JP2002332302A - 狭い粒子寸法分布を有する重合体粒子の製造方法 - Google Patents
狭い粒子寸法分布を有する重合体粒子の製造方法Info
- Publication number
- JP2002332302A JP2002332302A JP2002078073A JP2002078073A JP2002332302A JP 2002332302 A JP2002332302 A JP 2002332302A JP 2002078073 A JP2002078073 A JP 2002078073A JP 2002078073 A JP2002078073 A JP 2002078073A JP 2002332302 A JP2002332302 A JP 2002332302A
- Authority
- JP
- Japan
- Prior art keywords
- cyclodextrin
- polymerization
- polymer particles
- monomer
- particle size
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- 239000000178 monomer Substances 0.000 claims abstract description 60
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 22
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical compound O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 20
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 7
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- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 claims description 7
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- MXRGSJAOLKBZLU-UHFFFAOYSA-N 3-ethenylazepan-2-one Chemical compound C=CC1CCCCNC1=O MXRGSJAOLKBZLU-UHFFFAOYSA-N 0.000 claims description 3
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- 150000003923 2,5-pyrrolediones Chemical class 0.000 claims description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 2
- 150000003926 acrylamides Chemical class 0.000 claims description 2
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical class NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 claims description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 2
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- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 claims description 2
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- 238000002360 preparation method Methods 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 7
- 229940043377 alpha-cyclodextrin Drugs 0.000 description 7
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- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 7
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- 125000006850 spacer group Chemical group 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 238000010923 batch production Methods 0.000 description 6
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
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- QUKRIOLKOHUUBM-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)C=C QUKRIOLKOHUUBM-UHFFFAOYSA-N 0.000 description 2
- GVDRNFHUEMZJRY-UHFFFAOYSA-N 4-(2,5-dioxopyrrol-1-yl)-n-(1,3-thiazol-2-yl)benzenesulfonamide Chemical compound O=C1C=CC(=O)N1C1=CC=C(S(=O)(=O)NC=2SC=CN=2)C=C1 GVDRNFHUEMZJRY-UHFFFAOYSA-N 0.000 description 2
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
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Landscapes
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2008120860A (ja) * | 2006-11-08 | 2008-05-29 | Fujifilm Corp | 顔料分散組成物、それを含有する着色感光性樹脂組成物及び感光性樹脂転写材料、並びにそれらを用いたカラーフィルタ及び液晶表示装置 |
| JP2010215921A (ja) * | 2004-10-29 | 2010-09-30 | Council Scient Ind Res | 不飽和モノマーの包接複合体、そのポリマー及びこれらの調製方法 |
| WO2010131628A1 (ja) * | 2009-05-11 | 2010-11-18 | Ａｇｃセイミケミカル株式会社 | 単分散性クロロメチルスチレン重合体およびその製造方法 |
| JP2012236797A (ja) * | 2011-05-12 | 2012-12-06 | Adeka Corp | 複合体及びその製造方法 |
| KR20130020002A (ko) * | 2011-08-18 | 2013-02-27 | 삼성전자주식회사 | 단분산 입자의 제조 방법, 이에 따라 제조된 단분산 입자 및 가변 광결정 소자 |
| KR20180048574A (ko) * | 2015-08-28 | 2018-05-10 | 가부시키가이샤 닛폰 쇼쿠바이 | 유기 중합체 미립자 |
| JP2023500898A (ja) * | 2019-11-05 | 2023-01-11 | エヌ－ラブ・テクノロジー・センター・プライベイト・リミテッド | 単分散粒子を製造するための方法 |
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| WO2015101621A1 (en) | 2013-12-30 | 2015-07-09 | Averis As | Process for the preparation of solid particulate vinyl aromatic polymer compositions |
-
2002
- 2002-02-20 DE DE2002625203 patent/DE60225203T2/de not_active Expired - Lifetime
- 2002-03-20 JP JP2002078073A patent/JP2002332302A/ja active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010215921A (ja) * | 2004-10-29 | 2010-09-30 | Council Scient Ind Res | 不飽和モノマーの包接複合体、そのポリマー及びこれらの調製方法 |
| JP2008120860A (ja) * | 2006-11-08 | 2008-05-29 | Fujifilm Corp | 顔料分散組成物、それを含有する着色感光性樹脂組成物及び感光性樹脂転写材料、並びにそれらを用いたカラーフィルタ及び液晶表示装置 |
| WO2010131628A1 (ja) * | 2009-05-11 | 2010-11-18 | Ａｇｃセイミケミカル株式会社 | 単分散性クロロメチルスチレン重合体およびその製造方法 |
| JP2012236797A (ja) * | 2011-05-12 | 2012-12-06 | Adeka Corp | 複合体及びその製造方法 |
| KR20130020002A (ko) * | 2011-08-18 | 2013-02-27 | 삼성전자주식회사 | 단분산 입자의 제조 방법, 이에 따라 제조된 단분산 입자 및 가변 광결정 소자 |
| KR101942966B1 (ko) * | 2011-08-18 | 2019-01-29 | 삼성전자주식회사 | 단분산 입자의 제조 방법, 이에 따라 제조된 단분산 입자 및 가변 광결정 소자 |
| KR20180048574A (ko) * | 2015-08-28 | 2018-05-10 | 가부시키가이샤 닛폰 쇼쿠바이 | 유기 중합체 미립자 |
| KR102676527B1 (ko) | 2015-08-28 | 2024-06-20 | 가부시키가이샤 닛폰 쇼쿠바이 | 유기 중합체 미립자 |
| JP2023500898A (ja) * | 2019-11-05 | 2023-01-11 | エヌ－ラブ・テクノロジー・センター・プライベイト・リミテッド | 単分散粒子を製造するための方法 |
| JP7670701B2 (ja) | 2019-11-05 | 2025-04-30 | エヌ－ラブ・テクノロジー・センター・プライベイト・リミテッド | 単分散粒子を製造するための方法 |
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| DE60225203D1 (de) | 2008-04-10 |
| DE60225203T2 (de) | 2009-02-19 |
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