JP2003107729A - Processing tank structure for photosensitive material processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent small components from falling down to a bottom hole for an outflow of a processing liquid formed at a bottom part of a processing tank. SOLUTION: The bottom hole 112 is formed on a bottom plate 110 of a developing tank 24 of the processing tank 22, and for instance, in discharging a developer from the developing tank, the developer flows into the bottom hole. On the bottom plate, a guide part 130 where a plurality of erected wall parts 132 are formed so as to surround the bottom hole is provided around the bottom hole. While the developer discharged from the developing tank passes through an opening 134 between the erected wall, the small components such as screws, nuts and E rings are abutted on the erected walls and stopped without passing through the opening and they are surely prevented from entering the bottom hole.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing tank structure of a photosensitive material processing apparatus forming a processing tank for storing a processing liquid.

[0002]

2. Description of the Related Art In a photosensitive material processing apparatus such as an automatic developing apparatus, while conveying an image-exposed photosensitive material, the photosensitive material is immersed in a processing solution, or the processing solution is sprayed on the surface of the photosensitive material. Processing solution processing such as development processing is performed.

In a PS plate processor which is an automatic developing device for processing a photosensitive lithographic printing plate (hereinafter referred to as "PS plate") which is a photosensitive material having a photosensitive layer provided on a support such as aluminum, the PS plate is treated with a developing solution. In addition to the developing process of dipping in water, the washing process of spraying washing water on the front and back surfaces of the PS plate that has undergone development processing, and the desensitization of gum solution etc. on the front and back surfaces of the PS plate that has been washed A processing step such as a desensitization step of applying a processing liquid to perform a desensitization processing is provided.

By the way, in the PS plate processor, in the step of processing the PS plate with a processing solution such as a developing solution, washing water, and a desensitizing processing solution (gum solution), a processing tank for storing each processing solution is provided. Has been. These processing tanks are generally provided integrally with a processing tank formed by molding resin or the like.

In the PS plate processor, rollers and guides for transporting the PS plate in and out of the liquid in each processing tank are attached by using various small parts such as screws, nuts and E-rings. Has been.

On the other hand, in the PS plate processor, after the processing liquid in each processing tank is sucked by a circulation pump or the like, it is jetted again into the processing tank using a spray pipe or is supplied to the PS plate and then collected in the processing tank. As described above, the processing liquid is circulated so that the PS plate can be processed so as to have a constant finish quality.

Further, in the PS plate processor, for example, a certain amount of PS plate is processed, or after a certain period of time, all the processing liquid in the processing tank is discharged to perform maintenance such as cleaning or the processing liquid. I am trying to replace it.

Therefore, the processing tank is formed with a bottom hole at the bottom of each processing tank for discharging or sucking the processing liquid in the processing tank. Further, the bottom of each processing tank is connected to this bottom hole. It is inclined towards.

As a result, for example, by opening the valve provided in the pipe connected to the bottom hole, it is possible to drain all the processing liquid in the processing tank and empty the processing tank. There is.

[0010]

However, if a hole is formed in the bottom of the processing tank, small parts such as screws, nuts, and E-rings are accidentally dropped into the processing tank when performing maintenance or the like. If this happens, these small parts will roll into the bottom of the processing tank and enter this hole. This allows
If a pipe for discharging or circulating the processing liquid is connected to the opening, there arises a problem that these small parts that have entered through the opening may clog the pipe.

The present invention has been made in view of the above facts, and is a photosensitive material processing in which small parts such as screws, nuts, and E-rings are prevented from entering the holes formed at the bottom of the processing tank. The purpose is to propose a processing tank structure for the device.

[0012]

In order to achieve the above object, the present invention is a processing tank structure of a photosensitive material processing apparatus for processing a photosensitive material with a processing liquid, which comprises forming a bottom portion of the processing tank and processing the same. A bottom plate portion that is inclined toward the bottom hole that is opened to allow the liquid to flow out, and a periphery that is projected from the bottom plate portion to a predetermined height so as to surround the opening of the bottom hole A protective wall formed with an opening for allowing the treatment liquid to reach the opening of the bottom hole along the upper surface of the bottom plate.

According to the present invention, the bottom portion of the processing tank is formed by the bottom plate portion. The bottom plate portion is inclined toward the opening of the bottom hole, whereby the treatment liquid in the treatment tank can be discharged and the treatment liquid can be sucked for circulation or the like.

