JP2002225275A - Ｃｍｏｓ／ｍｅｍｓ集積型インクジェット印刷ヘッドのインクチャネルにおけるシリコンブリッジの組込構造とその製造方法 - Google Patents
Ｃｍｏｓ／ｍｅｍｓ集積型インクジェット印刷ヘッドのインクチャネルにおけるシリコンブリッジの組込構造とその製造方法Info
- Publication number
- JP2002225275A JP2002225275A JP2001387253A JP2001387253A JP2002225275A JP 2002225275 A JP2002225275 A JP 2002225275A JP 2001387253 A JP2001387253 A JP 2001387253A JP 2001387253 A JP2001387253 A JP 2001387253A JP 2002225275 A JP2002225275 A JP 2002225275A
- Authority
- JP
- Japan
- Prior art keywords
- ink
- nozzle
- silicon
- print head
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010703 silicon Substances 0.000 title claims description 95
- 229910052710 silicon Inorganic materials 0.000 title claims description 94
- 238000000034 method Methods 0.000 title claims description 28
- 238000004519 manufacturing process Methods 0.000 title description 15
- 239000000758 substrate Substances 0.000 claims abstract description 51
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 91
- 238000010438 heat treatment Methods 0.000 claims description 11
- 239000012212 insulator Substances 0.000 claims description 8
- 239000004020 conductor Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 229920001296 polysiloxane Polymers 0.000 abstract 3
- 239000000976 ink Substances 0.000 description 137
- 239000010410 layer Substances 0.000 description 73
- 235000012431 wafers Nutrition 0.000 description 44
- 230000000903 blocking effect Effects 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000002161 passivation Methods 0.000 description 13
- 238000007639 printing Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- 238000000151 deposition Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- 230000008021 deposition Effects 0.000 description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 229920005591 polysilicon Polymers 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 238000007641 inkjet printing Methods 0.000 description 6
- 150000004767 nitrides Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 230000005499 meniscus Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000007600 charging Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 150000003376 silicon Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 101100219325 Phaseolus vulgaris BA13 gene Proteins 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- QCHSEDTUUKDTIG-UHFFFAOYSA-L dipotassium clorazepate Chemical compound [OH-].[K+].[K+].C12=CC(Cl)=CC=C2NC(=O)C(C(=O)[O-])N=C1C1=CC=CC=C1 QCHSEDTUUKDTIG-UHFFFAOYSA-L 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007786 electrostatic charging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/02—Ink jet characterised by the jet generation process generating a continuous ink jet
- B41J2/03—Ink jet characterised by the jet generation process generating a continuous ink jet by pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/02—Ink jet characterised by the jet generation process generating a continuous ink jet
- B41J2/03—Ink jet characterised by the jet generation process generating a continuous ink jet by pressure
- B41J2002/032—Deflection by heater around the nozzle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/13—Heads having an integrated circuit
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/16—Nozzle heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/22—Manufacturing print heads
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/751,726 US6474794B1 (en) | 2000-12-29 | 2000-12-29 | Incorporation of silicon bridges in the ink channels of CMOS/MEMS integrated ink jet print head and method of forming same |
| US09/751,726 | 2000-12-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002225275A true JP2002225275A (ja) | 2002-08-14 |
