JP2002340484A - Evaporator - Google Patents

Evaporator

Info

Publication number
JP2002340484A
JP2002340484A JP2001144729A JP2001144729A JP2002340484A JP 2002340484 A JP2002340484 A JP 2002340484A JP 2001144729 A JP2001144729 A JP 2001144729A JP 2001144729 A JP2001144729 A JP 2001144729A JP 2002340484 A JP2002340484 A JP 2002340484A
Authority
JP
Japan
Prior art keywords
temperature
gas
heat exchange
heat exchanger
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001144729A
Other languages
Japanese (ja)
Other versions
JP4621379B2 (en
Inventor
Tadashi Sato
忠史 佐藤
Atsushi Kobayashi
篤 小林
Nobuyuki Takahashi
伸之 高橋
Naoyoshi Ishikawa
直良 石川
Toshiyuki Takahashi
利行 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Kogyo Co Ltd
Japan Oxygen Co Ltd
Nippon Sanso Corp
Original Assignee
Nissin Kogyo Co Ltd
Japan Oxygen Co Ltd
Nippon Sanso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Kogyo Co Ltd, Japan Oxygen Co Ltd, Nippon Sanso Corp filed Critical Nissin Kogyo Co Ltd
Priority to JP2001144729A priority Critical patent/JP4621379B2/en
Publication of JP2002340484A publication Critical patent/JP2002340484A/en
Application granted granted Critical
Publication of JP4621379B2 publication Critical patent/JP4621379B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an evaporator, small in size, high in performance and excellent in temperature stability, by a method wherein a characteristic that the evaporator can supply a gas at a stabilized temperature while utilizing the high heat exchanging efficiency of a heat exchanger utilizing steam and the temperature stability of evaporated gas in a heat exchanger utilizing hot-water are combined. SOLUTION: A first constitution is provided with a main heat exchanging tank and a heat exchanging tank for regulating temperature, which are different in an evaporated gas temperature, to join and mix the evaporated gas from both heat exchanging tanks whereby temperature regulation is effected. A second constitution is provided with a first heat exchanger in a hot-water layer, a second heat exchanger in a steam layer and a third heat exchanger in the hot-water layer which are formed so as to conduct gas to flow in this sequence whereby the evaporator, utilizing the highness of the heat exchanging efficiency due to steam and the excellency of temperature stability due to hot-water, can be obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、低温液化ガスを気
化させる蒸発器に関し、詳しくは、気化ガスの温度を安
定した状態にすることができる蒸発器に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an evaporator for vaporizing a low-temperature liquefied gas, and more particularly, to an evaporator capable of stabilizing the temperature of a vaporized gas.

【0002】[0002]

【従来の技術】一般に、比較的大量のガス、例えば窒
素、酸素、アルゴン等のガスを使用する設備では、低温
液化ガス貯槽内に充填した液体窒素、液体酸素、液体ア
ルゴン等の低温液化ガスを蒸発器で気化させて使用する
ようにしている。低温液化ガスを気化させる蒸発器とし
ては、大気を熱媒体とした空温式蒸発器や、温水を熱媒
体とした温水式蒸発器、高温・高圧のスチームを熱媒体
としたスチーム式蒸発器が用いられている。
2. Description of the Related Art Generally, in a facility using a relatively large amount of gas, for example, a gas such as nitrogen, oxygen, or argon, a low-temperature liquefied gas such as liquid nitrogen, liquid oxygen, or liquid argon filled in a low-temperature liquefied gas storage tank is supplied. It is used by vaporizing it with an evaporator. Examples of the evaporator for vaporizing low-temperature liquefied gas include an air-heated evaporator using the atmosphere as a heat medium, a hot water evaporator using hot water as a heat medium, and a steam evaporator using high-temperature and high-pressure steam as a heat medium. Used.

【0003】汎用的な蒸発器である空温式蒸発器は、熱
交換器の材質として熱伝導率が高いアルミニウムを用い
ており、周囲にフィンを有するアルミニウム製配管を、
必要な熱交換能力に応じて複数本組合わせた構造となっ
ている。配管内を流れる低温液化ガスは、フィンを介し
て大気と熱交換を行うことにより気化するので、空温式
蒸発器の熱交換能力は、熱交換するフィンの面積、すな
わち、配管のトータル的な長さにより調節される。
An air-heated evaporator, which is a general-purpose evaporator, uses aluminum having a high thermal conductivity as a material of a heat exchanger.
The structure is a combination of multiple tubes according to the required heat exchange capacity. Since the low-temperature liquefied gas flowing in the pipes is vaporized by performing heat exchange with the atmosphere through the fins, the heat exchange capacity of the air-heated evaporator is determined by the area of the heat exchange fins, Adjusted by length.

【0004】この空温式蒸発器は、低温液化ガスを大気
との熱交換によって気化させるため、熱源が不要であ
り、汎用的に使用されている。しかし、設置場所の大気
温度が低い場合には熱交換能力が小さくなり、大気温度
によって能力が左右されるという問題があった。また、
熱交換能力を大きくするために配管数を増やしたり、長
くしたりすることは、蒸発器自体の大型化を招くため、
他の形式の蒸発器に比べて設置スペースを要するという
問題がある。
The air-heated evaporator vaporizes a low-temperature liquefied gas by heat exchange with the atmosphere, and therefore does not require a heat source and is widely used. However, when the atmospheric temperature of the installation location is low, the heat exchange capacity is reduced, and there is a problem that the capacity is affected by the atmospheric temperature. Also,
Increasing or lengthening the number of pipes to increase the heat exchange capacity causes the evaporator itself to become large,
There is a problem that installation space is required as compared with other types of evaporators.

【0005】スチーム式蒸発器は、スチームが導入され
る密閉容器内に熱交換用の配管を気密に配置し、この配
管内に低温液化ガスを流すとともに容器内にスチームを
導入し、スチームとの熱交換によって低温液化ガスを気
化させるようにしている。スチームとしては、一般に、
0.3MPa、120℃のスチームが用いられている。
このスチーム式蒸発器は、熱交換効率が高く、スチーム
が供給できれば、設置場所は環境に限定されることがな
く、しかも、装置はコンパクトになるという特徴を有し
ている。しかし、熱交換前後のスチームの温度差が大き
く、気化したガスの温度制御幅が広くなるという問題が
ある。
[0005] In the steam type evaporator, a pipe for heat exchange is hermetically arranged in a closed vessel into which steam is introduced, a low-temperature liquefied gas is flowed into this pipe, and steam is introduced into the vessel. The low-temperature liquefied gas is vaporized by heat exchange. As steam, in general,
A steam of 0.3 MPa and 120 ° C. is used.
This steam type evaporator has a feature that the heat exchange efficiency is high, and if steam can be supplied, the installation place is not limited to the environment, and the apparatus is compact. However, there is a problem that the temperature difference between the steam before and after the heat exchange is large, and the temperature control range of the vaporized gas is widened.

【0006】また、温水式蒸発器は、所定温度の温水を
入れた容器内に熱交換用の配管を気密に配置し、この配
管内に低温液化ガスを流して熱交換させるものであっ
て、熱交換によって温水から奪われる熱の補充は、一般
にヒーターによって行うようにしている。この温水式蒸
発器は、気化したガスの温度制御幅を狭くでき、しかも
安定するという特徴を有している。しかし、スチーム式
蒸発器に比べて容器自体が大きくなり、運転重量が嵩む
ために設置場所に注意を要するという問題がある。
In the hot water evaporator, a pipe for heat exchange is hermetically disposed in a vessel containing hot water at a predetermined temperature, and a low-temperature liquefied gas is flowed through the pipe to exchange heat. The replenishment of the heat deprived from the hot water by the heat exchange is generally performed by a heater. This hot-water evaporator has a feature that the temperature control range of the vaporized gas can be narrowed and is stable. However, there is a problem that the container itself is larger than the steam type evaporator, and the operating weight is increased, so that attention must be paid to the installation location.

【0007】[0007]

【発明が解決しようとする課題】上述のように、従来の
蒸発器では、安定した温度でガスを供給できる小型の蒸
発器で適当なものがなく、略一定温度のガスを大量に供
給する場合は、大型の温水式蒸発器を使用せざるを得な
かった。このため、例えば、供給するガスの用途がガス
タンク等の気密テストのように、スポット的なガス使用
で、しかも大量のガスを必要とし、さらに、大気温度に
近いガスの供給が望まれる場合は、供給ガス温度が比較
的高く、ガス温度の制御も困難なスチーム式蒸発器を使
用することはほとんどなく、大型の空温式蒸発器や温水
式蒸発器を現地に搬送し、蒸発器の組立てや配管の接続
を現地で行ってからガスの供給を開始するようにしてい
る。
As described above, in the conventional evaporator, there is no suitable evaporator capable of supplying gas at a stable temperature, and a large amount of gas having a substantially constant temperature is supplied. Had to use a large hot water evaporator. For this reason, for example, when the application of the supplied gas is a spot gas use, such as an airtightness test of a gas tank or the like, and a large amount of gas is required, and further, when a gas supply close to the atmospheric temperature is desired, The steam-type evaporator, which has a relatively high supply gas temperature and difficult to control the gas temperature, is rarely used.A large air-temperature evaporator or hot-water evaporator is transported to the site, and the evaporator assembly and The gas supply is started after connecting the pipes on site.

