JP2002217353A - Protective apparatus of lithium ion battery - Google Patents

Protective apparatus of lithium ion battery

Info

Publication number
JP2002217353A
JP2002217353A JP2001014149A JP2001014149A JP2002217353A JP 2002217353 A JP2002217353 A JP 2002217353A JP 2001014149 A JP2001014149 A JP 2001014149A JP 2001014149 A JP2001014149 A JP 2001014149A JP 2002217353 A JP2002217353 A JP 2002217353A
Authority
JP
Japan
Prior art keywords
substrate
bare chip
ion battery
chip substrate
surface side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001014149A
Other languages
Japanese (ja)
Other versions
JP4674401B2 (en
Inventor
Shigechika Koga
茂義 古賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2001014149A priority Critical patent/JP4674401B2/en
Publication of JP2002217353A publication Critical patent/JP2002217353A/en
Application granted granted Critical
Publication of JP4674401B2 publication Critical patent/JP4674401B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Landscapes

  • Protection Of Static Devices (AREA)
  • Secondary Cells (AREA)

Abstract

PROBLEM TO BE SOLVED: To miniaturize the protective apparatus of a lithium ion battery. SOLUTION: In a FET for controlling current and voltage, two adjacent FETs 5 and 6 are composed on a wafer 14, which are packaged on a board 1 of the protection device to miniaturize the board itself.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、リチウムイオン電
池の保護装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a protection device for a lithium ion battery.

【0002】[0002]

【従来の技術】従来、この種のリチウムイオン電池の保
護装置の構成は次のようなものとなっていた。すなわち
基板と、この基板上に実装された電流制御用FET、電
圧制御用FET及び、これらの電流制御用FET、電圧
制御用FETの動作制御用の制御素子とを備えた構成と
なっていた。
2. Description of the Related Art Hitherto, the structure of a protection device for a lithium ion battery of this type has been as follows. That is, the configuration includes a substrate, a current control FET and a voltage control FET mounted on the substrate, and a control element for controlling the operation of the current control FET and the voltage control FET.

【0003】[0003]

【発明が解決しようとする課題】上記、従来例において
問題となるのは、基板自体が大型化してしまうというこ
とであった。すなわち上述したごとく、この基板上には
電流制御用FET、電圧制御用FETが設けられること
になるので、それらを実装するために基板が大型化して
しまうことになるのであった。
A problem in the above-mentioned conventional example is that the size of the substrate itself is increased. That is, as described above, since the current control FET and the voltage control FET are provided on the substrate, the size of the substrate is increased in order to mount them.

【0004】そこで本発明は、基板の小型化を図ること
を目的とするものである。
Therefore, an object of the present invention is to reduce the size of a substrate.

【0005】[0005]

【課題を解決するための手段】この目的を達成するため
に本発明は、前記電流と電圧制御用FETは一枚のベア
チップ基板において、隣接する2個のFETによって構
成するものであり、これら隣接する2個のFETは、そ
れぞれ前記一枚のベアチップ基板の上面側にドレイン電
極、下面側にゲート電極とソース電極を有し、これらの
ゲート・ソース電極を前記基板上に電気的に接続し、前
記隣接するFETのドレイン電極同士間は、これらドレ
イン電極間を覆う前記ベアチップ基板の上面側に設けた
導電性材料により電気的に接続する構成としたものであ
る。
In order to achieve this object, the present invention provides a method for controlling a current and a voltage, comprising the steps of: forming two FETs adjacent to each other on a single bare chip substrate; The two FETs each have a drain electrode on the upper surface side of the one bare chip substrate, a gate electrode and a source electrode on the lower surface side, and electrically connect these gate / source electrodes on the substrate. The drain electrodes of the adjacent FETs are electrically connected by a conductive material provided on the upper surface side of the bare chip substrate covering between the drain electrodes.

【0006】すなわち従来は、基板上に個々に設けられ
た電流制御用FETと電圧制御用FETを実装していた
ものを、1つのベアチップ基板にこれら2個の電流制御
用FETと電圧制御用FETを設けたものを実装する構
成とすれば、その実装スペースが小さくなる分だけ基板
自体を小型化することができるものである。
That is, conventionally, a current control FET and a voltage control FET which are individually provided on a substrate are mounted, but these two current control FETs and a voltage control FET are mounted on one bare chip substrate. Is mounted, the board itself can be reduced in size by the reduced mounting space.