Further, on the bottom plate portion, a protection wall having a predetermined height is provided around the bottom hole so as to surround the opening of the bottom hole. An opening is formed in the protective wall, which ensures that the processing liquid in the processing tank flows toward the bottom hole. Also, when a small part is dropped into the processing tank, the protective wall prevents the small part from rolling toward the bottom hole, so it is possible to ensure that small parts such as screws, nuts, and E-rings enter the bottom hole. Can be prevented.

In such a protective wall of the present invention, the protruding height from the upper surface of the bottom plate portion is set to a height at which a small component rolling down on the bottom plate portion does not get over, and the photosensitive material placed in the processing tank. Any material may be used as long as it does not interfere with a member arranged in the processing tank such as a transport roller or a guide.

Further, in the present invention, the opening may be formed in the protective wall by notch portions having a predetermined width and formed so as to reach the bottom plate portion from the upper end portion.

According to the present invention, the cutouts are formed in the protective wall at predetermined intervals. At this time, by setting the cut width of the cut portion to a width that does not allow the small component to pass, it is possible to reliably prevent the small component from entering the bottom hole. In addition, by forming a plurality of cuts along the periphery of the bottom hole, it is possible to prevent the treatment liquid from flowing into the bottom hole.

[0018]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows a photosensitive lithographic printing plate processing apparatus (hereinafter referred to as “P”) applied as an example of a photosensitive material processing apparatus.
S version processor 10 "). The PS plate processor 10 processes a photosensitive lithographic printing plate (hereinafter referred to as "PS plate 12") which is image-wise exposed by an exposure device (not shown) as a photosensitive material. The PS plate 12 has a thin rectangular flat plate such as an aluminum plate as a support, and a photosensitive layer is formed on the support. As the PS plate 12, an optical bonding layer, a photopolymerization layer and an overcoat layer are laminated to form a photosensitive layer, and an image is exposed to a laser beam to accelerate a polymerization reaction of an image portion of the photopolymerization layer. It is also possible to apply a photopolymer plate or the like.

The PS plate processor 10 includes a developing section 14 for treating the PS plate 12 by immersing it in a developing solution, and a rinsing process in which rinsing water is supplied to the PS plate 12 treated with the developing solution with a spray pipe for rinsing. Part 16 and PS plate 1 after washing with water
The desensitizing treatment unit 18 which applies a gum solution for plate surface protection to 2 by applying it with a spray pipe to desensitize it.
And a drying section 20 for drying the PS plate 12 are provided. That is, in the PS version processor 10,
Along the conveying direction of the plate 12 (direction of arrow A in FIG. 1),
A developing process, a water washing process, a desensitizing treatment process, and a drying process are sequentially arranged.

A processing tank 22 is provided in the PS plate processor 10. As shown in FIGS. 1 and 2,
In this processing tank 22, a developing tank 24 is formed at a position to be a developing section 14 as a processing tank, and as shown in FIGS. 1 and 2, a washing tank at a position to be a washing section 16 and a desensitizing processing section 18. 26 and a desensitizing tank 28 are formed.
Further, as shown in FIGS. 1 and 2, the processing tank 22 is provided with a space serving as the insertion portion 34 on the upstream side of the developing tank 24, and as shown in FIGS. 1 and 3, the desensitizing processing tank is provided. A space for the drying unit 20 is provided on the downstream side of 28.

As shown in FIG. 1, a slit-shaped insertion opening 32 is formed in the outer panel 30 that covers the processing tank 22, and an insertion portion 34 is provided between the insertion opening 32 and the developing section 14. .

The PS plate processor 10 has covers 36 and 3 for covering the upper part of the processing tank 22 and the upper part of the drying part 20.
8 are provided. The cover 36 on the insertion port 32 side is arranged so as to cover the insertion part 34 of the processing tank 22 to the upper part of the water washing part 16, and the cover 38 is arranged so as to cover between the upper part of the water washing part 16 and the upper part of the drying part 20.

Further, the cover 36 is re-entry between the developing section 14 and the water washing section 16 for inserting the PS plate 12 for performing the processing in the PS plate processor 10 except the processing in the developing section 14. An insertion opening (sub-insertion opening) 40 is provided.

At the insertion portion 34 adjacent to the insertion opening 32, a rubber conveying roller pair 42 is arranged. The PS plate 12 on which the image has been printed is inserted between the conveying roller pair 42 by being inserted from the insertion port 32 in the direction of the arrow A.

