JP2002170998A - Semiconductor light emitting device and its manufacturing method - Google Patents
Semiconductor light emitting device and its manufacturing methodInfo
- Publication number
- JP2002170998A JP2002170998A JP2000367494A JP2000367494A JP2002170998A JP 2002170998 A JP2002170998 A JP 2002170998A JP 2000367494 A JP2000367494 A JP 2000367494A JP 2000367494 A JP2000367494 A JP 2000367494A JP 2002170998 A JP2002170998 A JP 2002170998A
- Authority
- JP
- Japan
- Prior art keywords
- light emitting
- emitting device
- semiconductor light
- substrate
- resin portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12041—LED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Led Device Packages (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、基板と、この基板
上にダイボンディングおよびワイヤボンディングされた
発光チップと、この発光チップ表面を覆う透明な樹脂硬
化物とからなる半導体発光装置およびその製造方法に係
り、特に、電気電子機器等のインジケータ(例えば液晶
表示装置)用のバックライトとして使用される半導体発
光装置およびその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor light-emitting device comprising a substrate, a light-emitting chip die-bonded and wire-bonded on the substrate, and a cured transparent resin covering the surface of the light-emitting chip, and a method of manufacturing the same. More particularly, the present invention relates to a semiconductor light emitting device used as a backlight for an indicator (for example, a liquid crystal display device) of an electric / electronic device or the like, and a method of manufacturing the same.
【0002】[0002]
【従来の技術】従来の側面発光型半導体発光装置の一例
である側面発光型LED(lightemitting
diode)装置は、裏面に電極が形成され、上面
(表面)側にのみ発光するように設計されている。ま
た、横倒しし易いように細長く形成されており、横倒し
した状態でテーピング梱包されていた。2. Description of the Related Art A side emission type LED (light emitting) which is an example of a conventional side emission type semiconductor light emitting device.
The diode device is designed so that an electrode is formed on the rear surface and light is emitted only on the upper surface (front surface) side. In addition, it is formed in a slender shape so as to be easily laid down, and is packaged in taping in a laid state.
【0003】この側面発光型半導体発光装置について、
図面を参照しつつさらに詳しく説明する。[0003] With respect to this side emission type semiconductor light emitting device,
This will be described in more detail with reference to the drawings.
【0004】図17は、従来の側面発光型半導体発光装
置の一例を示す斜視図である。FIG. 17 is a perspective view showing an example of a conventional side emission type semiconductor light emitting device.
【0005】従来の側面発光型半導体発光装置は、耐熱
性を有する基板101と、基板101の両端部に形成さ
れた金属配線102a,102bと、一方の金属配線1
02a上に導電性ペーストを介してダイボンディングさ
れたLEDチップ103と、このLEDチップ103と
他方の金属配線102bとを電気的に接続するAu線1
04と、LEDチップ103およびAu線104を覆う
光透過性樹脂部105とから構成されている。上記金属
配線102a,102bは、基板101の表面、側面お
よび裏面に渡ってそれぞれ形成されている。A conventional side emission type semiconductor light emitting device comprises a substrate 101 having heat resistance, metal wirings 102a and 102b formed on both ends of the substrate 101, and one of the metal wirings 1a and 1b.
LED chip 103 which is die-bonded via conductive paste onto an LED chip 02a, and an Au wire 1 for electrically connecting the LED chip 103 and the other metal wiring 102b.
04 and a light-transmitting resin portion 105 covering the LED chip 103 and the Au wire 104. The metal wirings 102a and 102b are formed over the front surface, side surface, and back surface of the substrate 101, respectively.
【0006】この半導体発光装置は、基板101の厚さ
Tおよび光透過性樹脂部105の高さtの寸法を、従来
の上面発光型半導体発光装置の基板の厚さまたは光透過
性樹脂部の高さの寸法よりも大きくすることによって、
図17に示すように、横転させた場合でも実装基板に搭
載可能な構造となっている。In this semiconductor light emitting device, the dimensions of the thickness T of the substrate 101 and the height t of the light transmissive resin portion 105 are adjusted to the thickness of the substrate or the light transmissive resin portion of the conventional top emission type semiconductor light emitting device. By making it larger than the height dimension,
As shown in FIG. 17, the structure is such that it can be mounted on a mounting board even when it is turned over.
【0007】図18は、従来の側面発光型半導体発光装
置の他の例を示す斜視図である。FIG. 18 is a perspective view showing another example of a conventional side emission type semiconductor light emitting device.
【0008】この側面発光型半導体発光装置は、その上
面に凹部が形成された直方体の樹脂成形体111と、凹
部表面に設けられた金属配線112a,112bと、一
方の金属配線112a上に導電性ペーストを介してダイ
ボンディングされたLEDチップ113と、このLED
チップ113と他方の金属配線112bとを電気的に接
続するAu線114と、凹部にディスペンサー等により
樹脂を注入し硬化することにより形成され、LEDチッ
プ113表面を覆う光透過性樹脂部115とから構成さ
れている。さらに、直方体の樹脂成形体111の4つの
角部のうち2つの角部は削り取られており、この削り取
られた部分には、金属配線112a,112bに一体形
成されたスルーホール電極116a,116bがそれぞ
れ設けられているため、図18に示すように、横転させ
た場合でも実装基板に搭載可能な構造となっている。This side emission type semiconductor light emitting device has a rectangular parallelepiped resin molded body 111 having a concave portion formed on the upper surface, metal wirings 112a and 112b provided on the surface of the concave portion, and a conductive material formed on one of the metal wirings 112a. An LED chip 113 die-bonded via a paste and this LED
An Au wire 114 for electrically connecting the chip 113 and the other metal wiring 112b, and a light-transmitting resin portion 115 formed by injecting a resin into the recess with a dispenser or the like and curing the resin to cover the LED chip 113 surface. It is configured. Further, two corners of the four corners of the rectangular parallelepiped resin molded body 111 are cut off, and through-holes 116a and 116b formed integrally with the metal wirings 112a and 112b are formed in the cut off parts. Since each of them is provided, as shown in FIG. 18, the structure is such that it can be mounted on the mounting board even when it is turned over.
【0009】[0009]
【発明が解決しようとする課題】しかしながら、従来の
半導体発光装置では、元々上面に発光する表面実装(S
MD)型の半導体発光装置を実装基板に横向きに搭載す
るので、図17および図18に示すように、電極を裏面
(実装基板に接する面)に形成できず、主に側面にしか
形成できない。そのため、半導体発光装置を実装基板に
搭載するときに、実装基板に対する位置ずれや接続不良
といった問題があった。However, in the conventional semiconductor light emitting device, the surface mounting (S
Since the (MD) type semiconductor light emitting device is mounted horizontally on the mounting substrate, the electrodes cannot be formed on the back surface (the surface in contact with the mounting substrate) as shown in FIGS. For this reason, when the semiconductor light emitting device is mounted on the mounting substrate, there have been problems such as misalignment with respect to the mounting substrate and poor connection.
【0010】さらに、従来の半導体発光装置では、元々
上面に発光する表面実装(SMD)型の半導体発光装置
を実装基板に横向きに搭載するので、図17に示すよう
に、側面以外の部分 (例えば、上面)からも発光してし
まう(光もれが生じる)。そのため、側面発光型半導体
発光装置として使用するには光の取り出し効率が低いと
いった問題があった。Further, in a conventional semiconductor light emitting device, a surface mount (SMD) type semiconductor light emitting device which emits light on the top surface is mounted on a mounting substrate in a horizontal direction. Therefore, as shown in FIG. , The upper surface) (light leakage occurs). Therefore, there is a problem that the light extraction efficiency is low for use as a side emission type semiconductor light emitting device.
