JP2002202498A - Liquid crystal display element, its manufacturing method and image display application apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To solve the problem that pinholes are generated in a reflecting film due to moisture accumulated in a substrate made of a resin during each heat treating process of a liquid crystal display element in the liquid crystal display element in which the reflecting film is formed on the substrate made of the resin. SOLUTION: In a second substrate on which a lower side base substrate 9, a silicon oxide film 8, a reflecting film 6 and an ITO electrode 2b are respectively formed, a silicon nitride film 7 is provided between the silicon oxide film 8 and the reflecting film 6. Thereby absorption and evapotranspiration of the moisture via the silicon oxide film 8 can be prevented and yield of manufacture of the liquid crystal display element can be improved.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device comprising a resin substrate, a method of manufacturing the same, and an image display application device using the liquid crystal display device.

[0002]

2. Description of the Related Art As a reflection film material for a reflection type liquid crystal display element, there are Al-based and Ag-based materials which are metals having high reflectivity. In a liquid crystal display element in which a reflective film is formed on a resin base substrate, there is a problem in adhesion between the resin material of the substrate and the Al-based or Ag-based reflective film material. In order to solve such a problem of adhesion, an inorganic film such as a silicon oxide film is generally formed between the reflective film and the base substrate.

[0003]

However, the silicon oxide film easily absorbs moisture, and the moisture easily accumulates on the resin base substrate through the silicon oxide film. This accumulated moisture,
In the subsequent heat treatment steps after the formation of the reflection film, the formation of the color filter, the formation of the alignment film, the hardening of the sealing resin, and the encapsulation of the liquid crystal, the film is detached from the substrate. At this time, due to the bumping of the water, pressure is applied to the reflective film formed on the silicon oxide film, and there is a problem that a pinhole is generated in the reflective film. In particular, when forming a color filter or forming an alignment film, 1
Since a heat treatment step of about 20 ° C. to 180 ° C. is involved, pinholes are generated in the reflection film at this time.

The present invention has been made in view of such conventional problems, and provides an inorganic film for ensuring the adhesion between a resin-made base substrate and a reflective film, and reduces bumping of water. It is another object of the present invention to provide a liquid crystal display device having stable quality by further providing a protective film for preventing the same, to establish a manufacturing method thereof, and to provide an image display application device using the liquid crystal display device.

[0005]

According to a first aspect of the present invention, there is provided a first substrate in which a first transparent electrode is formed on an upper transparent base substrate made of a transparent resin; In a liquid crystal display element having a second substrate on which a reflection film and a second transparent electrode are formed, and a liquid crystal sealed between the first substrate and the second substrate, a lower base substrate of the second substrate At least a silicon nitride film and an inorganic film are formed between the semiconductor device and the reflection film.

According to a second aspect of the present invention, in the liquid crystal display element of the first aspect, the inorganic film is disposed between the lower base substrate and the reflective film of the second substrate in order from the lower base substrate side. The silicon nitride film is formed.

According to a third aspect of the present invention, in the liquid crystal display element of the first aspect, the silicon nitride film is arranged between the lower base substrate and the reflective film of the second substrate in order from the lower base substrate side. And the inorganic film are formed.

According to a fourth aspect of the present invention, in the liquid crystal display device according to any one of the first to third aspects, the inorganic film comprises:
It is a silicon oxide film.

According to a fifth aspect of the present invention, in the liquid crystal display device according to any one of the first to third aspects, the reflective film is
It is characterized by containing either aluminum (Al) or silver (Ag).

According to a sixth aspect of the present invention, in the liquid crystal display device according to any one of the first to third aspects, the upper transparent base substrate is made of an acrylic resin, a polycarbonate resin, an epoxy resin, or a polyethylene terephthalate. It is characterized by containing any one of resin, polyether sulfone resin, polyethylene resin, and polysilicon resin.

According to a seventh aspect of the present invention, in the liquid crystal display device according to any one of the first to third aspects, the lower base substrate is made of an acrylic resin, a polycarbonate resin, an epoxy resin, or a polyethylene terephthalate. It is characterized by containing any one of resin, polyether sulfone resin, polyethylene resin, and polysilicon resin.

