JP2003107738A - Photosensitive material processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve processing performance of a processing liquid and to improve an agitation property when immersing a photosensitive material in the processing liquid stored in a processing tank and processing it. SOLUTION: In a development tank 24 formed in the processing tank 22, a developer is circulated and agitated by the developer jetted from spray pipes 54 and 56. Then, since the spray pipe 54 provided on an upstream part in a PS plate carrying direction jets a large amount of the developer toward a carrying width direction, the developer flows on a surface of a PS plate along a width direction, a development processing to the PS plate is accelerated and a temperature change of the developer due to the temperature of the PS plate is prevented. Also, since the spray pipe 56 provided on a downstream part of the development tank jets the developer from a jetting hole 204 to a downstream side of the carrying direction, the developer of an almost uniform processing performance is supplied along the width direction of the PS plate and irregularities of finishing are prevented.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for processing a photosensitive material by immersing the photosensitive material in a processing liquid stored in a processing tank. More specifically, the present invention relates to a photosensitive material processing apparatus that circulates and agitates a processing liquid by ejecting the processing liquid sucked from the processing tank into the processing tank.

[0002]

2. Description of the Related Art In a photosensitive material processing apparatus such as an automatic developing apparatus, while conveying an image-exposed photosensitive material, the photosensitive material is immersed in a processing solution, or the processing solution is sprayed on the surface of the photosensitive material. Processing solution processing such as development processing is performed.

In a PS plate processor which is an automatic developing device for processing a photosensitive lithographic printing plate (hereinafter referred to as "PS plate") which is a photosensitive material having a photosensitive layer provided on a support such as aluminum, the PS plate is treated with a developing solution. In addition to the developing process of dipping in water, the washing process of spraying washing water on the front and back surfaces of the PS plate that has undergone development processing, and the desensitization of gum solution etc. on the front and back surfaces of the PS plate that has been washed A processing step such as a desensitization step of applying a processing liquid to perform a desensitization processing is provided.

In such a PS plate processor as well, a heater is provided in the developing tank so that the developing solution in the developing tank is charged with P.
There is one in which the S plate is heated so as to be in a temperature range in which it is optimally processed. At this time, in the PS plate processor, the developer in the developing tank is sucked by the circulation pump,
The sucked developing solution is jetted from a spray pipe arranged in the developing solution to circulate and stir the developing solution so that the developing solution in the developing tank has a uniform temperature.

By the way, in order to efficiently finish the development processing of the PS plate to a constant quality, fresh developer is supplied to the surface of the PS plate which is conveyed in the developer, and the PS plate is fed from the vicinity of the surface. It is necessary to replace the developer to remove the fatigued developer.

[0006]

However, there is a problem in that it is difficult to surely replace the liquid near the surface of the PS plate by merely ejecting the developer from the spray pipe arranged in the developing tank. is there. Further, since the PS plate conveyed in the developing tank divides the developer on the upper side and the lower side of the conveying path, it is difficult to control the temperature of the developer with high accuracy.

The present invention has been made in view of the above facts, and when the photosensitive material is dipped in the processing solution while the temperature of the processing solution is adjusted and the processing is performed, a reliable solution near the surface of the photosensitive material is obtained. It is an object of the present invention to propose a light-sensitive material processing apparatus capable of replacement and uniform temperature control.

[0008]

In order to achieve the above-mentioned object, the present invention is a photosensitive material processing apparatus which conveys and processes a photosensitive material obliquely downward while immersing it in a processing solution stored in a processing tank. Is provided on the side of a conveying path for conveying the photosensitive material obliquely downward, and the processing liquid is supplied to eject the processing liquid along a width direction orthogonal to the conveying direction of the photosensitive material. No. 1 jetting means and a conveying path for conveying the photosensitive material obliquely upward are provided so that the longitudinal direction is along the conveying width direction, and are provided along the longitudinal direction by supplying the processing liquid. The second jetting means for jetting the processing liquid toward the downstream side in the conveying direction of the photosensitive material from the jetting hole, and the processing liquid in the processing bath from the suction hole provided at a predetermined position of the processing bath. Suction to the first and second Characterized in that it comprises a circulation means for circulating said treatment liquid by supplying to the ejection means.

According to the present invention, the processing liquid in the processing tank sucked from the suction hole by the circulation means is squirted into the processing liquid in the processing tank by the first and second jetting means to circulate the processing liquid. To do.

At this time, the first ejecting means ejects the processing liquid along the conveying width direction which is a direction orthogonal to the conveying direction at the upstream portion in the processing tank, and the width of the photosensitive material conveyed in the conveying path. Allow the processing solution to flow along the direction. This allows
By supplying a large amount of the processing liquid to the surface of the photosensitive material at the initial stage of the processing with the processing liquid, it is possible to reduce the temperature fluctuation of the processing liquid due to the inserted photosensitive material and perform a substantially uniform processing.

The second jetting means jets the processing liquid toward the downstream side in the carrying direction at the downstream portion in the processing tank, and the processing liquid flows along the carrying direction in the vicinity of the surface of the photosensitive material. I am trying.

As a result, at the final stage of processing with the processing liquid that affects the finish of the photosensitive material, a processing liquid flows along the conveying direction of the photosensitive material, and the processing liquid that has been fatigued does not stay. As a result, unevenness in the finish does not occur.

Particularly when the processing liquid is jetted onto the photosensitive material,
Although the jetted processing liquid directly contacts the photosensitive material to cause processing unevenness, this can be prevented by jetting the processing liquid substantially downward from the horizontal direction.

In the present invention as described above, the suction hole is
It is preferable to provide it at the bottom of the processing tank between the first ejection means and the second ejection means.

The first and second suction holes for circulating the processing liquid are provided.
Is provided between the jetting means so that the treatment liquid is not jetted toward the suction hole, so that the relatively fresh treatment liquid jetted from the first and second jetting means remains as it is. It is possible to prevent the air from being sucked into and circulated by the circulation means.

