JP2002296802A - Device for processing sensitive material - Google Patents

Abstract

PROBLEM TO BE SOLVED: To use a liquid temperature detection means provided with piping for processing liquid circulation to accurately detect the liquid temperature even in the standby state. SOLUTION: In the standby state which is the non-processing state of a PS plate, a thermistor is used to detect the liquid temperature in the piping; and when the detection result is deviated from a prescribed range, a circulating pump is operated to send a developer in a developing tank into the piping, and the liquid temperature is detected again. At this time, the timing of liquid temperature detection is delayed by a time set on the basis of the capacity of the developing tank and the discharge capability of the circulating pump after operation of the circulating pump (steps 200 to 214). Thus the temperature of the developer is accurately detected, and the temperature of the developer is controlled on the basis of this detection result to keep the developer at a temperature for proper processing of the PS plate even in the standby state.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing apparatus for detecting the temperature of a processing solution and controlling the temperature of the processing solution in a processing tank within a predetermined temperature range.

[0002]

2. Description of the Related Art A photosensitive material includes a printing plate (hereinafter, referred to as a "PS plate") having a photosensitive layer formed on a support such as aluminum. The PS plate is a photosensitive material processing apparatus for processing the PS plate. In the processor, the PS plate is immersed in a developer maintained at a predetermined temperature to perform development processing.

[0003] In the developing tank of such a PS plate processor, a heater for heating is provided, and after the developing solution in the developing tank is sucked out by a circulating pump, the developing solution is ejected from the spray pipe into the developing tank. In this way, the mixture is agitated to obtain a uniform temperature.

In general, the temperature of a developing solution is controlled by detecting the temperature of the developing solution with a thermistor arranged in a developing tank while the PS plate is not being processed and in a standby state. Is turned on / off, and the circulation pump is operated intermittently to maintain the developing solution at a predetermined temperature while suppressing the deterioration of the developing solution due to carbon dioxide gas in the air.

When a thermistor for detecting the temperature of the developer is arranged in the developing tank, when the heater is turned off, the thermistor may be affected by the residual heat of the heater. Temperature detection may be difficult. For this reason, the PS version processor includes:
In some cases, a thermistor is attached to a pipe for circulating the developer to detect the temperature of the developer in the pipe for circulating.

However, when the temperature of the circulating developer is detected, the temperature of the developer can be maintained at a predetermined temperature during the operation of processing the PS plate. In the standby state, which is a non-processing state, the circulation pump is operated intermittently. Further, the temperature of the developing solution in the pipe may be lower than the temperature of the developing solution in the developing tank.

For this reason, the temperature of the solution detected by the thermistor may be lower than the actual temperature of the solution. When the developer is heated based on the detection result of the thermistor, the temperature of the developing solution in the developing tank is reduced. The temperature of the liquid may rise above the predetermined temperature range.

[0008] Such a temperature difference appears as a sensitivity difference between the PS plate processed immediately after standby and the PS plate after continuous processing, so that the PS plate can have a constant finish quality. I'm gone.

[0009]

DISCLOSURE OF THE INVENTION The present invention has been made in view of the above-mentioned circumstances, and by always detecting an appropriate temperature of a processing solution, a photosensitive material such as a PS plate can always have a fixed finish quality. It is an object of the present invention to propose a photosensitive material processing apparatus capable of controlling the temperature of a processing solution such that

[0010]

According to the present invention, there is provided a photosensitive material processing apparatus for processing a photosensitive material with a processing solution stored in a processing tank while maintaining the processing solution at a predetermined temperature. A circulating means for circulating the processing liquid in the processing tank, a temperature adjusting means for heating or cooling the processing liquid in the processing tank, and the circulating means provided in a conduit for circulating the processing liquid. Liquid temperature detecting means for detecting the liquid temperature of the processing liquid circulated in the pipeline, and when the detection result of the liquid temperature detecting means is out of a predetermined temperature range when the photosensitive material is not processed, Liquid temperature detection control means for detecting the liquid temperature of the processing liquid by the liquid temperature detection means after a predetermined time from the activation of the circulation means.

According to the present invention, by heating or cooling the processing solution in the processing tank by the temperature control means, the temperature of the processing solution in the processing tank is reduced to a temperature range in which the photosensitive material can be appropriately processed. To keep. The liquid temperature used for the operation of this temperature control means is
The liquid is detected by a liquid temperature detecting means provided in a pipe for circulating the processing liquid.

