JP2002502549A - 巨大磁気抵抗性の全金属固体素子 - Google Patents
巨大磁気抵抗性の全金属固体素子Info
- Publication number
- JP2002502549A JP2002502549A JP53925797A JP53925797A JP2002502549A JP 2002502549 A JP2002502549 A JP 2002502549A JP 53925797 A JP53925797 A JP 53925797A JP 53925797 A JP53925797 A JP 53925797A JP 2002502549 A JP2002502549 A JP 2002502549A
- Authority
- JP
- Japan
- Prior art keywords
- state device
- solid
- conductor
- solid state
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 title claims description 46
- 229910052751 metal Inorganic materials 0.000 title claims description 46
- 230000005291 magnetic effect Effects 0.000 claims abstract description 114
- 239000004020 conductor Substances 0.000 claims abstract description 80
- 239000010409 thin film Substances 0.000 claims abstract description 73
- 239000007787 solid Substances 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims description 45
- 229910000889 permalloy Inorganic materials 0.000 claims description 28
- 230000015654 memory Effects 0.000 claims description 27
- 239000012528 membrane Substances 0.000 claims description 20
- 238000004804 winding Methods 0.000 claims description 19
- 229910017052 cobalt Inorganic materials 0.000 claims description 16
- 239000010941 cobalt Substances 0.000 claims description 16
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 12
- 230000004907 flux Effects 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 5
- 241000209140 Triticum Species 0.000 claims description 4
- 235000021307 Triticum Nutrition 0.000 claims description 4
- 238000009738 saturating Methods 0.000 claims description 3
- 239000004575 stone Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 230000008054 signal transmission Effects 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 claims 2
- 230000004888 barrier function Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 87
- 239000010410 layer Substances 0.000 description 63
- 230000005415 magnetization Effects 0.000 description 26
- 230000003321 amplification Effects 0.000 description 24
- 238000003199 nucleic acid amplification method Methods 0.000 description 24
- 230000006870 function Effects 0.000 description 22
- 239000011159 matrix material Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 15
- 230000008901 benefit Effects 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 230000008021 deposition Effects 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- 230000004044 response Effects 0.000 description 7
- 238000013459 approach Methods 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 230000009977 dual effect Effects 0.000 description 5
- 230000005294 ferromagnetic effect Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 230000002441 reversible effect Effects 0.000 description 4
- 241000282376 Panthera tigris Species 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- LFVLUOAHQIVABZ-UHFFFAOYSA-N Iodofenphos Chemical compound COP(=S)(OC)OC1=CC(Cl)=C(I)C=C1Cl LFVLUOAHQIVABZ-UHFFFAOYSA-N 0.000 description 1
- 238000003482 Pinner synthesis reaction Methods 0.000 description 1
- 241001600434 Plectroglyphidodon lacrymatus Species 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000004883 computer application Methods 0.000 description 1
- 239000002772 conduction electron Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000006353 environmental stress Effects 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
- G11C11/15—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