The position of the suction hole is preferably at the bottom, but it is not limited to this, as long as the treatment liquid jetted from the first and second jetting means does not enter directly. However, it can be provided at any position such as the tank wall of the processing tank.

Further, in the present invention, it is preferable that the ejection hole formed in the second ejection means is directed obliquely downward.

Further, according to the present invention, when the temperature adjusting means for maintaining the processing liquid within a predetermined temperature range is provided, the amount of the processing liquid ejected from the first ejecting means is ejected from the second ejecting means. It is characterized by including a flow rate distribution means for increasing the amount of the processing liquid.

According to this invention, from the first ejection means,
A flow rate distribution unit is provided in the upstream portion of the transfer path so as to eject a large amount of the processing liquid.

As a result, a large amount of processing liquid can be supplied to the surface of the photosensitive material in the initial stage of processing, and the processing by the processing liquid can be promoted. Also, although there is a large difference between the temperature of the photosensitive layer on the surface of the photosensitive material upstream of the transport path and the temperature of the processing liquid,
By increasing the amount of the processing liquid ejected from the first ejection means, the temperature of the photosensitive layer on the surface of the photosensitive material can be quickly made equal to the temperature of the processing liquid, and the photosensitive material can be processed at a substantially uniform temperature. Can be processed by.

[0021]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a photosensitive lithographic printing plate processing apparatus (hereinafter referred to as “P”) applied as an example of a photosensitive material processing apparatus.
S version processor 10 "). The PS plate processor 10 processes a photosensitive lithographic printing plate (hereinafter referred to as "PS plate 12") which is image-wise exposed by an exposure device (not shown) as a photosensitive material. The PS plate 12 has a thin rectangular flat plate such as an aluminum plate as a support, and a photosensitive layer is formed on the support. As the PS plate 12, an optical bonding layer, a photopolymerization layer and an overcoat layer are laminated to form a photosensitive layer, and an image is exposed to a laser beam to accelerate a polymerization reaction of an image portion of the photopolymerization layer. It is also possible to apply a photopolymer plate or the like.

The PS plate processor 10 includes a developing section 14 for treating the PS plate 12 with a developing solution, a washing section 16 for supplying washing water of the PS plate 12 treated with the developing solution with water, and a washing section 16 after washing with water. Desensitization processing section 18 for applying a gum solution for plate surface protection to the PS plate 12 to desensitize the PS plate 12.
And a drying section 20 for drying the PS plate 12 are provided. That is, in the PS version processor 10,
A development process, a water washing process, a desensitizing treatment process, and a drying process are sequentially arranged along the transport direction (arrow A in FIG. 1) of the plate 12.

A processing tank 22 is provided in the PS plate processor 10. In the processing tank 22, a developing tank 24 is formed as a processing tank at a position to be the developing section 14, and a washing tank 26 and a desensitizing processing tank 28 are formed at positions to be the water washing section 16 and the desensitizing processing section 18. Has been done.

A slit-shaped insertion opening 32 is formed in the outer panel 30 that covers the processing tank 22.
In FIG. 2, an insertion portion 34 is formed on the insertion opening 32 side of the developing portion 14.

The PS plate processor 10 has covers 36 and 3 for covering the upper part of the processing tank 22 and the upper part of the drying part 20.
8 are provided. The cover 36 on the insertion port 32 side is arranged so as to cover the insertion part 34 of the processing tank 22 to the upper part of the water washing part 16, and the cover 38 is arranged so as to cover between the upper part of the water washing part 16 and the upper part of the drying part 20.

Further, the cover 36 is provided with a reentry insertion port (sub-insertion port) 40 for inserting the PS plate 12 between the developing section 14 and the water washing section 16. The sub-insertion port 40 is for inserting the PS plate 12 for performing the process in the PS plate processor 10 excluding the process in the developing unit 14.

At the insertion portion 34 adjacent to the insertion opening 36, a rubber conveying roller pair 42 is arranged. The PS plate 12 on which the image has been printed is inserted between the conveying roller pair 42 by being inserted from the insertion port 32 in the direction of the arrow A.

When the conveying roller pair 42 is driven to rotate, the PS plate 12 is drawn into the insertion port 32 and is sent to the developing unit 14 at an angle of about 15 ° to 31 ° with respect to the horizontal direction. In this embodiment, a single-sided PS plate 12 having a photosensitive layer formed on one surface of the support is used, and the PS plate 12 is inserted from the insertion opening 32 with the photosensitive layer facing upward. It is inserted into the PS plate processor 10.

Developing tank 2 formed in processing tank 22
4 has a substantially mountain shape in which the center of the bottom is projected downward, and stores a developing solution for developing the PS plate 12. In the developing tank 24, guide plates 44 and 46 are arranged on the lower side along the transport direction of the PS plate 12 along the bottom. Further, in the developing tank 24, conveying roller pairs 48, 50, 52 and guide plates 44, 46 are arranged at an upstream portion (insertion portion 34 side), a middle portion and a downstream portion (water washing portion 16 side). .

The PS plate 12 drawn in from the insertion port 32 by the conveying roller pair 42 is fed into the space between the conveying roller pairs 48, and the conveying roller pair 48 draws the PS plate 12 into the developing tank 24 and guides it. Send it onto the plate 46.

The guide plate 44 includes a pair of conveying rollers 48, 50.
The PS plate 12 that is disposed between the two and is fed by the pair of transport rollers 48 is guided obliquely downward toward the pair of transport rollers 50. The guide plate 46 includes a pair of transport rollers 50,
The PS plate 12, which is disposed between the pair of transport rollers 52 and is fed from the pair of transport rollers 50, is guided along the bottom surface of the developing tank 24 obliquely upward.