The liquid temperature detection control means activates the circulating means when the liquid temperature detected by the liquid temperature detecting means deviates from a predetermined temperature range, and again after a predetermined time from the start of the operation of the circulating means, Perform liquid temperature detection. Thus, the processing liquid in the processing tank is sent into the circulation pipe and the temperature of the processing liquid is detected, so that the temperature of the processing liquid in the processing tank can be accurately detected.

[0013] In the invention according to claim 2, the predetermined time is set as
The processing liquid is set based on the volume of the processing liquid stored in the processing tank and the amount of circulation per unit time by the circulation means.

According to the present invention, the timing of detecting the liquid temperature by the liquid temperature detecting means is set based on the capacity of the processing tank and the amount of the processing liquid circulated by the circulating means.

For example, From the volume D (l: liter) of the processing liquid stored in the processing tank and the circulation amount V (l / min) per unit time by the circulation means, the predetermined time Ts (min) is set to 0.01 * (D / V) ≦ Ts ≦ 5 * (D / V).

By delaying the detection timing of the liquid temperature detecting means in this manner, the liquid temperature detecting means provided in the circulation pipe can accurately detect the processing liquid temperature in the processing tank.

According to a third aspect of the present invention, there is provided a method for controlling the temperature of the processing liquid by operating the circulation means and operating the temperature adjusting means based on the detection result of the liquid temperature detecting means after the predetermined time. Key control means.

According to the present invention, the temperature of the processing liquid is controlled by operating the temperature control means based on the liquid temperature detected a predetermined time after the circulation of the processing liquid by the circulation means is started.

At this time, since the temperature of the processing solution can be accurately detected, the temperature of the processing solution can be maintained at an optimum temperature for processing the photosensitive material.

[0020]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a PS plate processor 10 applied as a photosensitive material processing apparatus in the present embodiment.

The PS plate processor 10 is a photosensitive lithographic printing plate (hereinafter referred to as "PS plate 1") such as a photopolymer plate which has been exposed as a photosensitive material by an exposure device (not shown).
2 "). The PS version 12 is
Using a thin rectangular flat plate such as an aluminum plate as a support, a photosensitive layer is formed on this support, and the photopolymer plate is
The photosensitive layer is formed by laminating the photo-bonding layer, the photo-polymerized layer and the overcoat layer, and the image is exposed by laser light, whereby the polymerization reaction of the image portion of the photo-polymerized layer is promoted.

The PS plate processor 10 includes a developing unit 14 for treating the PS plate 12 with a developing solution, a washing unit 16 for supplying and washing the PS plate 12 treated with the developing solution with washing water, A desensitizing unit 18 for applying a gum solution to the PS plate 12 to desensitize the PS plate 12;
And a drying unit 20 for drying the water.

A processing tank 22 is provided in the PS plate processor 10. In the processing tank 22, a developing tank 24 is formed at a position to be the developing section 14 as a processing tank, and a washing tank 26 and a desensitizing processing tank 28 are formed at a position to be the washing section 16 and the desensitizing processing section 18. Have been.

A slit-shaped insertion port 32 is formed in the outer panel 30 covering the processing tank 22 so that the processing tank 2
2, a discharge port 34 is formed on the drying unit 20 side.

The PS plate processor 10 is provided with a cover 36 that covers the upper part of the processing tank 22. The cover 36 integrally covers the developing step, the washing step, and the desensitizing step provided in the processing tank 22. The cover 36 includes the developing unit 14 and the washing unit 1.
6, a re-entry insertion port (sub-insertion port) 38 for inserting the PS plate 12 is provided. The sub-insertion opening 38 is used to insert the PS plate 12 for performing processing in the PS plate processor 10 except for processing in the developing unit 14.

An insertion table 40 is provided outside the insertion port 32, and a pair of rubber-made conveyance rollers 42 is disposed on the side of the developing unit 14 where the PS plate 12 is inserted. The PS plate 12 on which the image has been printed is placed on the insertion table 40 and inserted from the insertion port 32 along the direction of arrow A, and the conveying roller pair 42 is inserted.
Sent between.

The conveying roller pair 42 is driven to rotate, and feeds the PS plate 12 into the developing unit 14 at an angle in the range of about 15 ° to 31 ° with respect to the horizontal direction while pulling the PS plate 12 from the insertion port 32. In this embodiment, a single-sided PS plate 12 having a photosensitive layer formed on one surface of the support is used. The PS plate 12 is inserted from the insertion port 32 with the photosensitive layer facing upward. It is inserted into the PS version processor 10.

