JP2002184336A - 荷電粒子線顕微鏡装置、荷電粒子線応用装置、荷電粒子線顕微方法、荷電粒子線検査方法、及び電子顕微鏡装置 - Google Patents

荷電粒子線顕微鏡装置、荷電粒子線応用装置、荷電粒子線顕微方法、荷電粒子線検査方法、及び電子顕微鏡装置

Info

Publication number
JP2002184336A
JP2002184336A JP2000377027A JP2000377027A JP2002184336A JP 2002184336 A JP2002184336 A JP 2002184336A JP 2000377027 A JP2000377027 A JP 2000377027A JP 2000377027 A JP2000377027 A JP 2000377027A JP 2002184336 A JP2002184336 A JP 2002184336A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
sample
lens
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000377027A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002184336A5 (enrdf_load_stackoverflow
Inventor
Kuniyasu Nakamura
邦康 中村
Kimio Kanda
公生 神田
Mitsugi Sato
佐藤　　貢
Mikio Ichihashi
幹雄 市橋
Hiroyuki Shinada
博之 品田
Ruriko Tokida
るり子 常田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2000377027A priority Critical patent/JP2002184336A/ja
Priority to PCT/JP2001/010415 priority patent/WO2002049066A1/ja
Publication of JP2002184336A publication Critical patent/JP2002184336A/ja
Publication of JP2002184336A5 publication Critical patent/JP2002184336A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2000377027A 2000-12-12 2000-12-12 荷電粒子線顕微鏡装置、荷電粒子線応用装置、荷電粒子線顕微方法、荷電粒子線検査方法、及び電子顕微鏡装置 Pending JP2002184336A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000377027A JP2002184336A (ja) 2000-12-12 2000-12-12 荷電粒子線顕微鏡装置、荷電粒子線応用装置、荷電粒子線顕微方法、荷電粒子線検査方法、及び電子顕微鏡装置
PCT/JP2001/010415 WO2002049066A1 (fr) 2000-12-12 2001-11-29 Microscope a faisceau de particules chargees, dispositif d'application de ce faisceau, procede d'utilisation du microscope en question, procede d'inspection via un tel faisceau, et microscope electronique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000377027A JP2002184336A (ja) 2000-12-12 2000-12-12 荷電粒子線顕微鏡装置、荷電粒子線応用装置、荷電粒子線顕微方法、荷電粒子線検査方法、及び電子顕微鏡装置

Publications (2)

Publication Number Publication Date
JP2002184336A true JP2002184336A (ja) 2002-06-28
JP2002184336A5 JP2002184336A5 (enrdf_load_stackoverflow) 2005-03-03

Family

ID=18845805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000377027A Pending JP2002184336A (ja) 2000-12-12 2000-12-12 荷電粒子線顕微鏡装置、荷電粒子線応用装置、荷電粒子線顕微方法、荷電粒子線検査方法、及び電子顕微鏡装置

Country Status (2)

Country Link
JP (1) JP2002184336A (enrdf_load_stackoverflow)
WO (1) WO2002049066A1 (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6963067B2 (en) 2003-01-06 2005-11-08 Hitachi High-Technologies Corporation Scanning electron microscope and sample observing method using it
JP2006173021A (ja) * 2004-12-17 2006-06-29 Keyence Corp 電子顕微鏡、電子顕微鏡の操作方法、電子顕微鏡操作プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器
US7633064B2 (en) 2006-07-07 2009-12-15 Hitachi High-Technologies Corporation Electric charged particle beam microscopy and electric charged particle beam microscope
US7825377B2 (en) 2003-03-31 2010-11-02 Hitachi High-Technologies Corporation Electron beam apparatus with aberration corrector
JP2012018812A (ja) * 2010-07-08 2012-01-26 Keyence Corp 拡大観察装置及び拡大観察方法、拡大観察用プログラム並びにコンピュータで読み取り可能な記録媒体
US8207513B2 (en) 2004-12-20 2012-06-26 Hitachi High-Technologies Corporation Charged particle beam apparatus
JP2015162265A (ja) * 2014-02-25 2015-09-07 株式会社ホロン 静電型回転場偏向器を用いた荷電粒子線装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019212766A (ja) * 2018-06-05 2019-12-12 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
CN111024739B (zh) * 2019-12-31 2023-03-21 长江存储科技有限责任公司 透射电子显微镜图像畸变的表征方法及表征装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0175933A1 (de) * 1984-09-21 1986-04-02 Siemens Aktiengesellschaft Rasterlinsen-System ohne Ablenkfarbfehler zur Materialbearbeitung mit Korpuskularstrahlen
JPS62184750A (ja) * 1986-02-07 1987-08-13 Jeol Ltd 電子線装置
JPH0820237B2 (ja) * 1987-03-09 1996-03-04 株式会社日立製作所 電子顕微鏡用画像計測・検査装置
JPS63284747A (ja) * 1987-05-14 1988-11-22 Nikon Corp 試料像表示装置
JP3356554B2 (ja) * 1994-07-27 2002-12-16 株式会社東芝 多極子レンズ電子光学装置
JP3400285B2 (ja) * 1997-03-03 2003-04-28 日本電子株式会社 走査型荷電粒子ビーム装置
JP2000048752A (ja) * 1998-05-27 2000-02-18 Jeol Ltd 電子ビ―ム検査装置とその調整用試料と調整方法およびコンタクトホ―ルの検査方法
US6614026B1 (en) * 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6963067B2 (en) 2003-01-06 2005-11-08 Hitachi High-Technologies Corporation Scanning electron microscope and sample observing method using it
US7825377B2 (en) 2003-03-31 2010-11-02 Hitachi High-Technologies Corporation Electron beam apparatus with aberration corrector
JP2006173021A (ja) * 2004-12-17 2006-06-29 Keyence Corp 電子顕微鏡、電子顕微鏡の操作方法、電子顕微鏡操作プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器
US8207513B2 (en) 2004-12-20 2012-06-26 Hitachi High-Technologies Corporation Charged particle beam apparatus
US7633064B2 (en) 2006-07-07 2009-12-15 Hitachi High-Technologies Corporation Electric charged particle beam microscopy and electric charged particle beam microscope
JP2012018812A (ja) * 2010-07-08 2012-01-26 Keyence Corp 拡大観察装置及び拡大観察方法、拡大観察用プログラム並びにコンピュータで読み取り可能な記録媒体
JP2015162265A (ja) * 2014-02-25 2015-09-07 株式会社ホロン 静電型回転場偏向器を用いた荷電粒子線装置

Also Published As

Publication number Publication date
WO2002049066A1 (fr) 2002-06-20

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