As a result, the PS plate 12 is immersed in the developing solution while being guided and conveyed in the developing tank 24 in a substantially U-shape.

Further, the conveying roller pair 52 is formed, for example, by a roller whose outer peripheral portion is made of rubber, and the guide plate 4
The developing tank 24 with the PS plate 12 guided by 6 interposed therebetween.
While pulling out from, it is sent to the washing section 16. At this time, the conveying roller pair 52 sends out the developing solution from the PS plate 12 drawn from the developing tank 24 while squeezing the developing solution.

In the developing tank 24, spray pipes 54 and 56 are provided on the lower surface side of the guide plates 44 and 46.
Further, a large number of liquid passage holes (not shown) are formed in each of the guide plates 44 and 46.

The spray pipes 54 and 56 jet the developing solution when the developing solution stored in the developing tank 24 is supplied by the circulation means described later. As a result, the developer in the developing tank 24 is agitated, and the PS plate 12
The uniform treatment of is possible. At this time,
From the liquid passage holes formed in the guide plates 44 and 46, the PS plate 1
As the developer circulates to the side of the conveyance path of 2, the PS plate 1
No. 2 rapid development processing and generation of processing unevenness are prevented.

A brush roller 58 and a carrying roller 60 are provided inside the developing tank 24 so as to face the guide plate 46. The brush roller 58 rotates while contacting the surface of the PS plate 12 conveyed on the guide plate 46 with the bristle material while being immersed in the developing solution, thereby brushing the surface of the PS plate 12 to make the PS plate 12 Promotes the removal of unwanted photosensitive layers from the surface of the. At this time, the transport roller 60 prevents the PS plate 12 brushed by the brush roller 58 from rising from the guide plate 46.

The PS plate 12 is conveyed in the developing tank 24 while being immersed in the developing solution in this way, so that the photosensitive layer which has become unnecessary by exposure is removed.

In the washing section 16, a conveying path for conveying the PS plate 12 in a substantially horizontal state is formed by a pair of conveying rollers 62 and 64 arranged above the washing tank 26.
2 is sandwiched between a pair of conveyance rollers 62 and 64, and the washing tank 26
Is transported horizontally above.

The water washing section 16 has a pair of conveying rollers 62, 64.
In between, spray pipes 66 and 68 are provided in a pair in the vertical direction with the transport path of the PS plate 12 interposed therebetween. The spray pipes 66 and 68 are arranged such that the axial direction is along the width direction of the PS plate 12 (direction orthogonal to the transport direction), and a plurality of discharge holes (not shown) facing the transport path of the PS plate 12 are provided in the axial direction. It is formed along.

Washing water is stored in the washing tank 26, and this washing water is supplied to the spray pipes 66 and 68 in synchronization with the conveyance of the PS plate 12. As a result, washing water is ejected from the spray pipes 66, 68 toward the PS plate 12, and the developer adhering to the surface of the PS plate 12 is washed away.

The rinsing water supplied to the PS plate 12 is sent out while the PS plate 12 is sandwiched by the conveying roller pair 64, and is sent out together with the developer adhering to the front and back surfaces of the PS plate 12. It is squeezed out from the water and collected in the washing tank 26. Note that the direction of jetting the washing water from the spray pipes 66 and 68 is such that the spray pipe 66 is upstream in the transport direction of the PS plate 12 and the spray pipe 68 is downstream in the transport direction of the PS plate 12, but is not limited to this. Instead, it may be in another direction.

The desensitizing section 18 is provided with a pair of conveying rollers 70 above the desensitizing tank 28, and the PS plate 12 is provided therewith.
After being transported by the transport roller pair 64 toward the transport roller pair 70, it is transported through the desensitization processing unit 18, and then is sandwiched by the transport roller pair 70 and transported toward the drying unit 20.

In the desensitizing section 18, a spray pipe 72 is provided above the transport path of the PS plate 12, and a spray pipe 74 is provided below the transport path. The spray pipes 72, 74 have PS in the longitudinal direction (axial direction).
The PS plates 12 are vertically arranged along the width direction of the plate 12 with the transport path of the PS plate 12 interposed therebetween. Also, spray pipes 72, 74
A plurality of discharge holes are formed along the width direction of the PS plate 12.

The desensitizing tank 28 stores a gum solution used for protecting the plate surface of the PS plate 12, and the gum solution is sprayed in synchronization with the transfer of the PS plate 12 to the spray pipes 72, 74.
Is supplied to. The spray pipe 72 uses this gum solution as a P
It is dripped toward the S plate 12 and spread on the surface of the PS plate 12 and applied. In addition, the spray pipe 74 is
The gum solution is discharged toward the back surface of the plate 12 to apply the gum solution to the back surface of the PS plate 12.

The PS plate 12 has a protective film formed by the gum solution applied to the front and back surfaces. In addition, spray pipe 7
The discharging direction of the gum liquid from 2 is not limited to the downstream side in the transport direction of the PS plate 12, and may be another direction. Further, a rectifying plate is provided and the gum liquid jetted toward the rectifying plate is While uniformly diffusing along the width direction of the PS plate 12 with the current plate,
The PS plate 12 may be applied by dropping it on the surface. Further, instead of the spray pipe 74, the PS plate 12 moves while being in contact with the discharged gum liquid, so that P
You may use the discharge unit etc. which apply a gum solution to the back surface of S plate 12.

In the desensitizing section 18, a cleaning spray 76 is provided above the conveying roller pair 70, and a cleaning roller 78 that rotates while contacting the roller above the conveying roller pair 70 is provided. The cleaning water is dropped from the cleaning spray 76 to a contact position between the cleaning roller 78 above the conveying roller pair 70 and the cleaning roller 78 at a predetermined timing set in advance through the straightening plate 80. The gum liquid is evenly dispersed on the peripheral surfaces of the rollers above the conveying roller pair 70 to wash away the gum liquid from the peripheral surfaces of the upper and lower rollers of the conveying roller pair 70, and the gum liquid adheres to the peripheral surfaces of the rollers to cause PS.
The plate 12 is prevented from being damaged.

