JP2002191984A - Photocatalyst composition and thermoplastic resin composition containing the same - Google Patents
Photocatalyst composition and thermoplastic resin composition containing the sameInfo
- Publication number
- JP2002191984A JP2002191984A JP2000399164A JP2000399164A JP2002191984A JP 2002191984 A JP2002191984 A JP 2002191984A JP 2000399164 A JP2000399164 A JP 2000399164A JP 2000399164 A JP2000399164 A JP 2000399164A JP 2002191984 A JP2002191984 A JP 2002191984A
- Authority
- JP
- Japan
- Prior art keywords
- photocatalyst
- composition
- thermoplastic resin
- titanium dioxide
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 70
- 239000000203 mixture Substances 0.000 title claims abstract description 40
- 229920005992 thermoplastic resin Polymers 0.000 title claims abstract description 27
- 239000011342 resin composition Substances 0.000 title claims abstract description 25
- 229920005989 resin Polymers 0.000 claims abstract description 32
- 239000011347 resin Substances 0.000 claims abstract description 32
- 239000000843 powder Substances 0.000 claims abstract description 27
- 238000002156 mixing Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 abstract description 8
- 230000001699 photocatalysis Effects 0.000 abstract description 8
- 230000009257 reactivity Effects 0.000 abstract description 4
- 238000013329 compounding Methods 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 85
- 239000004408 titanium dioxide Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 19
- 238000012360 testing method Methods 0.000 description 19
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 17
- 238000013032 photocatalytic reaction Methods 0.000 description 16
- 239000002245 particle Substances 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 6
- 239000005977 Ethylene Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- -1 suboxide Chemical compound 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 4
- 239000004925 Acrylic resin Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- 230000001954 sterilising effect Effects 0.000 description 4
- 238000004659 sterilization and disinfection Methods 0.000 description 4
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 239000004594 Masterbatch (MB) Substances 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000000440 bentonite Substances 0.000 description 2
- 229910000278 bentonite Inorganic materials 0.000 description 2
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000004567 concrete Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 2
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000012760 heat stabilizer Substances 0.000 description 2
- 229910001701 hydrotalcite Inorganic materials 0.000 description 2
- 229960001545 hydrotalcite Drugs 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 230000008635 plant growth Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 235000013311 vegetables Nutrition 0.000 description 2
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 102000003729 Neprilysin Human genes 0.000 description 1
- 108090000028 Neprilysin Proteins 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 239000011398 Portland cement Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000000843 anti-fungal effect Effects 0.000 description 1
- 229940121375 antifungal agent Drugs 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000012055 fruits and vegetables Nutrition 0.000 description 1
- 230000000855 fungicidal effect Effects 0.000 description 1
- 239000000417 fungicide Substances 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000002070 germicidal effect Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- OCWMFVJKFWXKNZ-UHFFFAOYSA-L lead(2+);oxygen(2-);sulfate Chemical compound [O-2].[O-2].[O-2].[Pb+2].[Pb+2].[Pb+2].[Pb+2].[O-]S([O-])(=O)=O OCWMFVJKFWXKNZ-UHFFFAOYSA-L 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 208000008842 sick building syndrome Diseases 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Catalysts (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は光触媒組成物および
熱可塑性樹脂組成物に関し、詳しくは、建物の壁面など
に使われて、長期にわたり光触媒反応活性を有し、劣化
しにくい樹脂資材を製造するための光触媒組成物および
熱可塑性樹脂組成物に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photocatalyst composition and a thermoplastic resin composition, and more particularly, to a resin material which is used for a wall surface of a building, has a long term photocatalytic reaction activity, and is hardly deteriorated. To a photocatalyst composition and a thermoplastic resin composition.
【0002】[0002]
【従来の技術】最近、光触媒を、建物の外壁、道路の防
音壁、病院の内壁、あるいは青果物倉庫の内壁などに塗
布することにより、紫外線照射下での光触媒反応を利用
して、例えば、アンモニア、メルカプタンなどの悪臭物
質の除去、スス汚れの防止、NOX などの有害物質の
除去、青果物から発生するエチレンなどの植物成長(腐
敗)促進物質の除去、殺菌または防黴などが図られてい
る(例えば、特開平9−277463号公報、特開平1
1−1659号公報など)。光触媒は、二酸化チタンな
どの0.5〜5eVの禁止帯幅を有する半導体(光触
媒)の粉末粒子であるので、有機バインダーを用いて基
材に固定したり、樹脂に混ぜ込む等して使用される。し
かし、光触媒の光触媒機能により有機バインダーや基材
を分解してしまう問題がある。これに対して、例えば、
油中水滴型エマルジョン調製法によって光触媒を内包し
た多孔質マイクロカプセルを製造し、これを不飽和ポリ
エステル樹脂に配合する方法(特開平9−225320
号公報)、チタニア粒子の表面にセラミックスを島状に
担持させる方法(特開平9−225319号公報)等が
提案された。しかしこれらの方法を用いて有機バインダ
ーや基材を分解しない光触媒粒子を調製するには複雑な
工程が必要であり、操作が煩雑である。2. Description of the Related Art Recently, by applying a photocatalyst to an outer wall of a building, a soundproof wall of a road, an inner wall of a hospital, or an inner wall of a vegetable store, for example, ammonia is applied by utilizing a photocatalytic reaction under ultraviolet irradiation. , removal of malodor substances such as mercaptans, prevention of soot stains, removal of harmful substances such as NO X, the removal of plant growth (spoilage) promoting substances such as ethylene generated from fruit and vegetables, such as sterilization or antifungal is achieved (For example, JP-A-9-277463, JP-A-9-277463)
1-11659). Since the photocatalyst is powder particles of a semiconductor (photocatalyst) having a band gap of 0.5 to 5 eV such as titanium dioxide, the photocatalyst is used by being fixed to a base material using an organic binder or mixed with a resin. You. However, there is a problem that the organic binder and the base material are decomposed by the photocatalytic function of the photocatalyst. In contrast, for example,
A method of preparing a porous microcapsule containing a photocatalyst by a water-in-oil type emulsion preparation method and blending it with an unsaturated polyester resin (JP-A-9-225320)
Japanese Patent Application Laid-Open No. 9-225319), and a method of supporting ceramics in the form of islands on the surface of titania particles has been proposed. However, using these methods to prepare photocatalyst particles that do not decompose an organic binder or a substrate requires a complicated process, and the operation is complicated.