【0007】[0007]

【発明の実施の形態】本発明の請求項1に記載の発明
は、基板と、この基板上に実装された電流制御用FE
T、電圧制御用FET及び、これらの電流・電圧制御用
FETの動作を制御する制御素子とを備え、前記電流と
電圧制御用FETは、一枚のベアチップ基板において隣
接する2個のFETより構成され、一枚のベアチップ基
板の上面側にドレイン電極、下面側にゲート電極とソー
ス電極を有し、これらのゲートとソース電極を、前記基
板上に電気的に接続し、前記の隣接するFETのドレイ
ン電極同士間はこれらドレイン電極を覆うごとく前記ベ
アチップ基板の上面側に設けた導電性材料により電気的
に接続したリチウムイオン電池の保護装置であって、電
流・電圧制御用FETを一枚のベアチップ基板上で構成
することにより、基板上におけるそれらの実装スペース
を小さくし、これによって基板自体を小型化するもので
ある。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The invention according to claim 1 of the present invention is directed to a substrate and a current control FE mounted on the substrate.
T, a voltage control FET, and a control element for controlling the operation of these current / voltage control FETs, wherein the current and voltage control FETs are composed of two adjacent FETs on one bare chip substrate. A bare chip substrate has a drain electrode on the upper surface side, a gate electrode and a source electrode on the lower surface side, and these gates and source electrodes are electrically connected on the substrate, and the adjacent FETs are connected to each other. A protection device for a lithium ion battery electrically connected by a conductive material provided on the upper surface side of the bare chip substrate so as to cover the drain electrodes between the drain electrodes, wherein the current / voltage control FET is connected to one bare chip. The configuration on the board reduces the space for mounting them on the board, thereby reducing the size of the board itself.

【0008】本発明の請求項2に記載の発明は、導電性
材料を半田とした請求項1に記載のリチウンイオン電池
の保護装置であって、導電性材料として半田を用いるこ
とにより、一枚のベアチップ基板上において隣接する電
流と電圧制御用FETのドレイン電極間を容易に接続す
ることができ、これにより2個のFETドレイン電極間
の電気抵抗を大幅に下げ、これによってこの部分の発熱
を抑制できるものである。
According to a second aspect of the present invention, there is provided the protective device for a lithium ion battery according to the first aspect, wherein the conductive material is solder. The current between the adjacent current and the drain electrode of the voltage control FET on the bare chip substrate can be easily connected, thereby greatly reducing the electrical resistance between the two FET drain electrodes, thereby suppressing heat generation in this area. You can do it.

【0009】本発明の請求項3に記載の発明は、導電性
材料は、ベアチップ基板の周辺部は薄く、中央部は厚く
なるように設けた請求項1、または請求項2に記載のリ
チウムイオン電池の保護装置であって、ベアチップ基板
の周辺部においては導電性材料を薄くなるように設ける
ことにより、導電性材料がベアチップ基板の外周部に漏
れ出して、他の部分に対する電気的な障害を起こすこと
が無くなるものである。また、中央部を肉厚にすること
により、抵抗値を小さくできることだけではなく、放熱
面積も大きくなり、放熱効果を高めるという事にもつな
がるものである。
According to a third aspect of the present invention, the conductive material is provided such that the peripheral portion of the bare chip substrate is thinner and the central portion is thicker. A battery protection device, in which a conductive material is provided so as to be thin in a peripheral portion of a bare chip substrate, so that the conductive material leaks to an outer peripheral portion of the bare chip substrate, and an electrical obstacle to other portions is prevented. It does not happen. In addition, by making the central portion thick, not only the resistance value can be reduced, but also the heat radiation area increases, which leads to an increase in the heat radiation effect.

【0010】本発明の請求項4に記載の発明は、基板上
に電子部品を半田により実装し、この半田の融点より
も、ベアチップ基板上面側の導電性材料の融点を低くし
た請求項1〜3のいずれか一つに記載のリチウムイオン
電池の保護装置であって、基板上に半田により実装した
他の電子部品の半田よりもベアチップ基板上面側の導電
性材料の融点を低くすることにより、このベアチップ基
板の上面側に導電性材料を設ける際に先に実装が完了し
ている電子部品の半田を溶融させ、それにより実装不良
あるいは電気的な導通障害を無くすものである。
According to a fourth aspect of the present invention, an electronic component is mounted on a substrate by soldering, and the melting point of the conductive material on the upper surface side of the bare chip substrate is lower than the melting point of the solder. The protection device for a lithium ion battery according to any one of 3, wherein the melting point of the conductive material on the upper surface side of the bare chip substrate is lower than that of the solder of another electronic component mounted on the substrate by soldering, When a conductive material is provided on the upper surface side of the bare chip substrate, the solder of the electronic component that has been mounted first is melted, thereby eliminating mounting failure or electrical conduction failure.

