect the gas permeable layer during etching of the support layer. It is an object of the present invention to provide a gas permeable layer laminated material in which layers are laminated and a component using the gas permeable layer laminated material applicable to a hydrogen permeable device and the like.
【０００４】[0004]
【課題を解決するための手段】前記課題に対する第１の
解決手段として本発明のガス透過層積層材は、支持層と
中間層とガス透過層とを複数層積層してなるガス透過層
積層材であって、ガス透過層積層材の少なくとも１つの
接合面が、圧延によって接合してなる構成とした。As a first solution to the above-mentioned problems, the gas permeable layer laminated material of the present invention is a gas permeable layer laminated material obtained by laminating a plurality of supporting layers, intermediate layers and gas permeable layers. In addition, at least one joint surface of the gas permeable layer laminated material is configured to be joined by rolling.
【０００５】前記課題に対する第２の解決手段として本
発明のガス透過層積層材は、支持層と中間層とガス透過
層とを複数層積層してなるガス透過層積層材であって、
ガス透過層積層材の少なくとも１つの接合面が、接合さ
れる層のそれぞれの面を活性化処理した後、活性化処理
面同士が対向するように当接して重ね合わせて積層接合
してなる構成とした。この場合、活性化処理が、不活性
ガス雰囲気中でグロー放電を行わせて、前記接合される
層のそれぞれの面をスパッタエッチング処理することが
好ましい。As a second means for solving the above-mentioned problems, a gas permeable layer laminate of the present invention is a gas permeable layer laminate comprising a support layer, an intermediate layer and a gas permeable layer laminated in plural layers.
A structure in which at least one bonding surface of the gas permeable layer laminated material is subjected to activation treatment on each surface of the layers to be bonded, and then abutting so that the activation surfaces face each other, and overlapping and laminating. And In this case, it is preferable that the activation treatment is performed by performing glow discharge in an inert gas atmosphere to perform sputter etching treatment on each surface of the layers to be joined.
【０００６】前記課題に対する第３の解決手段として本
発明の部品は、支持層と中間層とガス透過層とを複数層
積層してなるガス透過層積層材にエッチング加工を施し
て少なくとも１つの開口を設けた構成とした。さらに、
前記部品が、ガス透過膜部品またはガス透過膜ユニット
に適用される構成とした。As a third means for solving the above-mentioned problems, in the component of the present invention, at least one opening is formed by etching a gas permeable layer laminated material obtained by laminating a plurality of supporting layers, intermediate layers and gas permeable layers. Is provided. further,
The component is applied to a gas permeable membrane component or a gas permeable membrane unit.
【０００７】[0007]
【発明の実施の形態】以下に、本発明の実施形態を説明
する。図２は、本発明のガス透過層積層材２２の一実施
形態を示す概略断面図であり、ガス透過層２４の片面に
中間層２８と支持層２６の積層材２０を積層した例を示
している。また、図１は、本発明のガス透過層積層材２
２の製造に用いる積層材２０の一実施形態を示す概略断
面図であり、支持層２６の片面に中間層２８を積層した
例を示している。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below. FIG. 2 is a schematic cross-sectional view showing one embodiment of the gas permeable layer laminated material 22 of the present invention, showing an example in which the laminated material 20 of the intermediate layer 28 and the support layer 26 is laminated on one surface of the gas permeable layer 24. There is. Further, FIG. 1 shows a gas permeable layer laminated material 2 of the present invention.
It is a schematic sectional drawing which shows one Embodiment of the laminated material 20 used for manufacture of No. 2, and has shown the example which laminated | stacked the intermediate | middle layer 28 on the single side | surface of the support layer 26.
【０００８】支持層２６の材質としては、ガス透過層積
層材２２を製造可能であり、形成された部品を充分に支
持しうる強度などを有する素材で、エッチング加工が可
能であれば特にその種類は限定されず、ガス透過層積層
材２２の用途により適宜選択して用いることができる。
例えば、ステンレス鋼、ニッケル、ニッケル基合金、銅
合金、鉄−ニッケル合金などを適用することができる。
ガス透過層積層材２２の用途が水素透過装置などであれ
ば、支持層２６としてはステンレス鋼などを適用するこ
とができる。また支持層２６の厚みは、１０〜５００μ
ｍが好ましい。１０μｍ未満では充分な強度を維持する
ことが難しく、５００μｍを超えるとエッチング加工に
向かなくなるとともに重くなり過ぎる。As the material for the support layer 26, a material having a strength capable of manufacturing the gas permeable layer laminated material 22 and capable of sufficiently supporting the formed parts, and if the etching process is possible, especially its kind Is not limited, and can be appropriately selected and used depending on the use of the gas permeable layer laminate 22.
For example, stainless steel, nickel, nickel-based alloy, copper alloy, iron-nickel alloy, etc. can be applied.
If the gas permeable layer laminate 22 is used for a hydrogen permeable device or the like, the support layer 26 may be made of stainless steel or the like. The thickness of the support layer 26 is 10 to 500 μ.
m is preferred. If it is less than 10 μm, it is difficult to maintain sufficient strength, and if it exceeds 500 μm, it becomes unsuitable for etching and becomes too heavy.
