JP2002246539A - Manufacturing method for semiconductor device - Google Patents

Manufacturing method for semiconductor device

Info

Publication number
JP2002246539A
JP2002246539A JP2001042450A JP2001042450A JP2002246539A JP 2002246539 A JP2002246539 A JP 2002246539A JP 2001042450 A JP2001042450 A JP 2001042450A JP 2001042450 A JP2001042450 A JP 2001042450A JP 2002246539 A JP2002246539 A JP 2002246539A
Authority
JP
Japan
Prior art keywords
semiconductor chip
adhesive
semiconductor device
bonding
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001042450A
Other languages
Japanese (ja)
Inventor
Tomoko Tono
朋子 東野
Takafumi Nishida
隆文 西田
Masaru Yamada
勝 山田
Hiroshi Ono
浩 大野
Takeshi Kaneda
剛 金田
Masakuni Shibamoto
正訓 柴本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi Solutions Technology Ltd
Original Assignee
Hitachi Ltd
Hitachi ULSI Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi ULSI Systems Co Ltd filed Critical Hitachi Ltd
Priority to JP2001042450A priority Critical patent/JP2002246539A/en
Publication of JP2002246539A publication Critical patent/JP2002246539A/en
Withdrawn legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
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    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73215Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/922Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
    • H01L2224/9222Sequential connecting processes
    • H01L2224/92242Sequential connecting processes the first connecting process involving a layer connector
    • H01L2224/92247Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
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    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/0651Wire or wire-like electrical connections from device to substrate
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    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
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    • H01L2924/181Encapsulation

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To simplify material and manufacturing processes by using a surface protective resin also as an adhesive, and increase adhesiveness of the semiconductor chip. SOLUTION: The BGA type semiconductor device has a stacked structure made up of two laminated semiconductor chips 4 and 5. When the semiconductor chip 5 is laminated on the semiconductor chip 4, an adhesive in a paste-like state is applied on the surface of the semiconductor chip 4 having no surface protective resin and the like applied thereon. The adhesive 6 functions as an adhesive and also as pellet surface protection. In this case, the adhesive 6 is made of polyimide-, epoxy-, acryl- or their mixture-based material of either thermoplastic or heat hardening type. As a result, the resin material is saved and the manufacturing process can be simplified.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置におけ
る製造技術に関し、特に、スタックド構造の半導体装置
における信頼性の向上、ならびに製造コストの低減に適
用して有効な技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing technique for a semiconductor device, and more particularly to a technique effective for improving reliability of a stacked semiconductor device and reducing manufacturing costs.

【0002】[0002]

【従来の技術】本発明者が検討したところによれば、半
導体チップサイズとほぼ同じ程度の大きさのパッケージ
を、より高密度化する技術として、たとえば、2つの半
導体チップを積層した、いゆわるスタックドCSP(C
hip Size Package)構造の半導体装置
が知られている。
2. Description of the Related Art According to studies by the present inventor, as a technique for increasing the density of a package having a size substantially the same as the size of a semiconductor chip, for example, two semiconductor chips are stacked. Worst Stacked CSP (C
2. Description of the Related Art A semiconductor device having a chip size (Hip Size Package) structure is known.

【0003】この半導体装置は、2段に積層された半導
体チップがプリント配線基板の中央部に搭載されてお
り、下段の半導体チップは上段の半導体チップよりも大
きい形状となっている。
In this semiconductor device, semiconductor chips stacked in two stages are mounted at the center of a printed wiring board, and the lower semiconductor chip has a larger shape than the upper semiconductor chip.

【0004】また、下段の半導体チップと上段の半導体
チップとを接着する際には、該下段の半導体チップ表面
に、ペースト状、あるいはフィルム状の接着材を塗布
し、上段の半導体チップを重ね合わせて接着している。
When bonding the lower semiconductor chip and the upper semiconductor chip, a paste or film adhesive is applied to the surface of the lower semiconductor chip, and the upper semiconductor chip is laminated. Glued.

【0005】さらに、上段、下段の半導体チップの周辺
部近傍には、ボンディングパッドがそれぞれ形成されて
おり、それらボンディングパッドと該プリント配線基板
に形成された電極とがボンディングワイヤによって接続
された構成となっている。
Further, bonding pads are formed in the vicinity of the peripheral portions of the upper and lower semiconductor chips, respectively, and the bonding pads and the electrodes formed on the printed wiring board are connected by bonding wires. Has become.

【0006】なお、この種の半導体装置について詳しく
述べてある例としては、特開平11−204720号公
報があり、この文献には、CSP構造のスタックドパッ
ケージにおける半導体装置について記載されている。
Japanese Patent Application Laid-Open No. 11-204720 discloses an example of this type of semiconductor device in detail, which describes a semiconductor device in a stacked package having a CSP structure.

【0007】[0007]

【発明が解決しようとする課題】ところが、上記のよう
なスタックドパッケージの半導体集積回路装置では、次
のような問題点があることが本発明者により見い出され
た。
However, it has been found by the present inventors that the following problems occur in the semiconductor integrated circuit device of the stacked package as described above.

【0008】すなわち、半導体チップの表面には、キズ
防止、アルファ線対策などを目的としたポリイミド系樹
脂などの表面保護用樹脂が予め塗布されており、この表
面保護用樹脂と接着材とが重ね合わされる構造となるの
で、接着材に用いる樹脂材料の種類が制限されるととも
に、接着の信頼性が低下してしまう恐れがある。
That is, the surface of the semiconductor chip is coated in advance with a surface-protecting resin such as a polyimide resin for the purpose of preventing scratches and preventing alpha rays, and the surface-protecting resin and the adhesive are superposed. Therefore, the type of the resin material used for the adhesive is limited, and the reliability of the adhesive may be reduced.

【0009】また、保護用樹脂と接着材との2工程、お
よび2つの材料がそれぞれ必要となるのでコストが上昇
し、製造効率などが低下してしまうという問題がある。
[0009] Further, since two steps of a protective resin and an adhesive are required, and two materials are required, there is a problem that the cost is increased and the production efficiency is reduced.