【0003】[0003]
【発明が解決しようとする課題】このような状況下にあ
って本発明の目的は、建物の壁面などに使用され、長期
にわたって劣化することがなく、しかも光触媒反応性に
優れた光触媒活性表面を有する樹脂資材を提供すること
である。本発明者らは、鋭意研究した結果、アナターゼ
型二酸化チタン粉末を多量のルチル型二酸化チタン粉末
と混合したものを樹脂に練り込むと、長期的に樹脂成形
品の光劣化なしに高い光触媒反応性を持続できることを
見出し、この知見に基づいて本発明を完成するに至っ
た。SUMMARY OF THE INVENTION Under such circumstances, an object of the present invention is to provide a photocatalytically active surface which is used for a building wall or the like and which does not deteriorate for a long period of time and which has excellent photocatalytic reactivity. It is to provide a resin material having. The present inventors have conducted intensive studies and found that when a mixture of anatase-type titanium dioxide powder and a large amount of rutile-type titanium dioxide powder was kneaded into a resin, high photocatalytic reactivity was obtained over a long period of time without photodeterioration of the resin molded product. Have been found, and the present invention has been completed based on this finding.
【0004】[0004]
【課題を解決するための手段】かくして本発明によれ
ば、(1)光触媒と、光触媒として不活性な無機粉末か
らなる光触媒組成物、(2)熱可塑性樹脂に、上記
(1)に記載された光触媒組成物を配合してなる熱可塑
性樹脂組成物、および、(3)上記(2)に記載された
熱可塑性樹脂組成物からなる樹脂成形品、が提供され
る。Thus, according to the present invention, (1) a photocatalyst composition comprising a photocatalyst and an inorganic powder which is inactive as a photocatalyst, and (2) a thermoplastic resin are described in (1) above. And (3) a resin molded article comprising the thermoplastic resin composition described in the above (2).
【0005】また、好ましい態様として、(4)前記光
触媒がアナターゼ型二酸化チタンである上記(1)に記
載の光触媒組成物、(5)前記光触媒として不活性な無
機粉末がルチル型二酸化チタンである上記(1)記載の
光触媒組成物、(6)前記光触媒と、前記光触媒として
不活性な無機粉末との重量比が5/95〜20/80で
ある上記(1)に記載の光触媒組成物、および、(7)
前記光触媒と、前記光触媒として不活性な無機粉末とを
予め混合した後、前記熱可塑性樹脂に配合することを特
徴とする熱可塑性樹脂組成物の製造方法、が提供され
る。In a preferred embodiment, (4) the photocatalyst composition according to the above (1), wherein the photocatalyst is an anatase type titanium dioxide, and (5) the inorganic powder inactive as the photocatalyst is rutile type titanium dioxide. (6) The photocatalyst composition according to (1), wherein the weight ratio of the photocatalyst to the inorganic powder inert as the photocatalyst is 5/95 to 20/80. And (7)
A method for producing a thermoplastic resin composition is provided, wherein the photocatalyst and an inorganic powder which is inert as the photocatalyst are mixed in advance and then mixed with the thermoplastic resin.
【0006】[0006]
【発明の実施の態様】以下、本発明について詳述する。
本発明で使用する光触媒は、0.5〜5eVの禁止帯幅
を有する半導体であって、半導体に禁止帯幅以上のエネ
ルギーを有する光を照射することにより、光触媒反応を
生じる半導体である。かかる半導体に光を照射すると、
価電子帯から伝導帯への電子励起が生じ、価電子帯に正
孔、伝導帯に電子が生成し、これらの正孔および電子が
半導体表面でそれと接する気相や水相で光触媒反応を行
うことが知られている。なお、禁止帯幅は2〜4eVで
あることが好ましい。前記光触媒としては、例えば、ア
ナターゼ型二酸化チタン、二酸化スズ、酸化亜鉛、三酸
化タングステン、酸化セリウム、チタン酸バリウム、酸
化第二鉄などの金属酸化物;硫化亜鉛、硫化カドミウ
ム、硫化鉛、セレン化亜鉛、セレン化カドミウムなどの
金属カルコゲナイド;シリコン、ゲルマニウムなどの第
IV族元素;ガリウムリン、ガリウムヒ素、インジウム
リンなどの第III族元素と第V族元素との化合物;ポ
リアセチレン、ポリピロール、ポリチオフェン、ポリア
ニリン、ポリビニルカルバゾールなどの有機半導体など
が挙げられる。これらの中でアナターゼ型二酸化チタ
ン、酸化亜塩、三酸化タングステン、酸化セリウムなど
の金属酸化物が好ましく、特にアナターゼ型二酸化チタ
ンが好適である。また、半導体に白金、銀などの貴金属
を担持させて触媒作用を高めることもできる。前記光触
媒は、通常、粉末状のものが使用される。光触媒の粉末
粒子は、一次粒子が1〜1000nmのものが表面積が
大きいので光触媒反応には有利である。一次粒子を顆粒
状に凝集させて粒径10〜200μmの二次粒子にした
ものを使用する場合は、後述の光触媒組成物を調製する
過程で大部分を一次粒子にほぐすことが好ましい。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail.