- H01F10/3281—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn only by use of asymmetry of the magnetic film pair itself, i.e. so-called pseudospin valve [PSV] structure, e.g. NiFe/Cu/Co
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/16—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using saturable magnetic devices
- H03K19/166—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using saturable magnetic devices using transfluxors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
- H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Hall/Mr Elements (AREA)
- Measuring Magnetic Variables (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US1670496P | 1996-05-02 | 1996-05-02 | |
| US60/016,704 | 1996-05-02 | ||
| US08/846,410 | 1997-04-30 | ||
| US08/846,410 US5929636A (en) | 1996-05-02 | 1997-04-30 | All-metal giant magnetoresistive solid-state component |
| PCT/US1997/007425 WO1997041601A1 (en) | 1996-05-02 | 1997-05-02 | All-metal, giant magnetoresistive, solid-state component |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002502549A true JP2002502549A (ja) | 2002-01-22 |
| JP2002502549A5 JP2002502549A5 (enExample) | 2005-01-13 |
Family
ID=26688967
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53925797A Pending JP2002502549A (ja) | 1996-05-02 | 1997-05-02 | 巨大磁気抵抗性の全金属固体素子 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US5929636A (enExample) |
| EP (1) | EP0896734B1 (enExample) |
| JP (1) | JP2002502549A (enExample) |
| KR (1) | KR100467117B1 (enExample) |
| AU (1) | AU3117097A (enExample) |
| CA (1) | CA2252926C (enExample) |
| DE (1) | DE69735627T2 (enExample) |
| WO (1) | WO1997041601A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001175641A (ja) * | 1999-10-19 | 2001-06-29 | Motorola Inc | デュアル・リード・ポートを含む埋め込みmram |
| JP2008517289A (ja) * | 2004-10-18 | 2008-05-22 | コミサリア、ア、レネルジ、アトミク | 磁気抵抗センサーを用いた磁場測定方法および磁場測定装置 |
| JP2016531481A (ja) * | 2013-07-24 | 2016-10-06 | 江▲蘇▼多▲維▼科技有限公司Multidimension Technology Co., Ltd. | 磁気抵抗ミキサ |
Families Citing this family (57)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6741494B2 (en) * | 1995-04-21 | 2004-05-25 | Mark B. Johnson | Magnetoelectronic memory element with inductively coupled write wires |
| JPH11316919A (ja) | 1998-04-30 | 1999-11-16 | Hitachi Ltd | スピントンネル磁気抵抗効果型磁気ヘッド |
| EP0971424A3 (en) * | 1998-07-10 | 2004-08-25 | Interuniversitair Microelektronica Centrum Vzw | Spin-valve structure and method for making spin-valve structures |
| US6194774B1 (en) * | 1999-03-10 | 2001-02-27 | Samsung Electronics Co., Ltd. | Inductor including bonding wires |
| US6240622B1 (en) * | 1999-07-09 | 2001-06-05 | Micron Technology, Inc. | Integrated circuit inductors |
| US6507187B1 (en) * | 1999-08-24 | 2003-01-14 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Ultra-sensitive magnetoresistive displacement sensing device |
| DE10032272C2 (de) * | 2000-07-03 | 2002-08-29 | Infineon Technologies Ag | Strom-Treiberanordnung für MRAM |
| US6538437B2 (en) * | 2000-07-11 | 2003-03-25 | Integrated Magnetoelectronics Corporation | Low power magnetic anomaly sensor |
| US6483740B2 (en) * | 2000-07-11 | 2002-11-19 | Integrated Magnetoelectronics Corporation | All metal giant magnetoresistive memory |
| US7248713B2 (en) | 2000-09-11 | 2007-07-24 | Micro Bar Technology, Inc. | Integrated automatic telephone switch |
| DE10053206C1 (de) * | 2000-10-26 | 2002-01-17 | Siemens Ag | Logikschaltungsanordnung |
| US6624490B2 (en) | 2000-10-26 | 2003-09-23 | The University Of Iowa Research Foundation | Unipolar spin diode and the applications of the same |