According to an eighth aspect of the present invention, a first substrate is formed by forming a first transparent electrode on an upper transparent base substrate made of a transparent resin, and at least a reflection film and a first film are formed on a lower base substrate made of a resin. And forming a second substrate by forming a second transparent electrode, and sealing a liquid crystal between the first substrate and the second substrate. At least a silicon nitride film and an inorganic film are formed therebetween.

According to a ninth aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the eighth aspect, the lower substrate is arranged between the lower base substrate and the reflection film of the second substrate in order from the lower base substrate side. An inorganic film and the silicon nitride film are formed.

According to a tenth aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the eighth aspect, the lower substrate is arranged between the lower base substrate and the reflection film of the second substrate in order from the lower base substrate side. It is characterized in that a silicon nitride film and the inorganic film are formed.

The invention of claim 11 of the present application is directed to claims 8 to 1
0. The method for manufacturing a liquid crystal display device according to any one of
The inorganic film is a silicon oxide film.

[0016] The invention of claim 12 of the present application provides claims 8 to 1
0. The method for manufacturing a liquid crystal display device according to any one of
The reflection film includes one of aluminum (Al) and silver (Ag).

The invention of claim 13 of the present application is directed to claims 8 to 1
0. The method for manufacturing a liquid crystal display device according to any one of
The upper transparent base substrate includes one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin.

The invention of claim 14 of the present application is directed to claims 8 to 1
0. The method for manufacturing a liquid crystal display device according to any one of
The lower base substrate includes one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin.

An image display application device according to claim 15 of the present application comprises:
A liquid crystal display element according to any one of claims 1 to 7 is provided.

According to a sixteenth aspect of the present invention, the first transparent electrode is formed on a transparent resin upper transparent base substrate.
A liquid crystal display comprising: a substrate; a second substrate in which at least a reflection film and a second transparent electrode are formed on a resin lower base substrate; and a liquid crystal sealed between the first substrate and the second substrate. In the device, an inorganic film is formed on the upper surface and the lower surface of the reflection film of the second substrate so as to sandwich the reflection film.

According to a seventeenth aspect of the present invention, in the reflection type liquid crystal display element of the sixteenth aspect, the inorganic film is a silicon oxide film.

According to an eighteenth aspect of the present invention, in the liquid crystal display element of the sixteenth or seventeenth aspect, the reflection film contains one of aluminum (Al) and silver (Ag).

According to a nineteenth aspect of the present invention, in the liquid crystal display element of the sixteenth or seventeenth aspect, the upper transparent base substrate is made of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyether sulfone. It is characterized by containing any one of a series resin, a polyethylene series resin and a polysilicon series resin.

According to a twentieth aspect of the present invention, in the liquid crystal display element of the sixteenth or seventeenth aspect, the lower base substrate is made of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyether sulfone. It is characterized by containing any one of a series resin, a polyethylene series resin and a polysilicon series resin.

According to a twenty-first aspect of the present invention, a first substrate is formed by forming a first transparent electrode on an upper transparent base substrate made of a transparent resin, and at least a reflection film and a first film are formed on a lower base substrate made of a resin. And forming a second substrate by forming a second transparent electrode and filling a liquid crystal between the first substrate and the second substrate in the method of manufacturing a liquid crystal display element. An inorganic film is formed on the lower surface so as to sandwich the reflective film.

According to a twenty-second aspect of the present invention, in the method for manufacturing a liquid crystal display element of the twenty-first aspect, the inorganic film is formed of silicon oxide.

According to a twenty-third aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the twenty-first or twenty-second aspect, the reflection film contains one of aluminum (Al) and silver (Ag). .

According to a twenty-fourth aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the twenty-first or twenty-second aspect, the upper transparent base substrate is made of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, It is characterized by containing any of a polyether sulfone resin, a polyethylene resin, and a polysilicon resin.

According to a twenty-fifth aspect of the present invention, in the method for manufacturing a liquid crystal display element of the twenty-first or twenty-second aspect, the lower base substrate is made of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, It is characterized by containing any of a polyether sulfone resin, a polyethylene resin, and a polysilicon resin.

An image display application device according to claim 26 of the present application comprises:
A liquid crystal display device according to any one of claims 16 to 20 is provided.

[0031]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of a liquid crystal display device and a method of manufacturing the same according to an embodiment of the present invention will be described below with reference to the drawings.

