JP2003001763A - Insulating film and multilayered wiring board using the same - Google Patents

Insulating film and multilayered wiring board using the same

Info

Publication number
JP2003001763A
JP2003001763A JP2001194273A JP2001194273A JP2003001763A JP 2003001763 A JP2003001763 A JP 2003001763A JP 2001194273 A JP2001194273 A JP 2001194273A JP 2001194273 A JP2001194273 A JP 2001194273A JP 2003001763 A JP2003001763 A JP 2003001763A
Authority
JP
Japan
Prior art keywords
insulating film
wiring board
organic material
polyphenylene ether
conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001194273A
Other languages
Japanese (ja)
Other versions
JP4959066B2 (en
Inventor
Takahiro Matsunaga
隆弘 松永
Takuji Seri
拓司 世利
Kiyomi Hagiwara
清己 萩原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001194273A priority Critical patent/JP4959066B2/en
Publication of JP2003001763A publication Critical patent/JP2003001763A/en
Application granted granted Critical
Publication of JP4959066B2 publication Critical patent/JP4959066B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To satisfy all of the densification of wiring, humidity resistance, insulating properties and high frequency transmission characteristics in an insulating film comprising an organic material and a multilayered wiring board using the same. SOLUTION: The insulating film 3 is constituted by forming coating layers 2 comprising polyphenylene ether type organic matter on the upper and rear surfaces of a polyphenylene ether ketone type organic matter layer. The multilayered wiring board is constituted by laminating a plurality of the insulating films 3 each having a wiring conductor 4 comprising a metal foil on at least one of the upper and rear surfaces thereof and electrically connecting the wiring conductors 4 positioned up and down so as to hold the insulating films 3 through the piercing conductors formed to the insulating films 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、各種AV機器や家
電機器・通信機器・コンピュータやその周辺機器等の電
子機器に使用される絶縁フィルムおよびこれを用いた多
層配線基板に関し、特にポリエーテルエーテルケトン系
有機物を一部に用いた絶縁フィルムおよびこれを用いた
多層配線基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating film used in various kinds of electronic equipment such as AV equipment, home electric appliances, communication equipment, computers and peripheral equipment thereof, and a multilayer wiring board using the same, and particularly polyether ether. The present invention relates to an insulating film using a ketone-based organic material as a part and a multilayer wiring board using the insulating film.

【0002】[0002]

【従来の技術】従来、半導体素子等の能動部品や容量素
子・抵抗素子等の受動部品を多数搭載して所定の電子回
路を構成して成る混成集積回路に用いられる多層配線基
板は、通常、ガラスクロスにエポキシ樹脂を含浸させて
成る絶縁フィルムにドリルによって上下に貫通孔を形成
し、この貫通孔内部および絶縁層表面に複数の配線導体
を形成した配線基板を、多数積層することによって形成
されている。
2. Description of the Related Art Conventionally, a multilayer wiring board used for a hybrid integrated circuit in which a large number of active components such as semiconductor elements and passive components such as capacitance elements and resistance elements are mounted to form a predetermined electronic circuit is usually Formed by stacking a number of wiring boards, each having a plurality of wiring conductors formed inside the through hole and on the surface of the insulating layer by forming through holes in the insulating film made of glass cloth impregnated with epoxy resin by a drill. ing.

【0003】一般に、現在の電子機器は、移動体通信機
器に代表されるように小型・薄型・軽量・高性能・高機
能・高品質・高信頼性が要求されており、このような電
子機器に搭載される混成集積回路等の電子部品も小型・
高密度化が要求されるようになってきており、このよう
な高密度化の要求に応えるために、電子部品を構成する
多層配線基板も、配線導体の微細化や絶縁層の薄層化・
貫通孔の微細化が必要となってきている。このため、近
年、貫通孔を微細化するために、ドリル加工より微細加
工が可能なレーザ加工が用いられるようになってきた。
In general, current electronic devices are required to be small, thin, lightweight, high-performance, high-performance, high-quality and highly reliable, as represented by mobile communication devices. Electronic components such as hybrid integrated circuits mounted on
There is a demand for higher densities, and in order to meet such demands for higher densities, the multilayer wiring boards that compose electronic components are also made finer in wiring conductors and thinner in insulating layers.
The miniaturization of through holes has become necessary. For this reason, in recent years, in order to miniaturize the through holes, laser machining, which enables finer machining than drilling, has come to be used.

【0004】しかしながら、ガラスクロスにエポキシ樹
脂を含浸させて成る絶縁フィルムは、ガラスクロスをレ
ーザにより穿設加工することが困難なために貫通孔の微
細化には限界があり、また、ガラスクロスの厚みが不均
一のために均一な孔径の貫通孔を形成することが困難で
あるという問題点を有していた。
However, the insulating film formed by impregnating glass cloth with an epoxy resin has a limit in miniaturizing the through holes because it is difficult to drill the glass cloth with a laser, and the glass cloth of There is a problem that it is difficult to form a through hole having a uniform hole diameter due to the uneven thickness.

【0005】このような問題点を解決するために、アラ
ミド樹脂繊維で製作した不織布にエポキシ樹脂を含浸さ
せた絶縁フィルムや、ポリイミドフィルムにエポキシ系
接着剤を塗布した絶縁フィルムを絶縁層に用いた多層配
線基板が提案されている。
In order to solve such a problem, an insulating film obtained by impregnating a non-woven fabric made of aramid resin fiber with an epoxy resin or an insulating film obtained by coating a polyimide film with an epoxy adhesive is used as an insulating layer. Multilayer wiring boards have been proposed.

【0006】しかしながら、アラミド不織布やポリイミ
ドフィルムを用いた絶縁フィルムは吸湿性が高く、吸湿
した状態で半田リフローを行なうと半田リフローの熱に
より吸湿した水分が気化してガスが発生し、絶縁フィル
ム間で剥離してしまう等の問題点を有していた。
However, an insulating film using an aramid non-woven fabric or a polyimide film has a high hygroscopic property, and when solder reflow is performed in a moisture-absorbed state, moisture absorbed by the solder reflow is vaporized to generate a gas, and However, there is a problem such as peeling off.

【0007】このような問題点を解決するために、多層
配線基板の絶縁層の材料としてポリエーテルエーテルケ
トン樹脂を用いることが検討されている。ポリエーテル
エーテルケトン樹脂は、剛直な分子で構成されていると
ともに分子同士が規則的に並んだ構成をしており分子間
力が強いことから、高耐熱性・高弾性率・高寸法安定性
・低吸湿性を示し、ガラスクロスのような強化材を用い
る必要がなく、また、微細加工性にも優れるという特徴
を有している。
In order to solve such a problem, the use of polyetheretherketone resin as the material of the insulating layer of the multilayer wiring board has been studied. Polyetheretherketone resin is composed of rigid molecules and has a structure in which the molecules are regularly arranged and the intermolecular force is strong, so that high heat resistance, high elastic modulus, high dimensional stability, It has low hygroscopicity, does not require the use of a reinforcing material such as glass cloth, and has excellent fine workability.

