JP2002261013A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002261013A5 JP2002261013A5 JP2001360383A JP2001360383A JP2002261013A5 JP 2002261013 A5 JP2002261013 A5 JP 2002261013A5 JP 2001360383 A JP2001360383 A JP 2001360383A JP 2001360383 A JP2001360383 A JP 2001360383A JP 2002261013 A5 JP2002261013 A5 JP 2002261013A5
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- substrate
- reflector
- irradiating
- back side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 claims 31
- 238000000034 method Methods 0.000 claims 17
- 239000004065 semiconductor Substances 0.000 claims 16
- 230000001678 irradiating effect Effects 0.000 claims 12
- 238000004519 manufacturing process Methods 0.000 claims 9
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001360383A JP2002261013A (ja) | 2000-11-29 | 2001-11-27 | レーザ照射方法並びに半導体装置の作製方法 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000362036 | 2000-11-29 | ||
| JP2000-362036 | 2000-11-29 | ||
| JP2000-394977 | 2000-12-26 | ||
| JP2000394977 | 2000-12-26 | ||
| JP2001360383A JP2002261013A (ja) | 2000-11-29 | 2001-11-27 | レーザ照射方法並びに半導体装置の作製方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006309211A Division JP2007123910A (ja) | 2000-11-29 | 2006-11-15 | 薄膜トランジスタの作製方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002261013A JP2002261013A (ja) | 2002-09-13 |
| JP2002261013A5 true JP2002261013A5 (https=) | 2005-06-30 |
Family
ID=27345287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001360383A Withdrawn JP2002261013A (ja) | 2000-11-29 | 2001-11-27 | レーザ照射方法並びに半導体装置の作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002261013A (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4660074B2 (ja) * | 2003-05-26 | 2011-03-30 | 富士フイルム株式会社 | レーザアニール装置 |
| JP2005085817A (ja) * | 2003-09-04 | 2005-03-31 | Mitsubishi Electric Corp | 薄膜半導体装置およびその製造方法 |
| US7696031B2 (en) | 2004-06-14 | 2010-04-13 | Semiconductor Energy Laboratory Co., Ltd | Method for manufacturing semiconductor device |
| JP5411456B2 (ja) * | 2007-06-07 | 2014-02-12 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| KR20100105606A (ko) * | 2007-11-21 | 2010-09-29 | 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 | 에피택셜하게 텍스쳐화된 후막의 제조를 위한 시스템 및 방법 |
| FR2972447B1 (fr) * | 2011-03-08 | 2019-06-07 | Saint-Gobain Glass France | Procede d'obtention d'un substrat muni d'un revetement |
-
2001
- 2001-11-27 JP JP2001360383A patent/JP2002261013A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9636777B2 (en) | Laser micro/nano processing system and method | |
| US20160158886A1 (en) | Interferometric laser processing | |
| CN101368256A (zh) | 一种利用超短脉冲激光改变金属表面色泽的方法 | |
| JPH09321310A5 (https=) | ||
| WO2003017002A1 (en) | Composition for forming antireflective film for use in lithography | |
| JP2005072183A5 (https=) | ||
| MY160196A (en) | A method of cutting semiconductor substrate | |
| CN102320553A (zh) | 利用激光双光子直写技术制作微纳结构器件的方法 | |
| JP2003156667A5 (https=) | ||
| JP2002261013A5 (https=) | ||
| US10011104B2 (en) | Method for performing delamination of a polymer film | |
| MY134252A (en) | Method for forming a magnetic pattern in a magnetic recording medium, magnetic recording medium, magnetic recording device and photomask | |
| JP2009200480A5 (https=) | ||
| KR930001142A (ko) | 광학 판독 데이타 메모리에 정보를 메모리시키는 방법 | |
| JP2002289524A5 (https=) | ||
| HU231027B1 (hu) | Komplex mikrostruktúrák készítésére szolgáló új litográfiás eljárás a spektrummódosítás lehetőségével | |
| JP2009520376A5 (https=) | ||
| US8303291B2 (en) | Imprint template, nanoimprint device and nanostructuring method | |
| JP2005057222A5 (https=) | ||
| CA3026614C (en) | Method for performing delamination of a polymer film | |
| TW200504857A (en) | Method for fabricating semiconductor device and method for fabricating semiconductor substrate used in the semiconductor device | |
| JP2006100810A5 (https=) | ||
| JP2005328037A5 (https=) | ||
| JP2002025104A5 (https=) | ||
| JP2005286320A5 (https=) |