| EP1370884A4 (en) * | 2001-03-23 | 2004-08-25 | Integrated Magnetoelectronics | TRANSPINORIAL SAMPLER-LOCKER CIRCUIT AND ASSOCIATED APPLICATIONS |
| US6738284B2 (en) | 2001-03-23 | 2004-05-18 | Integrated Magnetoelectronics Corporation | Transpinnor-based sample-and-hold circuit and applications |
| DE10118650A1 (de) * | 2001-04-14 | 2002-10-17 | Philips Corp Intellectual Pty | Winkelsensor sowie Verfahren zum Erhöhen der Anisotropiefeldstärke einer Sensoreinheit eines Winkelsensors |
| JP3603872B2 (ja) * | 2001-05-16 | 2004-12-22 | 松下電器産業株式会社 | 磁気センサとこれを用いた紙幣識別装置 |
| US6688169B2 (en) | 2001-06-15 | 2004-02-10 | Textron Systems Corporation | Systems and methods for sensing an acoustic signal using microelectromechanical systems technology |
| US6711437B2 (en) | 2001-07-30 | 2004-03-23 | Medtronic, Inc. | Pacing channel isolation in multi-site cardiac pacing systems |
| US6700371B2 (en) * | 2001-09-05 | 2004-03-02 | Honeywell International Inc. | Three dimensional conductive strap for a magnetorestrictive sensor |
| US6771472B1 (en) | 2001-12-07 | 2004-08-03 | Seagate Technology Llc | Structure to achieve thermally stable high sensitivity and linear range in bridge GMR sensor using SAF magnetic alignments |
| US7046117B2 (en) * | 2002-01-15 | 2006-05-16 | Honeywell International Inc. | Integrated magnetic field strap for signal isolator |
| US6859063B2 (en) * | 2002-04-11 | 2005-02-22 | Integrated Magnetoelectronics Corporation | Transpinnor-based transmission line transceivers and applications |
| AU2003225048A1 (en) | 2002-04-19 | 2003-11-03 | Integrated Magnetoelectronics Corporation | Interfaces between semiconductor circuitry and transpinnor-based circuitry |
| US8284970B2 (en) | 2002-09-16 | 2012-10-09 | Starkey Laboratories Inc. | Switching structures for hearing aid |
| US7369671B2 (en) | 2002-09-16 | 2008-05-06 | Starkey, Laboratories, Inc. | Switching structures for hearing aid |
| US6992919B2 (en) * | 2002-12-20 | 2006-01-31 | Integrated Magnetoelectronics Corporation | All-metal three-dimensional circuits and memories |
| US7259545B2 (en) * | 2003-02-11 | 2007-08-21 | Allegro Microsystems, Inc. | Integrated sensor |
| US7005852B2 (en) | 2003-04-04 | 2006-02-28 | Integrated Magnetoelectronics Corporation | Displays with all-metal electronics |
| US7027319B2 (en) * | 2003-06-19 | 2006-04-11 | Hewlett-Packard Development Company, L.P. | Retrieving data stored in a magnetic integrated memory |
| US7244997B2 (en) * | 2003-07-08 | 2007-07-17 | President And Fellows Of Harvard College | Magneto-luminescent transducer |
| US20050083743A1 (en) * | 2003-09-09 | 2005-04-21 | Integrated Magnetoelectronics Corporation A California Corporation | Nonvolatile sequential machines |
| US7177107B2 (en) * | 2004-02-11 | 2007-02-13 | Hitachi Global Storage Technologies Netherlands B.V. | Preamplifier circuit with signal interference cancellation suitable for use in magnetic storage devices |
| EP1574850A1 (de) * | 2004-03-08 | 2005-09-14 | Siemens Aktiengesellschaft | Vorrichtung zur zerstörungsfreien Erfassung von tiefen Defekten in elektrisch leitenden Materialien |
| US20050269612A1 (en) * | 2004-05-11 | 2005-12-08 | Integrated Magnetoelectronics | Solid-state component based on current-induced magnetization reversal |
| JP4692805B2 (ja) * | 2004-06-30 | 2011-06-01 | Tdk株式会社 | 磁気検出素子およびその形成方法 |
| US7777607B2 (en) * | 2004-10-12 | 2010-08-17 | Allegro Microsystems, Inc. | Resistor having a predetermined temperature coefficient |