The photocatalyst used in the present invention is a semiconductor having a band gap of 0.5 to 5 eV, and a semiconductor that generates a photocatalytic reaction by irradiating the semiconductor with light having energy equal to or larger than the band gap. When such a semiconductor is irradiated with light,
Electron excitation from the valence band to the conduction band occurs, holes are generated in the valence band, and electrons are generated in the conduction band. These holes and electrons undergo photocatalytic reactions in the gas phase or aqueous phase where they come into contact with the semiconductor surface. It is known. Note that the forbidden band width is preferably 2 to 4 eV. Examples of the photocatalyst include metal oxides such as anatase type titanium dioxide, tin dioxide, zinc oxide, tungsten trioxide, cerium oxide, barium titanate, and ferric oxide; zinc sulfide, cadmium sulfide, lead sulfide, and selenide. Metal chalcogenides such as zinc and cadmium selenide; group IV elements such as silicon and germanium; compounds of group III and group V elements such as gallium phosphide, gallium arsenide and indium phosphide; polyacetylene, polypyrrole, polythiophene, polyaniline And organic semiconductors such as polyvinyl carbazole. Among these, metal oxides such as anatase-type titanium dioxide, suboxide, tungsten trioxide, and cerium oxide are preferable, and anatase-type titanium dioxide is particularly preferable. In addition, a noble metal such as platinum or silver can be carried on the semiconductor to enhance the catalytic action. The photocatalyst is usually in the form of a powder. The powder particles of the photocatalyst having primary particles of 1 to 1000 nm have a large surface area, which is advantageous for the photocatalytic reaction. When the primary particles are aggregated into granules to form secondary particles having a particle size of 10 to 200 μm, it is preferable that most of the particles are loosened into the primary particles in the process of preparing the photocatalyst composition described below.
【0007】なお、二酸化チタンには、3種の結晶構
造、アナターゼ型、ルチル型およびブルッカイト型があ
るが、光触媒活性のあるのは、アナターゼ型およびブル
ッカイト型のものである。アナターゼ型の結晶は正方晶
系で、a:c=1:1.771であり、比重は3.84
である。アナターゼ型二酸化チタンを800〜1000
℃に加熱するとルチル型二酸化チタンに変わる。ルチル
型二酸化チタンは、結晶が正方晶系で、a:c=1:
0.6442で、比重は4.26であり、光触媒として
は不活性である。結晶構造は、X線回折測定で区別がつ
けられる。[0007] Titanium dioxide has three crystal structures, anatase type, rutile type and brookite type, but the anatase type and brookite type have photocatalytic activity. The crystals of the anatase type are tetragonal, a: c = 1: 1.771, and the specific gravity is 3.84.
It is. 800-1000 anatase type titanium dioxide
Converts to rutile titanium dioxide when heated to ° C. The rutile type titanium dioxide has a tetragonal crystal system, and a: c = 1:
At 0.6442, the specific gravity is 4.26, which is inactive as a photocatalyst. The crystal structure is distinguished by X-ray diffraction measurements.
【0008】本発明で使用する光触媒として不活性な無
機粉末(以下、「光不活性無機粉末」と記す。)とは、
光触媒反応を呈さないか、もしくはほとんど呈さない無
機粉末である。光不活性無機粉末の例としては、上記の
ルチル型二酸化チタンの他、ハイドロタルサイト、ベン
トナイト、ゼオライト、タルク、マイカ、クレー、カオ
リン、雲母、モンモリロナイト、シリカ、炭酸カルシウ
ム、リン酸カルシウム、ケイ酸カルシウム、酸化アルミ
ニウム、水酸化アルミニウム、硫酸アルミニウム、リン
酸アルミニウム、アルミナセメント、ポルトランドセメ
ントなどが挙げられる。なかでも、ルチル型二酸化チタ
ン、ハイドロタルサイト、有機処理したベントナイトが
好ましく、特にルチル型二酸化チタンが好ましい。光不
活性無機粉末の一次粒子径は、好ましくは1〜1000
nm、より好ましくは10〜200nmで、前記半導体
の粒子径より小さいものが好ましい。The inorganic powder that is inert as a photocatalyst used in the present invention (hereinafter referred to as “photoinert inorganic powder”) is
It is an inorganic powder that does not or hardly exhibits a photocatalytic reaction. Examples of the photoinert inorganic powder, in addition to the above rutile titanium dioxide, hydrotalcite, bentonite, zeolite, talc, mica, clay, kaolin, mica, montmorillonite, silica, calcium carbonate, calcium phosphate, calcium silicate, Examples include aluminum oxide, aluminum hydroxide, aluminum sulfate, aluminum phosphate, alumina cement, Portland cement and the like. Among them, rutile-type titanium dioxide, hydrotalcite, and bentonite treated with an organic substance are preferable, and rutile-type titanium dioxide is particularly preferable. The primary particle diameter of the photo-inert inorganic powder is preferably 1 to 1000.
nm, more preferably 10 to 200 nm, which is smaller than the particle size of the semiconductor.