【0008】したがって、現地において蒸発器を設置す
るためのスペースを必要とするだけでなく、機器の搬入
からガス供給の開始までに相当の時間を必要とし、機器
の運搬や組立て等に要するコストも多大なものとなって
いた。
Therefore, not only is space required for installing an evaporator on site, but also a considerable amount of time is required from the loading of equipment to the start of gas supply, and the costs required for transporting and assembling equipment are also reduced. It was enormous.

【0009】そこで本発明は、スチームを利用した熱交
換器の熱交換効率の高さを利用しながら、安定した温度
でガスを供給することができ、さらに、温水を利用した
熱交換器における気化ガスの温度安定性を組合わせるこ
とにより、小型高性能で、より温度安定性に優れた蒸発
器を提供することを目的としている。
Therefore, the present invention can supply gas at a stable temperature while utilizing the high heat exchange efficiency of a heat exchanger using steam, and furthermore, vaporizes gas in a heat exchanger using hot water. An object of the present invention is to provide a small-sized, high-performance evaporator having more excellent temperature stability by combining gas temperature stability.

【0010】[0010]

【課題を解決するための手段】上記目的を達成するた
め、本発明の蒸発器は、第1の構成として、低温液化ガ
スを熱媒体と熱交換させることにより加温して気化させ
る蒸発器において、熱媒体が導入される容器内に前記低
温液化ガスが導入される熱交換器を収納した主熱交換槽
と、熱媒体が導入される容器内に低温液化ガスの一部が
導入される熱交換器を収納した温調用熱交換槽と、前記
主熱交換槽の熱交換器に低温液化ガスを導入する低温液
化ガス導入経路と、該低温液化ガス導入経路から分岐
し、流量調節弁を介して前記温調用熱交換槽の熱交換器
に低温液化ガスを導入する温調用低温液化ガス導入経路
と、前記主熱交換槽の熱交換器で気化したガスを導出す
る気化ガス導出経路と、前記温調用熱交換槽の熱交換器
で気化したガスを導出する温調用気化ガス導出経路と、
前記気化ガス導出経路のガスと前記温調用気化ガス導出
経路のガスとを合流混合させてガス使用先に供給するガ
ス供給経路と、該ガス供給経路を流れる供給ガスの温度
を測定する温度測定手段と、該温度測定手段の測定温度
に基づいて前記温調用低温液化ガス導入経路の流量調節
弁を開閉制御する制御手段とを備えていることを特徴と
し、さらに、前記温調用熱交換槽の熱交換能力を、前記
主熱交換槽の熱交換能力と異なった能力に設定したこと
を特徴としている。
According to a first aspect of the present invention, there is provided an evaporator in which a low-temperature liquefied gas is heated and vaporized by exchanging heat with a heat medium. A main heat exchange tank containing a heat exchanger in which the low-temperature liquefied gas is introduced in a vessel into which the heat medium is introduced, and a heat in which a part of the low-temperature liquefied gas is introduced into the vessel into which the heat medium is introduced. A heat exchange tank for temperature control containing an exchanger, a low-temperature liquefied gas introduction path for introducing a low-temperature liquefied gas into the heat exchanger of the main heat exchange tank, a branch from the low-temperature liquefied gas introduction path, and a flow control valve. A low-temperature liquefied gas introduction path for introducing a low-temperature liquefied gas into the heat exchanger of the temperature-adjustment heat exchange tank, a vaporized gas derivation path for leading out gas vaporized by the heat exchanger of the main heat exchange tank, Deriving vaporized gas with heat exchanger of heat exchange tank for temperature control And the vaporized gas derivation path for temperature control that,
A gas supply path for mixing and mixing the gas in the vaporized gas derivation path and the gas in the temperature control vaporized gas derivation path and supplying the gas to a gas use destination; and a temperature measuring means for measuring the temperature of the supply gas flowing through the gas supply path And control means for controlling opening and closing of a flow control valve of the low-temperature liquefied gas introduction path for temperature control based on the temperature measured by the temperature measurement means. The exchange capacity is set to be different from the heat exchange capacity of the main heat exchange tank.

【0011】また、本発明の蒸発器における第2の構成
は、低温液化ガスを熱媒体と熱交換させることにより加
温して気化させる蒸発器において、前記蒸発器は、熱媒
体としてスチーム層及び温水層を有する少なくとも一つ
の熱交換槽内に、前記温水層内に配置されて前記低温液
化ガスが導入される第一熱交換器と、前記スチーム層内
に配置されて該第一熱交換器で熱交換後のガスが導入さ
れる第二熱交換器と、前記温水層内に配置されて前記第
二熱交換器で熱交換後のガスが導入される第三熱交換器
とを収納したことを特徴としている。
A second configuration of the evaporator of the present invention is an evaporator that heats and vaporizes a low-temperature liquefied gas by exchanging heat with a heat medium, wherein the evaporator has a steam layer and a heat layer as a heat medium. A first heat exchanger disposed in the hot water layer and into which the low-temperature liquefied gas is introduced, and a first heat exchanger disposed in the steam layer in at least one heat exchange tank having a hot water layer. The second heat exchanger into which the gas after heat exchange is introduced is housed, and the third heat exchanger which is disposed in the hot water layer and into which the gas after heat exchange is introduced in the second heat exchanger is housed. It is characterized by:

【0012】さらに、上記構成において、前記第二熱交
換器で熱交換後のガスの温度が、該蒸発器から導出され
るガスの設定温度よりも高く設定され、前記第三熱交換
器で熱交換後のガスの温度が、第二熱交換器で熱交換後
のガスの温度より低く設定されていることを特徴として
いる。また、前記蒸発器から導出したガスの温度を測定
する温度測定手段と、前記熱交換槽内にスチームを供給
するボイラーと、前記温度測定手段で測定したガスの温
度に基づいて前記熱交換槽内に供給するスチーム量を調
節するスチーム供給量調節手段とを備えていることを特
徴としている。
Further, in the above structure, the temperature of the gas after the heat exchange in the second heat exchanger is set higher than the set temperature of the gas led out from the evaporator, and the heat in the third heat exchanger is The temperature of the gas after exchange is set lower than the temperature of the gas after heat exchange in the second heat exchanger. A temperature measuring means for measuring a temperature of the gas derived from the evaporator; a boiler for supplying steam into the heat exchange tank; and a boiler for supplying heat to the heat exchange tank based on the gas temperature measured by the temperature measuring means. Steam supply amount adjusting means for adjusting the amount of steam supplied to the apparatus.

【0013】[0013]

【発明の実施の形態】図1は、本発明の蒸発器の第1形
態例を示す系統図である。この蒸発器は、主熱交換槽1
0と温調用熱交換槽20とを並列に設置したものであっ
て、主熱交換槽10で気化したガスと温調用熱交換槽2
0で気化したガスとを適当に混合することによって所定
温度のガスを供給するように形成されている。
FIG. 1 is a system diagram showing a first embodiment of an evaporator according to the present invention. This evaporator has a main heat exchange tank 1
0 and the temperature control heat exchange tank 20 are installed in parallel, and the gas vaporized in the main heat exchange tank 10 and the temperature control heat exchange tank 2
The gas at a predetermined temperature is supplied by appropriately mixing the gas vaporized at 0.

【0014】両熱交換槽10,20は、断熱構造を有す
る金属製密閉容器11,21内に、低温液化ガスが導入
される熱交換器12,22をそれぞれ収納したものであ
って、各容器11,21には、ボイラーBで発生させた
スチームを熱媒体として容器内に導入するスチーム導入
管13,23と、熱交換によりスチームが凝縮して生じ
た水を容器内から抜取り、ボイラーに戻すドレン14,
24とがそれぞれ設けられている。
The two heat exchange tanks 10 and 20 contain heat exchangers 12 and 22 into which low-temperature liquefied gas is introduced, respectively, in metal sealed containers 11 and 21 having a heat insulating structure. In 11 and 21, steam introduction pipes 13 and 23 for introducing steam generated in the boiler B into the container as a heat medium, and water generated by steam condensation due to heat exchange are extracted from the container and returned to the boiler. Drain 14,
24 are provided respectively.