【０００９】中間層２８の材質としては、ガス透過層積
層材２２を製造可能であり、支持層２６をエッチング加
工する際にガス透過層２８に悪影響が及ぶことを抑止し
うる素材であれば特にその種類は限定されずガス透過層
積層材２２の用途により適宜選択して用いることができ
る。例えば、ガス透過層積層材２２の用途が水素透過装
置などであれば、中間層２８としては、銀などを適用す
ることができる。中間層２８は、板材でもよいし、メッ
キや蒸着などによる膜材であってもよい。また、中間層
２８の厚みは、１〜２００μｍが好ましい。１μ未満で
はガス透過層に及ぶ可能性のある悪影響を充分に抑止す
ることが難しく、２００μｍを超えるとエッチング加工
に向かなくなるとともに重くなり過ぎる。より好ましく
は、５〜１００μｍである。The material of the intermediate layer 28 is not particularly limited as long as it can manufacture the gas permeable layer laminated material 22 and can prevent the gas permeable layer 28 from being adversely affected when the support layer 26 is etched. The type is not limited and can be appropriately selected and used depending on the application of the gas permeable layer laminated material 22. For example, if the gas permeable layer laminated material 22 is used for a hydrogen permeable device or the like, silver or the like can be used as the intermediate layer 28. The intermediate layer 28 may be a plate material or a film material formed by plating or vapor deposition. The thickness of the intermediate layer 28 is preferably 1 to 200 μm. If it is less than 1 μm, it is difficult to sufficiently suppress the adverse effect that may affect the gas permeable layer, and if it exceeds 200 μm, it becomes unsuitable for etching and becomes too heavy. More preferably, it is 5 to 100 μm.
【００１０】ガス透過層２４の材質としては、ガス透過
層積層材２２を製造可能であり、目的とするガスなどを
充分にガス透過しうる素材であれば特にその種類は限定
されずガス透過層積層材２２の用途により適宜選択して
用いることができる。ガス透過層積層材２２の用途が水
素透過装置などであれば、ガス透過層２４としては、パ
ラジウム、パラジウムを含む合金（例えばパラジウム−
銀合金、パラジウム−ホルミウム合金、パラジウム−ガ
ドリニウム合金など）、ジルコニウム−ニッケル合金な
どを適用することができる。ガス透過層２４は、板材で
もよいし、メッキや蒸着などによる膜材であってもよい
し、アモルファスであってもよいし、複数層のガス透過
層からなる積層材であってもよい。また、ガス透過層２
４の厚みは、１〜１００μｍが好ましい。１μ未満では
ピンホールを生じやすく、ガス分離機能が劣り、１００
μｍを超えるとガス透過効率が低下したり重くなり過ぎ
る。より好ましくは、５〜５０μｍである。The material of the gas permeable layer 24 is not particularly limited as long as it can manufacture the gas permeable layer laminated material 22 and can sufficiently permeate the target gas and the like. It can be appropriately selected and used depending on the application of the laminated material 22. If the gas permeable layer laminate material 22 is used for a hydrogen permeable device or the like, the gas permeable layer 24 may include palladium or an alloy containing palladium (for example, palladium-
A silver alloy, a palladium-holmium alloy, a palladium-gadolinium alloy, etc., a zirconium-nickel alloy, etc. can be applied. The gas permeable layer 24 may be a plate material, a film material formed by plating or vapor deposition, may be amorphous, or may be a laminated material including a plurality of gas permeable layers. In addition, the gas permeable layer 2
The thickness of 4 is preferably 1 to 100 μm. If it is less than 1 μm, pinholes are likely to be formed, and the gas separation function is inferior.
When it exceeds μm, the gas permeation efficiency is lowered or becomes too heavy. More preferably, it is 5 to 50 μm.
【００１１】ガス透過層積層材は、支持層と中間層とガ
ス透過層とを複数層積層したものであって、少なくとも
１つの接合面は高圧延率での冷間圧延などにより接合が
可能であり、さらに、必要により冷間圧延や焼鈍処理な
どを施して所要の板厚を得ることができる。その他に
も、所定の板厚の２つの層に活性化処理を施して積層接
合する方法があり、以下にその活性化接合法について説
明する。The gas permeable layer laminate is a laminate of a support layer, an intermediate layer, and a gas permeable layer, and at least one joint surface can be joined by cold rolling at a high rolling rate. Further, if necessary, cold rolling or annealing treatment may be performed to obtain a desired plate thickness. In addition to this, there is a method of performing an activation treatment on two layers having a predetermined plate thickness to perform layered joining, and the activation joining method will be described below.
【００１２】活性化接合法による製造方法について、図
１に示す２層構造の積層材２０を例に取り、支持層２６
ならびに中間層２８が共に板材である場合を説明する。
図６に示すように、真空槽５２内において、巻き戻しリ
ール６２に設置された中間層２８の支持層２６との接合
予定面側が、活性化処理装置７０で活性化処理される。
同様にして巻き戻しリール６４に設置された支持層２６
の中間層２８との接合予定面側が、活性化処理装置８０
で活性化処理される。With respect to the manufacturing method by the activation bonding method, taking the laminated material 20 having a two-layer structure shown in FIG.
Also, a case where both the intermediate layers 28 are plate materials will be described.
As shown in FIG. 6, in the vacuum tank 52, the surface of the intermediate layer 28 installed on the rewind reel 62, which is to be joined to the support layer 26, is to be activated by the activation device 70.