【0010】さらに、下段の半導体チップにおける接着
用樹脂の塗布エリアにマージンがない場合には、接着材
のはみ出し、ブリーディングなどが懸念されるためにフ
ィルム状の接着材が主に用いられることになり、接着材
の形状や種類なども制限を受けるので、半導体装置の製
造コストが高くなってしまうという問題がある。
Further, when there is no margin in the application area of the adhesive resin in the lower semiconductor chip, a film-like adhesive is mainly used because there is a concern that the adhesive may overflow or bleed. In addition, since the shape and type of the adhesive are also restricted, there is a problem that the manufacturing cost of the semiconductor device is increased.

【0011】本発明の目的は、表面保護用樹脂と接着材
とを兼用することにより、材料、および製造工程を簡略
化し、かつ重ね合わせ接着される半導体チップの接着性
を大幅に向上することのできる半導体装置を提供するこ
とにある。
An object of the present invention is to use a resin for surface protection and an adhesive so as to simplify the material and the manufacturing process, and to greatly improve the adhesiveness of the semiconductor chips to be superposed and adhered. It is an object of the present invention to provide a possible semiconductor device.

【0012】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。
The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.

【0013】[0013]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
以下のとおりである。
SUMMARY OF THE INVENTION Among the inventions disclosed in the present application, the outline of a representative one will be briefly described.
It is as follows.

【0014】すなわち、本発明の半導体装置の製造方法
は、外周部近傍に形成され、内部回路と内部配線を介し
て接続された第1電極が設けられ、保護材による表面保
護が施されていない第1の半導体チップを準備する工程
と、周辺部近傍に形成され、内部回路と内部配線を介し
て接続された第2電極が設けられた第2の半導体チップ
を準備する工程と、該第1の半導体チップを搭載するプ
リント配線基板を準備する工程と、該第1の半導体チッ
プを前記プリント配線基板に搭載し、接着材を介して接
着固定する工程と、該第1の半導体チップの表面に表面
保護と接着とを兼ねた接着保護用樹脂を塗布し、該接着
保護用樹脂を介して第2の半導体チップを積層し、接着
固定する工程と、第1の半導体チップの第1電極、およ
び第2の半導体チップの第2電極とプリント配線基板に
形成されたボンディング電極とを第1、第2ワイヤによ
ってそれぞれ接続する工程とを有したものである。
That is, in the method of manufacturing a semiconductor device according to the present invention, a first electrode formed near an outer peripheral portion and connected to an internal circuit via an internal wiring is provided, and the surface is not protected by a protective material. A step of preparing a first semiconductor chip; a step of preparing a second semiconductor chip provided near a peripheral portion and provided with a second electrode connected to an internal circuit via an internal wiring; Preparing a printed wiring board on which the semiconductor chip is mounted, mounting the first semiconductor chip on the printed wiring board, and bonding and fixing the semiconductor chip with an adhesive; A step of applying an adhesive protection resin serving as both surface protection and adhesion, laminating a second semiconductor chip via the adhesion protection resin, and bonding and fixing; a first electrode of the first semiconductor chip; Second semiconductor chip The bonding electrode formed on the second electrode and the printed circuit board of the flop first, those having a step of connecting each of the second wire.

【0015】以上のことにより、第1の半導体チップと
第2の半導体チップとの間に介在する樹脂層が接着保護
用樹脂のみとなるので、接着性の低下などに起因する信
頼性の低下を大幅に低減し、かつ製造コストを低減を向
上させることができる。
As described above, since the resin layer interposed between the first semiconductor chip and the second semiconductor chip is only the resin for adhesion protection, the decrease in reliability due to the decrease in adhesiveness and the like can be prevented. It is possible to greatly reduce the manufacturing cost and improve the manufacturing cost.

【0016】[0016]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて詳細に説明する。
Embodiments of the present invention will be described below in detail with reference to the drawings.

【0017】(実施の形態1)図1は、本発明の実施の
形態1による半導体装置の断面図、図2〜図8は、図1
の半導体装置の製造工程の説明図、図9は、図1の半導
体装置の製造工程のフローチャートである。
(Embodiment 1) FIG. 1 is a sectional view of a semiconductor device according to Embodiment 1 of the present invention, and FIGS.
FIG. 9 is an explanatory diagram of the manufacturing process of the semiconductor device of FIG. 1, and FIG. 9 is a flowchart of the manufacturing process of the semiconductor device of FIG.

【0018】本実施の形態1において、半導体装置1
は、表面実装形CSPの一種であるBGA(Ball
Grid Array)から構成されている。半導体装
置1は、図1に示すように、たとえば、BT(ビスマレ
イミド系樹脂)材などからなるプリント配線基板2が設
けられている。
In the first embodiment, the semiconductor device 1
Is a BGA (Ball), a type of surface mount CSP.
Grid Array). As shown in FIG. 1, the semiconductor device 1 is provided with a printed wiring board 2 made of, for example, a BT (bismaleimide-based resin) material.

【0019】このプリント配線基板2の裏面には、アレ
イ状に並べられた接続用電極、および配線パターンが形
成されている。プリント配線基板2の主面(半導体チッ
プ搭載面)中央部には、絶縁樹脂などの接着材3を介し
て半導体チップ(第1の半導体チップ)4が搭載されて
いる。
On the rear surface of the printed wiring board 2, connection electrodes and wiring patterns arranged in an array are formed. A semiconductor chip (first semiconductor chip) 4 is mounted at the center of the main surface (semiconductor chip mounting surface) of the printed wiring board 2 via an adhesive 3 such as an insulating resin.

【0020】この半導体チップ4上には、半導体チップ
(第2の半導体チップ)5が積層されており、いわゆる
スタックド構造となっている。半導体チップ5も、同じ
く絶縁樹脂などの接着材(接着保護用樹脂)6を介して
半導体チップ4に接着固定されている。
On the semiconductor chip 4, a semiconductor chip (second semiconductor chip) 5 is stacked, and has a so-called stacked structure. The semiconductor chip 5 is also adhered and fixed to the semiconductor chip 4 via an adhesive (adhesion protection resin) 6 such as an insulating resin.

【0021】プリント配線基板2の主面において、半導
体チップ4の対向する2辺の周辺部近傍には、ボンディ
ング電極2a、ならびに配線パターンが形成されてい
る。ボンディング電極2aと接続用電極とは、プリント
配線基板の両面に形成された配線パターン、ならびにス
ルーホールなどによって電気的に接続されている。
On the main surface of the printed wiring board 2, a bonding electrode 2a and a wiring pattern are formed near the periphery of two opposing sides of the semiconductor chip 4. The bonding electrode 2a and the connection electrode are electrically connected by wiring patterns formed on both surfaces of the printed wiring board, through holes, and the like.