The PS plate 12 coated with the gum solution in the desensitizing section 18 is sandwiched by the pair of transport rollers 70 and sent to the drying section 20 with the gum solution slightly remaining on the front and back surfaces.

The PS plate processor 10 is provided with a partition plate 82 between the desensitizing section 18 and the drying section 20. The partition plate 82 is disposed above the transporting path of the PS plate 12 so as to face the upper end of the processing tank 22, whereby the desensitization processing unit 18 and the drying unit 20 are disposed.
A slit-shaped insertion opening 84 is formed between the two. In addition, the partition plate 82 has a double structure, whereby a groove-shaped ventilation passage is formed on the drying portion 20 side of the insertion opening 84, and the air in the drying portion 20 enters into this ventilation passage. This prevents the air in the drying unit 20 from entering the desensitization processing unit 18 through the insertion opening 84.

In the drying section 20, in the vicinity of the insertion opening 84,
A support roller 86 that supports the PS plate 12 is disposed, and a transport roller pair 90 and a transport roller pair 92 are disposed in the central portion of the PS plate 12 in the transport direction and in the vicinity of the discharge port 88. . The PS plate 12 is transported in the drying section 20 by the support roller 86 and the transport roller pair 90, 92.

Between the support roller 86 and the conveying roller pair 90 and between the conveying roller pair 90 and the conveying roller pair 92, a pair of ducts 94 and 96 sandwiching the conveying path of the PS plate 12 is provided.
Is provided. The ducts 94 and 96 have a longitudinal direction of P.
The PS plate 12 is arranged along the width direction of the S plate 12.
A slit hole 98 is provided on the surface facing the conveyance path.

When the dry air generated by the dry air generating means (not shown) is supplied to the ducts 94 and 96 from one end side in the longitudinal direction, the dry air is supplied from the slit holes 98 to the slit P.
It is discharged toward the transport path of the S plate 12 and sprayed on the PS plate 12. As a result, the gum solution applied to the front and back surfaces of the PS plate 12 is dried to form a protective film.

On the other hand, the lower surface of the developing section 14 is the developing tank 24.
The shielding lid 100 is arranged below the liquid surface of the developer stored in the developing tank 24 to reduce the area where the liquid surface of the developer in the developing tank 24 contacts the air. The sub-insertion port (reentry insertion port) 40 of the cover 36 is closed by a shielding member (not shown), and the shielding member prevents outside air from entering the developing unit 14. Further, the shielding lid 100 is narrowed between the upper side of the conveying roller pair 48, 52 protruding from the liquid surface and the like,
This prevents the developer in the developer tank 24 from being deteriorated due to contact with carbon dioxide gas in the air. A blade-shaped shielding member made of silicon rubber or the like is provided between the shielding lid 100 and the processing tank 22 and the conveying roller pairs 48, 52, etc., so that the developer in the developing tank 24 may come into contact with fresh outside air. It is also possible to prevent the water content in the developer from evaporating.

FIG. 2 shows a piping system for the processing liquid in the PS plate processor 10. PS version processor 10
The processing tank 22 has a pipe 102 at the bottom of the developing tank 24.
One end of is connected. The other end of the pipe 102 is connected to the spray pipes 54 and 56 arranged in the developing tank 24, and the circulation pump 104 and the filter 10 are provided in the middle portion.
6 is provided. As a result, the circulation pump 104 is actuated to supply the developer in the developing tank 24 to the spray pipes 54, 56.
The developer is circulated and agitated by being ejected from 6 into the developing tank 24. At this time, when the developer passes through the filter 106, floating substances are removed.

One end of the pipe 110 is connected to the bottom of the washing tank 26. The other end of the pipe 110 is connected to the spray pipes 66 and 68, and a circulation pump 112 and a filter 114 are provided in the middle part. As a result, the rinsing water in the rinsing tank 26 is supplied to the spray pipes 66 and 68 while the suspended matter is removed by the filter 114 by the operation of the circulation pump 112.

Further, one end of a pipe 116 is connected to the bottom of the desensitizing treatment tank 28. The other end of the pipe 116 is connected to the spray pipes 72 and 74, and a circulation pump 118 and a filter 120 are provided in the middle portion. As a result, when the circulation pump 118 is operated, the gum liquid in the desensitizing tank 28 is supplied to the spray pipes 72, 74 while the suspended matter is removed by the filter 120.

The developing tank 24 includes an overflow pipe 122.
Is provided. In this overflow pipe 122,
One end of the pipe 124 is connected, and the other end of the pipe 124 is connected to a waste liquid tank (not shown). Also, a washing tank 2
6 is provided with an overflow pipe 126, and the desensitizing tank 28 is provided with an overflow pipe 128. One ends of pipes 130 and 132 are connected to the overflow pipes 126 and 128, respectively.
The other ends of 30, 132 are connected to a waste liquid tank (not shown).

As a result, the excess developing solution, washing water and gum solution in the developing tank 24, the water washing tank 26 and the desensitizing tank 28 flow into the overflow pipes 122, 126 and 128 and are discharged to the waste liquid tank. To be done.

The pipe 102 for circulating the developer is branched at the inlet side of the circulation pump 104 and is connected to the pipe 124 via a waste liquid valve 134. Further, the pipe 110 for circulating the washing water and the pipe 116 for circulating the gum solution are branched at the inlet sides of the circulation pumps 112, 118 and connected to the pipes 130, 132 via the waste liquid valves 136, 138. There is.

As a result, the waste liquid valves 134, 136,
By opening 138, the developing solution in the developing tank 24,
The washing water in the washing tank 26 and the gum solution in the desensitizing treatment tank 28 can be discharged.

