JP2003043202A5 - - Google Patents

Description

[Claims]
(1)
An antireflection film provided on a base material, wherein the first and eighth layers are formed of a low refractive index material, the second, fourth and sixth layers are formed of an intermediate refractive index material, and Each layer has a high refractive index material formed thereon, and the first layer has an optical thickness nd of (0.9 to 2.4) with respect to a design wavelength λ.
) × λ / 4, the second layer is (0.9 to 1.2) × λ / 4, and the third layer is (0.27 to 0.50) ×
λ / 4, the fourth layer is (0.17 to 0.27) × λ / 4, and the fifth layer is (1.34 to 2.14) ×
λ / 4, the sixth layer is (0.35-0.45) × λ / 4, and the seventh layer is (0.26-0.38) ×
λ / 4, and the eighth layer is (1.03 to 1.13) × λ / 4.
(2)
An antireflection film provided on a base material, wherein a low refractive index material is used in an eighth layer, an intermediate refractive index material is used in second, fourth, sixth layers, and a first, third, fifth, and seventh layers counted from the base material side. A high refractive index material is formed on each layer, and the first layer has an optical thickness nd of (0.05 to 0. 0) with respect to a design wavelength λ.
4) × λ / 4, the second layer is (0.2 to 1.3) × λ / 4, and the third layer is (0.2 to 0.7) × λ.
/ 4, the fourth layer is (0.1 to 0.5) × λ / 4, the fifth layer is (1.8 to 2.6) × λ / 4, and the sixth layer is (0.2 to 0.5). 5) × λ / 4, the seventh layer is (0.1-0.5) × λ / 4, and the eighth layer is (
0.9 to 1.2) × λ / 4.
(3)
The high refractive index material is _{HfO 2, ZrO 2, Ta 2} O 5, LaTi x O y, either or antireflective film according to claim 1 or 2, wherein the mixtures thereof of _Y 2 _{O 3} .
(4)
Antireflection film according to claim 1, wherein the intermediate refractive index material is one or a mixture of these Al 2 _{O 3,} CeF 3.
(5)
Claim 1, wherein the low refractive index material is either _SiO 2, MgF ₂
5. The antireflection film according to any one of 4.
6.
An optical component comprising the base material provided with the antireflection film according to any one of claims 1 to 5 .

[0020]
The antireflection film according to the invention of claim 5 is the antireflection film according to any one of claims 1 to 4,
,
The low refractive index material is one of SiO ₂ and MgF ₂ .
Use SiO2 or MgF2, which has low absorption in the ultraviolet region, as the low refractive index material
It is possible to use SiO _{2 for} the first layer and use MgF ₂ having a lower refractive index for the eighth layer.
desirable.

[0021]
According to a sixth aspect of the present invention, there is provided an optical component, wherein the antireflection film according to the first aspect is provided on a base material.
It is characterized in that
According to this optical component, the antireflection film having a high antireflection effect in a wide wavelength range from the ultraviolet region to the infrared region is formed, and thus has a high transmittance in a wide wavelength range. Therefore, the present invention can be applied to an optical device used in a wide wavelength range from the ultraviolet region to the infrared region. The material of the substrate may be a crystal material, plastic, or the like, in addition to glass. Also,
It is possible to obtain optical components of any shape such as a flat plate, a lens, and a prism.

[0079]
【The invention's effect】
As described above, according to the first to fifth aspects of the present invention, it is possible to obtain an antireflection film having high antireflection performance in a wide band from an ultraviolet region to a visible region and further to an infrared region.

[0080]
According to the invention of claim 6 , by providing the antireflection film of the invention of claims 1 to 5 , it is possible to obtain an optical component having a high transmittance in a wide band from the ultraviolet region to the infrared region.