【0009】本発明の光触媒組成物は、光触媒粉末と光
不活性無機粉末とを重量比で、通常、5/95〜20/
80、好ましくは8/92〜15/85の範囲で混合し
てなるものである。両者の混合の方法には、通常、粉体
の混合に使用される装置を用いる方法であれば制限がな
い。好ましい混合装置としては、タンブラーミキサー、
ユニバーサルミキサー、ホバートミキサー、リボンブレ
ンダー、ヘンシェルミキサーなどが挙げられる。上記光
触媒組成物の好ましい態様として、光触媒粉末にアナタ
ーゼ型二酸化チタンを、また、光不活性無機粉末にルチ
ル型ニ酸化チタンを用いる態様が挙げられる。この場合
に、両粉末を上記のような混合装置で混合する方法の他
に、アナターゼ型ニ酸化チタン粉末を温度800〜13
00℃にて1〜5時間焼成することにより、アナターゼ
型二酸化チタン粒子とルチル型二酸化チタンとが混在し
たものを調製する方法を採ることもできる。この場合
も、アナターゼ型とルチル型の重量比は、上記の範囲に
あることが必要である。The photocatalyst composition of the present invention comprises a photocatalyst powder and a photoinert inorganic powder in a weight ratio of usually 5/95 to 20 /.
80, preferably in the range of 8/92 to 15/85. The method of mixing the two is not particularly limited as long as it is a method using a device used for mixing powders. Preferred mixing devices include a tumbler mixer,
Universal mixers, Hobart mixers, ribbon blenders, Henschel mixers and the like can be mentioned. As a preferred embodiment of the photocatalyst composition, there is an embodiment in which an anatase type titanium dioxide is used as a photocatalyst powder and a rutile type titanium dioxide is used as a photoinert inorganic powder. In this case, in addition to the method of mixing both powders with the above-described mixing device, anatase-type titanium dioxide powder at a temperature of 800 to 13 is used.
By baking at 00 ° C. for 1 to 5 hours, a method of preparing a mixture of anatase-type titanium dioxide particles and rutile-type titanium dioxide can be adopted. Also in this case, the weight ratio between the anatase type and the rutile type needs to be within the above range.
【0010】本発明の光触媒組成物の利用方法として
は、光触媒組成物を熱可塑性樹脂に配合して成形品とす
る方法;生コンクリートに配合してコンクリート成形物
とする方法などが挙げられる。Examples of the method of using the photocatalyst composition of the present invention include a method in which the photocatalyst composition is mixed with a thermoplastic resin to obtain a molded product; a method in which the photocatalyst composition is mixed with ready-mixed concrete to obtain a concrete molded product.
【0011】本発明で使用する熱可塑性樹脂は特に限定
されない。このような熱可塑性樹脂の具体例としては、
例えば、ポリテトラフルオロエチレン、ポリフッ化ビニ
リデン、ポリフッ化ビニル、エチレン−テトラフルオロ
エチレンコポリマー等のフッ素樹脂;ポリアミド6,ポ
リアミド66,ポリアミド12等のポリアミド;ポリエ
チレン、ポリプロピレン、ポリメチルペンテン等のポリ
オレフィン;ポリスチレン、ポリα−メチルスチレン等
の芳香族ビニル樹脂;ポリエチレンテレフタレート、ポ
リブチレンテレフタレート等のポリエステル;塩化ビニ
ル樹脂、ポリ塩化ビニリデン等の塩素系樹脂;アクリル
樹脂、ABS樹脂、エチレン−酢酸ビニルコポリマー、
ノルボルネン樹脂、ポリアセタール、ポリエーテルイミ
ド、ポリカーボネート、ポリ酢酸ビニル、ポリビニルア
ルコール等が挙げられる。本発明の光触媒組成物を配合
した熱可塑性樹脂組成物は、光触媒の光触媒機能によっ
て、基材である熱可塑性樹脂が分解されにくいので、長
期間その効果を持続することができる。特に、光触媒に
よって分解されやすい性質のある塩化ビニル樹脂等の塩
素系樹脂に配合した場合は、長期間基材が分解しないの
で、塩化水素ガスが発生する等の弊害を防止することが
できる。[0011] The thermoplastic resin used in the present invention is not particularly limited. As a specific example of such a thermoplastic resin,
For example, fluorine resins such as polytetrafluoroethylene, polyvinylidene fluoride, polyvinyl fluoride, and ethylene-tetrafluoroethylene copolymer; polyamides such as polyamide 6, polyamide 66 and polyamide 12; polyolefins such as polyethylene, polypropylene and polymethylpentene; polystyrene , Aromatic vinyl resins such as poly-α-methylstyrene; polyesters such as polyethylene terephthalate and polybutylene terephthalate; chlorine resins such as vinyl chloride resins and polyvinylidene chloride; acrylic resins, ABS resins, ethylene-vinyl acetate copolymers,
Norbornene resin, polyacetal, polyetherimide, polycarbonate, polyvinyl acetate, polyvinyl alcohol and the like can be mentioned. The thermoplastic resin composition containing the photocatalyst composition of the present invention can maintain its effect for a long time because the thermoplastic resin as the base material is hardly decomposed by the photocatalytic function of the photocatalyst. In particular, when compounded with a chlorine-based resin such as a vinyl chloride resin having a property of being easily decomposed by a photocatalyst, the base material does not decompose for a long period of time, so that adverse effects such as generation of hydrogen chloride gas can be prevented.
【0012】熱可塑性樹脂に光触媒組成物を配合するに
は、タンブラーミキサー、ユニバーサルミキサー、ホバ
ートミキサー、リボンブレンダー、ヘンシェルミキサ
ー、バンバリーミキサー、加圧ニーダーなどを使用すれ
ばよい。熱可塑性樹脂組成物の配合割合は、熱可塑性樹
脂100重量部に対して、上記光触媒組成物を、通常、
1〜100重量部、好ましくは5〜50重量部である。
光触媒組成物が過度に少ないと樹脂成形品の光触媒反応
が少ないおそそれがあり、逆に、光触媒組成物が過度に
多いと、熱可塑性樹脂が分解する可能性がある。上記樹
脂組成物を調製する際、樹脂加工の際に通常配合される
熱安定剤、滑剤、耐衝撃強化剤、可塑剤、帯電防止剤、
難燃剤、酸化防止剤、紫外線吸収剤、顔料、カップリン
グ剤、防黴剤なども配合して混合するとよい。To mix the photocatalyst composition with the thermoplastic resin, a tumbler mixer, a universal mixer, a Hobart mixer, a ribbon blender, a Henschel mixer, a Banbury mixer, a pressure kneader or the like may be used. The mixing ratio of the thermoplastic resin composition is, with respect to 100 parts by weight of the thermoplastic resin, the photocatalyst composition, usually,
It is 1 to 100 parts by weight, preferably 5 to 50 parts by weight.