Similarly, the support layer 26 installed on the rewind reel 64
The surface to be joined with the intermediate layer 28 of the activation processing device 80
Is activated.
【００１３】活性化処理は、以下のようにして実施す
る。すなわち、真空槽５２内に装填された支持層２６、
中間層２８をそれぞれアース接地された一方の電極Ａと
接触させ、絶縁支持された他の電極Ｂとの間に、１０〜
１×１０−３Ｐａの極低圧不活性ガス雰囲気好ましくは
アルゴンガス中で、１〜５０ＭＨｚの交流を印加してグ
ロー放電を行わせ、グロー放電によって生じたプラズマ
中に露出される電極Ａと接触した支持層２６、中間層２
８のそれぞれの面積が、電極Ｂの面積の１／３以下とな
るようにスパッタエッチング処理する。なお不活性ガス
圧力が１×１０− ３Ｐａ未満では安定したグロー放電が
行いにくく高速エッチングが困難であり、１０Ｐａを超
えると活性化処理効率が低下する。印加する交流は、１
ＭＨｚ未満では安定したグロー放電を維持するのが難し
く連続エッチングが困難であり、５０ＭＨｚを超えると
発振し易く電力の供給系が複雑となり好ましくない。ま
た、効率よくエッチングするためには電極Ａと接触した
支持層２６、中間層２８のそれぞれの面積を電極Ｂの面
積より小さくする必要があり、１／３以下とすることに
より充分な効率でエッチング可能となる。The activation process is carried out as follows. That is, the support layer 26 loaded in the vacuum chamber 52,
The intermediate layer 28 is brought into contact with one of the electrodes A, which is grounded, and between the other electrode B and the other electrode B, which are insulated and supported.
Ultralow pressure inert gas atmosphere of 1 × 10 −3 Pa, preferably argon gas, to apply alternating current of 1 to 50 MHz to perform glow discharge, and contact with electrode A exposed in plasma generated by glow discharge Support layer 26, intermediate layer 2
Sputter etching is performed so that each area of 8 is less than 1/3 of the area of the electrode B. Note inert gas pressure 1 × 10 - a stable glow discharge is carried out hardly fast etching is less than 3 Pa is difficult, if more than 10Pa activation process efficiency is lowered. The alternating current applied is 1
If it is less than MHz, it is difficult to maintain a stable glow discharge, and it is difficult to perform continuous etching. If it exceeds 50 MHz, oscillation is likely to occur and the power supply system becomes complicated, which is not preferable. Further, in order to perform the etching efficiently, it is necessary to make the area of each of the support layer 26 and the intermediate layer 28 in contact with the electrode A smaller than the area of the electrode B. By setting the area to 1/3 or less, the etching is performed with sufficient efficiency. It will be possible.
【００１４】その後、これら活性化処理された支持層２
６、中間層２８を積層接合する。積層接合は、支持層２
６、中間層２８のそれぞれ活性化処理された面が対向す
るようにして両者を当接して重ね合わせ、圧接ユニット
６０における圧接ロール６１と圧接ロール６３を用い
て、冷間圧接を施すことによって達成される。この際の
積層接合は比較的低い温度で可能であり、支持層２６、
中間層２８ならびに接合部に組織変化や合金層の形成な
どといった悪影響を軽減または排除することが可能であ
る。Ｔを支持層、中間層の温度（℃）とするとき、０℃
＜Ｔ≦３００℃で良好な圧接状態が得られる。０℃以下
では特別な冷却装置が必要となり、３００℃を超えると
組織変化などの悪影響が生じてくるため好ましくない。
また、圧延率Ｒ（％）は、０．０１％≦Ｒ≦３０％であ
ることが好ましい。０．０１％未満では充分な接合強度
が得られず、３０％を超えると変形が大きくなり加工精
度上好ましくない。より好ましくは、０．１％≦Ｒ≦３
％である。Thereafter, the activated support layer 2 is treated.
6. The intermediate layer 28 is laminated and joined. Laminated joint is the support layer 2
6. The intermediate layer 28 is brought into contact with the activated surfaces of the intermediate layer 28 so that they are opposed to each other, and they are overlapped with each other, and cold pressing is performed using the pressing roller 61 and the pressing roller 63 in the pressing unit 60. To be done. At this time, the lamination bonding can be performed at a relatively low temperature, and the support layer 26,
It is possible to reduce or eliminate adverse effects such as a structural change and formation of an alloy layer in the intermediate layer 28 and the joint portion. When T is the temperature (° C) of the support layer and the intermediate layer, 0 ° C
A good pressure contact state can be obtained at <T ≦ 300 ° C. If the temperature is 0 ° C. or lower, a special cooling device is required, and if it exceeds 300 ° C., adverse effects such as microstructural change occur, which is not preferable.
Further, the rolling ratio R (%) is preferably 0.01% ≦ R ≦ 30%. If it is less than 0.01%, sufficient bonding strength cannot be obtained, and if it exceeds 30%, deformation becomes large, which is not preferable in terms of processing accuracy. More preferably, 0.1% ≦ R ≦ 3
%.