【0015】また、前記主熱交換槽10に設けられた熱
交換器12の下部入口部には、低温液化ガス貯槽C等か
ら供給される低温液化ガスを導入する低温液化ガス導入
経路15が接続され、上部出口部には、熱交換器12内
で気化したガスを導出する気化ガス導出経路16が接続
されている。一方、温調用熱交換槽20に設けられた熱
交換器22の下部入口部には、前記低温液化ガス導入経
路15から分岐した温調用低温液化ガス導入経路25が
流量調節弁27を介して接続され、上部出口部には、熱
交換器22内で気化したガスを導出する温調用気化ガス
導出経路26が接続されている。
A low-temperature liquefied gas introduction path 15 for introducing a low-temperature liquefied gas supplied from a low-temperature liquefied gas storage tank C or the like is connected to a lower inlet of a heat exchanger 12 provided in the main heat exchange tank 10. The upper outlet is connected to a vaporized gas deriving path 16 for deriving gas vaporized in the heat exchanger 12. On the other hand, a low-temperature liquefied gas introduction path 25 for temperature regulation branched from the low-temperature liquefied gas introduction path 15 is connected to a lower inlet portion of the heat exchanger 22 provided in the heat exchange tank 20 for temperature regulation via a flow control valve 27. In addition, a temperature-regulated vaporized gas deriving path 26 for deriving gas vaporized in the heat exchanger 22 is connected to the upper outlet portion.

【0016】前記気化ガス導出経路16と温調用気化ガ
ス導出経路26とは合流してガス供給経路17となり、
このガス供給経路17を通してユーザーのガス使用設備
にガスが供給される。また、ガス供給経路17には、供
給するガスの温度を測定する手段である温度指示調節計
(TIC)31が設けられている。この温度指示調節計
31は、その指示値、測定値に基づいて前記流量調節弁
27の開閉を制御し、温調用低温液化ガス導入経路25
を流れて温調用熱交換槽20の熱交換器22に導入する
低温液化ガス量を調節するように形成されている。
The vaporized gas outlet path 16 and the temperature controlled vaporized gas outlet path 26 merge to form a gas supply path 17,
Gas is supplied to the user's gas use facility through the gas supply path 17. The gas supply path 17 is provided with a temperature indicating controller (TIC) 31 which is a means for measuring the temperature of the supplied gas. The temperature indicating controller 31 controls the opening and closing of the flow control valve 27 based on the indicated value and the measured value, and controls the temperature of the low-temperature liquefied gas introduction path 25 for temperature control.
To adjust the amount of low-temperature liquefied gas introduced into the heat exchanger 22 of the heat exchange tank 20 for temperature control.

【0017】なお、前記各熱交換槽10,20における
容器11,21の容積や熱交換器12,22の形状、ス
チーム導入量等の各種条件は、蒸発器に求められる供給
ガス量(蒸発量)や供給ガスの温度範囲等に応じて設計
されるが、主熱交換槽10の熱交換能力と温調用熱交換
槽20の熱交換能力とが異なるようにしておくことによ
り、供給ガスの温度調整をより容易に行うことができ
る。各熱交換槽における熱交換能力は、例えば、熱交換
器の熱交換面積を大きくしたり、熱交換器内を流れるガ
スの流速を遅くしたり、スチームの導入量を多くしたり
することにより、熱交換能力を高めることができる。
Various conditions such as the volumes of the vessels 11 and 21 in the heat exchange tanks 10 and 20, the shapes of the heat exchangers 12 and 22, and the amount of introduced steam are determined by the supply gas amount (evaporation amount) required for the evaporator. ) And the temperature range of the supply gas, etc., but by making the heat exchange capacity of the main heat exchange tank 10 and the heat exchange capacity of the heat exchange tank 20 for temperature control different from each other, Adjustment can be performed more easily. The heat exchange capacity in each heat exchange tank is, for example, by increasing the heat exchange area of the heat exchanger, reducing the flow rate of gas flowing in the heat exchanger, or increasing the amount of introduced steam, Heat exchange capacity can be increased.

【0018】また、前記スチーム導入管13,23に
は、スチーム導入量を調節する調節弁13V、23Vが
それぞれ設けられているが、通常は所定の開度で常時開
となっており、所定量のスチームが各容器11,21内
に連続導入されている。
The steam introduction pipes 13 and 23 are provided with control valves 13V and 23V, respectively, for adjusting the amount of introduced steam. Is continuously introduced into each of the containers 11 and 21.

【0019】このように形成した蒸発器を使用して所定
温度のガスを所定流量で供給するには、まず、各容器1
1,21内に所定温度及び圧力のスチームをそれぞれ所
定量ずつ導入する。このときの各容器11,21へのス
チーム導入量は、低温液化ガスの蒸発量及び供給ガスの
温度に応じて設定すればよいが、通常は、主熱交換槽1
0から導出されるガスの温度が供給ガスの設定温度より
高くなるようにし、温調用熱交換槽20から導出される
ガスの温度が供給ガスの設定温度より低くなるようにし
ておく。
In order to supply a gas at a predetermined temperature at a predetermined flow rate using the evaporator thus formed, first, each container 1
A predetermined amount of steam at a predetermined temperature and pressure is introduced into each of the first and second units. At this time, the amount of steam introduced into each of the containers 11 and 21 may be set in accordance with the amount of evaporation of the low-temperature liquefied gas and the temperature of the supply gas.
The temperature of the gas derived from 0 is set higher than the set temperature of the supply gas, and the temperature of the gas derived from the temperature control heat exchange tank 20 is set lower than the set temperature of the supply gas.

【0020】この状態で低温液化ガス貯槽C等からの低
温液化ガスの供給を開始する。主熱交換槽10及び温調
用熱交換槽20への各低温液化ガスの供給割合は、温度
指示調節計31により制御される。すなわち、主熱交換
槽10から導出した設定温度より高い温度のガス(高温
ガス)と、温調用熱交換槽20から導出した設定温度よ
り低い温度のガスとの混合割合を調節することにより、
供給ガスの温度を所望の温度に調節することができる。
In this state, the supply of the low-temperature liquefied gas from the low-temperature liquefied gas storage tank C or the like is started. The supply ratio of each low-temperature liquefied gas to the main heat exchange tank 10 and the temperature control heat exchange tank 20 is controlled by the temperature indicating controller 31. That is, by adjusting the mixing ratio of the gas (high-temperature gas) having a temperature higher than the set temperature derived from the main heat exchange tank 10 and the gas having a temperature lower than the set temperature derived from the heat exchange tank 20 for temperature control,
The temperature of the feed gas can be adjusted to a desired temperature.

【0021】例えば、温度指示調節計31で測定した供
給ガスの温度が設定温度を超えたら流量調節弁27を開
方向に作動させる。これにより、温調用熱交換槽20へ
の低温液化ガス供給量が増加して主熱交換槽10への低
温液化ガス供給量が減少し、結果的に、主熱交換槽10
で気化した高温ガスの流量が減少するとともに温調用熱
交換槽20で気化した低温ガスの流量が増加するので、
両者が混合した供給ガスの温度が下がることになる。同
様に、供給ガスの測定温度が設定温度以下になったら、
流量調節弁27を閉方向に作動させることにより、供給
ガスの温度を上昇させることができる。
For example, when the temperature of the supply gas measured by the temperature indicating controller 31 exceeds the set temperature, the flow control valve 27 is operated in the opening direction. As a result, the supply amount of the low-temperature liquefied gas to the temperature control heat exchange tank 20 increases, and the supply amount of the low-temperature liquefied gas to the main heat exchange tank 10 decreases.
Since the flow rate of the high-temperature gas vaporized in the step decreases and the flow rate of the low-temperature gas vaporized in the temperature control heat exchange tank 20 increases,
The temperature of the supply gas in which the two are mixed will decrease. Similarly, when the measured temperature of the supply gas falls below the set temperature,
By operating the flow control valve 27 in the closing direction, the temperature of the supply gas can be increased.

【0022】なお、同一構成の蒸発器であっても、各容
器11,21内へのスチーム導入量を調節することによ
り、主熱交換槽10から導出するガスの温度を供給ガス
の設定温度より低くし、温調用熱交換槽20から導出す
るガスの温度を供給ガスの設定温度より高くしておくこ
とができる。この場合は、供給ガスの測定温度が設定温
度を超えたら流量調節弁27を閉方向に作動させて温調
用熱交換槽20からの高温ガスの混合割合を少なくす
る。また、上記説明では、各容器11,21内に所定量
のスチームを連続導入するようにしたが、各熱交換槽1
0,20の適当な位置の温度や各導出ガスの温度を検出
し、これに基づいて調節弁13V、23Vを開閉し、ス
チームを間欠的に導入したり、スチームの導入量を調節
したりしてもよい。
It should be noted that even in the evaporator having the same configuration, by adjusting the amount of steam introduced into each of the containers 11 and 21, the temperature of the gas derived from the main heat exchange tank 10 is made higher than the set temperature of the supply gas. The temperature of the gas derived from the temperature control heat exchange tank 20 can be set higher than the set temperature of the supply gas. In this case, when the measured temperature of the supply gas exceeds the set temperature, the flow control valve 27 is operated in the closing direction to reduce the mixing ratio of the high-temperature gas from the heat exchange tank 20 for temperature control. In the above description, a predetermined amount of steam is continuously introduced into each of the containers 11 and 21.
The temperature at appropriate positions of 0 and 20 and the temperature of each derived gas are detected, and the control valves 13V and 23V are opened / closed based on the detected temperatures to intermittently introduce steam or adjust the amount of introduced steam. You may.