The conveying roller pair 42 draws the PS plate 12 through the insertion port 32 and moves about 15 in the horizontal direction.
It is fed to the developing unit 14 at an angle in the range of 30 ° to 31 °. In this embodiment, a single-sided PS plate 12 having a photosensitive layer formed on one surface of the support is used.
2 is inserted into the PS plate processor 10 through the insertion port 32 with the photosensitive layer facing upward.

The developing tank 2 formed in the processing tank 22
4 has a substantially mountain shape in which the center of the bottom is projected downward, and stores a developing solution for developing the PS plate 12. In the developing tank 24, guide plates 44 and 46 are arranged on the lower side along the transport direction of the PS plate 12 along the bottom. Further, in the developing tank 24, conveying roller pairs 48, 50 and 52 are arranged at the upstream portion (insertion portion 34 side), the middle portion and the downstream portion (water washing portion 16 side).

The PS plate 12 drawn from the insertion opening 32 by the pair of conveying rollers 42 is fed into the space between the pair of conveying rollers 48, and the pair of conveying rollers 48 draws the PS plate 12 into the developing tank 24 and guides it. It is sent out along the plate 44. The guide plate 44 guides the PS plate 12 drawn into the developing tank 24 by the pair of transport rollers 48 in an obliquely downward direction.

The conveying roller pair 50 sandwiches the PS plate 12 guided by the guide plate 44 and sends it out along the guide plate 46. In addition, the guide plate 46 includes a pair of transport rollers 50.
The PS plate 12 sent out from is guided obliquely upward along the bottom surface of the developing tank 24.

Further, the conveying roller pair 52 has, for example, an outer peripheral portion formed by a roller made of rubber, and has a guide plate 4
The developing tank 24 with the PS plate 12 guided by 6 interposed therebetween.
While pulling out from, it is sent to the washing section 16.

As a result, the PS plate 12 is immersed in the developing solution while being guided and conveyed in the developing tank 24 in a substantially U-shape,
By exposing, the unnecessary photosensitive layer is removed.

In the developing tank 24, spray pipes 54 and 56 are provided on the lower surface side of the guide plates 44 and 46.
Further, a large number of liquid passage holes (not shown) are formed in each of the guide plates 44 and 46.

The spray pipes 54, 56 are supplied with the developer in the developing tank 24 sucked by a pump (not shown), and the developer is jetted from the spray pipes 54, 56. As a result, the developer in the developing tank 24 is agitated so that the PS plate 12 can be uniformly processed. At this time, by swirling the developing solution into the transport path side of the PS plate 12 through the liquid passage holes formed in the guide plates 44 and 46, it is possible to prevent the rapid development processing of the PS plate 12 and the occurrence of processing unevenness. There is.

A brush roller 58 and a conveying roller 60 are provided inside the developing tank 24 so as to face the guide plate 46. The brush roller 58 rotates while contacting the surface of the PS plate 12 conveyed on the guide plate 46 with the bristle material while being immersed in the developing solution, thereby brushing the surface of the PS plate 12 to make the PS plate 12 Promotes the removal of unwanted photosensitive layers from the surface of the. At this time, the transport roller 60 prevents the PS plate 12 brushed by the brush roller 58 from rising from the guide plate 46.

The PS plate 12 thus developed
The developing solution adhering to the surface is squeezed out when being sent out to the washing section 16 by the pair of transport rollers 52.

In the water washing section 16, a conveying path for conveying the PS plate 12 in a substantially horizontal state is formed by a pair of conveying rollers 62, 64 arranged above the water washing tank 26.
2 is sandwiched between a pair of conveyance rollers 62 and 64, and the washing tank 26
Is transported horizontally above.

The washing section 16 has a pair of conveying rollers 62, 64.
In between, spray pipes 66 and 68 are provided in a pair in the vertical direction with the transport path of the PS plate 12 interposed therebetween. The spray pipes 66 and 68 are arranged such that the axial direction is along the width direction of the PS plate 12 (direction orthogonal to the transport direction), and a plurality of discharge holes (not shown) facing the transport path of the PS plate 12 are provided in the axial direction. It is formed along.

The washing water is stored in the washing tank 26, and the PS plate processor 10 supplies the washing water to the spray pipes 66 and 68 in synchronization with the conveyance of the PS plate 12 by a water supply pump (not shown). . As a result, washing water is ejected from the spray pipes 66 and 68 toward the PS plate 12, and the developer adhering to the surface of the PS plate 12 is washed away.