| WO2006078720A2 (en) * | 2005-01-19 | 2006-07-27 | Integrated Magnetoelectronics Corporation | Radiation detector |
| US7839605B2 (en) * | 2005-11-13 | 2010-11-23 | Hitachi Global Storage Technologies Netherlands B.V. | Electrical signal-processing device integrating a flux sensor with a flux generator in a magnetic circuit |
| US7768083B2 (en) | 2006-01-20 | 2010-08-03 | Allegro Microsystems, Inc. | Arrangements for an integrated sensor |
| US7911830B2 (en) * | 2007-05-17 | 2011-03-22 | Integrated Magnetoelectronics | Scalable nonvolatile memory |
| US7795862B2 (en) | 2007-10-22 | 2010-09-14 | Allegro Microsystems, Inc. | Matching of GMR sensors in a bridge |
| US7816905B2 (en) * | 2008-06-02 | 2010-10-19 | Allegro Microsystems, Inc. | Arrangements for a current sensing circuit and integrated current sensor |
| FR2942924B1 (fr) * | 2009-03-06 | 2011-06-24 | Thales Sa | Transposeur de frequences hyperfrequences a dimensions reduites |
| WO2011103437A1 (en) * | 2010-02-22 | 2011-08-25 | Integrated Magnetoelectronics Corporation | A high gmr structure with low drive fields |
| US9322889B2 (en) * | 2011-12-30 | 2016-04-26 | Nve Corporation | Low hysteresis high sensitivity magnetic field sensor |
| EP2663095B1 (en) | 2012-05-07 | 2015-11-18 | Starkey Laboratories, Inc. | Hearing aid with distributed processing in ear piece |
| HRP20181721T1 (hr) | 2013-04-19 | 2018-12-28 | Zetec, Inc. | Sonda za inspekciju vrtložnih struja temeljena na magnetootpornim senzorima |
| US9632150B2 (en) * | 2015-04-27 | 2017-04-25 | Everspin Technologies, Inc. | Magnetic field sensor with increased field range |
| US9741923B2 (en) | 2015-09-25 | 2017-08-22 | Integrated Magnetoelectronics Corporation | SpinRAM |
| US10762940B2 (en) | 2016-12-09 | 2020-09-01 | Integrated Magnetoelectronics Corporation | Narrow etched gaps or features in multi-period thin-film structures |
| US10935612B2 (en) | 2018-08-20 | 2021-03-02 | Allegro Microsystems, Llc | Current sensor having multiple sensitivity ranges |
| DE102019122671B4 (de) * | 2019-08-22 | 2024-06-20 | RUHR-UNIVERSITäT BOCHUM | Passiver mikromechanischer Zähler |
| US11187764B2 (en) | 2020-03-20 | 2021-11-30 | Allegro Microsystems, Llc | Layout of magnetoresistance element |
| US11567108B2 (en) | 2021-03-31 | 2023-01-31 | Allegro Microsystems, Llc | Multi-gain channels for multi-range sensor |
| EP4130772B1 (en) | 2021-08-05 | 2025-07-23 | Allegro MicroSystems, LLC | Magnetoresistive element having compensated temperature coefficient of tmr |
| US11994541B2 (en) | 2022-04-15 | 2024-05-28 | Allegro Microsystems, Llc | Current sensor assemblies for low currents |
| US12248039B2 (en) | 2023-08-08 | 2025-03-11 | Allegro Microsystems, Llc | Interleaving sub-arrays of magnetoresistance elements based on reference directions to compensate for bridge offset |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03269383A (ja) * | 1990-03-20 | 1991-11-29 | Nec Corp | 磁気センサ及びその信号処理方式 |
| JPH07153034A (ja) * | 1993-11-26 | 1995-06-16 | Matsushita Electric Ind Co Ltd | 磁気抵抗効果素子及びその製造方法 |
| JPH08503778A (ja) * | 1993-06-09 | 1996-04-23 | インスティトゥート フュア ミクロシュトルクトウアテクノロギー ウント オプトエレクトロニク エー.ファウ. | 磁性反転導体と一又は複数の磁気抵抗レジスタとからなる磁界センサ |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3972786A (en) * | 1974-06-28 | 1976-08-03 | Ampex Corporation | Mechanically enhanced magnetic memory |
| US4751677A (en) * | 1986-09-16 | 1988-06-14 | Honeywell Inc. | Differential arrangement magnetic memory cell |