Developing tank 2 formed in processing tank 22
Numeral 4 has a substantially mountain shape with a bottom center protruding downward, and stores a developing solution for performing a developing process of the PS plate 12 as a processing solution. This developing tank 24 contains a PS plate 1
Guide plates 44 and 46 are provided along the bottom on the lower side along the transport direction 2.

The guide plate 44 is provided upstream of the developing tank 24 (on the side of the insertion port 32), and guides the PS plate 12 fed by the pair of conveying rollers 42 obliquely downward.
The guide plate 46 is provided downstream of the developing tank 24 and guides the PS plate 12 obliquely upward along the bottom surface of the developing tank 24.

In the developing tank 24, a pair of conveying rollers 45 is provided between the guide plates 44 and 46.
The transport roller pair 45 is driven to rotate,
The PS plate 12 guided by the guide plate 44 is fed toward the guide plate 46 while imparting a conveying force. Thus, the PS plate 12 is immersed in the developer while being guided and transported in the developing tank 24 in a substantially U-shape.

In the developing tank 24, a pair of conveying rollers 48 whose outer periphery is made of rubber are disposed on the washing section 16 side.
2 is guided toward the transport roller pair 48 by the guide plate 46, and is pulled out from the developing tank 24 by being pinched by the transport roller pair 48. The PS plate 12 is immersed in the developing solution when transported in the developing tank 24 in this manner, and unnecessary portions of the photosensitive layer exposed by the image exposure are swollen by the developing solution, peeled from the support, and exposed to light. Unnecessary photosensitive layers are removed according to the image.

Guide plates 44, 4
A spray pipe 50 is provided on the lower surface side of 6. In each of the guide plates 44 and 46, a large number of liquid passage holes (not shown) are formed.

The spray pipe 50 is supplied with a developing solution in the developing tank 24 which is sucked by a circulating pump, which will be described later. As a result, the developer in the developing tank 24 is agitated so that the PS plate 12 can be uniformly processed. At this time, the developing solution flows to the PS plate 12 transport path side from the liquid passage holes formed in the guide plates 44 and 46, so that rapid development processing of the PS plate 12 and occurrence of processing unevenness are prevented. I have.

A brush roller 80 is provided in the developing tank 24 so as to face the guide plate 46. The brush roller 80 is immersed in the developing solution while the guide plate 46
By rotating while contacting the bristle material with the surface of the PS plate 12 conveyed thereon, the surface of the PS plate 12 is brushed, and removal of an unnecessary photosensitive layer from the surface of the PS plate 12 is promoted. .

On the other hand, the lower surface of the developing unit 14
The liquid level cover 52 is arranged so as to be lower than the liquid level of the developer stored in the liquid container. Further, on the wall surface of the developing tank 24 and the liquid surface lid 52, shielding members 54A, 54B
Are provided, and shielding members 54C and 54D are attached to the washing section 24 side. The processing tank 22 has a discharge port 34.
Around the periphery of the pair of conveying rollers 56
4E and 54F are attached, and the sub insertion slot 3 of the cover 36 is attached.
8 is provided with a shielding member 54G.

The shielding members 54A to 54G are made of silicon rubber or the like. The inside of the developing tank 24 is filled with a liquid surface in a space in a sealed portion formed by the shielding members 54A to 54G, the pair of conveying rollers 42 and 48, and the like. Is provided to reduce the amount of air trapped in this space, and the liquid level lid 52 and the shielding members 54A to 5A are provided.
The use of 4G or the like prevents fresh air from entering near the liquid surface of the developing solution, and suppresses deterioration of the developing solution and evaporation of water due to carbon dioxide gas in the air. The liquid surface lid 52 is provided with skewer rollers 52A and 52B on the lower surfaces of the upstream and downstream ends of the PS plate 12 in the transport direction, and the PS plate 12 transported in the developing unit 14 is provided with the liquid surface lid 52. To prevent damage to the surface (mainly the photosensitive surface) due to contact with the lower surface of the photomask.

The PS plate 12 pulled out from the developing tank 24 by the pair of transport rollers 48 is sent to the washing section 16 while the developer adhering to the surface is squeezed down by the pair of transport rollers 48.

In the rinsing section 16, a transport path for transporting the PS plate 12 in a substantially horizontal state by a pair of transport rollers 58 and 60 disposed above the rinsing tank 26 is formed.
2 is sandwiched between the conveying roller pairs 58 and 60 and
Is transported horizontally above the

The washing section 16 includes a pair of conveying rollers 58, 60.
Spray pipes 62A and 62B are provided in pairs between the upper and lower sides of the PS plate 12 conveyance path. The spray pipes 62A and 62B are arranged so that the axial direction is along the width direction of the PS plate 12 (the direction orthogonal to the transport direction), and a plurality of discharge holes are formed along the axial direction facing the transport path of the PS plate 12. Is formed.

