JP2002176001A5 - - Google Patents

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Publication number
JP2002176001A5
JP2002176001A5 JP2000370783A JP2000370783A JP2002176001A5 JP 2002176001 A5 JP2002176001 A5 JP 2002176001A5 JP 2000370783 A JP2000370783 A JP 2000370783A JP 2000370783 A JP2000370783 A JP 2000370783A JP 2002176001 A5 JP2002176001 A5 JP 2002176001A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000370783A
Other languages
Japanese (ja)
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JP2002176001A (ja
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Publication date
Application filed filed Critical
Priority to JP2000370783A priority Critical patent/JP2002176001A/ja
Priority claimed from JP2000370783A external-priority patent/JP2002176001A/ja
Publication of JP2002176001A publication Critical patent/JP2002176001A/ja
Publication of JP2002176001A5 publication Critical patent/JP2002176001A5/ja
Withdrawn legal-status Critical Current

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JP2000370783A 2000-12-05 2000-12-05 熱処理装置 Withdrawn JP2002176001A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000370783A JP2002176001A (ja) 2000-12-05 2000-12-05 熱処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000370783A JP2002176001A (ja) 2000-12-05 2000-12-05 熱処理装置

Publications (2)

Publication Number Publication Date
JP2002176001A JP2002176001A (ja) 2002-06-21
JP2002176001A5 true JP2002176001A5 (ru) 2008-01-24

Family

ID=18840609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000370783A Withdrawn JP2002176001A (ja) 2000-12-05 2000-12-05 熱処理装置

Country Status (1)

Country Link
JP (1) JP2002176001A (ru)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100962054B1 (ko) 2000-12-05 2010-06-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 제조 방법
JP4815600B2 (ja) * 2005-09-06 2011-11-16 株式会社テラセミコン 多結晶シリコン薄膜製造方法及びその製造装置
CN115347125A (zh) * 2022-10-18 2022-11-15 中国华能集团清洁能源技术研究院有限公司 一种钙钛矿材料快速原位退火的方法及退火装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5938584A (ja) * 1982-08-30 1984-03-02 ウシオ電機株式会社 照射加熱炉の運転方法
JPS6229131A (ja) * 1985-07-31 1987-02-07 Hitachi Ltd 薄膜形成方法
JPH069193B2 (ja) 1987-02-17 1994-02-02 信越石英株式会社 減圧熱処理装置に用いられる反応管
JPH05198507A (ja) * 1991-09-21 1993-08-06 Semiconductor Energy Lab Co Ltd 半導体作製方法
JPH06268242A (ja) 1993-03-17 1994-09-22 Matsushita Electric Ind Co Ltd シリコン基板の製造方法および結晶質シリコン太陽電池
JPH0729839A (ja) * 1993-07-15 1995-01-31 Sony Corp 熱処理装置及びこれを用いた熱処理方法
JP3212060B2 (ja) 1993-09-20 2001-09-25 株式会社半導体エネルギー研究所 半導体装置およびその作製方法
JP3311522B2 (ja) 1994-05-30 2002-08-05 三洋電機株式会社 半導体装置の製造方法
JPH08264472A (ja) * 1995-03-24 1996-10-11 Hitachi Ltd 半導体装置の製造方法及び半導体製造装置
JP3539821B2 (ja) 1995-03-27 2004-07-07 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3071129B2 (ja) * 1995-08-04 2000-07-31 三洋電機株式会社 半導体装置の製造方法
US5773329A (en) * 1996-07-24 1998-06-30 International Business Machines Corporation Polysilicon grown by pulsed rapid thermal annealing
JPH1197706A (ja) 1997-09-23 1999-04-09 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP4625183B2 (ja) * 1998-11-20 2011-02-02 ステアーグ アール ティ ピー システムズ インコーポレイテッド 半導体ウェハのための急速加熱及び冷却装置
JP2000260710A (ja) 1999-03-11 2000-09-22 Seiko Epson Corp 半導体装置の製造方法及びアニール装置

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