【0023】このように、熱媒体としてスチームを使用
する場合であっても、主熱交換槽10から導出したガス
と温調用熱交換槽20から導出したガスとの混合割合を
調節することにより、供給ガスの温度を設定温度範囲に
制御することが可能となる。そして、スチームを使用す
ることにより、その熱交換率の高さを活かして蒸発器の
小型化を図ることができ、ボイラーを含めた蒸発器ユニ
ットとして形成することができ、現地への運搬や設置も
容易に行うことができ、ガス使用設備へのガス供給も短
時間で開始することができる。
As described above, even when steam is used as the heat medium, the mixing ratio between the gas derived from the main heat exchange vessel 10 and the gas derived from the temperature control heat exchange vessel 20 is adjusted. It is possible to control the temperature of the supply gas within a set temperature range. By using steam, it is possible to reduce the size of the evaporator by taking advantage of its high heat exchange rate, and form it as an evaporator unit including a boiler. The gas supply to the gas-using equipment can be started in a short time.

【0024】また、本形態例では、低温液化ガスを気化
させて加温するための熱媒体としてスチームを使用した
が、各容器内でスチームと温水とが共存した状態になっ
ていてもよい。この場合、温水の加熱はスチームによっ
て行うことができるが、ヒーターによる加熱を併用して
もよい。さらに、蒸発器の大きさよりも供給ガス温度の
安定性が要求される場合は、熱媒体として温水を用いる
ことも可能である。
In this embodiment, steam is used as a heat medium for vaporizing the low-temperature liquefied gas and heating it. However, steam and hot water may coexist in each vessel. In this case, heating of the hot water can be performed by steam, but heating by a heater may be used together. Furthermore, when stability of the supply gas temperature is required rather than the size of the evaporator, hot water can be used as the heat medium.

【0025】図2は、本発明の蒸発器の第2形態例を示
す系統図である。この蒸発器は、温水式蒸発器及びスチ
ーム式蒸発器の双方の利点を活かして、小型でありなが
ら温度安定性に優れた蒸発器を形成したものである。
FIG. 2 is a system diagram showing a second embodiment of the evaporator of the present invention. This evaporator is a small-sized evaporator having excellent temperature stability, taking advantage of both the hot water evaporator and the steam evaporator.

【0026】本形態例に示す蒸発器は、スチーム及び温
水を熱媒体とする第一熱交換槽51と、スチームを熱媒
体とする第二熱交換槽52とを組合わせたものであっ
て、両熱交換槽51,52は、前記形態例と同様に、断
熱構造を有する金属製密閉容器51a,52a内に、低
温液化ガスが導入される第一乃至第三熱交換器53,5
4,55をそれぞれ収納するとともに、ボイラーBで発
生させたスチームを容器内に導入するスチーム導入管5
6,57と、熱交換によりスチームが凝縮して生じた水
を容器内から抜取り、ボイラーに戻すドレン58,59
とがそれぞれ設けられている。
The evaporator shown in this embodiment is a combination of a first heat exchange tank 51 using steam and hot water as a heat medium and a second heat exchange tank 52 using steam as a heat medium. Both heat exchange tanks 51 and 52 are provided with first to third heat exchangers 53 and 5 in which low-temperature liquefied gas is introduced into metal closed containers 51a and 52a having a heat insulating structure, as in the above-described embodiment.
4 and 55, respectively, and a steam introduction pipe 5 for introducing steam generated by the boiler B into the container.
6, 57 and drains 58, 59 for extracting water generated by condensation of steam due to heat exchange from the container and returning it to the boiler.
Are provided respectively.

【0027】前記各熱交換器は、ガスの流れ方向に対し
て、第一熱交換器53、第二熱交換器54、第三熱交換
器55の順で直列に設けられており、第一熱交換器53
及び第三熱交換器55は、下部が第一熱交換槽51の温
水層W内に、上部がスチーム層S内に、それぞれ位置し
ており、第二熱交換器54は、そのほとんどが第二熱交
換槽52のスチーム層S内に位置している。
Each of the heat exchangers is provided in series in the order of the first heat exchanger 53, the second heat exchanger 54, and the third heat exchanger 55 in the gas flow direction. Heat exchanger 53
The third heat exchanger 55 has a lower part located in the hot water layer W of the first heat exchange tank 51 and an upper part located in the steam layer S, and the second heat exchanger 54 has almost the third part. It is located in the steam layer S of the two heat exchange tank 52.

【0028】低温液化ガス貯槽C等から供給される低温
液化ガスは、低温液化ガス導入経路61を通って第一熱
交換器53に下部から流入し、最初に温水、次いでスチ
ームと熱交換を行うことによって気化し、第一熱交換器
53の上部から低温ガス経路62に導出する。低温ガス
経路62のガスは、第一熱交換槽51を出て第二熱交換
槽52に向かい、第二熱交換槽52内の第二熱交換器5
4に下部から流入してスチームと熱交換を行い、所定温
度に加温されて高温ガス経路63に導出する。高温ガス
経路63のガスは、第二熱交換槽52から再び第一熱交
換槽51に入り、第一熱交換槽51内の第三熱交換器5
5に上部から流入する。この第三熱交換器55に流入し
たガスは、スチームと熱交換を行った後、温水と熱交換
を行うが、最後に熱容量の大きな温水と熱交換を行うこ
とにより温度調節され、安定した温度状態となって第三
熱交換器55からガス供給経路64に導出し、ユーザー
のガス使用設備に供給される。
The low-temperature liquefied gas supplied from the low-temperature liquefied gas storage tank C or the like flows through the low-temperature liquefied gas introduction path 61 into the first heat exchanger 53 from below, and exchanges heat with firstly hot water and then with steam. As a result, it is vaporized and led out from the upper part of the first heat exchanger 53 to the low-temperature gas path 62. The gas in the low-temperature gas path 62 exits the first heat exchange tank 51 and travels to the second heat exchange tank 52, and the second heat exchanger 5 in the second heat exchange tank 52
4 flows from the lower part into the heat exchange with steam, is heated to a predetermined temperature, and is led out to the high-temperature gas path 63. The gas in the high-temperature gas path 63 enters the first heat exchange tank 51 again from the second heat exchange tank 52, and the third heat exchanger 5 in the first heat exchange tank 51.
5 flows from above. The gas flowing into the third heat exchanger 55 exchanges heat with steam, and then exchanges heat with hot water. Finally, the gas is heat-exchanged with hot water having a large heat capacity, so that the temperature of the gas is adjusted to a stable temperature. In a state, it is led from the third heat exchanger 55 to the gas supply path 64 and is supplied to the user's gas use facility.

【0029】また、供給ガスの温度制御を行うための手
段として、前記ガス供給経路64には、第一熱交換槽5
1にスチームを供給する第一スチーム導入管56の第一
流量調節弁56Vを制御する第一温度指示調節計(TI
C)65が設けられ、前記高温ガス経路63には、第二
熱交換槽52にスチームを供給する第二スチーム導入管
57の第二流量調節弁57Vを制御する第二温度指示調
節計66が設けられている。
As means for controlling the temperature of the supply gas, the first heat exchange tank 5 is connected to the gas supply path 64.
1 and a first temperature indicating controller (TI) that controls a first flow control valve 56V of a first steam introduction pipe 56 that supplies steam to the first steam introducing pipe 56.
C) 65 is provided, and a second temperature indicating controller 66 for controlling the second flow rate control valve 57V of the second steam introduction pipe 57 for supplying steam to the second heat exchange tank 52 is provided in the high temperature gas path 63. Is provided.

【0030】第一温度指示調節計65は、供給ガスの温
度が設定温度より低下したら第一流量調節弁56Vを開
方向に作動させ、スチーム供給量を増加させて第一熱交
換槽51内のスチーム層S及び温水層Wの温度を上昇さ
せる。同様に、第二温度指示調節計66は、高温ガス経
路63を流れるガスの温度が設定温度より低下したら第
二流量調節弁57Vを開方向に作動させ、スチーム供給
量を増加させて第二熱交換槽52内のスチーム層Sの温
度を上昇させる。逆に各ガスの温度が上昇したら、スチ
ーム導入量を減少させることにより、各ガスの温度を所
定温度に維持することができる。
When the temperature of the supply gas falls below the set temperature, the first temperature indicating controller 65 operates the first flow rate control valve 56V in the opening direction to increase the steam supply amount, thereby increasing the steam supply amount in the first heat exchange tank 51. The temperatures of the steam layer S and the hot water layer W are increased. Similarly, when the temperature of the gas flowing through the high-temperature gas path 63 becomes lower than the set temperature, the second temperature indicating controller 66 operates the second flow rate control valve 57V in the opening direction to increase the steam supply amount and to increase the second heat control valve 57V. The temperature of the steam layer S in the exchange tank 52 is increased. Conversely, when the temperature of each gas rises, the temperature of each gas can be maintained at a predetermined temperature by reducing the amount of steam introduced.

