JP2002289722A - Package for semiconductor and its manufacturing method - Google Patents

Package for semiconductor and its manufacturing method

Info

Publication number
JP2002289722A
JP2002289722A JP2001090339A JP2001090339A JP2002289722A JP 2002289722 A JP2002289722 A JP 2002289722A JP 2001090339 A JP2001090339 A JP 2001090339A JP 2001090339 A JP2001090339 A JP 2001090339A JP 2002289722 A JP2002289722 A JP 2002289722A
Authority
JP
Japan
Prior art keywords
frame
semiconductor package
heat sink
alloy
mounting hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001090339A
Other languages
Japanese (ja)
Inventor
Keiji Narushige
恵二 成重
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal SMI Electronics Device Inc
Original Assignee
Sumitomo Metal SMI Electronics Device Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal SMI Electronics Device Inc filed Critical Sumitomo Metal SMI Electronics Device Inc
Priority to JP2001090339A priority Critical patent/JP2002289722A/en
Publication of JP2002289722A publication Critical patent/JP2002289722A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Semiconductor Lasers (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a package for a semiconductor using a heat sink that has no defect and can be stably supplied and is inexpensive, and to provide its manufacturing method. SOLUTION: By bonding a frame 11 consisting of metal or ceramic to the heat sink 12 that consists of an Fe-Ni-Co alloy or an Fe-Ni alloy and is partially provided with installation holes 13 and where the installation holes 13 and the contour are formed with a punching die, a cavity part 15 for accommodating the semiconductor element is formed inside the frame 11.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、光通信用や高周波
用の半導体素子を収容するためのキャビティ底部となる
放熱板を備える半導体用パッケージ及びその製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor package provided with a heat sink serving as a bottom of a cavity for accommodating a semiconductor element for optical communication or high frequency, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】光通信用や高周波用の半導体素子を収容
するための半導体用パッケージには、本体がセラミック
製や金属製のもの、外部接続端子の接合形状がデュアル
インライン(Dual in Line)型やバタフラ
イ(Butterfly)型のパッケージ等がある。例
えば、図3に示すように、枠体が金属製でバタフライ型
の光通信用の半導体用パッケージ50は、放熱性に優れ
た銅タングステン等の金属部材からなる放熱板51と、
セラミックと熱膨張係数が近似するコバール等の金属部
材からなる枠体52を接合して、内部に半導体素子を搭
載するためのキャビティ部53を形成している。この枠
体52の一側面部には、貫通孔を穿設し、貫通孔を介し
てキャビティ部53に光信号を通すための空洞部を有す
るコバール等の金属材からなる金属製固定部材54を貫
通孔位置にろう付け接合している。また、枠体52の他
の側面部には対向して、窓枠状の孔を穿設し、アルミナ
(Al 23 )等のセラミック材からなるフィードスル
ー基板55を、窓枠状の孔に当接する部分にメタライズ
パターンを形成してろう付け接合している。このフィー
ドスルー基板55は、キャビティ部53側から枠体52
の外側にかけて導通して形成される導体配線パターン5
6を備え、外側部分の導体配線パターン56に外部から
の電気的接続をするためのコバール等の金属部材からな
る外部接続端子57をバタフライ型にろう付け接合して
いる。
2. Description of the Related Art Semiconductor devices for optical communication and high frequency are housed.
The semiconductor package used for
And metal, and the external connection terminal has a dual joint shape
In-line (Dual in Line) type and butterfly
There is a Butterfly type package and the like. An example
For example, as shown in FIG. 3, the frame is made of metal and a butterfly type
Of the semiconductor package 50 for optical communication is excellent in heat dissipation.
A heat sink 51 made of a metal member such as copper tungsten,
Metal parts such as Kovar that have similar thermal expansion coefficients to ceramic
The frame 52 made of a material is joined and a semiconductor element is mounted inside.
A cavity 53 for mounting is formed. This frame
A through hole is formed in one side surface of the body 52, and through the through hole.
Has a cavity for passing an optical signal through the cavity 53
Through a metal fixing member 54 made of a metal material such as Kovar.
It is brazed to the through hole position. In addition, other than the frame 52
A window frame-like hole is formed on the side of
(Al Two OThree ) Etc.
-Metallize the substrate 55 in the part that contacts the window frame-shaped hole
A pattern is formed and brazed. This fee
The through-hole board 55 is connected to the frame 52 from the cavity 53 side.
Conductor pattern 5 formed to be conductive to the outside of
6 on the outer side conductor wiring pattern 56 from outside.
Metal parts such as Kovar for electrical connection of
The external connection terminal 57 is brazed and joined in a butterfly shape.
I have.