【0011】また、従来の半導体発光装置の製造方法で
は、発光部としてLEDチップをモールドするためにト
ランスファーモールドを行っているが、このとき、金型
との離型性を良くするために、樹脂の表面に薄い離型剤
の膜が形成される。そのため、この離型剤の膜が、後に
反射または遮光性を有する外装ケースを取り付けるとき
に障害になるといった問題があった。In the conventional method for manufacturing a semiconductor light emitting device, transfer molding is performed to mold an LED chip as a light emitting portion. At this time, in order to improve the releasability from a mold, a resin is used. A thin release agent film is formed on the surface of the substrate. For this reason, there has been a problem that the release agent film becomes an obstacle when an outer case having a reflective or light-shielding property is attached later.
【0012】さらにまた、従来の半導体発光装置の製造
方法では、外装ケースを取り付ける代わりに後から接着
剤を用いて反射材を貼り合わせる場合、気泡の巻き込み
や接着剤の不均一のために、完成した製品の厚さの寸法
にバラツキが発生するといった問題があった。Furthermore, in the conventional method for manufacturing a semiconductor light emitting device, when a reflective material is pasted by using an adhesive instead of attaching an outer case, the completion is caused by the inclusion of bubbles and unevenness of the adhesive. There is a problem that the thickness dimension of the resulting product varies.
【0013】本発明はこのような問題を解決すべく創案
されたもので、実装性が良く、さらに光の取り出し効率
の良い側面発光型の半導体発光装置およびその製造方法
を提供することを目的としている。The present invention has been made in order to solve such a problem, and an object of the present invention is to provide a side emission type semiconductor light emitting device having good mountability and high light extraction efficiency, and a method of manufacturing the same. I have.
【0014】[0014]
【課題を解決するための手段】本発明の半導体発光装置
は、電気的に絶縁性を有する基板と、この基板上に形成
された2つの電極部と、1つの電極部上に搭載され、他
の電極部に金属線を介してワイヤボンディングされた発
光素子チップと、この発光素子チップおよび金属線表面
を覆う透明樹脂部と、この透明樹脂部を覆う遮光性およ
び反射性を有する樹脂部とから構成されており、前記透
明樹脂部の一側部が外部に露出した発光面に形成されて
いるものである。A semiconductor light emitting device according to the present invention comprises an electrically insulating substrate, two electrode portions formed on the substrate, and one mounted on one electrode portion. A light-emitting element chip wire-bonded to the electrode portion of the light-emitting element via a metal wire, a transparent resin portion covering the light-emitting element chip and the metal wire surface, and a light-shielding and reflective resin portion covering the transparent resin portion. And one side of the transparent resin portion is formed on a light emitting surface exposed to the outside.
【0015】この発明によれば、一側方にのみ発光する
半導体発光装置を得ることができる。According to the present invention, a semiconductor light emitting device that emits light only to one side can be obtained.
【0016】また、前記基板および電極部が、基板の下
面に金属層が設けられ、基板の上面に接着シートが設け
られた状態で所定の位置にスルーホールが形成されてお
り、さらに、接着シートに電極部を構成する金属箔が貼
り付けられてスルーホールがふさがれてなる構造を有し
ているものであってもよい。Further, the substrate and the electrode portion are provided with a metal layer on a lower surface of the substrate, and a through hole is formed at a predetermined position with an adhesive sheet provided on the upper surface of the substrate. May have a structure in which a metal foil constituting an electrode portion is adhered to and a through hole is closed.
【0017】この場合には、基板裏面への樹脂もれを防
止することができる。In this case, it is possible to prevent the resin from leaking to the back surface of the substrate.
【0018】また、前記透明樹脂部の前記発光面に対向
する部分が、前記樹脂部から露出した第2の発光面とし
て形成されているものであってもよい。Further, a portion of the transparent resin portion facing the light emitting surface may be formed as a second light emitting surface exposed from the resin portion.
【0019】この場合には、両側面発光する半導体発光
装置を得ることができる。In this case, a semiconductor light emitting device that emits light from both sides can be obtained.
【0020】また、基板上に発光色の異なる2種または
3種の発光素子チップが搭載されているものであっても
よい。Further, two or three types of light emitting element chips having different emission colors may be mounted on a substrate.
【0021】この場合には、多色発光が可能な半導体発
光装置を得ることができる。In this case, it is possible to obtain a semiconductor light emitting device capable of emitting light of multiple colors.
【0022】また、基板上に複数の電極部を設け、第1
電極部上に第1発光素子チップを搭載し、第2電極部上
に第2発光素子チップを搭載し、第1発光素子チップを
金属線を用いて第3電極部にワイヤボンディングし、第
2発光素子チップを金属線を用いて第4電極部にワイヤ
ボンディングする工程と、液状の透明樹脂を塗布または
注入し硬化させることによって、少なくとも隣り合う第
1発光素子チップおよび第2発光素子チップを覆う1つ
の透明樹脂部を形成する工程と、遮光性および反射性を
有する樹脂を塗布または注入し硬化させることによっ
て、光透過性樹脂部表面を覆う遮光性および反射性を有
する樹脂部を形成する工程と、隣り合う第1発光素子チ
ップと第2発光素子チップとを個々に切り離すために、
透明樹脂部を2分割する工程とからなるものである。Further, a plurality of electrode portions are provided on the substrate,
A first light emitting element chip is mounted on the electrode part, a second light emitting element chip is mounted on the second electrode part, and the first light emitting element chip is wire-bonded to the third electrode part using a metal wire, A step of wire bonding the light emitting element chip to the fourth electrode portion using a metal wire, and applying or injecting and curing a liquid transparent resin to at least cover the adjacent first light emitting element chip and second light emitting element chip A step of forming one transparent resin part and a step of forming a light-shielding and reflective resin part covering the light-transmitting resin part surface by applying or injecting and curing a resin having light-shielding and reflective properties And in order to separate the adjacent first light emitting element chip and second light emitting element chip individually,
And a step of dividing the transparent resin portion into two.
【0023】この発明によれば、分割面のみを発光面に
することができる。According to the present invention, only the divided surface can be used as the light emitting surface.
【0024】また、前記透明樹脂部を形成する方法とし
てスクリーン印刷方式が用いられていてもよい。Further, a screen printing method may be used as a method for forming the transparent resin portion.
【0025】この場合には、透明樹脂部を容易に形成す
ることができる。In this case, the transparent resin portion can be easily formed.
【0026】また、前記透明樹脂部を形成する方法とし
てポッティング方式が用いられていてもよい。Further, a potting method may be used as a method for forming the transparent resin portion.
【0027】この場合には、硬化後の透明樹脂部表面に
離型剤が残らず内部樹脂部と外部樹脂部との間に安定し
た接着性を確保できる。In this case, the release agent does not remain on the surface of the cured transparent resin portion, and stable adhesiveness between the internal resin portion and the external resin portion can be secured.
【0028】また、前記遮光性および反射性を有する樹
脂部を形成する方法としてスクリーン印刷方式が用いら
れていてもよい。Further, a screen printing method may be used as a method for forming the resin portion having the light-shielding property and the reflective property.
【0029】この場合には、遮光性および反射性を有す
る樹脂部を容易に形成することができる。In this case, it is possible to easily form a resin part having a light-shielding property and a reflective property.
【0030】また、前記遮光性および反射性を有する樹
脂部を形成する方法としてトランスファーモールド方式
が用いられていてもよい。Further, a transfer molding method may be used as a method for forming the resin portion having the light-shielding property and the reflective property.