【0031】このように、温水層Wに下部が設置された
第一熱交換器53で熱容量の大きな温水と熱交換させて
低温液化ガスを気化させた後、スチーム層Sに設置され
た第一熱交換器53の上部及び第二熱交換器54で高温
のスチームと熱交換させてガスを加温するので、小型の
熱交換器で十分な加温性能を得ることができ、蒸発器全
体の小型を図れる。さらに、第二熱交換器54で供給ガ
スの設定温度以上にガスを加温した後、最後に温水層W
に下部が設置された第三熱交換器55で熱容量の大きな
温水と熱交換させて所定の供給ガス温度に調節するよう
にしているので、蒸発器から導出される供給ガス温度の
安定化が図れる。
As described above, after the low-temperature liquefied gas is vaporized by exchanging heat with the hot water having a large heat capacity in the first heat exchanger 53 whose lower portion is installed in the hot water layer W, the first heat exchanger 53 is installed in the steam layer S. Since the gas is heated by heat exchange with the high-temperature steam in the upper part of the heat exchanger 53 and the second heat exchanger 54, sufficient heating performance can be obtained with a small heat exchanger, and the entire evaporator can be heated. Small size can be achieved. Further, after the gas is heated in the second heat exchanger 54 to a temperature equal to or higher than the set temperature of the supply gas, finally, the hot water layer W
The heat is exchanged with hot water having a large heat capacity in the third heat exchanger 55 whose lower part is installed at a predetermined temperature to adjust the temperature of the supplied gas, so that the temperature of the supplied gas derived from the evaporator can be stabilized. .

【0032】また、第二熱交換器54でスチームと熱交
換後のガスの温度を供給ガスの設定温度よりも高く設定
し、第三熱交換器55で熱交換後のガスの温度を第二熱
交換器54で熱交換後のガスの温度より低く設定してお
くことにより、スチームと温水との熱容量の差及び温度
差を有効に利用して効率よく安定した温度調節を行うこ
とができる。
Further, the temperature of the gas after heat exchange with steam is set higher than the set temperature of the supply gas in the second heat exchanger 54, and the temperature of the gas after heat exchange in the third heat exchanger 55 is set to the second temperature. By setting the temperature of the gas after the heat exchange in the heat exchanger 54 to be lower than that of the gas after the heat exchange, it is possible to effectively utilize the difference in heat capacity between the steam and the hot water and the temperature difference to perform efficient and stable temperature control.

【0033】なお、本形態例では、第一熱交換槽51に
供給するスチームを第一スチーム導入管56からスチー
ム層Sに供給するようにしているが、該導入管を槽(容
器)下部まで延長して温水層W内にバブリングさせて供
給することもできる。
In this embodiment, the steam to be supplied to the first heat exchange tank 51 is supplied from the first steam introduction pipe 56 to the steam layer S. It is also possible to extend and supply the hot water layer W by bubbling.

【0034】図3は、本発明の蒸発器の第3形態例を示
す系統図である。この蒸発器は、前記第2形態例と同様
に、温水式蒸発器及びスチーム式蒸発器の双方の利点を
活かして、小型でありながら温度安定性に優れた蒸発器
を形成したものであって、第2形態例よりもさらに小型
化及び装置構成の簡略化を図ったものである。
FIG. 3 is a system diagram showing a third embodiment of the evaporator of the present invention. This evaporator forms a small-sized evaporator having excellent temperature stability by utilizing the advantages of both a hot water evaporator and a steam evaporator, as in the second embodiment. In this embodiment, further miniaturization and simplification of the device configuration are achieved as compared with the second embodiment.

【0035】この蒸発器は、スチーム層S及び温水層W
の二層を有する気液共存状態の熱交換槽71内に、温水
層W部分に収納された第一熱交換器72と、スチーム層
S部分に収納された第二熱交換器73と、温水層W部分
に収納された第三熱交換器74とを設置したものであっ
て、第一熱交換器72、第二熱交換器73及び第三熱交
換器74は、ガスの流れ方向に対してこの順に直列に接
続されている。
This evaporator comprises a steam layer S and a hot water layer W.
A first heat exchanger 72 housed in the hot water layer W, a second heat exchanger 73 housed in the steam layer S, and a hot water The third heat exchanger 74 housed in the layer W portion is installed, and the first heat exchanger 72, the second heat exchanger 73, and the third heat exchanger 74 are arranged in the gas flow direction. They are connected in series in the order of leverage.

【0036】熱交換槽71には、ボイラーBで発生した
スチームをスチーム層Sに供給する第一スチーム導入管
75と、温水層S内にスチームをバブリングして供給す
る第二スチーム導入管76とが設けられており、各スチ
ーム管75,76には、スチーム供給量を調節するため
手段として第一調節弁75V及び第二調節弁76Vがそ
れぞれ設けられている。また、槽底部には、ドレン水を
ボイラーBに戻すためのドレン77が設けられている。
In the heat exchange tank 71, a first steam introduction pipe 75 for supplying steam generated in the boiler B to the steam layer S, and a second steam introduction pipe 76 for supplying steam by bubbling steam into the warm water layer S are provided. The steam pipes 75 and 76 are provided with a first control valve 75V and a second control valve 76V as means for adjusting the steam supply amount. In addition, a drain 77 for returning drain water to the boiler B is provided at the bottom of the tank.

【0037】また、蒸発器で気化したガスをガス使用設
備に供給するガス供給管78には、供給ガスの温度を測
定して前記第一調節弁75Vを開閉制御する供給ガス温
度指示調節計(TIC)81が設けられており、熱交換
槽71には、温水層Sの温度を測定して前記第二調節弁
76Vを開閉制御する温水温度指示調節計(TIC)8
2が設けられている。さらに、本形態例では、前記ガス
供給管78に供給ガスの流量を測定する流量指示調節計
(FIC)83を設け、この流量指示調節計83の指示
値と前記温度指示調節計81の指示値とを演算器84で
処理することにより、第一調節弁75Vの開閉制御を円
滑にかつ的確に行えるようにしている。
Further, a gas supply pipe 78 for supplying the gas vaporized by the evaporator to the gas using equipment is provided with a supply gas temperature indicating controller (which controls the opening and closing of the first control valve 75V by measuring the temperature of the supply gas). A hot water temperature indicating controller (TIC) 8 that measures the temperature of the hot water layer S and controls the opening and closing of the second control valve 76V is provided in the heat exchange tank 71.
2 are provided. Further, in the present embodiment, a flow indicator controller (FIC) 83 for measuring the flow rate of the supply gas is provided in the gas supply pipe 78, and the indication value of the flow indicator controller 83 and the indication value of the temperature indicator controller 81 are provided. Is processed by the computing unit 84, so that the opening and closing control of the first control valve 75V can be performed smoothly and accurately.

【0038】低温液化ガス貯槽C等から供給される低温
液化ガスは、低温液化ガス導入経路85を通って熱交換
槽71に入り、最初に、温水層W内に設置された第一熱
交換器72に導入される。この第一熱交換器72では、
温水層Wの温水と熱交換を行って所定温度まで加温さ
れ、低温液化ガスが気化する。第一熱交換器72で気化
したガスは、続いて第二熱交換器73に導入され、ここ
でスチーム層Sの高温のスチームと熱交換を行い、供給
ガス温度よりも高い温度に加温される。この高温のガス
は、第三熱交換器74に導入され、温水層Wの温水と熱
交換を行って冷却され、所定の供給ガス温度に調節され
る。
The low-temperature liquefied gas supplied from the low-temperature liquefied gas storage tank C or the like enters the heat exchange tank 71 through the low-temperature liquefied gas introduction path 85 and firstly the first heat exchanger installed in the hot water layer W 72. In this first heat exchanger 72,
Heat exchange is performed with the warm water in the warm water layer W to a predetermined temperature, and the low-temperature liquefied gas is vaporized. The gas vaporized in the first heat exchanger 72 is subsequently introduced into the second heat exchanger 73, where it performs heat exchange with the high-temperature steam of the steam layer S, and is heated to a temperature higher than the supply gas temperature. You. The high-temperature gas is introduced into the third heat exchanger 74, exchanges heat with the hot water in the hot water layer W, is cooled, and is adjusted to a predetermined supply gas temperature.