The washing tank 26 stores washing water as a treatment liquid. In the PS plate processor 10, the washing water is supplied to the spray pipes 62A and 62B by a water supply pump (not shown) in synchronization with the transport of the PS plate 12. Supply. As a result, the washing water is jetted from the spray pipes 62A and 62B toward the PS plate 12, and the developing solution attached to the surface of the PS plate 12 is washed away.

The washing water supplied to the PS plate 12 is sent out while the PS plate 12 is sandwiched by the pair of transport rollers 60 and is fed together with the developer adhering to the front and back surfaces of the PS plate 12. And is collected in the washing tank 26. The spraying direction of the washing water from the spray pipes 62A and 62B is such that the spray pipe 62A is on the upstream side in the transport direction of the PS plate 12 and the spray pipe 62B is
Although the downstream side in the transport direction of the plate 12 is used, the present invention is not limited to this, and may be another direction. The new washing water is P
The S plate 12 is supplied to the washing tank 26 by means (not shown) in accordance with the processing amount.

The desensitizing section 18 is provided with a pair of conveying rollers 56 above the desensitizing tank 28, and the PS plate 12
Is desensitized by the conveying roller pair 56.
After being conveyed through the inside, it is sent out from the outlet 34.

In the desensitizing section 18, a spray pipe 64 is provided above the conveying path of the PS plate 12, and a discharge unit 66 is provided below the conveying path. The longitudinal direction (axial direction) of the spray pipe 64 and the discharge unit 66 extends along the width direction of the PS plate 12 and is disposed vertically above and below the transport path of the PS plate 12. A plurality of discharge holes are formed in the spray pipe 64 along the width direction of the PS plate 12, and a slit hole is formed in the discharge unit 66 along the width direction of the PS plate 12.

A gum solution used for protecting the plate surface of the PS plate 12 is stored in the desensitizing tank 28, and the gum solution is supplied to the spray pipe 64 and the discharge unit 66 in synchronization with the transport of the PS plate 12. Is done. The spray pipe 64 is
This gum solution is dropped toward the PS plate 12 and spread and applied on the surface of the PS plate 12. Further, the discharge unit 66 discharges the gum solution from the slit holes, and the PS plate 12 moves while contacting the gum solution, so that the gum solution is applied to the PS plate.

The PS plate 12 has a protective film formed by the gum solution applied to the front and back surfaces. The spray pipe 6
The discharge direction of the gum solution from 4 is not limited to the downstream side in the transport direction of the PS plate 12, and may be any other direction. Also, a straightening plate is provided, and the gum solution ejected toward the straightening plate is discharged. While uniformly spreading along the width direction of the PS plate 12 with the current plate,
It may be applied by flowing down onto the surface of the PS plate 12. Further, instead of the discharge unit 66, a spray pipe or the like may be used.

In the desensitizing section 18, a cleaning spray 102 is provided above the transport roller pair 56, and the cleaning spray 102 is supplied from the cleaning spray 102 to the transport roller pair 56 at a predetermined timing. The washing liquid dropped on the peripheral surface is used to wash the gum solution from the peripheral surface of the roller forming the transport roller pair 56, thereby preventing the gum solution from sticking to the peripheral surface of the roller and damaging the PS plate 12. Like that.

The PS plate 12 to which the gum solution has been applied in the desensitizing unit 18 is sandwiched between the pair of transport rollers 56 and discharged from the outlet 34 with a slight amount of gum solution remaining on the front and back surfaces.
It is sent to the drying unit 20.

In the drying section 20, P
A support roller 68 for supporting the S plate 12 is provided.
A transport roller pair 72 and a transport roller pair 74 are disposed in the center of the PS plate 12 in the transport direction and near the discharge port 70. The PS plate 12 is transported in the drying section 20 by the support roller 68 and the transport roller pairs 72 and 74.

Ducts 76A, 7 are provided between the support roller 68 and the transport roller pair 72 and between the transport roller pair 72 and the transport roller pair 74 with the transport path of the PS plate 12 therebetween.
6B is provided. The ducts 76A and 76B are disposed such that the longitudinal direction is along the width direction of the PS plate 12,
A slit hole 78 is provided on a surface of the S plate 12 facing the conveyance path.