【0008】このようなポリエーテルエーテルケトン樹
脂の特徴を活かし、特開2000-200976号公報には、ポリ
エーテルエーテルケトン樹脂を主成分とするフィルム状
絶縁体表面に導体箔を熱融着した後、この導体箔に回路
を形成してフィルム状配線基板を得、これらを複数積層
し熱融着して多層化した多層プリント配線板が提案され
ている。
Taking advantage of such characteristics of the polyether ether ketone resin, Japanese Patent Laid-Open No. 2000-200976 discloses that after a conductor foil is heat-sealed on the surface of a film-shaped insulator containing the polyether ether ketone resin as a main component. A multilayer printed wiring board has been proposed in which a circuit is formed on this conductor foil to obtain a film-shaped wiring board, and a plurality of these are laminated and heat-sealed to form a multilayer.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、このよ
うな多層プリント配線板は、ポリエーテルエーテルケト
ン樹脂フィルム同士を多層化する際、ポリエーテルエー
テルケトン樹脂分子が剛直であるとともにある程度分子
が規則正しく配向して分子間力が強くなっているために
分子が動き難くなり、ポリエーテルエーテルケトン樹脂
フィルムの表面のごく一部の分子だけしか絡み合うこと
ができないために密着性が悪く、高温バイアス試験にお
いてフィルム間で剥離して絶縁不良が発生してしまうと
いう問題点を有していた。また、導体箔とポリエーテル
エーテルケトン樹脂フィルムを熱融着により接着する
際、ポリエーテルエーテルケトン樹脂分子が動き難いた
めに導体箔表面の微細な凹部に入ることができず、その
結果、十分なアンカー効果を発揮することができず、導
体箔とポリエーテルエーテルケトン樹脂フィルムとの密
着性が悪くなって、高温高湿下において両者間で剥離し
て導体箔が断線してしまうという問題点も有していた。
また、エポキシ系接着剤を用いて導体箔とポリエーテル
エーテルケトン樹脂フィルムを接着する方法もあるが、
この場合、エポキシ系接着剤の誘電率がポリエーテルエ
ーテルケトン樹脂フィルムの誘電率と大きく異なること
から、導体箔を接着する際の加圧によって生じるわずか
な厚みばらつきにより、高周波領域、特に100MHz以
上の周波数においては伝送特性が低下してしまうという
問題点を有していた。
However, in such a multilayer printed wiring board, when the polyetheretherketone resin films are formed into multiple layers, the polyetheretherketone resin molecules are rigid and the molecules are regularly oriented to some extent. As the intermolecular force becomes strong, the molecules become difficult to move, and because only a small part of the molecules on the surface of the polyetheretherketone resin film can be entangled with each other, the adhesion is poor. However, there is a problem in that the insulation is peeled off and the insulation failure occurs. Further, when the conductor foil and the polyetheretherketone resin film are bonded by heat fusion, the polyetheretherketone resin molecules are difficult to move and therefore cannot enter the fine recesses on the surface of the conductor foil, resulting in sufficient There is also a problem that the anchor effect cannot be exhibited, the adhesion between the conductor foil and the polyetheretherketone resin film deteriorates, and the conductor foil peels off between the two under high temperature and high humidity and the conductor foil is broken. Had.
There is also a method of bonding the conductor foil and the polyetheretherketone resin film using an epoxy adhesive,
In this case, since the dielectric constant of the epoxy adhesive is significantly different from the dielectric constant of the polyetheretherketone resin film, due to a slight thickness variation caused by the pressure when bonding the conductor foil, a high frequency region, particularly 100 MHz or more There is a problem that the transmission characteristic is deteriorated at the frequency.

【0010】本発明はかかる従来技術の問題点に鑑み案
出されたものであり、その目的は、高密度な配線を有す
るとともに、耐湿性・絶縁性・高周波伝送特性に優れた
絶縁フィルムおよびこれを用いた多層配線基板を提供す
ることに有る。
The present invention has been devised in view of the above problems of the prior art, and an object thereof is to provide an insulating film having high-density wiring and excellent in moisture resistance, insulation, and high-frequency transmission characteristics. It is to provide a multilayer wiring board using.

【0011】[0011]

【課題を解決するための手段】本発明の絶縁フィルム
は、ポリエーテルエーテルケトン系有機物層の上下面に
ポリフェニレンエーテル系有機物から成る被覆層を形成
して成ることを特徴とするものである。
The insulating film of the present invention is characterized in that a coating layer made of a polyphenylene ether organic material is formed on the upper and lower surfaces of the polyether ether ketone organic material layer.

【0012】また、本発明の絶縁フィルムは、上記構成
において、ポリフェニレンエーテル系有機物が熱硬化性
ポリフェニレンエーテルであることを特徴とするもので
ある。
Further, the insulating film of the present invention is characterized in that, in the above constitution, the polyphenylene ether organic substance is a thermosetting polyphenylene ether.

【0013】さらに、本発明の多層配線基板は、上下面
の少なくとも一方の面に金属箔から成る配線導体が配設
された上記の絶縁フィルムを複数積層して成るととも
に、この絶縁フィルムを挟んで上下に位置する配線導体
間を絶縁フィルムに形成された貫通導体を介して電気的
に接続したことを特徴とするものである。
Further, the multilayer wiring board of the present invention is formed by laminating a plurality of the above-mentioned insulating films having wiring conductors made of a metal foil disposed on at least one of the upper and lower surfaces, and sandwiching the insulating films. It is characterized in that the wiring conductors located above and below are electrically connected to each other through a penetrating conductor formed in an insulating film.

【0014】また、本発明の多層配線基板は、絶縁フィ
ルムに配設された配線導体の幅方向の断面形状が、絶縁
フィルム側の底辺の長さが対向する底辺の長さよりも短
い台形状であり、かつ、絶縁フィルム側の底辺と側辺と
の成す角度が95〜150°であることを特徴とするもので
ある。
Further, in the multilayer wiring board of the present invention, the cross-sectional shape in the width direction of the wiring conductors arranged on the insulating film is a trapezoidal shape in which the length of the bottom side on the insulating film side is shorter than the length of the opposite bottom side. And the angle formed by the base and the side on the side of the insulating film is 95 to 150 °.

【0015】本発明の絶縁フィルムによれば、ポリエー
テルエーテルケトン系有機物層の上下面にポリフェニレ
ンエーテル系有機物から成る被覆層を形成して成るもの
としたことから、ポリフェニレンエーテル系有機物分子
がポリエーテルエーテルケトン系有機物分子ほど剛直で
なく、また、規則正しい配向性も示さないことから比較
的分子が動きやすく、その結果、絶縁フィルムを多層化
した場合においても、絶縁フィルム同士の密着性が良好
となり、高温バイアス試験においてフィルム間で剥離し
て絶縁不良が発生してしまうということはない。また、
絶縁フィルム表面に配線導体を配設した場合において
も、ポリフェニレンエーテル系有機物分子が配線導体表
面の微細な凹部に入り込み十分なアンカー効果を発揮す
ることができ、絶縁フィルムと配線導体との密着性が良
好となり、その結果、高温高湿下で両者間で剥離して配
線導体が断線してしまうということもない。さらに、ポ
リフェニレンエーテル系有機物から成る被覆層とポリエ
ーテルエーテルケトン系有機物層の誘電率の周波数挙動
がほぼ等しいことから、配線導体を接着する際の加圧に
よって被覆層にわずかな厚みばらつきが生じたとして
も、高周波領域における伝送特性に低下を生じることの
ない高周波伝送特性に優れた絶縁フィルムとすることが
できる。
According to the insulating film of the present invention, since the coating layer made of polyphenylene ether organic material is formed on the upper and lower surfaces of the polyether ether ketone organic material layer, the polyphenylene ether organic material molecule is polyether. It is not as rigid as the etherketone-based organic molecule, and the molecule is relatively easy to move because it does not show a regular orientation, and as a result, even when the insulating films are multi-layered, the adhesion between the insulating films becomes good, In the high temperature bias test, there is no possibility of peeling between the films and causing insulation failure. Also,
Even when the wiring conductor is arranged on the surface of the insulating film, the polyphenylene ether-based organic compound molecules can enter the fine recesses on the surface of the wiring conductor to exert a sufficient anchoring effect, and the adhesion between the insulating film and the wiring conductor can be improved. The result is good, and as a result, there is no possibility that the wiring conductor is broken due to peeling between the two under high temperature and high humidity. Furthermore, since the frequency behavior of the permittivity of the coating layer made of polyphenylene ether organic material and that of the polyether ether ketone organic material are almost equal, a slight thickness variation occurred in the coating layer due to the pressure applied when bonding the wiring conductor. Even in this case, it is possible to obtain an insulating film having excellent high-frequency transmission characteristics without causing deterioration in transmission characteristics in the high-frequency region.

【0016】また、本発明の多層配線基板によれば、多
層配線基板を上記の絶縁フィルムを用いて形成したこと
から、耐湿性・高周波特性に優れた多層配線基板とする
ことができる。さらに、絶縁フィルムを多層化する際、
被覆層を形成するポリフェニレンエーテル系有機物分子
は動きやすいためにポリフェニレンエーテル系有機物分
子同士が絡み合いやすく、絶縁フィルム同士の密着性が
強くなり、その結果、高温バイアス試験下においても絶
縁フィルム間で剥離して絶縁不良が発生してしまうこと
はない。
Further, according to the multilayer wiring board of the present invention, since the multilayer wiring board is formed by using the above-mentioned insulating film, the multilayer wiring board having excellent moisture resistance and high frequency characteristics can be obtained. Furthermore, when multilayering the insulating film,
Since the polyphenylene ether-based organic molecule forming the coating layer is easy to move, the polyphenylene ether-based organic molecule is easily entangled with each other, and the adhesion between the insulating films is increased, and as a result, the insulating films are peeled between the insulating films even under the high temperature bias test. Insulation failure does not occur.

【0017】さらに、本発明の多層配線基板によれば、
絶縁フィルムに配設された配線導体の幅方向の断面形状
を、絶縁フィルム側の底辺の長さが対向する底辺の長さ
よりも短い台形状とし、かつ、絶縁フィルム側の底辺と
側辺との成す角度を95〜150°としたことから、配線導
体を被覆層に容易に埋設することができ、配線導体を埋
設した後の被覆層表面をほぼ平坦にすることができるた
め、多層化する際に絶縁層間に空気をかみ込むことはな
く、絶縁性信頼性の高い多層配線基板とすることができ
る。
Further, according to the multilayer wiring board of the present invention,
The cross-sectional shape in the width direction of the wiring conductor disposed on the insulating film is a trapezoid whose base length on the insulating film side is shorter than the length of the opposing base, and between the base and the side on the insulating film side. Since the angle formed is 95 to 150 °, the wiring conductor can be easily embedded in the coating layer, and the surface of the coating layer after the wiring conductor is embedded can be made almost flat. Since no air is caught between the insulating layers, a multilayer wiring board having high insulation reliability can be obtained.