(Embodiment 1) FIG. 1 is a sectional view showing a structure of a reflection type liquid crystal display element in Embodiment 1. The liquid crystal display element D1 includes an upper transparent base substrate 1, a first ITO electrode 2a, a liquid crystal 3, a second
, An ITO electrode 2b, a flattening film 4, a color filter 5, a reflection film 6, a silicon nitride film 7, a silicon oxide film 8, and a lower base substrate 9.

In each of the above layers, the upper transparent base substrate 1 and the first ITO electrode 2a are referred to as a first substrate. Also the second
The portion including the ITO electrode 2b, the flattening film 4, the color filter 5, the reflection film 6, the silicon nitride film 7, the silicon oxide film 8, and the lower base substrate 9 is referred to as a second substrate. Upper transparent base substrate 1
The lower base substrate 9 is formed of an acrylic resin.
The flattening film 4 is formed of an epoxy resin. The reflection film 6 is formed of an aluminum (Al) alloy.

A method for manufacturing a liquid crystal display device having such a structure will be described. First, an upper transparent base substrate 1 and a lower base substrate 9 having a predetermined thickness made of a transparent resin are prepared.
Assuming that the substrate surface is an (x, z) plane, ITO is formed on the upper transparent base substrate 1 by sputtering, and the ITO electrode 2a which becomes a strip-shaped pixel electrode in the z direction by etching.
Was formed to obtain a first substrate.

In order to form an inorganic film on the entire upper surface of the lower base substrate 9, a silicon oxide film 8 was formed by a sputtering method. Next, in order to form a protective film on the upper surface of the silicon oxide film 8, a silicon nitride film 7 was formed by a sputtering method. Further, a reflective film 6 of an Al alloy was formed on the upper surface of the silicon nitride film 7 by a sputtering method. The thickness of the reflection film 6 is, for example, 0.2 μm or more in order to obtain a sufficient reflectance. On the lower substrate thus obtained, a sheet having a stripe arrangement of red, green, and blue was printed by a pigment dispersion type to form a color filter 5. Then, an epoxy resin was coated on the color filter 5 to form the flattening film 4. Next, an ITO film was formed on the upper surface of the flattening film 4 by sputtering, and an ITO electrode 2b serving as a strip-shaped pixel electrode was formed in the x direction by etching to obtain a second substrate. Further, an alignment film was printed on the upper surfaces of the ITO electrodes 2a and 2b, baked and formed, and then subjected to an alignment process by rotary rubbing using rayon cloth so as to realize an STN mode liquid crystal.

When the first substrate and the second substrate were obtained in this manner, a photocurable sealing resin mixed with glass fibers was printed on the peripheral portion of the first substrate including the upper transparent base substrate 1. Further, resin beads having a predetermined diameter were sprayed on the second substrate including the lower base substrate 9. Then, the first substrate and the second substrate were bonded so that the ITO electrodes 2a and 2b faced each other and had a certain gap, and the sealing resin was irradiated with a high-pressure mercury lamp to be thermally cured. Thereafter, a mixed liquid crystal in which a predetermined amount of a chiral agent was mixed with an ester-based nematic liquid crystal was prepared, and the mixed liquid crystal was vacuum-injected into a gap between the first substrate and the second substrate. Then, sealing was performed with a photo-curing resin, the sealing portion was cured by ultraviolet irradiation, and heat treatment was performed to prepare a liquid crystal display element.

Further, in order to obtain a sample of Comparative Example 1, a liquid crystal display element in which only the silicon nitride film 7 was not formed was prepared under the same conditions as in the first embodiment. Then, with respect to Embodiment 1 and Comparative Example 1, the adhesion of the reflective film and the presence or absence of pinholes were evaluated. The evaluation here is based on Embodiment 1.
And in the manufacturing process of the liquid crystal display element according to Comparative Example 1,
This was performed on the lower substrate at the time when the reflective film 6 of the 1 alloy was formed. The lower substrate was heat-treated at 170 ° C. for 1 hour for all samples. In particular, regarding the adhesion of the reflective film 6, the base tape method (paint general test method; JIS_K_540)
0).

As a result, the lower substrate of the first embodiment
No pinhole was generated in the reflective film 6 of the alloy,
In the lower substrate of Comparative Example 1, pinholes were formed in the reflective film 6 of the Al alloy. The results of the evaluation of the adhesion of the reflective film 6 made of Al alloy were 100/100 in both the first embodiment and the comparative example 1.
It was 100, and it was confirmed that peeling did not occur.