When the drying air generated by the drying air generating means (not shown) is supplied from one end in the longitudinal direction, the ducts 76A and 76B direct the drying air from the slit holes 78 to the transport path of the PS plate 12. And spray it onto the PS plate 12. Thereby, in the PS plate 12, the gum solution applied to the front and back surfaces is dried, and a protective film is formed. The outlet 34 has a processor unit up to the desensitizing unit 18 for treating the PS plate 12 with the processing liquid and the drying unit 2.
A shutter (not shown) is provided to separate the air from zero, and the discharge port 34 is unnecessarily opened to prevent the heated air in the drying unit 20 from entering the desensitization processing unit 18.

As shown in FIG. 2, a circulating pump 110 is provided in the developing section 14 of the PS plate processor 10 as circulating means. This circulation pump 110
Are connected to the bottom of the developing tank 24 via a pipe 130A, and are connected to the spray pipes 50 via a pipe 130B.

In the developing section 14, when the circulation pump 110 operates, the developing solution in the developing tank 24 is supplied to the spray pipe 50 and is spouted from the spray pipe 50. By circulating the developing solution in the developing tank 24 in this manner, the developing solution is stirred, for example, so that the liquid temperature becomes uniform.

The PS plate processor 10 is provided with a replenisher replenishing mechanism 112 for preventing the developer in the developing tank 24 from deteriorating. The replenishing solution replenishing mechanism 112 includes a stock solution tank 114 for storing a stock solution for replenishment, and a replenishing pump 11 for supplying the stock solution in the stock solution tank 114 to the developing tank 24.
6, a water tank 118 storing water for diluting a stock solution for replenishment supplied to the developing tank 24 at a predetermined ratio, a dilution pump 120 for supplying water in the water tank 118 to the developing tank 24, It has.

Further, the PS plate processor 10 is provided with a control unit 122, and a replenishment pump 116 and a dilution pump 120 are connected together with the circulation pump 110. The control unit 122 performs the control at a predetermined timing set in advance.
The stock solution pump 116 and the dilution pump 120 are operated to supply the stock solution for replenishment and water for diluting the stock solution at a preset dilution ratio to the developing tank 24. Thus, the replenisher is replenished to the developing tank 24. The operation timing of the replenisher replenishing mechanism 112 can be a conventionally known timing, and a detailed description is omitted in the present embodiment.

On the other hand, the developing tank 2 of the PS plate processor 10
4, a heater 132 and a cooler 136 are provided as temperature control means.
Is provided. The heater 132 is disposed in the developing tank 24 and heats the developer in the developing tank 24.

The cooler 136 circulates cooling water with a cooling pipe 138 disposed in the developing tank 24. As a result, the cooling water passing through the cooling pipe 138 is
The developer inside is cooled.

A thermistor 134 is provided in the pipe 130A for circulating the developer as a liquid temperature detecting means. The thermistor 134 is connected to the control unit 122 together with the heater 132 and the cooler 136.

During the processing of the PS plate 12, the control unit 122 operates the circulation pump 110 to circulate the developing solution, and turns on / off the heater 132 based on the temperature of the developing solution detected by the thermistor 134. Off control and cooler 1
By circulating and stopping the cooling water by 36, the temperature of the developer in the developing tank 24 is maintained at a temperature (for example, about 30 ° C.) at which the PS plate 12 can be optimally processed.

On the other hand, in the standby state where the PS plate 12 is not being processed, the control unit 122 turns on / off the heater 132 based on the liquid temperature detected by the thermist 134 and circulates / stops the cooling water by the cooler 136. By controlling, the temperature of the developer in the developing tank 24 is maintained at a temperature at which the PS plate 12 can be properly processed. Also,
In the standby state of the PS plate processor 10, the control unit 122 intermittently operates the circulation pump 110 to stir the developing solution in the developing tank 24,
The temperature of the developing solution is made uniform while suppressing the deterioration of the developing solution due to carbon dioxide gas in the air.

A conventionally known method can be applied to the on / off control of the heater 132 and the intermittent operation of the circulation pump 110 in the standby state, and a detailed description is omitted in the present embodiment.

On the other hand, when detecting the temperature of the developer in the standby state, the controller 122 first detects the temperature of the developer in the pipe 130A by the thermistor 134, and this temperature is set in advance. If the temperature is out of the predetermined temperature range, the circulation pump 110 is operated to
The developer inside is sent to the pipe 130A.

After a predetermined time has elapsed after the operation of the circulation pump 110 has been started, the
The liquid temperature of the developing solution is detected by 34.

That is, the control unit 122 operates the circulation pump 110 when detecting the liquid temperature of the developing solution, and detects the liquid temperature by delaying the circulation pump 110 by a predetermined time from the start of operation. .