【００１５】このように積層接合することにより、所要
の層厚みを有する積層材２０を形成することができ、巻
き取りロール６６に巻き取られる。さらに、必要により
所定の大きさに切り出して、図１に示す積層材２０を製
造することができる。また、このようにして製造された
積層材２０に、必要により残留応力の除去または低減な
どのために熱処理を施してもよい。By laminating and joining in this manner, the laminated material 20 having a required layer thickness can be formed and wound on the winding roll 66. Further, if necessary, it can be cut into a predetermined size to manufacture the laminated material 20 shown in FIG. Further, the laminated material 20 manufactured in this manner may be subjected to a heat treatment for removing or reducing residual stress, if necessary.
【００１６】なお、積層材２０の製造にはバッチ処理を
用いることができる。すなわち真空槽内に予め所定の大
きさに切り出された支持層や中間層の板材を複数枚装填
して活性化処理装置に搬送して垂直または水平など適切
な位置に処理すべき面を対向または並置した状態などで
設置または把持して固定して活性化処理を行い、さら
に、支持層や中間層の板材を保持する装置が圧接装置を
兼ねる場合には活性化処理後に設置または把持したまま
圧接し、支持層や中間層の板材を保持する装置が圧接装
置を兼ねない場合にはプレス装置などの圧接装置に搬送
して圧接を行うことにより達成される。なお、活性化処
理は、支持層や中間層の板材を絶縁支持された一方の電
極Ａとし、アース接地された他の電極Ｂとの間で行うこ
とが好ましい。A batch process can be used to manufacture the laminated material 20. That is, a plurality of plate materials for the support layer and the intermediate layer, which are cut into a predetermined size in advance in a vacuum chamber, are loaded and conveyed to an activation processing device to face the surface to be processed at an appropriate position such as vertical or horizontal. Installed or gripped and fixed in a side-by-side state to perform activation treatment, and when the device that holds the plate material of the support layer or the intermediate layer also serves as a pressure welding device, pressure welding is performed after installation or grasping after activation treatment. However, when the device for holding the plate material of the support layer or the intermediate layer does not also function as the pressure contact device, it is achieved by transporting it to a pressure contact device such as a press device for pressure contact. The activation treatment is preferably performed between the plate material of the support layer or the intermediate layer as one electrode A that is insulated and supported and the other electrode B that is grounded.
【００１７】次に図２に示す３層構造のガス透過層積層
材２２は、上記説明において中間層２８の代わりに２層
構造の積層材２０を用い、支持層２６の代わりにガス透
過層２４を用いることにより製造することができる。さ
らに、中間層２８の代わりにガス透過層積層材２２を用
い、支持層２６の代わり積層材２０を用いることによ
り、支持層−中間層−ガス透過層−中間層−支持層の５
層構造のガス透過層積層材を製造可能である。また、ガ
ス透過層積層材２２は、板材の支持層２６にメッキや蒸
着などによる膜材の中間層２８を積層した積層材２０を
用いることでも製造することができる。さらに、必要に
よりガス透過層積層材にメッキや蒸着などによる膜を積
層してもよい。このようにして本発明のガス透過層積層
材を製造することができる。なお、板材の支持層２６に
メッキや蒸着などによる膜材の中間層２８を積層した積
層材２０に、さらに、メッキや蒸着などによる膜材のガ
ス透過層２４を積層して必要により熱処理を施すことに
より、３層のガス透過層積層材を得ることができる。Next, in the gas-permeable layer laminated material 22 having a three-layer structure shown in FIG. 2, the two-layer laminated material 20 is used instead of the intermediate layer 28 in the above description, and the gas-permeable layer 24 is used instead of the support layer 26. It can be manufactured by using. Furthermore, by using the gas permeable layer laminated material 22 instead of the intermediate layer 28 and the laminated material 20 instead of the support layer 26, five layers of support layer-intermediate layer-gas permeable layer-intermediate layer-support layer are obtained.
It is possible to manufacture a gas permeable layer laminated material having a layered structure. The gas permeable layer laminated material 22 can also be manufactured by using the laminated material 20 in which the intermediate layer 28 of the film material is laminated on the support layer 26 of the plate material by plating or vapor deposition. Furthermore, if necessary, a film formed by plating or vapor deposition may be laminated on the gas permeable layer laminated material. In this way, the gas permeable layer laminated material of the present invention can be manufactured. In addition, the gas permeable layer 24 of the film material is further laminated on the laminated material 20 in which the intermediate layer 28 of the film material is laminated on the support layer 26 of the plate material by plating or vapor deposition, and heat treatment is performed if necessary. Thereby, a three-layer gas permeable layer laminated material can be obtained.
【００１８】また、本発明の部品は、支持層と中間層と
ガス透過層を複数層積層してなるガス透過層積層材を用
いたもので、ガス透過層積層材にエッチング加工などを
施して少なくとも１つの開口などを設けたものである。
また、この部品を用いてガス透過膜部品などに適用で
き、さらに、このガス透過膜部品にメッシュ板や基台を
積層してレーザー溶接などで接合することによりガス透
過膜ユニットなどに適用できる。さらに、ガス透過膜部
品やガス透過膜ユニットを水素透過装置などに適用する
ことができる。Further, the component of the present invention uses a gas permeable layer laminated material obtained by laminating a plurality of supporting layers, intermediate layers and gas permeable layers, and the gas permeable layer laminated material is subjected to etching processing or the like. At least one opening or the like is provided.
