JP2002296615A - Liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a TFT(thin-film transistor) liquid crystal display device which is incorporated with a color filter on a TFT substrate, having a wide viewing angle and brighter display. SOLUTION: The first and second transparent substrates and a liquid crystal layer narrowed between the first and the second substrates are provided. The first substrate has a plurality of image signal lines, a plurality of scanning signal lines. and a plurality of pixel areas formed as an area surrounded by the image signal lines and the scanning signal lines. Each pixel area has at least one active element and a pixel electrode and a common electrode. In a liquid crystal display device having a color filter between the pixel electrode and the liquid crystal layer; the common electrode is formed to the upper layer with the color filter, the pixel electrode is formed to the lower layer with the color filter. The color filter is superimposed at least the whole surface of the pixel electrodes in the pixel area.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a liquid crystal display device and a method for manufacturing the same.

[0002]

2. Description of the Related Art An example of a basic structure of a liquid crystal display device using a TFT as a driving element is to form a TF on a first transparent substrate.
T, forming a scanning wiring or a signal wiring, forming a color filter on a second transparent substrate, filling a liquid crystal in a gap between the TFT and the color filter forming surface of the first and second transparent substrates inside. Configuration. The TFT on the first substrate is arranged in each pixel region. The color filter on the second substrate is arranged such that red (R), green (G), and blue (B) regions are arranged in a stripe pattern with respect to each pixel region. It has a matrix configuration. The brightness, that is, the aperture ratio, of the liquid crystal display device configured as described above is greatly reduced when the positioning accuracy of the first and second substrates is poor, and this effect is caused by the TFT, the scanning wiring or the signal on the first substrate. It is larger than the effect of the deterioration of the alignment accuracy between wirings. Therefore, TF is placed on the first substrate.
T, scanning wiring, signal wiring, etc.
A technique for simultaneously forming a color filter and a black matrix formed on the two substrates, a technique generally called a color filter on TFT has been disclosed.

On the other hand, as a method of widening the viewing angle of a liquid crystal display device, a liquid crystal molecule is rotated while being kept substantially horizontal to a substrate, and a pixel electrode and a common electrode for driving liquid crystal are both used.
I is formed on one substrate, and a voltage is applied between the two electrodes to generate an electric field almost horizontal to the substrate.
One of the pixel electrode and the common electrode is not processed into a comb shape, but is formed into a flat plate shape, and a comb-shaped electrode is formed on the upper portion of the pixel electrode and the common electrode via an insulating film via an insulating film. Fringe-Field-
Switching) method has been proposed. The FSS method is disclosed in JP-A-11-202356.

A method of realizing a color filter on a TFT by the IPS method is disclosed in Japanese Patent Laid-Open No. 2000-1119.
No. 57, for example.

[0005]

However, in Japanese Patent Application Laid-Open No. 2000-111957, a pixel electrode for applying an electric field to the liquid crystal layer is disposed above the color filter layer through a through hole opened in the color filter layer. This through hole is formed for each pixel. However, as a result of the experiment, the inventors have found a serious problem with respect to the mass productivity and the yield that the yield is largely reduced due to the clogging of the through hole. In the IPS display system, the dielectric constant is low, and the thickness of the color filter layer is larger than the thickness of the inorganic insulating film on the TFT.
When a through hole is not formed as in Japanese Patent Application Laid-Open No. 2000-111957, there is a problem that a sufficient voltage cannot be applied to the liquid crystal layer and the transmittance is reduced.

Further, in Japanese Patent Application Laid-Open No. H11-202356, in order to rotate liquid crystal molecules horizontally with respect to the first substrate, a common electrode not having a comb-like shape is provided on the first substrate and an insulating film is provided thereon. Although a configuration in which a comb-shaped pixel electrode is formed is disclosed, a color filter is not formed on the first substrate, and a color filter on TF
There is no technical disclosure that includes the problem with T. On the other hand, Japanese Patent Laying-Open No. 2000-111957 discloses one type of a color filter-on-TFT using an IPS system, but a transparent insulating film is formed between a pixel electrode and a common electrode in a sectional structure. As a basic configuration, the resin color layer constituting the color filter CF layer is configured to have a predetermined thickness of red (R), green (G), and blue (B) according to a specified coloration of each pixel. And patterned. Therefore, after forming a normal TFT, three photo-patterning steps are performed to form R, G, and B of the color filter layer.
One of the pixel electrodes or the common electrode is formed as a comb electrode,
After that, a transparent insulating film is formed, and the other comb electrode of the pixel electrode or the common electrode is to be formed thereon, which has a problem that the process is extremely long. Further, such a long process increases the chances of alignment of exposure on the first substrate on which the TFT is formed, and when a manufacturing process with an alignment margin is performed, a color filter-on-TFT process is performed. There is a problem that the original purpose of providing a bright liquid crystal display device by increasing the aperture ratio and the transmittance, which are the objects, is impaired.

An object of the present invention is to solve the above-mentioned problems. A first object of the present invention is to form a pixel electrode for driving a liquid crystal layer and a common electrode on a first glass substrate without forming a through hole for each pixel. Are provided, and a TFT liquid crystal display device further including a color filter layer is provided.

A second object is to form a liquid crystal display device having a wide viewing angle by rotating liquid crystal molecules horizontally on a substrate by using a simple manufacturing method. An object of the present invention is to provide a liquid crystal display device having a CF formed thereon and a method of manufacturing the same.

A third object is to provide a liquid crystal display device having a high aperture ratio or transmittance and a method of manufacturing the same.

[0010] Further objects of the present invention will become apparent herein.

[0011]

The following is a brief description of typical means for solving the above-mentioned problems.

(Means 1) There are first and second transparent substrates, and a liquid crystal layer sandwiched between the first and second substrates.
One substrate has a plurality of video signal lines, a plurality of scanning signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines, and each pixel region has at least one pixel region. In a liquid crystal display device having an active element and a pixel electrode, and having a color filter layer between the pixel electrode and the liquid crystal layer, a boundary of a color filter of a pixel adjacent in a scanning signal line extending direction is on the video signal line. And a light shielding layer is formed between the color filter and the liquid crystal layer so as to overlap the boundary portion and the video signal line.

Thus, the liquid crystal display device can reduce the alignment margin and improve the aperture ratio by shortening the process and providing a boundary of the color filter on the video signal line and providing a light shielding layer for shielding the boundary region. Can be realized.

(Means 2) The device has first and second transparent substrates and a liquid crystal layer sandwiched between the first and second substrates.
One substrate has a plurality of video signal lines, a plurality of scanning signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines, and each pixel region has at least one pixel region. In a liquid crystal display device having an active element, a pixel electrode, and a common electrode, and having a color filter between the pixel electrode and the liquid crystal layer, the common electrode is formed above the color filter, and the pixel electrode is The color filter is formed below the color filter, and the color filter is formed so as to overlap at least the entire surface of the pixel electrode in the pixel region.