| JP2002225275A5 JP2002225275A5 (enExample) | 2005-06-23 |
Family
ID=25023218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001387253A Pending JP2002225275A (ja) | 2000-12-29 | 2001-12-20 | Ｃｍｏｓ／ｍｅｍｓ集積型インクジェット印刷ヘッドのインクチャネルにおけるシリコンブリッジの組込構造とその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6474794B1 (enExample) |
| EP (1) | EP1219422B1 (enExample) |
| JP (1) | JP2002225275A (enExample) |
| DE (1) | DE60134112D1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6450619B1 (en) * | 2001-02-22 | 2002-09-17 | Eastman Kodak Company | CMOS/MEMS integrated ink jet print head with heater elements formed during CMOS processing and method of forming same |
| US7052117B2 (en) | 2002-07-03 | 2006-05-30 | Dimatix, Inc. | Printhead having a thin pre-fired piezoelectric layer |
| US6746108B1 (en) | 2002-11-18 | 2004-06-08 | Eastman Kodak Company | Method and apparatus for printing ink droplets that strike print media substantially perpendicularly |
| US6821450B2 (en) * | 2003-01-21 | 2004-11-23 | Hewlett-Packard Development Company, L.P. | Substrate and method of forming substrate for fluid ejection device |
| US7281778B2 (en) | 2004-03-15 | 2007-10-16 | Fujifilm Dimatix, Inc. | High frequency droplet ejection device and method |
| US8491076B2 (en) | 2004-03-15 | 2013-07-23 | Fujifilm Dimatix, Inc. | Fluid droplet ejection devices and methods |
| US8708441B2 (en) | 2004-12-30 | 2014-04-29 | Fujifilm Dimatix, Inc. | Ink jet printing |
| US7249830B2 (en) * | 2005-09-16 | 2007-07-31 | Eastman Kodak Company | Ink jet break-off length controlled dynamically by individual jet stimulation |
| US7673976B2 (en) | 2005-09-16 | 2010-03-09 | Eastman Kodak Company | Continuous ink jet apparatus and method using a plurality of break-off times |
| US7364276B2 (en) * | 2005-09-16 | 2008-04-29 | Eastman Kodak Company | Continuous ink jet apparatus with integrated drop action devices and control circuitry |
| US7434919B2 (en) * | 2005-09-16 | 2008-10-14 | Eastman Kodak Company | Ink jet break-off length measurement apparatus and method |
| US7777395B2 (en) * | 2006-10-12 | 2010-08-17 | Eastman Kodak Company | Continuous drop emitter with reduced stimulation crosstalk |
| US7988247B2 (en) | 2007-01-11 | 2011-08-02 | Fujifilm Dimatix, Inc. | Ejection of drops having variable drop size from an ink jet printer |
| EP2276633B1 (en) * | 2008-05-06 | 2013-10-16 | Hewlett-Packard Development Company, L.P. | Print head feed slot ribs |
| JP2013500880A (ja) | 2009-07-31 | 2013-01-10 | ヒューレット−パッカード デベロップメント カンパニー エル．ピー． | 中央インク供給路を使用するインクジェットプリントヘッド及び方法 |
| US8632162B2 (en) | 2012-04-24 | 2014-01-21 | Eastman Kodak Company | Nozzle plate including permanently bonded fluid channel |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1941001A (en) | 1929-01-19 | 1933-12-26 | Rca Corp | Recorder |
| US3373437A (en) | 1964-03-25 | 1968-03-12 | Richard G. Sweet | Fluid droplet recorder with a plurality of jets |
| GB1143079A (en) | 1965-10-08 | 1969-02-19 | Hertz Carl H | Improvements in or relating to recording devices for converting electrical signals |
| US3946398A (en) | 1970-06-29 | 1976-03-23 | Silonics, Inc. | Method and apparatus for recording with writing fluids and drop projection means therefor |
| CA1127227A (en) | 1977-10-03 | 1982-07-06 | Ichiro Endo | Liquid jet recording process and apparatus therefor |
| CA1158706A (en) | 1979-12-07 | 1983-12-13 | Carl H. Hertz | Method and apparatus for controlling the electric charge on droplets and ink jet recorder incorporating the same |
| US4552974A (en) | 1982-12-07 | 1985-11-12 | Asahi Kasei Kogyo Kabushiki Kaisha | Process for producing diphenylmethane dicarbamates |