【0003】この半導体用パッケージ50には、キャビ
ティ部53に光通信用の半導体素子を装着し、半導体素
子とキャビティ部53側の導体配線パターン56とをボ
ンディングワイヤ等で接続することで外部接続端子57
と導通状態とする。また、光ファイバー部材を金属製固
定部材54に、YAG等のレーザーを使用して溶接した
後、枠体52の上面に金属やセラミック等からなる蓋体
58をガラス、ろう材、樹脂等からなる封止材で接合す
ることで光半導体装置が形成され、取付け用孔59を介
してねじで外部の固定部材にねじ止めされる。
In the semiconductor package 50, a semiconductor element for optical communication is mounted in the cavity 53, and the semiconductor element and the conductor wiring pattern 56 on the cavity 53 are connected by a bonding wire or the like, so that external connection terminals are provided. 57
And a conduction state. After welding the optical fiber member to the metal fixing member 54 using a laser such as YAG, a lid 58 made of metal, ceramic, or the like is sealed on the upper surface of the frame 52 with glass, brazing material, resin, or the like. The optical semiconductor device is formed by joining with a stopper, and is screwed to an external fixing member with a screw through the mounting hole 59.

【0004】通常、光通信用や高周波用の半導体用パッ
ケージの放熱板には、Cu−W(ポーラス状のタングス
テンに銅を含浸させたもの)、CMC(Cu−Mo−C
uの接合板)等の高放熱特性を有する部材以外に、KV
(Fe−Ni−Co系合金、商品名「Kovar」)、
42アロイ(Ni−Fe合金)等の熱膨張係数がセラミ
ックに近似し、放熱特性の優れた金属板が用いられてい
る。そして、KVや42アロイからなる放熱板は、通
常、板状部材にドリル等で取付け用孔を穿設し、ダイシ
ングソーやワイヤソー等で外形を切削して形成してい
る。
[0004] Usually, Cu-W (porous tungsten impregnated with copper), CMC (Cu-Mo-C) are used as heat sinks of semiconductor packages for optical communication and high frequency.
u bonding plate), KV
(Fe-Ni-Co alloy, trade name "Kovar"),
A metal plate having a thermal expansion coefficient similar to that of a 42 alloy (Ni—Fe alloy) or the like and having excellent heat radiation characteristics is used. The heat radiating plate made of KV or 42 alloy is usually formed by drilling a mounting hole with a drill or the like in a plate-like member and cutting the outer shape with a dicing saw or a wire saw.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、前述し
たような従来の半導体用パッケージ及びその製造方法
は、次のような問題がある。 (1)KVや42アロイからなる放熱板は、通常、取付
け用孔をドリル等で穿孔し、外形を切削して製造してい
るので、製造工期が長く掛かっている。また、加工費用
が高く掛かるために製造コストが高い。 (2)切削は、通常、湿式状態で行われるので、切削後
に洗浄、乾燥が必要になり、更に工期が長くなり、コス
トも高くなる。 (3)KVや42アロイからなる放熱板は、打ち抜き金
型で一度に打ち抜くと、板厚みが厚く、しかも外側端か
ら取付け用孔までの距離が僅かしかないので、亀裂やク
ラック等の欠陥が発生する。 本発明は、かかる事情に鑑みてなされたものであって、
欠陥がなく、安定供給でき、安価である放熱板を用いた
半導体用パッケージ及びその製造方法を提供することを
目的とする。
However, the conventional semiconductor package and the method of manufacturing the same as described above have the following problems. (1) The heat sink made of KV or 42 alloy is usually manufactured by drilling the mounting holes and cutting the outer shape, so that the manufacturing period is long. Further, the manufacturing cost is high because the processing cost is high. (2) Since cutting is usually performed in a wet state, cleaning and drying are required after cutting, and the work period is prolonged and the cost is increased. (3) When a heat sink made of KV or 42 alloy is punched at once with a punching die, the thickness of the plate is large, and the distance from the outer end to the mounting hole is small, so that defects such as cracks and cracks are generated. appear. The present invention has been made in view of such circumstances,
An object of the present invention is to provide a semiconductor package using a heat sink that is inexpensive, can be supplied stably and is inexpensive, and a method for manufacturing the same.

【0006】[0006]

【課題を解決するための手段】前記目的に沿う本発明に
係る半導体用パッケージは、金属又はセラミックからな
る枠体と、Fe−Ni−Co系合金又はFe−Ni合金
からなり、一部には取付け用孔を備え、取付け用孔とそ
の外形は打ち抜き金型で形成された放熱板とを接合し
て、半導体素子収容のためのキャビティ部が枠体の内側
に形成される。これにより、安価で製造工期が短く亀裂
やクラック等の欠陥のない放熱板を備えた光通信用パッ
ケージを得ることができる。
According to the present invention, there is provided a semiconductor package according to the present invention, comprising a frame made of metal or ceramic, and an Fe-Ni-Co alloy or an Fe-Ni alloy. A mounting hole is provided, and the mounting hole and its outer shape are joined to a heat sink formed by a punching die, so that a cavity for accommodating a semiconductor element is formed inside the frame. This makes it possible to obtain an optical communication package including a heat sink that is inexpensive, has a short manufacturing period, and is free from defects such as cracks and cracks.