On the other hand, in the PS plate processor 10, a replenisher tank 140 for storing a developer replenisher to be supplied to the developing tank 24 as a developer replenisher and a desensitizing tank 28 to be supplied as a gum solution replenisher. A replenisher tank 142 for storing gum replenisher and a replenisher tank 144 for storing water are provided. The water stored in the replenishing water tank 144 is used for diluting the developing replenishing solution and the gum replenishing solution and replenishing the rinsing water to the rinsing tank 26. In addition, this replenishment water tank 1
The amount of stored water is maintained within a predetermined range by supplying tap water to the pipe 44 through a pipe (not shown).

Further, the PS plate processor 10 is provided with a mixing tank 146 near the developing tank 24. One end of pipes 148 and 150 are open to the mixing tank 146. The other end of the pipe 148 is connected to the replenisher tank 140, and a replenishment pump 152 is provided in the middle part. Further, the other end of the pipe 150 is inserted into the replenishment water tank 144, and a replenishment water pump 154 is provided in the middle part.

In the PS plate processor 10, the developing tank 24
When replenishing the replenisher with the replenisher, the replenishing pump 152 and the replenishing water pump 154 are operated at a predetermined timing, and the developing replenisher and water for diluting the developing replenisher with a predetermined ratio in the mixing tank 146 (diluting water). Is supplied as a replenisher.

One end of a pipe 156 is connected to the bottom of the mixing tank 146. The other end of the pipe 156 is connected to the inlet side of the circulation pump 104. As a result, the replenisher supplied to the mixing tank 146 is sucked by the operation of the circulation pump 104, and is supplied to the spray pipes 54 and 56 while being mixed with the developer in the developing tank 24.

Further, the PS plate processor 10 is provided with auxiliary tanks 158 and 160 adjacent to the water washing tank 26 and the desensitizing processing tank 28, respectively. In the auxiliary tank 158 on the side of the water washing tank 26, one end of a pipe 162 is opened, and the other end of the pipe 162 is opened in the replenishment water tank 144. Further, in the auxiliary tank 160 on the desensitizing tank 28 side,
One ends of the pipes 164 and 166 are open, and the other end of the pipe 164 is connected to the replenisher tank 142.
The other end of 6 opens into the replenishment water tank 144.

Replenishment water pumps 168 and 170 are provided in the middle of the pipes 162 and 166, and a replenishment pump 172 is provided in the middle of the pipe 164.

As a result, the replenishing water pump 168 operates to supply the water in the replenishing water tank 144 to the auxiliary tank 156 as a new liquid for washing water, and the replenishing pump 172 and the replenishing water pump 170 operate. Auxiliary tank 15
8, the gum replenisher in the replenishing tank 142 and water for diluting the gum replenisher at a predetermined ratio are supplied to the desensitizing tank 28 as a gum replenisher.

One end of a pipe 174 is connected to the bottom of the auxiliary tank 156, and the other end of the pipe 174 is connected to the circulation pump 1.
It is connected to the entry side of 12. Further, one end of a pipe 176 is connected to the bottom of the auxiliary tank 158.
The other end of 6 is connected to the inlet side of the circulation pump 118.

As a result, the circulation pump 112 is operated, the water in the auxiliary tank 156 is supplied to the spray pipes 66 and 68 while being mixed with the wash water in the washing tank 26, and the circulation pump 118 is operated. , Auxiliary tank 1
The replenisher in 58 is supplied to the spray pipes 72, 74 while being mixed with the gum solution in the desensitizing tank 28.

In the PS version processor 10, the circulation pumps 104, 112, 11 are operated based on preset conditions.
8, replenishment pumps 152, 172 and replenishment water pump 15
By controlling the operations of 4, 168, 170, circulation of the developer, washing water and gum solution, the developing tank 24, the washing tank 26
And, the replenisher is replenished to the desensitizing tank 28.

A conventionally known method can be applied to this control, and detailed description thereof will be omitted in the present embodiment.

The PS plate processor 10 has one end connected to the cleaning spray 76 and the other end connected to the replenishing water tank 1.
A pipe 178 that is open inside the pipe 44 is provided, and a cleaning pump 180 is provided in the middle of the pipe 178.
By operating the cleaning pump 180, the water in the replenishing water tank 144 is supplied to the cleaning nozzle 76, and the conveyance roller pair 70 of the desensitizing treatment tank 28 is cleaned.

At this time, the water used to wash the conveying roller pair 70 is collected in the desensitizing tank 28, and the water collected in the desensitizing tank 28 is used for diluting the gum replenisher. There is a pipe 166 and a replenishment water pump 170.
Alternatively, the wash water pump 180 may be used to supply water for diluting the gum replenisher.

By the way, the developer sucked from the developing tank 24 by the circulation pump 104 is applied to the spray pipe 54 provided as the first jetting means and the spray pipe 56 provided as the second jetting means. By being supplied, it is ejected from the spray pipes 54 and 56 into the developing solution in the developing tank 24.

As shown in detail in FIG. 3, the spray pipe 54 is provided upstream of the developing tank 24 and below the guide plate 44. Further, as shown in FIG. 4, the spray pipe 54 extends from one end side in the transport width direction of the developing tank 24 toward the other end side in the transport width direction, and is an intermediate portion along the transport width direction. It is open.

The spray pipe 54 is a circulation pump 104.
The developing solution sucked by is jetted along the widthwise direction of conveyance of the PS plate 12.

As a result, in the developing tank 24, the PS plate 1
A flow of the developer along the width direction of the PS plate 12 is formed in the upstream portion of the conveyance path of No. 2. That is, the spray pipe 5
The developer ejected from No. 4 is folded back by the rack side plate 200 arranged in the developing tank 24 and the side wall 202 of the developing tank 24, so that the developing solution flows in the conveyance width direction. Therefore, the developer in the developing tank 24 flows from one end side to the other end side in the width direction along the surface of the PS plate 12 transported in the upstream part of the developing tank 24, and near the surface of the PS plate 12. Perform liquid replacement.