Here, in this embodiment, a predetermined time for delaying the detection of the liquid temperature is set based on the capacity of the developing tank 24 and the ability of the circulation pump 110 to circulate the developer.
That is, the capacity D of the developing tank 24 (l: liter, the amount of the developing solution stored in the developing tank 24,
When the circulation amount V (l / min), which is the amount of the developer circulated per unit time, is set to 0, the circulation pump 1
The delay time Ts (min) from the time when the liquid crystal 10 is operated to the time when the liquid temperature is detected by the thermistor 134 is set so as to be in the range of 0.01 * (D / V) ≦ Ts ≦ 5 * (D / V) are doing.

For example, the capacity D of the developing tank 24 is 20 l (liter), and the discharge amount V of the circulation pump 110 is 10 l / min.
Is 0.02 (min) ≦ T ≦ 10 (min), for example, the time Ts can be set to 5 seconds (Ts = 5 sec). That is, the liquid temperature detection by the thermistor 134 is performed after the predetermined time T from the start of the operation of the circulation pump 110 reaches the delay time Ts.

In the PS plate processor 10 configured as described above, the PS plate 12 on which an image is recorded by a printing device (not shown) or the like is placed on the insertion table 40 and the insertion port 3
2, the PS plate 12 is pulled in by the transport roller pair 42 and sent to the developing unit 14. In the PS plate processor 10, the PS plate 1 passing through the insertion slot 32 is used.
When 2 is detected by a sensor (not shown), a timer is started. The timer measures the timing of discharging the washing water from the spray pipes 62A and 62B of the washing unit 16 and the timing of discharging the gum solution in the desensitizing unit 18 together with the operation of the driving unit for transporting the PS plate 12. Used for

In the developing section 14, the PS plate 12 is fed by the pair of conveying rollers 42 at an insertion angle of 15 ° to 31 ° with respect to the horizontal direction, and is conveyed while being immersed in the developing solution. The PS plate 12 is sent out of the developer at a discharge angle in the range of 17 ° to 31 °. PS version 12
By being immersed in a developing solution in the developing unit 14, unnecessary portions of the photosensitive layer swell according to the exposed image, and the swollen photosensitive layer is removed from the support. At this time, by brushing the surface of the PS plate 12 with a brush roller 80 disposed in the developing tank 24, removal of an unnecessary photosensitive layer from the surface of the PS plate 12 is promoted.

The PS version processor 10 includes:
A plurality of brush rollers 80 may be arranged to face the surface of the PS plate 12 for brushing,
Further, the processing of the PS plate 12 may be performed without using the brush roller 80.

The PS plate 12 thus processed with the developing solution and sent out of the developing solution is drawn out by the transport roller pair 48 and sent to the washing section 16. At this time, the transport roller pair 48 squeezes the developer adhering to the front and back surfaces of the PS plate 12 from the PS plate 12.

In the rinsing section 16, rinsing water is jetted from the spray pipes 62 A and 62 B while the PS plate 12 is sandwiched between the transport roller pairs 58 and 60 and transported in a substantially horizontal state. The transport roller pair 60 disposed downstream in the transport direction of the PS plate 12 squeezes the washing water supplied to the front and back surfaces of the PS plate 12 together with the developer remaining without being squeezed by the transport roller pair 48. While dropping, this PS version 1
2 is sent to the desensitizing unit 18.

Thus, when the PS plate 12 passes through the washing section 16, the developer remaining on the front and back surfaces is washed away.

The PS plate 12 sent to the desensitizing unit 18
Is passed between the spray pipe 64 and the discharge unit 66, and is pinched by the pair of transport rollers 56, so as to be sent out of the desensitizing unit 18 by the pair of transport rollers 56.

At this time, the desensitizing section 18 supplies the gum solution to the spray pipe 64 and the discharge unit 66, and applies the gum solution to the front and back surfaces of the PS plate 12. The transport roller pair 56 forms a thin film of the gum solution on the front and back surfaces of the PS plate 12 by pinching and sending out the PS plate 12, and squeezes excess gum solution from the front and back surfaces of the PS plate 12.

The PS plate 12 to which the gum solution has been applied is sent from the discharge port 34 to the drying section 20 by the pair of conveying rollers 56. The shutter (not shown) provided at the discharge port 34 is used for controlling the timing of starting the processing of the PS plate 12 or the PS timing.
The plate 12 operates at the timing of being sent out from the desensitizing unit 18 to open the discharge port 34, and the drying air from the drying unit 20 unnecessarily enters the desensitizing unit 18, and the gum solution is supplied to the conveying roller pair 56. To prevent sticking,
The air enters from the outlet 34 and reaches the developing unit 14 to prevent the developer from being deteriorated by carbon dioxide in the air, or the moisture in the developer, washing water, and moisture in the gum solution evaporate. It is prevented from getting out of the discharge port 34.

