JPH05182891A - Positioning apparatus of substrate - Google Patents

Positioning apparatus of substrate

Info

Publication number
JPH05182891A
JPH05182891A JP4105297A JP10529792A JPH05182891A JP H05182891 A JPH05182891 A JP H05182891A JP 4105297 A JP4105297 A JP 4105297A JP 10529792 A JP10529792 A JP 10529792A JP H05182891 A JPH05182891 A JP H05182891A
Authority
JP
Japan
Prior art keywords
substrate
substrates
positioning
size
holding member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4105297A
Other languages
Japanese (ja)
Other versions
JPH07114233B2 (en
Inventor
Shinobu Tokushima
忍 徳島
Tatsuhiro Tsuda
樹宏 津田
Taro Ototake
太朗 乙武
Akio Nishikata
昭雄 西方
Yasuhisa Matsumoto
康久 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10529792A priority Critical patent/JPH07114233B2/en
Publication of JPH05182891A publication Critical patent/JPH05182891A/en
Publication of JPH07114233B2 publication Critical patent/JPH07114233B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an apparatus wherein substrates in any size can be positioned stably by providing the following: a positioning member which is arranged so as to be faced with the edge of a substrate and which acts as a reference; and a pressure member which presses the substrate. CONSTITUTION:A holding member 1 is raised slightly at a reception position; a substrate 10 in a minimum size is held on a mounting face 1a; a substrate in an intermediate size is held on a mounting face 1b; a substrate in a maximum size is held on a mounting face 1c; movement stands 2 to 7 are released by using air cylinders 24, 26, 31 for release use. Then, the vacuum suction of the holding member 1 is released; the movement stands 2, 4, 5 on the reference side are moved by a spring force; a positioning member 11 is brought into contact with the end part on the corresponding side of the substrate 10; the movement stands 3, 6, 7 on the opposite side are moved; the positioning member 11 is brought into contact with the corresponding side of the substrate 10. Since the pressure force of the positioning member 11 with reference to the substrate 10 is decided by setting the spring force of a tension spring 23 and a torsion spring 29, not only small substrates but also large substrates can be prealigned stably.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体素子製造用のフ
ォトマスクまたはレチクルなどの矩形状の基板、あるい
は半導体ウエハなどの円形状の基板の位置決め装置に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a positioning device for a rectangular substrate such as a photomask or reticle for manufacturing a semiconductor element, or a circular substrate such as a semiconductor wafer.

【0002】[0002]

【従来の技術】近年、半導体素子の多種多様化に連れ
て、フォトマスク又はレチクル(以下、基板という)の
種類も増加している。基板は搬送過程において一度位置
決め(プリアライメント)する必要がある。これは、工
程の自動化に際し、基板外径に対する位置決め用マーク
がずれると、ウエハ上に露光されたパターンも基板外径
に対し位置がずれることとなり、位置決め用マークの検
索時間もしくは工程時間にも影響を及ぼすからである。
従って、基板は再現性良く位置決めされる必要がある。
2. Description of the Related Art In recent years, the number of types of photomasks or reticles (hereinafter referred to as substrates) has increased along with the diversification of semiconductor devices. It is necessary to position (pre-align) the substrate once in the transportation process. This is because if the positioning mark is displaced with respect to the substrate outer diameter during process automation, the position of the pattern exposed on the wafer is also displaced with respect to the substrate outer diameter, affecting the positioning mark search time or process time. Because it affects.
Therefore, the substrate needs to be reproducibly positioned.

【0003】このため、基板を扱う多くの装置には、基
板の端面と当接する複数の位置決めピン(ローラ)を持
ったプリアライメント機構が組み込まれ、基板を位置決
めピンに機械的に押し当てることで事前の位置決めを行
なっている。
For this reason, many devices that handle substrates incorporate a pre-alignment mechanism having a plurality of positioning pins (rollers) that come into contact with the end face of the substrate, and mechanically press the substrate against the positioning pins. Pre-positioning is done.

【0004】[0004]

【発明が解決しようとする課題】ところが従来の位置決
め装置は同一サイズの基板にしか対応できず、異なるサ
イズの基板に対しては、そのローラピンの付け替え作業
に伴いチャンバー内に塵埃を持ち込む可能性があるなど
の不都合があった。尚、ここでいうチャンバーとは、そ
の種の位置決め装置が組み込まれた露光装置や検査装置
を正常な環境で収納するものを言う。
However, the conventional positioning device is only applicable to substrates of the same size, and for substrates of different sizes, dust may be brought into the chamber when the roller pins are replaced. There was some inconvenience. The chamber referred to here means a chamber for accommodating an exposure apparatus and an inspection apparatus in which such a positioning device is incorporated in a normal environment.

【0005】本発明は、複数種類のサイズの基板の各々
について、位置決め用のローラピンなどを付け替えるこ
ともなく、どのようなサイズの基板に対しても安定な位
置決めができる装置を提供することを目的としている。
It is an object of the present invention to provide a device capable of performing stable positioning on any size substrate without replacing the positioning roller pins or the like for each of a plurality of types of size substrates. I am trying.

【0006】[0006]

【課題を解決するための手段】本発明は、外形形状が相
似で互いにサイズの異なる少なくとも2枚の基板の夫々
を択一的にプリアライメントする位置決め装置であり、
基板の端面と対向配置されて基準となる位置決め部材
(2,4,5及び11,13,15) と、基板をその位置決め部材の方
向へ押圧する押圧部材(3,6,7及び11,13,15) とを備えた
装置に関するものである。
SUMMARY OF THE INVENTION The present invention is a positioning device for selectively pre-aligning at least two substrates having similar outer shapes and different sizes from each other.
Positioning member that is arranged as a reference and is opposed to the end surface of the substrate
The present invention relates to an apparatus including (2,4,5 and 11,13,15) and a pressing member (3,6,7 and 11,13,15) for pressing a substrate toward a positioning member thereof.

【0007】そして本発明では、押圧部材として、サイ
ズの異なる基板(10,12,14)の夫々の端面と当接可能な当
接子(位置決め部材:11,13,15)と、この当接子を基板の
面と平行な面内で所定の軸(28)を中心として回転させる
移動体(移動台:6,7) と、この移動体に付勢力を与える
付勢手段(捩じりばね29)とを設け、さらに当接子が基
板を押圧して位置決め部材(2,4,6) の方へ当接させたと
き、移動体(6,7) の回動角(θ123)を基板のサイ
ズに応じて異ならせると共に、基板のサイズが大きくな
るに従って当接子の押圧力が大きくなるように、移動体
(6,7) の回動軸(28)と当接子との各配置を定めるように
してある。
Further, in the present invention, as pressing members, abutting elements (positioning members: 11, 13, 15) capable of abutting the respective end faces of the substrates (10, 12, 14) of different sizes, and the abutting members. A moving body (moving table: 6, 7) for rotating the child about a predetermined axis (28) in a plane parallel to the surface of the substrate, and a biasing means (torsion spring) for applying a biasing force to the moving body. 29), and when the contactor presses the substrate to bring it into contact with the positioning member (2, 4, 6), the rotation angle (θ 1 , θ) of the moving body (6, 7) is (2 , θ 3 ) is changed according to the size of the substrate, and the moving body is moved so that the pressing force of the contactor increases as the size of the substrate increases.
Each arrangement of the rotation shaft (28) of (6, 7) and the contactor is determined.

【0008】[0008]

【作用】本発明においては、押圧部材を回動方式にし、
サイズの異なる基板に対して、その基板の大きさ、すな
わち質量に応じた大きさの押圧力を発生させることがで
きる。通常、大きなサイズの基板は質量も大きいので、
大きな押圧力で基板を基準となる位置決めピン(ロー
ラ)の方へ押圧する必要があるが、本発明による位置決
め装置の構成によれば、簡単な構造で基板サイズの大小
に適した押圧力が得られる。
In the present invention, the pressing member is of the rotating type,
It is possible to generate a pressing force having a size corresponding to the size of the substrates, that is, a size corresponding to the mass, with respect to the substrates having different sizes. Usually, a large size substrate has a large mass, so
Although it is necessary to press the substrate toward the reference positioning pin (roller) with a large pressing force, the structure of the positioning device according to the present invention provides a pressing force suitable for the size of the substrate with a simple structure. Be done.

【0009】[0009]

【実施例】以下、図に示す実施例について説明する。図
1は本発明の実施例の概略斜視図である。また、この実
施例では5,6,7インチの3種類のサイズの相似形基
板に適用する場合を例にとって示してある。
Embodiments Embodiments shown in the drawings will be described below. FIG. 1 is a schematic perspective view of an embodiment of the present invention. Further, in this embodiment, the case of applying to similar-shaped substrates of three sizes of 5, 6 and 7 inches is shown as an example.

【0010】図1において、10は最小サイズで示される
基板である。基板10は上下動可能な保持部材1によって
ほぼ水平に保持される。他のサイズの基板も同様に保持
されるが、この保持機構については後述する。
In FIG. 1, reference numeral 10 denotes a substrate shown in the minimum size. The substrate 10 is held substantially horizontally by the holding member 1 which can move up and down. Substrates of other sizes are held similarly, but the holding mechanism will be described later.

【0011】保持部材1の板幅はその上に最小サイズの
基板10を載置したとき基板10が両側に充分大きくはみ出
すような大きさに形成されている。
The plate width of the holding member 1 is formed so that when the minimum size substrate 10 is placed on the holding member 1, the substrate 10 protrudes sufficiently to both sides.

【0012】図示しない基台上において、適当数の移動
台2〜7が全サイズの基板を包囲するように配置され、
基板の対応の辺に対して進退または回転可能に構成され
ている。すなわち、移動台2,3は、図示しないガイド
に沿って保持部材1の板幅方向(矢印A方向)に進退可
能であり、各々の移動台2,3の下面に突設されたピン
21と基台上に突設されたピン22との間に引張ばね23を張
設して各移動台2,3に基板の対応辺に向かう力を付与
している。また、各移動台2,3には開放用のエアシリ
ンダ24がロッド25を介して連結されている。
On a base (not shown), an appropriate number of movable bases 2 to 7 are arranged so as to surround all size substrates,
It is configured to be able to move back and forth or rotate with respect to the corresponding side of the substrate. That is, the movable bases 2 and 3 can be moved back and forth in the plate width direction (arrow A direction) of the holding member 1 along a guide (not shown), and the pins provided on the lower surface of each movable base 2 and 3 can be protruded.
A tension spring 23 is stretched between the pin 21 and a pin 22 protruding from the base to apply a force to the movable bases 2 and 3 toward the corresponding side of the substrate. An air cylinder 24 for opening is connected to each of the moving bases 2 and 3 via a rod 25.

【0013】次に、保持部材1の先端側に配置される移
動台4,5は連結板8にて一体に連結され、保持部材1
の長手方向(矢印B方向)に進退可能である。連結板8
の下方には移動台2,3の場合と同様の方式によって引
張ばね(図示せず)及び開放用のエアシリンダ26がロッ
ド27を介して連結されている。
Next, the movable bases 4 and 5 arranged on the front end side of the holding member 1 are integrally connected by a connecting plate 8, and the holding member 1
It is possible to move back and forth in the longitudinal direction (direction of arrow B). Connection plate 8
A tension spring (not shown) and an opening air cylinder 26 are connected via a rod 27 to the lower part of the table by a method similar to that of the movable tables 2 and 3.

【0014】移動台4,5の反対側に配置される移動台
6,7は枢軸28を中心として矢印C方向に回転可能であ
り、枢軸28と基台間に介装された捩りばね29により常に
基板の対応辺に向かう力が付与されている。また枢軸28
には水平方向にピン30が突設され、ピン30には開放用の
エアシリンダ31のロッド32が連結されている。この回転
方式による移動台6,7の構成は省スペース化を考慮し
たものである。
The movable bases 6 and 7 arranged on the opposite sides of the movable bases 4 and 5 are rotatable about the pivot 28 in the direction of the arrow C, and by a torsion spring 29 interposed between the pivot 28 and the base. A force is always applied to the corresponding side of the substrate. Axis 28
A pin 30 is provided so as to project in the horizontal direction, and a rod 32 of an air cylinder 31 for opening is connected to the pin 30. The structure of the movable bases 6 and 7 based on this rotation method is in consideration of space saving.

【0015】以上の移動台2〜7上には、さらに図2を
も参照して、最小サイズの基板10に対応する位置決め部
材11と、中間サイズの基板12に対応する位置決め部材13
と、最大サイズの基板14に対応する位置決め部材15とが
基板サイズの小から大にかけて順次上方へ所定量ずつ高
さ位置を異にし、かつ基板サイズに合わせて水平方向に
離して階段状に設けられている。
With reference to FIG. 2 as well, a positioning member 11 corresponding to the minimum size substrate 10 and a positioning member 13 corresponding to the intermediate size substrate 12 are provided on the above-mentioned movable tables 2 to 7.
And the positioning member 15 corresponding to the maximum size substrate 14 is provided in a stepwise manner in which the height position is sequentially increased upward by a predetermined amount from the small substrate size to the large substrate size, and is horizontally separated according to the substrate size. Has been.

【0016】各位置決め部材11,13,15は例えばローラ
ピンから構成され、図3に示すように、ある一つの移動
台上に偏心軸33を介して本体34が枢支され、本体34の上
面中心に立設した軸35にベアリング36を介して基板の端
面に当接するローラ37を軸支してなるものである。
Each of the positioning members 11, 13, 15 is composed of, for example, a roller pin, and as shown in FIG. 3, a main body 34 is pivotally supported on a certain movable table via an eccentric shaft 33, and the center of the upper surface of the main body 34 is centered. A roller 37, which abuts on the end face of the substrate via a bearing 36, is axially supported by a shaft 35 standing upright.

【0017】38は本体34の偏心軸33の止めねじで、ロ
ーラ37の水平方向の位置を微調整後セットするものであ
る。ローラ37の水平方向の位置は軸35と偏心軸33との間
の相対偏心量のために本体34を偏心軸33のまわりに回動
することにより微小変位可能である。
Reference numeral 38 denotes a set screw of the eccentric shaft 33 of the main body 34, which is set after finely adjusting the horizontal position of the roller 37. The horizontal position of the roller 37 can be finely displaced by rotating the main body 34 around the eccentric shaft 33 due to the amount of relative eccentricity between the shaft 35 and the eccentric shaft 33.

【0018】各位置決め部材11,13,15の垂直方向の位
置(高さ位置)調整は、本体34の長さを変えることによ
ってローラ37の軸支位置を順次高くしていけばよい。な
お、移動台6,7に設けるローラピンは必ずしも偏心し
たものである必要はない。
The vertical position (height position) of each positioning member 11, 13, 15 may be adjusted by sequentially increasing the axial support position of the roller 37 by changing the length of the main body 34. It should be noted that the roller pins provided on the movable tables 6 and 7 do not necessarily have to be eccentric.

【0019】図4は、上述した回転方式の移動台6,7
上に設置した位置決め部材11,13,15と各サイズの基板
10,12,14との枢軸28に対する位置関係を示す図であ
る。枢軸28は位置決め部材11,13,15の対応基板に対す
る押圧力が夫々の基板サイズに応じた荷重となるような
位置に設置されている。
FIG. 4 shows the above-mentioned rotary type moving bases 6 and 7.
Positioning members 11, 13 and 15 installed on top and boards of each size
It is a figure which shows the positional relationship with respect to the axis 28 with 10,12,14. The pivot 28 is installed at a position where the pressing force of the positioning members 11, 13, 15 against the corresponding substrate becomes a load corresponding to each substrate size.

【0020】いま、枢軸28の中心より位置決め部材11,
13,15の各中心までの距離をLi(i=1,2,3)、対応の基板
10,12,14に対応する押圧力をFi(i=1,2,3)、そしてL
i とFi とのなす角をθi(i=1,2,3)とすれば、 Fi = (T/Li)・cos[(π/2)-θi] (i=1,2,3) (ただし、Tは捻りばね29のトルクで一定) となる。
Now, the positioning member 11, from the center of the pivot 28,
The distance to the center of 13 and 15 is Li (i = 1,2,3), the corresponding board
The pressing force corresponding to 10, 12, 14 is Fi (i = 1,2,3), and L
If the angle between i and Fi is θi (i = 1,2,3), then Fi = (T / Li) · cos [(π / 2) -θi] (i = 1,2,3) ( However, T is constant with the torque of the torsion spring 29).

【0021】ここで、F1,F2,F3 をそれぞれの基板の
質量に応じた力に近似させてLi およびθi を決定し、
枢軸28の中心位置を決定するものである。すなわち、小
サイズの基板10の場合にはF1 は小さく、大サイズの基
板14の場合にはF3 は大きくなる。
Here, F 1 , F 2 , and F 3 are approximated to the forces corresponding to the mass of the respective substrates to determine Li and θi,
The center position of the axis 28 is determined. That is, F 1 is small in the case of the small-sized substrate 10 and F 3 is large in the case of the large-sized substrate 14.

【0022】なお、移動台2,4,5上の位置決め部材
11,13,15側を位置決めのための基準とするために、移
動台2及び連結板8に対するストッパ(図示せず)を基
台上に設けることもできる。また、移動台2側の引張ば
ね23を移動台3側の引張ばね23よりも強力にし、移動台
4,5側の引張ばね(図示せず)の力を移動台6,7側
の捩りばね29の力よりも強く設計することによって、結
果的に基準側の位置決め部材11,13,15は他側の位置決
め部材よりも大きな荷重で対応の基板を押圧することが
できる。このため基準側の位置決め部材11,13,15は位
置決めストッパにより正しい位置に停止した後も、他側
の位置決め部材の力の影響を受けて基準位置より変位す
ることがなくなる。
Positioning members on the movable tables 2, 4, 5
A stopper (not shown) for the movable table 2 and the connecting plate 8 may be provided on the base so that the sides 11, 13, 15 are used as a reference for positioning. Further, the tension spring 23 on the moving base 2 side is made stronger than the tension spring 23 on the moving base 3 side, and the force of the tension spring (not shown) on the moving bases 4 and 5 side is set to the torsion spring on the moving bases 6 and 7. By designing stronger than the force of 29, the positioning members 11, 13, 15 on the reference side can consequently press the corresponding substrate with a larger load than the positioning members on the other side. For this reason, the positioning members 11, 13, 15 on the reference side are not displaced from the reference position under the influence of the force of the positioning member on the other side even after the positioning members 11, 13, 15 are stopped at the correct positions by the positioning stoppers.

【0023】図5は保持部材1の基板10,12,14の保持
機構を示す斜視図であり、最小サイズの基板10の載置面
1a,中間サイズの基板12の載置面1b及び最大サイズの基
板14の載置面1cが水平に階段状に設けられている。そし
て各載置面1a,1b,1cにはそれぞれの基板を吸着するた
めの吸引口40a,40b,40c が設けられ、それぞれ図示しな
いホースを介して真空発生装置に連結されている。
FIG. 5 is a perspective view showing a holding mechanism for holding the substrates 10, 12 and 14 of the holding member 1, and is a mounting surface of the substrate 10 of the smallest size.
1a, a mounting surface 1b of a medium-sized substrate 12 and a mounting surface 1c of a maximum-sized substrate 14 are horizontally provided in a stepwise manner. The mounting surfaces 1a, 1b, 1c are provided with suction ports 40a, 40b, 40c for sucking the respective substrates, and are connected to a vacuum generator via hoses (not shown).

【0024】この実施例の作用を説明すれば、保持部材
1は、所定の受入位置でわずかに上昇することによっ
て、所要の基板を対応の載置面にほぼ水平に吸着し保持
することができる。すなわち、最小サイズの基板10は載
置面1a上に、中間サイズの基板12は載置面1b上に、最大
サイズの基板14は載置面1c上に保持される。
Explaining the operation of this embodiment, the holding member 1 is capable of slightly advancing at a predetermined receiving position to adsorb and hold a required substrate substantially horizontally on a corresponding mounting surface. .. That is, the minimum size substrate 10 is held on the mounting surface 1a, the intermediate size substrate 12 is held on the mounting surface 1b, and the maximum size substrate 14 is held on the mounting surface 1c.

【0025】次に、保持部材1上に保持された基板を保
持部材1に対し位置決めするには、例えば最小サイズの
基板10について説明すると、基板10を保持部材1により
本実施例装置上に搬入してそのまま所定の位置まで加工
させる。この基板10の加工動作に先立って本実施例装置
のすべての移動台2〜7を基板10及び保持部材1との干
渉を避けるべく開放用のエアシリンダ24,26,31によっ
て外側に開放させておくことはもちろんである。
Next, in order to position the substrate held on the holding member 1 with respect to the holding member 1, for example, the smallest size substrate 10 will be explained. The substrate 10 is carried into the apparatus of this embodiment by the holding member 1. Then, it is processed as it is to a predetermined position. Prior to the processing operation of the substrate 10, all the moving bases 2 to 7 of the apparatus of this embodiment are opened to the outside by air cylinders 24, 26 and 31 for opening in order to avoid interference with the substrate 10 and the holding member 1. Needless to say.

【0026】次いで、保持部材1の真空吸着を解除して
基準側の移動台2,4,5をそれぞれのばね力によって
基板10に向かって移動させ、それらの移動台上に設けら
れている位置決め部材11を基板10の対応の辺の端部に当
接させる。その後、対向側の移動台3,6,7を上記と
同様にばねの力によって移動させ、それらの移動台上に
設けられている位置決め部材11を基板10の対応の辺に当
接させる。
Next, the vacuum suction of the holding member 1 is released, and the moving bases 2, 4, 5 on the reference side are moved toward the substrate 10 by the respective spring forces, and the positioning provided on these moving bases is performed. The member 11 is brought into contact with the ends of the corresponding sides of the substrate 10. After that, the moving bases 3, 6, 7 on the opposite side are moved by the force of the spring in the same manner as described above, and the positioning members 11 provided on these moving bases are brought into contact with the corresponding sides of the substrate 10.

【0027】基板10に対する位置決め部材11の押圧力は
引張ばね23および捻りばね29のばね力を設定することに
よって定まるので、かくして基板10は保持部材1に保持
された状態でその保持部材1に対し外形を位置決めされ
る。その後、保持部材1の真空吸着を行なって基板10を
吸着させてから、各移動台2〜7をもとの位置に退避さ
せる。退避の順序は移動台3,6,7が先で移動台2,
4,5が後である。
Since the pressing force of the positioning member 11 against the substrate 10 is determined by setting the spring force of the tension spring 23 and the torsion spring 29, the substrate 10 is thus held by the holding member 1 against the holding member 1. The outer shape is positioned. After that, the holding member 1 is vacuum-sucked to suck the substrate 10, and then the movable tables 2 to 7 are retracted to their original positions. In the order of evacuation, the mobile units 3, 6, 7 come first, then the mobile units 2,
4, 5 are later.

【0028】中間サイズの基板12あるいは最大サイズの
基板14の位置決めの場合も、それぞれの位置決め部材1
3,15がそれよりも小さいサイズの基板に対して所定量
だけ上方に高くなった第2の高さ位置を有するので、上
記の場合と同様に位置決めを行なうことができる。
Also in the case of positioning the intermediate size substrate 12 or the maximum size substrate 14, the respective positioning members 1
Since 3 and 15 have a second height position which is elevated by a predetermined amount with respect to a substrate of a smaller size, positioning can be performed in the same manner as in the above case.

【0029】以上のように、基板のサイズに合わせて複
数の位置決め部材11,13,15を設けることによって移動
台2〜7の移動ストロークがわずかになると共に、異な
るサイズの基板であっても、常にその中心は装置の定位
置に位置決めされる。
As described above, by providing the plurality of positioning members 11, 13, and 15 in accordance with the size of the substrate, the moving stroke of the moving bases 2 to 7 becomes small, and even if the substrates are different sizes, Its center is always located at a fixed position on the device.

【0030】次に、図6は本実施例装置を搬送工程に組
み込んだ場合のシステム全体を示すものであり、同図に
おいて、保持部材1を上下動させるためのエレベーショ
ン機構41は上部に保持部材1を旋回させるための回転駆
動部42を備えている。回転駆動部42はスライダー43を支
持しており、このスライダー43はアーム方式に形成され
た保持部材1を水平方向に進退させる。回転駆動部42の
周囲には、ロード側のマスクカセット44と、アンロード
側のマスクカセット45と、露光装置及び検査装置側のマ
スクホルダ46と、図1に示した実施例装置を取りつけた
プリアライメント装置(基台)47とが配置されている。
マスクカセット44および45には複数枚の基板Mを保持部
材1の厚さ分以上の間隔を空けて段積み状態で装填可能
である。またマスクホルダ46はXY移動ステージを含ん
でいる。
Next, FIG. 6 shows the entire system when the apparatus of this embodiment is incorporated in the carrying process. In FIG. 6, the elevation mechanism 41 for moving the holding member 1 up and down is held at the upper part. A rotary drive unit 42 for rotating the member 1 is provided. The rotary drive unit 42 supports a slider 43, and the slider 43 moves the holding member 1 formed in an arm system in the horizontal direction. Around the rotation drive unit 42, a mask cassette 44 on the loading side, a mask cassette 45 on the unloading side, a mask holder 46 on the exposure apparatus and inspection apparatus side, and a preparatory apparatus equipped with the embodiment apparatus shown in FIG. An alignment device (base) 47 is arranged.
A plurality of substrates M can be loaded in the mask cassettes 44 and 45 in a stacked state with an interval equal to or larger than the thickness of the holding member 1. The mask holder 46 also includes an XY moving stage.

【0031】図6のシステムによる搬送シーケンスを説
明すると次のとおりである。なお、図6において保持部
材1の載置部中心の軌跡を矢印で示す。
The transport sequence by the system of FIG. 6 will be described as follows. Note that, in FIG. 6, the locus of the center of the mounting portion of the holding member 1 is indicated by an arrow.

【0032】先ず、保持部材1が点P0 にあるときか
ら、回転駆動部42によって保持部材1を反時計方向に回
転させ、点P1 にて位置決めした後、スライダー43によ
って点P1 から保持部材1を伸ばし、基板Mの下方に進
入させる。次いで保持部材1を上方にわずかに持ち上げ
て真空吸着してから点P2 まで後退させる。その後、点
2 から点P3 まで保持部材1を時計方向に回転し、そ
のまま真っ直ぐにプリアライメント装置47まで降下さ
せ、基板Mのサイズに応じた高さ位置で保持部材1の真
空吸着を解除して、前述のように基板Mの位置決め(プ
リアライメント)を行なう。
[0032] First, the holding since the holding member 1 is at point P 0, rotates the retaining member 1 in a counterclockwise direction by the rotary drive unit 42, after positioning at point P 1, from the point P 1 by the slider 43 The member 1 is stretched and made to enter below the substrate M. Next, the holding member 1 is slightly lifted upward to be vacuum-sucked, and then retracted to the point P 2 . After that, the holding member 1 is rotated clockwise from the point P 2 to the point P 3 and lowered straight to the pre-alignment device 47, and the vacuum suction of the holding member 1 is released at the height position corresponding to the size of the substrate M. Then, the substrate M is positioned (pre-alignment) as described above.

【0033】位置決め完了後、再度、真空吸着を行ない
つつ保持部材1を点P4 まで上昇させてからスライダー
43によって腕を伸ばし、マスクホルダ46の上方で停止さ
せてからわずかに降下させることによって基板Mをマス
クホルダ46に受け渡す。このときは保持部材1の真空吸
着を解除しておく。
After the positioning is completed, the holding member 1 is raised to the point P 4 while vacuum suction is performed again, and then the slider is moved.
The arm is extended by 43, stopped above the mask holder 46, and then slightly lowered to transfer the substrate M to the mask holder 46. At this time, the vacuum suction of the holding member 1 is released.

【0034】また、基板Mのアンロードは次のように行
なう。すなわち、点P0 からマスクホルダ46の下方に保
持部材1を進入させ、保持部材1をわずかに上昇させた
後、点P4 の位置で上昇させ、点P5 に位置決めする。
その後、保持部材1を時計方向に回転させ、点P6 で保
持部材1を伸ばし、基板Mをマスクカセット45内の所定
のスロット位置に挿入し、保持部材1を少し下げてか
ら、点P7 まで引っ込める。このとき、基板Mはマスク
カセット45内の段部(スロット)に載せられる。その
後、保持部材1を点P7 から反時計方向に点P0 まで回
転し、もとの位置に復帰させる。
The unloading of the substrate M is performed as follows. That is, the holding member 1 is moved under the mask holder 46 from the point P 0 , the holding member 1 is slightly raised, and then the holding member 1 is raised at the position of the point P 4 and positioned at the point P 5 .
After that, the holding member 1 is rotated clockwise, the holding member 1 is extended at the point P 6 , the substrate M is inserted into a predetermined slot position in the mask cassette 45, the holding member 1 is slightly lowered, and then the point P 7 is reached. Withdraw. At this time, the substrate M is placed on the step (slot) in the mask cassette 45. After that, the holding member 1 is rotated counterclockwise from the point P 7 to the point P 0 and returned to the original position.

【0035】以上に述べた実施例では、移動台2〜7と
位置決め部材11,13,15とが基板に対して下側に配置さ
れるような構成としたが、図1に示したプリアライメン
ト装置の天地を逆にして、これらが基板の上側に配置さ
れるような構成としてもよいことは述べるまでもない。
その場合、サイズが一番小さい基板は、最も上昇した位
置で位置決め部材11と当接して位置決めされ、サイズの
大きい基板は小さい木場にょりも所定量だけ降下した位
置で位置決め部材13または15と当接して位置決めされ
る。また本発明はマスクやレチクルのような矩形基板の
位置決めの他に、半導体ウエハ等のような円形基板の位
置決めに対しても適用でき、全く同様の効果を得ること
ができる。
In the embodiment described above, the movable bases 2 to 7 and the positioning members 11, 13 and 15 are arranged below the substrate. However, the pre-alignment shown in FIG. It goes without saying that the top and bottom of the device may be reversed so that they are arranged above the substrate.
In that case, the substrate having the smallest size is brought into contact with the positioning member 11 at the most raised position to be positioned, and the substrate having the large size is brought into contact with the positioning member 13 or 15 at the position lowered by a predetermined amount even in the small Kiba. Positioned in contact. Further, the present invention can be applied not only to positioning of a rectangular substrate such as a mask or reticle, but also to positioning of a circular substrate such as a semiconductor wafer, and the same effect can be obtained.

【0036】[0036]

【発明の効果】以上のように、本発明によれば、異なる
サイズの基板を択一的にプリアライメントする際、基板
の大きさ(質量)に適合した押圧力を発生するように押
圧部材を構成したので、小さな基板から大きな基板ま
で、確実に安定したプリアライメントが達成される。更
に押圧部材は回転方式であるため、構造がコンパクトに
なるといった利点もある。
As described above, according to the present invention, when selectively pre-aligning substrates of different sizes, a pressing member is provided so as to generate a pressing force suitable for the size (mass) of the substrates. Since it is configured, stable pre-alignment is reliably achieved from a small substrate to a large substrate. Further, since the pressing member is a rotary type, there is an advantage that the structure is compact.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例による位置決め装置の概略的
な構成を示す概略の斜視図である。
FIG. 1 is a schematic perspective view showing a schematic configuration of a positioning device according to an embodiment of the present invention.

【図2】図1中のII−II線矢視断面図である。FIG. 2 is a sectional view taken along the line II-II in FIG.

【図3】各位置決め部材(ローラピン)の構造を示す断
面図である。
FIG. 3 is a cross-sectional view showing the structure of each positioning member (roller pin).

【図4】回転方式の移動体上のローラピン配置と各サイ
ズの基板の位置関係の説明図である。
FIG. 4 is an explanatory diagram of a positional relationship between a roller pin arrangement on a rotary type moving body and a board of each size.

【図5】保持部材の保持機構の構造を示す斜視図であ
る。
FIG. 5 is a perspective view showing a structure of a holding mechanism of a holding member.

【図6】搬送系を含めたシステム全体の概略的な構成を
示す斜視図である。
FIG. 6 is a perspective view showing a schematic configuration of an entire system including a transport system.

【符号の説明】 10,12,14:レチクル(基板)、 2,3,4,5:直動式の移動
台、 6,7:回動式の移動台、11,13,15:ローラピン、2
8:回動軸、29:捩じりばね。
[Explanation of reference signs] 10,12,14: Reticle (substrate), 2,3,4,5: Direct-acting moving base, 6,7: Rotating moving base, 11,13,15: Roller pins, 2
8: rotating shaft, 29: torsion spring.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西方 昭雄 東京都品川区西大井1丁目6番3号 日本 光学工業株式会社大井製作所内 (72)発明者 松本 康久 東京都品川区西大井1丁目6番3号 日本 光学工業株式会社大井製作所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akio Nishikata 1-6-3 Nishi-oi, Shinagawa-ku, Tokyo Inside Oi Works, Nippon Optical Industry Co., Ltd. (72) In-house Yasuhisa Matsumoto 1-6-3 Nishi-oi, Shinagawa-ku, Tokyo No. Japan Optical Industry Co., Ltd. Oi Works

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 外形形状が相似で互いにサイズの異なる
少なくとも2枚の基板の夫々の中心をほぼ同一位置にプ
リアライメントするために、前記サイズの異なる基板の
うち任意の1枚の基板の端面と対向配置される位置決め
部材と、前記任意の一枚の基板の端面を前記位置決め部
材へ当接させるように該基板を押圧する押圧部材とを備
えた基板の位置決め装置において、 前記押圧部材が、前記サイズの異なる基板の夫々の端面
と当接可能な当接子、この当接子を前記基板の面と平行
な面内で所定の軸を中心として回転させる移動体、およ
び前記当接子を前記基板の端面方向へ押圧するための付
勢力を前記移動体に与える付勢部材を有し、 前記当接子が前記基板を押圧して前記位置決め部材へ当
接させたときに基板のサイズが大きくなるに従って前記
当接子の押圧力が大きくなるように前記移動体の回転中
心と前記当接子との各配置を設定したことを特徴とする
基板の位置決め装置。
1. In order to pre-align the centers of at least two substrates having similar outer shapes and different sizes to each other at substantially the same position, an end face of any one of the substrates having different sizes is formed. In a board positioning device comprising a positioning member arranged to face each other and a pressing member for pressing the substrate so that an end surface of the arbitrary one of the substrates is brought into contact with the positioning member, the pressing member comprises: The contactor capable of contacting the respective end surfaces of the substrates of different sizes, the moving body that rotates the contactor about a predetermined axis in a plane parallel to the surface of the substrate, and the contactor A urging member that applies an urging force for pressing the substrate toward the end face direction of the substrate, and when the contactor presses the substrate to bring it into contact with the positioning member, the size of the substrate increases. According to Positioning device for the substrate, characterized in that said setting each placement of the center of rotation of the moving body as the pressing force of this SECCO increases and the and those Secco.
【請求項2】 前記当接子が、前記移動体上の互いに異
なる位置に設けられて夫々前記サイズの異なる基板の夫
々の端面と当接する複数個の当接子からなると共に、こ
れら複数個の当接子が前記基板のサイズの応じて基板の
面と垂直方向に高さを異ならせて階段状に構成されてい
ることを特徴とする請求項1に記載の基板の位置決め装
置。
2. The contactor comprises a plurality of contactors which are provided at different positions on the movable body and contact the respective end faces of the substrates of different sizes, and the plurality of contactors are provided. 2. The substrate positioning device according to claim 1, wherein the abutment is formed in a stepped shape having a height different in a direction perpendicular to a surface of the substrate according to a size of the substrate.
JP10529792A 1992-04-01 1992-04-01 Board positioning device Expired - Lifetime JPH07114233B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10529792A JPH07114233B2 (en) 1992-04-01 1992-04-01 Board positioning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10529792A JPH07114233B2 (en) 1992-04-01 1992-04-01 Board positioning device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP60068538A Division JPH079925B2 (en) 1985-04-02 1985-04-02 Board positioning device

Publications (2)

Publication Number Publication Date
JPH05182891A true JPH05182891A (en) 1993-07-23
JPH07114233B2 JPH07114233B2 (en) 1995-12-06

Family

ID=14403763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10529792A Expired - Lifetime JPH07114233B2 (en) 1992-04-01 1992-04-01 Board positioning device

Country Status (1)

Country Link
JP (1) JPH07114233B2 (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0866837A (en) * 1994-08-24 1996-03-12 Excellon Autom Alignment device and method
WO1996042108A1 (en) * 1995-06-08 1996-12-27 Kokusai Electric Co., Ltd. Substrate carrying device
JP2004253808A (en) * 2003-02-20 2004-09-09 Applied Materials Inc Method and device for positioning substrate with respect to supporting stage
JP2004328014A (en) * 2004-08-10 2004-11-18 Nikon Corp Projection lithography system and pattern forming method using same
KR100706381B1 (en) * 1999-06-03 2007-04-10 동경 엘렉트론 주식회사 Substrate transporting apparatus
JP2008098565A (en) * 2006-10-16 2008-04-24 Yaskawa Electric Corp Aligner of wafer
JP2008175846A (en) * 2007-01-16 2008-07-31 Hitachi High-Technologies Corp Positioning device for substrate and positioning method
US7651315B2 (en) * 2003-10-20 2010-01-26 Applied Materials, Inc. Large area substrate transferring method for aligning with horizontal actuation of lever arm
JP2011519482A (en) * 2008-04-30 2011-07-07 株式会社テラセミコン Holder stage
WO2013171782A1 (en) * 2012-05-14 2013-11-21 平田機工株式会社 Positioning device, processing device, processing system, and positioning method
WO2014017587A1 (en) * 2012-07-26 2014-01-30 千住金属工業株式会社 Semiconductor wafer transfer jig
JP2017215451A (en) * 2016-05-31 2017-12-07 株式会社オーク製作所 Exposure apparatus
KR20210044586A (en) * 2019-10-15 2021-04-23 (주)에스티아이 Substrate processing apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59202645A (en) * 1983-04-30 1984-11-16 Nichiden Mach Ltd Orienter for chip

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59202645A (en) * 1983-04-30 1984-11-16 Nichiden Mach Ltd Orienter for chip

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0866837A (en) * 1994-08-24 1996-03-12 Excellon Autom Alignment device and method
WO1996042108A1 (en) * 1995-06-08 1996-12-27 Kokusai Electric Co., Ltd. Substrate carrying device
US5957651A (en) * 1995-06-08 1999-09-28 Kokusai Electric Co., Ltd. Substrate carrying apparatus
KR100706381B1 (en) * 1999-06-03 2007-04-10 동경 엘렉트론 주식회사 Substrate transporting apparatus
JP2004253808A (en) * 2003-02-20 2004-09-09 Applied Materials Inc Method and device for positioning substrate with respect to supporting stage
JP4615877B2 (en) * 2003-02-20 2011-01-19 アプライド マテリアルズ インコーポレイテッド Apparatus and computer program for positioning substrate relative to support stage
US7651315B2 (en) * 2003-10-20 2010-01-26 Applied Materials, Inc. Large area substrate transferring method for aligning with horizontal actuation of lever arm
JP2004328014A (en) * 2004-08-10 2004-11-18 Nikon Corp Projection lithography system and pattern forming method using same
JP2008098565A (en) * 2006-10-16 2008-04-24 Yaskawa Electric Corp Aligner of wafer
JP2008175846A (en) * 2007-01-16 2008-07-31 Hitachi High-Technologies Corp Positioning device for substrate and positioning method
JP2011519482A (en) * 2008-04-30 2011-07-07 株式会社テラセミコン Holder stage
WO2013171782A1 (en) * 2012-05-14 2013-11-21 平田機工株式会社 Positioning device, processing device, processing system, and positioning method
WO2014017587A1 (en) * 2012-07-26 2014-01-30 千住金属工業株式会社 Semiconductor wafer transfer jig
JP5737480B2 (en) * 2012-07-26 2015-06-17 千住金属工業株式会社 Semiconductor wafer transfer jig
US20150179496A1 (en) * 2012-07-26 2015-06-25 Senju Metal lndustry Co., Ltd. Semiconductor wafer transfer jig
US10026639B2 (en) 2012-07-26 2018-07-17 Senju Metal Industry Co., Ltd. Semiconductor wafer conveying tool
JP2017215451A (en) * 2016-05-31 2017-12-07 株式会社オーク製作所 Exposure apparatus
KR20170135730A (en) 2016-05-31 2017-12-08 가부시키가이샤 오크세이사쿠쇼 Exposure apparatus
KR20210044586A (en) * 2019-10-15 2021-04-23 (주)에스티아이 Substrate processing apparatus

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