JP2003024773A5 - - Google Patents

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Publication number
JP2003024773A5
JP2003024773A5 JP2001219535A JP2001219535A JP2003024773A5 JP 2003024773 A5 JP2003024773 A5 JP 2003024773A5 JP 2001219535 A JP2001219535 A JP 2001219535A JP 2001219535 A JP2001219535 A JP 2001219535A JP 2003024773 A5 JP2003024773 A5 JP 2003024773A5
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JP
Japan
Prior art keywords
vacuum vessel
high frequency
vacuum
processing apparatus
inductance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001219535A
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English (en)
Japanese (ja)
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JP2003024773A (ja
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Publication date
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Priority to JP2001219535A priority Critical patent/JP2003024773A/ja
Priority claimed from JP2001219535A external-priority patent/JP2003024773A/ja
Publication of JP2003024773A publication Critical patent/JP2003024773A/ja
Publication of JP2003024773A5 publication Critical patent/JP2003024773A5/ja
Pending legal-status Critical Current

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JP2001219535A 2001-07-19 2001-07-19 プラズマ処理方法及び装置 Pending JP2003024773A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001219535A JP2003024773A (ja) 2001-07-19 2001-07-19 プラズマ処理方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001219535A JP2003024773A (ja) 2001-07-19 2001-07-19 プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
JP2003024773A JP2003024773A (ja) 2003-01-28
JP2003024773A5 true JP2003024773A5 (https=) 2005-08-25

Family

ID=19053521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001219535A Pending JP2003024773A (ja) 2001-07-19 2001-07-19 プラズマ処理方法及び装置

Country Status (1)

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JP (1) JP2003024773A (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100455819B1 (ko) * 2002-08-13 2004-11-06 어댑티브프라즈마테크놀로지 주식회사 Ａｃｐ 방식에 의한 플라즈마 생성방법
KR100584122B1 (ko) * 2004-03-25 2006-05-29 에이피티씨 주식회사 플라즈마 소스코일을 갖는 플라즈마 챔버 및 이를 이용한웨이퍼 식각방법
WO2006031010A1 (en) * 2004-09-14 2006-03-23 Adaptive Plasma Technology Corp. Adaptively plasma source and method of processing semiconductor wafer using the same
JP2006278219A (ja) * 2005-03-30 2006-10-12 Utec:Kk Ｉｃｐ回路、プラズマ処理装置及びプラズマ処理方法
KR101069384B1 (ko) * 2008-11-14 2011-09-30 세메스 주식회사 플라즈마 안테나 및 이를 포함하는 플라즈마 처리 장치
JP5905447B2 (ja) * 2010-04-20 2016-04-20 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ プラズマ処理システムにおける誘導コイルアセンブリ
KR101695380B1 (ko) * 2013-05-31 2017-01-11 (주)브이앤아이솔루션 유도 결합 플라즈마 처리 장치

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