Therefore, by forming the silicon nitride film 7 between the silicon oxide film 8 and the reflection film 6 of Al alloy, good adhesion between the lower base substrate 9 and the reflection film 6 is ensured, and It has been found that a barrier effect of suppressing the penetration of moisture in the substrate can be obtained. As a result, it was found that the quality of the liquid crystal display element was stabilized.

(Embodiment 2) Next, the structure of a liquid crystal display element and a method of manufacturing the same according to Embodiment 2 of the present invention will be described with reference to FIG. FIG. 2 is a sectional view showing the structure of the reflective liquid crystal display element D2 in the present embodiment. The liquid crystal display element D2 is arranged from the upper side to the lower side.
Upper transparent base substrate 1, first ITO electrode 2a, liquid crystal 3, second ITO electrode 2b, flattening film 4, color filter 5, reflection film 6, silicon oxide film 8, silicon nitride film 7, lower base substrate 9.

In each of the above layers, the upper transparent base substrate 1 and the first ITO electrode 2a are called a first substrate, and a second I
The portion including the TO electrode 2b, the flattening film 4, the color filter 5, the reflection film 6, the silicon oxide film 8, the silicon nitride film 7, and the lower base substrate 9 is called a second substrate. As in the first embodiment, the upper transparent base substrate 1 and the lower base substrate 9 are formed of an acrylic resin, the flattening film 4 is formed of an epoxy resin, and the reflection film 6 is formed of an aluminum (Al) alloy. Is done.

The structure and manufacturing method of the liquid crystal display element D2 are basically the same as those of the liquid crystal display element D1, except that the order of forming the silicon oxide film 8 and the silicon nitride film 7 is reversed. .

Then, the lower substrate of Embodiment 2 and the lower substrate of Comparative Example 1 described above were evaluated for the adhesion of the reflective film and the presence or absence of pinholes. Evaluation is in the second embodiment and the comparative example 1
, At the time when the reflection film 6 of the Al alloy was formed. Such a lower substrate was subjected to a heat treatment at 170 ° C. for 1 hour, and the adhesion of the reflective film 6 was evaluated using the base tape method.

As a result, the lower substrate of the second embodiment
No pinhole was generated in the reflective film 6 of the alloy,
In the lower substrate of Comparative Example 1, pinholes were formed in the Al alloy reflective film 6. Further, the result of the evaluation of the adhesion of the reflective film 6 was 100/100 in both Embodiment 2 and Comparative Example 1 and no peeling occurred, and good results were obtained.

Therefore, by forming the silicon oxide film 8 between the silicon nitride film 7 and the reflection film 6 of the Al alloy,
It was found that good adhesion to the substrate was obtained, and a barrier effect of suppressing penetration of moisture in the resin substrate was obtained.

(Embodiment 3) Next, the structure of a liquid crystal display element and a method of manufacturing the same according to Embodiment 3 of the present invention will be described with reference to FIG. FIG. 3 is a sectional view showing the structure of the reflective liquid crystal display element D3 in the present embodiment. This liquid crystal display element D3 is arranged from the upper side to the lower side.
Upper transparent base substrate 1, first ITO electrode 2a, liquid crystal 3, second ITO electrode 2b, flattening film 4, color filter 5, second silicon oxide film 10, reflection film 6, first silicon oxide film 8, including the lower base substrate 9.

In each of the above layers, the upper transparent base substrate 1 and the first ITO electrode 2a are called a first substrate, and a second I
A portion including the TO electrode 2b, the flattening film 4, the color filter 5, the second silicon oxide film 10, the reflection film 6, the first silicon oxide film 8, and the lower base substrate 9 is called a second substrate. As in the first and second embodiments, the upper transparent base substrate 1 and the lower base substrate 9 are formed of an acrylic resin. The flattening film 4 is formed of an epoxy resin, and the reflection film 6 is formed of an aluminum (Al) alloy.