If the amount of the photocatalyst composition is too small, the photocatalytic reaction of the resin molded article may be small. Conversely, if the amount of the photocatalyst composition is too large, the thermoplastic resin may be decomposed. When preparing the above resin composition, a heat stabilizer, a lubricant, an impact resistance enhancer, a plasticizer, an antistatic agent, which are usually compounded during resin processing,
It is preferable that a flame retardant, an antioxidant, an ultraviolet absorber, a pigment, a coupling agent, a fungicide and the like are also blended and mixed.
【0013】熱可塑性樹脂に光触媒組成物を配合するに
際しては、光触媒組成物を予め同種の少量の樹脂に配合
したマスターバッチとし、これを多量の樹脂に配合する
方法を採ってもよいし、光触媒組成物を直接多量の樹脂
に配合する方法を採ってもよい。マスターバッチは、光
触媒組成物を適用しようとする樹脂と同種類の少量の樹
脂に予め十分に均一に分散、調合した樹脂組成物であ
り、このマスターバッチを多量の樹脂に配合するときは
比較的に簡略な混合でも全体的に均一な分散ができるよ
うにするものである。When a photocatalyst composition is blended with a thermoplastic resin, a masterbatch in which the photocatalyst composition is blended in advance with a small amount of the same kind of resin, and this may be blended with a large amount of resin may be employed. A method in which the composition is directly mixed with a large amount of resin may be adopted. A masterbatch is a resin composition which is sufficiently and uniformly dispersed and prepared in advance in a small amount of the same kind of resin as the resin to which the photocatalyst composition is to be applied. This enables uniform dispersion to be achieved even with simple mixing.
【0014】光触媒組成物を配合した熱可塑性樹脂組成
物は押出機などで溶融混練してペレット化してもよい。
また、熱可塑性樹脂組成物が、例えば塩化ビニル樹脂組
成物やオレフィン系樹脂組成物などの場合で、粉体加工
するときは、熱可塑性樹脂組成物は粉末状とする必要が
ある。本発明の光触媒組成物が配合された熱可塑性樹脂
組成物の成形方法は特に制限はなく、押出成形法、カレ
ンダーロール成形法、射出成形法、圧縮成形法、真空成
形法、粉体成形法などにより成形することができる。The thermoplastic resin composition containing the photocatalyst composition may be melt-kneaded with an extruder or the like to form pellets.
Further, when the thermoplastic resin composition is, for example, a vinyl chloride resin composition or an olefin-based resin composition, and the powder is processed, the thermoplastic resin composition needs to be in a powder form. The molding method of the thermoplastic resin composition containing the photocatalyst composition of the present invention is not particularly limited, and includes an extrusion molding method, a calender roll molding method, an injection molding method, a compression molding method, a vacuum molding method, a powder molding method, and the like. Can be molded.
【0015】本発明の光触媒組成物を使用した樹脂成形
品の表面には、特に、波長400nm〜200nmの紫
外線が光触媒反応を活発に起こすので光源として好適で
ある。紫外線の他に可視光線、赤外線が同時に照射され
てもよい。紫外線の光源としては、太陽光、超高圧水銀
灯、キセノン灯、低圧水銀灯、ケミカルランプ、レーザ
ー、ブラックライト、殺菌灯、LED、蛍光灯などが挙
げられる。The surface of a resin molded article using the photocatalyst composition of the present invention is particularly suitable as a light source because ultraviolet rays having a wavelength of 400 nm to 200 nm actively activate a photocatalytic reaction. Visible light and infrared light may be simultaneously irradiated in addition to ultraviolet light. Examples of the ultraviolet light source include sunlight, ultrahigh-pressure mercury lamp, xenon lamp, low-pressure mercury lamp, chemical lamp, laser, black light, germicidal lamp, LED, and fluorescent lamp.
【0016】本発明の光触媒組成物を使用した樹脂成形
品の表面は、紫外線を受けて汚れ防止、殺菌、防黴、悪
臭除去、有害ガス除去、鮮度保持などの各種の光触媒反
応を起こす効果を有する。具体的な用法としては、例え
ば、自動車の排ガス中のススなどによる汚れの防止のた
めの家屋や車庫の壁面;殺菌のための病院の内壁;殺菌
のためのボールペンやふでばこ;防黴のための浴室の壁
面;ホルマリンなどによるシックハウス症候群の予防の
ための家屋の内壁;アンモニア、アミン、メチルメルカ
プタン、硫化水素、イソ吉草酸など悪臭物質の除去のた
めの家屋の内壁;自動車の排ガス中のNOX 、SO
X などの有害ガス除去のための駐車場やトンネルの内
壁;エチレン、アセトアルデヒドなどの植物成長促進物
質を除去して鮮度保持するための青果物倉庫の内壁など
が挙げられる。The surface of a resin molded article using the photocatalyst composition of the present invention is exposed to ultraviolet rays and has the effect of causing various photocatalytic reactions such as stain prevention, sterilization, mold prevention, odor removal, harmful gas removal and freshness maintenance. Have. Specific usages include, for example, walls of houses and garages for prevention of dirt due to soot and the like in exhaust gas of automobiles; inner walls of hospitals for sterilization; ball-point pens and blowers for sterilization; Wall of bathroom for bathroom; inner wall of house for prevention of sick house syndrome caused by formalin etc .; inner wall of house for removal of malodorous substances such as ammonia, amine, methyl mercaptan, hydrogen sulfide, isovaleric acid; of NO X, SO
Inner walls of parking lots and tunnels for removing harmful gases such as X ; inner walls of vegetable stores for removing plant growth promoting substances such as ethylene and acetaldehyde to maintain freshness.