| US4894664A (en) | 1986-04-28 | 1990-01-16 | Hewlett-Packard Company | Monolithic thermal ink jet printhead with integral nozzle and ink feed |
| US4875968A (en) * | 1989-02-02 | 1989-10-24 | Xerox Corporation | Method of fabricating ink jet printheads |
| AU657720B2 (en) * | 1991-01-30 | 1995-03-23 | Canon Kabushiki Kaisha | A bubblejet image reproducing apparatus |
| US5880759A (en) | 1995-04-12 | 1999-03-09 | Eastman Kodak Company | Liquid ink printing apparatus and system |
| US5825385A (en) | 1995-04-12 | 1998-10-20 | Eastman Kodak Company | Constructions and manufacturing processes for thermally activated print heads |
| US6000787A (en) * | 1996-02-07 | 1999-12-14 | Hewlett-Packard Company | Solid state ink jet print head |
| US5812159A (en) | 1996-07-22 | 1998-09-22 | Eastman Kodak Company | Ink printing apparatus with improved heater |
| US6079821A (en) | 1997-10-17 | 2000-06-27 | Eastman Kodak Company | Continuous ink jet printer with asymmetric heating drop deflection |
| US5966154A (en) * | 1997-10-17 | 1999-10-12 | Eastman Kodak Company | Graphic arts printing plate production by a continuous jet drop printing with asymmetric heating drop deflection |
-
2000
- 2000-12-29 US US09/751,726 patent/US6474794B1/en not_active Expired - Lifetime
-
2001
- 2001-12-19 DE DE60134112T patent/DE60134112D1/de not_active Expired - Lifetime
- 2001-12-19 EP EP01130219A patent/EP1219422B1/en not_active Expired - Lifetime
- 2001-12-20 JP JP2001387253A patent/JP2002225275A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE60134112D1 (de) | 2008-07-03 |
| US6474794B1 (en) | 2002-11-05 |
| EP1219422B1 (en) | 2008-05-21 |
| EP1219422A1 (en) | 2002-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4243057B2 (ja) | Ｃｍｏｓ工程で形成したヒーター要素を有するｃｍｏｓ／ｍｅｍｓ集積型インクジェット印刷ヘッド及びその製造方法 | |
| JP4142285B2 (ja) | 連続インクジェット印刷ヘッド、連続インクジェット印刷ヘッドを作動する方法及び連続インクジェット印刷ヘッドを製造する方法 | |
| US6943037B2 (en) | CMOS/MEMS integrated ink jet print head and method of forming same | |
| EP1234668B1 (en) | Cmos/mems integrated ink jet print head with elongated bore and method of forming same | |
| US6439703B1 (en) | CMOS/MEMS integrated ink jet print head with silicon based lateral flow nozzle architecture and method of forming same | |
| US6491376B2 (en) | Continuous ink jet printhead with thin membrane nozzle plate | |
| JP4173662B2 (ja) | Ｃｍｏｓ／ｍｅｍｓ集積型インクジェット印刷ヘッドのインクチャネルに補助ヒーターを組み込んだ構造及びその製造方法 | |
| JP2002225275A (ja) | Ｃｍｏｓ／ｍｅｍｓ集積型インクジェット印刷ヘッドのインクチャネルにおけるシリコンブリッジの組込構造とその製造方法 | |
| JPH11192707A (ja) | 非対称加熱による液滴偏向を行う連続インクジェットプリンタ | |
| JP2010535116A (ja) | 一体的排出溝を備える側流装置プリントヘッド | |
| EP1219426B1 (en) | Cmos/mems integrated ink jet print head and method of forming same | |
| JP2002283580A (ja) | 完全に一体化した熱インクジェットプリントヘッド用のインク供給トレンチエッチング技術 | |
| JP4142286B2 (ja) | 連続インクジェット印刷ヘッド、連続インクジェット印刷ヘッドを作動する方法及び連続インクジェット印刷ヘッドを製造する方法 | |
| TW201215513A (en) | Inkjet printhead having common conductive track on nozzle plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041007 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041007 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20071024 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20071030 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20080130 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20080204 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080430 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20081028 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090225 |
|
| A911 | Transfer of reconsideration by examiner before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20090403 |
|
| A912 | Removal of reconsideration by examiner before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20090424 |