The rinsing water supplied to the PS plate 12 is sent out while the PS plate 12 is sandwiched by the conveying roller pair 64, and the PS plate 12 is sent out together with the developer adhered to the front and back surfaces of the PS plate 12. It is squeezed out from the water and collected in the washing tank 26. Note that the direction of jetting the washing water from the spray pipes 66 and 68 is such that the spray pipe 66 is upstream in the transport direction of the PS plate 12 and the spray pipe 68 is downstream in the transport direction of the PS plate 12, but is not limited to this. Instead, it may be in another direction.

The desensitizing section 18 is provided with a pair of conveying rollers 70 above the desensitizing tank 28, and the PS plate 12
After being transported by the transport roller pair 64 toward the transport roller pair 70, it is transported through the desensitization processing unit 18, and then is sandwiched by the transport roller pair 70 and transported toward the drying unit 20.

In the desensitizing section 18, a spray pipe 72 is provided above the transport path of the PS plate 12, and a spray pipe 74 is provided below the transport path. The spray pipes 72, 74 have PS in the longitudinal direction (axial direction).
The PS plates 12 are vertically arranged along the width direction of the plate 12 with the transport path of the PS plate 12 interposed therebetween. Also, spray pipes 72, 74
A plurality of discharge holes are formed along the width direction of the PS plate 12.

The desensitizing tank 28 stores a gum solution used for protecting the plate surface of the PS plate 12, and the gum solution is sprayed in synchronization with the transfer of the PS plate 12 to the spray pipes 72, 74.
Is supplied to. The spray pipe 72 uses this gum solution as a P
It is dripped toward the S plate 12 and spread on the surface of the PS plate 12 and applied. In addition, the spray pipe 74 is
The gum solution is discharged toward the back surface of the plate 12 to apply the gum solution to the back surface of the PS plate 12.

The PS plate 12 has a protective film formed by the gum solution applied to the front and back surfaces. In addition, spray pipe 7
The discharging direction of the gum liquid from 2 is not limited to the downstream side in the transport direction of the PS plate 12, and may be another direction. Further, a rectifying plate is provided and the gum liquid jetted toward the rectifying plate is While uniformly diffusing along the width direction of the PS plate 12 with the current plate,
The PS plate 12 may be applied by dropping it on the surface. Further, instead of the spray pipe 74, the PS plate 12 moves while being in contact with the discharged gum liquid, so that P
You may use the discharge unit etc. which apply a gum solution to the back surface of S plate 12.

In the desensitizing section 18, a cleaning spray 76 is provided above the conveying roller pair 70, and a cleaning roller 78 that rotates while contacting the roller above the conveying roller pair 70 is provided. The cleaning water is dropped from the cleaning spray 76 to a contact position between the cleaning roller 78 above the conveying roller pair 70 and the cleaning roller 78 at a predetermined timing set in advance through the straightening plate 80. The gum liquid is evenly dispersed on the peripheral surfaces of the rollers above the conveying roller pair 70 to wash away the gum liquid from the peripheral surfaces of the upper and lower rollers of the conveying roller pair 70, and the gum liquid adheres to the peripheral surfaces of the rollers to cause PS.
The plate 12 is prevented from being damaged.

The PS plate 12 to which the gum solution has been applied in the desensitizing section 18 is sandwiched by the pair of conveying rollers 70 and is sent to the drying section 20 with the gum solution slightly remaining on the front and back surfaces. At this time, the excess gum solution is squeezed from the front and back surfaces of the PS plate 12 by the pair of conveying rollers 70 and is collected in the desensitizing tank 28.

The PS plate processor 10 is provided with a partition plate 82 between the desensitizing section 18 and the drying section 20. The partition plate 82 is disposed above the transporting path of the PS plate 12 so as to face the upper end of the processing tank 22, whereby the desensitization processing unit 18 and the drying unit 20 are disposed.
A slit-shaped insertion opening 84 is formed between the two. In addition, the partition plate 82 has a double structure, whereby a groove-shaped ventilation passage is formed on the drying portion 20 side of the insertion opening 84, and the air in the drying portion 20 enters into this ventilation passage. This prevents the air in the drying unit 20 from entering the desensitization processing unit 18 through the insertion opening 84.

In the drying section 20, in the vicinity of the insertion opening 84,
A support roller 86 that supports the PS plate 12 is disposed, and a transport roller pair 90 and a transport roller pair 92 are disposed in the central portion of the PS plate 12 in the transport direction and in the vicinity of the discharge port 88. . The PS plate 12 is transported in the drying section 20 by the support roller 86 and the transport roller pair 90, 92.