【0007】前記目的に沿う本発明に係る半導体用パッ
ケージの製造方法は、金属又はセラミックからなる枠体
と、Fe−Ni−Co系合金又はFe−Ni合金からな
る放熱板を接合し、枠体の内側に半導体素子を収容可能
なキャビティ部を形成する半導体用パッケージの製造方
法において、放熱板の外形寸法より大きい板状部材の一
部に取付け用孔をピン型で打ち抜き、次に、その外形を
打ち抜き金型で打ち抜いて放熱板を製作する。これによ
り、安価で製造工期が短く亀裂やクラック等の欠陥のな
い放熱板を製作できる。
A method of manufacturing a semiconductor package according to the present invention, which meets the above object, comprises joining a frame made of metal or ceramic and a heat radiating plate made of an Fe—Ni—Co alloy or an Fe—Ni alloy to form the frame. In a method for manufacturing a semiconductor package in which a cavity portion capable of accommodating a semiconductor element is formed inside a heat sink, a mounting hole is punched out with a pin type in a part of a plate-like member larger than an outer dimension of a heat sink. Is punched out with a punching die to produce a heat sink. This makes it possible to manufacture a heat sink that is inexpensive, has a short manufacturing period, and is free from defects such as cracks and cracks.

【0008】ここで、取付け用孔をピン型で打ち抜いた
後、打ち抜き後の取付け用孔にピン型を挿入した状態
で、放熱板の外形を打ち抜き金型で打ち抜くのがよい。
これにより、放熱板の取付け用孔と外側端との間の距離
が僅かしかないときでも亀裂やクラック等の欠陥のない
放熱板を製作できる。
Here, it is preferable that after the mounting hole is punched out with a pin type, the outer shape of the heat sink is punched out with a punching die in a state where the pin type is inserted into the mounting hole after the punching.
Thus, even when the distance between the mounting hole of the heat sink and the outer end is small, a heat sink without defects such as cracks and cracks can be manufactured.

【0009】[0009]

【発明の実施の形態】続いて、添付した図面を参照しつ
つ、本発明を具体化した実施の形態について説明し、本
発明の理解に供する。ここに、図1(A)、(B)はそ
れぞれ本発明の一実施の形態に係る半導体用パッケージ
の平面図、断面図、図2は本発明の他の実施の形態に係
る半導体用パッケージの斜視図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention will be described with reference to the accompanying drawings to provide an understanding of the present invention. Here, FIGS. 1A and 1B are a plan view and a cross-sectional view of a semiconductor package according to one embodiment of the present invention, and FIG. 2 is a view of a semiconductor package according to another embodiment of the present invention. It is a perspective view.

【0010】図1(A)、(B)に示すように、本発明
の一実施の形態に係る半導体用パッケージ10は、平面
視して長方形状で、長手方向の両端部に取付け用孔13
を備え、Fe−Ni−Co系合金、例えばKV(コバー
ル)、又はFe−Ni合金、例えば42アロイからなる
放熱板12と、金属製の枠体11とをろう付け接合し
て、枠体11の内部に光通信用の半導体素子を搭載する
ためのキャビティ部15が形成されている。放熱板12
は、取付け用孔13とその外形が打ち抜き金型で打ち抜
いて形成され、放熱板12の長手方向外側端14と取付
け用孔13の外周縁間の最短距離は、放熱板12の厚み
の40%以上ある。これにより放熱板12に、打ち抜き
による亀裂やクラック等の欠陥を発生させることがな
い。
As shown in FIGS. 1A and 1B, a semiconductor package 10 according to an embodiment of the present invention has a rectangular shape in plan view, and has mounting holes 13 at both ends in the longitudinal direction.
And a heat radiating plate 12 made of an Fe—Ni—Co alloy, for example, KV (Kovar) or an Fe—Ni alloy, for example, 42 alloy, and a metal frame 11 are brazed and joined. A cavity 15 for mounting a semiconductor element for optical communication is formed in the inside. Heat sink 12
The mounting hole 13 and its outer shape are formed by punching with a punching die. The shortest distance between the longitudinal outer end 14 of the heat sink 12 and the outer peripheral edge of the mounting hole 13 is 40% of the thickness of the heat sink 12. That's it. Thereby, defects such as cracks and cracks due to punching do not occur in the heat sink 12.