In the drying section 20, drying air is blown from the ducts 76A and 76B while the PS plate 12 is transported by the support roller 68 and the transport roller pairs 72 and 74. As a result, the PS plate 12 is discharged from the outlet 70 after the protective film is formed by the applied gum solution.

By the way, in the PS version processor 10,
During the processing of the PS plate 12, the heater 132 and the cooler 136 control the temperature of the developing solution while circulating the developing solution in the developing tank 24 by operating the circulation pump 110, so that the PS plate 12 is optimally developed. Maintain the temperature at which it is possible.

In the PS version processor 10, the PS
In a standby state, which is a non-processing state of the plate 12, the on / off control of the heater 132 and the circulation / stop of the cooling water by the cooler 136 are performed based on the liquid temperature detected by the thermistor 134, and the circulation pump 110 is operated. Thus, the temperature of the developer is maintained at a temperature at which the PS plate 12 can be processed.

At this time, the PS version processor 10
Piping 13 for circulating the developing solution through the thermistor 134
By providing at 0 A, the thermistor 134 is not affected by the residual heat of the heater 132 when detecting the temperature of the developing solution.

On the other hand, when the thermistor 134 is provided in the pipe 130A, the liquid temperature detected by the thermistor 134 may be different from the liquid temperature of the developer in the developing tank 24. For example,
If the ambient temperature, which is the ambient temperature of the PS plate processor 10, is low, the temperature of the developer in the pipe 130A decreases, and if the environmental temperature or the temperature inside the apparatus becomes unnecessarily high, the developer in the pipe 130A increases. May be higher than the temperature of the developer in the developing tank 24.

For this purpose, the controller 122 of the PS plate processor 10 controls the capacity of the developing tank 24 and the circulation pump 110
The timing at which the thermistor 134 detects the liquid temperature is delayed by the time Ts set based on the discharge capacity of the liquid. The discharge capacity of the circulation pump 110 is
A, because it is affected by the flow path area and path in 130B,
It is preferable to measure and set on an actual machine.

Here, thermistor 1 will be described with reference to FIG.
The outline of the liquid temperature detection will be described with reference to FIG. The temperature control of the control unit 122 is performed based on the liquid temperature detected by the thermistor 134. In the following description, in the case of a general-purpose PS plate, the developer temperature t detected by the thermistor 134 is changed from t ₁ = 29.0 ° C. to t ₂ = 3.
If the temperature is out of the range of 1.0 ° C., the delay time Ts from the time when the circulation pump 110 is operated to the time when the liquid temperature is detected by the thermistor 134 is set to 5 sec (Ts = 5 sec). Temperature was about 30 ° C (t ₃ = 29.8 °)
C to t ₄ = 30.2 ° C.).

In this flowchart, in the first step 200, it is confirmed whether or not the PS plate processor 10 is in the standby state.
If an affirmative determination is made in step, the process proceeds to step 202. This step 202 is executed at a predetermined time interval when the PS plate processor 10 is in the standby state, and detects the temperature of the developer in the pipe 130A using the thermistor 134.

In the next step 204, it is confirmed whether or not the detected liquid temperature is out of a predetermined temperature range. That is, it is determined whether or not the detected liquid temperature t satisfies t ₁ ≦ t ≦ t ₂ .

Here, if the liquid temperature t detected by the thermistor 134 is out of the predetermined temperature range, a negative determination is made in step 204 and the routine proceeds to step 206. In this step 206, the circulating pump 110 is operated to accurately detect the liquid temperature, and the developing solution in the developing tank 24 is sent into the pipe 130A provided with the thermistor 134.

At the same time, in step 208, a timer (not shown) is reset / started, and measurement of the elapsed time T from the start of the operation of the circulation pump 110 is started.

Here, the time T measured by the timer is a delay time Ts (for example, a delay time Ts set based on the capacity D of the developing tank 24 and the discharge capacity of the circulation pump 110 (the amount of developer circulation per unit time V)). Ts = 0.83min = 5se
If the determination at step c) is reached, and the determination at step 210 is affirmative, the routine proceeds to step 212, where the operation of the circulation pump 110 is stopped.
The temperature detected in step 4 is read as the developer temperature.