【0018】[0018]

【発明の実施の形態】次に本発明の絶縁フィルムおよび
多層配線基板を添付の図面に基づいて詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Next, the insulating film and the multilayer wiring board of the present invention will be described in detail with reference to the accompanying drawings.

【0019】図1は、本発明の絶縁フィルムの実施の形
態の一例を示す断面図であり、また、図2は、図1の絶
縁フィルムを用いて形成した多層配線基板に半導体素子
等の電子部品を搭載して成る混成集積回路の実施の形態
の一例を示す断面図である。さらに、図3は、図2に示
す多層配線基板の要部拡大断面図である。これらの図に
おいて1はポリエーテルエーテルケトン系有機物層、2
は被覆層で、主にこれらで本発明の絶縁フィルム3が構
成されている。また、4は配線導体、5は貫通導体で、
主に絶縁フィルム3と配線導体4と貫通導体5とで本発
明の多層配線基板6が構成されている。なお、本例の多
層配線基板6では、絶縁フィルム3を4層積層して成る
ものを示している。
FIG. 1 is a sectional view showing an example of an embodiment of an insulating film of the present invention, and FIG. 2 is a multilayer wiring board formed by using the insulating film of FIG. It is sectional drawing which shows an example of embodiment of the hybrid integrated circuit which mounts components. Further, FIG. 3 is an enlarged cross-sectional view of a main part of the multilayer wiring board shown in FIG. In these figures, 1 is a polyether ether ketone-based organic material layer, 2
Is a coating layer, which mainly constitutes the insulating film 3 of the present invention. Further, 4 is a wiring conductor, 5 is a through conductor,
The insulating film 3, the wiring conductor 4, and the penetrating conductor 5 mainly form the multilayer wiring board 6 of the present invention. In addition, the multilayer wiring board 6 of this example is shown as being formed by laminating four layers of the insulating films 3.

【0020】絶縁フィルム3は、ポリエーテルエーテル
ケトン系有機物層1と、その表面に被着形成された被覆
層2とから構成されており、これを用いて多層配線基板
6を構成した場合、配線導体4や多層配線基板6に搭載
される電子部品7の支持体としての機能を有する。
The insulating film 3 is composed of a polyetheretherketone-based organic material layer 1 and a coating layer 2 adhered to the surface thereof. When the multilayer wiring board 6 is constructed by using this, wiring is formed. It has a function as a support for the electronic component 7 mounted on the conductor 4 and the multilayer wiring board 6.

【0021】なお、ここでポリエーテルエーテルケトン
系有機物とは次式で示される構造の樹脂やこの構造に種
々の官能基が結合した樹脂、あるいはこれらの誘導体・
重合体を意味するものである。
The term "polyether ether ketone-based organic material" as used herein means a resin having a structure represented by the following formula, a resin having various functional groups bonded to this structure, or a derivative thereof.
It means a polymer.

【0022】[0022]

【化1】 [Chemical 1]

【0023】また、ポリフェニレンエーテル系有機物と
は、ポリフェニレンエーテル樹脂やポリフェニレンエー
テルに種々の官能基が結合した樹脂、あるいはこれらの
誘導体・重合体を意味するものである。
The term "polyphenylene ether organic material" means a polyphenylene ether resin, a resin in which various functional groups are bonded to polyphenylene ether, or a derivative or polymer thereof.

【0024】このようなポリエーテルエーテルケトン系
有機物としては、温度サイクル信頼性・半田耐熱性・加
工性の観点からは230〜430℃の温度、特に280〜380℃の
温度に融点を有するものが好ましく、さらに、層として
の物性を損なわない範囲内で、熱安定性を改善するため
の酸化防止剤や耐光性を改善するための紫外線吸収剤等
の光安定剤、難燃性を改善するためのハロゲン系もしく
はリン酸系の難燃性剤、アンチモン系化合物やホウ酸亜
鉛・メタホウ酸バリウム・酸化ジルコニウム等の難燃助
剤、潤滑性を改善するための高級脂肪酸や高級脂肪酸エ
ステル・高級脂肪酸金属塩・フルオロカーボン系界面活
性剤等の滑剤、熱膨張係数を調整するため、および/ま
たは機械的強度を向上するための酸化アルミニウム・酸
化珪素・酸化チタン・酸化バリウム・酸化ストロンチウ
ム・酸化ジルコニウム・酸化カルシウム・ゼオライト・
窒化珪素・窒化アルミニウム・炭化珪素・チタン酸カリ
ウム・チタン酸バリウム・チタン酸ストロンチウム・チ
タン酸カルシウム・ホウ酸アルミニウム・スズ酸バリウ
ム・ジルコン酸バリウム・ジルコン酸ストロンチウム等
の充填材を含有してもよい。
From the viewpoint of temperature cycle reliability, solder heat resistance, and workability, such polyether ether ketone-based organic matter has a melting point at a temperature of 230 to 430 ° C., particularly 280 to 380 ° C. More preferably, within a range that does not impair the physical properties of the layer, a light stabilizer such as an antioxidant for improving thermal stability or an ultraviolet absorber for improving light resistance, for improving flame retardancy. Halogen-based or phosphoric acid-based flame retardants, antimony compounds, flame-retardant aids such as zinc borate, barium metaborate and zirconium oxide, higher fatty acids and higher fatty acid esters and higher fatty acids for improving lubricity Lubricants such as metal salts / fluorocarbon-based surfactants, aluminum oxide / silicon oxide / titanium oxide for adjusting the thermal expansion coefficient and / or improving the mechanical strength Barium oxide, strontium oxide zirconium oxide calcified Zeolite
Fillers such as silicon nitride, aluminum nitride, silicon carbide, potassium titanate, barium titanate, strontium titanate, calcium titanate, aluminum borate, barium stannate, barium zirconate, and strontium zirconate may be contained. .

【0025】なお、上記の充填材等の粒子形状は、略球
状・針状・フレーク状等があり、充填性の観点からは略
球状が好ましい。また、粒子径は、通常0.1〜15μm程
度であり、ポリエーテルエーテルケトン系有機物層1の
厚みよりも小さい。
The particle shape of the above-mentioned filler and the like may be substantially spherical, needle-like, flake-like, etc. From the viewpoint of filling properties, substantially spherical shape is preferred. The particle diameter is usually about 0.1 to 15 μm, which is smaller than the thickness of the polyether ether ketone-based organic material layer 1.

【0026】さらに、ポリエーテルエーテルケトン系有
機物層1は、ポリフェニレンエーテル系有機物から成る
被覆層2との密着性を高めるために、その表面をバフ研
磨・ブラスト研磨・ブラシ研磨・プラズマ処理・コロナ
処理・紫外線処理・薬品処理等の方法を用いて中心線表
面粗さRaが0.05〜5μmの値となるように粗化してお
くことが好ましい。中心線表面粗さRaは、半田リフロ
ーの際にポリエーテルエーテルケトン系有機物層1と被
覆層2との剥離を防止するという観点からは0.05μm以
上であることが好ましく、表面に被覆層2を形成する際
に空気のかみ込みを防止するという観点からは5μm以
下であることが好ましい。従って、ポリエーテルエーテ
ルケトン系有機物層1は、その表面を中心線表面粗さR
aが0.05〜5μmの粗面とすることが好ましい。
Further, the surface of the polyetheretherketone-based organic material layer 1 is buffed, blasted, brushed, plasma-treated or corona-treated in order to improve the adhesion to the coating layer 2 made of a polyphenylene ether-based organic material. It is preferable that the center line surface roughness Ra be roughened to a value of 0.05 to 5 μm by using a method such as ultraviolet ray treatment or chemical treatment. The center line surface roughness Ra is preferably 0.05 μm or more from the viewpoint of preventing separation of the polyether ether ketone-based organic material layer 1 and the coating layer 2 during solder reflow, and the coating layer 2 is formed on the surface. The thickness is preferably 5 μm or less from the viewpoint of preventing entrapment of air during formation. Therefore, the surface of the polyether ether ketone-based organic material layer 1 has a center line surface roughness R
It is preferable that a has a rough surface of 0.05 to 5 μm.