【0022】プリント配線基板2裏面の接続用電極に
は、球形のはんだからなるはんだバンプ7がそれぞれ形
成されている。半導体チップ4の主面には、該半導体チ
ップ4の外周部近傍に複数の電極(第1電極)4aが形
成されている。
On the connection electrodes on the back surface of the printed wiring board 2, solder bumps 7 made of spherical solder are formed. On the main surface of the semiconductor chip 4, a plurality of electrodes (first electrodes) 4a are formed near the outer peripheral portion of the semiconductor chip 4.

【0023】また、半導体チップ5の主面にも、同様に
該半導体チップ5の外周部近傍に電極(第2電極)5a
が形成されている。これら電極4a,5aは、後述する
ボンディングワイヤ(第1ワイヤ)8、ボンディングワ
イヤ(第2ワイヤ)9によってそれぞれ接続されてい
る。
Similarly, on the main surface of the semiconductor chip 5, an electrode (second electrode) 5a is provided near the outer peripheral portion of the semiconductor chip 5.
Are formed. These electrodes 4a and 5a are connected by a bonding wire (first wire) 8 and a bonding wire (second wire) 9, which will be described later.

【0024】そして、これら半導体チップ4,5、プリ
ント配線基板2のボンディング電極2a周辺、ならびに
ボンディングワイヤ8,9が、封止樹脂10によって封
止されてパッケージが形成されている。
The semiconductor chips 4 and 5, the periphery of the bonding electrode 2a of the printed wiring board 2, and the bonding wires 8 and 9 are sealed with a sealing resin 10 to form a package.

【0025】半導体チップ4,5の電極4a,5aに
は、所定のボンディング電極2aがボンディングワイヤ
8,9を介してそれぞれ接続されている。
A predetermined bonding electrode 2a is connected to the electrodes 4a, 5a of the semiconductor chips 4, 5 via bonding wires 8, 9, respectively.

【0026】そして、半導体装置1を、電子部品などを
実装するプリント実装基板に実装する際には、該プリン
ト実装基板2に形成されたランドなどの電極に、はんだ
バンプ7を重合させて搭載し、リフローを行うことによ
り電気的に接続する。
When the semiconductor device 1 is mounted on a printed circuit board on which electronic components and the like are mounted, solder bumps 7 are superimposed on electrodes such as lands formed on the printed circuit board 2 and mounted. , And are electrically connected by performing reflow.

【0027】次に、本実施の形態1における半導体装置
1の製造工程について、図1、および図2〜図8の製造
工程の説明図、ならびに図9のフローチャートを用いて
説明する。
Next, the manufacturing process of the semiconductor device 1 according to the first embodiment will be described with reference to FIGS. 1, 2 to 8, and the flowchart of FIG.

【0028】まず、ボンディング電極2aが形成された
半導体チップ4を搭載するプリント配線基板2、周辺部
に電極4aが形成された半導体チップ4、ならびに周辺
部に電極5aが形成された半導体チップ5をそれぞれ準
備する(ステップS101)。また、これら半導体チッ
プ4,5の表面には、表面保護用の樹脂などは一切塗布
されていないものとする。
First, the printed wiring board 2 on which the semiconductor chip 4 on which the bonding electrode 2a is formed is mounted, the semiconductor chip 4 on which the electrode 4a is formed on the periphery, and the semiconductor chip 5 on which the electrode 5a is formed on the periphery. Each is prepared (step S101). It is assumed that no resin or the like for protecting the surface is applied to the surfaces of the semiconductor chips 4 and 5 at all.

【0029】そして、図2に示すように、プリント配線
基板2の中央部に、ペースト状、またはフィルム状の接
着材3を塗布する(ステップS102)。その後、図3
に示すように、半導体チップ4が搭載され、図4に示す
ように、プリント配線基板2と半導体チップ4とが接着
固定される(ステップS103)。
Then, as shown in FIG. 2, a paste-like or film-like adhesive 3 is applied to the center of the printed wiring board 2 (step S102). Then, FIG.
As shown in FIG. 4, the semiconductor chip 4 is mounted, and as shown in FIG. 4, the printed wiring board 2 and the semiconductor chip 4 are bonded and fixed (step S103).

【0030】次に、半導体チップ4の電極4a以外の表
面上に、図5に示すように、ペースト状、あるいはフィ
ルム状の接着材6を塗布し(ステップS104)、図6
に示すように、半導体チップ5を搭載して積層し、半導
体チップ4と半導体チップ5とを接着固定する(ステッ
プS105)。
Next, as shown in FIG. 5, a paste or film adhesive 6 is applied to the surface of the semiconductor chip 4 other than the electrodes 4a (step S104).
As shown in (5), the semiconductor chip 5 is mounted and laminated, and the semiconductor chip 4 and the semiconductor chip 5 are bonded and fixed (step S105).

【0031】この接着材6は、ペレット表面保護用と接
着用とを兼用したものであり、この場合も、該接着材6
はポリイミド系、エポキシ系、アクリル系、またはそれ
らの混合物などがあり、熱可塑性、熱硬化性などその種
類は問わないものとする。これにより、樹脂材料を省略
し、かつ工程を簡略化することができる。
The adhesive 6 serves both for protecting the surface of the pellet and for bonding. In this case, the adhesive 6 is also used.
Are polyimide-based, epoxy-based, acrylic-based, or mixtures thereof, and may be of any type such as thermoplasticity and thermosetting. Thereby, the resin material can be omitted and the process can be simplified.

【0032】そして、ボンディング工程において、図7
に示すように、半導体チップ4の電極4aとのプリント
配線基板2の所定のボンディング電極2aとをボンディ
ングワイヤ8によりボンディングする(ステップS10
6)。
Then, in the bonding step, FIG.
As shown in FIG. 5, the electrodes 4a of the semiconductor chip 4 and the predetermined bonding electrodes 2a of the printed wiring board 2 are bonded by the bonding wires 8 (step S10).
6).