Further, the component can be applied to a gas permeable membrane component or the like, and further, the gas permeable membrane component can be applied to a gas permeable membrane unit or the like by laminating a mesh plate or a base on the gas permeable membrane component and joining them by laser welding or the like. Furthermore, the gas permeable membrane component or the gas permeable membrane unit can be applied to a hydrogen permeable device or the like.
【００１９】ガス透過膜部品は、例えば図３に示すよう
に支持層−中間層−ガス透過層の３層構造のガス透過層
積層材２２に２段のエッチング加工を施して支持層２
６、中間層２８に開口を設けたものである。この場合、
支持層２６の材質、中間層２８の材質、エッチング液な
どを適切に選定することにより、この中間層２８をエッ
チングストップ層として機能させることができ、ガス透
過層２４に悪影響を与えることなくエッチング加工を施
すことができる。すなわち、支持層２６を加工する１段
目のエッチングでは中間層２８は影響を受けず、支持層
２６の開口を通じて中間層２８を加工する２段目のエッ
チングではガス透過層２４が影響を受けないように開口
を設けることができる。例えばこの３層構造のガス透過
層積層材２２は、ステンレス（支持層２６）−銀（中間
層２８）−パラジウム合金（ガス透過層２４）構造など
であり、ステンレス箔に銀箔を積層接合した積層材２０
とパラジウム合金箔を積層接合することなどにより達成
することができる。さらに、エッチング液として、ステ
ンレス箔に対しては塩化第二鉄液を用い、銀箔に対して
は硝酸第二鉄液を用いることにより、銀箔をエッチング
ストップ層として機能させることができ、ガス透過層２
４に悪影響を与えることなく支持層２６および中間層２
８に開口を設けることができる。同様にして支持層−中
間層−ガス透過層−中間層−支持層の５層構造のガス透
過層積層材にエッチング加工を施すことによって、ガス
透過層の両面に開口を設けたガス透過膜部品を製造する
ことができる。In the gas permeable membrane component, for example, as shown in FIG. 3, a gas permeable layer laminated material 22 having a three-layer structure of a support layer-intermediate layer-gas permeable layer is subjected to a two-step etching process to form a support layer 2
6. The intermediate layer 28 has openings. in this case,
By appropriately selecting the material of the support layer 26, the material of the intermediate layer 28, the etching solution, etc., the intermediate layer 28 can be made to function as an etching stop layer, and etching processing can be performed without adversely affecting the gas permeable layer 24. Can be applied. That is, the intermediate layer 28 is not affected by the first etching for processing the support layer 26, and the gas permeable layer 24 is not affected by the second etching for processing the intermediate layer 28 through the opening of the support layer 26. The opening can be provided as follows. For example, the gas permeable layer laminate material 22 having the three-layer structure has a stainless (support layer 26) -silver (intermediate layer 28) -palladium alloy (gas permeable layer 24) structure, etc. Material 20
It can be achieved by, for example, laminating and bonding a palladium alloy foil. Furthermore, by using ferric chloride solution for stainless steel foil and ferric nitrate solution for silver foil as the etching solution, the silver foil can function as an etching stop layer, and the gas permeable layer can be used. Two
4 without adversely affecting the support layer 26 and the intermediate layer 2
An opening can be provided in 8. Similarly, a gas permeable membrane component in which openings are provided on both sides of the gas permeable layer by etching a gas permeable layer laminated material having a five-layer structure of a support layer-intermediate layer-gas permeable layer-intermediate layer-support layer Can be manufactured.
【００２０】ガス透過膜部品の供給ガスＧ側の開口部
は、目的とするガスの透過効率を高めるために開口の総
面積を増してガス透過層と供給ガスとの接触面積を大き
くすることが求められている。ガス透過膜部品の支持
層、中間層に丸孔や長孔などの開口を多数設けることで
は開口間に支持層や中間層が残るため開口率は低くなり
ガス透過膜部品自体を大きくしなければならないが、逆
に各開口を大きくして開口間の残部を減らすことにより
開口率を上げて開口の総面積を増すことができる。本発
明の部品では、支持層とガス透過層の間にエッチングス
トップ機能を有する中間層を設けることで、各開口の面
積を増しても支持層のエッチング加工によるガス透過層
へのピンホール発生などの悪影響はないため、各開口の
大きさはエッチング加工による制限は受けずにガス透過
膜部品の強度などにより決定することができる。ガス透
過膜部品は、溶接しろなどの固定や保持のための領域の
枠部とガス透過層を露出させるための孔開け加工を施す
領域の開口部からなり、さらに開口部はガス透過層が露
出する少なくとも１つの開口と開口間に残された支持層
や中間層の仕切からなる。開口面積を開口部におけるガ
ス透過層の露出した面積とし、仕切面積を開口部におけ
るガス透過層が隠れた非露出面積とするとき、開口面積
の総和と仕切面積の総和の比率である開口率は、開口率
（％）＝露出総面積／（露出総面積＋仕切総面積）で表
すことができる。なお開口率は５０％〜９９％が好まし
い。５０％未満ではガス透過効率が悪く９９％を超える
と強度が不足する。より好ましくは７０％〜９５％であ
り、さらに好ましくは８０％〜９０％である。The opening on the side of the supply gas G of the gas permeable membrane component may be increased in total area of the opening to increase the contact area between the gas permeable layer and the supply gas in order to increase the desired gas permeation efficiency. It has been demanded. By providing a large number of openings such as round holes and long holes in the supporting layer and the intermediate layer of the gas permeable membrane component, the supporting layer and the intermediate layer remain between the openings, so that the aperture ratio becomes low and the gas permeable membrane component itself must be enlarged. However, on the contrary, the aperture ratio can be increased and the total area of the apertures can be increased by enlarging each aperture and reducing the remaining portion between the apertures. In the component of the present invention, by providing the intermediate layer having an etching stop function between the support layer and the gas permeable layer, even if the area of each opening is increased, pinholes are generated in the gas permeable layer due to the etching process of the support layer. Therefore, the size of each opening can be determined by the strength of the gas permeable membrane component without being limited by the etching process. The gas permeable membrane part consists of a frame part in the area for fixing and holding a welding margin and an opening in the area where perforation processing is performed to expose the gas permeable layer, and the gas permeable layer is exposed in the opening part. At least one opening and a partition of the support layer and the intermediate layer left between the openings. When the opening area is the exposed area of the gas permeable layer in the opening and the partition area is the non-exposed area where the gas permeable layer in the opening is hidden, the opening ratio, which is the ratio of the total opening area and the total partition area, is , Aperture ratio (%) = total exposed area / (total exposed area + total partitioned area). The aperture ratio is preferably 50% to 99%. If it is less than 50%, the gas permeation efficiency is poor, and if it exceeds 99%, the strength is insufficient. It is more preferably 70% to 95%, still more preferably 80% to 90%.