【0017】[0017]
【実施例】以下に、実施例を挙げて本発明を説明する
が、本発明はこれらにより限定されるものではない。な
お、部数および%は特に表記しない限り、重量基準であ
る。光触媒として、アナターゼ型二酸化チタン(A−1
00、多木化学株式会社製、結晶子サイズ8nm)を使
用した。試験法は以下によった。(1)光触媒反応試験 内容積1500mlのパイレックス(登録商標)製セパ
ラブルフラスコに試料片1枚を置き、内部の空気をエア
ポンプにて3リットル/分で循環しつつ、同フラスコ上
方にあるケミカルランプ(FL10BL、東芝株式会社
製)より石英製の蓋を通して紫外線を強度1mW/cm
2 で照射する。この系内にエチレンをガスタイトシリ
ンジで初期濃度100ppmとなる量添加し、光触媒に
より分解して減少するエチレン濃度を時間の経過につれ
て測定する。エチレン濃度の測定は、水素炎イオン化検
出器(FID)型ガスクロマトグラフィーによる。数値
が小さいほど光触媒反応の効果が大きい。EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited thereto. Unless otherwise specified, parts and% are based on weight. As a photocatalyst, anatase type titanium dioxide (A-1)
00, manufactured by Taki Chemical Co., Ltd., crystallite size: 8 nm). The test method was as follows. (1) Photocatalytic reaction test One sample piece was placed in a 1500 ml separable flask made of Pyrex (registered trademark), and a chemical lamp was placed above the flask while circulating the air at 3 liters / minute with an air pump. (FL10BL, manufactured by Toshiba Corporation) UV light intensity 1 mW / cm through quartz lid
Irradiate at 2 . Ethylene is added to this system by a gas-tight syringe in such an amount that the initial concentration becomes 100 ppm, and the ethylene concentration which is decomposed and reduced by the photocatalyst is measured over time. The measurement of the ethylene concentration is based on a flame ionization detector (FID) type gas chromatography. The smaller the value, the greater the effect of the photocatalytic reaction.
【0018】(2)耐光性試験 UVテスター{SUV−W13、岩崎電気(株)製}に
同一種類の試験片3枚を設置し、水冷式メタルハライド
ランプ、波長295〜450nm、UV強度50mW/
cm2 、温度50℃、相対湿度70%の条件で50,
100および200時間経過時点で試験片各1枚を取り
出して表面状態を観察し、下記基準で評価する。 ○:割れまたは欠けが無い。 △:割れまたは欠けがわずか見られる。 ×:半分以上の面積に割れまたは欠けが見られる。 (2) A light resistance test UV tester (SUV-W13, manufactured by Iwasaki Electric Co., Ltd.) was equipped with three test pieces of the same type, and was provided with a water-cooled metal halide lamp, a wavelength of 295 to 450 nm, and a UV intensity of 50 mW /
cm 2 , temperature 50 ° C., and relative humidity 70%.
After 100 and 200 hours, one test piece is taken out, the surface state is observed, and the evaluation is made according to the following criteria. :: No crack or chipping. Δ: Cracks or chips were slightly observed. ×: Cracks or chips are seen in more than half the area.
【0019】実施例1 アナターゼ型二酸化チタン(A−100)とルチル型二
酸化チタン(R−820、石原産業株式会社製)とを重
量比1/9の割合で混合して光触媒組成物Aを調製し
た。次に、塩化ビニル樹脂〔ZEST 1000Z、新
第一塩ビ(株)製、塩化ビニル単独重合体、平均重合度
1050〕100部、前記光触媒組成物Aを10部およ
び三塩基性硫酸鉛/ステアリン酸鉛複合熱安定剤3部を
ヘンシェルミキサーで高速混合して得た粉末状の混合物
を、シリンダー径40mmの二軸異方向押出機により、
バレル温度175℃で3mmφ×60穴のホットカット
ダイスにてペレット化して塩化ビニル樹脂組成物Aを作
製した。得られた塩化ビニル樹脂組成物Aのペレットを
用いて、シリンダー径40mmの一軸押出機(L/D=
24、圧縮比2.5、25rpm、バレル温度170
℃、厚み1mm×幅45mmベルトダイス)により、幅
45mm、厚み1mm、長さ500mmの硬質塩化ビニ
ル樹脂製ベルトを押出成形した。これより、縦75m
m、横45mm、厚さ1mmの塩化ビニル樹脂の試験片
を5枚作製した。得られた試験片の紫外線照射下での光
触媒反応試験および耐光性試験を行った結果を表1に記
す。 Example 1 Photocatalytic composition A was prepared by mixing anatase type titanium dioxide (A-100) and rutile type titanium dioxide (R-820, manufactured by Ishihara Sangyo Co., Ltd.) at a weight ratio of 1/9. did. Next, 100 parts of a vinyl chloride resin [ZEST 1000Z, manufactured by Shin-Daiichi PVC Co., Ltd., vinyl chloride homopolymer, average degree of polymerization 1050], 10 parts of the photocatalyst composition A, and tribasic lead sulfate / stearic acid A powdery mixture obtained by high-speed mixing of 3 parts of the lead composite heat stabilizer with a Henschel mixer is subjected to a biaxially different-direction extruder having a cylinder diameter of 40 mm.