【0033】ボンディングワイヤ8によるボンディング
が終了すると、プリント配線基板2の所定のボンディン
グ電極2aと半導体チップ5の電極5aとをボンディン
グワイヤ9によりボンディングする(ステップS10
7)。
When the bonding by the bonding wire 8 is completed, the predetermined bonding electrode 2a of the printed wiring board 2 and the electrode 5a of the semiconductor chip 5 are bonded by the bonding wire 9 (step S10).
7).

【0034】そして、これら半導体チップ4,5、プリ
ント配線基板2のボンディング電極2a周辺、ならびに
ボンディングワイヤ8,9が、図8に示すように、封止
樹脂10によって樹脂封止される(ステップS10
8)。
Then, the semiconductor chips 4 and 5, the periphery of the bonding electrode 2a of the printed wiring board 2, and the bonding wires 8 and 9 are sealed with a sealing resin 10 as shown in FIG. 8 (step S10).
8).

【0035】その後、樹脂封止されたプリント配線基板
2裏面の接続用電極には、たとえば、印刷法や転写法な
どによってはんだバンプ7がそれぞれ形成され(ステッ
プS109)、図1に示す半導体装置1が完成する(ス
テップS110)。
Thereafter, solder bumps 7 are respectively formed on the connection electrodes on the back surface of the resin-sealed printed wiring board 2 by, for example, a printing method or a transfer method (step S109), and the semiconductor device 1 shown in FIG. Is completed (step S110).

【0036】それにより、本実施の形態1によれば、半
導体チップ4と半導体チップ5との間に介在する樹脂層
が接着材6のみとなるので、接着性の低下などに起因す
る信頼性の低下を大幅に低減することができる。
Thus, according to the first embodiment, since the resin layer interposed between the semiconductor chip 4 and the semiconductor chip 5 is only the adhesive 6, the reliability due to a decrease in the adhesiveness and the like is reduced. The reduction can be greatly reduced.

【0037】また、接着材6の形状や種類などの制限が
なくなるので、製造コストを低減しながら製造効率を向
上させることができる。
Further, since there is no restriction on the shape and type of the adhesive 6, the production efficiency can be improved while reducing the production cost.

【0038】(実施の形態2)図10は、本発明の実施
の形態2による半導体装置の断面図、図11〜図18
は、図10の半導体装置の製造工程の説明図、図19
は、図10の半導体装置の製造工程のフローチャートで
ある。
(Second Embodiment) FIG. 10 is a sectional view of a semiconductor device according to a second embodiment of the present invention, and FIGS.
FIG. 19 is an explanatory view of a manufacturing process of the semiconductor device of FIG. 10;
11 is a flowchart of a manufacturing process of the semiconductor device of FIG.

【0039】本実施の形態2において、表面実装形CS
Pの一種であるBGAから構成される半導体装置1a
は、図10に示すように、ボンディング電極2aが設け
られたプリント配線基板2、接着材3、電極4aが設け
られた半導体チップ4、電極5aが形成された半導体チ
ップ5、接着材6、はんだバンプ7、ボンディングワイ
ヤ8,9、ならびに封止樹脂10から構成されており、
前記実施の形態1の半導体装置1と同様の構成となって
いる。
In the second embodiment, the surface mount type CS
Semiconductor device 1a composed of BGA which is a kind of P
As shown in FIG. 10, a printed wiring board 2 provided with a bonding electrode 2a, an adhesive 3, a semiconductor chip 4 provided with an electrode 4a, a semiconductor chip 5 provided with an electrode 5a, an adhesive 6, a solder It is composed of a bump 7, bonding wires 8, 9 and a sealing resin 10,
The configuration is the same as that of the semiconductor device 1 of the first embodiment.

【0040】そして、半導体装置1と異なるところは、
半導体チップ4,5の接着工程とボンディングワイヤ
8,9のボンディング工程との製造工程順、および接着
材6が半導体チップ4の電極4aにも塗布されている点
である。
The differences from the semiconductor device 1 are as follows.
This is in the order of the manufacturing steps of the bonding step of the semiconductor chips 4 and 5 and the bonding step of the bonding wires 8 and 9, and that the adhesive 6 is also applied to the electrodes 4 a of the semiconductor chip 4.

【0041】次に、半導体装置1aにおける製造工程に
ついて、図10、および図11〜図18の製造工程の説
明図、ならびに図19のフローチャートを用いて説明す
る。
Next, the manufacturing process of the semiconductor device 1a will be described with reference to FIGS. 10 and 11 and FIGS. 11 to 18 and the flowchart of FIG.

【0042】まず、ボンディング電極2aが形成された
半導体チップ4を搭載するプリント配線基板2、周辺部
に電極4aが形成された半導体チップ4、ならびに周辺
部に電極5aが形成された半導体チップ5をそれぞれ準
備する(ステップS201)。ここでも、これら半導体
チップ4,5の表面には、表面保護用の樹脂などは一切
塗布されていないものとする。
First, the printed wiring board 2 on which the semiconductor chip 4 on which the bonding electrode 2a is formed is mounted, the semiconductor chip 4 on which the electrode 4a is formed on the peripheral part, and the semiconductor chip 5 on which the electrode 5a is formed on the peripheral part. Each is prepared (step S201). Here, it is also assumed that the surface of the semiconductor chips 4 and 5 is not coated with any resin for protecting the surface.

【0043】そして、図11に示すように、プリント配
線基板2の中央部に、ペースト状、またはフィルム状の
接着材3を塗布する(ステップS202)。この場合に
おいても、接着材3は、ポリイミド系、エポキシ系、ア
クリル系、またはそれらの混合物などがあり、熱可塑
性、熱硬化性などその種類は問わない。
Then, as shown in FIG. 11, a paste or film adhesive 3 is applied to the center of the printed wiring board 2 (step S202). Also in this case, the adhesive 3 may be a polyimide, an epoxy, an acrylic, or a mixture thereof, and may be of any type such as thermoplastic or thermosetting.

【0044】その後、図12に示すように、半導体チッ
プ4が搭載され、図13に示すように、プリント配線基
板2と半導体チップ4とが接着固定される(ステップS
203)。
Thereafter, as shown in FIG. 12, the semiconductor chip 4 is mounted, and as shown in FIG. 13, the printed wiring board 2 and the semiconductor chip 4 are bonded and fixed (step S).
203).

【0045】次に、図14に示すように、半導体チップ
4の電極4aとのプリント配線基板2の所定のボンディ
ング電極2aとをボンディングワイヤ8によりボンディ
ングする(ステップS204)。
Next, as shown in FIG. 14, the electrodes 4a of the semiconductor chip 4 and the predetermined bonding electrodes 2a of the printed wiring board 2 are bonded by bonding wires 8 (step S204).

【0046】そして、半導体チップ4上に、図15に示
すように、ペースト状の接着材6を塗布する(ステップ
S205)。ここでは、ステップ204の処理におい
て、すでに電極4aとボンディング電極2aとをボンデ
ィングワイヤ8によりボンディングしているので、電極
4aも含めた半導体チップ4の表面すべてに接着材を塗
布する。
Then, as shown in FIG. 15, a paste-like adhesive 6 is applied on the semiconductor chip 4 (step S205). Here, in the process of step 204, since the electrode 4a and the bonding electrode 2a have already been bonded by the bonding wire 8, the adhesive is applied to the entire surface of the semiconductor chip 4 including the electrode 4a.

【0047】その後、図16に示すように、半導体チッ
プ5を搭載して積層し、半導体チップ4と半導体チップ
5とを接着固定する(ステップS206)。この接着材
6は、ペレット表面保護用と接着用とを兼用したもので
あり、この場合も、該接着材6はポリイミド系、エポキ
シ系、アクリル系、またはそれらの混合物などがあり、
熱可塑性、熱硬化性などその種類は問わないものとす
る。これにより、樹脂材料を省略し、かつ工程を簡略化
することができる。
Thereafter, as shown in FIG. 16, the semiconductor chips 5 are mounted and laminated, and the semiconductor chips 4 and 5 are bonded and fixed (step S206). The adhesive 6 serves both for protecting the surface of the pellet and for bonding, and also in this case, the adhesive 6 includes polyimide, epoxy, acrylic, or a mixture thereof,
The type thereof is not limited, such as thermoplasticity and thermosetting. Thereby, the resin material can be omitted and the process can be simplified.

【0048】そして、図17に示すように、プリント配
線基板2の所定のボンディング電極2aと半導体チップ
5の電極5aとをボンディングワイヤ9によりボンディ
ングする(ステップS207)。
Then, as shown in FIG. 17, the predetermined bonding electrode 2a of the printed wiring board 2 and the electrode 5a of the semiconductor chip 5 are bonded by the bonding wire 9 (step S207).

【0049】これら半導体チップ4,5、プリント配線
基板2のボンディング電極2a周辺、ならびにボンディ
ングワイヤ8,9が、図18に示すように、封止樹脂1
0によって樹脂封止される(ステップS208)。
As shown in FIG. 18, the semiconductor chips 4 and 5, the periphery of the bonding electrode 2 a of the printed wiring board 2, and the bonding wires 8 and 9 are
The resin is sealed with 0 (step S208).

【0050】その後、樹脂封止されたプリント配線基板
2裏面の接続用電極には、たとえば、印刷法や転写法な
どによってはんだバンプ7がそれぞれ形成され(ステッ
プS209)、図10に示す半導体装置1aが完成する
(ステップS210)。
Thereafter, solder bumps 7 are respectively formed on the connection electrodes on the back surface of the printed wiring board 2 sealed with resin by, for example, a printing method or a transfer method (step S209), and the semiconductor device 1a shown in FIG. Is completed (step S210).

【0051】それにより、本実施の形態2においても、
半導体チップ4と半導体チップ5との間に介在する樹脂
層が接着材6のみとなるので、接着性の低下などに起因
する信頼性の低下を大幅に低減し、かつ製造コストを低
減しながら製造効率を向上させることができる。
Thus, also in the second embodiment,
Since the adhesive layer 6 is the only resin layer interposed between the semiconductor chip 4 and the semiconductor chip 5, a decrease in reliability due to a decrease in adhesiveness or the like is significantly reduced, and the manufacturing cost is reduced. Efficiency can be improved.

【0052】また、ボンディングワイヤ8によるボンデ
ィングを行った後、接着材6を塗布することによって、
接着材のはみ出し、ブリード起因の汚染などがなくな
り、高いボンダビリティを確保することができる。
After bonding with the bonding wire 8, the adhesive material 6 is applied.
Adhesion material does not protrude and contamination due to bleeding is eliminated, and high bondability can be secured.

【0053】さらに、本実施の形態2では、半導体チッ
プ4の表面すべてに接着材6を塗布した場合について記
載したが、ワイヤボンディング8のボンディング後、半
導体チップ4の電極4aを除く表面に塗布(図5)する
ようにしてもよい。
Further, in the second embodiment, the case where the adhesive 6 is applied to the entire surface of the semiconductor chip 4 is described. However, after the bonding of the wire bonding 8, the adhesive 6 is applied to the surface of the semiconductor chip 4 except for the electrodes 4 a ( (FIG. 5).

【0054】以上、本発明者によってなされた発明を発
明の実施の形態に基づき具体的に説明したが、本発明は
前記実施の形態に限定されるものではなく、その要旨を
逸脱しない範囲で種々変更可能であることはいうまでも
ない。
Although the invention made by the inventor has been specifically described based on the embodiments of the present invention, the present invention is not limited to the above-described embodiments, and various modifications may be made without departing from the scope of the invention. Needless to say, it can be changed.

【0055】たとえば、前記実施の形態1,2によれ
ば、上段の半導体チップの表面には、表面保護用樹脂を
塗布しない構成としたが、図20に示すように、半導体
装置1(,1a)における最上段の半導体チップ5の表
面に表面保護用の樹脂11を塗布するようにしてもよ
い。
For example, according to the first and second embodiments, the surface protection resin is not applied to the surface of the upper semiconductor chip. However, as shown in FIG. 20, the semiconductor device 1 (, 1a The surface protection resin 11 may be applied to the surface of the uppermost semiconductor chip 5 in the step (1).

【0056】また、前記実施の形態では、半導体チップ
を2段に重ねたスタックド構造の半導体装置について記
載したが、半導体チップを3段重ね以上にしたスタック
ド構造の半導体装置であっても、接着性を大幅に向上す
ることができる。
In the above-described embodiment, a semiconductor device having a stacked structure in which semiconductor chips are stacked in two stages has been described. However, even in a semiconductor device having a stacked structure in which semiconductor chips are stacked in three or more stages, the adhesive property can be improved. Can be greatly improved.