A method for manufacturing the liquid crystal display element D3 having such a structure will be described. An acrylic substrate having a thickness of 0.4 mm was used as the upper transparent base substrate 1 and the lower base substrate 9. First ITO electrode 2 on upper transparent base substrate 1
As a, ITO was formed by sputtering, and a pixel electrode was formed by etching to obtain a first substrate. Further, a first silicon oxide film 8, a reflection film 6 of an Al alloy, and a second silicon oxide film 10 were further formed on the lower base substrate 9 by a sputtering method to obtain a lower substrate.

On such a lower substrate, a color filter 5 of a pigment dispersion type having a stripe arrangement of red, green and blue was formed by printing, and a flattening film 4 using an epoxy resin was formed thereon. . And the second ITO electrode 2b
A second substrate was obtained by forming a film of ITO by sputtering and forming a pixel electrode by etching. An orientation film is printed on the second ITO electrode 2b,
After the formation by baking, an alignment treatment was performed by rotary rubbing using a rayon cloth so as to realize a 250 ° twist STN mode liquid crystal.

Then, a photo-curable sealing resin containing 1.0 wt% of glass fiber was printed on the peripheral portion on the first substrate. Further, resin beads having a predetermined diameter were sprayed on the second substrate at a rate of 300 beads / mm ² , and the first substrate and the second substrate were bonded to each other. Then, after the sealing resin was cured with a high-pressure mercury lamp, it was further thermally cured at 130 ° C. afterwards,
A mixed liquid crystal in which a predetermined amount of a chiral agent was mixed with an ester nematic liquid crystal of n = 0.14 was injected under vacuum. Next, after sealing with a photocurable resin, the composition was cured by irradiation with ultraviolet rays, and then heat-treated to obtain a reflective liquid crystal display element D3.

As described above, the structure and manufacturing method of the liquid crystal display element D3 are basically the same as those of the liquid crystal display element D1 or D2. That is different.

Further, in order to obtain the sample of Comparative Example 2, the second silicon oxide film 1 in the liquid crystal display element of Embodiment 3 was used.
0 was not formed, and the lower substrate was manufactured under the same conditions as those of the above-described embodiment in the formation steps other than this film. Then, regarding the lower substrate of the present embodiment and the lower substrate of Comparative Example 2,
The adhesion of the reflective film and the presence or absence of pinholes were evaluated.

A lower substrate on which the process up to the silicon oxide film 10 of the third embodiment was performed and a lower substrate on which the process of forming the reflective film 6 of the Al alloy of the comparative example 2 was performed were prepared. 170
The heat treatment was performed at 1 ° C. for 1 hour to evaluate. The adhesiveness of the reflective film 6 of the Al alloy was measured according to the base tape method (paint general test method JIS_K_5400).

As a result, in the lower substrate of the third embodiment, A
No pinhole was generated in the reflective film 6 of the 1 alloy, but a pinhole was generated in the reflective film 6 of the Al alloy in the lower substrate of Comparative Example 2. The results of the evaluation of the adhesion of the reflective film 6 made of an Al alloy were 1 in both the third embodiment and the comparative example 2.
00/100, no peeling occurred, and good results were obtained.

The lower substrate of Embodiment 3 and the lower substrate of Comparative Example 2 were compared and evaluated for the presence or absence of pinholes in the reflective film 6 made of Al alloy. As a result, although no pinhole was generated on the lower substrate of the third embodiment,
In the lower substrate of Comparative Example 2, pinholes were formed in the reflective film 6 of the Al alloy. Therefore, the second silicon oxide film 10 is
It was found that the barrier effect of suppressing permeation of water in the resin-made base substrate was enhanced by forming the film on the reflective film 6 made of the 1 alloy, and the quality of the liquid crystal display element was stabilized.

In order to obtain a transflective liquid crystal display device,
The lower base substrate 9 may be made transparent, and the thickness of the reflective film 6 may be set to 0.02 μm, which is smaller than those of the first and second embodiments. In this case, it is necessary to attach a circularly polarizing film to the first substrate on the opposite side across the liquid crystal. In this case, the reflection film 6 preferably has a reflectance of about 50% to 80% at a wavelength of 550 nm and a transmittance of about 10% to 30%.

In each embodiment, it has been confirmed that the same effect can be obtained regardless of the shape of the surface of the second substrate on which the reflective film 6 is formed, such as a flat shape and an uneven shape. In addition, an acrylic resin was used as the resin substrate, but is not limited thereto, and may be any of a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. It has been confirmed that a similar effect can be obtained even when a resin substrate containing is used.