【0011】この半導体用パッケージ10の枠体11の
対向する側面部には、キャビティ部15に連通する窓枠
状孔16が設けられ、窓枠状孔16の内周壁面にはセラ
ミックからなるフィードスルー基板17をろう付け接合
している。フィードスルー基板17は、枠体11の外側
で外部接続端子となるリードフレーム18をバタフライ
型にろう付け接合し、キャビティ部15側で半導体素子
をワイヤボンディング等で接続するための導体パターン
19を備えている。フィードスルー基板17が接合され
ていない枠体11の一側面部には、キャビティ部15に
連通する貫通孔20が形成され、この貫通孔20には、
光ファイバーの先端と対向させるための光軸を合わせた
金属製固定部材21が挿入され接合されている。
A window frame-like hole 16 communicating with the cavity portion 15 is provided on a side surface of the frame 11 of the semiconductor package 10 opposite to the frame body 11, and a ceramic feed hole is formed on an inner peripheral wall surface of the window frame-like hole 16. The through substrate 17 is joined by brazing. The feed-through board 17 includes a conductor pattern 19 for brazing a lead frame 18 serving as an external connection terminal outside the frame body 11 into a butterfly shape, and connecting a semiconductor element by wire bonding or the like on the cavity 15 side. ing. A through-hole 20 communicating with the cavity 15 is formed in one side surface of the frame 11 to which the feed-through board 17 is not joined.
A metal fixing member 21 whose optical axis is aligned with the tip of the optical fiber is inserted and joined.

【0012】次いで、本発明の一実施の形態に係る半導
体用パッケージ10の製造方法を説明する。セラミック
と熱膨張係数が近似するKV、42アロイ等の金属塊を
切削したり、パイプ状を輪切りにしてから押し曲げて4
側面を備える枠状とし、更に、この4側面のうち相対向
する2側面にそれぞれキャビティ部15に連通する実質
的に矩形状からなる窓枠状孔16を形成し、窓枠状孔1
6が形成されていない2側面のうち一方にキャビティ部
15に連通する実質的に円形からなる貫通孔20を形成
して、枠体11を作る。
Next, a method of manufacturing the semiconductor package 10 according to one embodiment of the present invention will be described. Cutting metal lumps such as KV, 42 alloy, etc., whose thermal expansion coefficients are similar to those of ceramics, or cutting pipes into circular sections and pressing and bending them.
A substantially rectangular window frame-shaped hole 16 communicating with the cavity portion 15 is formed on each of two opposing side surfaces of the four side surfaces.
A substantially circular through-hole 20 communicating with the cavity 15 is formed on one of the two side surfaces on which the 6 is not formed, and the frame 11 is formed.

【0013】一方、半導体素子からの発熱を放熱するの
に優れるセラミックと熱膨張係数が近似するFe−Ni
−Co系合金、又はFe−Ni合金の金属板からなる放
熱板12を形成する。その形成工程は以下の通りであ
る。Fe−Ni−Co系合金、例えばKV(商品名「K
ovar」)又はFe−Ni合金、例えば42アロイか
らなり、例えば厚み約1.5mmの板状で、外形寸法が
約30mm×13mmの製品外形寸法より大きい板状部
材を準備する。次いで、この板状部材の長手方向両側部
に取付け用孔13を孔径に匹敵するピン径を備えるピン
型で打ち抜いて形成する。次いで、製品外形寸法に匹敵
する打ち抜き金型で外形を打ち抜いて放熱板12を製作
する。
On the other hand, a ceramic excellent in dissipating heat generated from a semiconductor element and a Fe—Ni alloy having a thermal expansion coefficient similar to that of a ceramic are used.
The heat radiating plate 12 made of a metal plate of a Co-based alloy or an Fe-Ni alloy is formed. The forming process is as follows. Fe-Ni-Co based alloy, for example, KV (trade name "K
ovar ") or a plate member made of an Fe-Ni alloy, for example, 42 alloy and having a thickness of, for example, about 1.5 mm and a larger outer dimension of about 30 mm × 13 mm. Next, mounting holes 13 are formed on both sides in the longitudinal direction of the plate-like member by punching with a pin type having a pin diameter equivalent to the hole diameter. Next, the heat sink 12 is manufactured by punching out the outer shape with a punching die comparable to the product outer size.