【0031】この場合には、遮光性および反射性を有す
る樹脂部を容易に形成することができる。In this case, it is possible to easily form a resin portion having a light-shielding property and a reflective property.
【0032】また、前記スクリーン印刷方式において用
いられるメタルマスクの開口部の形状が、楕円形状をベ
ースとし、さらにこの楕円形状の両端部の曲線部分をカ
ットしたものであってもよい。The shape of the opening of the metal mask used in the screen printing method may be based on an elliptical shape, and the curved portions at both ends of the elliptical shape may be cut.
【0033】この場合には、LEDチップ搭載位置ずれ
および基板パターンずれを防止することができる。In this case, the displacement of the LED chip mounting position and the displacement of the substrate pattern can be prevented.
【0034】[0034]
【発明の実施の形態】次に、本発明の半導体発光装置お
よびその製造方法の一実施の形態について図面を参照し
つつ説明する。Next, an embodiment of a semiconductor light emitting device and a method of manufacturing the same according to the present invention will be described with reference to the drawings.
【0035】初めに、半導体発光装置の製造方法の一実
施の形態について説明する。First, an embodiment of a method for manufacturing a semiconductor light emitting device will be described.
【0036】図1は、本発明の半導体発光装置の製造方
法の一実施の形態を示す平面図であり、図2は、本発明
の半導体発光装置の製造方法の一実施の形態を示す断面
図である。なお、図2(a)は図1(a)のA−A線断
面を示す部分拡大図であり、図2(b)は図1(b)の
B−B線断面を示す部分拡大図であり、図2(c)は図
1(c)のC−C線断面を示す部分拡大図であり、図2
(d)は図1(d)のD−D線断面を示す部分拡大図で
ある。FIG. 1 is a plan view showing one embodiment of a method for manufacturing a semiconductor light emitting device according to the present invention, and FIG. 2 is a sectional view showing one embodiment of a method for manufacturing a semiconductor light emitting device according to the present invention. It is. 2A is a partially enlarged view showing a cross section taken along line AA in FIG. 1A, and FIG. 2B is a partially enlarged view showing a cross section taken along line BB in FIG. 1B. FIG. 2 (c) is a partially enlarged view showing a cross section taken along line CC of FIG. 1 (c).
(D) is a partially enlarged view showing a cross section taken along line DD of FIG. 1 (d).
【0037】まず、図1(a)および図2(a)に示す
ように、基板1上に金属配線2a,2bを設け、この金
属配線2aの電極部2a1,2a2のうちの一方の電極
部2a1上に発光素子チップとしての第1LEDチップ
3aを搭載し、同時に、この金属配線2bの電極部2b
1,2b2のうちの一方の電極部2b1上に第2LED
チップ3bを搭載する。そして、第1LEDチップ3a
をAu線4aを用いて他方の電極部2b2にワイヤボン
ディングし、同時に、第2LEDチップ3bをAu線4
bを用いて他方の電極部2a2にワイヤボンディングし
て、第1LEDチップ3aと他方の電極部2b2との間
および第2LEDチップ3bと他方の電極部2a2との
間に電気的接続をもたせる。First, as shown in FIGS. 1A and 2A, metal wirings 2a and 2b are provided on a substrate 1, and one of the electrode parts 2a1 and 2a2 of the metal wiring 2a is provided. A first LED chip 3a as a light emitting element chip is mounted on 2a1 and at the same time, an electrode portion 2b of the metal wiring 2b is mounted.
A second LED on one of the electrode portions 2b1 of the first and second electrodes 2b2
The chip 3b is mounted. Then, the first LED chip 3a
Is wire-bonded to the other electrode portion 2b2 using the Au wire 4a, and at the same time, the second LED chip 3b is connected to the Au wire 4a.
b is used to perform wire bonding to the other electrode portion 2a2 to provide electrical connection between the first LED chip 3a and the other electrode portion 2b2 and between the second LED chip 3b and the other electrode portion 2a2.
【0038】続いて、図1(b)および図2(b)に示
すように、液状の光透過性樹脂を塗布または注入し硬化
させることによって、第1LEDチップ3a、第2LE
Dチップ3bおよびAu線4a,4b表面を覆う光透過
性樹脂部5を形成する。このとき用いられる樹脂塗布方
法の一例としてはスクリーン印刷方式があり、樹脂注入
方法の一例としてはポッティング方式がある。Subsequently, as shown in FIGS. 1 (b) and 2 (b), the first LED chip 3a, the second LE
A light-transmitting resin portion 5 covering the surfaces of the D chip 3b and the Au wires 4a, 4b is formed. A screen printing method is an example of a resin coating method used at this time, and a potting method is an example of a resin injection method.
【0039】さらに、光透過性樹脂を硬化させた後、図
1(c)および図2(c)に示すように、遮光性および
反射性を有する白色エポキシ系樹脂を塗布または注入し
硬化させることによって、光透過性樹脂部5表面を覆う
白色エポキシ系樹脂部6を形成する。このとき用いられ
る樹脂塗布方法の一例としてはトランスファーモールド
方式がある。Further, after the light-transmitting resin is cured, as shown in FIGS. 1C and 2C, a white epoxy resin having a light-shielding property and a reflective property is applied or injected and cured. Thereby, a white epoxy resin portion 6 covering the surface of the light transmitting resin portion 5 is formed. An example of a resin coating method used at this time is a transfer molding method.
【0040】最後に、図1(d)および図2(d)に示
すように、ダイシング装置を用いて、各LEDチップを
個々に切り離す。具体的には、幅が一定の寸法になる切
断位置L1で基板1を切断し、さらに、第1LEDチッ
プ3aと第2LEDチップ3bとの対称線となる切断位
置L2、および1つの光透過性樹脂部5とこの1つの光
透過性樹脂部5に隣り合う他の光透過性樹脂部5との対
称線となる切断位置L3で基板1を切断し、半導体発光
装置を完成させる。なお、この切断位置L2での切断に
よって形成された面を半導体発光装置の発光面とする。Finally, as shown in FIGS. 1D and 2D, each LED chip is individually cut using a dicing device. Specifically, the substrate 1 is cut at a cutting position L1 at which the width becomes a fixed dimension, and further, a cutting position L2 which is a symmetrical line between the first LED chip 3a and the second LED chip 3b, and one light-transmitting resin. The substrate 1 is cut at a cutting position L3, which is a line of symmetry between the portion 5 and another light-transmitting resin portion 5 adjacent to the one light-transmitting resin portion 5, thereby completing a semiconductor light emitting device. The surface formed by cutting at the cutting position L2 is defined as a light emitting surface of the semiconductor light emitting device.
【0041】このような手順によって形成された半導体
発光装置の一実施の形態を図3に示す。FIG. 3 shows an embodiment of the semiconductor light emitting device formed by such a procedure.
【0042】図3は、本発明の半導体発光装置の一実施
の形態を示す斜視図である。FIG. 3 is a perspective view showing one embodiment of the semiconductor light emitting device of the present invention.
【0043】この半導体発光装置は、電気的に絶縁性を
有する基板11と、この基板11上に形成された2つの
電極部12a,12bと、1つの電極部12a上に搭載
され、他の電極部12bにAu線14を介してワイヤボ
ンディングされたLEDチップ13と、このLEDチッ
プ13およびAu線14表面を覆う光透過性樹脂部5
と、この光透過性樹脂部5を覆う白色エポキシ系樹脂部
16とから構成されている。なお、図3においては、電
極部12a,12b、LEDチップ13およびAu線1
4をより明確に示すために、光透過性樹脂部5を透明と
して図示している。This semiconductor light emitting device has an electrically insulating substrate 11, two electrode portions 12a and 12b formed on the substrate 11, and one electrode portion 12a mounted on another electrode portion. The LED chip 13 wire-bonded to the portion 12b via the Au wire 14, and the light-transmitting resin portion 5 covering the surface of the LED chip 13 and the Au wire 14
And a white epoxy resin portion 16 that covers the light transmitting resin portion 5. In FIG. 3, the electrode portions 12a and 12b, the LED chip 13 and the Au wire 1
In order to more clearly show 4, the transparent resin portion 5 is shown as transparent.
【0044】次に、LEDチップ等を樹脂で封止する方
法の一例であるスクリーン印刷方式について図面を参照
しつつ説明する。Next, a screen printing method which is an example of a method of sealing an LED chip or the like with a resin will be described with reference to the drawings.
【0045】図4は、スクリーン印刷方式による光透過
性樹脂の塗布工程の一例を示す断面図である。なお、図
4(a)は、図1(a)のE−E線断面を示す拡大断面
図である。FIG. 4 is a sectional view showing an example of a step of applying a light transmitting resin by a screen printing method. FIG. 4A is an enlarged cross-sectional view showing a cross section taken along line EE of FIG. 1A.
【0046】まず、スクリーン印刷方式では、図4
(a)に示すように、基板1表面への電極部2a1,2
b1の形成、第1LEDチップ3aおよび第2LEDチ
ップ3bの搭載、ならびにAu線4a,4bを用いたワ
イヤボンディング、が完了した状態で、図4(b)に示
すように、封止サイズに合わせた開口部21aを有する
メタルマスク21を基板1上の所定の位置に配置する。
さらに、このメタルマスク21上の端部(図4(b)で
は右側端部)に光透過性樹脂22をのせる。なお、開口
部21aは、第1LEDチップ3aおよび第2LEDチ
ップ3bを一対ずつ個々に露出することができるよう
な、大きさや位置に形成されている。First, in the screen printing method, FIG.
As shown in (a), the electrode portions 2a1 and 2a2
After the formation of b1, the mounting of the first LED chip 3a and the second LED chip 3b, and the wire bonding using the Au wires 4a, 4b, the sealing size was adjusted as shown in FIG. 4B. A metal mask 21 having an opening 21 a is arranged at a predetermined position on the substrate 1.
Further, a light transmissive resin 22 is placed on an end portion (right end portion in FIG. 4B) on the metal mask 21. The opening 21a is formed in a size and a position such that the first LED chip 3a and the second LED chip 3b can be individually exposed in pairs.
【0047】続いて、図4(c)に示すように、メタル
マスク21を基板1に押し当てた状態で、光透過性樹脂
22をスキージ23にて一方向(矢印d1で示した方
向)に移動し、開口部21aに光透過性樹脂22を詰め
込む。このとき使用するメタルマスク21の基板1等に
接触する側の面(下面)には、基板1等との接触面積を
少なくすることができるように、凹部21bが設けられ
ており、これにより、メタルマスク21と基板1側の部
材との間に隙間が生じにくくなり、メタルマスク21裏
面(下面)への光透過性樹脂22のにじみを防ぐことが
できる。Subsequently, as shown in FIG. 4C, while the metal mask 21 is pressed against the substrate 1, the light-transmitting resin 22 is moved in one direction (the direction indicated by the arrow d1) by the squeegee 23. Then, the light transmissive resin 22 is packed in the opening 21a. At the surface (lower surface) of the metal mask 21 used at this time in contact with the substrate 1 or the like, a concave portion 21b is provided so as to reduce the contact area with the substrate 1 or the like. A gap is less likely to be formed between the metal mask 21 and the member on the substrate 1 side, and it is possible to prevent the light transmissive resin 22 from bleeding on the rear surface (lower surface) of the metal mask 21.
【0048】このような印刷方式は、一般に、PES
(Printing Encapsulation S
ystems)方式と呼ばれている。このように、にじ
みの少ない方式を採用することによって、図4(d)に
示すように、メタルマスク21を除去したときに、光透
過性樹脂22の表面張力により、光透過性樹脂22はド
ーム形状を維持することができる。また、ここで使用す
る樹脂の特徴としては、安定したドーム形状を形成する
ために、構造粘性比が3.6程度であることが好まし
い。Such a printing method is generally known as PES
(Printing Encapsulation S
systems) system. In this manner, by adopting the method with less bleeding, as shown in FIG. 4D, when the metal mask 21 is removed, the light transmitting resin 22 becomes dome-shaped due to the surface tension of the light transmitting resin 22. Shape can be maintained. The resin used herein preferably has a structural viscosity ratio of about 3.6 in order to form a stable dome shape.
【0049】次に、LEDチップ等を樹脂で封止する方
法の他の例であるポッティング方式について図面を参照
しつつ説明する。Next, a potting method which is another example of a method of sealing an LED chip or the like with a resin will be described with reference to the drawings.
【0050】図5は、ポッティング方式による光透過性
樹脂の注入工程の一例を示す断面図である。なお、図5
(a)は、図1(a)のE−E線断面を示す拡大断面図
である。FIG. 5 is a sectional view showing an example of a step of injecting a light-transmitting resin by a potting method. FIG.
FIG. 2A is an enlarged cross-sectional view showing a cross section taken along line EE of FIG.
【0051】まず、ポッティング方式では、図5(a)
に示すように、基板1表面への電極部2a1,2b1の
形成、第1LEDチップ3aおよび第2LEDチップ3
bの搭載、ならびにAu線4a,4bを用いたワイヤボ
ンディング、が完了した状態で、図5(b)に示すよう
に、ディスペンサ31に予め封入されている光透過性樹
脂を空気圧を利用してディスペンサ31の先端から第1
LEDチップ3aおよび第2LEDチップ3bへ吐出す
る。そして、図5(c)に示すように、一対の第1LE
Dチップ3aおよび第2LEDチップ3b、ならびにA
u線4a,4b表面を覆う。このとき、吐出された光透
過性樹脂32は、表面張力によりドーム形状を維持す
る。First, in the potting method, FIG.
As shown in the figure, the formation of the electrode portions 2a1 and 2b1 on the surface of the substrate 1, the first LED chip 3a and the second LED chip 3
5b, and after the wire bonding using the Au wires 4a and 4b is completed, as shown in FIG. 5B, the light transmissive resin previously sealed in the dispenser 31 is removed by air pressure. First from the tip of the dispenser 31
It discharges to LED chip 3a and 2nd LED chip 3b. Then, as shown in FIG. 5C, the pair of first LEs
D chip 3a, second LED chip 3b, and A
Covers the surfaces of the u lines 4a and 4b. At this time, the discharged light transmissive resin 32 maintains a dome shape due to surface tension.
【0052】次に、光透過性樹脂部上に、遮光性および
反射性が高い白色エポキシ系樹脂を塗布する方式につい
て図面を参照しつつ説明する。Next, a method of applying a white epoxy resin having high light-shielding properties and high reflectivity on the light-transmitting resin portion will be described with reference to the drawings.
【0053】図6は、スクリーン印刷方式による白色エ
ポキシ系樹脂の塗布工程の一例を示す断面図である。な
お、図6(a)は、図1(b)のF−F線断面を示す拡
大断面図である。FIG. 6 is a sectional view showing an example of a step of applying a white epoxy resin by a screen printing method. FIG. 6A is an enlarged sectional view showing a section taken along line FF of FIG. 1B.
【0054】なお、白色エポキシ系樹脂を塗布する手順
は、光透過性樹脂を塗布する手順と同様のものであり、
用いられるメタルマスクの形状が異なるのみである。The procedure for applying the white epoxy resin is the same as the procedure for applying the light transmitting resin.
The only difference is the shape of the metal mask used.
【0055】まず、このスクリーン印刷方式では、図6
(a)に示すように、基板1表面への電極部2a1,2
b1の形成、第1LEDチップ3aおよび第2LEDチ
ップ3bの搭載、ならびにAu線4a,4bを用いたワ
イヤボンディング、光透過性樹脂部5の形成、が完了し
た状態で、図6(b)に示すように、封止サイズに合わ
せた開口部41aを有するメタルマスク41を基板1上
の所定の位置に配置する。さらに、このメタルマスク4
1上の端部(図6(b)では右側端部)に白色エポキシ
系樹脂42をのせる。なお、開口部41aは、複数の光
透過性樹脂部5を露出することができるような、大きさ
や位置に形成されている。First, in this screen printing method, FIG.
As shown in (a), the electrode portions 2a1 and 2a2
FIG. 6B shows a state in which the formation of b1, the mounting of the first LED chip 3a and the second LED chip 3b, the wire bonding using the Au wires 4a and 4b, and the formation of the light-transmitting resin portion 5 are completed. As described above, the metal mask 41 having the opening 41a corresponding to the sealing size is arranged at a predetermined position on the substrate 1. Furthermore, this metal mask 4
A white epoxy resin 42 is placed on the upper end (the right end in FIG. 6B). The opening 41a is formed in a size and a position so that the plurality of light-transmitting resin portions 5 can be exposed.
【0056】続いて、図6(c)に示すように、メタル
マスク41を基板1に押し当てた状態で、白色エポキシ
系樹脂42をスキージ43にて一方向(図6(b)にお
いて矢印d2で示した方向)に移動し、メタルマスクの
開口部に白色エポキシ系樹脂42を詰め込む。最後に、
メタルマスクを除去すると、白色エポキシ系樹脂42の
表面張力により、白色エポキシ系樹脂42はドーム形状
を維持した状態になる。Subsequently, as shown in FIG. 6 (c), with the metal mask 41 pressed against the substrate 1, the white epoxy resin 42 is moved in one direction with a squeegee 43 (arrow d2 in FIG. 6 (b)). (In the direction indicated by), and the white epoxy resin 42 is packed into the openings of the metal mask. Finally,
When the metal mask is removed, the white epoxy resin 42 maintains a dome shape due to the surface tension of the white epoxy resin 42.
【0057】次に、本発明の半導体発光装置を構成する
基板の構造の一例について図面を参照しつつ説明する。Next, an example of the structure of the substrate constituting the semiconductor light emitting device of the present invention will be described with reference to the drawings.
【0058】図7は、本発明の半導体発光装置を構成す
る基板および電極部の構造の一例を示す断面図である。FIG. 7 is a cross-sectional view showing an example of the structure of the substrate and the electrode part constituting the semiconductor light emitting device of the present invention.
【0059】基板としてのガラエポ(ガラス繊維強化エ
ポキシ樹脂)基材51の下面には銅層52が設けられて
おり、一方、ガラエポ基材51の上面にはエポキシ系接
着シート53が設けられている。この状態で、ガラエポ
基材51とエポキシ系接着シート53とにスルーホール
50を設けるために、ドリル加工を施した後、金属部を
構成する銅箔54をエポキシ系接着シート53にてガラ
エポ基材51に貼り付けて、スルーホール50をふさい
でいる。このような構造により、後に光透過性樹脂を塗
布または注入したときに、基板裏面への光透過性樹脂も
れを防ぐことができる。A copper layer 52 is provided on the lower surface of a glass epoxy (glass fiber reinforced epoxy resin) substrate 51 as a substrate, while an epoxy adhesive sheet 53 is provided on the upper surface of the glass epoxy substrate 51. . In this state, a drilling process is performed to provide through holes 50 in the glass epoxy base material 51 and the epoxy adhesive sheet 53, and then the copper foil 54 constituting the metal part is coated with the epoxy adhesive sheet 53 using the epoxy adhesive sheet 53. 51 to cover the through hole 50. With such a structure, when the light transmitting resin is applied or injected later, the light transmitting resin can be prevented from leaking to the back surface of the substrate.
【0060】また、光透過性樹脂や白色エポキシ系樹脂
をスクリーン印刷方式で塗布するときに用いられるメタ
ルマスクの厚さにしたがって、メタルマスク除去後の樹
脂部の高さを変更することができる。The height of the resin portion after removing the metal mask can be changed according to the thickness of the metal mask used when applying the light transmitting resin or the white epoxy resin by the screen printing method.
【0061】図8は、メタルマスクの厚さに対する塗布
後の樹脂部の厚さの一例を示すグラフであり、同図
(a)は、メタルマスクの厚さが1.0mmのときの樹
脂部の厚さを示しており、同図(b)は、メタルマスク
の厚さが0.8mmのときの樹脂部の厚さを示してお
り、同図(c)は、メタルマスクの厚さが0.6mmの
ときの樹脂部の厚さを示している。なお、このグラフ
は、メタルマスクの厚さ別に20個のデータをとり作成
されており、縦軸は樹脂部の厚さを示しており、横軸は
データの個数を示している。FIG. 8 is a graph showing an example of the thickness of the resin portion after application with respect to the thickness of the metal mask. FIG. 8A shows the resin portion when the thickness of the metal mask is 1.0 mm. FIG. 2B shows the thickness of the resin portion when the thickness of the metal mask is 0.8 mm, and FIG. 2C shows the thickness of the metal mask when the thickness of the metal mask is 0.8 mm. The thickness of the resin portion at 0.6 mm is shown. This graph is created by taking 20 pieces of data for each thickness of the metal mask, the vertical axis shows the thickness of the resin portion, and the horizontal axis shows the number of data.
【0062】図示されているように、メタルマスクの厚
さが1.0mmのときの樹脂部の厚さの平均値は0.6
mmであり、メタルマスクの厚さが0.8mmのときの
樹脂部の厚さの平均値は0.71mmであり、メタルマ
スクの厚さが0.6mmのときの樹脂部の厚さの平均値
は0.67mmである。例えば、完成したときの厚さが
1.2mmとなる半導体発光装置を製造する場合には、
樹脂部の厚さを0.7mm程度にすることが好ましく、
したがって、厚さが0.8mmのメタルマスクを用いれ
ばよいことがグラフから分かる。As shown, when the thickness of the metal mask is 1.0 mm, the average value of the thickness of the resin portion is 0.6.
mm, the average value of the thickness of the resin portion when the thickness of the metal mask is 0.8 mm is 0.71 mm, and the average value of the thickness of the resin portion when the thickness of the metal mask is 0.6 mm. The value is 0.67 mm. For example, when manufacturing a semiconductor light emitting device having a thickness of 1.2 mm when completed,
Preferably, the thickness of the resin part is about 0.7 mm,
Therefore, it can be seen from the graph that a metal mask having a thickness of 0.8 mm should be used.
【0063】さらにまた、PES方式を採用する場合に
おいて、メタルマスク61の開口部61aの形状は、図
9に示すように、楕円形状がベースになっており、さら
に楕円形状の両端部61a1,61a2の曲線部分がカ
ットされた形状になっていることが、LEDチップ搭載
位置ずれ、および基板パターンずれ等への対策とするこ
とができるため好ましい。図9は、本発明の半導体発光
装置の製造方法において用いられるメタルマスクの一例
を示す説明図であり、同図(a)はメタルマスクを示す
平面図であり、同図(b)は1つの開口部を示す部分拡
大図である。Further, when the PES method is adopted, the shape of the opening 61a of the metal mask 61 is based on an ellipse as shown in FIG. 9, and furthermore, both ends 61a1 and 61a2 of the ellipse are formed. It is preferable that the curved portion is cut to prevent the LED chip mounting position shift and the substrate pattern shift. FIG. 9 is an explanatory view showing an example of a metal mask used in the method for manufacturing a semiconductor light emitting device of the present invention. FIG. 9A is a plan view showing the metal mask, and FIG. It is the elements on larger scale which show an opening part.