In each of the embodiments, an Al alloy is used as the reflection film 6. However, the present invention is not limited to this, and it has been confirmed that similar effects can be obtained by using Ag, for example. In particular, in the case of a transflective liquid crystal display element, oxides of indium and tin, zinc oxide, indium oxide, titanium oxide, aluminum nitride, and silicon nitride can be used as the material of the reflection film 6. It has been confirmed that a similar effect can be obtained when an inorganic film such as silicon oxide or silicon nitride is formed on the reflective film.

In each embodiment, the silicon oxide film 8
And the silicon nitride film 7 is formed by a sputtering method. However, the present invention is not limited to this, and a thin film can be formed by using an evaporation method, a laser irradiation film forming method, a coating film forming method, or other film forming methods. It is. In addition, although the sputtering method is used for forming the reflective film 6 of the Al alloy, the present invention is not limited thereto, and a similar thin film can be formed by using an evaporation method or another film forming method.

In each of the embodiments, the color filter 5 is provided. However, the liquid crystal display element of the present invention is not limited to the type and presence of the color filter.

When the above-described liquid crystal display device is used as a display of an image display application device, its practical effect is increased. In portable image display application equipment,
Light weight and robustness are required. In order to reduce the power consumption of the battery, it is necessary to suppress the power consumption of the backlight. By making the liquid crystal display element a perfect reflection type, information of the liquid crystal display element can be visually recognized under external light.
In addition, by making the liquid crystal display element semi-transmissive, the backlight is turned off under external light and the information of the liquid crystal display element is visually recognized, and in a dark place, the backlight is turned on and the information of the liquid crystal display element is visually recognized. Can be.

By using a resin substrate, it is possible to realize a display panel that is curved in accordance with the external shape of an image display application device. In addition, if the substrate is made of resin, the display panel itself can be prevented from being broken even if the image display application device is dropped or a sharp object hits the display panel surface.

[0063]

As described above, according to the present invention, a silicon nitride film having a large barrier effect against moisture and a silicon oxide film having a large adhesion effect are formed at least between the lower base substrate and the reflection film. Thereby, the adhesion of the reflective film can be ensured, and the quality of the liquid crystal display element can be stabilized.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating a structure of a liquid crystal display element according to Embodiment 1 of the present invention.

FIG. 2 is a cross-sectional view illustrating a structure of a liquid crystal display element according to Embodiment 2 of the present invention.

FIG. 3 is a cross-sectional view illustrating a structure of a liquid crystal display element according to Embodiment 3 of the present invention.

[Explanation of symbols]

 Reference Signs List 1 upper transparent base substrate 2a first ITO electrode 2b second ITO electrode 3 liquid crystal 4 flattening film 5 color filter 6 reflection film 7 silicon nitride film 8 (first) silicon oxide film 9 lower base substrate 10 second Silicon oxide film

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Ikuhiro Hosokawa 1006 Kazuma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. F-term (reference) 2H042 DA02 DA04 DA11 DA15 DA18 DC02 DE04 2H090 HA04 HD02 HD15 HD17 JA07 JB03 JD12 LA20 2H091 FA14Y FB06 FB08 FB13 FD06 LA06 LA12 4F100 AA00E AA20E AA28 AA33 AB10C AB24C AD05E AK01A AK04A AK04E AK25A AK25E AK42A AK42E AK45A AK45E AK52A AK52E AK53A AK53E AK55A AK55E AT00A AT00E BA05 BA07 BA10A BA10E EH66 EH76 EJ08 EJ42 EJ54 GB41 HB31 JA11E JG01B JG01D JK06 JK14 JM02C JM02E JN01A JN01B JN01D JN06C

Claims (26)