【0014】なお、放熱板12の取付け用孔13をピン
型で打ち抜いた後、ピン型は、打ち抜いた取付け用孔1
3に挿入した状態で、外形を打ち抜き金型で打ち抜いて
放熱板12を形成するするのが好ましい。これにより、
取付け用孔13が放熱板12の外側端14から僅かしか
離れていない場合(例えば、放熱板の厚みの40%以上
の距離があればよい)でも、取付け用孔13と外側端1
4との間に亀裂やクラック等の欠陥を発生させずに放熱
板12が形成できる。
After the mounting holes 13 of the heat sink 12 are punched out with a pin type, the pin type is
It is preferable to form the heat radiating plate 12 by punching the outer shape with a punching die in a state of being inserted into the heat sink 3. This allows
Even when the mounting hole 13 is slightly separated from the outer end 14 of the heat radiating plate 12 (for example, a distance of 40% or more of the thickness of the heat radiating plate is sufficient), the mounting hole 13 and the outer end 1 may be used.
The heat radiating plate 12 can be formed without generating a defect such as a crack or a crack between the radiating plate 12 and the heat radiating plate 12.

【0015】枠体11と放熱板12にはNiめっきを施
した後、接合部に例えば、Ag−Cuろう材等の高温ろ
う材を挟んで加熱し、ろう付け接合することで、内部に
光通信用のレーザーダイオード、発光ダイオード等の半
導体素子を搭載するためのキャビティ部15を形成す
る。
After the frame 11 and the radiator plate 12 are plated with Ni, a high-temperature brazing material such as an Ag-Cu brazing material is sandwiched between the joints, heated, and brazed to join the light to the inside. A cavity portion 15 for mounting a semiconductor device such as a communication laser diode or a light emitting diode is formed.

【0016】窓枠状孔16に接合されるフィードスルー
基板17は、絶縁体であるアルミナ等のセラミックを形
成する各セラミックグリーンシートにタングステンやモ
リブデン等の高融点金属で導体パターンを形成し、各セ
ラミックグリーンシートを積層した積層体を焼成して形
成する。このフィードスルー基板17に形成された導体
パターンの一つは、窓枠状孔16にフィードスルー基板
17を嵌め込んでろう付け接合するために、フィードス
ルー基板17の窓枠状孔16と当接する外周部に形成さ
れ、Niめっきを施した後Ag−Cuろう材等の高温ろ
う材を接合部に挟んで加熱し、ろう付け接合する。上記
以外の導体パターンは、枠体11の内側と外側の導通用
となる導体パターン19を形成する。そして、枠体11
の外側の導体パターン19には、外部接続端子となるリ
ードフレーム18をバタフライ型に当接し、Ag−Cu
ろう材等の高温ろう材でろう付け接合する。また、キャ
ビティ部15側の導体パターン19は、半導体素子をボ
ンディングワイヤ等で接続するために用いられる。な
お、上述のAg−Cuろう材等の高温ろう材でのろう付
け接合は、各接合部分を一度に合わせて加熱接合する場
合と、複数回に分けて加熱接合する場合がある。
The feed-through substrate 17 joined to the window frame-like hole 16 is formed by forming a conductor pattern on each ceramic green sheet forming a ceramic such as alumina as an insulator with a high melting point metal such as tungsten or molybdenum. A laminate formed by laminating ceramic green sheets is formed by firing. One of the conductor patterns formed on the feed-through board 17 is in contact with the window frame-shaped hole 16 of the feed-through board 17 in order to fit the feed-through board 17 into the window frame-shaped hole 16 and to perform brazing. After being formed on the outer peripheral portion and subjected to Ni plating, a high-temperature brazing material such as an Ag-Cu brazing material is sandwiched between the joints and heated to be brazed. The conductor pattern other than the above forms the conductor pattern 19 for conduction between the inside and the outside of the frame 11. And the frame 11
A lead frame 18 serving as an external connection terminal is abutted on the outer conductor pattern 19 in a butterfly shape.
Brazing with high-temperature brazing material such as brazing material. The conductor pattern 19 on the side of the cavity 15 is used for connecting the semiconductor element with a bonding wire or the like. In the case of brazing with a high-temperature brazing material such as the above-described Ag-Cu brazing material, there are cases in which the respective joints are heat-joined together at one time, and cases in which the heat-joining is performed a plurality of times.

【0017】そして、枠体11の貫通孔20に、光ファ
イバーの光軸を合わせる金属製固定部材21を挿入し、
枠体11との間に低温ろう材を介し、加熱してろう付け
接合することで光通信用の半導体用パッケージ10を製
造している。
Then, a metal fixing member 21 for aligning the optical axis of the optical fiber is inserted into the through hole 20 of the frame 11,
The semiconductor package 10 for optical communication is manufactured by heating and brazing with a low-temperature brazing material between the frame 11 and the frame body 11.