It should be noted that in FIG. 3, the shielding lid 100 and the like are omitted, and in FIG. 4, the guide plates 44 and 46 above the spray pipes 54 and 56 and the conveying rollers 60 and the like are omitted.

As shown in FIGS. 3 and 4, the spray pipe 56 is arranged downstream of the developing tank 24 and below the guide plate 46. As shown in FIG. 4, the longitudinal direction of the spray pipe 56 is arranged along the widthwise direction of conveyance of the PS plate 12. A large number of ejection holes 204 are formed in the spray pipe 56. The ejection holes 204 are
The spray pipes 56 are formed at predetermined intervals along the longitudinal direction. Further, as shown in FIGS. 3 and 4, the ejection hole 204 is directed obliquely downward on the downstream side in the transport direction of the PS plate 12. The intervals between the ejection holes 204 may be such that the developing solution can be ejected substantially uniformly from the spray pipe 56 in the conveyance width direction of the PS plate 12.

As a result, the developer supplied from the circulation pump 104 to the spray pipe 56 is
6 is ejected toward the downstream side in the transport direction of the PS plate 12, and a flow of the developer along the transport direction of the PS plate 12 is formed in the downstream portion of the transport path of the PS plate 12. That is, the developer ejected from the spray pipe 56 is folded back at the bottom of the developing tank 24 or the tank wall 206 on the downstream side of the developing tank 24 to form a flow along the transport direction of the PS plate 12.

The PS plate 12 conveyed on the guide plate 46 is supplied with a developer having a uniform processing performance along the conveyance width direction of the PS plate 12 by the flow of the developer.
Liquid replacement is performed near the surface.

On the other hand, as shown in FIG. 3, at the bottom of the developing tank 24, a suction hole 210 is formed in the lowest bottom plate 208 between the spray pipes 54 and 56, and the circulation pump 104 operates. As a result, the developer in the developing tank 24 is sucked through the suction hole 210. In the developing tank 24, in the vicinity of the suction hole 210,
A heater 212 used for heating the developing solution is provided as a temperature adjusting means.

As a result, the developer mainly heated by the heater 212 flows into the suction port 210.

In the PS version processor 10, the heater 21
The developer heated by 2 is sprayed with the spray pipes 54, 56.
By spraying from the developer, the developer in the developing tank 24 is made to have a substantially uniform temperature. In addition, the suction hole 210
Is a position where the developer ejected from the spray pipes 54, 56 does not directly enter, the spray pipes 54, 5
It is not limited to the bottom plate 208 between 6 and 6, and may be provided at other places such as the tank wall of the developing tank 24.

A conventionally known method can be used for temperature control of the developing solution using the heater 212, and detailed description thereof will be omitted in this embodiment. Further, the heater 212 is not provided in the developing tank 24, and the pipe 102 for circulating the developing solution is used.
It may be provided in the middle of, and in addition to the heater 212,
The heat exchanger or the like for cooling or controlling the temperature of the developer is connected to the pipe 102.
It may be provided in.

As shown in FIG. 2, the pipe 102 is provided with a branch pipe 214 at a branch portion between the spray pipe 54 and the spray pipe 56. The branch portion 214 is provided with a flow rate limiting device such as an orifice (not shown) so that the amount of the developer supplied to the spray pipe 54 is larger than the amount of the developer supplied to the spray pipe 56. ing. In the present embodiment, as an example, the ratio of the discharge amount of the developing solution between the spray pipe 54 and the spray pipe 56 is set to 6: 4 to 8: 2.

In the PS plate processor 10 thus configured, the PS plate 12 on which an image is recorded by being exposed by a printing device (not shown) is inserted into the insertion port 32.
Then, the transport roller 42 is driven to rotate.
As a result, the PS plate 12 is nipped by the pair of transport rollers 42 and drawn into the PS plate processor 10.

In the PS plate processor 10, a sensor for detecting the PS plate 12 passing through the insertion port 32 is provided in the vicinity of the insertion port 32.
When the insertion of 2 is detected, the rotation drive of the conveying roller pair 42 and the like is started, and at the timing based on the detection of the PS plate 12 by this sensor, the rinsing water from the spray pipes 66, 68 of the rinsing section 16 is detected. The gum liquid is discharged from the spray pipes 72 and 74 of the discharge and desensitization processing unit 18.

The conveying roller pair 42 has the PS plate 12 drawn in from the insertion port 32, and is 15 ° to 31 ° with respect to the horizontal direction.
It is fed into the developing tank 24 at an insertion angle within the range. As a result, the PS plate 12 is conveyed in the developing tank 24 by the pair of conveying rollers 48 to 52 while being guided by the guide plates 44 and 46, and is immersed in the developing solution stored in the developing tank 24 to be 17 °. It is delivered from within the developer at an ejection angle in the range of ˜31 °.

When the PS plate 12 is immersed in the developing solution in the developing tank 24, an unnecessary photosensitive layer swells according to the exposed image, and the swollen photosensitive layer is removed from the support. At this time, in the PS plate processor 10, the surface of the PS plate 12 (the surface on the photosensitive layer side) is brushed by the brush roller 58 arranged in the developing tank 24, so that P
The removal of the unnecessary photosensitive layer from the surface of the S plate 12 is promoted.

As the PS version processor 10,
The surface of the PS plate 12 may be brushed using a plurality of brush rollers, or the PS plate 12 may be treated without using the brush rollers.

The PS plate 12 which has been developed and sent from the developing tank 24 is sent to the washing section 16 by the pair of carrying rollers 52. At this time, the conveying roller pair 52 is set to P
The developer adhering to the front and back surfaces of the S plate 12 is squeezed out.