【００２１】ガス透過膜ユニットは、例えばガス透過膜
部品３０にメッシュ板３４を積層したものであり、ある
いは図４に示すように基台３６をさらに積層したもので
ある。ガス透過膜部品３０は、支持層−中間層−ガス透
過層の３層構造のガス透過層積層材２２に２段のエッチ
ング加工を施して製造したもので、ガス透過層２４の片
面に開口を有し他面が露出した形態である。このガス透
過膜部品３０のガス透過層露出面側にメッシュ板３４
を、また必要により基台３６を積層してレーザー溶接な
どで接合することによりガス透過膜ユニット３２を製造
することができる。メッシュ板３４はガス透過膜部品の
保護や補強などを図るためのものであり、ステンレス鋼
などにエッチング加工などを施して貫通孔を設けたもの
である。基台３６は、ガス透過膜部品の保持やガス透過
層よりガス透過した水素などの目的とする透過ガスを集
めるためのものであり、例えば図５に示すように基台の
表面や内部に透過ガスＨのための溝やトンネルなどの導
出路を設けたものである。また、必要により、基台表面
にガス透過膜部品やメッシュ板を支える基台凸部３９を
設けることによってガス透過膜部品やメッシュ板の変形
を抑止することができる。さらに、基台の他の面にも適
切な導出路を設けることにより、基台の上下面や側面に
もガス透過膜部品を配置することができ、ガス透過膜ユ
ニットのガス透過能力を高めることができる。例えば、
基台の上下面に導出路を設けて２つのガス透過膜部品を
積層した場合、ガス透過能力はほぼ２倍となる。なお必
要によりガス透過膜部品の供給ガスＧ側にメッシュ板を
積層してもよいし、ガス透過層の両面に開口を有する分
ガス透過膜部品を用いる場合は、ガス透過膜部品と基台
３６の間のメッシュ板３４を省略してもよい。The gas permeable membrane unit is, for example, one in which a mesh plate 34 is laminated on the gas permeable membrane component 30, or a base 36 is further laminated as shown in FIG. The gas permeable membrane component 30 is manufactured by subjecting a gas permeable layer laminated material 22 having a three-layer structure of a support layer-intermediate layer-gas permeable layer to two-step etching processing, and having an opening on one side of the gas permeable layer 24. The other surface is exposed. A mesh plate 34 is provided on the gas permeable layer exposed surface side of the gas permeable membrane component 30.
Further, the gas permeable membrane unit 32 can be manufactured by stacking the bases 36 if necessary and joining them by laser welding or the like. The mesh plate 34 is provided to protect and reinforce the gas permeable membrane component, and is formed by etching stainless steel or the like to provide a through hole. The base 36 is for holding a gas permeable membrane component and collecting a target permeated gas such as hydrogen gas permeated from the gas permeable layer. For example, as shown in FIG. 5, the base 36 permeates to the surface or the inside of the base. A discharge path such as a groove or a tunnel for the gas H is provided. Further, if necessary, by providing a base convex portion 39 for supporting the gas permeable membrane component or the mesh plate on the surface of the base, it is possible to suppress the deformation of the gas permeable membrane component or the mesh plate. Furthermore, by providing an appropriate outlet path on the other surface of the base, it is possible to arrange the gas permeable membrane parts on the upper and lower surfaces and side surfaces of the base, thereby enhancing the gas permeation capability of the gas permeable membrane unit. You can For example,
When two gas permeable membrane parts are laminated by providing a lead-out path on the upper and lower surfaces of the base, the gas permeable capacity is almost doubled. If necessary, a mesh plate may be laminated on the supply gas G side of the gas permeable membrane component, or when a gas permeable membrane component having openings on both sides of the gas permeable layer is used, the gas permeable membrane component and the base 36 The mesh plate 34 between them may be omitted.