【0018】次に、本発明の他の実施の形態に係る半導
体用パッケージ10aについて説明する。図2に示すよ
うに、半導体用パッケージ10aは、リング状の枠体1
1aがセラミック製で、セラミックグリーンシートを積
層、焼成して製造したものである。平面視して長方形状
をし、長手方向の両端部に取付け用孔13を備えたFe
−Ni−Co系合金、例えばKV、又はFe−Ni合
金、例えば42アロイからなる放熱板12に、枠体11
aが裏面側に形成されたメタライズパターンを介してろ
う付けで接合され、内部に高周波用の半導体素子を搭載
するためのキャビティ部15aが形成されている。そし
て、放熱板12は、半導体用パッケージ10と同様に、
取付け用孔13とその外形を打ち抜き金型で打ち抜いて
形成されている。
Next, a semiconductor package 10a according to another embodiment of the present invention will be described. As shown in FIG. 2, the semiconductor package 10 a includes a ring-shaped frame 1.
1a is made of ceramic and is manufactured by laminating and firing ceramic green sheets. It has a rectangular shape in a plan view, and has mounting holes 13 at both ends in the longitudinal direction.
A heat sink 12 made of a Ni-Co alloy, for example, KV, or an Fe-Ni alloy, for example, 42 alloy;
a is joined by brazing via a metallized pattern formed on the back surface side, and a cavity portion 15a for mounting a high-frequency semiconductor element is formed inside. The heat radiating plate 12 is, like the semiconductor package 10,
The mounting hole 13 and its outer shape are formed by punching with a punching die.

【0019】この高周波用の半導体用パッケージ10a
のリング状のセラミック製の枠体11aには、表面側に
形成された導体パターン22を介して外部と接続するた
めのKVや42アロイ等から形成されるリード23がろ
う付け接合されている。放熱板12、枠体11a及びリ
ード23には、ろう付けされた後、金属表面にNiめっ
き、Auめっきが施され、キャビティ部15aに高周波
用の半導体素子が実装された後、樹脂等で気密封止され
る。
This high-frequency semiconductor package 10a
A lead 23 made of KV, 42 alloy, or the like for connecting to the outside via a conductor pattern 22 formed on the front surface side is brazed to the ring-shaped ceramic frame 11a. After the heat sink 12, the frame 11a, and the lead 23 are brazed, the metal surface is plated with Ni or Au, and after the high frequency semiconductor element is mounted in the cavity 15a, it is air-sealed with resin or the like. Hermetically sealed.

【0020】次いで、本発明の他の実施の形態に係る半
導体用パッケージ10aの製造方法を説明する。半導体
用パッケージ10aは、枠体11aがセラミック製で、
例えば、アルミナ等のセラミックグリーンシートを1
枚、又は複数枚を積層し、焼成して製造したものであ
る。セラミックグリーンシートは、アルミナ粉末にマグ
ネシア、シリカ、カルシア等の焼結助剤を適当量加えた
粉末に、ジオキシルフタレート等の可塑剤と、アクリル
樹脂等のバインダー及び、トルエン、キシレン、アルコ
ール類等の溶剤を加え、十分に混練し、脱泡して粘度2
000〜40000cpsのスラリーを作製し、ドクタ
ーブレード法等によって例えば、厚み0.25mmのロ
ール状のシートを形成し、適当なサイズにカットして矩
形状のシートから作製している。
Next, a method of manufacturing a semiconductor package 10a according to another embodiment of the present invention will be described. In the semiconductor package 10a, the frame 11a is made of ceramic,
For example, one ceramic green sheet such as alumina
It is manufactured by laminating or firing a plurality of sheets. The ceramic green sheet is obtained by adding an appropriate amount of a sintering aid such as magnesia, silica, and calcia to alumina powder, a plasticizer such as dioxyl phthalate, a binder such as an acrylic resin, and toluene, xylene, and alcohols. , And kneaded thoroughly, defoamed and had a viscosity of 2.
A slurry of 000 to 40000 cps is prepared, and a roll-shaped sheet having a thickness of, for example, 0.25 mm is formed by a doctor blade method or the like, and cut into an appropriate size to prepare a rectangular sheet.