Between the support roller 86 and the transport roller pair 90 and between the transport roller pair 90 and the transport roller pair 92, a pair of ducts 94 and 96 sandwiching the transport path of the PS plate 12 is provided.
Is provided. The ducts 94 and 96 have a longitudinal direction of P.
The PS plate 12 is arranged along the width direction of the S plate 12.
A slit hole 98 is provided on the surface facing the conveyance path.

When the dry air generated by the dry air generating means (not shown) is supplied to the ducts 94 and 96 from one end side in the longitudinal direction, the dry air is supplied from the slit holes 98 to the P
It is discharged toward the transport path of the S plate 12 and sprayed on the PS plate 12. As a result, the gum solution applied to the front and back surfaces of the PS plate 12 is dried to form a protective film.

On the other hand, the lower surface of the developing section 14 is the developing tank 24.
The shielding lid 100 is arranged below the liquid surface of the developer stored in the developing tank 24 to reduce the area where the liquid surface of the developer in the developing tank 24 contacts the air. The sub-insertion port (reentry insertion port) 40 of the cover 36 is closed by a shielding member (not shown), and the shielding member prevents outside air from entering the developing unit 14. Further, the shielding lid 100 is narrowed between the upper side of the conveying roller pair 48, 52 protruding from the liquid surface and the like,
This prevents the developer in the developer tank 24 from being deteriorated due to contact with carbon dioxide gas in the air. A blade-shaped shielding member made of silicon rubber or the like is provided between the shielding lid 100 and the processing tank 22 and the conveying roller pairs 48, 52, etc., so that the developer in the developing tank 24 may come into contact with fresh outside air. It is also possible to prevent the water content in the developer from evaporating.

In the PS plate processor 10 thus configured, the PS plate 12 on which an image is recorded by being exposed by a printing device (not shown) is inserted into the insertion port 32.
Then, the transport roller 42 is driven to rotate.
As a result, the PS plate 12 is nipped by the pair of transport rollers 42 and drawn into the PS plate processor 10.

In the PS plate processor 10, a sensor for detecting the PS plate 12 passing through the insertion port 32 is provided in the vicinity of the insertion port 32, and this sensor is the PS plate 1
When the insertion of 2 is detected, the rotation drive of the conveying roller pair 42 and the like is started, and at the timing based on the detection of the PS plate 12 by this sensor, the rinsing water from the spray pipes 66, 68 of the rinsing section 16 is detected. The gum liquid is discharged from the spray pipes 72 and 74 of the discharge and desensitization processing unit 18.

The conveying roller pair 42 has the PS plate 12 drawn in from the insertion port 32, and is 15 ° to 31 ° with respect to the horizontal direction.
It is fed into the developing tank 24 at an insertion angle within the range. As a result, the PS plate 12 is conveyed in the developing tank 24 by the pair of conveying rollers 48 to 52 while being guided by the guide plates 44 and 46, and is immersed in the developing solution stored in the developing tank 24 to be 17 °. It is delivered from within the developer at an ejection angle in the range of ˜31 °.

When the PS plate 12 is immersed in a developing solution in the developing tank 24, an unnecessary photosensitive layer swells according to the exposed image, and the swollen photosensitive layer is removed from the support. At this time, in the PS plate processor 10, the surface of the PS plate 12 (the surface on the photosensitive layer side) is brushed by the brush roller 58 arranged in the developing tank 24, so that P
The removal of the unnecessary photosensitive layer from the surface of the S plate 12 is promoted.

As the PS version processor 10,
The surface of the PS plate 12 may be brushed using a plurality of brush rollers, or the PS plate 12 may be treated without using the brush rollers.

The PS plate 12 that has been developed and sent out from the developing tank 24 is sent to the water washing section 16 by the pair of carrying rollers 52. At this time, the conveying roller pair 52 is set to P
The developer adhering to the front and back surfaces of the S plate 12 is squeezed out.

In the water washing section 16, the PS plate 12 is sandwiched by the conveying roller pairs 62 and 64 and conveyed in a substantially horizontal state, while the washing water is jetted from the spray pipes 66 and 68. The transport roller pair 64 arranged on the downstream side in the transport direction of the PS plate 12 squeezes the wash water supplied to the front and back surfaces of the PS plate 12 together with the developer remaining without being squeezed by the transport roller pair 52. While dropping, the PS plate 12 is sent to the desensitization processing unit 18.

As a result, when the PS plate 12 passes through the water washing section 16, the developer remaining on the front and back surfaces is washed off.