【００２２】[0022]
【実施例】以下に、実施例を図面に基づいて説明する。
（実施例１）支持層２６として厚み１００μｍのステン
レス（ＪＩＳ規定のＳＵＳ４３０）箔を用い、中間層２
８として厚み２０μｍの銀箔を用いて、ステンレス箔、
銀箔を積層材製造装置５０にセットし、真空槽５２内の
活性化処理ユニット７０および８０でスパッタエッチン
グ法により、アルゴンガス雰囲気中で（圧力：１０ー １
Ｐａ）で、それぞれ活性化処理した。次に圧接ユニット
６０を用いて、これら活性化処理されたステンレス箔、
銀箔を、活性化処理面同士を重ね合わせて圧接（圧延
率：１．５％）して積層接合して積層材２０を製造し
た。この積層材２０とガス透過層２４として厚み２０μ
ｍのＰｄー２８％Ａｇ合金箔を用いて、同様な活性化処
理条件及び圧接条件で、積層接合しガス透過層積層材２
２を製造した。さらにガス透過層積層材２２に２段エッ
チング加工を施してガス透過膜部品３０を製造し、ガス
透過膜部品３０にメッシュ板３４、基台３６を接合して
ガス透過膜ユニット３２を製造した。Embodiments Embodiments will be described below with reference to the drawings. Example 1 A stainless steel (JIS430 SUS430) foil having a thickness of 100 μm was used as the support layer 26, and the intermediate layer 2 was used.
A silver foil having a thickness of 20 μm is used as 8, stainless steel foil,
Set the silver foil in the laminated material manufacturing apparatus 50, by a sputtering etching method by activating the processing unit 70 and 80 in the vacuum chamber 52, in an argon gas atmosphere (pressure: 10 -1
In Pa), each was activated. Next, using the pressure welding unit 60, these activated stainless steel foils,
Laminated materials 20 were manufactured by laminating silver foils with their activation-treated surfaces being overlapped with each other and press-contacting (rolling rate: 1.5%) to laminate-bond them. The laminated material 20 and the gas permeable layer 24 have a thickness of 20 μm.
m Pd-28% Ag alloy foil was laminated and bonded under similar activation treatment conditions and pressure welding conditions.
2 was produced. Further, the gas permeable layer laminated material 22 was subjected to a two-step etching process to manufacture the gas permeable membrane component 30, and the gas permeable membrane component 30 was joined with the mesh plate 34 and the base 36 to fabricate the gas permeable membrane unit 32.
【００２３】[0023]
【発明の効果】以上説明したように本発明のガス透過層
積層材は支持層と中間層とガス透過層を複数層積層して
なるものであり、本発明の部品はガス透過層積層材を用
いたものである。このため、ガス透過層に悪影響を与え
ることなく支持層ならびに中間層に開口を形成可能であ
り、水素透過装置などへの適用も好適である。As described above, the gas permeable layer laminated material of the present invention is formed by laminating a plurality of layers of a support layer, an intermediate layer and a gas permeable layer, and the component of the present invention is a gas permeable layer laminated material. Used. Therefore, the openings can be formed in the support layer and the intermediate layer without adversely affecting the gas permeable layer, and the application to a hydrogen permeable device is also suitable.
【図１】本発明のガス透過層積層材に用いる積層材の一
実施形態を示す概略断面図である。FIG. 1 is a schematic cross-sectional view showing an embodiment of a laminated material used for a gas permeable layer laminated material of the present invention.
【図２】本発明のガス透過層積層材の一実施形態を示す
概略断面図である。FIG. 2 is a schematic cross-sectional view showing an embodiment of a gas permeable layer laminated material of the present invention.
【図３】本発明のガス透過膜部品の一実施形態を示す概
略断面図である。FIG. 3 is a schematic cross-sectional view showing an embodiment of the gas-permeable membrane component of the present invention.
【図４】本発明のガス透過膜ユニットの一実施形態を示
す概略断面図である。FIG. 4 is a schematic sectional view showing an embodiment of a gas permeable membrane unit of the present invention.
【図５】本発明のガス透過膜ユニットの製造に用いる基
台の一実施形態を示す概略平面図である。FIG. 5 is a schematic plan view showing an embodiment of a base used for manufacturing the gas permeable membrane unit of the present invention.
【図６】本発明のガス透過層積層材の製造に用いる装置
の一実施形態を示す概略断面図である。FIG. 6 is a schematic cross-sectional view showing an embodiment of an apparatus used for producing the gas permeable layer laminated material of the present invention.
