JP2002222753A5 - - Google Patents
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- Publication number
- JP2002222753A5 JP2002222753A5 JP2001018097A JP2001018097A JP2002222753A5 JP 2002222753 A5 JP2002222753 A5 JP 2002222753A5 JP 2001018097 A JP2001018097 A JP 2001018097A JP 2001018097 A JP2001018097 A JP 2001018097A JP 2002222753 A5 JP2002222753 A5 JP 2002222753A5
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- JP
- Japan
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001018097A JP4585697B2 (en) | 2001-01-26 | 2001-01-26 | Exposure apparatus and light source position adjustment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001018097A JP4585697B2 (en) | 2001-01-26 | 2001-01-26 | Exposure apparatus and light source position adjustment method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002222753A JP2002222753A (en) | 2002-08-09 |
| JP2002222753A5 true JP2002222753A5 (en) | 2008-03-13 |
| JP4585697B2 JP4585697B2 (en) | 2010-11-24 |
Family
ID=18884164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001018097A Expired - Fee Related JP4585697B2 (en) | 2001-01-26 | 2001-01-26 | Exposure apparatus and light source position adjustment method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4585697B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4489982B2 (en) * | 2001-02-05 | 2010-06-23 | 大日本印刷株式会社 | Exposure equipment |
| JP2004079778A (en) * | 2002-08-19 | 2004-03-11 | Nikon Corp | Aligner, exposing system and exposing method |
| US7307694B2 (en) * | 2005-06-29 | 2007-12-11 | Asml Netherlands B.V. | Lithographic apparatus, radiation beam inspection device, method of inspecting a beam of radiation and device manufacturing method |
| WO2019082727A1 (en) * | 2017-10-24 | 2019-05-02 | キヤノン株式会社 | Exposure device and method for manufacturing articles |
| JP2019079029A (en) | 2017-10-24 | 2019-05-23 | キヤノン株式会社 | Exposure equipment and manufacturing method for article |
| JP7059105B2 (en) * | 2018-05-18 | 2022-04-25 | キヤノン株式会社 | Data processing equipment, data processing methods, programs, and data processing systems |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0622193B2 (en) * | 1986-06-02 | 1994-03-23 | キヤノン株式会社 | Exposure equipment |
| JPS6320715A (en) * | 1986-07-14 | 1988-01-28 | Matsushita Electric Ind Co Ltd | Floating magnetic head device |
| JP2928277B2 (en) * | 1989-08-03 | 1999-08-03 | 株式会社日立製作所 | Projection exposure method and apparatus |
| JPH0653121A (en) * | 1992-07-28 | 1994-02-25 | Oki Electric Ind Co Ltd | Positioning mechanism for light source lamp in light exposure device |
| JP3275575B2 (en) * | 1993-10-27 | 2002-04-15 | キヤノン株式会社 | Projection exposure apparatus and device manufacturing method using the projection exposure apparatus |
| JP2809081B2 (en) * | 1993-12-27 | 1998-10-08 | 日本電気株式会社 | Exposure equipment |
| JP3610175B2 (en) * | 1996-10-29 | 2005-01-12 | キヤノン株式会社 | Projection exposure apparatus and semiconductor device manufacturing method using the same |
| JPH10189428A (en) * | 1996-12-20 | 1998-07-21 | Nikon Corp | Illumination optical apparatus |
| JP3262039B2 (en) * | 1997-07-18 | 2002-03-04 | キヤノン株式会社 | Exposure apparatus and device manufacturing method using the same |
| JPH11102074A (en) * | 1997-09-25 | 1999-04-13 | Nikon Corp | Illumination optical system and projection exposing device having the same |
| JP3937580B2 (en) * | 1998-04-30 | 2007-06-27 | キヤノン株式会社 | Projection exposure apparatus and device manufacturing method using the same |
| JP2000121498A (en) * | 1998-10-15 | 2000-04-28 | Nikon Corp | Method and device for evaluating focusing performance |
| JP2000208386A (en) * | 1999-01-08 | 2000-07-28 | Sony Corp | Exposing system and method for regulating uniformity of illumination thereof |
| JP2000260698A (en) * | 1999-03-09 | 2000-09-22 | Canon Inc | Projection aligner and fabrication of semiconductor device employing the same |
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2001
- 2001-01-26 JP JP2001018097A patent/JP4585697B2/en not_active Expired - Fee Related