【0057】たとえば、3つの半導体チップ12〜14
を重ね合わせる半導体装置1bの場合、図21に示すよ
うに、プリント配線基板15と最下段の半導体チップ1
2とは接着材16によって接着されており、該半導体チ
ップ12と中段の半導体チップ13との間、および該半
導体チップ13と最上段の半導体チップ14との間は、
ペレット表面保護用と接着用とを兼用した接着材17,
18によってそれぞれ接着される。
For example, three semiconductor chips 12 to 14
In the case of the semiconductor device 1b in which the semiconductor chip 1b is overlaid, as shown in FIG.
2 are bonded by an adhesive 16, and between the semiconductor chip 12 and the middle semiconductor chip 13, and between the semiconductor chip 13 and the uppermost semiconductor chip 14,
Adhesive material 17 that is used both for protecting the surface of the pellet and for bonding
18 respectively.

【0058】ここでも、接着材17,18は、ポリイミ
ド系、エポキシ系、アクリル系、またはそれらの混合物
などであり、熱可塑性、熱硬化性などその種類は問わな
いものとする。
Here, the adhesives 17 and 18 are made of polyimide, epoxy, acrylic, or a mixture thereof, and may be of any type such as thermoplastic or thermosetting.

【0059】そして、半導体チップ12〜14にそれぞ
れ設けられた電極12a〜14aとプリント配線基板1
5に設けられたボンディング電極15aとは、ワイヤボ
ンディング19〜21によってそれぞれ接続されてお
り、これらは封止樹脂22によって封止されてパッケー
ジが形成されている。また、プリント配線基板15の裏
面には、はんだバンプ23が形成されている。
The electrodes 12a to 14a provided on the semiconductor chips 12 to 14 and the printed wiring board 1
5 are connected to the bonding electrodes 15a by wire bondings 19 to 21, respectively, and these are sealed by a sealing resin 22 to form a package. Further, a solder bump 23 is formed on the back surface of the printed wiring board 15.

【0060】それにより、樹脂材料を省略し、かつ工程
を簡略化しながら半導体装置1bの信頼性を向上するこ
とができる。
As a result, the reliability of the semiconductor device 1b can be improved while omitting the resin material and simplifying the steps.

【0061】さらに、前記実施の形態1,2において
は、BGA型の半導体装置について記載したが、たとえ
ば、図22示すように、SOP(Smal Outli
nePackage)型の半導体装置1c、あるいは図
23に示すようなLOC(Lead On Chip)
型の半導体装置1dなどスタックド構造の半導体装置で
あれば、パッケージの種類はどのようなものであっても
よい。
Further, in the first and second embodiments, the BGA type semiconductor device has been described. For example, as shown in FIG. 22, an SOP (Small Outli)
NePackage) type semiconductor device 1c or LOC (Lead On Chip) as shown in FIG.
Any type of package may be used as long as the semiconductor device has a stacked structure such as a semiconductor device 1d of a die type.

【0062】たとえば、図22に示すSOP型の半導体
装置1cは、封止樹脂24によって形成されたパッケー
ジの2つの側面からリード25が突出した構成からな
り、該リード25はガルウィング状に形成されている。
For example, an SOP type semiconductor device 1c shown in FIG. 22 has a structure in which leads 25 project from two sides of a package formed by a sealing resin 24, and the leads 25 are formed in a gull wing shape. I have.

【0063】積層された半導体チップ26,27のう
ち、下段の半導体チップ26とダイパッド28とは、接
着材29によって接着されており、該半導体チップ26
と上段の半導体チップ27とは、ペレット表面保護用と
接着用とを兼用した接着材30によって接着されてい
る。
Of the stacked semiconductor chips 26 and 27, the lower semiconductor chip 26 and the die pad 28 are adhered by an adhesive 29.
The upper semiconductor chip 27 is bonded to the upper semiconductor chip 27 by an adhesive 30 which is used both for protecting the surface of the pellet and for bonding.

【0064】また、半導体チップ26,27にそれぞれ
形成された電極26a,27aとリード25とは、ワイ
ヤボンディング31,32によってそれぞれ接続されて
いる。
The electrodes 26 a and 27 a formed on the semiconductor chips 26 and 27 are connected to the leads 25 by wire bondings 31 and 32, respectively.

【0065】さらに、図23に示す半導体装置1dは、
2段重ねの半導体チップ33,34のうち、下段の半導
体チップ33の上方にリード35先端部がくる構造から
なり、半導体チップ33,34に設けられた電極33
a,34aとリード35とがワイヤボンディング36,
37によってそれぞれ接続されている。半導体チップ3
3,34の接着には、ペレット表面保護用と接着用とを
兼用した接着材38によって接着されている。また、封
止樹脂39によって形成されたパッケージの2つの側面
から突出したリード35はJ字状に形成されている。
Further, the semiconductor device 1d shown in FIG.
Of the two-stage semiconductor chips 33 and 34, the tip of the lead 35 is arranged above the lower semiconductor chip 33, and the electrodes 33 provided on the semiconductor chips 33 and 34 are formed.
a, 34a and the lead 35 are wire-bonded 36,
37 are respectively connected. Semiconductor chip 3
3 and 34 are adhered by an adhesive 38 which is used both for protection of the pellet surface and for adhesion. The leads 35 projecting from two side surfaces of the package formed by the sealing resin 39 are formed in a J-shape.

【0066】この場合においても、接着材38は、ポリ
イミド系、エポキシ系、アクリル系、またはそれらの混
合物などであり、熱可塑性、熱硬化性などその種類は問
わないものとする。
Also in this case, the adhesive 38 is made of polyimide, epoxy, acrylic, or a mixture thereof, and may be of any type such as thermoplastic or thermosetting.

【0067】[0067]

【発明の効果】本願によって開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下のとおりである。
Advantageous effects obtained by typical ones of the inventions disclosed by the present application will be briefly described as follows.
It is as follows.

【0068】(1)第1の半導体チップと第2の半導体
チップとの間に介在する樹脂層が接着保護用樹脂のみと
なるので、パッケージ構成が簡単となりスタックド構造
の半導体装置における信頼性を向上させることができ
る。
(1) Since the resin layer interposed between the first semiconductor chip and the second semiconductor chip is only the resin for adhesion protection, the package configuration is simplified and the reliability of the stacked structure semiconductor device is improved. Can be done.

【0069】(2)接着用保護樹脂の形状や種類などの
制限を不要とでき、かつ製造工程を簡略化しながら使用
材料を少なくできるので、半導体装置の製造コストを小
さくするとともに製造効率を向上させることができる。
(2) Since there is no need to limit the shape and type of the protective resin for adhesion, and the number of materials used can be reduced while simplifying the manufacturing process, the manufacturing cost of the semiconductor device can be reduced and the manufacturing efficiency can be improved. be able to.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態1による半導体装置の断面
図である。
FIG. 1 is a sectional view of a semiconductor device according to a first embodiment of the present invention;

【図2】図1の半導体装置における製造工程の説明図で
ある。
FIG. 2 is an explanatory diagram of a manufacturing process in the semiconductor device of FIG. 1;

【図3】図2に続く半導体装置の製造工程の説明図であ
る。
FIG. 3 is an explanatory view of the semiconductor device manufacturing process following FIG. 2;

【図4】図3に続く半導体装置の製造工程の説明図であ
る。
FIG. 4 is an explanatory view of the semiconductor device manufacturing process following FIG. 3;

【図5】図4に続く半導体装置の製造工程の説明図であ
る。
FIG. 5 is an explanatory view of the semiconductor device manufacturing process following FIG. 4;

【図6】図5に続く半導体装置の製造工程の説明図であ
る。
FIG. 6 is an explanatory view of the manufacturing process of the semiconductor device, following FIG. 5;

【図7】図6に続く半導体装置の製造工程の説明図であ
る。
FIG. 7 is an explanatory view of the semiconductor device manufacturing process following FIG. 6;

【図8】図7に続く半導体装置の製造工程の説明図であ
る。
FIG. 8 is an explanatory view of the manufacturing process of the semiconductor device, following FIG. 7;

【図9】図1の半導体装置の製造工程のフローチャート
である。
FIG. 9 is a flowchart of a manufacturing process of the semiconductor device of FIG. 1;

【図10】本発明の実施の形態2による半導体装置の断
面図である。
FIG. 10 is a sectional view of a semiconductor device according to a second embodiment of the present invention;

【図11】図10の半導体装置における製造工程の説明
図である。
FIG. 11 is an explanatory diagram of a manufacturing process in the semiconductor device of FIG. 10;

【図12】図11に続く半導体装置の製造工程の説明図
である。
FIG. 12 is an explanatory diagram of the semiconductor device manufacturing process following FIG. 11;

【図13】図12に続く半導体装置の製造工程の説明図
である。
FIG. 13 is an explanatory view of the manufacturing process for the semiconductor device, following FIG. 12;

【図14】図13に続く半導体装置の製造工程の説明図
である。
FIG. 14 is an explanatory view of the semiconductor device manufacturing process following FIG. 13;

【図15】図14に続く半導体装置の製造工程の説明図
である。
FIG. 15 is an explanatory view of the semiconductor device manufacturing process following FIG. 14;

【図16】図15に続く半導体装置の製造工程の説明図
である。
FIG. 16 is an explanatory diagram of the manufacturing process of the semiconductor device, following FIG. 15;

【図17】図16に続く半導体装置の製造工程の説明図
である。
FIG. 17 is an explanatory view of the semiconductor device manufacturing process following FIG. 16;

【図18】図17に続く半導体装置の製造工程の説明図
である。
FIG. 18 is an explanatory diagram of the manufacturing process for the semiconductor device, following FIG. 17;

【図19】図10の半導体装置の製造工程のフローチャ
ートである。
FIG. 19 is a flowchart of a manufacturing process of the semiconductor device of FIG. 10;

【図20】本発明の他の実施の形態による半導体装置の
一例を示す断面図である。
FIG. 20 is a sectional view showing an example of a semiconductor device according to another embodiment of the present invention.

【図21】本発明の他の実施の形態による半導体装置の
他の例を示す断面図である。
FIG. 21 is a sectional view showing another example of a semiconductor device according to another embodiment of the present invention.

【図22】本発明の他の実施の形態による半導体装置の
一例を示す断面図である。
FIG. 22 is a sectional view showing an example of a semiconductor device according to another embodiment of the present invention.

【図23】本発明の他の実施の形態による半導体装置の
他の例を示す断面図である。
FIG. 23 is a sectional view showing another example of the semiconductor device according to another embodiment of the present invention;

【符号の説明】[Explanation of symbols]

1 半導体装置 1a〜1d 半導体装置 2 プリント配線基板 2a ボンディング電極 3 接着材 4 半導体チップ(第1の半導体チップ) 4a 電極(第1電極) 5 半導体チップ(第2の半導体チップ) 5a 電極(第2電極) 6 接着材(接着保護用樹脂) 7 はんだバンプ 8 ボンディングワイヤ(第1ワイヤ) 9 ボンディングワイヤ(第2ワイヤ) 10 封止樹脂 11 樹脂 12 半導体チップ 12a 電極 13 半導体チップ 13a 電極 14 半導体チップ 14a 電極 15 プリント配線基板 15a ボンディング電極 16 接着材 17,18 接着材 19〜21 ワイヤボンディング 22 封止樹脂 23 はんだバンプ 24 封止樹脂 25 リード 26 半導体チップ 26a 電極 27 半導体チップ 27a 電極 28 ダイパッド 29 接着材 30 接着材 31,32 ワイヤボンディング 33 半導体チップ 33a 電極 34 半導体チップ 34a 電極 35 リード 36,37 ワイヤボンディング 38 接着材 39 封止樹脂 Reference Signs List 1 semiconductor device 1a to 1d semiconductor device 2 printed wiring board 2a bonding electrode 3 adhesive 4 semiconductor chip (first semiconductor chip) 4a electrode (first electrode) 5 semiconductor chip (second semiconductor chip) 5a electrode (second Electrode) 6 adhesive (bonding protection resin) 7 solder bump 8 bonding wire (first wire) 9 bonding wire (second wire) 10 sealing resin 11 resin 12 semiconductor chip 12a electrode 13 semiconductor chip 13a electrode 14 semiconductor chip 14a Electrode 15 Printed circuit board 15a Bonding electrode 16 Adhesive material 17, 18 Adhesive material 19-21 Wire bonding 22 Sealing resin 23 Solder bump 24 Sealing resin 25 Lead 26 Semiconductor chip 26a Electrode 27 Semiconductor chip 27a Electrode 28 Die pad 29 Adhesive 0 adhesive 31,32 wire bonding 33 semiconductor chips 33a electrode 34 semiconductor chips 34a electrodes 35 lead 36, 37 the wire bonding 38 adhesive 39 sealing resin