Pellets were formed at a barrel temperature of 175 ° C. with a hot cut die of 3 mmφ × 60 holes to prepare a vinyl chloride resin composition A. Using the pellets of the obtained vinyl chloride resin composition A, a single screw extruder (L / D = 40 mm in cylinder diameter) was used.
24, compression ratio 2.5, 25 rpm, barrel temperature 170
C., a 1 mm thick × 45 mm wide belt die) was used to extrude a 45 mm wide, 1 mm thick, 500 mm long belt made of a hard vinyl chloride resin. From this, height 75m
Five test pieces of vinyl chloride resin having a length of 45 mm, a width of 45 mm and a thickness of 1 mm were prepared. Table 1 shows the results of a photocatalytic reaction test and a light resistance test of the obtained test piece under ultraviolet irradiation.
【0020】比較例1 実施例1において、塩化ビニル樹脂に、光触媒組成物A
に代えてアナターゼ型ニ酸化チタン(A−100)10
部を添加した他は実施例1と同様な方法で塩化ビニル樹
脂組成物を作製したが、その直後から塩化ビニル樹脂が
分解を始め、試験片を作製することができなかった。 Comparative Example 1 In Example 1, a vinyl chloride resin was added to the photocatalyst composition A.
Anatase type titanium dioxide (A-100) 10
A vinyl chloride resin composition was prepared in the same manner as in Example 1 except that the parts were added. Immediately thereafter, the vinyl chloride resin began to decompose, and a test piece could not be prepared.
【0021】実施例2 アナターゼ型二酸化チタン(A−100)の粉末を、温
度1000℃で3時間焼成し、アナターゼ型二酸化チタ
ン/ルチル型二酸化チタンの重量比が13/87で混在
する光触媒組成物Bを調製した。次に、前記光触媒組成
物Bを使用して、実施例1と同様にして塩化ビニル樹脂
組成物Bを作製し、光触媒反応試験および耐光性試験を
行った。結果を表1に記す。 EXAMPLE 2 A powder of anatase type titanium dioxide (A-100) was calcined at a temperature of 1000 ° C. for 3 hours, and a photocatalyst composition in which the weight ratio of anatase type titanium dioxide / rutile type titanium dioxide was 13/87 was mixed. B was prepared. Next, using the photocatalyst composition B, a vinyl chloride resin composition B was prepared in the same manner as in Example 1, and a photocatalytic reaction test and a light resistance test were performed. The results are shown in Table 1.
【0022】実施例3 攪拌機および冷却ジャケットを備えた耐圧反応器に、メ
チルメタクリレート80部、n−ブチルアクリレート2
0部、連鎖移動剤t−ドデシルメルカプタン0.5部、
重合開始剤ラウロイルパーオキサイド0.1部およびメ
チルエチルケトン150部を入れ、攪拌しつつ温度75
℃にて重合反応を行った。重合転化率98%で冷却して
反応を終了した。得られたアクリル樹脂のMwは75,
000、Tgは74℃であった。重合反応終了後の反応
溶液25部を採取してロータリーエバポレーターに入
れ、50℃にて減圧下でメチルエチルケトンを一部留去
してアクリル樹脂溶液の粘度が6500mPa・sのと
き、この濃厚溶液中のアクリル樹脂100部に対して、
実施例1で調製した光触媒組成物Aを10部添加して均
一に混合した。この分散液をステンレス製の、縦75m
m、横45mm、深さ2mmの皿状容器に入れ、温度6
0℃で減圧乾燥し、縦75mm、横45mm、厚み1m
mの試験片5枚を得た。得られた試験片で光触媒反応試
験および耐光性試験を行った結果を表1に記す。 Example 3 A pressure-resistant reactor equipped with a stirrer and a cooling jacket was charged with 80 parts of methyl methacrylate and n-butyl acrylate 2
0 parts, chain transfer agent t-dodecyl mercaptan 0.5 part,
0.1 part of the polymerization initiator lauroyl peroxide and 150 parts of methyl ethyl ketone are added, and the mixture is stirred at a temperature of 75 parts.
The polymerization reaction was carried out at ℃. The reaction was terminated by cooling at a polymerization conversion of 98%. Mw of the obtained acrylic resin is 75,
000 and Tg were 74 ° C. After the polymerization reaction was completed, 25 parts of the reaction solution was collected and put into a rotary evaporator, and methyl ethyl ketone was partially distilled off under reduced pressure at 50 ° C., and when the viscosity of the acrylic resin solution was 6500 mPa · s, For 100 parts of acrylic resin,
10 parts of the photocatalyst composition A prepared in Example 1 was added and uniformly mixed. This dispersion is made of stainless steel, 75 m long
m, 45 mm wide and 2 mm deep in a dish-shaped container at a temperature of 6
Dry under reduced pressure at 0 ° C, length 75mm, width 45mm, thickness 1m
m test pieces were obtained. Table 1 shows the results of a photocatalytic reaction test and a light fastness test performed on the obtained test pieces.
【0023】比較例2 特開平9−225319号公報の記載に従い、粒子の表
面に水を吸着させたアナターゼ型二酸化チタンの表面で
シリコンテトラエトキシドを加水分解し、光触媒として
不活性なセラミックスを粒子表面に島状に付着させた光
触媒粒子(光触媒C)を調製した。次に、実施例1と同
様な操作を行って塩化ビニル樹脂組成物Cを得た。実施
例1と同様にして作製した試験片で光触媒反応試験およ
び耐光性試験を行った結果を表1に記す。 Comparative Example 2 In accordance with the description in JP-A-9-225319, silicon tetraethoxide was hydrolyzed on the surface of anatase-type titanium dioxide having water adsorbed on the surface of the particles, and the particles of inert ceramics were used as a photocatalyst. Photocatalyst particles (photocatalyst C) attached to the surface in an island shape were prepared. Next, the same operation as in Example 1 was performed to obtain a vinyl chloride resin composition C. Table 1 shows the results of the photocatalytic reaction test and the light resistance test performed on the test pieces prepared in the same manner as in Example 1.