【0027】ポリエーテルエーテルケトン系有機物層1
の表面に形成される被覆層2は、配線導体4を被着形成
する際の接着剤の機能を有するとともに、絶縁フィルム
3を用いて多層配線基板6を構成する際に、絶縁フィル
ム3同士を積層する際の接着剤の役目を果たす。
Polyetheretherketone-based organic material layer 1
The coating layer 2 formed on the surface has a function as an adhesive when the wiring conductor 4 is adhered and formed, and when the insulating film 3 is used to form the multilayer wiring substrate 6, the insulating films 3 are separated from each other. Serves as an adhesive when laminating.

【0028】被覆層2は、ポリフェニレンエーテル樹脂
やその誘導体、または、これらのポリマーアロイ等のポ
リフェニレンエーテル系有機物を30〜90体積%含有して
おり、とりわけ熱サイクル信頼性や配線導体4を接着す
る際の位置精度の観点からは、アリル変性ポリフェニレ
ンエーテル等の熱硬化性ポリフェニレンエーテルを含有
することが好ましい。
The coating layer 2 contains 30 to 90% by volume of a polyphenylene ether resin or a derivative thereof, or a polyphenylene ether type organic material such as a polymer alloy of these, and particularly, the thermal cycle reliability and the adhesion of the wiring conductor 4 to each other. From the viewpoint of positional accuracy in this case, it is preferable to contain a thermosetting polyphenylene ether such as allyl-modified polyphenylene ether.

【0029】なお、ポリフェニレンエーテル系有機物の
含有量が30体積%未満であると、後述する充填材との混
練性が低下する傾向があり、また、90体積%を超える
と、ポリエーテルエーテルケトン系有機物層1表面に被
覆層2を形成する際に、被覆層2の厚みバラツキが大き
くなる傾向がある。従って、ポリフェニレンエーテル系
有機物の含有量は、30〜90体積%の範囲が好ましい。
When the content of the polyphenylene ether-based organic matter is less than 30% by volume, the kneading property with the filler, which will be described later, tends to decrease, and when it exceeds 90% by volume, the polyetheretherketone-based organic matter is contained. When the coating layer 2 is formed on the surface of the organic material layer 1, the thickness variation of the coating layer 2 tends to increase. Therefore, the content of the polyphenylene ether organic substance is preferably in the range of 30 to 90% by volume.

【0030】また、被覆層2は、ポリエーテルエーテル
ケトン系有機物層1との接着性や配線導体4・貫通導体
5との密着性を良好にするという観点からは、重合反応
可能な官能基を2個以上有する多官能性モノマーあるい
は多官能性重合体等の添加剤を含有することが好まし
く、例えば、トリアリルシアヌレートやトリアリルイソ
シアヌレートおよびこれらの重合体等を含有することが
好ましい。
From the viewpoint of improving the adhesiveness with the polyetheretherketone-based organic material layer 1 and the adhesiveness with the wiring conductor 4 and the through conductor 5, the coating layer 2 contains a functional group capable of undergoing a polymerization reaction. It is preferable to contain an additive such as a polyfunctional monomer or a polyfunctional polymer having two or more, and for example, it is preferable to contain triallyl cyanurate, triallyl isocyanurate or a polymer thereof.

【0031】さらに、被覆層2は、弾性率を調整するた
めのゴム成分や熱安定性を改善するための酸化防止剤、
耐光性を改善するための紫外線吸収剤等の光安定剤、難
燃性を改善するためのハロゲン系もしくはリン酸系の難
燃性剤、アンチモン系化合物やホウ酸亜鉛・メタホウ酸
バリウム・酸化ジルコニウム等の難燃助剤、潤滑性を改
善するための高級脂肪酸や高級脂肪酸エステルや高級脂
肪酸金属塩・フルオロカーボン系界面活性剤等の滑剤、
熱膨張係数を調整したり機械的強度を向上するための酸
化アルミニウムや酸化珪素・酸化チタン・酸化バリウム
・酸化ストロンチウム・酸化ジルコニウム・酸化カルシ
ウム・ゼオライト・窒化珪素・窒化アルミニウム・炭化
珪素・チタン酸カリウム・チタン酸バリウム・チタン酸
ストロンチウム・チタン酸カルシウム・ホウ酸アルミニ
ウム・スズ酸バリウム・ジルコン酸バリウム・ジルコン
酸ストロンチウム等の充填材、あるいは、充填材との親
和性を高めこれらの接合性向上と機械的強度を高めるた
めのシラン系カップリング剤やチタネート系カップリン
グ剤等のカップリング剤を含有してもよい。
Further, the coating layer 2 comprises a rubber component for adjusting the elastic modulus and an antioxidant for improving the thermal stability,
Light stabilizers such as UV absorbers to improve light resistance, halogen-based or phosphoric acid-based flame retardants to improve flame retardancy, antimony compounds, zinc borate, barium metaborate, and zirconium oxide. Flame retardant aids such as, lubricants such as higher fatty acids and higher fatty acid esters to improve lubricity, higher fatty acid metal salts and fluorocarbon surfactants,
Aluminum oxide, silicon oxide, titanium oxide, barium oxide, strontium oxide, zirconium oxide, calcium oxide, zeolite, silicon nitride, aluminum nitride, silicon carbide, potassium titanate for adjusting thermal expansion coefficient and improving mechanical strength・ Filling materials such as barium titanate, strontium titanate, calcium titanate, aluminum borate, barium stannate, barium zirconate, strontium zirconate, etc., or improving their bondability and mechanical properties. A coupling agent such as a silane coupling agent or a titanate coupling agent for increasing the mechanical strength may be contained.

【0032】特に絶縁フィルム3を積層しプレスする際
に、被覆層2の流動性を抑制し、貫通導体5の位置ずれ
や被覆層2の厚みばらつきを防止するという観点から
は、被覆層2は充填材として10体積%以上の無機絶縁粉
末を含有することが好ましい。また、ポリエーテルエー
テルケトン系有機物層1との接着界面および配線導体4
との接着界面での半田リフロー時の剥離を防止するとい
う観点からは、充填材の含有量を70体積%以下とするこ
とが好ましい。従って、ポリフェニレンエーテル系有機
物から成る被覆層2に、10〜70体積%の充填材を含有さ
せておくことが好ましい。
In particular, when the insulating film 3 is laminated and pressed, from the viewpoint of suppressing the fluidity of the coating layer 2 and preventing the positional displacement of the through conductor 5 and the variation in the thickness of the coating layer 2, the coating layer 2 is It is preferable to contain 10% by volume or more of inorganic insulating powder as the filler. In addition, the bonding interface with the polyether ether ketone-based organic material layer 1 and the wiring conductor 4
The content of the filler is preferably 70% by volume or less from the viewpoint of preventing peeling during solder reflow at the adhesive interface with. Therefore, it is preferable that the coating layer 2 made of a polyphenylene ether-based organic material contains 10 to 70% by volume of the filler.

【0033】なお、上記の充填材等の形状は、略球状・
針状・フレーク状等があり、充填性の観点からは、略球
状が好ましい。また、粒子径は、0.1〜15μm程度であ
り、被覆層2の厚みよりも小さい。
The shape of the above-mentioned filling material is substantially spherical.
There are needle-like shapes and flake-like shapes, and a substantially spherical shape is preferable from the viewpoint of filling properties. The particle size is about 0.1 to 15 μm, which is smaller than the thickness of the coating layer 2.

【0034】本発明の絶縁フィルム3によれば、ポリエ
ーテルエーテルケトン系有機物層1の上下面にポリフェ
ニレンエーテル系有機物から成る被覆層2を形成して成
るものとしたことから、ポリフェニレンエーテル系有機
物分子がポリエーテルエーテルケトン系有機物分子ほど
剛直でなく、また、規則正しい配向性も示さないことか
ら比較的分子が動きやすく、その結果、絶縁フィルム3
を多層化した場合においても、絶縁フィルム3同士の密
着性が良好となり、高温バイアス試験においてフィルム
間で剥離して絶縁不良が発生してしまうということはな
い。また、絶縁フィルム3表面に配線導体4を配設した
場合においても、ポリフェニレンエーテル系有機物分子
が配線導体4表面の微細な凹部に入り込み十分なアンカ
ー効果を発揮することができ、絶縁フィルム3と配線導
体4との密着性が良好となり、その結果、高温高湿下に
おいて両者間で剥離して配線導体4が断線してしまうと
いうこともない。さらに、ポリフェニレンエーテル系有
機物から成る被覆層2とポリエーテルエーテルケトン系
有機物層の誘電率の周波数挙動がほぼ等しいことから、
配線導体4を接着する際の加圧によってわずかな厚みば
らつきが生じたとしても高周波領域における伝送特性の
低下を生じることのない高周波伝送特性に優れた絶縁フ
ィルム3とすることができる。
According to the insulating film 3 of the present invention, since the coating layers 2 made of polyphenylene ether organic material are formed on the upper and lower surfaces of the polyether ether ketone organic material layer 1, polyphenylene ether organic material molecules are formed. Is not as rigid as the polyetheretherketone-based organic molecule, and does not show regular orientation, so that the molecule is relatively easy to move, and as a result, the insulating film 3
Even in the case of forming a multi-layered structure, the adhesion between the insulating films 3 becomes good, and there is no possibility that insulation failure occurs due to peeling between the films in the high temperature bias test. Even when the wiring conductor 4 is arranged on the surface of the insulating film 3, the polyphenylene ether-based organic compound molecules can enter the fine recesses on the surface of the wiring conductor 4 and exert a sufficient anchoring effect. Adhesion with the conductor 4 is improved, and as a result, there is no possibility that the wiring conductor 4 is disconnected due to peeling between the two under high temperature and high humidity. Furthermore, since the coating layer 2 made of a polyphenylene ether-based organic material and the polyether ether ketone-based organic material layer have substantially the same frequency behavior of the dielectric constant,
Even if a slight variation in thickness occurs due to the pressure applied when the wiring conductor 4 is bonded, it is possible to obtain the insulating film 3 having excellent high-frequency transmission characteristics that does not cause deterioration of the transmission characteristics in the high-frequency region.