[Claims] A first transparent base substrate made of a transparent resin;
A first substrate on which a transparent electrode is formed, a second substrate on which at least a reflection film and a second transparent electrode are formed on a lower base substrate made of resin, and a first substrate and a second substrate between the first substrate and the second substrate. In a liquid crystal display device having liquid crystal sealed therein, between the lower base substrate of the second substrate and the reflection film,
A liquid crystal display element comprising at least a silicon nitride film and an inorganic film. 2. The method according to claim 1, wherein the inorganic film and the silicon nitride film are formed between the lower base substrate and the reflection film of the second substrate in order from the lower base substrate. Item 2. A liquid crystal display device according to item 1. 3. The silicon nitride film and the inorganic film are formed between the lower base substrate and the reflective film of the second substrate in this order from the lower base substrate side. Item 2. A liquid crystal display device according to item 1. 4. The liquid crystal display device according to claim 1, wherein said inorganic film is a silicon oxide film. 5. The liquid crystal display device according to claim 1, wherein the reflection film contains one of aluminum (Al) and silver (Ag). 6. The upper transparent base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. The liquid crystal display device according to claim 1, wherein: 7. The lower base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. The liquid crystal display device according to claim 1, wherein: 8. An upper transparent base substrate made of a transparent resin,
To form a first substrate, and to form a second substrate by forming at least a reflection film and a second transparent electrode on a lower base substrate made of resin to form a second substrate. In a method of manufacturing a liquid crystal display element in which liquid crystal is sealed between substrates, at least a silicon nitride film and an inorganic film are formed between the lower base substrate and the reflection film. Production method. 9. The inorganic film and the silicon nitride film are formed between the lower base substrate and the reflection film of the second substrate in order from the lower base substrate side. The manufacturing method of the liquid crystal display element described in. 10. The silicon nitride film and the inorganic film are formed between the lower base substrate and the reflection film of the second substrate in this order from the lower base substrate side. The manufacturing method of the liquid crystal display element described in. 11. The method according to claim 8, wherein the inorganic film is a silicon oxide film. 12. The reflection film is made of aluminum (Al).
The method for producing a liquid crystal display device according to any one of claims 8 to 10, wherein the method comprises any one of silver and silver (Ag). 13. The method according to claim 13, wherein the upper transparent base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. The method for producing a liquid crystal display device according to claim 8, wherein the method comprises: 14. The lower base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. The method for producing a liquid crystal display device according to claim 8, wherein the method comprises: 15. An image display application device comprising the liquid crystal display element according to claim 1. Description: 16. A first substrate in which a first transparent electrode is formed on an upper transparent base substrate made of a transparent resin, and at least a reflection film and a second transparent electrode are formed on a lower base substrate made of a resin. In a liquid crystal display device having a second substrate and a liquid crystal sealed between the first substrate and the second substrate, the liquid crystal display device may be arranged such that the reflective film is sandwiched between upper and lower surfaces of the reflective film of the second substrate. A liquid crystal display device comprising an inorganic film. 17. The reflection type liquid crystal display device according to claim 16, wherein said inorganic film is a silicon oxide film. 18. The reflection film is made of aluminum (Al).
18. The liquid crystal display device according to claim 16, wherein the liquid crystal display device contains any of silver and silver (Ag). 19. The method according to claim 19, wherein the upper transparent base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. 18. The method according to claim 16, wherein:
The liquid crystal display element as described in the above. 20. The lower base substrate according to claim 1, wherein the lower base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. The liquid crystal display device according to claim 16 or 17, wherein 21. A first substrate is formed by forming a first transparent electrode on an upper transparent base substrate made of a transparent resin, and at least a reflection film and a second transparent electrode are formed on a lower resin base substrate. Forming a second substrate, and enclosing liquid crystal between the first substrate and the second substrate. A method of manufacturing a liquid crystal display device, comprising: forming the reflective film on the upper and lower surfaces of the reflective film of the second substrate. A method for manufacturing a liquid crystal display element, comprising forming an inorganic film so as to sandwich the same. 22. The method according to claim 21, wherein the inorganic film is formed of silicon oxide. 23. The reflection film is made of aluminum (Al).
23. The method for manufacturing a liquid crystal display device according to claim 21, wherein the method includes one of silver and silver (Ag). 24. The upper transparent base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyether sulfone resin, a polyethylene resin, and a polysilicon resin. A feature according to claim 21 or 22.
The manufacturing method of the liquid crystal display element described in. 25. The method according to claim 25, wherein the lower base substrate includes any one of an acrylic resin, a polycarbonate resin, an epoxy resin, a polyethylene terephthalate resin, a polyethersulfone resin, a polyethylene resin, and a polysilicon resin. The method for manufacturing a liquid crystal display device according to claim 21 or 22, wherein 26. An image display application device comprising the liquid crystal display element according to claim 16. Description: