JP2002303978A5 - - Google Patents

Download PDF

Info

Publication number
JP2002303978A5
JP2002303978A5 JP2001107305A JP2001107305A JP2002303978A5 JP 2002303978 A5 JP2002303978 A5 JP 2002303978A5 JP 2001107305 A JP2001107305 A JP 2001107305A JP 2001107305 A JP2001107305 A JP 2001107305A JP 2002303978 A5 JP2002303978 A5 JP 2002303978A5
Authority
JP
Japan
Prior art keywords
resist composition
hydrocarbon group
formula
positive resist
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001107305A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002303978A (ja
JP4124978B2 (ja
Filing date
Publication date
Priority claimed from JP2001107305A external-priority patent/JP4124978B2/ja
Priority to JP2001107305A priority Critical patent/JP4124978B2/ja
Application filed filed Critical
Priority to KR1020020017975A priority patent/KR100907268B1/ko
Priority to TW091106744A priority patent/TW583511B/zh
Priority to US10/114,985 priority patent/US7179578B2/en
Publication of JP2002303978A publication Critical patent/JP2002303978A/ja
Publication of JP2002303978A5 publication Critical patent/JP2002303978A5/ja
Publication of JP4124978B2 publication Critical patent/JP4124978B2/ja
Application granted granted Critical
Priority to KR1020080101728A priority patent/KR100920164B1/ko
Priority to KR1020090069621A priority patent/KR100950508B1/ko
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2001107305A 2001-04-05 2001-04-05 ポジ型レジスト組成物 Expired - Lifetime JP4124978B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001107305A JP4124978B2 (ja) 2001-04-05 2001-04-05 ポジ型レジスト組成物
KR1020020017975A KR100907268B1 (ko) 2001-04-05 2002-04-02 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법
TW091106744A TW583511B (en) 2001-04-05 2002-04-03 Positive resist composition
US10/114,985 US7179578B2 (en) 2001-04-05 2002-04-04 Positive resist composition
KR1020080101728A KR100920164B1 (ko) 2001-04-05 2008-10-16 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법
KR1020090069621A KR100950508B1 (ko) 2001-04-05 2009-07-29 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001107305A JP4124978B2 (ja) 2001-04-05 2001-04-05 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2002303978A JP2002303978A (ja) 2002-10-18
JP2002303978A5 true JP2002303978A5 (de) 2006-01-19
JP4124978B2 JP4124978B2 (ja) 2008-07-23

Family

ID=18959642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001107305A Expired - Lifetime JP4124978B2 (ja) 2001-04-05 2001-04-05 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4124978B2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003280710A1 (en) * 2002-11-05 2004-06-07 Jsr Corporation Acrylic copolymer and radiation-sensitive resin composition
JP4225817B2 (ja) 2003-03-31 2009-02-18 富士フイルム株式会社 ポジ型レジスト組成物
JP4360836B2 (ja) 2003-06-04 2009-11-11 富士フイルム株式会社 ポジ型レジスト組成物
JP4300420B2 (ja) 2004-06-21 2009-07-22 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP4274057B2 (ja) * 2004-06-21 2009-06-03 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
JP4485913B2 (ja) * 2004-11-05 2010-06-23 東京応化工業株式会社 レジスト組成物の製造方法およびレジスト組成物
JP4881686B2 (ja) 2005-12-09 2012-02-22 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4881687B2 (ja) 2005-12-09 2012-02-22 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP5019055B2 (ja) * 2006-01-25 2012-09-05 日産化学工業株式会社 ポジ型感光性樹脂組成物及びそれから得られる硬化膜
JP4832237B2 (ja) * 2006-09-27 2011-12-07 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
JP4621754B2 (ja) 2007-03-28 2011-01-26 富士フイルム株式会社 ポジ型レジスト組成物およびパターン形成方法
EP1975714A1 (de) 2007-03-28 2008-10-01 FUJIFILM Corporation Positive Resistzusammensetzung und Verfahren zur Strukturformung
US7635554B2 (en) 2007-03-28 2009-12-22 Fujifilm Corporation Positive resist composition and pattern forming method
WO2009110388A1 (ja) * 2008-03-04 2009-09-11 Jsr株式会社 感放射線性組成物及び重合体並びに単量体
JP2011075750A (ja) * 2009-09-30 2011-04-14 Jsr Corp 化学増幅型レジスト用感放射線性樹脂組成物および重合体
JP2013088763A (ja) * 2011-10-21 2013-05-13 Jsr Corp フォトレジスト組成物

Similar Documents

Publication Publication Date Title
JP2002268223A5 (de)
JP2002303978A5 (de)
JP2003241379A5 (de)
JP2004117688A5 (de)
JP2001330947A5 (de)
JP2000214588A5 (de)
JP2003107710A5 (de)
JP2004126013A5 (de)
JP2003043690A5 (de)
JP2002303980A5 (de)
JP2002090988A5 (de)
JP2004361629A5 (de)
JP2002049156A5 (de)
JP2002278053A5 (de)
JP2004271629A5 (de)
JP2002323768A5 (de)
JP2004287262A5 (de)
JP2003262952A5 (de)
JP2004053822A5 (de)
JP2004101642A5 (de)
JP2000187327A5 (de)
JP2002372784A5 (de)
JP2000187329A5 (de)
JP2003177537A5 (de)
JP2004078105A5 (de)