【0039】第三熱交換器74で温度調節されたガス
は、熱交換槽71からガス供給管78に導出され、所定
圧力、所定温度の供給ガスとなってユーザーのガス使用
設備に供給される。このとき、前記供給ガス温度指示調
節計81及び流量指示調節計83の測定値に基づいて第
一調節弁75Vが開閉制御され、スチーム層Sに供給す
るスチーム量が調節されるとともに、温水温度指示調節
計82の測定値に基づいて第二調節弁76Vが開閉制御
され、温水層Wに供給するスチーム量が調節される。こ
れにより、ガス供給管78から供給される供給ガスの温
度が所定温度に制御される。
The gas whose temperature has been adjusted by the third heat exchanger 74 is led out of the heat exchange tank 71 to a gas supply pipe 78, and is supplied as a supply gas of a predetermined pressure and a predetermined temperature to a user gas use facility. . At this time, the first control valve 75V is controlled to open and close based on the measured values of the supply gas temperature indicating controller 81 and the flow rate indicating controller 83, so that the amount of steam to be supplied to the steam layer S is adjusted and the hot water temperature is indicated. The opening and closing of the second control valve 76V is controlled based on the measurement value of the controller 82, and the amount of steam supplied to the hot water layer W is adjusted. Thereby, the temperature of the supply gas supplied from the gas supply pipe 78 is controlled to a predetermined temperature.

【0040】また、本形態例に示す蒸発器においては、
温水層Wに設置した第一熱交換器72で熱容量の大きな
温水と熱交換させて低温液化ガスを気化させた後、スチ
ーム層Sに設置した第二熱交換器73で高温のスチーム
と熱交換させてガスを加温するので、小型の第二熱交換
器73で十分な加温性能を得ることができ、蒸発器全体
の小型を図れる。さらに、第二熱交換器73で供給ガス
の設定温度以上にガスを加温した後、最後に温水層Wに
設置した第三熱交換器74で熱容量の大きな温水と熱交
換させて所定の供給ガス温度に調節するようにしている
ので、蒸発器で気化させて供給するガス温度の安定化が
図れる。
In the evaporator shown in this embodiment,
After the low-temperature liquefied gas is vaporized by exchanging heat with hot water having a large heat capacity in the first heat exchanger 72 installed in the hot water layer W, heat exchange is performed with high-temperature steam in the second heat exchanger 73 installed in the steam layer S. Since the gas is heated in this way, sufficient heating performance can be obtained with the small second heat exchanger 73, and the entire evaporator can be reduced in size. Further, after the gas is heated to a temperature equal to or higher than the set temperature of the supply gas in the second heat exchanger 73, the heat is finally exchanged with hot water having a large heat capacity in the third heat exchanger 74 installed in the hot water layer W to supply the gas. Since the temperature is adjusted to the gas temperature, the temperature of the gas to be supplied after being vaporized by the evaporator can be stabilized.

【0041】さらに、本形態例では、一つの熱交換槽7
1内に第一乃至第三熱交換器72,73,74を収納し
ているので、前記第2形態例の蒸発器よりも全体的にさ
らなる小型化及び簡略化を図ることができる。したがっ
て、低温液化ガスを昇圧するためのポンプやスチーム供
給用のボイラーを含めて蒸発器全体を一つの設備ユニッ
トとして一体化しても、トラック等で運搬可能な大きさ
に納めることができるので、現地への搬送や据付けが容
易になり、ガス供給を迅速に開始することができ、スポ
ット的に使用する蒸発器として最適である。
Further, in this embodiment, one heat exchange tank 7
Since the first to third heat exchangers 72, 73, and 74 are housed in 1, the overall size and simplification of the evaporator of the second embodiment can be further reduced. Therefore, even if the entire evaporator, including the pump for raising the temperature of the low-temperature liquefied gas and the boiler for supplying steam, is integrated as one facility unit, it can be stored in a size that can be transported by truck or the like. It is easy to transport and install the gas, and can start gas supply quickly, making it ideal as an evaporator for spot use.

【0042】また、第二熱交換器73でスチームと熱交
換後のガスの温度を供給ガスの設定温度よりも高く設定
し、第三熱交換器74で熱交換後のガスの温度を第二熱
交換器73で熱交換後のガスの温度より低く設定してお
くことにより、スチームと温水との熱容量の差及び温度
差を有効に利用して効率よく安定した温度調節を行うこ
とができる。
The temperature of the gas after heat exchange with steam is set higher than the set temperature of the supply gas in the second heat exchanger 73, and the temperature of the gas after heat exchange in the third heat exchanger 74 is set to the second temperature. By setting the temperature to be lower than the temperature of the gas after the heat exchange in the heat exchanger 73, the difference in heat capacity between the steam and the hot water and the temperature difference can be effectively used to efficiently and stably control the temperature.

【0043】なお、低温液化ガス供給源は、低温液化ガ
ス貯槽だけでなくローリーでも同様であり、スチーム
は、ガス使用設備のボイラーから供給を受けてもよく、
蒸発器に付設した専用のボイラーから供給してもよい。
The low-temperature liquefied gas supply source is the same not only in the low-temperature liquefied gas storage tank but also in the lorry, and the steam may be supplied from a boiler of a gas-using facility.
It may be supplied from a dedicated boiler attached to the evaporator.

【0044】[0044]

【実施例】実施例1 図1に示す第1形態例の蒸発器を使用し、ローリーに搭
載した0.3MPa、−196℃の液体窒素を気化さ
せ、60℃に温度調節した窒素ガスを供給する実験を行
った。スチームは120℃、0.3MPaで供給し、該
スチームの供給量や熱交換器の形状等を調整することに
より、主熱交換槽10は、熱交換後のガス温度が80℃
になるように設定し、温調用熱交換槽20は、熱交換後
のガス温度が50℃になるように設定した。
EXAMPLE 1 Using the evaporator of the first embodiment shown in FIG. 1, a liquid nitrogen of 0.3 MPa and -196.degree. C. mounted on a lorry was vaporized, and a nitrogen gas temperature-controlled to 60.degree. C. was supplied. An experiment was performed. The steam is supplied at 120 ° C. and 0.3 MPa, and by adjusting the supply amount of the steam and the shape of the heat exchanger, the main heat exchange tank 10 has a gas temperature of 80 ° C. after the heat exchange.
The temperature control heat exchange tank 20 was set so that the gas temperature after the heat exchange became 50 ° C.

【0045】温度指示調節計31で測定した供給ガスの
温度が60℃を超えたときに、流量調節弁27を開方向
に作動させて温調用熱交換槽20を流れる低温液化ガス
の流量を増加させ、低温ガスの混合割合を多くして供給
ガスの温度を下げ、供給ガスの温度が60℃を下回った
ときに流量調節弁27を閉方向に作動させて温調用熱交
換槽20を流れる低温液化ガスの流量を減少させ、低温
ガスの混合割合を少なくして供給ガスの温度を上げるよ
うにした。これにより、平均温度60℃で、温度変動幅
が±10℃の窒素ガスを約5000m/hで供給する
ことができた。また、PID制御を行うことによってよ
り高精度の温度調節を行うことができた。さらに、両熱
交換槽導出後のガス温度を種々変更して実験を行った
が、本形態例の蒸発器は、比較的高い温度、例えば40
〜60℃のガス供給に適していることがわかった。
When the temperature of the supply gas measured by the temperature indicating controller 31 exceeds 60 ° C., the flow rate control valve 27 is operated in the opening direction to increase the flow rate of the low temperature liquefied gas flowing through the temperature control heat exchange tank 20. Then, the mixing ratio of the low-temperature gas is increased to lower the temperature of the supply gas, and when the temperature of the supply gas falls below 60 ° C., the flow control valve 27 is operated in the closing direction to cause the low-temperature gas flowing through the heat exchange tank 20 for temperature control. The flow rate of the liquefied gas was reduced, the mixing ratio of the low-temperature gas was reduced, and the temperature of the supply gas was increased. As a result, a nitrogen gas having an average temperature of 60 ° C. and a temperature fluctuation range of ± 10 ° C. was supplied at a rate of about 5000 m 3 / h. Further, by performing the PID control, it was possible to perform temperature control with higher accuracy. Further, the experiment was conducted by changing the gas temperature after deriving both heat exchange tanks, but the evaporator of the present embodiment has a relatively high temperature, for example, 40 ° C.
It turned out to be suitable for gas supply at 6060 ° C.

【0046】実施例2 図2に示す第2形態例の蒸発器を使用し、低温液化ガス
貯槽内の0.3MPa、−193℃の液体窒素をポンプ
で1MPaに昇圧し、20℃に温度調節した窒素ガスを
供給する実験を行った。スチームは120℃、0.3M
Paで供給した。なお、第一熱交換槽51における温水
層W及びスチーム層Sの体積、第二熱交換槽52のスチ
ーム層Sの体積はそれぞれ約2mとした。第一温度指
示調節計65の指示温度は20℃、第二温度指示調節計
66の指示温度は35℃とし、各ガス温度がこの温度を
超えたときに各流量調節弁56V,57Vを開方向に作
動させ、各ガス温度が下回ったときに各流量調節弁を閉
方向に作動させた。
Example 2 Using the evaporator of the second embodiment shown in FIG. 2, the pressure of liquid nitrogen of 0.3 MPa and -193 ° C. in the low temperature liquefied gas storage tank was increased to 1 MPa by a pump, and the temperature was adjusted to 20 ° C. An experiment of supplying the supplied nitrogen gas was performed. Steam is 120 ℃, 0.3M
Pa was supplied. The volumes of the hot water layer W and the steam layer S in the first heat exchange tank 51 and the volume of the steam layer S in the second heat exchange tank 52 were each set to about 2 m 3 . The indicated temperature of the first temperature indicating controller 65 is 20 ° C., and the indicated temperature of the second temperature indicating controller 66 is 35 ° C., and when each gas temperature exceeds this temperature, the flow control valves 56V and 57V are opened. , And when each gas temperature fell, each flow control valve was operated in the closing direction.