【0021】次に、タングステンやモリブデン等の高融
点金属を用いてセラミックグリーンシートの表面に導体
パターン22をスクリーン印刷し、リング状に打ち抜い
てキャビティ部15aを得るための空間を形成し、約1
550℃の還元雰囲気中で焼成して枠体11a形成す
る。また、リング状のセラミック製の枠体11aの必要
な高さを得るために、複数枚のセラミックグリーンシー
トを積層して形成する場合がある。なお、セラミックの
材質は、特に限定されるものではなく、アルミナ、窒化
アルミニウム、低温焼成ガラスセラミック等のセラミッ
クが使用できる。この枠体11aには、裏面側の放熱板
12と接する面にも導体パターンを施し、高温ろう材、
例えばAg−Cuろう材で放熱板12に接合する。ま
た、表面側に形成した導体パターン22には、例えばA
g−Cuろう材でリード23を接合する。なお、この高
周波用の半導体素子が実装される半導体用パッケージ1
0aに用いられる放熱板12は、前記実施の形態に係る
半導体用パッケージ10の放熱板12の形成方法と同様
の方法で製造される。
Next, a conductor pattern 22 is screen-printed on the surface of the ceramic green sheet using a refractory metal such as tungsten or molybdenum, and punched into a ring to form a space for obtaining the cavity 15a.
The frame 11a is formed by firing in a reducing atmosphere at 550 ° C. Further, in order to obtain the required height of the ring-shaped ceramic frame 11a, a plurality of ceramic green sheets may be formed by lamination. The material of the ceramic is not particularly limited, and ceramics such as alumina, aluminum nitride, and low-temperature fired glass ceramic can be used. This frame 11a is also provided with a conductor pattern on the back surface thereof in contact with the heat radiating plate 12, so that a high-temperature brazing material,
For example, it is joined to the heat sink 12 with an Ag-Cu brazing material. Also, the conductor pattern 22 formed on the front surface side has, for example, A
The lead 23 is joined with a g-Cu brazing material. The semiconductor package 1 on which the high-frequency semiconductor element is mounted.
The heat radiating plate 12 used for Oa is manufactured by the same method as the method of forming the heat radiating plate 12 of the semiconductor package 10 according to the above embodiment.

【0022】[0022]

【発明の効果】請求項1記載の半導体用パッケージは、
取付け用孔とその外形を打ち抜き金型で打ち抜かれた放
熱板を有するので、安価で製造工期が短く亀裂やクラッ
ク等の欠陥のない放熱板を備えた光通信用の半導体用パ
ッケージを得ることができる。
According to the first aspect of the present invention, there is provided a semiconductor package.
Since it has a mounting hole and a radiator plate whose outer shape is punched by a punching die, it is possible to obtain a semiconductor package for optical communication having a radiator plate that is inexpensive, has a short production period, and has no defects such as cracks and cracks. it can.

【0023】請求項2及び3記載の半導体用パッケージ
の製造方法は、放熱板の外形寸法より大きい板状部材の
一部に取付け用孔をピン型で打ち抜き、次に、その外形
を打ち抜き金型で打ち抜いて放熱板を製作するので、安
価で製造工期が短く亀裂やクラック等の欠陥のない放熱
板を有する半導体用パッケージを製造できる。
According to a second aspect of the present invention, there is provided a method of manufacturing a semiconductor package, wherein a mounting hole is punched in a part of a plate-like member larger than the outer size of the heat sink with a pin type, and then the outer shape is punched. Since the heat sink is manufactured by punching, a semiconductor package having a heat sink that is inexpensive, has a short manufacturing period, and is free from defects such as cracks and cracks can be manufactured.

【0024】特に、請求項3記載の半導体用パッケージ
の製造方法は、取付け用孔をピン型で打ち抜いた後、打
ち抜き後の取付け用孔にピン型を挿入した状態で、放熱
板の外形を打ち抜き金型で打ち抜くので、放熱板の取付
け用孔と外側端との間の距離が僅かしかないときでも亀
裂やクラック等の欠陥のない放熱板を製作できる。
According to a third aspect of the present invention, in the method of manufacturing a semiconductor package, the outer shape of the heat radiating plate is punched out after the mounting hole is punched with a pin type and the pin type is inserted into the mounting hole after the punching. Since the die is punched out, a heat sink having no defects such as cracks and cracks can be manufactured even when the distance between the mounting hole of the heat sink and the outer end is small.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)、(B)はそれぞれ本発明の一実施の形
態に係る半導体用パッケージの平面図、断面図である。
FIGS. 1A and 1B are a plan view and a cross-sectional view, respectively, of a semiconductor package according to an embodiment of the present invention.

【図2】本発明の他の実施の形態に係る半導体用パッケ
ージの斜視図である。
FIG. 2 is a perspective view of a semiconductor package according to another embodiment of the present invention.

【図3】従来例に係る半導体用パッケージの斜視図であ
る。
FIG. 3 is a perspective view of a semiconductor package according to a conventional example.