PS plate 12 sent to the desensitizing section 18
Passes through between the spray pipes 72 and 74 and is sandwiched by the pair of transport rollers 70, so that the pair of transport rollers 7
0 is sent from the desensitization processing unit 18.

At this time, in the desensitizing section 18, the gum liquid is discharged from the spray pipes 66 and 68 to make the PS plate 1
The gum solution is uniformly applied to the front and back surfaces of No. 2 while diffusing the gum solution.
The conveying roller pair 70 sandwiches and conveys the PS plate 12, and squeezes the excess gum liquid from the front and back surfaces of the PS plate 12, thereby forming a uniform thin film of gum liquid on the front and back surfaces of the PS plate 12. .

The PS plate 12 coated with the gum solution is sent to the drying section 20 from the insertion opening 84 by the pair of conveying rollers 70. When the insertion opening 84 is provided with a shutter, the timing for starting the processing of the PS plate 12 or P
At the timing when the S plate 12 is sent out from the desensitization processing unit 18, the shutter is operated to open the insertion opening 84,
When the PS plate 12 does not pass through, the drying air of the drying unit 20 unnecessarily enters the desensitization processing unit 18 to prevent the gum solution from sticking to the pair of transport rollers 70, and also the insertion port 8
4 to prevent the deterioration of the developing solution due to carbon dioxide in the air that reaches the developing section 14 and to prevent the developing solution from deteriorating, or the water in the developing solution, the washing water and the water in the gum solution evaporate. It prevents you from getting out of 84.

In the drying unit 20, while the PS plate 12 is being conveyed by the support roller 86 and the pair of conveying rollers 90 and 92, the drying air is blown from the ducts 94 and 96 to the front and back surfaces of the PS plate 12. As a result, the PS plate 12 has a protective film formed by the gum solution applied on the surface and is discharged from the discharge port 88.

By the way, as shown in FIG. 2, in the processing tank 22 used in the PS plate processor 10, a bottom hole 112 is formed in a bottom plate 110 which is the bottom of the developing tank 24. Further, the bottom plate 110 of the developing tank 24 is inclined so that the bottom hole 112 side is at the lowest position. That is, the bottom plate 110 of the developing tank 24 in which the bottom hole 112 is formed is
It is the lowest in the developer tank 24, and the bottom plate 1
10 is inclined toward the bottom hole 112.

As shown in FIG. 1, the bottom plate 11 of the developing tank 24.
0 is provided with a pipe portion 114 projecting downward, and a bottom hole 112 (not shown in FIG. 1) is formed in the pipe portion 1.
14 is one of the openings.

As a result, the developing tank 24 is opened by opening the other end of the pipe section 114 (the side opposite to the bottom hole 112).
The developing solution inside flows into the bottom hole 112.

The pipe portion 114 is connected to the spray pipes 54 and 56 by a pipe (not shown), and a circulation pump (not shown) provided at an intermediate portion of the pipe is operated to develop in the developing tank 24. Liquid is bottom hole 112
And is supplied to the spray pipes 54 and 56.

The pipe connected to the pipe section 114 is branched before the circulation pump and connected to a waste liquid tank via a waste liquid valve (all not shown). As a result, the developer tank 2 can be opened by opening the waste liquid valve.
The developing solution can be discharged so that 4 is empty.

As shown in FIG. 3, in the processing tank 22,
A bottom hole 118 is formed in a bottom plate 116 which is the bottom of the washing tank 26, and a bottom hole 122 is formed in a bottom plate 120 which is the bottom of the desensitizing tank 26. The bottom holes 118 and 122 are each formed in an intermediate portion in the width direction which is a direction orthogonal to the transport direction of the PS plate 12. In addition, the bottom plates 116 and 12
0 from the both ends in the width direction to the bottom holes 118, 12
2, the bottom holes 118 and 122 are inclined so that the circumference thereof is the lowest.

As shown in FIG. 1, the bottom plate 11 of the washing tank 26
6, a pipe portion 124 is provided so as to project downward, and a bottom hole 118 is one opening of the pipe portion 124. The bottom plate 120 of the desensitizing tank 28 is provided with a pipe downwardly. The portion 126 is provided so that the bottom hole 122 has the pipe portion 1.
One of the openings 26.

Further, the pipe portion 124 formed on the bottom plate 116 of the washing tank 26 and the bottom plate 12 of the desensitizing tank 28.
The pipe portion 126 formed at 0 is connected to the spray pipes 66, 68 or the spray pipes 72, 74 via a circulation pump (not shown).