フロントページの続き (72)発明者 西田 隆文 東京都小平市上水本町5丁目22番1号 株 式会社日立超エル・エス・アイ・システム ズ内 (72)発明者 山田 勝 東京都小平市上水本町5丁目22番1号 株 式会社日立超エル・エス・アイ・システム ズ内 (72)発明者 大野 浩 東京都小平市上水本町5丁目22番1号 株 式会社日立超エル・エス・アイ・システム ズ内 (72)発明者 金田 剛 東京都小平市上水本町5丁目22番1号 株 式会社日立超エル・エス・アイ・システム ズ内 (72)発明者 柴本 正訓 東京都小平市上水本町五丁目20番1号 株 式会社日立製作所半導体グループ内Continuing on the front page (72) Inventor Takafumi Nishida 5-2-2-1, Kamimizuhoncho, Kodaira-shi, Tokyo Inside Hitachi Super LSI Systems Co., Ltd. (72) Inventor Masaru Yamada, Kodaira-shi, Tokyo 5-22-1, Mizumotocho Within Hitachi Ultra-LII Systems, Ltd. (72) Inventor Hiroshi Ono 5-2-21-1 Kamimizu-Honcho, Kodaira-shi, Tokyo Hitachi, Ltd.・ I-Systems Inc. (72) Inventor Tsuyoshi Kaneda 5-2-2-1, Kamimizuhoncho, Kodaira-shi, Tokyo Hitachi, Ltd. In-System Hitachi Ltd. (72) Inventor Masanori Shibamoto Kodaira, Tokyo Hitachi, Ltd. Semiconductor Group

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 外周部近傍に形成され、内部回路と内部
配線を介して接続された第1電極が設けられ、保護材に
よる表面保護が施されていない第1の半導体チップを準
備する工程と、 周辺部近傍に形成され、内部回路と内部配線を介して接
続された第2電極が設けられた第2の半導体チップを準
備する工程と、 前記第1の半導体チップを搭載するプリント配線基板を
準備する工程と、 前記第1の半導体チップを前記プリント配線基板に搭載
し、接着材を介して接着固定する工程と、 前記第1の半導体チップの表面に表面保護と接着とを兼
ねた接着保護用樹脂を塗布し、前記接着保護用樹脂を介
して前記第2の半導体チップを積層し、接着固定する工
程と、 前記第1の半導体チップの第1電極、および前記第2の
半導体チップの第2電極と前記プリント配線基板に形成
されたボンディング電極とを第1、第2ワイヤによって
それぞれ接続する工程とを有したことを特徴とする半導
体装置の製造方法。
A step of preparing a first semiconductor chip provided with a first electrode formed near an outer peripheral portion and connected to an internal circuit via an internal wiring and not subjected to surface protection by a protective material; Preparing a second semiconductor chip formed in the vicinity of the peripheral portion and provided with a second electrode connected to an internal circuit via an internal wiring; and providing a printed wiring board on which the first semiconductor chip is mounted. A step of preparing; a step of mounting the first semiconductor chip on the printed wiring board; and a step of bonding and fixing the same via an adhesive; and a step of bonding and protecting the surface of the first semiconductor chip. Applying a resin for application, laminating the second semiconductor chip via the adhesive protection resin, and bonding and fixing the first semiconductor chip; and a first electrode of the first semiconductor chip and a second electrode of the second semiconductor chip. Two electrodes and front Printed wiring bonding the electrode first substrate formed, a method of manufacturing a semiconductor device characterized by having a step of connecting each of the second wire.
JP2001042450A 2001-02-19 2001-02-19 Manufacturing method for semiconductor device Withdrawn JP2002246539A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001042450A JP2002246539A (en) 2001-02-19 2001-02-19 Manufacturing method for semiconductor device

Publications (1)

Publication Number Publication Date
JP2002246539A true JP2002246539A (en) 2002-08-30

Family

ID=18904743

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2002246539A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356529A (en) * 2003-05-30 2004-12-16 Renesas Technology Corp Semiconductor device and method for manufacturing the semiconductor device
JP2006222470A (en) * 2006-05-29 2006-08-24 Renesas Technology Corp Semiconductor device and manufacturing method thereof
JP2008509572A (en) * 2004-08-13 2008-03-27 インテル コーポレイション Method and apparatus for attaching a die in a stacked die package
US8557635B2 (en) 2011-03-04 2013-10-15 Kabushiki Kaisha Toshiba Stacked semiconductor device and manufacturing method thereof
US8796076B2 (en) 2011-09-01 2014-08-05 Kabushiki Kaisha Toshiba Stacked semiconductor devices and fabrication method/equipment for the same
US10490531B2 (en) 2017-09-20 2019-11-26 Toshiba Memory Corporation Manufacturing method of semiconductor device and semiconductor device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004356529A (en) * 2003-05-30 2004-12-16 Renesas Technology Corp Semiconductor device and method for manufacturing the semiconductor device
JP2008509572A (en) * 2004-08-13 2008-03-27 インテル コーポレイション Method and apparatus for attaching a die in a stacked die package
JP4732456B2 (en) * 2004-08-13 2011-07-27 インテル コーポレイション Method and apparatus for attaching a die in a stacked die package
JP2006222470A (en) * 2006-05-29 2006-08-24 Renesas Technology Corp Semiconductor device and manufacturing method thereof
US8557635B2 (en) 2011-03-04 2013-10-15 Kabushiki Kaisha Toshiba Stacked semiconductor device and manufacturing method thereof
US8659137B2 (en) 2011-03-04 2014-02-25 Kabushiki Kaisha Toshiba Stacked semiconductor device and manufacturing method thereof
US8796076B2 (en) 2011-09-01 2014-08-05 Kabushiki Kaisha Toshiba Stacked semiconductor devices and fabrication method/equipment for the same
US10490531B2 (en) 2017-09-20 2019-11-26 Toshiba Memory Corporation Manufacturing method of semiconductor device and semiconductor device

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