In the water washing section 16, the PS plate 12 is sandwiched by the conveying roller pairs 62 and 64 and conveyed in a substantially horizontal state, while the washing water is jetted from the spray pipes 66 and 68. The transport roller pair 64 arranged on the downstream side in the transport direction of the PS plate 12 squeezes the wash water supplied to the front and back surfaces of the PS plate 12 together with the developer remaining without being squeezed by the transport roller pair 52. While dropping, the PS plate 12 is sent to the desensitization processing unit 18.

As a result, when the PS plate 12 passes through the water washing section 16, the developer remaining on the front and back surfaces is washed off.

PS plate 12 sent to the desensitizing section 18
Passes through between the spray pipes 72 and 74 and is sandwiched by the pair of transport rollers 70, so that the pair of transport rollers 7
0 is sent from the desensitization processing unit 18.

At this time, in the desensitizing section 18, the gum solution is discharged from the spray pipes 72 and 74 to make the PS plate 1
The gum solution is uniformly applied to the front and back surfaces of No. 2 while diffusing the gum solution.
The conveying roller pair 70 sandwiches and conveys the PS plate 12, and squeezes the excess gum liquid from the front and back surfaces of the PS plate 12, thereby forming a uniform thin film of gum liquid on the front and back surfaces of the PS plate 12. .

The PS plate 12 coated with the gum solution is sent to the drying section 20 from the insertion opening 84 by the pair of conveying rollers 70. When the insertion opening 84 is provided with a shutter, the timing for starting the processing of the PS plate 12 or P
At the timing when the S plate 12 is sent out from the desensitization processing unit 18, the shutter is operated to open the insertion opening 84,
When the PS plate 12 does not pass through, the drying air of the drying unit 20 unnecessarily enters the desensitization processing unit 18 to prevent the gum solution from sticking to the pair of transport rollers 70, and also the insertion port 8
4 to prevent the deterioration of the developing solution due to carbon dioxide in the air that reaches the developing section 14 and to prevent the developing solution from deteriorating, or the water in the developing solution, the washing water and the water in the gum solution evaporate. It prevents you from getting out of 84.

In the drying unit 20, while the PS plate 12 is being conveyed by the supporting roller 86 and the pair of conveying rollers 90 and 92, the drying air is blown from the ducts 94 and 96 to the front and back surfaces of the PS plate 12. As a result, the PS plate 12 has a protective film formed by the gum solution applied on the surface and is discharged from the discharge port 88.

By the way, in the PS version processor 10,
The developing solution in the developing tank 24 is heated by the heater 212 and is circulated by the circulation pump 104 to be agitated to maintain the PS plate 12 in a predetermined temperature range in which it can be optimally finished.

In the PS plate processor 10, the circulation pump 104 is operated to operate the bottom plate 20 of the developing tank 24.
The developing solution is sucked through the suction hole 210 formed in 8. This developing solution is supplied to the spray pipes 54 and 56 via the pipe 102, and is ejected from the spray pipes 54 and 56 into the developing tank 24.

On the other hand, the spray pipe 54 is connected to the developing tank 24.
Is provided on the upstream side of the PS plate 12 and ejects the developer along the conveyance width direction of the PS plate 12 in the vicinity of the guide plate 44.
The flow of the developing solution is formed along the conveyance width direction of.

As a result, on the front and back surfaces of the PS plate 12 which is inserted from the insertion portion 34 and guided and conveyed on the guide plate 44, the developer near the front surface is discharged by the developer flowing in the conveyance width direction. Meanwhile, liquid replacement is performed in which new developer is supplied.

At this time, in the PS version processor 10,
A branch pipe 214 is provided in the pipe 102 for circulating the developer,
A large amount of developing solution is ejected from the spray pipe 54. As a result, rapid liquid replacement is performed on the front and back surfaces of the PS plate 12 conveyed on the guide plate 44, and the development process of the PS plate 12 is promoted by the developing solution.

Further, the PS plate 12 inserted into the developing tank 24
Unlike the temperature of the developing solution when the PS plate 12 is optimally processed, the temperature is generally lower than the temperature of the developing solution. For this reason, in the vicinity of the surface of the original PS plate 12 inserted into the developer, the temperature of the developer is affected by the temperature of the PS plate 12 and deviates from the temperature range in which the PS plate 12 is optimally processed. I will end up.

At this time, in the PS version processor 10,
By ejecting a large amount of developing solution from the spray pipe 54 provided in the upstream portion of the developing tank 24, the temperature of the developing solution near the front and back surfaces of the PS plate 12 changes under the influence of the temperature of the PS plate 12. Is being prevented.

That is, by ejecting a large amount of the developing solution from the spray pipe 54, the developing solution near the surface of the PS plate 12 whose temperature is lowered by the influence of the temperature of the PS plate 12 is promptly removed. It is possible to start the efficient developing process of the PS plate 12 while preventing the developer in the upstream portion of the developing tank 24 from being changed by the influence of the temperature of the PS plate 12.

As a result, the temperature of the developing solution in the developing tank 24 can be maintained properly. That is, the developing tank 2
By ejecting a large amount of the developing solution to the upstream portion of No. 4, it is possible to control the temperature of the developing solution with high accuracy.

Further, in the PS plate processor 10, from the spray pipe 56 provided in the downstream portion of the developing tank 24,
The developing solution is ejected toward the downstream side of the PS plate 12 in the conveying direction. As a result, in the vicinity of the front and back surfaces of the PS plate conveyed on the guide plate 46 provided in the downstream portion, PS
A flow of developer is formed along the transport direction of the plate 12, and P
The S plate 12 is subjected to liquid replacement in the vicinity of the surface by this developing solution.