As described above, while the circulation pump 110 is stopped, when the temperature of the developing solution in the pipe 130A in which the thermistor 134 is provided greatly deviates from an appropriate temperature range for processing the PS plate 12, It is determined that the temperature of the developer in the developing tank 24 may be out of the temperature range in which the PS plate 12 is appropriately processed.

Then, the circulation pump 110 is operated to detect the temperature of the developer. At this time, immediately after the start of the operation of the circulation pump 110, the liquid temperature detected by the thermistor 134 may not be an accurate liquid temperature of the developing solution. Delay the temperature detection timing.

As a result, even if the thermistor 134 provided in the pipe 130 is used, it is possible to accurately detect the temperature of the developing solution.

As described above, when the liquid temperature of the developing solution is detected using the thermistor 134 provided in the pipe 130A, in the next step 216, the detected liquid temperature t is changed to the PS plate 12
Check whether the temperature is out of the temperature range that can be optimally processed. That is, it is checked whether the liquid temperature t satisfies t ₃ ≦ t ≦ t ₄ .

Thus, when the liquid temperature t detected by the thermistor 134 is out of the predetermined temperature range, a negative determination is made in step 216 and the routine proceeds to step 218. Thereby, the heater 132 or the cooler 13
6, the temperature of the developer is controlled using the heater 132 or the cooler 136 so that the liquid temperature of the developer is in a predetermined temperature range in which the PS plate 12 can be optimally processed. At this time, since the appropriate temperature of the developer can be detected by the thermistor 134, the temperature of the developer is maintained at a temperature at which the PS plate 12 can be properly processed even in the standby state. Can be.

Therefore, in the PS plate processor 10, the PS plate 12 which has started the processing from the standby state,
The PS plate 12 can always be finished with a constant quality without causing a difference in sensitivity due to the difference in developer temperature between the PS plate 12 that is continuously processed. I have.

Note that the present embodiment described above does not limit the configuration of the present invention. INDUSTRIAL APPLICABILITY The present invention can be applied to a photosensitive material processing apparatus of any configuration that optimally processes a photosensitive material such as a PS plate, photographic paper, or a film while maintaining a processing solution such as a developer at a predetermined temperature.

[0094]

As described above, according to the present invention, it is possible to accurately detect the liquid temperature by using the liquid temperature detecting means provided in the pipe for circulating the processing liquid. Thereby, even in the standby state, the processing liquid can be maintained at an appropriate temperature, and even when the photosensitive material is continuously processed, it can be finished to a constant quality without causing a difference in sensitivity. An excellent effect is obtained.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram of a PS plate processor according to an embodiment.

FIG. 2 is a schematic diagram showing a configuration of circulation of a processing liquid in a developing tank.

FIG. 3 is a flowchart showing an outline of liquid temperature detection in a standby state of a PS plate processor.

[Explanation of symbols]

 Reference Signs List 10 PS plate processor (photosensitive material processing device) 12 PS plate (photosensitive material) 14 Developing unit 22 Processing tank 24 Developing tank (processing tank) 50 Spray pipe (circulating means) 110 Circulating pump (circulating pump) 122 Control unit (control means) , Temperature control means) 130A, 130B piping 132 heater (temperature control means) 134 thermistor (liquid temperature detection means) 136 cooler (temperature control means)

 ──────────────────────────────────────────────────続 き The continuation of the front page F term (reference) 2H096 AA06 GA22

Claims (3)

[Claims] 1. A photosensitive material processing apparatus for processing a photosensitive material with a processing liquid while maintaining a processing liquid stored in a processing tank at a predetermined temperature, wherein the processing liquid in the processing tank is circulated. Means, a temperature adjusting means for heating or cooling the processing liquid in the processing tank, and a circulating means provided in a pipe for circulating the processing liquid, and detecting a temperature of the processing liquid circulated in the pipe. A liquid temperature detecting means for performing, when a detection result of the liquid temperature detecting means is out of a predetermined temperature range during non-processing of the photosensitive material, the liquid temperature detecting means after a predetermined time from operating the circulating means And a control means for detecting the temperature of the processing liquid according to (1). 2. The photosensitive apparatus according to claim 1, wherein the predetermined time is set based on a volume of the processing liquid stored in the processing tank and a circulation amount per unit time by the circulation unit. Material processing equipment. 3. A temperature control means for operating the circulation means and operating the temperature adjustment means based on the detection result of the liquid temperature detection means after the predetermined time to adjust the temperature of the processing liquid. The photosensitive material processing apparatus according to claim 1 or 2, wherein: