JP2002175972A - Automated aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an automated aligner which minimizes the causes of dust attachment by reducing the number of delivering substrates, and can invert the substrates, even without an inversion mechanism for special use for the purpose, and can be improved in throughput. SOLUTION: The automatic aligner 1 aligns a substrate W and a mask M and then exposes the substrate W to light via an optical system 50, to form a prescribed pattern on the substrate W. The automatic aligner 1 comprises a first holder unit 10, which consists of a plurality of first holder sections 11A-11D, disposed so as to face respectively, oppositely to the positions, where the substrate is received and where the substrate is exposed to light; a rotation driving means 18 for rotating the first holder unit and stopping the rotation of the unit; and a first exposure mechanism 20, disposed adjacent to the first holder unit. At least the first holder unit or the first exposure mechanism is provided with a first movement means 25 for moving the first holder sections or a first translucent plate in the abutting direction.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to an automatic exposure apparatus for exposing a substrate to a predetermined pattern using ultraviolet rays through a mask.

[Prior art]

Conventionally, various automatic exposure apparatuses have been proposed for exposing a substrate to a predetermined pattern by irradiating ultraviolet rays having a predetermined wavelength. For example, a conventional automatic exposure apparatus
A substrate transport mechanism that transports a substrate is known to transport a substrate by reciprocating a substrate transport position by a handler having a suction pad, or a substrate transport mechanism that transports a substrate by a feed roller or a feed belt. I have.

Further, there has been proposed an automatic exposure apparatus which performs an aligning operation and an exposure operation in a state in which a substrate is vertical. As shown in FIG. 9A, the automatic exposure apparatus 80
A mechanism W for carrying in and delivering the substrate W, and the delivery mechanism 81
Substrate holder 82 which receives substrate W in a vertical state from
A mask holding mechanism 83 for the mask M arranged at a position where the substrate holder 82 is moved;
3, an imaging light 85 for performing an imaging operation by the imaging means 84, and a substrate holder 8
An optical system 86 for irradiating parallel light to the second substrate W via a mask M is provided. Note that the automatic exposure apparatus 80 is configured such that the delivery mechanism 81 performs a reversing operation of the substrate W.

Further, as shown in FIG. 9B, an automatic exposure apparatus 90 having another configuration includes a substrate W loading mechanism 91.
A holder unit 92 for receiving the substrate W vertically from the loading mechanism 91; an exposure unit 93 having a mask M provided at a position where the holder unit 92 has been moved;
An optical system 9 for irradiating parallel light to a contact position between the substrate W and the mask M;
5 and an unloading mechanism 96 that unloads the substrate W that has been exposed on both sides. Note that the automatic exposure apparatus 90 performs the reversing operation of the substrate W using the handlers 94, 94.

[0005]

However, there is room for further improvement in the conventional automatic exposure apparatus, and the following problems must be solved. (1) A conventional automatic exposure apparatus repeatedly performs a series of processes such as substrate transport, positioning (alignment), and exposure when its substrate transport mechanism is operating via a handler or the like. Since the substrate is transferred, the number of times the substrate is transferred increases, so a transfer space, a transfer time, and the like are required, and the opportunity for dust to adhere to the substrate increases. In addition, the number of causes such as a drop due to an increase in the number of times of transferring the substrate is increased.

(2) The conventional automatic exposure apparatus is provided with a separate substrate reversing structure when both surfaces of the substrate are exposed. Further, even in an apparatus for aligning and exposing a substrate in a vertical state, when performing a substrate reversing operation, the substrate is once returned to a horizontal position and reversed, so that an installation space for performing the reversing operation is required. However, the size of the entire apparatus becomes large and complicated, which is inconvenient.

(3) In the conventional automatic exposure apparatus, the number of times of delivery by a handler or the like increases, and the tact time (time required for a unit process) due to the time for confirming the suction of the substrate, the time for waiting for delivery, and the like becomes longer. However, there is room for improvement in the improvement of the processing capability (throughput) per unit time of the substrate. Even in an apparatus that exposes a substrate in a vertical state, the substrate inversion operation is performed by returning the substrate to a horizontal state. It has been desired to reduce the time associated with this.

The present invention has been made in view of the above problems, and minimizes the cause of dust adhesion by reducing the number of times of transferring a substrate. An object of the present invention is to provide an automatic exposure apparatus which can be inverted and further improves the processing capacity (throughput) of a substrate per unit time.

[0009]

SUMMARY OF THE INVENTION The present invention is configured as follows to solve the above-mentioned problem. That is, in an automatic exposure apparatus for aligning a substrate and a mask and performing a predetermined pattern on the substrate through an optical system,
A first holder including a plurality of first holders disposed to face the substrate transfer position and the exposure processing position, respectively;
A holder unit; a rotation drive unit for stopping the rotation of the first holder unit; and a first exposure mechanism provided adjacent to the first holder unit, wherein the first holder unit receives a substrate. Holding means for holding, the first exposure mechanism includes a first light-transmitting plate for holding a mask, and the first holder unit or the first exposure mechanism has at least one of: An automatic exposure apparatus having a first moving means for moving the first holder portion and the first light transmitting plate in the contact direction is configured.

[0010] With this configuration, the incoming substrate is held by one of the plurality of first holders. Then, the first holder unit holding the substrate faces the first light transmitting plate having the mask of the first exposure mechanism when the first holder unit is rotated by the first rotation driving means. Then, the first holder portion or the first light transmitting plate makes the mask and the substrate come into contact with each other via the first moving means, and after the alignment operation is performed, the exposure processing operation is performed. Note that the transfer position refers to a carry-in position and a carry-out position of the substrate.

In an automatic exposure apparatus having a first exposure stage and a second exposure stage for aligning a substrate with a mask and exposing a predetermined pattern on the substrate via an optical system, the first exposure stage A first holder unit including a plurality of first holder units, a first exposure mechanism provided adjacent to the first holder unit,
A first rotation driving unit for stopping the rotation of the first holder unit, wherein the second exposure stage is provided adjacent to the first holder unit and includes a plurality of second holder units. A holder unit, a second exposure mechanism provided adjacent to the second holder unit,
Second rotation driving means for stopping the rotation of the second holder unit.

The two holders have holding means for receiving and holding the substrate, and the two exposure mechanisms respectively have a first light transmitting plate and a second mask for holding a first mask. A second translucent plate for holding the first holder unit or the first exposing mechanism, at a position facing the first translucent plate, at least one of the first holder unit and the first translucent plate in a contact direction. The first moving means for moving and the first holder unit or the second holder unit move at least one of the first holder unit or the second holder unit in a contact direction at a position facing the first holder unit or the second holder unit. The reversing delivery means for reversing and delivering the substrate and the second holder unit or the second exposure mechanism are provided at least at a position facing the second holder unit or the second light transmitting plate. It was also constructed as an automatic exposure apparatus and a second moving means for moving the one in contact direction.

[0013] With this configuration, one of the plurality of first holder units that has received the substrate (No. 1) is stopped at a predetermined position by the rotation of the first holder unit by the rotation driving means. And the first light transmitting plate that holds the mask of the first exposure mechanism. Then, the mask and the substrate are brought into contact with each other by the first moving means, and the alignment operation and the exposure processing operation are performed. At this time, the next substrate (No. 2) is delivered to another first holder portion facing the substrate loading position. Then, the substrate on which one-sided exposure operation has been completed (No. 1)
Is held by the first holder while facing the second holder of one of the plurality of second holders. Further, the substrate (No. 1) is delivered to the second holder portion in an inverted state by the inversion delivery means. At this time, the substrate (No. 2) is brought into contact with the first driving means at a position facing the mask of the first light transmitting plate, and the alignment operation and the exposure processing operation are performed. Further, the other first holder portion receives the substrate (No. 3) at the substrate loading position.

On the other hand, the second holder unit is rotated by the second rotation driving means and stopped at a predetermined position, so that the second holder unit faces the second light transmitting plate having the mask of the second exposure mechanism. Further, the substrate (No. 1) of the second holder portion and the mask of the second translucent member are brought into contact with each other by the second moving means, so that the aligning operation and the exposure operation are performed, and the exposure operation on the back surface of the substrate (No. 1) is completed. Then, the second holder unit is rotated by the rotation driving means and stopped at a predetermined position, so that the substrate (No. 1) can be unloaded from the second holder unit to the unloading side. As described above, the substrate is held by the plurality of first holder units of the first holder unit and the plurality of second holder units of the second holder unit, and the substrate is received, the aligning operation, the exposure processing operation, the reversing operation, and the We are delivering.

[0015] The first holder unit of the automatic exposure apparatus may include a plurality of first holder portions, a first position for receiving the substrate from a loading side, and a second position for facing the first light transmitting plate. And a third position facing the second holder portion of the second holder unit, and a fourth position between the first position and the third position, and the second holder unit further comprises: A plurality of the second holder portions, a fifth position facing the third position, a sixth position facing the second light-transmitting plate, a seventh position facing a position where the substrate is carried out, It was configured to be provided at an eighth position between the fifth position and the seventh position.

With this configuration, when the first holder unit is rotated and stopped by the first rotation driving means, the first holder unit holding the substrate is moved to the carry-in position, the first exposure mechanism, and the second exposure unit. It can be arranged at a position facing the holder unit. When the second holder unit is rotated and stopped by the second rotation driving unit, the second holder unit holding the substrate is moved to the first holder unit and the second holder unit.
It can be arranged at a position facing the exposure mechanism and the unloading position.

Further, the automatic exposure apparatus is provided with a delivery mechanism for delivering the substrate to a first holder portion of the first holder unit at a position where the substrate is carried in, and the substrate is carried out. Said second position
The receiving mechanism for receiving the substrate from the second holder section of the holder unit is provided.

With this configuration, the substrate can be transferred to the first holder by the transfer mechanism, and the substrate can be received from the second holder by the receiving mechanism, and the processing posture of the substrate can be set freely.

[0019]

Embodiments of the present invention will be described below with reference to the drawings. Here, the automatic exposure apparatus will be described as an example of an apparatus that continuously performs exposure processing on both surfaces of a substrate. FIG. 1 is a plan view showing main parts of the automatic exposure apparatus, FIG. 2 is a front view showing main parts of the automatic exposure apparatus, and FIG.
FIG. 4 is a side view showing a main part of the automatic exposure mechanism, and FIG.
5B is a plan view and a side view of a loading mechanism of the automatic exposure apparatus, and FIGS. 5A and 5B are a partial cross-sectional view and a partial front view showing an alignment mechanism of the first and second exposure mechanisms of the automatic exposure apparatus. FIG. 6 is a front view of a light transmitting plate of the automatic exposure apparatus.

As shown in FIGS. 1 to 3, the automatic exposure apparatus 1 includes a loading section 2 provided at a position where a substrate W is loaded,
A first exposure stage A for receiving the substrate W from the loading unit 2 and exposing one surface of the substrate W, and a second exposure stage A provided adjacent to the first exposure stage for exposing the other surface of the substrate W Exposure stage B and second exposure stage B
And an optical system 50 for irradiating the exposure stages A and B with light including ultraviolet rays.

The first exposure stage A has a plurality (here, four).
A first holder unit 10 including first base units 11A to 11D, a first rotation driving unit 18 for stopping the rotation of the first holder unit 10, and a first holder 11B of the first holder unit 10. Do (adjacent)
And a first exposure mechanism 20 provided.

The second exposure stage B includes a second holder unit 30 provided adjacent to the first holder unit 10 and a second rotation driving means 38 for stopping the rotation of the second holder unit 30. With the second holder unit 30B of the second holder unit 30 facing (adjacent to)
The second exposure mechanism 40 provided and the unloading unit 6 for the substrate W provided facing the second holder unit 30C of the second holder unit 30
0.

As shown in FIG. 2 and FIG.
Is a feed roller 3 on which the substrate W is placed and fed to a predetermined position.
And a pre-positioning mechanism 5 for pressing the end face of the substrate W placed on the feed roller 3 to perform pre-positioning work.
A lifting plate 4 for lifting the substrate W pre-positioned by the pre-positioning mechanism 5 from the feed roller 3
And a loading mechanism 6 for sucking and holding the substrate W lifted from the feed roller 3 by the elevating plate 4 to rise vertically and deliver it to the first holder portion 11A.

The loading mechanism 6 includes a suction pad 6a for sucking the substrate W, a suction support 6b for supporting the suction pad 6a, a rising arm 6c for raising the suction support 6b, and a The rising arm 6c is connected to the first holder 1
A moving unit 6d for moving to the 1A (11B to 11D) side is provided. Here, the loading mechanism 6 is formed separately from the elevating plate 4, but is transferred to the first holder portions 11A (11B to 11D) by rotating the base end side of the elevating plate 4. It is good also as a structure which can be performed.

As shown in FIGS. 1 to 3, the first holder unit 10 is configured such that the side portions of the first holder portions 11A to 11D are arranged adjacent to each other and are arranged on the peripheral surface of a frame 17 having a cross-shaped cross section. Have been. Also, the first holder unit 10
Each of the first holder portions 11 is provided with a rotating shaft provided on upper and lower mounting plates 10a and 10b.
A to 11D are configured to rotate and stop every 90 degrees. Note that it is convenient to use the first rotation driving means 18 such as a servomotor which can control the number of rotations and perform precise rotation driving.

As shown in FIG. 1, each of the first holder portions 11A to 11D has a first position facing the carry-in portion 2, a second position facing the first exposure mechanism 20, and a second holder unit. It is arranged to face a third position facing 30 and a fourth position between the first position and the third position. Then, as shown in FIG. 3, each of the first holder portions 11A to 11D is vertically supported and has a flat plate 12 having a suction hole 13 as a holding means for sucking and holding the substrate W, and holds the flat plate 12. Frame part 14, a slide support part 15 for supporting the frame part 14 to the frame 17 side of the first holder unit 10 so as to be able to move forward and backward, and a flat plate 1.
2 and a push pin 16 protruding from the lower end side. Note that, when performing the operation of transferring the substrate W, the frame body portion 14 is preferably provided with a buffer portion in order to minimize an impact on the substrate W.

The flat plate 12 is provided with a vacuum pump, a leak valve and the like (not shown) at appropriate positions, and sucks and holds the substrate W in a vertical state through suction holes (including recesses such as grooves) 13. It is configured to be able to. Further, as shown in FIG. 2, each of the first holder portions 11A to 11A is located at a position facing the second unit holder 30, which is the reverse transfer position of the substrate W.
When D arrives, the pushing pin 16 of the first holder portion 11A is configured to engage with the engaging portion 28a of the one holder driving portion 28 of the reversing delivery means 27.

As shown in FIGS. 1 and 2, the slide support portion 15 is configured such that support legs provided on the left and right ends of the flat plate 12 at upper and lower positions of the flat plate 12 slide on the guide portion. Note that the slide support 15 is always
An elastic member (such as a spring) (not shown) for urging each of the first holder portions 11A to 11D is provided on the side 7.

For this reason, after each of the first holders 11A to 11D moves forward through the push pin 15, the first holder 11A (11B to 1B) is moved to the base position on the frame 17 side.
1D), when the operation of the engaging portion 28a of the holder driving portion 28 is moved to the frame 17, the first holder portions 11A to 11D can be moved by the elastic members (not shown) of the slide supporting portion 15. ) To move backward.

It should be noted that the above-mentioned reversal delivery means 27 is provided with the first
Holder 11A (11B-11D) and second holder 31
Holder driving units 28 and 29 are provided below the position facing A (31B to 31D). Each of the holder driving units 28 and 29 includes engaging portions 28a and 29a for engaging the push pins 16 and 36, lot portions 28b and 29b connected to the engaging portions 28a and 29a, and lot portions 28b and 29b. 28
b and 29b for operating cylinders 28c and 29b. The reversing / transfer means 27 includes a first holder 11A (11B to 11D) and a second holder 31A.
By arranging them at the positions facing (31B to 31D),
All the holder portions (11A to 11D, 31A to 31D) are convenient because they do not have a means for moving forward and backward.

The configuration of the second holder unit 30 other than the arrangement in the second holder portions 31A to 31D is the same as the configuration of the first holder unit 10 described above, and thus the description thereof is omitted. Also, the second holder portions 31A-
31D is a fifth position facing the first holder unit;
It is arranged so as to face a sixth position facing the second exposure mechanism 40, a seventh position facing the unloading section 60, and an eighth position between the fifth position and the seventh position.

Next, as shown in FIGS. 1 and 3, the first exposure mechanism 20 includes a light transmitting plate 21 (first light transmitting plate) for holding a mask M (first mask), An alignment mechanism 22 for supporting and aligning and moving the support frame 21; a support frame 23 for supporting the alignment mechanism 22;
And imaging means 24 provided at a predetermined position. The first exposure mechanism 20 includes a first holder unit 1 facing the first exposure unit 20.
Here, a first moving unit 25 for moving the light transmitting plate 21 to the 1A (11B to 11D) side is provided here.

As shown in FIGS. 5A and 5B, the light transmitting plate 21 includes a light transmitting plate main body 21b, a frame body 21a provided on the outer periphery of the light transmitting plate main body 21b, and a light transmitting plate. Body 21
b, a holding mechanism (not shown) for holding the mask M at a predetermined position, and a bank rubber (seal member for vacuum-sucking the substrate W and the mask M) provided around the mask M 21
c. The translucent plate 21 is configured so that the position of the mask M can be aligned and moved in the X, Y, and θ directions by an alignment mechanism 22 provided at the position of the frame body 21a.

The alignment mechanism 22 has one end thereof connected to the frame 2.
1a, and the other end is supported on the support frame portion side. As shown in FIGS. 5 (a) and 5 (b), the alignment mechanism 22 includes an X-rail base 2 fixed to a frame body 21a.
2a, an X-direction rail 22b provided on the X-rail base 22a, a Y-rail base 22c slidably supported by the X-direction rail 22b, and a drive motor 22d provided on the Y-rail base 22c. And a Y-direction rail 22e slidably supported by the Y-rail base 22c.
And a support base 22f for fixing the Y-direction rail 22e.
And The support base 22f supports a rotation support shaft 22g disposed therein, a rotation portion 22h mounted on the rotation support shaft 22g, and the rotation portion 22h rotatably. A rotation fixing portion 22j fixedly supported by the light transmitting plate 21.

As shown in FIG. 6, the drive motor 22d of the aligning mechanism 22 is arranged so that the Y-rail base 22c can be aligned and moved in the X direction. Some are arranged in a direction that can be aligned and moved. By appropriately combining the moving directions of the drive motors 22d, the position of the mask M is also moved in the θ direction. Although the drive motor 22d has been described as being provided at three locations here, two or four or more drive motors may be provided as long as the alignment movement of the mask M can be moved in the X, Y, and θ directions.

As shown in FIG. 3, the support frame 23 includes a mounting frame 23a for supporting the other end of the alignment mechanism 22,
A moving rail of the imaging means 24 provided on the mounting frame 23a is provided.

As shown in FIG. 2 and FIG.
Reference numeral 4 denotes a CCD camera or the like for taking an image of the mask mark Mm (at least two places) of the mask M and the work mark Wm (at least two places) of the substrate W. Mark Mm
It is connected to detect and calculate the position information of the work mark Wm. Each drive motor 22d of the matching mechanism 22 is
The position of the mask M is moved by the drive control. In addition, as shown in FIG. 2, both marks Wm and Mm are configured so that an operator can visually recognize the marks on the display D.

As shown in FIG. 3, the first moving means 25 comprises:
It is for moving the mask M of the light transmitting plate 21 to the substrate W side, and includes a support leg 25a attached to a peripheral position of the support frame portion 23, and a guide portion 25b for holding and guiding the support leg 25a. , Support leg 25a through this guide portion 25b.
Is provided with a motor 25c for moving the motor forward and backward. The first moving means 25 moves an elastic member (not shown) for reducing an impact when the mask M of the light transmitting plate 21 contacts the substrate W at an appropriate position between the guide portion 25b and the support leg 25a. Have.

The second moving means 38 and the second exposing mechanism 40 are the same as the first moving means 18 and the first exposing mechanism 20 and will not be described.

As shown in FIG. 1 and FIG.
Is a discharge lamp 51 for irradiating light containing ultraviolet light of a predetermined wavelength.
And an elliptical reflecting mirror 52 attached to the discharge lamp 51
A first reflecting mirror 53 that changes the optical path of the irradiation light from the discharge lamp 51 and the elliptical reflecting mirror 52; and a fly-eye that receives the reflected light from the first reflecting mirror 53 and makes the light (distribution) uniform. A lens 54 and a second reflecting mirror 5 for distributing and radiating light emitted from the fly-eye lens 54 to one and the other.
5 and collimator reflecting mirrors 56 and 57 for reflecting the light from the second reflecting mirror 55 as parallel light to the substrate W side.

As shown in FIGS. 1 and 2, the unloading section 60 for the substrate W is provided with a feed roller 61 and a second stop which rises from below the feed roller 61 and stops facing the feed roller 61. And a receiving mechanism 62 for receiving the substrate W from the holder 31A (31B to 31D).
The receiving mechanism 62 includes a suction unit 63 for holding the substrate W by suction, and a support arm 6 for supporting the suction unit 63.
4 and a rotation mechanism (not shown) for rotating the support arm 64. The suction section 63 is configured to have a suction pad (suction hole) on a base (including a plate shape) in a state where the suction section 63 can enter between the feed rollers 61.

Next, the processing state of the substrate W will be described mainly with reference to FIGS. First, FIG. 2 and FIG.
As shown in (1), when the substrate W is placed on the feed roller 3 and sent to a predetermined position and stopped, the end face is pushed by the operation of the pre-positioning mechanism 5 to perform pre-positioning work. Then, the substrate W is lifted from the feed roller 3 by the elevating plate 4 and delivered to the loading mechanism 6.
As shown in FIGS. 2 and 7 (b) and 7 (c), when the loading mechanism 6 receives the substrate W on the suction pad 6a, the loading mechanism 6 vertically raises the rising arm 6c and moves the first holder by the moving unit 6d. The substrate W is transferred to the unit 11A. Then, FIG.
As shown in the figure, the rising arm 6c that has delivered the substrate W
Retreat to the original position and wait.

As shown in FIG. 2 and FIG. 7 (e), the first holder 11A receiving the substrate W is rotated by the first rotation unit 18 by 90 degrees by the first holder unit 10 to perform the first exposure. It stops at the position where the mechanism 20 faces. As shown in FIGS. 3 and 7F, the first exposure mechanism 20
Stops at the position where the first holder 11A faces,
The light transmitting plate 21 is moved forward by the first moving means 25, and the mask M and the substrate W are brought into contact with each other and brought into close contact by a contact mechanism (vacuum contact mechanism) not shown.

Then, as shown in FIG.
Thus, the matching state of both marks Wm and Mm (see FIG. 2) is recognized. If the marks Wm and Mm are out of the allowable range, the close contact between the substrate W and the mask M is released, and the position of the mask M is moved by the alignment mechanism 22. Then, the substrate W and the mask M are again brought into close contact with each other and checked by the image pickup means 24.
Exposure processing operation is performed via the “0”. When the exposure processing operation is completed, the first exposure mechanism moves the first exposure mechanism as shown in FIG.
The moving means 25 separates from the first holder 11A and returns to the original position and waits.

On the other hand, as shown in FIGS.
When the first holder unit 11A is arranged at the position of the first exposure mechanism 20, the next first holder unit 11B arranged in the input unit 2
Is transferred and received by the loading mechanism 6 after the substrate W on which the preliminary positioning operation as described above has been performed.

As shown in FIGS. 7 (g), (h) and FIG. 3, when the first exposure mechanism 20 returns to the original position, the first holder unit 10 is rotated by 90 degrees by the first rotation driving means 18. By doing so, the first holder 11A is arranged at a position facing the second holder 31A of the second holder unit 30. At this time, the first holder unit 11B is disposed at a position that holds the next substrate W and faces the first exposure mechanism 20, and further, the first holder unit 11C is positioned at a position that faces the loading unit 2 of the substrate W. Placed in

As shown in FIG. 7 (h), FIG. 8 (a) and FIG. 2, when the first holder 11A and the second holder 31A holding the substrate W whose one side has been exposed face each other, the pressing is performed. The moving pins 16 and 36 are engaged with the engaging portions 28 of
a, 29a. Therefore, by operating the holder driving portions 28 and 29 of the reversing delivery means 27, the engaging portions 28a and 29a move the push pins 16 and 36 forward, and the holders 11A and 31A receive the substrate W. Move to be able to pass. That is, both of the holder portions 11A and 31A move to a state where they come into contact with the substrate W. At this time, it is convenient to provide a buffer for minimizing the impact on the substrate W.

As shown in FIGS. 8B and 2, the holder portions 11 A and 31 A which have delivered the substrate W are engaged with the engaging portions 28 by the holder driving portions 28 and 29 of the reverse transfer means 27.
By moving a and 29a toward the respective frame bodies 17 and 37, the elastic members (not shown) provided on the slide support portions 15 and 35 retreat respectively.

At this time, as shown in FIG.
The holder 11B and the first exposure mechanism 20 perform exposure processing on the next substrate W by the above-described operation. Further, the first holder unit 11 </ b> C receives the third substrate W from the loading mechanism 6.

As shown in FIG. 8 (c) and FIG.
When the substrate W is transferred from the holder 11A to the second holder 31A, the substrate W is in a state where the substrate W is turned upside down. And the second holder unit 30
The second rotation drive means 38 rotates 90 degrees and stops.
Therefore, as shown in FIG. 8D, the second holder 31A holding the substrate W is arranged at a position facing the second exposure mechanism 40. Then, the second exposure mechanism contacts the light transmitting plate 41 having the mask M with the substrate W via the second moving unit 45, and performs the alignment operation (the same operation as that described with reference to FIGS. 7F and 3). Then, an exposure processing operation is performed. At this time, as shown in FIG. 1, the light irradiation from the optical system 50 directs the parallel light toward the second exposure mechanism 40 by changing the angle of the second reflecting mirror.

As shown in FIG. 8D, while the exposure processing is being performed in the second holder unit 30, the first holder portion 11B that holds the next substrate W that has already been subjected to the exposure processing on one side is formed. The second holder unit 30 is disposed at a position facing the second holder unit 31B via the first rotation drive unit 18. Then, the first substrate W holding the third substrate W
The holder unit 11C is arranged at a position facing the first exposure mechanism 20. Further, a new substrate W is transferred by the loading mechanism 6 to the first holder portion 11 </ b> D at a position facing the loading section 2.

Then, as shown in FIG. 8E and FIG. 3, the substrate W held by the first holder 11B is
By the operation described in (a), it is delivered to the second holder 31B in a state of being turned upside down. The second of the second holder unit 30
When the respective exposure processing and the reversal delivery processing in the holders 31A and 31B are completed, the second holder unit 30 rotates the substrate W by 90 degrees by the second rotation driving unit 38 to remove the substrate W on which both surfaces of the substrate W have been exposed. Second holder 3 to be held
1A is arranged at a position facing the unloading section. Then, as shown in FIG. 8F and FIG. 3, the second holder portion 31A at the position facing the unloading portion 60 is configured such that the support arm 64 of the transfer mechanism 62, which has been waiting, is rotated by a rotation mechanism (not shown). To transfer the substrate W to the suction section 63. The delivery mechanism 62 that has received the substrate W places the substrate W on the feed roller 61, returns to the original position, and ends the delivery operation.

As shown in FIGS. 8E and 8F,
When the delivery mechanism 62 is receiving the substrate of the second holder 31A, the alignment and exposure processing operations are performed on the substrate W held by the first holder 11C on the first holder unit 10 side. At the same time, a new substrate W is transferred from the loading unit 2 to the first holder unit 11D.

The optical system 50 includes a second reflecting mirror 54.
The first exposure mechanism 20 and the second exposure mechanism 40
The exposure operation is performed one by one by alternately irradiating parallel light. When it is necessary to shut off the irradiation light from the discharge lamp 51 as necessary, it is performed by a shutter mechanism (not shown). It may be configured.

As described above, the substrate W is mounted on each of the first holder portions 11.
A to 11D and the second holders 31A to 31D are sequentially held, and the aligning operation and the exposure processing operation are performed by the two exposure mechanisms 20 and 40.
The substrate W is transferred between the second holder unit 30 and the second holder unit 30 by being turned over by the reversing and transferring means 27, transferred from the unloading unit 60 to the feed roller 61 via the transfer mechanism 62, and then unloaded.

Therefore, the work is always performed at each position, and it is possible to perform a series of exposure-related work while minimizing wasted time from carry-in to carry-out. In addition, since the time spent for the exposure processing work at the positions of the two exposure mechanisms 20 and 40 is the largest compared with the other work time, other work is performed based on the operation time by the two exposure mechanisms 20 and 40. If you do it,
No time is lost.

Although the arrangement of each holder in the present invention has been described as being from the first position to the fourth position, the structure of the skeleton is pentagonal and each holder is moved from the first position to the fifth position (from the sixth position). There may be a configuration in which the alignment work and the exposure processing work are performed at different places, with five places up to the tenth position).

Further, if the automatic exposure apparatus comprises a carry-in section, a first holder unit, a first exposure mechanism, and a carry-out section, a first holder provided in the first holder unit is provided. The portion may be provided on a skeleton of a triangle (from the first position to the third position).

Further, the automatic exposure apparatus according to the present invention
Although the transport exposure is performed in a state where the substrate is vertical, the substrate W may be configured in a horizontal state. Although the automatic exposure apparatus has been described as a double-sided automatic exposure apparatus, the loading, the first exposure stage, the optical system, and the unloading section may be used as an entire configuration depending on the use mode.

Further, in the apparatus according to the present invention, when the substrate is transported and exposed in the vertical direction, since the carry-in portion is provided with the preliminary positioning mechanism, the aligning operation by the aligning mechanism is performed quickly and accurately. be able to.

In the present invention, the means for holding the substrate in each holder portion has been described by exemplifying vacuum suction. However, other negative pressure suction means such as Bernoulli suction means (ejector mechanism or the like (in this case, Can be held and moved even if the degree of adhesion of the substrate is small) or a mechanical support mechanism. Further, when the mask and the substrate are imaged by the imaging means, or when the exposure processing is performed, the mask and the substrate may be adhered by a method other than the vacuum adhesion, or a proximity method may be used. is there. Further, in the alignment operation, the mask side is aligned and moved, but the substrate side may be aligned and moved.

[0062]

The present invention has the following advantages because of the construction described above. (1) The automatic exposure apparatus uses the first one of a plurality of substrates.
The substrate can be transported to each processing position by receiving it in the holder unit and rotating the first holder unit by the first rotation drive unit. Therefore, the automatic exposure apparatus can minimize causes such as dropping, deformation, and a delivery error due to the attachment and transfer of dust by minimizing the delivery of the substrate. In addition, the automatic exposure apparatus minimizes the transfer of the substrate, so that the transfer time to each position can be quickly performed, and the throughput can be improved. In addition, by making the transporting and processing posture of the substrate vertical, the cause of the adhesion of dust to the substrate can be almost eliminated.

(2) The automatic exposure apparatus uses a first holder unit having a plurality of first holder portions and a second holder unit having a plurality of second holder portions adjacent to each other to perform exposure processing on both surfaces of the substrate. With this configuration, it is possible to transfer the substrate between the first holder portion and the second holder portion without providing a dedicated mechanism for the inversion operation of the substrate. For this reason, the automatic exposure apparatus minimizes the transfer of the substrate and optimizes the tact time (the time required for unit processes (transfer, transport, etc.) in the apparatus) as an apparatus for exposing both sides of the substrate to improve the throughput. Enables improvement.

(3) In the automatic exposure apparatus, since both holders are arranged at four positions and work is performed on the substrate at each position, the tact time can be optimized in addition to the above effects. , It is possible to further improve the throughput.

(4) Since the automatic exposure apparatus is provided with a loading mechanism in the loading section and a delivery mechanism in the unloading section, if a preliminary positioning mechanism for the substrate is provided in the loading section, the pre-positioned state is maintained. Can be transported,
Since the substrate can be received from the second holder unit at the unloading unit, there is no need to have a mechanism for transferring the substrate to each holder unit and each holder unit side, and a configuration excellent in operability can be achieved. Further, the substrate can be held correspondingly from thick to thin.

[Brief description of the drawings]

FIG. 1 is a plan view showing a main part of an automatic exposure apparatus according to the present invention.

FIG. 2 is a front view showing a main part of the automatic exposure apparatus according to the present invention.

FIG. 3 is a side view showing a main part of the automatic exposure apparatus according to the present invention.

FIGS. 4A and 4B are a plan view and a side view of an input mechanism of the automatic exposure apparatus according to the present invention.

FIGS. 5A and 5B are a partial cross-sectional view and a partial front view showing an alignment mechanism of first and second exposure mechanisms of the automatic exposure apparatus according to the present invention.

FIG. 6 is a front view of a light transmitting plate of the automatic exposure apparatus according to the present invention.

FIGS. 7A to 7H are schematic diagrams illustrating the operation of the automatic exposure apparatus according to the present invention.

FIGS. 8A to 8F are schematic diagrams illustrating the operation of the automatic exposure apparatus according to the present invention.

FIGS. 9A and 9B are schematic diagrams showing a configuration of a conventional automatic exposure apparatus.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Automatic exposure apparatus 2 Carry-in part 3 Feed roller 4 Elevating plate 5 Pre-positioning mechanism 6 Feeding mechanism 10 1st holder unit 10a, 10b mounting plate 11A-11D 1st
Holder part 12, 32 Flat plate 13, 33 Suction hole (holding means) 14, 34 Frame part 15, 35 Slide support part 16, 36 Pushing pin 17, 37 Frame 18 First rotation driving means 20 First
Exposure mechanism 21, 41 Light transmitting body (first light transmitting plate, second light transmitting plate) 22, 42 Alignment mechanism 23, 43 Supporting frame portion 24, 44 Imaging means 25 First
Moving means 27 Reverse transfer means 28, 29 Holder driving unit 30 Second holder unit 31A to 31D
1st holder part 38 2nd rotation drive hand 40 2nd
Exposure mechanism 45 Second moving means 50 Optical system 41 Collimator reflecting mirror 60 Unloading section 61 Feed roller 62 Receiving mechanism A First exposure stage B Second
Exposure stage D Display M Mask (first mask, second mask) Mm Mask mark W Substrate Wm Work mark

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shinichi Matsunaga 3-34-1, Chofugaoka, Chofu-shi, Tokyo F-term in Oak Manufacturing Co., Ltd. (reference) 2H097 AA12 BA10 CA12 DB20 DC01 GA00 KA03 KA29 5F046 AA21 BA01 CC01 CC10 CD01 CD04

Claims (4)

[Claims] 1. An automatic exposure apparatus for aligning a substrate and a mask and exposing a predetermined pattern on the substrate via an optical system, comprising: a plurality of substrates each facing a transfer position of the substrate and a position to be exposed; A first holder portion is arranged and provided.
A holder unit; first rotation driving means for stopping the rotation of the first holder unit; and a first exposure mechanism provided adjacent to the first holder unit. Holding means for receiving and holding the image, the first exposure mechanism includes a first light transmitting plate for holding a mask, and the first holder unit or the first exposure mechanism has at least one of them. An automatic exposure apparatus having a first moving means for moving the first holder portion and the first light transmitting plate in a contact direction. 2. An automatic exposure apparatus, comprising: a first exposure stage and a second exposure stage for aligning a substrate and a mask and exposing a predetermined pattern on the substrate via an optical system; Comprises a first holder unit having a plurality of first holder portions, a first exposure mechanism provided adjacent to the first holder unit, and a first rotation drive for stopping the rotation of the first holder unit. Means, the second exposure stage is provided adjacent to the first holder unit, and a second holder unit provided with a plurality of second holder units, and provided adjacent to the second holder unit. A second exposure mechanism; and second rotation driving means for stopping the rotation of the second holder unit. The holder sections receive and hold the substrate. The exposure mechanism includes a first light transmitting plate for holding a first mask and a second light transmitting plate for holding a second mask, respectively, and the first holder unit or The first exposure mechanism includes a first moving unit configured to move at least one of the first holder unit and the first light transmitting plate in a contact direction at a position facing the first exposure mechanism, and the first holder unit or the first moving unit. The two-holder unit is a reversing delivery unit for reversing and delivering the substrate by moving at least one of the first holder unit and the second holder unit in a contact direction at a position facing the second holder unit, The holder unit or the second exposure mechanism includes a second moving unit for moving at least one of the second holder unit or the second light transmitting plate in a contact direction at a position facing the holder unit or the second exposure mechanism. Automatic exposure apparatus according to. 3. The first holder unit comprises: a first position for receiving the first holder portion from the loading side of the substrate; a second position for facing the first light transmitting plate; and the second holder unit. A third position facing the second holder portion of the
The second holder unit is arranged at a fourth position between the third position and the third position, and the second holder unit moves the second holder unit to a fifth position facing the third position, and the second light transmitting plate. A sixth position facing the substrate, a seventh position facing the position for unloading the substrate, and an eighth position between the fifth position and the seventh position. 3. The automatic exposure apparatus according to 2. 4. A loading mechanism for delivering the substrate to the first holder unit of the first holder unit at a position where the substrate is carried in, and at a position where the substrate is carried out, The automatic exposure apparatus according to claim 2 or 3, further comprising a receiving mechanism for receiving the substrate from the second holder unit of the second holder unit.