【0064】次に、本発明の半導体発光装置の他の実施
の形態について説明する。Next, another embodiment of the semiconductor light emitting device of the present invention will be described.
【0065】図10は、本発明の半導体発光装置の他の
実施の形態を示す斜視図であり、図11は、本発明の半
導体発光装置の製造方法にしたがってLEDチップを個
々に切り離す前の状態を示す平面図である。なお、図1
0においては、電極部12a,12b、LEDチップ1
3およびAu線14をより明確に示すために、光透過性
樹脂部5を透明として図示している。FIG. 10 is a perspective view showing another embodiment of the semiconductor light emitting device of the present invention, and FIG. 11 is a state before the LED chips are individually cut off according to the method of manufacturing the semiconductor light emitting device of the present invention. FIG. FIG.
0, the electrode portions 12a and 12b and the LED chip 1
In order to more clearly show 3 and the Au wire 14, the light-transmitting resin portion 5 is shown as being transparent.
【0066】この半導体発光装置と前述の実施の形態の
半導体発光装置との間で異なっているところは、上面か
ら見たときの切断前の光透過性樹脂部5の形状がトラッ
ク形状である点である。The difference between this semiconductor light emitting device and the semiconductor light emitting device of the above embodiment is that the shape of the light transmitting resin portion 5 before cutting when viewed from above is a track shape. It is.
【0067】図11に示すように、光透過性樹脂部5の
形状をトラック形状にすることによって、第1LEDチ
ップ3aと第2LEDチップ3bとの対称線となる切断
位置L4での切断によって形成された面(図10におい
てS1で示した面)と、この切断位置L4に平行な切断
位置L5での切断によって形成された面(図10におい
てS2で示した面)とが、完成した半導体発光装置の側
面を形成し、かつ、発光面になる。なお、このような手
順で製造された半導体発光装置も、前述の実施の形態の
半導体発光装置と同様に、上面は発光面にはならない。As shown in FIG. 11, by making the shape of the light-transmitting resin portion 5 into a track shape, the light-transmitting resin portion 5 is formed by cutting at the cutting position L4 which is a symmetrical line between the first LED chip 3a and the second LED chip 3b. The completed semiconductor light emitting device has a cut surface (the surface indicated by S1 in FIG. 10) and a surface formed by cutting at the cutting position L5 parallel to the cutting position L4 (the surface indicated by S2 in FIG. 10). And a light emitting surface. Note that the semiconductor light emitting device manufactured by such a procedure also does not have a light emitting surface on the upper surface, as in the semiconductor light emitting device of the above-described embodiment.
【0068】次に、本発明の半導体発光装置のさらに他
の実施の形態について図面を参照しつつ説明する。Next, still another embodiment of the semiconductor light emitting device of the present invention will be described with reference to the drawings.
【0069】図12は、本発明の半導体発光装置のさら
に他の実施の形態を示す斜視図である。FIG. 12 is a perspective view showing still another embodiment of the semiconductor light emitting device of the present invention.
【0070】この半導体発光装置は、1つの半導体発光
装置を発光色の異なる2種のLEDチップ73a,73
bで形成したものである。In this semiconductor light emitting device, one semiconductor light emitting device is composed of two types of LED chips 73a and 73 having different emission colors.
b.
【0071】2つのLEDチップ73a,73bのう
ち、1つのLEDチップ73aは電極部72a1上にダ
イボンディングされており、電極部72b2にAu線7
4aを用いてワイヤボンディングされている。一方、他
のLEDチップ73bは電極部72b1上にダイボンデ
ィングされており、電極部72a2にAu線74bを用
いてワイヤボンディングされている。なお、図11にお
いては、電極部72a1,72a2,72b1,72b
2、LEDチップ73a,73bおよびAu線74a、
74bをより明確に示すために、光透過性樹脂部5を透
明として図示している。Of the two LED chips 73a and 73b, one LED chip 73a is die-bonded on the electrode 72a1 and the Au wire 7 is connected to the electrode 72b2.
4a. On the other hand, the other LED chip 73b is die-bonded on the electrode portion 72b1, and wire-bonded to the electrode portion 72a2 using the Au wire 74b. In FIG. 11, the electrode portions 72a1, 72a2, 72b1, 72b
2, LED chips 73a, 73b and Au wire 74a,
In order to more clearly show 74b, the light-transmitting resin portion 5 is illustrated as being transparent.
【0072】図13は、本発明の半導体発光装置のさら
に他の実施の形態を示す斜視図である。FIG. 13 is a perspective view showing still another embodiment of the semiconductor light emitting device of the present invention.
【0073】この半導体発光装置は、1つの半導体発光
装置を発光色の異なる3種のLEDチップ83a,83
b、83cで形成したものである。In this semiconductor light emitting device, one semiconductor light emitting device is divided into three types of LED chips 83a and 83 having different emission colors.
b, 83c.
【0074】3つのLEDチップ83a,83b,83
cは、1つの電極部82a上にダイボンディングされて
おり、Au線84a,84b,84cを用いて電極部8
2b1,82b2,82b3にそれぞれワイヤボンディ
ングされている。この場合、アノードまたはカソードを
コモンとしている。The three LED chips 83a, 83b, 83
c is die-bonded on one electrode portion 82a, and the electrode portion 8 is formed using Au wires 84a, 84b and 84c.
2b1, 82b2 and 82b3 are wire-bonded respectively. In this case, the anode or the cathode is used as a common.
【0075】また、本発明の半導体発光装置の製造方法
において、遮光性および反射性の高い白色エポキシ系樹
脂部をトランスファーモールド方式によって形成しても
よいい。In the method for manufacturing a semiconductor light emitting device of the present invention, a white epoxy resin portion having high light-shielding properties and high reflectivity may be formed by a transfer molding method.
【0076】このトランスファーモールド方式によって
白色エポキシ系樹脂部を形成する工程について説明す
る。A process for forming a white epoxy resin portion by the transfer molding method will be described.
【0077】図14は、本発明の半導体発光装置の製造
方法にしたがって、トランスファーモールド方式によっ
て白色エポキシ系樹脂部を形成した状態の一例を示す部
分平面図であり、図15および図16は、トランスファ
ーモールド方式によって白色エポキシ系樹脂部を形成す
る工程の一例を示す断面説明図である。なお、図15
(c)は図14のG−G線断面を示しており、図16
(c)は図14のH−H線断面を示している。FIG. 14 is a partial plan view showing an example of a state in which a white epoxy resin portion is formed by a transfer molding method according to the method for manufacturing a semiconductor light emitting device of the present invention. FIGS. It is sectional explanatory drawing which shows an example of the process of forming a white epoxy-type resin part by a molding method. Note that FIG.
FIG. 16C shows a cross section taken along line GG of FIG.
(C) shows a cross section taken along line HH in FIG.