【0024】[0024]
【表1】 [Table 1]
【0025】本発明の光触媒組成物は簡単に調製するこ
とができ、表1が示すように、これを用いた熱可塑性樹
脂組成物は紫外線照射下でエチレン濃度は低下し、か
つ、長期間光照射した成形品表面は損傷が生じていない
(実施例1〜3)。これに対し、アナターゼ型ニ酸化チ
タンのみを配合した塩化ビニル樹脂組成物は、塩化ビニ
ル樹脂が分解して成形品が得られなかった(比較例
1)。また、光触媒として不活性なセラミックスを粒子
表面に島状に付着させた光触媒粒子を使用した場合、塩
化ビニル樹脂成形品は光触媒反応活性は実施例1と同等
であるが、耐光性試験で表面に劣化が見られた(比較例
2)。The photocatalyst composition of the present invention can be easily prepared. As shown in Table 1, a thermoplastic resin composition using the photocatalyst composition has a low ethylene concentration under ultraviolet irradiation and a long-term The irradiated molded product surface is not damaged (Examples 1 to 3). On the other hand, in the case of the vinyl chloride resin composition containing only the anatase type titanium dioxide, the vinyl chloride resin was decomposed and a molded article was not obtained (Comparative Example 1). When photocatalyst particles in which inactive ceramics are attached to the particle surface in the form of islands are used as the photocatalyst, the vinyl chloride resin molded article has the same photocatalytic reaction activity as that of Example 1, but the surface shows a light resistance test. Deterioration was observed (Comparative Example 2).
【0026】[0026]
【発明の効果】本発明により、建物の壁面などに使用さ
れ、長期にわたって劣化することがなく、しかも光触媒
反応性に優れた光触媒活性表面を有する樹脂資材が提供
される。According to the present invention, there is provided a resin material having a photocatalytically active surface which is not deteriorated for a long time and has excellent photocatalytic reactivity, which is used for a wall surface of a building or the like.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // E04F 13/02 E04F 13/02 A Fターム(参考) 4F071 AA24 AA33 AB18 AB24 AB31 BC17 4G069 AA08 BA04B BA48A CA17 CD10 DA05 EA01Y EC22Y ED04 FA01 FB07 4J002 AA011 BD031 BG031 DE096 DE106 DE116 DE136 DE137 DE147 DE287 DG047 DJ007 DJ047 DJ057 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // E04F 13/02 E04F 13/02 A F term (Reference) 4F071 AA24 AA33 AB18 AB24 AB31 BC17 4G069 AA08 BA04B BA48A CA17 CD10 DA05 EA01Y EC22Y ED04 FA01 FB07 4J002 AA011 BD031 BG031 DE096 DE106 DE116 DE136 DE137 DE147 DE287 DG047 DJ007 DJ047 DJ057
Claims (3)
末からなる光触媒組成物。1. A photocatalyst composition comprising a photocatalyst and an inorganic powder inert as a photocatalyst.
光触媒組成物を配合してなる熱可塑性樹脂組成物。2. A thermoplastic resin composition obtained by blending the photocatalyst composition according to claim 1 with a thermoplastic resin.
物からなる樹脂成形品。3. A resin molded article comprising the thermoplastic resin composition according to claim 2.
Priority Applications (1)
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JP2000399164A JP2002191984A (en) | 2000-12-27 | 2000-12-27 | Photocatalyst composition and thermoplastic resin composition containing the same |
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---|---|---|---|
JP2000399164A JP2002191984A (en) | 2000-12-27 | 2000-12-27 | Photocatalyst composition and thermoplastic resin composition containing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002191984A true JP2002191984A (en) | 2002-07-10 |
Family
ID=18863995
Family Applications (1)
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JP2000399164A Pending JP2002191984A (en) | 2000-12-27 | 2000-12-27 | Photocatalyst composition and thermoplastic resin composition containing the same |
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JP (1) | JP2002191984A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7300514B2 (en) * | 2002-10-03 | 2007-11-27 | Ciments Francais | Photocatalytic granular mixture for mortar and concrete and its use |
JP2009221362A (en) * | 2008-03-17 | 2009-10-01 | Asahi Kasei Chemicals Corp | Photocatalyst coating film and photocatalyst composition |
CN112439456A (en) * | 2020-11-19 | 2021-03-05 | 西安理工大学 | Preparation of floatable porous BaTiO3Method for preparing/Ag/PVDF composite piezoelectric photocatalytic material |
-
2000
- 2000-12-27 JP JP2000399164A patent/JP2002191984A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7300514B2 (en) * | 2002-10-03 | 2007-11-27 | Ciments Francais | Photocatalytic granular mixture for mortar and concrete and its use |
US7556683B2 (en) | 2002-10-03 | 2009-07-07 | Ciments Francais | Photocatalytic granular mixture for mortar and concrete and its use |
JP2009221362A (en) * | 2008-03-17 | 2009-10-01 | Asahi Kasei Chemicals Corp | Photocatalyst coating film and photocatalyst composition |
CN112439456A (en) * | 2020-11-19 | 2021-03-05 | 西安理工大学 | Preparation of floatable porous BaTiO3Method for preparing/Ag/PVDF composite piezoelectric photocatalytic material |
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