Thus, a TFT liquid crystal display device in which a pixel electrode and a common electrode for driving a liquid crystal layer are arranged on a first glass substrate without forming a through hole for each pixel, and further, a color filter layer is built in. Can be provided.

(Means 3) There are first and second transparent substrates, and a liquid crystal layer sandwiched between the first and second substrates.
One substrate has a plurality of video signal lines, a plurality of scanning signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines, and each pixel region has at least one pixel region. In a liquid crystal display device having an active element, a pixel electrode, and a common electrode, and having a color filter between the pixel electrode and the liquid crystal layer, the common electrode and the pixel electrode are formed below the color filter layer; The color filter is formed so as to overlap at least the entire surface of the pixel electrode and the common electrode in the pixel region.

In this means, a pixel electrode for driving a liquid crystal layer and a common electrode are arranged on the first glass substrate without forming a through hole for each pixel as in the means 2, and a color filter layer is also incorporated. TFT liquid crystal display device can be provided.

(Means 4) There are first and second transparent substrates, and a liquid crystal layer sandwiched between the first and second substrates, formed on at least one of the first and second substrates. Having a common electrode, the first substrate includes a plurality of video signal lines, a plurality of scanning signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines. Wherein each pixel region has at least one active element and a pixel electrode, and wherein the color filter comprises a color filter layer between the pixel electrode and the liquid crystal layer. And the driving electric field of the liquid crystal layer is formed between the pixel electrode and the common electrode through a path passing through both the liquid crystal layer and the color filter.

With this arrangement, even if a through hole is not formed in each pixel of the color filter layer,
A driving electric field is applied to the liquid crystal layer sandwiched between the color filter layer and the second substrate. Since no through hole is provided in the color filter, the accuracy of alignment between the layers is improved, so that an aperture ratio is improved and a bright TFT liquid crystal display device can be realized.

Further, examples of the means of the present invention will be described as follows.

In order to apply a larger electric field to the liquid crystal layer, the pixels or the common electrode formed on the color filter layer are made to have a comb shape in a plane, and the common electrode or the pixel electrode below the color filter is made rectangular. At least the end of the comb electrode overlaps the lower rectangular electrode, and the electric field strength between the common electrode and the pixel electrode is defined by the thickness of the insulating film sandwiched between the common electrode and the pixel electrode as described above. You can do it. Further, the pixel or the common electrode has a comb shape in a plane, the common electrode or the pixel electrode below the color filter is rectangular, and at least the end of the comb electrode overlaps the lower rectangular electrode, and the common electrode and the common electrode have the same shape. As described above, the color filter layer may be formed above the electric field strength between the pixel electrodes so as to be determined by the thickness of the insulating film sandwiched between the common electrode and the pixel electrodes.

According to another aspect of the present invention, there is provided a liquid crystal display device comprising at least two color filter layers,
The process is simplified by functioning as a T light-shielding film.

In a liquid crystal display device which achieves another object of the present invention, the color filter layer is separated along adjacent drain wirings so as not to overlap with each other or separated for each pixel to thereby reduce transmittance. Since a high color filter can be used and the color filter layer itself can be used as an electrode, a driving liquid crystal display device with a low driving voltage and a low brightness can be provided.

Further, the means for providing a bright TFT liquid crystal display device will be further described as follows.

The liquid crystal display has a first and a second transparent substrate, and a liquid crystal layer sandwiched between the first and the second substrates. The first substrate has a plurality of video signal lines and a plurality of scanning signal lines. And a pixel region formed as a region surrounded by each signal line adjacent to the video signal line and the scanning signal line, wherein each pixel region has at least one active element and a pixel electrode. A liquid crystal display device having a light-shielding layer and a common electrode laminated on the video signal line via an insulating film, wherein the light-shielding layer is metal and the common electrode is a transparent conductor.

Furthermore, a portion of the common electrode on the video signal line is wider than the light shielding layer.

Furthermore, the invention is characterized in that the common electrode is laminated on the light shielding layer.

Furthermore, the invention is characterized in that the common electrode is laminated below the light shielding layer.

Further, the common electrode overlaps with the light shielding layer on the video signal line, and the common electrode does not overlap with the light shielding layer in a display area between the video signal lines.

Further, the pixel electrode is comb-shaped.

Further, the pixel electrode is comb-shaped, and is formed below the insulating film.

Further, the invention is characterized in that the insulating film is a color filter and has a boundary portion positioned at the video signal line.

Furthermore, the invention is characterized in that the insulating film is an organic film.

Further, the light shielding layer is also formed on the scanning signal line.

Further measures and advantages of the invention will become apparent from the description, including the claims.

[0036]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below with reference to the drawings. In the following embodiments, the semiconductor film is represented by amorphous silicon (a-Si) and the transparent conductive film is represented by ITO. However, this may be polycrystalline silicon, giant crystalline silicon, or single crystal silicon. In addition, other transparent conductive films such as indium zinc oxide (IZO), InO 2, and Sn
O2, ZnO, a mixture thereof, or a conductive oxide containing In may be used. In addition, as for names of TFT wiring, a scanning wiring is a gate wiring and a video signal wiring is a drain wiring. As for the source and drain electrodes of the TFT, the electrode of the TFT portion connected to the drain wiring side is called a drain electrode, and the pixel electrode side with the channel length region of the TFT interposed is called a source electrode.

[Embodiment 1] FIGS. 1 and 2 show a structure of a pixel portion of a liquid crystal display device of a system according to Embodiment 1. FIG. FIG. 1 shows a cross section taken along line AA ′ of FIG.

First, a description will be given with reference to FIG. A gate wiring (gate electrode) GL made of Mo, Cr or Al is arranged on a first substrate SUB1 using a glass substrate, and a gate insulating film GI made of SiN is formed so as to cover the gate wiring GL. ing. A scanning drive voltage is supplied to the gate line GL. On the gate line GL, a semiconductor film AS made of amorphous silicon is disposed via a gate insulating film GI, and a thin film transistor (TF)
T) functions as a channel layer. The drain electrode SD is made of Mo, Cr or Al through the semiconductor layer d0 doped with phosphorus at a high concentration.
1. A source electrode SD2 is arranged, and a protective film PSV using SiN is formed so as to cover them. The drain electrode SD1 actually constitutes a part of the drain wiring DL to which the video signal voltage is supplied. Then, a pixel electrode PX using a transparent conductive film such as ITO connected to the source electrode SD2 through the through hole CN penetrating the protective film PSV is disposed on the protective film PSV.

In this embodiment, a color filter layer FIL is formed on the pixel electrode PX. Here, in plan view, the pixel electrode PX is an area of one pixel, that is,
A rectangular shape is formed inside one pixel region separated by an adjacent drain wiring DL and an adjacent gate wiring. The color filter FIL uses an organic material, and its planar pattern is a vertical stripe pattern. Of course, the present invention is not limited to the stripe shape, but may be a rectangular shape or a square shape particularly when the pixel arrangement is in a so-called delta arrangement. As shown in FIG. 1, for example, a green color filter layer FIL (G) and a red color filter layer FIL (R)
Indicates a color pattern on the drain wiring DL.

Further, on the color filter layer FIL, a light shielding film BM, a common electrode wiring CL, and a common electrode CT are arranged. Looking at the planar pattern of FIG.
M is formed on the drain wiring DL and the gate wiring GL, and has a structure in which incident light from the surface does not directly hit the semiconductor layer AS. On the other hand, the common electrode wiring CL similarly has a mesh pattern arranged on the drain wiring DL and the gate wiring GL. The width of the light-shielding film BM is wider than that of the light-shielding film BM, and the pattern overlaps the lower pixel electrode PX via the color filter layer FIL. The common electrode CT is a part of the common electrode line CL, and has a comb-shaped portion in the pixel region. In this embodiment,
The light shielding film BM is made of a metal film of Cr or Mo, and the common electrode wiring CL is made of a transparent conductive film such as ITO. An alignment film O is formed on the common electrode and the color filter FIL in the gap.
RI is formed, and its surface is subjected to an orientation treatment.

The light shielding layer BM is made of a metal film of Cr or Mo,
Providing the common electrode with a transparent conductive film and providing a stacked structure of the light-shielding layer and the common electrode or the common electrode wiring separated from each other by the color filter FIL above the drain requires an improvement in contrast ratio due to light shielding near the drain wiring DL. There are two advantages of improving the aperture ratio by using the common electrode and the transparent electrode. Since the common electrode wiring CL on the video signal line also functions as the common electrode CT, the way of naming is not always important. In FIG. 1, a transparent common electrode is laminated on the DL wider than the light-shielding layer BM. However, the end of the common electrode on the DL can also be used as a light transmitting region, thereby further improving the aperture ratio. . Although the transparent electrode is used as the upper layer of the light-shielding layer, it is effective to protect the metallic light-shielding layer thereunder by using a transparent conductor having high stability by being an oxide as the upper layer. . In this case, a metal light-shielding layer is formed, and then a metal layer is first formed by coating, exposing, developing, and etching. The common electrode can be composed of only the transparent electrode. Of course,
Conversely, a metallic light-shielding layer may be an upper layer, and a common electrode of a transparent electrode may be a lower layer. In this case, after forming a metal layer and a transparent conductor layer all at once, the metal layer is photo-exposed, developed, and etched, and then the transparent conductor layer is photo-exposed, developed and etched to form a common electrode in the pixel. Can be formed as a light-transmitting region by using only a transparent electrode, and a metal layer and a transparent conductor layer can be continuously formed, which has an effect of improving contact and adhesion between the metal layer and the transparent conductor layer. Further, the light shielding layer BM may be formed on the gate wiring GL to form a matrix. This is because the image quality can be improved by reducing the power supply resistance, and a light-shielding layer for shielding the TFT from light is not required on the counter substrate side, so that the aperture ratio can be further improved. In addition, the effect described above does not necessarily require that the separation between the drain wiring DL and the light shielding layer BM be a color filter, but may be an organic insulating film or an inorganic insulating film. Drain wiring D
From the viewpoint of reducing the parasitic capacitance of L, an organic insulating film having a low dielectric constant is desirable. Further, even if the pixel electrode PX is configured in a comb-like configuration as a so-called IPS arrangement, and the liquid crystal molecules are driven by a so-called lateral electric field having a component parallel to the substrate between the pixel electrode PX and the common electrode CT. ,
The above effects can be obtained. In the above description, when the light-shielding layer is an upper layer, when an organic insulating film is used instead of a color filter, when the pixel electrode PX has a comb-like shape,
The configuration in the case where the light shielding layer is provided on the gate wiring GL and the configuration in the case where they are combined are not shown in the figure. This is because those skilled in the art can easily understand structural changes from the above description.

Further, a laminated structure of the light shielding layer and the common electrode line CL may be provided only on the gate line GL. Since the light shielding layer is a metal layer, the effect of reducing the power supply resistance can be achieved. Further, particularly in the case of the normally black mode, the liquid crystal on the transparent electrode does not operate if the potential is the same, that is, the display becomes black and the contrast is not greatly reduced. Even if it is constituted only by the common electrode wiring CL, it is possible to realize a practicable constant image quality.

On the other hand, a second substrate SUB2 made of glass
An orientation film ORI is formed inside the substrate, and its surface is rubbed. Then, the first glass substrate SUB
The first and second glass substrates SUB2 are opposed to each other on the alignment film ORI formation surface, and a liquid crystal layer LC is disposed between them. Also, the first and second glass substrates SUB1, SUB
A polarizing plate POL is formed on the outer surface of the second POL. The first substrate SUB1 and the second substrate SUB2 are not limited to glass, and may be transparent substrates such as plastic.

In the TFT liquid crystal display device formed as described above, when an electric field is not applied to the liquid crystal layer LC, the liquid crystal molecules in the liquid crystal layer LC are changed to the first glass substrate SUB1.
Are homogeneously aligned with each other in a substantially parallel state. However, the initial alignment state is not limited. When a voltage difference is applied between the common electrode CT and the common electrode wiring CL formed on the first glass substrate SUB1 and the pixel electrode PX, an electric field is generated. When the voltage is equal to or larger than the threshold electric field, the liquid crystal molecules rotate and the transmittance is controlled. Is done. The lines of electric force applied to the liquid crystal layer are transmitted from the common electrode CT to the liquid crystal layer LC and the color filter layer FI.
Through L, it reaches the pixel electrode PX. In this structure, since a large amount of the electric field component in the lateral direction with respect to the substrate is included, the component in which the liquid crystal molecules rotate with respect to the substrate becomes dominant, and a liquid crystal display device having a wide viewing angle can be obtained. Further, the comb-shaped common electrode CT and the pixel electrode PX in the pixel region overlap each other with the color filter layer FIL interposed therebetween, and the maximum electric field applied to the liquid crystal layer LC is defined by the thickness of the color filter layer FIL. . The color filter layer is formed of a 1-2 μm resin layer.
This method defines the maximum electric field between the pixel electrode PX and the common electrode CT with a planar dimension on the first glass substrate SUB1.
For example, Japanese Patent Application Laid-Open No. 2000-111957 discloses an IPS
The driving voltage can be reduced as compared with the liquid crystal display device of the system. Further, in the above publication, a transparent insulating film is further formed on a pixel color filter, and a pixel electrode and a common electrode are arranged so as to sandwich the transparent insulating film. This transparent insulating film is formed and the patterning formed thereon is performed. In this embodiment, the steps can be simplified, and the number of layers can be reduced, so that the aperture ratio can be improved and a bright liquid crystal display can be provided.

Next, an example of the manufacturing method will be described.
First, as shown in FIG. 3A, a laminated film of Cr, Mo, or Al and Mo is formed, and is patterned by photolithography and etching to form a film on the first glass substrate SUB1. The gate wiring GL is formed.

Next, as shown in FIG. 3B, a gate insulating film GI made of SiN is formed on the first glass substrate SUB1 including the gate wiring GL, and an amorphous film is formed on the gate wiring GL through this. Semiconductor film A made of silicon
S, a high concentration semiconductor film d0 is formed. This semiconductor film AS
An n-type high-concentration semiconductor film d0 to which phosphorus and phosphorus are added is formed by continuously forming a gate insulating film GI, a semiconductor film AS, and a high-concentration semiconductor film d0, and using the photolithography and etching techniques to form the high-concentration semiconductor film d0 and the semiconductor film. It is formed by AS patterning.

Next, as shown in FIG. 3C, a drain electrode SD1 and a source electrode SD2 are formed so as to partially overlap the pattern with the high-concentration semiconductor film d0. Then, using the drain electrode SD1 and the source electrode SD2 as a mask,
The channel region of the TFT is formed by removing the high-concentration semiconductor layer d0 by dry etching. Drain wiring D
L is formed by the same process and material as the drain electrode SD1.

Next, as shown in FIG. 4A, SiN is formed on the gate insulating film GI so as to cover the drain electrode SD1, the source electrode SD2, the semiconductor film AS, and the drain wiring DL.
Is used to form a protective film PSV. Subsequently, the source electrode SD is formed by photolithography and etching.
Then, a contact hole CN of the protective film PSV is opened on 2. Next, as shown in FIG. 4B, a pixel electrode PX using a transparent conductive film made of ITO is formed on the protective film PSV. The pixel electrode PX is substantially rectangular in plan,
Connected to source electrode SD1 via contact hole CN.

Next, as shown in FIG.
A color filter layer FIL is formed on the SV and the pixel electrode PX. The color filter layer FIL is formed of, for example, a resin film containing a red (R), green (G), or blue (B) dye or pigment. For this, for example, a pigment-dispersed resist obtained by dispersing a pigment capable of obtaining desired optical characteristics such as red in an acrylic-based photosensitive resin is used. First, a pigment dispersion resist is applied to the pixel electrode P.
X, is applied on the protective film PSV, and is exposed and developed using a photomask so that a pattern edge comes on the adjacent drain wiring DL. These steps are performed by the number of colors, for example, three (3) colors of red (R), blue (B), and green (G).
By repeating the process a number of times, a color filter layer FIL can be formed.

Next, as shown in FIG. 5B, a light shielding film BM of Cr or Mo is formed, and finally, the common electrode wiring CL and the common electrode CT are formed of a transparent conductive film using ITO.
To form The common electrode wiring CL is formed so as to cover the drain wiring DL via the color filter FIL.
The common electrode CT has a comb-like shape and overlaps the lower pixel electrode PX via the color filter FIL. The light-shielding film BM is formed of a metal film. In this case, there is an advantage that the common potential can be transmitted to lower the resistance together with the CL. Also, a resin film may be used. In this case, there is an effect that the capacitance between CL and DL can be further reduced. In addition, it can be omitted depending on the application, thereby simplifying the process, improving the yield, and providing an inexpensive liquid crystal display device. In particular, the semiconductor film AS is formed of continuous grain silicon (Continuo) in which crystal grain boundaries of polycrystalline silicon, giant crystalline silicon, or polycrystalline silicon are adjacent to each other.
In the case of using USS (Grain Silicon: CGS), the leakage current between the drain electrode SD1 and the source electrode SD2 when the TFT generated by light irradiation is off can be reduced, so that the light shielding film BM can be easily removed.

As described above, in this embodiment, the lines of electric force from the common electrode CT and the common electrode line CL on the color filter FIL pass through the liquid crystal layer LC of FIG. It reaches the electrode PX. The liquid crystal molecules in the liquid crystal layer LC are rotated by the electric field determined by the lines of electric force, and the transmittance is controlled. Further, the pixel area of the present embodiment is:
As shown in FIGS. 1 and 2, no through hole is formed in the color filter layer FIL. This is because a color filter is formed on a first glass substrate SUB1.
This is a great difference from the IPS type liquid crystal display device disclosed in Japanese Patent Application Publication No. 000-111957. As a result, a reduction in yield due to a contact failure that occurs when a contact hole is formed in each pixel of the color filter FIL formed of resin, and the occurrence of uneven brightness in each pixel due to a difference in contact resistance between pixels is fundamentally eliminated. I was able to do it. Thereby, on the first glass substrate SUB1,
Pixel electrode PX, common electrode CT, and color filter layer F
As a liquid crystal display device with a wide viewing angle formed with an IL, a liquid crystal display device having high yield quality and eliminating luminance unevenness for each pixel has been realized.

In this embodiment, the TFT is described, but the MIM may be used.

In this embodiment, the configuration of the pixel portion has been described. However, various circuits such as a scanning signal driving circuit, a video signal driving circuit, and a control circuit are provided in the peripheral portion. It goes without saying that it is driven. Of course, some or all of these circuits are constituted by active elements using continuous grain silicon CGS in which crystal grain boundaries of polycrystalline silicon, giant crystalline silicon, or silicon polycrystal are adjacent to each other on the first substrate SUB1. May be.

The metal material used for the wiring or the electrode may be Ta, W or the like in addition to the materials described in the above description.

In the case of a transmissive or front-light type liquid crystal display device, it goes without saying that a backlight unit is provided on the back surface of one of the polarizing plates.

[Embodiment 2] The structural difference between this embodiment and Embodiment 1 will be described with reference to FIGS. 6 and 7. FIG. FIG. 6 shows a cross section taken along the line BB 'of FIG.

In the liquid crystal display of this embodiment, the gate wiring GL and the common electrode wiring C are formed on the first glass substrate SUB1.
L, and a common electrode CT formed of a transparent conductive film such as ITO, as shown in FIG.
It is arranged to be connected to L. Common electrode C
T has a rectangular shape in plan view while not overlapping with the gate wiring GL or the drain wiring DL. The gate insulating film GI is coated so as to cover the electrodes and the wiring of the first glass substrate SUB1. Gate insulating film G
On I, a semiconductor layer AS, a drain electrode SD1, and a source electrode SD2 are formed. The connection between the electrode and the semiconductor layer AS is made of a phosphorus-doped n-type high-concentration semiconductor layer d0. The source electrode SD2 and the drain electrode SD1 are formed of the same metal film as in the first embodiment. The drain electrode SD1 forms a part of the drain wiring DL.

The pixel electrode P connected to the source electrode SD2
X is formed of a transparent conductive film such as ITO, which has a comb shape in the pixel area.
It overlaps with the common electrode CT via the lower gate insulating film GI. The PX may have a linear region, and both ends may be connected to each other. Then, the pixel electrode P
X is covered with a protective film PSV using SiN. A color filter layer FIL is formed on the protective film PSV. Above the light shielding film BM is formed a light shielding film for the TFT portion and a black matrix around the drain wiring DL. An alignment film ORI is formed thereon, and is subjected to an alignment treatment in the same manner as the alignment film ORI formed inside the second glass substrate SUB2. As described above, in the present embodiment, the pixel electrode P under the protective film PSV
The lines of electric force extending from X pass through the protective film PSV, the color filter layer FIL, and the liquid crystal layer LC, and then lower again, and the gate insulation of the gap between the color filter layer FIL, the protective film PSV, and the pixel electrode PX is formed. Through the membrane GI, the common electrode C
It reaches T. Here, the dielectric anisotropy of the used liquid crystal is not particularly defined. However, in the present structure, a material having a positive dielectric anisotropy is more preferable because the driving voltage can be reduced.

As in the first embodiment, the present embodiment has a feature that a contact hole is not formed in each pixel of the color filter FIL formed of this resin, and the yield can be increased as compared with the conventional known example. Further, this embodiment has a great advantage that point defects can be reduced as compared with the first embodiment. The reason will be described below.

It is known that adhesion between an organic material and an inorganic material is more difficult than between organic materials or between inorganic materials. However, in the first embodiment, it is necessary to form the common electrode CT which is an inorganic material made of a conductive metal or a transparent conductor on the color filter FIL. For this reason, the common electrode is easily peeled off from the FIL in the manufacturing process, and a point defect is easily generated. Further, the common electrode CT
Is processed into a comb shape or a linear shape, so that its width is narrow and it is easy to peel off. When the FIL-like component is peeled off, if it is an electrode, light control becomes impossible in the region, and even if the light itself can be controlled, the gap of the liquid crystal layer fluctuates, leading to uneven brightness. On the other hand, in this embodiment, a light shielding layer is formed on the FIL. This light shielding layer is formed of a resin, for example. In this case, since the light-shielding layer BM and the color filter FIL are organic materials, they have a configuration that is relatively difficult to peel off. Further, when the light-shielding layer BM is formed of a metal material, since it is a light-shielding layer, it can be formed wider than the CT of the first embodiment, and the contact area with the FIL can be increased. That is, in the present embodiment, even when the light shielding layer BM is made of resin or metal, the constituent layer on the FIL can be made harder to peel off than in Embodiment 1, and the yield can be improved.

[Embodiment 3] FIG. 8 is a sectional view. On the first glass substrate SUB1, a gate line GL for driving a scanning voltage, a drain line DL for supplying a video signal voltage, and a drain electrode SD1 and a source electrode SD2 forming a part thereof.
A gate insulating film GI made of SiN, a protective film PSV,
A pixel electrode PX is formed on the protective film PSV and connected to the source electrode SD2. The structure up to the pixel electrode PX and the manufacturing process are the same as in the first embodiment.

The difference between the present embodiment and the first embodiment is the structure above the pixel electrode PX in the pixel and the corresponding steps. The color filter layer FIL is a semiconductor layer AS of the TFT.
Thus, a color filter layer FIL (G) of an adjacent pixel is superimposed on a color filter layer FIL (R) for a single color. In this way, by overlapping at least two or more color filters FIL, the effect of a light-shielding film from light incident from the second glass substrate SUB2 side is enhanced.
In FIG. 6, two layers are superimposed. However, if another layer of blue color filter FIL (B) is superimposed on this layer, the light shielding effect is further enhanced.

In the present embodiment, two or three color layers of the color filter layer FIL are planarly overlapped in a part of the pixel, and this is used as a light shielding film in the TFT portion or a black matrix for separating pixels. Applied at least in part. Thereby, compared to the first embodiment, the light-shielding film BM formed by separate film formation and patterning can be omitted.
The color filter layer FIL is formed of, for example, a resin film containing a red (R), green (G), or blue (B) dye or pigment. For example, a pigment-dispersed resist in which a pigment that provides desired optical characteristics, such as red, is dispersed in an acrylic-based photosensitive resin is used. First, a pigment-dispersed resist is applied on the pixel electrode PX and the protective film PSV, and this is exposed using a photomask,
Develop and form. The color filter layer FIL can be formed by repeating these steps three times for the number of colors, for example, three colors of red (R), blue (B), and green (G).

In this embodiment, an overcoat layer OC made of a transparent insulating film material is formed on the color filter layer FIL. The overcoat layer OC uses, for example, a thermosetting resin such as an acrylic resin. Alternatively, a light-curable transparent resin may be used. CL and CT were formed thereon. This overcoat layer OC is a color filter layer FI
L partially overlaps, and there is a flattening effect that can reduce defects generated in the rubbing step of the alignment film ORI due to the steps. Thus, in a high definition TFT liquid crystal display device in which the distance between the adjacent drain wirings DL and the distance between the adjacent gate wirings GL are reduced, for example, in a TFT liquid crystal display device in which the distance between the drain wirings DL is 80 μm or less, the alignment processing, particularly the rubbing processing is performed. The defect was reduced as compared with the first embodiment.

In this embodiment, the color filter FIL
From the upper common electrode CT and the common electrode wiring CL to the liquid crystal layer L
C, color filter layer FIL, overcoat layer O
The liquid crystal molecules in the liquid crystal layer LC are rotated by an electric field determined by lines of electric force reaching the pixel electrode PX under the liquid crystal layer C through C, thereby controlling the transmittance.

[Embodiment 4] FIGS. 9 and 10 show a liquid crystal display device of a system according to Embodiment 4 of the present invention. FIG.
FIG. 11 is a cross-sectional view taken along line CC ′ of a plan view of one pixel in FIG. 10.
A gate line GL for driving a scanning voltage and a drain line DL for supplying a video signal voltage on a first glass substrate SUB1
And a drain electrode SD1 and a source electrode S forming a part thereof.
D2, gate insulating film GI formed of SiN, protective film P
The pixel electrode PX is formed on the SV and the protective film PSV and connected to the source electrode SD2. The structure up to the pixel electrode PX and the manufacturing process are the same as in the first embodiment.

The color filter layer F is formed on the protective film PSV.
Form an IL. In this embodiment, the color filter layer FIL
Is significantly different from the first and second embodiments. The color filter layer FIL is adjacent to the drain wiring D
Color filter layer FI having a boundary near L
L has regions separated from each other. The cross-sectional view of FIG. 9 shows that the red color filter layer FIL (R) and the green color filter layer FIL (G) overlap each other near the drain wiring DL and have regions that are not in contact with each other. On the other hand, since the gap between the adjacent color filter layers FIL has a large step, the overcoat layer OC made of a transparent insulating film material is formed from above. The overcoat layer OC uses, for example, a thermosetting resin such as an acrylic resin. Alternatively, a light-curable transparent resin may be used. This overcoat layer OC is a color filter layer FI
L partially overlaps, and there is a flattening effect of reducing poor coating of the alignment film ORI and poor alignment due to the step.

The common electrode CT and the common electrode wiring CL for driving the liquid crystal layer LC are arranged in a comb-like shape on the upper part. The common electrode CT is formed of a transparent conductive film such as ITO. However, the same applies to the first to third embodiments, but the common electrode CT and the common electrode line CL are both Cr.
Alternatively, a metal film such as Mo or Mo may be used. In this case, the transmittance is reduced, but the resistance is lower than that of ITO, and it also functions as a light-shielding film. Therefore, there is no need to provide a special light-shielding film BM, and a TFT liquid crystal display device with a larger screen can be provided.

The most important feature of this embodiment is as described above.
The color filter layer of each pixel is connected to the adjacent drain wiring D
Along L, separated so as not to overlap each other,
Alternatively, another point is that one pixel and one pixel are separated along the adjacent gate wiring. This is to realize the following performance improvement. For a color resist that determines the color of a color filter, high color purity and high transmittance have a trade-off relationship. As a material satisfying such a trade-off, the inventors have found that a material having conductivity is promising. As another promising material, a material containing an ionic component has been found to be promising.

However, when a prototype is manufactured according to the actual product structure, unexpected new phenomena such as deterioration of crosstalk, increase in drive voltage, and poor reliability have occurred. As a result of analyzing these in detail, it was concluded that the causes were as follows. That is, these materials are used for the color filter FIL, and the color filter layer FIL between the adjacent pixels is used.
Are overlapped with each other, the pixel electrode P
It was found that the potential of X leaked to an adjacent pixel, which caused deterioration in crosstalk and a decrease in effective voltage, that is, an increase in drive voltage. In addition, it was found that when an ionic component was contained, ions were exchanged between the color filters FIL that were in contact with each other, and a fading phenomenon occurred in the color filters FIL. It has also been found that this fading phenomenon represents a problem with reliability that progresses with time. In the case where the liquid crystal display device has conductivity and has an ionic component, it has been found that ion exchange is accelerated by actual driving of the liquid crystal display device, that is, energization, and color fading occurs rapidly.

In order to apply a color filter having conductivity, or having an ionic component, or having conductivity and having an ionic component, the present inventors applied a cross-sectional view to FIG. 9 and a cross-sectional view to FIG. The structure shown as a plan view was devised. That is, the color filters FIL are separated for each pixel, and the color filters are separated by a transparent overcoat film OC. Further, the overcoat film OC is provided between the color filter FIL and an electrode or a conductive material formed on the color filter, for example, a common electrode CT.

In the former method, when the color filter has conductivity, short-circuiting of the color filter between pixels can be prevented, so that deterioration of crosstalk and an increase in driving voltage can be prevented. When the color filter has an ionic component, ion exchange between the color filters can be prevented, and discoloration of the color filter can be prevented.

In the latter method, when the color filter has conductivity, a short circuit between the pixel electrode PX and the common electrode CL can be prevented. Further, when the color filter has an ionic component, it is possible to prevent the ionic component in the color filter from dissolving into the liquid crystal layer and contaminating the liquid crystal layer, and to suppress ion exchange between the liquid crystal layer and the color filter. Again, fading of the color filter can be prevented.

In FIG. 10, the gate lines GL are not separated from each other, and the color filters along the drain lines DL are not overlapped. However, a certain effect can be realized with this structure. This is because the width of the gate line GL is wider than the drain line DL, and the distance between the pixel electrodes adjacent in the direction in which the video signal lines extend can be kept larger than the distance between the pixel electrodes in the direction in which the scan signal lines extend. This is because leakage between pixel electrodes can be reduced. Note that a protective film is formed on the TFT as shown in FIG. This is the color filter FIL
Also functions to prevent a short circuit between the source and the drain due to the above.

In this embodiment, the case where the common electrode CL is formed on the same substrate as the pixel electrode PX has been mainly described. However, the effect of this embodiment is that the common electrode CL is formed on the pixel electrode PX.
The same applies to the case in which it is formed on a substrate facing
This is included in this embodiment.

The color filters FIL may be separated from each other in both the scanning signal line extending direction and the video signal line extending direction. In this case, the pixels between pixels adjacent in the video signal line extending direction may be separated. Since the electrodes can be completely separated from each other, the effects of the present embodiment can be realized more reliably.

When the color filter FIL is conductive, the potential of the pixel electrode PX is transmitted to the surface of the FIL due to the conductivity of the color filter layer FIL, and the potential of the pixel electrode PX reaches the liquid crystal layer LC more. A new effect that a TFT liquid crystal display device having a low driving voltage can be provided has been realized. At this time, if the resistivity indicating the conductivity of the color filter is 10 14 Ωcm or less, an effect of voltage drop can be produced. To further reduce the drive voltage,
It is desirable to be 10 10 Ωcm or less. It goes without saying that the lower the voltage, the stronger the effect of lowering the driving voltage. However, if the resistance is reduced too much, the light transmittance tends to decrease.
Most preferably, it is within the range of 0 Ωcm.

In the liquid crystal display device having the structure of this embodiment,
The driving electric field applied to the liquid crystal layer passes through the color filter layer. Conventional method, for example, color filter
In an example of a method in which a pixel electrode is provided on a TFT substrate, a common electrode is provided on a color filter of a color filter substrate, and a driving electric field is generated between the pixel electrode and the common electrode. There is a method. In this method, the driving electric field applied to the liquid crystal layer does not pass through the color filter layer. In the so-called lateral electric field method, both the pixel electrode and the common electrode are on the TFT substrate, and a driving electric field is formed between the electrodes. Therefore, the driving electric field applied to the liquid crystal layer does not pass through the color filter layer. Further, in a method in which a color filter is provided on a TFT substrate, a conventionally known method is to provide a pixel electrode on a color filter, provide a common electrode on an opposing substrate, and form a driving electric field applied to the liquid crystal layer therebetween. The driving electric field applied to the liquid crystal layer does not pass through the color filter layer. But,
In this embodiment, a color filter layer is provided between the pixel electrode and the common electrode, and a driving electric field is formed in the liquid crystal layer through the color filter layer. Therefore, in the case where the color filter layer has ionic impurities as in this embodiment, or has conductivity, or has any contaminant impurities, for example, metal ions, or an organic solvent, the liquid crystal layer Since the reaction between the color filter and the color filter is accelerated by the driving electric field passing through the color filter, a new problem that contamination of the liquid crystal layer is accelerated has been found. Therefore, from the viewpoint of ensuring the reliability of the liquid crystal display device and preventing contamination of the liquid crystal layer, a color filter layer is provided between the pixel electrode and the common electrode, and the liquid crystal layer is driven through the color filter layer. In the method of forming an electric field, it is extremely desirable to form a protective film for preventing contamination between the color filter and the liquid crystal layer. When the protective film is an organic film, it is more preferable because a flattening effect can also be realized.

As described in detail above, according to the configuration of this embodiment, a color filter is arranged on the TFT substrate, and a bright TFT liquid crystal display device with high color purity can be realized.

The present invention is not limited to the embodiments 1 to 4 including the technical idea and effects,
The configurations and effects according to the technical concept disclosed in the specification including the claims are all included in the scope of the present invention.

[0081]

The typical effects of the present invention are as follows. That is, there is provided a TFT liquid crystal display device in which a pixel electrode and a common electrode for driving a liquid crystal layer are arranged on a first glass substrate without forming a through hole in a color filter for each pixel, and further a color filter layer is incorporated. it can.

When a liquid crystal display device having a wide viewing angle is formed by rotating liquid crystal molecules horizontally on a substrate by using a simpler manufacturing method, a liquid crystal having not only TFTs but also CFs formed on a first substrate. A display device and a method for manufacturing the display device can be provided.

Further, it is possible to provide a liquid crystal display device having a high aperture ratio or high transmittance and a method of manufacturing the same.

Further, a bright TFT display device having a wide viewing angle can be provided.

[Brief description of the drawings]

FIG. 1 is a sectional view of a pixel of an embodiment of a liquid crystal display device of the present invention.

FIG. 2 is a plan view of a pixel in one embodiment of the liquid crystal display device of the present invention.

FIG. 3 is an explanatory diagram of a manufacturing method of an embodiment of the liquid crystal display device of the present invention.

FIG. 4 is an explanatory diagram of a manufacturing method of one embodiment of the liquid crystal display device of the present invention.

FIG. 5 is an explanatory diagram of a manufacturing method of one embodiment of the liquid crystal display device of the present invention.

FIG. 6 is a sectional view of a pixel in an embodiment of the liquid crystal display device of the present invention.

FIG. 7 is a plan view of a pixel in one embodiment of the liquid crystal display device of the present invention.

FIG. 8 is a sectional view of a pixel in one embodiment of the liquid crystal display device of the present invention.

FIG. 9 is a sectional view of a pixel of an embodiment of the liquid crystal display device of the present invention.

FIG. 10 is a plan view of a pixel in one embodiment of the liquid crystal display device of the present invention.

[Explanation of symbols]

AS: semiconductor film, SUB1: first glass substrate, SUB
2: second glass substrate, SD1: drain electrode, SD2
... Source electrode, GL ... Gate wiring, DL ... Drain wiring, CL ... Common electrode wiring, CT ... Common electrode, TFT ... Thin film transistor, GI ... Gate insulating film, PSV ... Protective film, PX ... Pixel electrode, FIL ... Color filter layer , LC
... Liquid crystal layer, ORI ... Orientation film, OC ... Overcoat film, B
M: light shielding film, POL: polarizing plate.

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme court ゛ (Reference) G09F 9/00 338 G09F 9/00 338 342 342Z 9/30 330 9/30 330Z 338 338 349 349B 349C 9 / 35 9/35 (72) Inventor Ryutaro Oke 3300 Hayano, Mobara City, Chiba Prefecture, Japan Hitachi Display Co., Ltd. (72) Inventor Yoshiaki Nakayoshi 3300 Hayano, Mobara City, Chiba Prefecture Hitachi, Ltd. Display Group (72) Invention Person Eiji Kurahashi 3300 Hayano, Mobara-shi, Chiba F-term in the Display Group, Hitachi, Ltd. EA04 EA07 ED03 ED15 5 G435 AA01 CC09 CC12 FF13 GG12

Claims (43)

[Claims] A first liquid crystal layer sandwiched between the first and second substrates, wherein the first substrate has a plurality of video signal lines and a plurality of scanning lines. A signal line, and a plurality of pixel regions formed as a region surrounded by the video signal line and the scanning signal line, each pixel region having at least one active element and a pixel electrode; In a liquid crystal display device having a color filter layer between the liquid crystal layers, a boundary of a color filter of a pixel adjacent in a scanning signal line extending direction is positioned on the video signal line,
A liquid crystal display device, wherein a light-blocking layer is formed between the color filter and the liquid crystal layer so as to overlap the boundary portion and the video signal line. 2. An organic flattening film is formed between the light shielding layer and the color filter.
The liquid crystal display device as described in the above. 3. The liquid crystal display device according to claim 1, wherein a common electrode and a common signal line serving also as the common electrode are provided on the color filter on the substrate on which the color filter is formed. 4. The liquid crystal display device according to claim 2, wherein a common electrode and a common signal line serving also as the common electrode are provided on the organic flattening film of the substrate on which the color filter is formed. . 5. A common electrode and a common signal line serving also as a common electrode are provided between the color filter and the liquid crystal layer on the substrate on which the color filter is formed, and the common signal line also serves as the light shielding layer. The liquid crystal display device according to any one of claims 1 to 4, wherein: 6. The liquid crystal display device according to claim 1, wherein said common signal line covers said light shielding layer on said video signal line. 7. A semiconductor device comprising: first and second transparent substrates; and a liquid crystal layer sandwiched between the first and second substrates, wherein the first substrate has a plurality of video signal lines and a plurality of scanning lines. Signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines, each pixel region has at least one active element, a pixel electrode and a common electrode, In a liquid crystal display device having a color filter between the pixel electrode and the liquid crystal layer, the common electrode is formed above the color filter, the pixel electrode is formed below the color filter, and the color filter is A liquid crystal display device, wherein the liquid crystal display device overlaps at least the entire surface of the pixel electrode in a pixel region. 8. An organic flattening film is formed between the color filter and the common electrode.
7. The liquid crystal display device according to 7. 9. The liquid crystal display device according to claim 7, wherein the pixel electrode is planar, and the common electrode has a linear region. 10. The liquid crystal display device according to claim 7, wherein a part of the common electrode is arranged so as to overlap the video signal line, and also serves as a common signal line. 11. The liquid crystal display device according to claim 7, wherein a part of the common electrode is arranged so as to overlap with the scanning signal line, and also serves as a common signal line. 12. The liquid crystal according to claim 7, wherein a part of the common electrode is disposed so as to overlap with the scanning signal line and the video signal line, and also serves as a common signal line. Display device. 13. The liquid crystal display device according to claim 10, wherein a common signal line shared by the common electrode has at least an end face overlapping the pixel electrode. 14. The liquid crystal display device according to claim 10, wherein the common signal line serving also as the common electrode is a transparent conductor, and has at least a light shielding layer on the active element. 15. The liquid crystal display device according to claim 10, wherein a common signal line serving as said common electrode is made of metal. 16. The liquid crystal display device according to claim 7, wherein said pixel electrode is a transparent electrode. 17. A semiconductor device comprising: a first and a second transparent substrate; and a liquid crystal layer sandwiched between the first and the second substrate, wherein the first substrate has a plurality of video signal lines and a plurality of scans. Signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines, each pixel region has at least one active element, a pixel electrode and a common electrode, In a liquid crystal display device having a color filter between the pixel electrode and the liquid crystal layer, the common electrode and the pixel electrode are formed below the color filter layer, and the color filter is at least the pixel electrode and the pixel electrode in the pixel region. A liquid crystal display device, wherein the liquid crystal display device overlaps the entire surface of a common electrode. 18. The liquid crystal display device according to claim 17, wherein said common electrode is a transparent conductor, and is formed below said pixel electrode via at least a gate insulating film. 19. The liquid crystal display device according to claim 17, wherein said common electrode is planar, and said pixel electrode has a linear region. 20. The semiconductor device according to claim 17, further comprising a common signal line disposed in the same layer as and separated from the scanning signal line, wherein the common signal line has an overlapping region with the common electrode.
10. The liquid crystal display device according to any one of 9. 21. A boundary of the color filter of a pixel adjacent in a direction in which the scanning signal line extends is positioned on the video signal line, and the color filter is superimposed on the boundary portion and the video signal line. 21. The liquid crystal display device according to claim 17, wherein a light shielding layer is formed between the liquid crystal layer and the liquid crystal layer. 22. A semiconductor device comprising: a first and a second transparent substrate; and a liquid crystal layer sandwiched between the first and the second substrates.
Having a common electrode formed on at least one of the substrates,
The first substrate has a plurality of video signal lines, a plurality of scanning signal lines, and a plurality of pixel regions formed as a region surrounded by the video signal lines and the scanning signal lines, and each pixel region is at least Having one active element and a pixel electrode,
In a liquid crystal display device having a color filter layer between the pixel electrode and the liquid crystal layer, the color filter is formed between the pixel electrode and the common electrode, and a driving electric field of the liquid crystal layer is applied to the pixel electrode and the common electrode. A liquid crystal display device formed between common electrodes by a path passing through both the liquid crystal layer and the color filter. 23. The pixel according to claim 23, wherein the common electrode is formed between the color filter and the liquid crystal layer, and the common electrode has a linear region and a region superimposed on the video signal line. 23. The liquid crystal display device according to claim 22, wherein an electrode is formed below the color filter, and the pixel electrode is in contact with the color filter. 24. The liquid crystal display device according to claim 23, wherein said pixel electrode and said color filter are in contact with each other. 25. A boundary of a color filter between pixels adjacent to each other in the scanning signal line extending direction is positioned on the video signal line, and the adjacent color filters overlap at the boundary portion, and An organic planarizing film is formed on the substrate.
5. The liquid crystal display device according to any one of 4. 26. A boundary of a color filter between pixels adjacent to each other in the scanning signal line extending direction is positioned on the video signal line, and the adjacent color filters are made of an insulating organic transparent film at the boundary. 25. The liquid crystal display device according to claim 22, wherein the liquid crystal display device is spaced apart. 27. The color filter, wherein the color filter is formed integrally between adjacent pixels in the direction in which the video signal line extends, and an inorganic insulating film is formed between the active element and the color filter. The liquid crystal display device according to any one of claims 22 to 24 and 26. 28. A boundary of the color filter between pixels adjacent in the extending direction of the video signal line is positioned on the scanning signal line, and the adjacent color filters are insulative organic transparent at the boundary. The liquid crystal display device according to any one of claims 22 to 24 and 26, wherein the liquid crystal display device is separated by a film. 29. The liquid crystal display device according to claim 22, wherein an organic flattening film is formed on said color filter. 30. The liquid crystal display device according to claim 22, wherein said color filter has conductivity. 31. A method in which the resistivity as an index of conductivity is 1
4. The resistance value is equal to or less than 0 to the 14th power Ωcm.
0 liquid crystal display device. 32. A method in which the resistivity as an index of conductivity is 1
4. The resistance value is not more than 0 to the 10th power Ωcm.
0 liquid crystal display device. 33. The liquid crystal display device according to claim 22, wherein said color filter contains an ionic component. 34. A semiconductor device comprising: a first and a second transparent substrate; and a liquid crystal layer sandwiched between the first and the second substrates, wherein the first substrate has a plurality of video signal lines and a plurality of scans. A liquid crystal display having a signal line and a pixel region formed as a region surrounded by each signal line adjacent to the video signal line and the scanning signal line, each pixel region having at least one active element and a pixel electrode A liquid crystal display device, comprising: a light shielding layer and a common electrode laminated on the video signal line via an insulating film; the light shielding layer is made of metal; and the common electrode is made of a transparent conductor. . 35. The liquid crystal display device according to claim 34, wherein a portion of the common electrode on the video signal line is wider than the light shielding layer. 36. The liquid crystal display device according to claim 34, wherein said common electrode is laminated on said light shielding layer. 37. The liquid crystal display device according to claim 34, wherein said common electrode is laminated below said light shielding layer. 38. The light emitting device according to claim 38, wherein the common electrode overlaps the light shielding layer on the video signal line, and the common electrode does not overlap the light shielding layer in a display area between the video signal lines. 38. The liquid crystal display device according to any one of 34 to 37. 39. The liquid crystal display device according to claim 34, wherein said pixel electrode has a comb shape. 40. The pixel electrode according to claim 3, wherein the pixel electrode has a comb shape and is formed below the insulating film.
39. The liquid crystal display device according to any one of items 4 to 38. 41. The liquid crystal display device according to claim 34, wherein said insulating film is a color filter and has a boundary portion positioned on said video signal line. 42. A liquid crystal display device according to claim 34, wherein said insulating film is an organic film. 43. The liquid crystal display device according to claim 34, wherein said light shielding layer is also formed on said scanning signal line.