【0078】まず、図15(a)および図16(a)に
示すように、基板91上に、電極部92を設け、この電
極部92の所定の位置にLEDチップ93を搭載し、金
線94を用いてワイヤボンディングを行い、これら電極
部92、LEDチップ93および金線94を透明樹脂部
95で封止した状態において、図15(b)および図1
6(b)に示すように、下板96aおよび上板96bか
ら構成されたトランスファーモールド金型96で上下か
ら基板91を挟みこむ。First, as shown in FIGS. 15A and 16A, an electrode portion 92 is provided on a substrate 91, and an LED chip 93 is mounted on a predetermined position of the electrode portion 92. FIG. 15 (b) and FIG. 1 show a state in which wire bonding is performed using the electrodes 94, and the electrode section 92, the LED chip 93, and the gold wire 94 are sealed with the transparent resin section 95.
As shown in FIG. 6B, the substrate 91 is sandwiched from above and below by a transfer mold die 96 composed of a lower plate 96a and an upper plate 96b.
【0079】このトランスファーモールド金型96は、
平らな下金型96aと下面に凹みを有する上金型96b
とから構成されている。上金型96bに設けられた凹み
は、白色エポキシ系樹脂部の形状に合わせて形成されて
おり、図14に示すように、例えば行方向に長いうね形
状の白色エポキシ系樹脂部90を形成する場合には、行
方向に長いうね形状に形成されている。This transfer mold 96 is
Flat lower mold 96a and upper mold 96b having a recess on the lower surface
It is composed of The recess provided in the upper mold 96b is formed in accordance with the shape of the white epoxy resin portion, and as shown in FIG. 14, for example, a ridge-shaped white epoxy resin portion 90 long in the row direction is formed. In this case, it is formed in a ridge shape long in the row direction.
【0080】続いて、トランスファーモールド金型96
自体を加熱した状態で、図15(b)に示す樹脂注入口
96cから半硬化状態の白色エポキシ系樹脂を高圧で流
しこむ。Subsequently, the transfer mold 96
While heating itself, a semi-cured white epoxy resin is poured at a high pressure from the resin injection port 96c shown in FIG. 15B.
【0081】そして、この白色エポキシ系樹脂を完全に
硬化させ、トランスファモールド金型96を取り除く
と、図15(c)および図16(c)に示すように、透
明樹脂部95の周りを、遮光性および反射性の高い白色
エポキシ系樹脂部90にて覆うことができる。When the white epoxy resin is completely cured and the transfer mold 96 is removed, the area around the transparent resin portion 95 is shielded from light, as shown in FIGS. It can be covered with a white epoxy resin part 90 having high properties and high reflectivity.
【0082】[0082]
【発明の効果】本発明の半導体発光装置は、電気的に絶
縁性を有する基板と、この基板上に形成された2つの電
極部と、1つの電極部上に搭載され、他の電極部に金属
線を介してワイヤボンディングされた発光素子チップ
と、この発光素子チップおよび金属線表面を覆う透明樹
脂部と、この透明樹脂部を覆う遮光性および反射性を有
する樹脂部とから構成されており、前記透明樹脂部の一
側部が外部に露出した発光面に形成されているものであ
り、この発明によれば、一側部にのみ発光面を形成する
ことができるため、光漏れを低減することができる。そ
の結果、発光面での光の取り出し効率をより高くするこ
とができる。According to the semiconductor light emitting device of the present invention, an electrically insulating substrate, two electrode portions formed on the substrate, and mounted on one electrode portion and mounted on another electrode portion are provided. A light-emitting element chip wire-bonded via a metal wire, a transparent resin part covering the light-emitting element chip and the metal wire surface, and a light-shielding and reflective resin part covering the transparent resin part. According to the present invention, since one side of the transparent resin portion is formed on the light emitting surface exposed to the outside, the light emitting surface can be formed only on one side, thereby reducing light leakage. can do. As a result, the light extraction efficiency at the light emitting surface can be further increased.
【0083】また、前記基板および電極部が、基板の下
面に金属層が設けられ、基板の上面に接着シートが設け
られた状態で所定の位置にスルーホールが形成されてお
り、さらに、接着シートに電極部を構成する金属箔が貼
り付けられてスルーホールがふさがれてなる構造を有し
ているものであってもよく、この場合には、基板裏面へ
の樹脂もれを防止することができる。Further, the substrate and the electrode portion are provided with a metal layer on a lower surface of the substrate, and a through hole is formed at a predetermined position with an adhesive sheet provided on the upper surface of the substrate. May have a structure in which the metal foil constituting the electrode portion is attached and the through-hole is closed, and in this case, it is possible to prevent resin leakage to the back surface of the substrate. it can.
【0084】また、前記透明樹脂部の前記発光面に対向
する部分が、前記樹脂部から露出した第2の発光面とし
て形成されているものであってもよく、この場合には、
両側面発光する半導体発光装置を得ることができる。Further, the portion of the transparent resin portion facing the light emitting surface may be formed as a second light emitting surface exposed from the resin portion. In this case,
A semiconductor light emitting device that emits light on both sides can be obtained.
【0085】また、基板上に発光色の異なる2種または
3種の発光素子チップが覆われているものであってもよ
く、この場合には、多色発光が可能な半導体発光装置を
得ることができ、利用用途がより広くなる。Further, two or three kinds of light emitting element chips having different emission colors may be covered on the substrate. In this case, a semiconductor light emitting device capable of emitting multicolor light is obtained. And can be used for a wider range of applications.
【0086】また、基板上に複数の電極部を設け、第1
電極部上に第1発光素子チップを搭載し、第2電極部上
に第2発光素子チップを搭載し、第1発光素子チップを
金属線を用いて第3電極部にワイヤボンディングし、第
2発光素子チップを金属線を用いて第4電極部にワイヤ
ボンディングする工程と、液状の透明樹脂を塗布または
注入し硬化させることによって、少なくとも隣り合う第
1発光素子チップおよび第2発光素子チップを覆う1つ
の透明樹脂部を形成する工程と、遮光性および反射性を
有する樹脂を塗布または注入し硬化させることによっ
て、光透過性樹脂部表面を覆う遮光性および反射性を有
する樹脂部を形成する工程と、隣り合う第1発光素子チ
ップと第2発光素子チップとを個々に切り離すために、
透明樹脂部を2分割する工程とからなるものであり、こ
の発明によれば、分割面のみを発光面にすることができ
るため、光漏れを低減することができる。その結果、発
光面での光の取り出し効率をより高くすることができ
る。Further, a plurality of electrode portions are provided on the substrate,
A first light emitting element chip is mounted on the electrode part, a second light emitting element chip is mounted on the second electrode part, and the first light emitting element chip is wire-bonded to the third electrode part using a metal wire, A step of wire bonding the light emitting element chip to the fourth electrode portion using a metal wire, and applying or injecting and curing a liquid transparent resin to at least cover the adjacent first light emitting element chip and second light emitting element chip A step of forming one transparent resin part and a step of forming a light-shielding and reflective resin part covering the light-transmitting resin part surface by applying or injecting and curing a resin having light-shielding and reflective properties And in order to separate the adjacent first light emitting element chip and second light emitting element chip individually,
According to the present invention, only the divided surface can be used as the light emitting surface, so that light leakage can be reduced. As a result, the light extraction efficiency at the light emitting surface can be further increased.
【0087】また、前記透明樹脂部を形成する方法とし
てスクリーン印刷方式が用いられていてもよく、この場
合には、透明樹脂部を容易に形成することができ、その
結果、製造コストを削減することができる。A screen printing method may be used as a method of forming the transparent resin portion. In this case, the transparent resin portion can be easily formed, and as a result, the manufacturing cost can be reduced. be able to.
【0088】また、前記透明樹脂部を形成する方法とし
てポッティング方式が用いられていてもよく、この場合
には、硬化後の透明樹脂部表面に離型剤が残らず内部樹
脂部と外部樹脂部との間に安定した接着性を確保でき
る。As a method of forming the transparent resin portion, a potting method may be used. In this case, the release agent does not remain on the surface of the cured transparent resin portion, and the inner resin portion and the outer resin portion are not removed. And stable adhesiveness can be ensured.