【0047】このように制御することにより、第一熱交
換器53で気化した窒素ガスの温度は約0℃、第二熱交
換器54で加温された窒素ガスの温度は約35℃、第三
熱交換器55で冷却された窒素ガスの温度は約20℃と
なり、平均温度20℃で、温度変動幅が±5℃の窒素ガ
スを5000m/hで供給することができた。
By controlling in this manner, the temperature of the nitrogen gas vaporized in the first heat exchanger 53 is about 0 ° C., the temperature of the nitrogen gas heated in the second heat exchanger 54 is about 35 ° C., The temperature of the nitrogen gas cooled by the three heat exchangers 55 was about 20 ° C., and nitrogen gas having an average temperature of 20 ° C. and a temperature fluctuation range of ± 5 ° C. could be supplied at 5000 m 3 / h.

【0048】実施例3 図2に示す第2形態例の蒸発器を使用し、ローリーに搭
載した0.3MPa、−196℃の液体窒素をポンプで
1MPaに昇圧し、20℃に温度調節した窒素ガスを供
給する実験を行った。スチームは120℃、0.3MP
aで供給し、温水の温度は15℃に設定した。熱交換槽
71内の温水層Wの体積は約2m、スチーム層Sの体
積は約2.7mとした。第一温度指示調節計81及び
第二温度指示調節計82の指示温度は15℃とし、各ガ
ス温度がこの温度を超えたときに各流量調節弁75V,
76Vを閉方向に作動させ、各ガス温度が下回ったとき
に各流量調節弁を開方向に作動させた。
Example 3 Using the evaporator according to the second embodiment shown in FIG. 2, the pressure of liquid nitrogen of 0.3 MPa and -196 ° C. mounted on a lorry was increased to 1 MPa by a pump, and nitrogen adjusted to 20 ° C. An experiment of supplying gas was performed. Steam is 120 ℃, 0.3MP
a, and the temperature of the hot water was set at 15 ° C. The volume of the warm water layer W in the heat exchange tank 71 was about 2 m 3 , and the volume of the steam layer S was about 2.7 m 3 . The indicated temperature of the first temperature indicating controller 81 and the second temperature indicating controller 82 is set to 15 ° C., and when each gas temperature exceeds this temperature, each flow rate adjusting valve 75V,
76V was operated in the closing direction, and when each gas temperature fell, each flow control valve was operated in the opening direction.

【0049】このように制御することにより、第一熱交
換器72で気化した窒素ガスの温度は約0℃、第二熱交
換器73で加温された窒素ガスの温度は約35℃、第三
熱交換器74で冷却された窒素ガスの温度は約20℃と
なり、平均温度20℃で、温度変動幅が±5℃の窒素ガ
スを5000m/hで供給することができた。
By controlling in this manner, the temperature of the nitrogen gas vaporized in the first heat exchanger 72 is about 0 ° C., the temperature of the nitrogen gas heated in the second heat exchanger 73 is about 35 ° C., The temperature of the nitrogen gas cooled by the three heat exchangers 74 was about 20 ° C., and nitrogen gas having an average temperature of 20 ° C. and a temperature fluctuation range of ± 5 ° C. could be supplied at 5000 m 3 / h.

【0050】[0050]

【発明の効果】以上説明したように、本発明の蒸発器に
よれば、熱媒体としてスチームを使用したことにより、
蒸発器全体の小型化を図ることができる。さらに、熱媒
体としてスチームと温水とを併用することにより、供給
ガスの温度をより安定化させることができる。
As described above, according to the evaporator of the present invention, since steam is used as a heat medium,
The size of the entire evaporator can be reduced. Furthermore, by using steam and hot water together as a heat medium, the temperature of the supply gas can be further stabilized.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の蒸発器の第1形態例を示す系統図で
ある。
FIG. 1 is a system diagram showing a first embodiment of an evaporator according to the present invention.

【図2】 本発明の蒸発器の第2形態例を示す系統図で
ある。
FIG. 2 is a system diagram showing a second embodiment of the evaporator of the present invention.

【図3】 本発明の蒸発器の第3形態例を示す系統図で
ある。
FIG. 3 is a system diagram showing a third embodiment of the evaporator of the present invention.

【符号の説明】[Explanation of symbols]

10…主熱交換槽、11…金属製密閉容器、12…熱交
換器、13…スチーム導入管、14…ドレン、15…低
温液化ガス導入経路、16…気化ガス導出経路、17…
ガス供給経路、20…温調用熱交換槽、21…金属製密
閉容器、22…熱交換器、23…スチーム導入管、24
…ドレン、25…温調用低温液化ガス導入経路、26…
温調用気化ガス導出経路、27…流量調節弁、31…温
度指示調節計、51…第一熱交換槽、52…第二熱交換
槽、53…第一熱交換器、54…第二熱交換器、55…
第三熱交換器、56…第一スチーム導入管、57…第二
スチーム導入管、58,59…ドレン、61…低温液化
ガス導入経路、62…低温ガス経路、63…高温ガス経
路、64…ガス供給経路、65…第一温度指示調節計、
66…第二温度指示調節計、71…熱交換槽、72…第
一熱交換器、73…第二熱交換器、74…第三熱交換
器、75…第一スチーム導入管、76…第二スチーム導
入管、77…ドレン、78…ガス供給管、81…供給ガ
ス温度指示調節計、82…温水温度指示調節計、83…
流量指示調節計、84…演算器、85…低温液化ガス導
入経路
DESCRIPTION OF SYMBOLS 10 ... Main heat exchange tank, 11 ... Metal closed container, 12 ... Heat exchanger, 13 ... Steam introduction pipe, 14 ... Drain, 15 ... Low temperature liquefied gas introduction path, 16 ... Vaporized gas discharge path, 17 ...
Gas supply path, 20: heat exchange tank for temperature control, 21: metal hermetic container, 22: heat exchanger, 23: steam introduction pipe, 24
... Drain, 25 ... Low temperature liquefied gas introduction path for temperature control, 26 ...
Temperature control vaporized gas outlet path, 27: flow control valve, 31: temperature indicating controller, 51: first heat exchange tank, 52: second heat exchange tank, 53: first heat exchanger, 54: second heat exchange Container, 55 ...
Third heat exchanger, 56: first steam introduction pipe, 57: second steam introduction pipe, 58, 59 ... drain, 61 ... low temperature liquefied gas introduction path, 62 ... low temperature gas path, 63 ... high temperature gas path, 64 ... Gas supply path, 65: first temperature indicating controller,
66 ... second temperature indicating controller, 71 ... heat exchange tank, 72 ... first heat exchanger, 73 ... second heat exchanger, 74 ... third heat exchanger, 75 ... first steam introduction pipe, 76 ... Two steam introduction pipes, 77 drain, 78 gas supply pipe, 81 supply gas temperature indicating controller, 82 hot water temperature indicating controller, 83
Flow rate controller, 84: arithmetic unit, 85: low-temperature liquefied gas introduction path

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小林 篤 東京都港区西新橋1−16−7 日本酸素株 式会社内 (72)発明者 高橋 伸之 東京都港区西新橋1−16−7 日本酸素株 式会社内 (72)発明者 石川 直良 神奈川県横浜市鶴見区矢向1−15−1 日 酸工業株式会社内 (72)発明者 高橋 利行 神奈川県横浜市鶴見区矢向1−15−1 日 酸工業株式会社内 Fターム(参考) 3L103 AA05 AA37 BB27 CC02 CC12 DD03 DD63  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Atsushi Kobayashi 1-16-7 Nishi-Shimbashi, Minato-ku, Tokyo Nippon Sanso Corporation (72) Inventor Nobuyuki Takahashi 1-16-7, Nishi-Shimbashi, Minato-ku, Tokyo Japan Within Oxygen Co., Ltd. (72) Inventor Naora Ishikawa 1-1-15-1, Yamu, Tsurumi-ku, Yokohama, Kanagawa Prefecture Inside Acid Industry Co., Ltd. (72) Toshiyuki Takahashi 1-15-1, Yamu, Tsurumi-ku, Yokohama, Kanagawa 3L103 AA05 AA37 BB27 CC02 CC12 DD03 DD63