２０ 積層材 ２２ ガス透過層積層材 ２４ ガス透過層 ２６ 支持層 ２８ 中間層 ３０ ガス透過膜部品 ３２ ガス透過膜ユニット ３４ メッシュ板 ３６ 基台 ３７ 溝 ３８ トンネル ３９ 基台凸部 ５０ 積層材製造装置 ５２ 真空槽 ６０ 圧接ユニット ６１ 圧接ロール ６２ 巻き戻しリール ６３ 圧接ロール ６４ 巻き戻しリール ６６ 巻き取りロール ７０ 活性化処理装置 ７２ 電極ロール ７４ 電極 ８０ 活性化処理装置 ８２ 電極ロール ８４ 電極 Ａ 電極Ａ Ｂ 電極Ｂ Ｇ 供給ガス Ｈ 透過ガス 20 laminated materials 22 Gas permeable layer laminated material 24 Gas permeable layer 26 Support layer 28 Middle class 30 Gas permeable membrane parts 32 gas permeable membrane unit 34 mesh plate 36 base 37 groove 38 tunnels 39 Base convex part 50 Laminated material manufacturing equipment 52 vacuum chamber 60 pressure welding unit 61 Pressure roll 62 Rewind reel 63 Pressure roll 64 rewind reel 66 winding roll 70 Activation processing device 72 electrode roll 74 electrodes 80 Activation processor 82 electrode roll 84 electrodes A electrode A B electrode B G supply gas H 2 permeation gas
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） // Ｈ０１Ｍ 8/06 Ｈ０１Ｍ 8/06 Ｇ Ｆターム(参考） 4D006 GA41 MA06 MC02X MC03X NA32 NA33 NA45 PB66 4F100 AT00A AT00B BA03 BA07 BA10A BA10C EH66 EH662 EJ17 EJ172 EJ37 EJ372 GB41 JD02 JD02C 4G075 AA22 AA30 BC02 CA16 EB31 5H027 AA02 BA01 BA16 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) // H01M 8/06 H01M 8/06 GF term (reference) 4D006 GA41 MA06 MC02X MC03X NA32 NA33 NA45 PB66 4F100 AT00A AT00B BA03 BA07 BA10A BA10C EH66 EH662 EJ17 EJ172 EJ37 EJ372 GB41 JD02 JD02C 4G075 AA22 AA30 BC02 CA16 EB31 5H027 AA02 BA01 BA16
Claims (5)
積層してなるガス透過層積層材であって、ガス透過層積
層材の少なくとも１つの接合面が、圧延によって接合し
てなることを特徴とするガス透過層積層材。1. A gas permeable layer laminate comprising a support layer, an intermediate layer and a gas permeable layer, wherein at least one joint surface of the gas permeable layer laminate is joined by rolling. A gas permeable layer laminated material characterized by the above.
積層してなるガス透過層積層材であって、ガス透過層積
層材の少なくとも１つの接合面が、接合される層のそれ
ぞれの面を活性化処理した後、活性化処理面同士が対向
するように当接して重ね合わせて積層接合してなること
を特徴とするガス透過層積層材。2. A gas permeable layer laminate comprising a support layer, an intermediate layer and a gas permeable layer, wherein at least one joint surface of the gas permeable layer laminate is one of the layers to be joined. The gas permeable layer laminated material is characterized in that after the activation treatment is performed on the surfaces, the activation treated surfaces are brought into contact with each other so as to face each other and are superposed and laminated.
でグロー放電を行わせて、前記接合される層のそれぞれ
の面をスパッタエッチング処理することを特徴とする請
求項２に記載のガス透過層積層材。3. The gas according to claim 2, wherein in the activation treatment, glow discharge is performed in an inert gas atmosphere to perform sputter etching treatment on each surface of the joined layers. Transmission layer laminated material.
積層してなるガス透過層積層材にエッチング加工を施し
て少なくとも１つの開口を設けたことを特徴とする部
品。4. A component characterized in that at least one opening is provided by subjecting a gas permeable layer laminated material obtained by laminating a plurality of supporting layers, an intermediate layer and a gas permeable layer to an etching process.
透過膜ユニットに適用されることを特徴とする請求項４
に記載の部品。5. The component is applied to a gas permeable membrane component or a gas permeable membrane unit.
Parts described in.
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|---|---|---|---|
| JP2001317731A JP2003118026A (en) | 2001-10-16 | 2001-10-16 | Gas-permeable layer-laminated material and part using the material |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001317731A JP2003118026A (en) | 2001-10-16 | 2001-10-16 | Gas-permeable layer-laminated material and part using the material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003118026A true JP2003118026A (en) | 2003-04-23 |
Family
ID=19135554
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001317731A Pending JP2003118026A (en) | 2001-10-16 | 2001-10-16 | Gas-permeable layer-laminated material and part using the material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003118026A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01224184A (en) * | 1988-03-02 | 1989-09-07 | Toyo Kohan Co Ltd | Method and device for manufacturing clad metal plate |
| JPH05317662A (en) * | 1992-04-27 | 1993-12-03 | Sumitomo Metal Ind Ltd | Hydrogen separation membrane and its production |
| JPH06224345A (en) * | 1993-01-23 | 1994-08-12 | Toppan Printing Co Ltd | Etching method |
| JP2001276558A (en) * | 2000-03-31 | 2001-10-09 | Toyo Kohan Co Ltd | Hydrogen gas separation unit and method of manufacturing it |
-
2001
- 2001-10-16 JP JP2001317731A patent/JP2003118026A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01224184A (en) * | 1988-03-02 | 1989-09-07 | Toyo Kohan Co Ltd | Method and device for manufacturing clad metal plate |
| JPH05317662A (en) * | 1992-04-27 | 1993-12-03 | Sumitomo Metal Ind Ltd | Hydrogen separation membrane and its production |
| JPH06224345A (en) * | 1993-01-23 | 1994-08-12 | Toppan Printing Co Ltd | Etching method |
| JP2001276558A (en) * | 2000-03-31 | 2001-10-09 | Toyo Kohan Co Ltd | Hydrogen gas separation unit and method of manufacturing it |
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