As a result, by operating the respective circulation pumps, the wash water in the wash tank 26 is removed from the bottom hole 118.
Is sucked from and supplied to the spray pipes 66, 68,
The gum solution in the desensitizing tank 28 is sucked from the bottom hole 122 and supplied to the spray pipes 72 and 74.

The respective pipes connected to the pipe parts 124 and 126 are branched in the middle and connected to a waste liquid tank via a waste liquid valve (both not shown).

Thus, by opening the respective waste liquid valves, the washing water in the washing tank 26 flows into the bottom hole 118, the gum solution in the desensitizing tank 28 flows into the bottom hole 122, and the washing tank 26 is washed. Also, the desensitizing treatment tank 28 can be discharged so as to be empty. It should be noted that conventionally known configurations can be applied to the circulation of each processing liquid, the waste liquid pipe, and the like, and detailed description thereof will be omitted in the present embodiment.

On the other hand, as shown in FIGS. 1, 2 and 3,
The bottom plates 110, 116, 120 have bottom holes 112, 11
A guide part 130 is formed so as to surround the 8 and 122. The basic configuration of the guide portion 130 provided on the bottom plate 110 of the developing tank 24, the bottom plate 116 of the water washing tank 26, and the bottom plate 120 of the desensitizing processing tank 28 is the same. As an example, the description of the washing tank 26 and the desensitizing tank 28 will be omitted.

As shown in FIG. 4, the guide portion 130 is formed by a plurality of standing walls 132 protruding from the bottom plate 110 so as to surround the bottom hole 112. Each of the standing walls 132 is curved with a predetermined curvature and is arranged concentrically with the bottom hole 112. As a result, in the guide portion 130, the opening portion 134 having a predetermined width is formed between the standing wall portions 132.

That is, in the guide part 130, a standing member 132 and an opening 134 are formed by arranging a cylindrical member coaxially with the bottom hole 112 and forming a cut having a predetermined width in the cylindrical member. It has a shape.

In this guide portion 130, the opening width W of the opening portion 134, which is the interval between the standing wall portions 132, is, for example, 2 mm to 5 mm.
In addition, the height H of the standing wall portion 132 is, for example, in the range of 5 mm to 15 mm, and the conveyance rollers (for example, the conveyance roller pair 50) and the guides (for example, the conveyance roller pair 50) arranged in the developing tank 24. For example, it can be formed so as not to interfere with the guide plates 44, 46, etc.).

The openings 134 between the standing wall portions 132 reach the upper surface of the bottom plate 110, so that the developing solution flowing along the bottom plate 110 passes through the openings 134 between the standing wall portions to form the bottom holes. It is possible to flow into 112.

When a large amount of developer (a liquid level exceeding the upper end of the standing wall 132) is stored in the developing tank 24, the bottom hole 11 is opened from the opening on the upper side of the standing wall 132.
It is possible to flow into 2.

At this time, by setting the height H of the standing wall portion 132 and the opening width of the opening portion 134 within the above-described predetermined ranges, small parts such as screws, nuts, and E-rings pass through the opening portion 134. It is possible to prevent the vehicle from running over the standing wall portion 132.

In the PS plate processor 10 having the processing tank 22 thus formed, the inside of the processing tank 22 is cleaned and the developing tank 24, the washing tank 26 and the desensitizing processing tank 2 are used.
When carrying out maintenance and the like of various members such as the conveying rollers, spray pipes, guides, etc., which are arranged inside 8, the corresponding members (work target members) are removed and attached.

At this time, the work target member may be attached or small parts such as screws, nuts and E-rings provided on the work target member may be accidentally dropped into the processing tank 22.

When such a small component falls into the developing tank 24, for example, the bottom plate 110 having the bottom hole 112 is the lowest in the developing tank 24. It rolls down and then rolls on the bottom plate 110 toward the bottom hole 112.

On the other hand, in the processing tank 22, a guide portion 130 is formed on the bottom plate 110. This guide part 130
The standing wall portion 132 is formed so as to surround the bottom hole 112, and the small parts rolling on the bottom plate 110 toward the bottom hole 112 do not pass through the openings 134 between the standing wall portions 132. It hits the part 132 and stops.

As a result, small parts do not enter the bottom hole 112 and fall into the pipe portion 114, so that the pipe portion 114 and the pipes connected to the pipe portion 114 are clogged. Can be reliably prevented.