【符号の説明】[Explanation of symbols]

10、10a:半導体用パッケージ、11、11a:枠
体、12:放熱板、13:取付け用孔、14:外側端、
15、15a:キャビティ部、16:窓枠状孔、17:
フィードスルー基板、18:リードフレーム、19、2
2:導体パターン、20:貫通孔、21:金属製固定部
材、23:リード
10, 10a: semiconductor package, 11, 11a: frame, 12: heat sink, 13: mounting hole, 14: outer end,
15, 15a: cavity portion, 16: window frame-like hole, 17:
Feedthrough board, 18: lead frame, 19, 2
2: conductor pattern, 20: through hole, 21: metal fixing member, 23: lead

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 金属又はセラミックからなる枠体と、F
e−Ni−Co系合金又はFe−Ni合金からなり、一
部には取付け用孔を備え、該取付け用孔とその外形は打
ち抜き金型で形成された放熱板とを接合して、半導体素
子収容のためのキャビティ部が前記枠体の内側に形成さ
れたことを特徴とする半導体用パッケージ。
1. A frame made of metal or ceramic;
e-Ni-Co-based alloy or Fe-Ni alloy, a part of which is provided with a mounting hole, and the mounting hole is joined to a heat sink formed by a punching die to form a semiconductor element. A semiconductor package, wherein a cavity portion for housing is formed inside the frame.
【請求項2】 金属又はセラミックからなる枠体と、F
e−Ni−Co系合金又はFe−Ni合金からなる放熱
板を接合し、前記枠体の内側に半導体素子を収容可能な
キャビティ部を形成する半導体用パッケージの製造方法
において、前記放熱板の外形寸法より大きい板状部材の
一部に取付け用孔をピン型で打ち抜き、次に、その外形
を打ち抜き金型で打ち抜いて前記放熱板を製作すること
を特徴とする半導体用パッケージの製造方法。
2. A frame made of metal or ceramic;
A method of manufacturing a semiconductor package, comprising joining a heat radiating plate made of an e-Ni-Co-based alloy or an Fe-Ni alloy to form a cavity capable of accommodating a semiconductor element inside the frame body. A method for manufacturing a semiconductor package, characterized in that a mounting hole is punched in a part of a plate-like member having a size larger than a dimension by a pin type, and then the outer shape is punched by a punching die to manufacture the heat sink.
【請求項3】 請求項2記載の半導体用パッケージの製
造方法において、前記取付け用孔を前記ピン型で打ち抜
いた後、打ち抜き後の前記取付け用孔に該ピン型を挿入
した状態で、前記放熱板の外形を前記打ち抜き金型で打
ち抜くことを特徴とする半導体用パッケージの製造方
法。
3. The method for manufacturing a semiconductor package according to claim 2, wherein after the mounting hole is punched out with the pin type, the heat radiation is performed in a state where the pin type is inserted into the mounting hole after punching. A method for manufacturing a semiconductor package, comprising punching an outer shape of a plate with the punching die.
JP2001090339A 2001-03-27 2001-03-27 Package for semiconductor and its manufacturing method Pending JP2002289722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001090339A JP2002289722A (en) 2001-03-27 2001-03-27 Package for semiconductor and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001090339A JP2002289722A (en) 2001-03-27 2001-03-27 Package for semiconductor and its manufacturing method

Publications (1)

Publication Number Publication Date
JP2002289722A true JP2002289722A (en) 2002-10-04

Family

ID=18945132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001090339A Pending JP2002289722A (en) 2001-03-27 2001-03-27 Package for semiconductor and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2002289722A (en)

Similar Documents

Publication Publication Date Title
JP2008135531A (en) Connection terminal, electronic component housing package using this, and electronic apparatus
JP2005150133A (en) Container for housing semiconductor element
JP2005159277A (en) Package for housing optical semiconductor device and optical semiconductor apparatus
JP2009283898A (en) Electronic part container, package for storing electronic part using the same and electronic device
JP5261104B2 (en) Circuit board and electronic device
JP2002289722A (en) Package for semiconductor and its manufacturing method
JP3984107B2 (en) Manufacturing method of high-frequency semiconductor element storage package
JP2002093931A (en) Ceramic package for high frequency
JP2002228891A (en) Package for optical communication and method for manufacturing the same
JP2002313973A (en) Package for optical communication
JP2002151612A (en) Package for optical communication and its manufacturing method
JP2004266188A (en) Package for semiconductor device, its manufacturing method and semiconductor device using it
JP6923474B2 (en) Semiconductor device packages and semiconductor devices
JP2003057497A (en) Package for optical communication
JP2003344722A (en) Package for optical communication and manufacturing method therefor
JP2003174108A (en) Package for optical communication and method of manufacturing the same
JP2005252121A (en) Package for storing semiconductor element and method for manufacturing the same
JP4404347B2 (en) Manufacturing method of semiconductor element storage package
JP2003318477A (en) Package for optical communication and its manufacturing method
JP2003197803A (en) Semiconductor package
JP4430477B2 (en) High heat dissipation type electronic component storage package
JP2003137592A (en) Translucent member and package for optical communication using the same
JP2002228884A (en) Package for optical communication
JP2002311303A (en) Package for optical communication
JP2009158537A (en) Package for housing semiconductor element