【0011】本発明の請求項5に記載の発明は、基板の
上面側においてベアチップ基板上面を絶縁体で覆い、こ
の絶縁体の肉厚を導電性材料の肉厚よりも薄くした請求
項1〜4のいずれか一つに記載のリチウムイオン電池の
保護装置であって、基板の上面側を絶縁体を覆うことに
より、基板の上面側における電気的な絶縁が十分に確保
され、しかもこの絶縁体の肉厚を導電性材料の肉厚より
も薄くすることにより、導電性材料を肉厚にすることに
よって得ている、放熱効果を大きく阻害させることが無
くなるものである。
According to a fifth aspect of the present invention, the upper surface of the bare chip substrate is covered with an insulator on the upper surface side of the substrate, and the thickness of the insulator is smaller than the thickness of the conductive material. 4. The protection device for a lithium-ion battery according to any one of items 4, wherein the upper surface of the substrate is covered with an insulator, so that electrical insulation on the upper surface of the substrate is sufficiently ensured. By making the thickness of the conductive material thinner than the thickness of the conductive material, the heat dissipation effect obtained by increasing the thickness of the conductive material is not significantly impaired.

【0012】(実施の形態)以下に、本発明の一実施形
態におけるリチウムイオン電池の保護装置について、添
付図面に従って説明する。
(Embodiment) A protection device for a lithium ion battery according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

【0013】図1、図2において、1は基板で、この基
板1の上面側には図3に示す制御素子2などが実装され
ている。
In FIGS. 1 and 2, reference numeral 1 denotes a substrate, and a control element 2 and the like shown in FIG.

【0014】すなわち図3はリチウムイオン電池3の保
護回路を示したものであって、リチウムイオン電池3の
GND端子4の間には2個のFET5,6が介在してお
り、これら2個のFET5,6は制御素子2によって制
御されるようになっている。
That is, FIG. 3 shows a protection circuit for the lithium ion battery 3, in which two FETs 5 and 6 are interposed between the GND terminals 4 of the lithium ion battery 3, and these two FETs are provided. The FETs 5 and 6 are controlled by the control element 2.

【0015】また、これら以外に出力端子7、抵抗8,
9、コンデンサ10,11、温度検出素子12が記載さ
れている。これらの各部品は図1、図2においては基板
1の上面側に実装されている。前記2個のFET5,6
は具体的には、図4、図7に示すように1枚のベアチッ
プ基板13上において、隣接するもので構成されてい
る。
In addition to these, the output terminal 7, the resistor 8,
9, capacitors 10, 11 and a temperature detecting element 12 are described. These components are mounted on the upper surface side of the substrate 1 in FIGS. The two FETs 5, 6
Specifically, as shown in FIG. 4 and FIG. 7, on one bare chip substrate 13, it is composed of adjacent ones.

【0016】すなわち図5は、FETのウエハー14を
示しており、このFETのウエハー14は図6に示すご
とくFETが整列された構成で作られている。
That is, FIG. 5 shows a FET wafer 14, and the FET wafer 14 is made of a configuration in which the FETs are arranged as shown in FIG.

【0017】この図6に示すごとくウエハー14の上面
側にはゲート電極15とソース電極16が設けられてお
り、その下面側には図示していないが、ドレイン電極が
設けられたものとなっている。
As shown in FIG. 6, a gate electrode 15 and a source electrode 16 are provided on the upper surface of the wafer 14, and a drain electrode (not shown) is provided on the lower surface thereof. I have.

【0018】そしてその状態で、図7に示すごとく、隣
接するFET5,6をワンセットとして切り出し図1、
図2に示すように実装することになる。その拡大図を示
したものが図4である。
In this state, as shown in FIG. 7, adjacent FETs 5 and 6 are cut out as one set, and FIG.
It will be implemented as shown in FIG. FIG. 4 shows the enlarged view.

【0019】図4に示すごとく、これら2個のFET
5,6は、そのゲート電極15a,15bとソース電極
16a,16bが下面側になるように基板1上に実装さ
れ、その上面側が、ドレイン電極となっている。
As shown in FIG. 4, these two FETs
5 and 6 are mounted on the substrate 1 such that the gate electrodes 15a and 15b and the source electrodes 16a and 16b are on the lower surface side, and the upper surface side is a drain electrode.