【0035】このような絶縁フィルム3は、例えば粒径
が0.1〜15μm程度の酸化珪素等の無機絶縁粉末に、熱
硬化性ポリフェニレンエーテル樹脂と溶剤・可塑剤・分
散剤等を添加して得たペーストをポリエーテルエーテル
ケトン系有機物層1の上下表面に従来周知のドクタブレ
ード法等のシート成型法を採用して被覆層2を形成した
後、あるいは上記のペースト中にポリエーテルエーテル
ケトン系有機物層1を浸漬し垂直に引き上げることによ
ってポリエーテルエーテルケトン系有機物層1の表面に
被覆層2を形成した後、これを60〜100℃の温度で5分
〜3時間加熱・乾燥することにより製作される。
Such an insulating film 3 is obtained by adding a thermosetting polyphenylene ether resin and a solvent, a plasticizer, a dispersant, etc. to an inorganic insulating powder such as silicon oxide having a particle size of about 0.1 to 15 μm. After forming the coating layer 2 on the upper and lower surfaces of the polyetheretherketone-based organic material layer 1 by using a conventionally known sheet molding method such as the doctor blade method, or in the above-mentioned paste, the polyetheretherketone-based organic material layer It is manufactured by forming a coating layer 2 on the surface of the polyetheretherketone-based organic material layer 1 by immersing 1 and pulling it up vertically, and then heating and drying this at a temperature of 60 to 100 ° C. for 5 minutes to 3 hours. It

【0036】なお、絶縁フィルム3の厚みは絶縁信頼性
を確保するという観点からは10〜200μmであることが
好ましく、また、高耐熱性・低吸湿性・高寸法安定性を
確保するという観点からは、ポリエーテルエーテルケト
ン系有機物層1の厚みを絶縁フィルム3の厚みの40〜90
%の範囲としておくことが好ましい。
The thickness of the insulating film 3 is preferably 10 to 200 μm from the viewpoint of ensuring insulation reliability, and from the viewpoint of ensuring high heat resistance, low hygroscopicity and high dimensional stability. Means that the thickness of the polyetheretherketone-based organic material layer 1 is 40 to 90 times that of the insulating film 3.
It is preferable to set it in the range of%.

【0037】また、本発明の多層配線基板6は、上下面
の少なくとも一方の面に金属箔から成る配線導体4が配
設された絶縁フィルム3を複数積層して成るとともに、
この絶縁フィルム3を挟んで上下に位置する配線導体4
間を絶縁フィルム3に形成された貫通導体5を介して電
気的に接続することにより形成されている。
The multilayer wiring board 6 of the present invention is formed by laminating a plurality of insulating films 3 each having a wiring conductor 4 made of a metal foil disposed on at least one of the upper and lower surfaces thereof.
Wiring conductors 4 located above and below with the insulating film 3 interposed therebetween
It is formed by electrically connecting the gaps through the penetrating conductors 5 formed on the insulating film 3.

【0038】絶縁フィルム3に形成された配線導体4
は、その厚みが2〜30μm程度で銅・金等の良導電性の
金属箔から成り、多層配線基板6に搭載される電子部品
7を外部電気回路(図示せず)に電気的に接続する機能
を有する。
Wiring conductor 4 formed on insulating film 3
Is made of a highly conductive metal foil such as copper and gold having a thickness of about 2 to 30 μm, and electrically connects the electronic component 7 mounted on the multilayer wiring board 6 to an external electric circuit (not shown). Have a function.

【0039】このような配線導体4は、絶縁フィルム3
を複数積層する際、配線導体4の周囲にボイドが発生す
るのを防止するという観点から、被覆層2に少なくとも
配線導体4の表面と被覆層2の表面とが平坦となるよう
に埋設されていることが好ましい。また、配線導体4を
被覆層2に埋設する際に、被覆層2の乾燥状態での気孔
率を3〜40体積%としておくと、配線導体4周囲の被覆
層2の樹脂盛り上がりを生じさせず平坦化することがで
きるとともに配線導体4と被覆層2の間に挟まれる空気
の排出を容易にして気泡の巻き込みを防止することがで
きる。なお、乾燥状態での気孔率が40体積%を超える
と、複数積層した絶縁フィルム3を加圧・加熱硬化した
後に被覆層2内に気孔が残存し、この気孔が空気中の水
分を吸着して絶縁性が低下してしまうおそれがあるの
で、被覆層2の乾燥状態での気孔率を3〜40体積%の範
囲としておくことが好ましい。
Such a wiring conductor 4 is composed of the insulating film 3
From the viewpoint of preventing voids from being generated around the wiring conductor 4 when a plurality of wiring conductors are stacked, the wiring conductor 4 is buried so that at least the surface of the wiring conductor 4 and the surface of the coating layer 2 are flat. Is preferred. When the wiring conductor 4 is embedded in the coating layer 2, if the porosity of the coating layer 2 in the dry state is set to 3 to 40% by volume, resin swelling of the coating layer 2 around the wiring conductor 4 does not occur. The air can be flattened and the air trapped between the wiring conductor 4 and the coating layer 2 can be easily discharged to prevent air bubbles from being trapped. When the porosity in the dry state exceeds 40% by volume, pores remain in the coating layer 2 after pressurizing and heating and curing a plurality of laminated insulating films 3, and the pores adsorb moisture in the air. Therefore, it is preferable that the porosity of the coating layer 2 in the dry state is in the range of 3 to 40% by volume because the insulating property may be deteriorated.

【0040】このような被覆層2の乾燥状態での気孔率
は、被覆層2をポリエーテルエーテルケトン系有機物層
1の表面上に塗布し乾燥する際に、乾燥温度や昇温速度
等の乾燥条件を適宜調整することにより所望の値とする
ことができる。
The porosity of the coating layer 2 in the dry state is such that when the coating layer 2 is applied onto the surface of the polyether ether ketone-based organic material layer 1 and dried, the drying temperature, the rate of temperature rise, etc. A desired value can be obtained by appropriately adjusting the conditions.

【0041】さらに、絶縁フィルム3に配設された配線
導体4の幅方向の断面形状を、絶縁フィルム3側の底辺
の長さが対向する底辺の長さよりも短い台形状とすると
ともに、絶縁フィルム3側の底辺と側辺との成す角度を
95〜150°とすることが好ましい。絶縁フィルム3に配
設された配線導体4の幅方向の断面形状を、絶縁フィル
ム3側の底辺の長さが対向する底辺の長さよりも短い台
形状とするとともに、絶縁フィルム3側の底辺と側辺と
の成す角度を95〜150°とすることにより、配線導体4
を被覆層2に埋設する際に、配線導体4を被覆層2に容
易に埋設して配線導体4を埋設した後の被覆層2表面を
ほぼ平坦にすることができ、積層の際に空気をかみ込ん
で絶縁性を低下させることのない多層配線基板6とする
ことができる。なお、気泡をかみ込むことなく埋設する
という観点からは、絶縁フィルム3側の底辺と側辺との
成す角度を95°以上とすることが好ましく、配線導体2
を微細化するという観点からは150°以下とすることが
好ましい。
Further, the cross-sectional shape in the width direction of the wiring conductor 4 arranged on the insulating film 3 is a trapezoidal shape in which the length of the bottom side on the insulating film 3 side is shorter than the length of the opposite bottom side, and the insulating film is formed. The angle between the bottom side and the side on the 3 side is
It is preferably set to 95 to 150 °. The cross-sectional shape of the wiring conductor 4 disposed on the insulating film 3 in the width direction is a trapezoid whose base length on the insulating film 3 side is shorter than the length of the opposing base, and By setting the angle formed by the sides with 95 to 150 °, the wiring conductor 4
When the wiring conductor 4 is embedded in the coating layer 2, the wiring conductor 4 can be easily embedded in the coating layer 2 so that the surface of the coating layer 2 after the wiring conductor 4 is embedded can be made substantially flat. It is possible to obtain the multilayer wiring board 6 that does not bite into and deteriorate the insulation. From the viewpoint of embedding air bubbles without biting, it is preferable that the angle formed by the bottom side and the side side of the insulating film 3 side be 95 ° or more.
From the viewpoint of miniaturization, it is preferable that the angle be 150 ° or less.