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 低温液化ガスを熱媒体と熱交換させるこ
とにより加温して気化させる蒸発器において、熱媒体が
導入される容器内に前記低温液化ガスが導入される熱交
換器を収納した主熱交換槽と、熱媒体が導入される容器
内に低温液化ガスの一部が導入される熱交換器を収納し
た温調用熱交換槽と、前記主熱交換槽の熱交換器に低温
液化ガスを導入する低温液化ガス導入経路と、該低温液
化ガス導入経路から分岐し、流量調節弁を介して前記温
調用熱交換槽の熱交換器に低温液化ガスを導入する温調
用低温液化ガス導入経路と、前記主熱交換槽の熱交換器
で気化したガスを導出する気化ガス導出経路と、前記温
調用熱交換槽の熱交換器で気化したガスを導出する温調
用気化ガス導出経路と、前記気化ガス導出経路のガスと
前記温調用気化ガス導出経路のガスとを合流混合させて
ガス使用先に供給するガス供給経路と、該ガス供給経路
を流れる供給ガスの温度を測定する温度測定手段と、該
温度測定手段の測定温度に基づいて前記温調用低温液化
ガス導入経路の流量調節弁を開閉制御する制御手段とを
備えていることを特徴とする蒸発器。
1. An evaporator that heats and vaporizes a low-temperature liquefied gas by exchanging heat with a heat medium, wherein a heat exchanger into which the low-temperature liquefied gas is introduced is housed in a vessel into which the heat medium is introduced. A main heat exchange tank, a heat exchange tank for temperature control containing a heat exchanger in which a part of the low-temperature liquefied gas is introduced in a container into which the heat medium is introduced, and a low-temperature liquefaction in the heat exchanger of the main heat exchange tank. A low-temperature liquefied gas introduction path for introducing a gas, and a low-temperature liquefied gas introduction for branching from the low-temperature liquefied gas introduction path and introducing the low-temperature liquefied gas to the heat exchanger of the temperature-regulating heat exchange tank via a flow control valve Path, a vaporized gas derivation path for deriving gas vaporized in the heat exchanger of the main heat exchange tank, and a temperature control vaporized gas derivation path for deriving gas vaporized in the heat exchanger of the temperature control heat exchange tank, The gas of the vaporized gas outlet path and the vaporized gas for temperature control A gas supply path for merging and mixing the gas of the lead-out path and supplying the gas to the gas use destination, a temperature measuring means for measuring the temperature of the supply gas flowing through the gas supply path, and the temperature measuring means based on the measured temperature of the temperature measuring means. A control means for controlling the opening and closing of a flow control valve in a low-temperature liquefied gas introduction path for temperature control.
【請求項2】 前記温調用熱交換槽の熱交換能力は、前
記主熱交換槽の熱交換能力と異なった能力に設定されて
いることを特徴とする請求項1記載の蒸発器。
2. The evaporator according to claim 1, wherein the heat exchange capacity of the temperature control heat exchange tank is set to be different from the heat exchange capacity of the main heat exchange tank.
【請求項3】 低温液化ガスを熱媒体と熱交換させるこ
とにより加温して気化させる蒸発器において、前記蒸発
器は、熱媒体としてスチーム層及び温水層を有する少な
くとも一つの熱交換槽内に、前記温水層内に配置されて
前記低温液化ガスが導入される第一熱交換器と、前記ス
チーム層内に配置されて該第一熱交換器で熱交換後のガ
スが導入される第二熱交換器と、前記温水層内に配置さ
れて前記第二熱交換器で熱交換後のガスが導入される第
三熱交換器とを収納したことを特徴とする蒸発器。
3. An evaporator that heats and vaporizes a low-temperature liquefied gas by exchanging heat with a heat medium, wherein the evaporator is provided in at least one heat exchange tank having a steam layer and a hot water layer as a heat medium. A first heat exchanger that is disposed in the hot water layer and into which the low-temperature liquefied gas is introduced, and a second heat exchanger that is disposed in the steam layer and into which heat-exchanged gas is introduced in the first heat exchanger. An evaporator comprising: a heat exchanger; and a third heat exchanger disposed in the hot water layer and into which the gas after heat exchange in the second heat exchanger is introduced.
【請求項4】 前記第二熱交換器で熱交換後のガスの温
度が、該蒸発器から導出されるガスの設定温度よりも高
く設定され、前記第三熱交換器で熱交換後のガスの温度
が、第二熱交換器で熱交換後のガスの温度より低く設定
されていることを特徴とする請求項3記載の高圧ガス供
給設備。
4. The temperature of the gas after heat exchange in the second heat exchanger is set higher than the set temperature of the gas derived from the evaporator, and the gas after heat exchange in the third heat exchanger. The high-pressure gas supply equipment according to claim 3, wherein the temperature of the gas is set lower than the temperature of the gas after heat exchange in the second heat exchanger.
【請求項5】 前記蒸発器から導出したガスの温度を測
定する温度測定手段と、前記熱交換槽内にスチームを供
給するボイラーと、前記温度測定手段で測定したガスの
温度に基づいて前記熱交換槽内に供給するスチーム量を
調節するスチーム供給量調節手段とを備えていることを
特徴とする請求項3記載の高圧ガス供給設備。
5. A temperature measuring means for measuring a temperature of a gas derived from the evaporator, a boiler for supplying steam into the heat exchange tank, and a thermometer for measuring the temperature of the gas based on the temperature of the gas measured by the temperature measuring means. The high-pressure gas supply equipment according to claim 3, further comprising steam supply amount adjusting means for adjusting the amount of steam supplied into the exchange tank.
JP2001144729A 2001-05-15 2001-05-15 Evaporator Expired - Fee Related JP4621379B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002340297A (en) * 2001-05-18 2002-11-27 Nippon Sanso Corp High-pressure gas feeding equipment
JP2013515228A (en) * 2009-10-27 2013-05-02 シエル・インターナシヨネイル・リサーチ・マーチヤツピイ・ベー・ウイ Apparatus and method for cooling and liquefying fluids
JP2013533949A (en) * 2010-06-08 2013-08-29 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド Trichlorosilane vaporization system
JP2022063018A (en) * 2020-10-09 2022-04-21 有限会社 両国設備 Liquefied gas vaporization system and liquefied gas vaporization method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211798A (en) * 1985-07-09 1987-01-20 Tokyo Gas Co Ltd Method of increasing heat of liquefied natural gas
JPS63163098A (en) * 1986-12-26 1988-07-06 Chiyoda Chem Eng & Constr Co Ltd Heating and vaporizing method and its device for liquefied light hydrocarbon
JPS6469898A (en) * 1987-09-11 1989-03-15 Tokyo Gas Co Ltd Lng gasification apparatus
JPH029754U (en) * 1988-06-29 1990-01-22
JPH0257800A (en) * 1988-08-24 1990-02-27 Kawasaki Heavy Ind Ltd Method of recovering and using cold temperature from lng
JPH06185696A (en) * 1992-12-21 1994-07-08 Tokyo Gas Co Ltd Evaporating device for low temperature liquefied gas
JPH1163474A (en) * 1997-08-26 1999-03-05 Ishikawajima Harima Heavy Ind Co Ltd Liquefied natural gas heating device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211798A (en) * 1985-07-09 1987-01-20 Tokyo Gas Co Ltd Method of increasing heat of liquefied natural gas
JPS63163098A (en) * 1986-12-26 1988-07-06 Chiyoda Chem Eng & Constr Co Ltd Heating and vaporizing method and its device for liquefied light hydrocarbon
JPS6469898A (en) * 1987-09-11 1989-03-15 Tokyo Gas Co Ltd Lng gasification apparatus
JPH029754U (en) * 1988-06-29 1990-01-22
JPH0257800A (en) * 1988-08-24 1990-02-27 Kawasaki Heavy Ind Ltd Method of recovering and using cold temperature from lng
JPH06185696A (en) * 1992-12-21 1994-07-08 Tokyo Gas Co Ltd Evaporating device for low temperature liquefied gas
JPH1163474A (en) * 1997-08-26 1999-03-05 Ishikawajima Harima Heavy Ind Co Ltd Liquefied natural gas heating device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002340297A (en) * 2001-05-18 2002-11-27 Nippon Sanso Corp High-pressure gas feeding equipment
JP4731042B2 (en) * 2001-05-18 2011-07-20 大陽日酸株式会社 High pressure gas supply equipment
JP2013515228A (en) * 2009-10-27 2013-05-02 シエル・インターナシヨネイル・リサーチ・マーチヤツピイ・ベー・ウイ Apparatus and method for cooling and liquefying fluids
US9046302B2 (en) 2009-10-27 2015-06-02 Shell Oil Company Apparatus and method for cooling and liquefying a fluid
JP2013533949A (en) * 2010-06-08 2013-08-29 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド Trichlorosilane vaporization system
JP2022063018A (en) * 2020-10-09 2022-04-21 有限会社 両国設備 Liquefied gas vaporization system and liquefied gas vaporization method

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