【0020】これらドレイン電極は、隣接するFET
5,6間は、予めドレイン電極間は接続された状態とな
っているが、それだけではなく本実施形態においては、
図4に示すごとく、そのドレイン電極上に更に導電性材
料の一例として、半田17を設けている。
These drain electrodes are connected to adjacent FETs.
Between 5 and 6, the drain electrodes are connected in advance, but in addition to this, in the present embodiment,
As shown in FIG. 4, solder 17 is further provided on the drain electrode as an example of a conductive material.

【0021】この半田17は、この図4に示すごとく、
ベアチップ基板13の周辺部は肉薄になるように、また
中央部は肉厚になるような状態としている。これは半田
17がベアチップ基板13の外周部から漏れ出さないと
いう配慮からである。
The solder 17 is, as shown in FIG.
The peripheral portion of the bare chip substrate 13 is made thinner and the central portion is made thicker. This is because the solder 17 does not leak from the outer peripheral portion of the bare chip substrate 13.

【0022】また、中央部を肉厚にした理由は、このよ
うにすることによって隣接するFET5,6間の電気抵
抗を、より小さくすることができるという事と、この様
に肉厚にする事によって半田17の上面側の面積を大き
くし、それによって放熱面積を稼ぐ事ができるという事
からも、以上の様な構成としたものである。
The reason why the thickness of the central portion is made thicker is that the electrical resistance between the adjacent FETs 5 and 6 can be made smaller by doing so, and that the thickness is made thicker in this way. The above configuration is also used because the area on the upper surface side of the solder 17 can be increased by this to increase the heat radiation area.

【0023】なお図4において18は、ベアチップ基板
13を基板1上に実装した後に、このベアチップ基板1
3を固定するためのアンダーフィル用の樹脂である。
In FIG. 4, reference numeral 18 denotes the bare chip substrate 1 after the bare chip substrate 13 is mounted on the substrate 1.
3 is an underfill resin for fixing 3.

【0024】図3にも示したが、電気回路的には、FE
T6のソース電極16bはGND端子4に接続され、ゲ
ート電極15bが制御素子2に接続され、またFET5
のゲート電極15aは制御素子2に接続され、ソース電
極16aがリチウムイオン電池3に接続された状態とな
っている。
As shown in FIG. 3, the electric circuit is FE
The source electrode 16b of T6 is connected to the GND terminal 4, the gate electrode 15b is connected to the control element 2, and the FET 5
The gate electrode 15a is connected to the control element 2, and the source electrode 16a is connected to the lithium ion battery 3.

【0025】この図3においては、FET5,6のそれ
ぞれドレイン電極17a,17bも記載されており、こ
の電気回路図に示す様にドレイン電極17a,17bは
電気的に接続された状態となっている。
FIG. 3 also shows the drain electrodes 17a and 17b of the FETs 5 and 6, respectively, and the drain electrodes 17a and 17b are electrically connected as shown in the electric circuit diagram. .

【0026】更にこれに加えて、これらFET5,6の
ドレイン電極17a,17b上を図4に示すごとく半田
17によって短絡しているものである。この場合、ただ
単にFET5,6のドレイン電極17a,17bだけで
接続するよりは、図4に示すごとく半田17を盛る事に
より肉厚の電気回路が形成され、これによってこの部分
における電気抵抗を極めて小さく、また放熱面積は極め
て大きくする事ができるものである。
In addition, the drain electrodes 17a and 17b of the FETs 5 and 6 are short-circuited by solder 17 as shown in FIG. In this case, rather than merely connecting the drain electrodes 17a and 17b of the FETs 5 and 6, the thicker electric circuit is formed by laying the solder 17 as shown in FIG. It is small and the heat radiation area can be made extremely large.

【0027】図8は、本発明の他の実施形態を示し、図
1、図2に示すごとく基板1上にFET5,6や抵抗
8,9あるいは、コンデンサ10,11などを実装した
後に、その上面側を絶縁性の被膜19を設けたものであ
る。
FIG. 8 shows another embodiment of the present invention. As shown in FIGS. 1 and 2, after mounting the FETs 5, 6 and the resistors 8, 9 or the capacitors 10, 11 on the substrate 1, The upper surface is provided with an insulating film 19.

【0028】この被膜19によって全ての部品を覆う事
により上面側に対する絶縁を確保しているものである。
但し、絶縁性の被膜19は、この図8に示すごとく半田
17の中央部の最も大きい肉厚よりは、薄くなるように
している。
By covering all the components with the coating 19, insulation with respect to the upper surface side is ensured.
However, the insulating film 19 is made thinner than the largest thickness at the central portion of the solder 17 as shown in FIG.

【0029】この半田17の中央部を肉厚にした理由
は、上述したごとくそれによって放熱面積を確保したい
という狙いがあったのであって、その意味からしても、
被膜19の肉厚をあまり厚くすると、この放熱効果が阻
害されるので、その肉厚は半田17の中央部の最も肉厚
の部分よりは薄くしている。
The reason why the thickness of the central portion of the solder 17 is made thicker is to secure a heat radiation area by the above as described above.
If the thickness of the coating 19 is too large, this heat radiation effect is impaired, so that the thickness is made smaller than the thickest portion at the center of the solder 17.

【0030】[0030]

【発明の効果】以上のように本発明は、基板と、この基
板上に実装された電流制御用FET、電圧制御用FET
及び、これらの電流・電圧制御用FETの動作を制御す
る制御素子とを備え、前記電流と電圧制御用FETは、
一枚のベアチップ基板において隣接する2個のFETよ
り構成され、一枚のベアチップ基板の上面側にドレイン
電極、下面側にゲート電極とソース電極を有し、これら
のゲートとソース電極を、前記基板上に電気的に接続
し、前記の隣接するFETのドレイン電極同士間は、こ
れらドレイン電極を覆うごとく前記ベアチップ基板の上
面側に設けた導電性材料により、電気的に接続したもの
であって、基板上において、2個のFETが1つのベア
チップ基板で実装できるものとなるので、小型化するこ
とができる。
As described above, the present invention relates to a substrate, a current control FET and a voltage control FET mounted on the substrate.
And a control element for controlling the operation of these current and voltage control FETs, wherein the current and voltage control FETs are
One bare chip substrate is composed of two adjacent FETs, and has a drain electrode on the upper surface side and a gate electrode and a source electrode on the lower surface side of one bare chip substrate. Electrically connected to each other, between the drain electrodes of the adjacent FETs, electrically connected by a conductive material provided on the upper surface side of the bare chip substrate so as to cover these drain electrodes, Since two FETs can be mounted on one bare chip substrate on the substrate, the size can be reduced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態の正面図FIG. 1 is a front view of an embodiment of the present invention.

【図2】本発明の一実施形態の平面図FIG. 2 is a plan view of one embodiment of the present invention.

【図3】本発明の一実施形態の電気回路図FIG. 3 is an electric circuit diagram of one embodiment of the present invention.

【図4】本発明の一実施形態の要部の拡大断面図FIG. 4 is an enlarged sectional view of a main part of one embodiment of the present invention.

【図5】ウエハーの平面図FIG. 5 is a plan view of a wafer.

【図6】ウエハーの拡大平面図FIG. 6 is an enlarged plan view of a wafer.

【図7】ベアチップ基板の平面図FIG. 7 is a plan view of a bare chip substrate.

【図8】本発明の他の実施形態の断面図FIG. 8 is a sectional view of another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 制御素子 3 リチウムイオン電池 4 GND端子 5 FET 6 FET 7 出力端子 8 抵抗 9 抵抗 10 コンデンサ 11 コンデンサ 12 温度検出素子 13 ベアチップ基板 14 ウエハー 15a FETのゲート電極 15b FETのゲート電極 16a FETのソース電極 16b FETのソース電極 17 半田 17a FETのドレイン電極 17b FETのドレイン電極 18 樹脂 19 被膜 DESCRIPTION OF SYMBOLS 1 Substrate 2 Control element 3 Lithium ion battery 4 GND terminal 5 FET 6 FET 7 Output terminal 8 Resistance 9 Resistance 10 Capacitor 11 Capacitor 12 Temperature detection element 13 Bare chip substrate 14 Wafer 15a Gate electrode of FET 15b Gate electrode of FET 16a Source of FET Electrode 16b Source electrode of FET 17 Solder 17a Drain electrode of FET 17b Drain electrode of FET 18 Resin 19 Coating

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基板と、この基板上に実装された電流制
御用FET、電圧制御用FET及び、これらの電流・電
圧制御用FETの動作を制御する制御素子とを備え、前
記電流と電圧制御用FETは、一枚のベアチップ基板に
おいて隣接する2個のFETより構成され、一枚のベア
チップ基板の上面側にドレイン電極、下面側にゲート電
極とソース電極を有し、これらのゲートとソース電極
を、前記基板上に電気的に接続し、前記の隣接するFE
Tのドレイン電極同士間は、これらドレイン電極を覆う
ごとく、前記ベアチップ基板の上面側に設けた導電性材
料により電気的に接続したリチウムイオン電池の保護装
置。
1. A semiconductor device comprising: a substrate; a current control FET and a voltage control FET mounted on the substrate; and a control element for controlling the operation of the current / voltage control FET. FET is composed of two adjacent FETs on one bare chip substrate, and has a drain electrode on the upper surface side and a gate electrode and a source electrode on the lower surface side of one bare chip substrate. Are electrically connected on the substrate, and the adjacent FE
A protective device for a lithium ion battery in which T drain electrodes are electrically connected to each other by a conductive material provided on the upper surface side of the bare chip substrate so as to cover the drain electrodes.
【請求項2】 導電性材料を半田とした請求項1に記載
のリチウムイオン電池の保護装置。
2. The protection device for a lithium ion battery according to claim 1, wherein the conductive material is solder.
【請求項3】 導電性材料は、ベアチップ基板の周辺部
は薄く、中央部は厚くなるように設けた請求項1、また
は請求項2に記載のリチウムイオン電池の保護装置。
3. The protection device for a lithium ion battery according to claim 1, wherein the conductive material is provided so that the peripheral portion of the bare chip substrate is thin and the central portion is thick.
【請求項4】 基板上に電子部品を半田により実装し、
この半田の融点よりも、ベアチップ基板上面側の導電性
材料の融点を低くした請求項1〜3のいずれか一つに記
載のリチウムイオン電池の保護装置。
4. An electronic component is mounted on a substrate by soldering,
4. The protection device for a lithium ion battery according to claim 1, wherein the melting point of the conductive material on the upper surface side of the bare chip substrate is lower than the melting point of the solder.
【請求項5】 基板の上面側においてベアチップ基板上
面を絶縁体で覆い、この絶縁体の肉厚は、導電性材料の
肉厚よりも薄くした請求項1〜4のいずれか一つに記載
のリチウムイオン電池の保護装置。
5. The bare chip substrate according to claim 1, wherein an upper surface of the bare chip substrate is covered with an insulator on an upper surface side of the substrate, and a thickness of the insulator is smaller than a thickness of the conductive material. Lithium-ion battery protection device.
JP2001014149A 2001-01-23 2001-01-23 Lithium ion battery protector Expired - Fee Related JP4674401B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001014149A JP4674401B2 (en) 2001-01-23 2001-01-23 Lithium ion battery protector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001014149A JP4674401B2 (en) 2001-01-23 2001-01-23 Lithium ion battery protector

Publications (2)

Publication Number Publication Date
JP2002217353A true JP2002217353A (en) 2002-08-02
JP4674401B2 JP4674401B2 (en) 2011-04-20

Family

ID=18880884

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4674401B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006210120A (en) * 2005-01-27 2006-08-10 Mitsumi Electric Co Ltd Battery protecting ic chip
JP2006210409A (en) * 2005-01-25 2006-08-10 Mitsumi Electric Co Ltd Battery protection module

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0832060A (en) * 1994-07-13 1996-02-02 Hitachi Ltd Semiconductor integrated circuit device and manufacture thereof
JP2000269260A (en) * 1999-03-16 2000-09-29 Rohm Co Ltd Field effect transistor chip and its mounting method
JP2002314029A (en) * 2001-04-09 2002-10-25 Taiyo Yuden Co Ltd Module electronic parts

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0832060A (en) * 1994-07-13 1996-02-02 Hitachi Ltd Semiconductor integrated circuit device and manufacture thereof
JP2000269260A (en) * 1999-03-16 2000-09-29 Rohm Co Ltd Field effect transistor chip and its mounting method
JP2002314029A (en) * 2001-04-09 2002-10-25 Taiyo Yuden Co Ltd Module electronic parts

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006210409A (en) * 2005-01-25 2006-08-10 Mitsumi Electric Co Ltd Battery protection module
JP2006210120A (en) * 2005-01-27 2006-08-10 Mitsumi Electric Co Ltd Battery protecting ic chip

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