【0042】また、絶縁フィルム3の層間において、配
線導体4の長さの短い底辺とポリエーテルエーテルケト
ン系有機物層1との間に位置する被覆層2の厚みx(μ
m)が、上下のポリエーテルエーテルケトン系有機物層
1間の距離をT(μm)、配線導体4の厚みをt(μ
m)としたときに、3μm≦0.5T−t≦x≦0.5T≦35
μm(ただし、8μm≦T≦70μm、1μm≦t≦32μ
m)であることが好ましい。
In addition, the thickness x (μ of the coating layer 2 located between the bottom of the wiring conductor 4 having a short length and the polyether ether ketone-based organic material layer 1 between the insulating film 3 layers.
m) is the distance between the upper and lower polyether ether ketone-based organic material layers 1 is T (μm), and the thickness of the wiring conductor 4 is t (μ).
m), 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T ≦ 35
μm (however, 8 μm ≦ T ≦ 70 μm, 1 μm ≦ t ≦ 32 μ
m) is preferred.

【0043】ポリエーテルエーテルケトン系有機物層1
間の距離をT(μm)、配線導体4の厚みをt(μm)
としたときに、配線導体4の長さの短い底辺とポリエー
テルエーテルケトン系有機物層1間のポリフェニレンエ
ーテル系有機物から成る被覆層2の厚みx(μm)を3
μm≦0.5T−t≦x≦0.5T≦35μmとすることによ
り、配線導体4の長さの短い底辺とポリエーテルエーテ
ルケトン系有機物層1間の距離および配線導体4の長さ
の長い底辺と隣接するポリエーテルエーテルケトン系有
機物層1間の距離の差をt(μm)未満と小さくするこ
とができ、被覆層2の厚みが大きく異なることから生じ
る多層配線基板6の反りを防止することができる。従っ
て、配線導体4の台形状の上底側表面とポリエーテルエ
ーテルケトン系有機物層1の間に位置する、被覆層2の
厚みx(μm)を、ポリエーテルエーテルケトン系有機
物層1間の距離をT(μm)、配線導体4の厚みをt
(μm)としたときに、3μm≦0.5T−t≦x≦0.5T
≦35μmの範囲とすることが好ましい。
Polyetheretherketone-based organic material layer 1
The distance between them is T (μm), and the thickness of the wiring conductor 4 is t (μm)
Then, the thickness x (μm) of the coating layer 2 made of polyphenylene ether organic material between the bottom of the wiring conductor 4 having a short length and the polyether ether ketone organic material layer 1 is 3
By setting μm ≦ 0.5T−t ≦ x ≦ 0.5T ≦ 35 μm, the bottom of the wiring conductor 4 having a short length and the distance between the polyetheretherketone-based organic material layer 1 and the bottom of the wiring conductor 4 having a long length are set. The difference in distance between adjacent polyether ether ketone-based organic material layers 1 can be made as small as less than t (μm), and the warp of the multilayer wiring board 6 caused by the large difference in the thickness of the coating layer 2 can be prevented. it can. Therefore, the thickness x (μm) of the coating layer 2 located between the upper bottom surface of the wiring conductor 4 and the polyetheretherketone-based organic material layer 1 is set to the distance between the polyetheretherketone-based organic material layers 1. Is T (μm), and the thickness of the wiring conductor 4 is t
(Μm), 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T
It is preferable that the range is ≦ 35 μm.

【0044】このような配線導体4は、絶縁フィルム3
となる前駆体シートに、公知のフォトレジストを用いた
サブトラクティブ法によりパターン形成した、例えば銅
から成る金属箔を転写法等により被着形成することによ
り形成される。先ず、支持体と成るフィルム上に銅から
成る金属箔を接着剤を介して接着した金属箔転写用フィ
ルムを用意し、次に、フィルム上の金属箔を公知のフォ
トレジストを用いたサブトラクティブ法を使用してパタ
ーン状にエッチングする。この時、パターンの表面側の
側面は、フィルム側の側面に較べてエッチング液に接す
る時間が長いためにエッチングされやすく、パターンの
幅方向の断面形状を台形状とすることができる。なお、
台形の形状は、エッチング液の濃度やエッチング時間を
調整することにより短い底辺と側辺とのなす角度を95〜
150°の台形状とすることができる。そして、この金属
箔転写用フィルムを絶縁フィルム3と成る前駆体シート
に積層し、温度が100〜200℃で圧力が0.5〜10MPaの
条件で10分〜1時間ホットプレスした後、支持体と成る
フィルムを剥離除去して金属箔を絶縁フィルム3と成る
前駆体シート表面に転写させることにより、台形状の上
底側が被覆層2に埋設された配線導体4を形成すること
ができる。
Such a wiring conductor 4 is composed of the insulating film 3
It is formed by depositing a metal foil made of, for example, copper, which is patterned by a subtractive method using a known photoresist, on the precursor sheet to be formed by a transfer method or the like. First, a metal foil transfer film is prepared by adhering a metal foil made of copper on a film serving as a support through an adhesive, and then a metal foil on the film is subjected to a subtractive method using a known photoresist. Is used to etch in a pattern. At this time, the side surface on the surface side of the pattern is more likely to be etched because the side surface on the surface side is in contact with the etching solution for a longer time than the side surface on the film side, and the cross-sectional shape in the width direction of the pattern can be trapezoidal. In addition,
The trapezoidal shape allows the angle between the short base and the side to be adjusted to 95 ~ by adjusting the concentration of the etching solution and the etching time.
It can be trapezoidal at 150 °. Then, this metal foil transfer film is laminated on a precursor sheet which becomes the insulating film 3, and hot pressed for 10 minutes to 1 hour under the conditions of a temperature of 100 to 200 ° C. and a pressure of 0.5 to 10 MPa, and then becomes a support. By removing the film by peeling and transferring the metal foil onto the surface of the precursor sheet which becomes the insulating film 3, the wiring conductor 4 having the trapezoidal upper bottom side embedded in the coating layer 2 can be formed.

【0045】なお、配線導体4の長さの短い底辺と対向
するポリエーテルエーテルケトン系有機物層1間の被覆
層2の厚みx(μm)は、金属箔転写時のホットプレス
の圧力を調整することにより所望の範囲とすることがで
きる。また、配線導体4は被覆層2との密着性を高める
ためにその表面にバフ研磨・ブラスト研磨・ブラシ研磨
・薬品処理等の処理で表面を粗化しておくことが好まし
い。
The thickness x (μm) of the coating layer 2 between the polyetheretherketone-based organic material layers 1 facing the short bottom of the wiring conductor 4 controls the pressure of the hot press at the time of transferring the metal foil. Therefore, the desired range can be obtained. Further, in order to improve the adhesion with the coating layer 2, the surface of the wiring conductor 4 is preferably roughened by a treatment such as buffing, blasting, brushing, or chemical treatment.

【0046】また、絶縁フィルム3には、直径が20〜15
0μm程度の貫通導体5が形成されている。貫通導体5
は、絶縁フィルム3を挟んで上下に位置する配線導体4
を電気的に接続する機能を有し、絶縁フィルム3にレー
ザにより穿設加工を施すことにより貫通孔を形成した
後、この貫通孔に銅・銀・金・半田等から成る導電性ペ
ーストを従来周知のスクリーン印刷法により埋め込むこ
とにより形成される。
The insulating film 3 has a diameter of 20 to 15
The through conductor 5 having a thickness of about 0 μm is formed. Through conductor 5
Are the wiring conductors 4 located above and below with the insulating film 3 in between.
Has a function of electrically connecting to each other. After a through hole is formed by performing a drilling process on the insulating film 3 with a laser, a conductive paste made of copper, silver, gold, solder or the like is conventionally provided in the through hole. It is formed by embedding by a known screen printing method.