Also, the small parts that are accidentally dropped are the standing wall 1
Since it stops by hitting 32, even if a small component is accidentally dropped, it can be easily taken out and will not be lost.

As described above, in the processing tank 22 provided in the PS plate processor 12, the bottom holes 112, 118 of the developing tank 24, the washing tank 26 and the desensitizing processing tank 28 provided in the processing tank 22 are provided. Since the guide portion 130 is provided for the 122, small parts such as screws, nuts, and E-rings, which are easily dropped by mistake when performing maintenance or the like, do not fall into the bottom holes 112, 118, 122. In order to take out the small parts dropped in the bottom holes 112, 118, 122, it is not necessary to perform a complicated work such as removing the pipes connected to the pipe parts 114, 124, 126 and the like.

The above-described embodiment does not limit the structure of the present invention. For example, in this embodiment, the bottom hole 112 (116, 1
Although the standing wall portion 132 is formed so as to divide the periphery of 20) into four, the present invention is not limited to this.

For example, the guide portion 136 shown in FIG.
In the above, the standing wall portion 138 and the opening portion 140 that divide the circumference of the bottom hole 112 into six are formed, and such a guide portion 136 is formed.
May be used. That is, it is possible to apply the one in which the standing wall portion and the opening portion are formed by dividing into an arbitrary number.

Further, as the present invention, the guide portion 142 shown in FIG. 5B can be applied. This guide part 14
In FIG. 2, the cylindrical standing wall portion 144 is projected from the bottom plate 110. The standing wall portion 144 has openings 146 at a plurality of locations on the side of the bottom plate 110 (four locations as an example in FIG. 5B).
Is formed.

Even in the guide portion 142 formed as described above, the developing solution can reliably flow toward the bottom hole 112 on the bottom plate 110 without being blocked by the standing wall portion 144. Passing through the opening 146 or standing wall 1
It is possible to reliably prevent small parts from falling into the bottom hole 112 without getting over 44.

Further, in the present embodiment described above, the processing tank 22 provided in the PS plate processor 10 for processing the PS plate 12 as a photosensitive material has been described as an example, but the present invention is not limited to printing the PS plate 12 or the like. The present invention can be applied not only to the printing plate but also to a processing tank of a photosensitive material processing apparatus for processing various photosensitive materials such as photographic paper and photographic film.

[0092]

As described above, according to the present invention, small components such as screws, nuts, and E-rings are surely prevented from falling into the bottom hole without blocking the processing liquid from flowing into the bottom hole. Can be prevented. As a result, when performing maintenance of the photosensitive material processing apparatus, even if a small component is accidentally dropped into the processing tank, the excellent effect that the troublesome work of taking out the small component dropped into the bottom hole does not occur. can get.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of a PS plate processor applied to the present embodiment.

FIG. 2 is a schematic view showing a main part on a developing tank side of a processing tank provided in a PS plate processor.

FIG. 3 is a schematic view showing a main part of a processing tank provided in a PS plate processor on a side of a washing tank and a desensitizing processing tank.

FIG. 4 is a perspective view of a main part showing an outline of a guide part which is a protective wall of the present invention.

5A and 5B are schematic perspective views showing another example of a guide portion applicable as a protective wall.

[Explanation of symbols]

10 PS Plate Processor (Photosensitive Material Processing Device) 12 PS plate (photosensitive material) 14 Development Department 16 Washing department 18 Desensitizing section 22 Processing tank 24 Development tank (processing tank) 26 Washing tank (treatment tank) 28 Desensitizing treatment tank (treatment tank) 110, 116, 120 Bottom plate 112, 118, 122 Bottom holes 130 Guide part (protection wall) 132 Standing wall (protection wall) 134 opening

Claims (2)

[Claims] 1. A processing tank structure of a photosensitive material processing apparatus for processing a photosensitive material with a processing liquid, wherein the processing tank structure forms a bottom portion of the processing tank and a bottom hole opened to allow the processing liquid to flow out. A bottom plate portion which is inclined toward the bottom plate portion, and the processing liquid is projected from the bottom plate portion to a predetermined height so as to surround the periphery of the opening of the bottom hole, and the processing liquid is projected along the upper surface of the bottom plate portion from the periphery. And a protective wall having an opening formed so as to reach the opening of, and a processing tank structure of a photosensitive material processing apparatus. 2. The opening is formed in the protective wall by notches having a predetermined width and formed so as to reach the bottom plate portion from the upper end portion. Of the processing tank of the photosensitive material processing device.