On the other hand, the developing solution passing through the downstream portion of the developing tank 24 is relatively being developed, and the difference in the processing performance of the developing solution affects the finish of the developing process. At this time, P
In the S plate processor 10, in order to prevent unevenness in the finish caused by the developer ejected from the spray pipe 56 directly hitting the front and back surfaces of the PS plate 12, the developer is developed obliquely downward on the downstream side in the transport direction. It is designed to eject liquid.

As described above, in the PS plate processor 10, the flow of the developer along the transport direction of the PS plate 12 is formed at the downstream portion of the developing tank 24, so that the PS plate 12 is transported along the transport width direction of the PS plate 12. A developer having uniform processing performance is supplied to the plate 12.

As a result, in the PS plate processor 10, the difference in the processing performance of the developing solution near the surface of the PS plate 12 is
The PS plate 12 is prevented from being generated in the conveyance width direction so that unevenness in the finish due to the development processing does not occur.

As described above, in the PS plate processor 10, the PS from the spray pipe 54 is upstream of the developing tank 24.
By ejecting a large amount of the developer along the plate conveyance width direction, the temperature control accuracy of the developer is improved, and the liquid is quickly replaced near the front and back surfaces of the PS plate 12 conveyed on the upstream side. By doing so, the development process is promoted.

Further, in the PS plate processor 10, since the developer is jetted from the spray pipe 56 so that the flow of the developer along the conveying direction of the PS plate 12 is generated in the downstream portion of the developing tank 24, The development processing can be performed without causing unevenness in the finish of the PS plate 12.

Further, in the PS plate processor 10, each of the spray pipes 54 and 56 is connected to the circulation pump 10.
Suction port 2 for sucking the developer in the developing tank 24 by means of 4
Since the developer is not ejected toward 10,
The relatively fresh developer ejected from the spray pipes 54, 56 is prevented from being sucked into the suction port 210 as it is, and the PS plate 12 is developed by the relatively fresh developer. ing.

As a result, the PS plate 12 can be finished efficiently and with high quality by using the developer stored in the developing tank 24.

The above-described embodiment does not limit the structure of the present invention. For example, in the present embodiment, the developing solution in the developing tank 24 for developing the PS plate 12 is described as an example of the processing solution, but the processing solution is not limited to this.
The S plate 12 can be applied to any processing tank in which the S plate 12 is transported while being immersed in the processing liquid for processing.

In the present embodiment, the PS plate 12 is used as the photosensitive material, and the PS plate 12 is processed by the processing liquid.
Although the S version processor 10 has been described as an example, the present invention is not limited to P
The present invention is not limited to the printing plate such as the S plate 12 and can be applied to a photosensitive material processing apparatus having an arbitrary configuration for carrying and processing other photosensitive materials such as photographic paper and photographic film while being immersed in the processing liquid.

[0117]

As described above, according to the present invention, the processing liquid is jetted along the conveyance width direction of the photosensitive material by the first jetting means provided in the upstream portion of the processing bath, and the downstream side of the processing bath. By ejecting the processing liquid toward the downstream side in the transport direction of the photosensitive material by the second ejection means provided in the section,
The excellent effect that the photosensitive material can be efficiently processed by the processing liquid to obtain high quality is obtained.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of a PS plate processor applied to the present embodiment.

FIG. 2 is a schematic diagram showing a piping system of a PS plate processor.

FIG. 3 is a schematic configuration diagram showing a developing tank of a PS plate processor.

FIG. 4 is a perspective view of a main part of a processing tank showing a schematic configuration of a developing tank of a PS plate processor.

[Explanation of symbols]

10 PS Plate Processor (Photosensitive Material Processing Device) 12 PS plate (photosensitive material) 14 Development Department 22 Processing tank 24 Development tank (processing tank) 44, 46 Guide plate 48, 50, 52 Conveyor roller pairs 54 Spray pipe (first ejection means) 56 Spray pipe (second ejection means) 102 piping (circulation means) 104 Circulation pump (circulation means) 204 spout hole 210 Suction hole 212 Heater (temperature control means) 214 Branch pipe (flow rate control means)

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Takeshi Konno             1250 Takematsu, Minamiashigara City, Kanagawa Prefecture Fuji Equipment             Industry Co., Ltd. F term (reference) 2H096 AA06 GA22 GA23 GA24 GA26

Claims (4)

[Claims] 1. A photosensitive material processing apparatus for processing a photosensitive material by carrying it obliquely downward while dipping it in a processing solution stored in a processing tank, wherein the photosensitive material processing apparatus carries the photosensitive material obliquely downward. And a first jetting unit for jetting the processing liquid along the width direction orthogonal to the conveying direction of the photosensitive material when the processing liquid is supplied, and the photosensitive material is directed obliquely upward. A longitudinal direction is provided along a lateral direction of conveyance on the side of the conveying path for conveying, and the processing liquid is supplied from the ejection holes provided along the longitudinal direction by the supply of the processing liquid. Second ejection means for ejecting toward the downstream side of the treatment tank, and suctioning the treatment liquid in the treatment tank from a suction hole at a predetermined position of the treatment tank to supply the treatment liquid to the first and second ejection means. Circulation for circulating the treatment liquid A photosensitive material processing apparatus comprising: a ring means. 2. The photosensitive material processing apparatus according to claim 1, wherein the suction hole is provided in a bottom portion of the processing tank between the first ejection unit and the second ejection unit. 3. The photosensitive material processing apparatus according to claim 1, wherein the ejection hole formed in the second ejection unit is directed obliquely downward. 4. The amount of the processing liquid ejected from the first ejecting means is the amount of the processing liquid ejected from the second ejecting means when the temperature adjusting means for maintaining the treating liquid in a predetermined temperature range is provided. 4. The photosensitive material processing apparatus according to claim 1, further comprising a flow rate distribution unit for increasing the flow rate.