| US5173873A (en) * | 1990-06-28 | 1992-12-22 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | High speed magneto-resistive random access memory |
| US5422621A (en) * | 1993-10-29 | 1995-06-06 | International Business Machines Corporation | Oriented granular giant magnetoresistance sensor |
| FR2712420B1 (fr) * | 1993-11-08 | 1995-12-15 | Commissariat Energie Atomique | Tête magnétique de lecture à élément magnétorésistant multicouche et à concentrateur et son procédé de réalisation. |
| US5650889A (en) * | 1994-02-07 | 1997-07-22 | Hitachi, Ltd. | Magnetic recording medium containing heavy rare gas atoms, and a magnetic transducing system using the medium |
| US5587943A (en) * | 1995-02-13 | 1996-12-24 | Integrated Microtransducer Electronics Corporation | Nonvolatile magnetoresistive memory with fully closed flux operation |
| US5652445A (en) * | 1995-04-21 | 1997-07-29 | Johnson; Mark B. | Hybrid hall effect device and method of operation |
| US5654566A (en) * | 1995-04-21 | 1997-08-05 | Johnson; Mark B. | Magnetic spin injected field effect transistor and method of operation |
| US5585986A (en) * | 1995-05-15 | 1996-12-17 | International Business Machines Corporation | Digital magnetoresistive sensor based on the giant magnetoresistance effect |
| US5650958A (en) * | 1996-03-18 | 1997-07-22 | International Business Machines Corporation | Magnetic tunnel junctions with controlled magnetic response |
-
1997
- 1997-04-30 US US08/846,410 patent/US5929636A/en not_active Expired - Lifetime
- 1997-05-02 KR KR10-1998-0708923A patent/KR100467117B1/ko not_active Expired - Fee Related
- 1997-05-02 JP JP53925797A patent/JP2002502549A/ja active Pending
- 1997-05-02 EP EP97926397A patent/EP0896734B1/en not_active Expired - Lifetime
- 1997-05-02 AU AU31170/97A patent/AU3117097A/en not_active Abandoned
- 1997-05-02 DE DE69735627T patent/DE69735627T2/de not_active Expired - Lifetime
- 1997-05-02 WO PCT/US1997/007425 patent/WO1997041601A1/en not_active Ceased
- 1997-05-02 CA CA002252926A patent/CA2252926C/en not_active Expired - Fee Related
-
1998
- 1998-12-08 US US09/208,628 patent/US6031273A/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03269383A (ja) * | 1990-03-20 | 1991-11-29 | Nec Corp | 磁気センサ及びその信号処理方式 |
| JPH08503778A (ja) * | 1993-06-09 | 1996-04-23 | インスティトゥート フュア ミクロシュトルクトウアテクノロギー ウント オプトエレクトロニク エー.ファウ. | 磁性反転導体と一又は複数の磁気抵抗レジスタとからなる磁界センサ |
| JPH07153034A (ja) * | 1993-11-26 | 1995-06-16 | Matsushita Electric Ind Co Ltd | 磁気抵抗効果素子及びその製造方法 |
Non-Patent Citations (1)
| Title |
|---|
| JPN7008007545, 物理学辞典編集委員会, 物理学事典−濃縮版−, 19921030, 改訂第5刷, P.1660, JP, 株式会社培風館 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001175641A (ja) * | 1999-10-19 | 2001-06-29 | Motorola Inc | デュアル・リード・ポートを含む埋め込みmram |
| JP2008517289A (ja) * | 2004-10-18 | 2008-05-22 | コミサリア、ア、レネルジ、アトミク | 磁気抵抗センサーを用いた磁場測定方法および磁場測定装置 |
| JP2016531481A (ja) * | 2013-07-24 | 2016-10-06 | 江▲蘇▼多▲維▼科技有限公司Multidimension Technology Co., Ltd. | 磁気抵抗ミキサ |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2252926A1 (en) | 1997-11-06 |
| US6031273A (en) | 2000-02-29 |
| EP0896734A4 (en) | 1999-11-24 |
| AU3117097A (en) | 1997-11-19 |
| WO1997041601A1 (en) | 1997-11-06 |
| EP0896734A1 (en) | 1999-02-17 |
| CA2252926C (en) | 2002-08-06 |
| EP0896734B1 (en) | 2006-04-05 |
| US5929636A (en) | 1999-07-27 |
| KR100467117B1 (ko) | 2005-06-23 |
| DE69735627D1 (de) | 2006-05-18 |
| DE69735627T2 (de) | 2006-08-24 |
| KR20000065205A (ko) | 2000-11-06 |
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