【0047】本発明の多層配線基板6によれば、絶縁フ
ィルム3をポリエーテルエーテルケトン系有機物層1の
上下面にポリフェニレンエーテル系有機物から成る被覆
層2を形成して成るものとしたことから、ポリエーテル
エーテルケトン系有機物層1が高耐熱性・高弾性率・高
寸法安定性・低吸湿性であり、ガラスクロスのような強
化材を用いなくとも絶縁フィルム3を構成することが可
能となり、その結果、レーザによる穿設加工が容易とな
り微細で均一な貫通孔を形成できる。
According to the multilayer wiring board 6 of the present invention, the insulating film 3 is formed by forming the coating layer 2 made of polyphenylene ether organic material on the upper and lower surfaces of the polyether ether ketone organic material layer 1. The polyetheretherketone-based organic material layer 1 has high heat resistance, high elastic modulus, high dimensional stability, and low hygroscopicity, and the insulating film 3 can be formed without using a reinforcing material such as glass cloth. As a result, laser drilling is facilitated, and fine and uniform through holes can be formed.

【0048】このような多層配線基板6は、上述したよ
うな方法で製作した絶縁フィルム3と成る前駆体シート
の所望の位置に貫通導体5を形成した後、パターン形成
した例えば銅の金属箔を、温度が100〜200℃で圧力が0.
5〜10MPaの条件で10分〜1時間ホットプレスして転
写し、これらを積層して最終的に温度が150〜300℃で圧
力が0.5〜10MPaの条件で30分〜24時間ホットプレス
して完全硬化させることにより製作される。
In such a multilayer wiring board 6, a through conductor 5 is formed at a desired position on a precursor sheet to be the insulating film 3 manufactured by the above-described method, and then a patterned metal foil of copper, for example, is formed. , The temperature is 100-200 ℃ and the pressure is 0.
Transfer by hot pressing for 10 minutes to 1 hour under the condition of 5 to 10 MPa, stacking these, and finally hot pressing under the condition of temperature of 150 to 300 ° C and pressure of 0.5 to 10 MPa for 30 minutes to 24 hours. It is manufactured by being completely cured.

【0049】かくして、本発明の多層配線基板6によれ
ば、ポリエーテルエーテルケトン系有機物層1の上下面
にポリフェニレンエーテル系有機物から成る被覆層2を
形成して成る絶縁フィルム3を複数積層して成るものと
したことから、ポリフェニレンエーテル系有機物分子は
ポリエーテルエーテルケトン系有機物分子ほど剛直でな
く、また、規則正しい配向性も示さないことから比較的
分子が動きやすいために配線導体4表面の微細な凹部に
入り込み十分なアンカー効果を発揮することができ、そ
の結果、絶縁フィルム3と配線導体4の密着性が良好と
なり高温高湿下において両者間で剥離を生じてしまうと
いうことがない。また、ポリフェニレンエーテル系有機
物から成る被覆層2とポリエーテルエーテルケトン系有
機物層1の誘電率の周波数挙動がほぼ等しいことから、
配線導体4を接着する際の加圧によって被覆層2にわず
かな厚みばらつきが生じたとしても高周波領域における
伝送特性の低下を生じることのない高周波伝送特性に優
れた多層配線基板6とすることができる。さらに、絶縁
フィルム3を多層化する際、ポリフェニレンエーテル系
有機物分子は動きやすいためにポリフェニレンエーテル
系有機物分子同士が絡み合いやすくなって被覆層2同士
の密着性が強くなり、その結果、高温バイアス試験下に
おいても絶縁フィルム3間で剥離して絶縁不良が発生し
てしまうこともない。
Thus, according to the multilayer wiring board 6 of the present invention, a plurality of insulating films 3 formed by forming the coating layers 2 made of a polyphenylene ether organic substance on the upper and lower surfaces of the polyether ether ketone type organic substance layer 1 are laminated. As a result, the polyphenylene ether-based organic molecule is not as rigid as the polyether ether ketone-based organic molecule, and since it does not show a regular orientation, the molecule is relatively easy to move, so that the surface of the wiring conductor 4 is fine. A sufficient anchoring effect can be exerted in the recesses, and as a result, the adhesion between the insulating film 3 and the wiring conductor 4 is improved, and peeling between the two does not occur under high temperature and high humidity. Further, since the coating layer 2 made of a polyphenylene ether organic material and the polyether ether ketone organic material layer 1 have substantially the same frequency behavior of the dielectric constant,
A multilayer wiring board 6 having excellent high-frequency transmission characteristics, which does not cause deterioration of transmission characteristics in a high-frequency region even if a slight variation in thickness occurs in the coating layer 2 due to pressure applied when the wiring conductor 4 is bonded, can be obtained. it can. Furthermore, when the insulating film 3 is formed into multiple layers, the polyphenylene ether-based organic molecule is easily moved, so that the polyphenylene ether-based organic molecule is easily entangled with each other, and the adhesion between the coating layers 2 is strengthened. As a result, under the high temperature bias test. Also in this case, the insulating films 3 are not separated from each other to cause insulation failure.

【0050】なお、本発明の多層配線基板6は上述の実
施例に限定されるものではなく、本発明の要旨を逸脱し
ない範囲であれば種々の変更は可能であり、例えば、上
述の実施例では4層の絶縁フィルム3を積層することに
よって多層配線基板6を製作したが、2層や3層、ある
いは5層以上の絶縁フィルム3を積層して多層配線基板
6を製作してもよい。また、本発明の多層配線基板6の
上下表面に、1層や2層、あるいは3層以上の有機樹脂
を主成分とする絶縁層から成るビルドアップ層やソルダ
ーレジスト層を形成してもよい。
The multilayer wiring board 6 of the present invention is not limited to the above-mentioned embodiments, but various modifications can be made without departing from the scope of the present invention. Then, the multilayer wiring board 6 is manufactured by laminating the four layers of the insulating films 3, but the multilayer wiring board 6 may be manufactured by laminating the insulating films 3 of two layers, three layers, or five layers or more. Further, a build-up layer or a solder resist layer formed of an insulating layer containing one or more layers or three or more layers of an organic resin as a main component may be formed on the upper and lower surfaces of the multilayer wiring board 6 of the present invention.

【0051】[0051]

【発明の効果】本発明の絶縁フィルムによれば、ポリエ
ーテルエーテルケトン系有機物層の上下面にポリフェニ
レンエーテル系有機物から成る被覆層を形成して成るも
のとしたことから、ポリフェニレンエーテル系有機物分
子はポリエーテルエーテルケトン系有機物分子ほど剛直
でなく、また、規則正しい配向性も示さないことから比
較的分子が動きやすく、その結果、絶縁フィルムを多層
化した場合においても、絶縁フィルム同士の密着性が良
好となり、高温バイアス試験においてフィルム間で剥離
して絶縁不良が発生してしまうということはない。ま
た、絶縁フィルム表面に配線導体を配設した場合におい
ても、ポリフェニレンエーテル系有機物分子が配線導体
表面の微細な凹部に入り込み十分なアンカー効果を発揮
することができ、絶縁フィルムと配線導体との密着性が
良好となり、その結果、高温高湿下において両者間で剥
離して導体箔が断線してしまうということもない。さら
に、ポリフェニレンエーテル系有機物から成る被覆層と
ポリエーテルエーテルケトン系有機物層の誘電率の周波
数挙動がほぼ等しいことから、配線導体を接着する際の
加圧によってわずかな厚みばらつきが生じたとしても高
周波領域における伝送特性の低下を生じることのない高
周波伝送特性に優れた絶縁フィルムとすることができ
る。
EFFECTS OF THE INVENTION According to the insulating film of the present invention, since the coating layers made of polyphenylene ether organic compound are formed on the upper and lower surfaces of the polyether ether ketone organic compound layer, the polyphenylene ether organic compound molecule is It is not as rigid as polyetheretherketone-based organic molecules, and because it does not show a regular orientation, the molecules are relatively mobile, resulting in good adhesion between insulating films even when the insulating films are multilayered. Therefore, in the high temperature bias test, peeling between the films does not cause insulation failure. Further, even when the wiring conductor is arranged on the surface of the insulating film, the polyphenylene ether-based organic compound molecules can enter the minute recesses on the surface of the wiring conductor and exhibit a sufficient anchoring effect, resulting in close contact between the insulating film and the wiring conductor. As a result, the conductor foil will not be peeled off and the conductor foil will not be broken under high temperature and high humidity. Further, since the frequency behavior of the dielectric constant of the coating layer made of polyphenylene ether organic material and that of the polyether ether ketone organic material layer are almost equal, even if a slight thickness variation occurs due to pressure when bonding the wiring conductor, It is possible to obtain an insulating film excellent in high-frequency transmission characteristics without causing deterioration of transmission characteristics in a region.

【0052】また、本発明の多層配線基板によれば、上
記の絶縁フィルムを用いたことから耐湿性・高周波特性
に優れた多層配線基板とすることができる。さらに、絶
縁フィルムを多層化する際、ポリフェニレンエーテル系
有機物分子は動きやすいためにポリフェニレンエーテル
系有機物分子同士が絡み合いやすくなって被覆層同士の
密着性が強くなり、その結果、高温バイアス試験下にお
いて絶縁フィルム間で剥離して絶縁不良が発生してしま
うこともない。
Further, according to the multilayer wiring board of the present invention, since the above-mentioned insulating film is used, a multilayer wiring board excellent in moisture resistance and high frequency characteristics can be obtained. Furthermore, when the insulating film is multi-layered, the polyphenylene ether-based organic molecules move easily, so that the polyphenylene ether-based organic molecules tend to become entangled with each other and the adhesion between the coating layers becomes strong, resulting in insulation under high temperature bias test. There is no possibility of peeling between the films to cause insulation failure.

【0053】さらに、本発明の多層配線基板によれば、
絶縁フィルムに配設された配線導体の幅方向の断面形状
を、絶縁フィルム側の底辺の長さが対向する底辺の長さ
よりも短い台形状とし、かつ、絶縁フィルム側の底辺と
側辺との成す角度を95〜150°としたことから、配線導
体を被覆層に容易に埋設することができ、配線導体を埋
設した後の被覆層表面をほぼ平坦にすることができるた
め、積層の際に絶縁層間に空気をかみ込むことはなく、
絶縁性信頼性の高い多層配線基板とすることができる。
Furthermore, according to the multilayer wiring board of the present invention,
The cross-sectional shape in the width direction of the wiring conductor disposed on the insulating film is a trapezoid whose base length on the insulating film side is shorter than the length of the opposing base, and between the base and the side on the insulating film side. Since the angle formed is 95 to 150 °, the wiring conductor can be easily embedded in the coating layer, and the surface of the coating layer after the wiring conductor is embedded can be made almost flat. No air is caught between insulating layers,
A multilayer wiring board having high insulation reliability can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の絶縁フィルムの実施の形態の一例を示
す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of an insulating film of the present invention.

【図2】本発明の多層配線基板に半導体素子を搭載して
成る混成集積回路の実施の形態の一例を示す断面図であ
る。
FIG. 2 is a sectional view showing an example of an embodiment of a hybrid integrated circuit in which a semiconductor element is mounted on a multilayer wiring board of the present invention.

【図3】図2に示す多層配線基板の要部拡大断面図であ
る。
FIG. 3 is an enlarged cross-sectional view of a main part of the multilayer wiring board shown in FIG.

【符号の説明】[Explanation of symbols]

1・・・・・ポリエーテルエーテルケトン系有機物層 2・・・・・被覆層 3・・・・・絶縁フィルム 4・・・・・配線導体 5・・・・・貫通導体 6・・・・・多層配線基板 1-Polyether ether ketone-based organic material layer 2 ... coating layer 3 ... Insulation film 4 ... Wiring conductor 5 ... Through conductor 6 ... Multilayer wiring board

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/46 H05K 3/46 Z Fターム(参考) 4F100 AB01D AB01E AB33D AB33E AK54A AK54B AK54C AK56A BA03 BA04 BA05 BA06 BA07 BA10B BA10C BA10D BA10E BA15 GB43 JA04 JB13B JB13C JD04 JG04 5E346 AA12 AA42 BB15 CC08 CC13 CC32 CC38 DD02 DD32 DD48 EE02 EE19 FF18 GG22 HH08─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 3/46 H05K 3/46 ZF term (reference) 4F100 AB01D AB01E AB33D AB33E AK54A AK54B AK54C AK56A BA03 BA04 BA05 BA06 BA07 BA10B BA10C BA10D BA10E BA15 GB43 JA04 JB13B JB13C JD04 JG04 5E346 AA12 AA42 BB15 CC08 CC13 CC32 CC38 DD02 DD32 DD48 EE02 EE19 FF18 GG22 HH08

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 ポリエーテルエーテルケトン系有機物層
の上下面にポリフェニレンエーテル系有機物から成る被
覆層を形成して成ることを特徴とする絶縁フィルム。
1. An insulating film, comprising a coating layer made of a polyphenylene ether organic material formed on the upper and lower surfaces of a polyether ether ketone organic material layer.
【請求項2】 前記ポリフェニレンエーテル系有機物が
熱硬化性ポリフェニレンエーテルであることを特徴とす
る請求項1記載の絶縁フィルム。
2. The insulating film according to claim 1, wherein the polyphenylene ether-based organic material is thermosetting polyphenylene ether.
【請求項3】 上下面の少なくとも一方の面に金属箔か
ら成る配線導体が配設された請求項1または請求項2記
載の絶縁フィルムを複数積層して成るとともに、該絶縁
フィルムを挟んで上下に位置する前記配線導体間を前記
絶縁フィルムに形成された貫通導体を介して電気的に接
続したことを特徴とする多層配線基板。
3. A plurality of insulating films according to claim 1 or 2 in which a wiring conductor made of a metal foil is disposed on at least one of the upper and lower surfaces, and the insulating films are sandwiched between the upper and lower surfaces. A multilayer wiring board characterized in that the wiring conductors located at are electrically connected to each other through a through conductor formed in the insulating film.
【請求項4】 前記絶縁フィルムに配設された配線導体
の幅方向の断面形状は、前記絶縁フィルム側の底辺の長
さが対向する底辺の長さよりも短い台形状であり、か
つ、前記絶縁フィルム側の底辺と側辺との成す角度が9
5〜150°であることを特徴とする請求項3記載の多
層配線基板。
4. The cross-sectional shape in the width direction of the wiring conductor disposed on the insulating film is a trapezoidal shape in which the length of the base on the side of the insulating film is shorter than the length of the opposite base, and The angle between the bottom side of the film and the side is 9
The multi-layer wiring board according to claim 3, wherein the multi-layer wiring board has an angle of 5 to 150 °.
JP2001194273A 2001-06-27 2001-06-27 Insulating film and multilayer wiring board using the same Expired - Fee Related JP4959066B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008522104A (en) * 2004-11-30 2008-06-26 マーレ インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツング Piston ring having a coated sliding surface and coating agent
JP2014205362A (en) * 2009-09-28 2014-10-30 京セラ株式会社 Wiring board, laminate board and laminate sheet

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JPH05309776A (en) * 1992-05-12 1993-11-22 Asahi Chem Ind Co Ltd Laminate
JPH09174786A (en) * 1995-12-22 1997-07-08 Japan Gore Tex Inc Oriented material of liquid crystal polymer film having adhesive surface or metallic surface
JP2000143967A (en) * 1998-11-10 2000-05-26 Ibiden Co Ltd Resin composite, printed circuit board and multilayer printed circuit board
JP2000200976A (en) * 1999-01-05 2000-07-18 Mitsubishi Plastics Ind Ltd Multilayer printed wiring substrate and its manufacture
JP2000277913A (en) * 1999-03-25 2000-10-06 Kyocera Corp Multilayer wiring substrate and manufacture of the same
JP2001015872A (en) * 1999-06-30 2001-01-19 Kyocera Corp Wiring board insulating sheet and manufacture of wiring board using the same
JP2001053198A (en) * 1999-08-12 2001-02-23 Shinko Electric Ind Co Ltd Method for manufacturing multilayer wiring board
JP2001068802A (en) * 1999-08-31 2001-03-16 Kyocera Corp Insulation sheet for wiring board and manufacture thereof
JP2002261453A (en) * 2001-02-28 2002-09-13 Kyocera Corp Multilayer interconnection board

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05309776A (en) * 1992-05-12 1993-11-22 Asahi Chem Ind Co Ltd Laminate
JPH09174786A (en) * 1995-12-22 1997-07-08 Japan Gore Tex Inc Oriented material of liquid crystal polymer film having adhesive surface or metallic surface
JP2000143967A (en) * 1998-11-10 2000-05-26 Ibiden Co Ltd Resin composite, printed circuit board and multilayer printed circuit board
JP2000200976A (en) * 1999-01-05 2000-07-18 Mitsubishi Plastics Ind Ltd Multilayer printed wiring substrate and its manufacture
JP2000277913A (en) * 1999-03-25 2000-10-06 Kyocera Corp Multilayer wiring substrate and manufacture of the same
JP2001015872A (en) * 1999-06-30 2001-01-19 Kyocera Corp Wiring board insulating sheet and manufacture of wiring board using the same
JP2001053198A (en) * 1999-08-12 2001-02-23 Shinko Electric Ind Co Ltd Method for manufacturing multilayer wiring board
JP2001068802A (en) * 1999-08-31 2001-03-16 Kyocera Corp Insulation sheet for wiring board and manufacture thereof
JP2002261453A (en) * 2001-02-28 2002-09-13 Kyocera Corp Multilayer interconnection board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008522104A (en) * 2004-11-30 2008-06-26 マーレ インターナショナル ゲゼルシャフト ミット ベシュレンクテル ハフツング Piston ring having a coated sliding surface and coating agent
JP2014205362A (en) * 2009-09-28 2014-10-30 京セラ株式会社 Wiring board, laminate board and laminate sheet

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