【0089】また、前記遮光性および反射性を有する樹
脂部を形成する方法としてスクリーン印刷方式が用いら
れていてもよく、この場合には、遮光性および反射性を
有する樹脂部を容易に形成することができ、その結果、
製造コストを削減することができる。A screen printing method may be used as a method of forming the resin part having the light-shielding property and the reflective property. In this case, the resin part having the light-shielding property and the reflective property is easily formed. And as a result,
Manufacturing costs can be reduced.
【0090】また、前記遮光性および反射性を有する樹
脂部を形成する方法としてトランスファーモールド方式
が用いられていてもよく、この場合には、遮光性および
反射性を有する樹脂部を容易に形成することができ、そ
の結果、製造コストを削減することができる。Further, a transfer molding method may be used as a method of forming the resin part having the light-shielding property and the reflective property. In this case, the resin part having the light-shielding property and the reflective property is easily formed. As a result, manufacturing costs can be reduced.
【0091】また、前記スクリーン印刷方式において用
いられるメタルマスクの開口部の形状が、楕円形状をベ
ースとし、さらにこの楕円形状の両端部の曲線部分をカ
ットしたものであってもよく、この場合には、LEDチ
ップ搭載位置ずれおよび基板パターンずれを防止するこ
とができ、その結果、歩留まりをよくすることができ
る。Further, the shape of the opening of the metal mask used in the screen printing method may be an ellipse-shaped base, and furthermore, a curved portion at both ends of the ellipse may be cut. Can prevent the displacement of the LED chip mounting position and the displacement of the substrate pattern, and as a result, the yield can be improved.
【図1】本発明の半導体発光装置の製造方法の一実施の
形態を示す平面図である。FIG. 1 is a plan view showing one embodiment of a method for manufacturing a semiconductor light emitting device of the present invention.
【図2】本発明の半導体発光装置の製造方法の一実施の
形態を示す断面図である。FIG. 2 is a sectional view showing one embodiment of a method for manufacturing a semiconductor light emitting device of the present invention.
【図3】本発明の半導体発光装置の一実施の形態を示す
斜視図である。FIG. 3 is a perspective view showing one embodiment of the semiconductor light emitting device of the present invention.
【図4】スクリーン印刷方式による光透過性樹脂の塗布
工程の一例を示す断面図である。FIG. 4 is a cross-sectional view illustrating an example of a step of applying a light transmitting resin by a screen printing method.
【図5】ポッティング方式による光透過性樹脂の注入工
程の一例を示す断面図である。FIG. 5 is a cross-sectional view showing an example of a step of injecting a light-transmitting resin by a potting method.
【図6】スクリーン印刷方式による白色エポキシ系樹脂
の塗布工程の一例を示す断面図である。FIG. 6 is a sectional view showing an example of a step of applying a white epoxy resin by a screen printing method.
【図7】本発明の半導体発光装置を構成する基板および
電極部の構造の一例を示す断面図である。FIG. 7 is a cross-sectional view illustrating an example of a structure of a substrate and an electrode unit constituting the semiconductor light emitting device of the present invention.
【図8】メタルマスクの厚さに対する塗布後の樹脂部の
厚さの一例を示すグラフである。FIG. 8 is a graph showing an example of a thickness of a resin portion after application with respect to a thickness of a metal mask.
【図9】本発明の半導体発光装置の製造方法において用
いられるメタルマスクの一例を示す説明図である。FIG. 9 is an explanatory diagram illustrating an example of a metal mask used in the method for manufacturing a semiconductor light emitting device of the present invention.
【図10】本発明の半導体発光装置の他の実施の形態を
示す斜視図である。FIG. 10 is a perspective view showing another embodiment of the semiconductor light emitting device of the present invention.
【図11】本発明の半導体発光装置の製造方法にしたが
ってLEDチップを個々に切り離す前の状態を示す平面
図である。FIG. 11 is a plan view showing a state before individual LED chips are separated according to the method for manufacturing a semiconductor light emitting device of the present invention.
【図12】本発明の半導体発光装置のさらに他の実施の
形態を示す斜視図である。FIG. 12 is a perspective view showing still another embodiment of the semiconductor light emitting device of the present invention.
【図13】本発明の半導体発光装置のさらに他の実施の
形態を示す斜視図である。FIG. 13 is a perspective view showing still another embodiment of the semiconductor light emitting device of the present invention.
【図14】本発明の半導体発光装置の製造方法にしたが
って、トランスファーモールド方式によって白色エポキ
シ系樹脂部を形成した状態の一例を示す部分平面図であ
る。FIG. 14 is a partial plan view showing an example of a state in which a white epoxy resin portion is formed by a transfer molding method according to the method for manufacturing a semiconductor light emitting device of the present invention.
【図15】トランスファーモールド方式によって白色エ
ポキシ系樹脂部を形成する工程の一例を示す断面説明図
である。FIG. 15 is an explanatory sectional view showing an example of a step of forming a white epoxy resin portion by a transfer molding method.
【図16】トランスファーモールド方式によって白色エ
ポキシ系樹脂部を形成する工程の一例を示す断面説明図
である。FIG. 16 is an explanatory sectional view showing an example of a step of forming a white epoxy resin portion by a transfer molding method.
【図17】従来の側面発光型半導体発光装置の一例を示
す斜視図である。FIG. 17 is a perspective view showing an example of a conventional side emission type semiconductor light emitting device.
【図18】従来の側面発光型半導体発光装置の他の例を
示す斜視図である。FIG. 18 is a perspective view showing another example of the conventional side emission type semiconductor light emitting device.
1 基板 2a,2b 金属配線 3a 第1LEDチップ 3b 第2LEDチップ 4a,4b Au線 5 光透過性樹脂部 6 白色エポキシ系樹脂部 DESCRIPTION OF SYMBOLS 1 Substrate 2a, 2b Metal wiring 3a 1st LED chip 3b 2nd LED chip 4a, 4b Au wire 5 Light transmissive resin part 6 White epoxy resin part
フロントページの続き Fターム(参考) 4M109 AA02 BA01 CA04 CA10 CA21 EC11 EC12 GA01 5F041 AA37 AA41 CA76 CA77 DA07 DA12 DA13 DA20 DA44 DA58 DA81 DA92 DB09 FF11 5F061 AA02 CA04 CA10 CA21 CB13 FA01 Continued on front page F-term (reference) 4M109 AA02 BA01 CA04 CA10 CA21 EC11 EC12 GA01 5F041 AA37 AA41 CA76 CA77 DA07 DA12 DA13 DA20 DA44 DA58 DA81 DA92 DB09 FF11 5F061 AA02 CA04 CA10 CA21 CB13 FA01
Claims (10)
板上に形成された2つの電極部と、1つの電極部上に搭
載され、他の電極部に金属線を介してワイヤボンディン
グされた発光素子チップと、この発光素子チップおよび
金属線表面を覆う透明樹脂部と、この透明樹脂部を覆う
遮光性および反射性を有する樹脂部とから構成されてお
り、前記透明樹脂部の一側部が外部に露出した発光面に
形成されていることを特徴とする半導体発光装置。1. An electrically insulating substrate, two electrode portions formed on the substrate, and mounted on one electrode portion and wire-bonded to another electrode portion via a metal wire. A light-emitting element chip, a transparent resin portion covering the light-emitting element chip and the metal wire surface, and a light-shielding and reflective resin portion covering the transparent resin portion. A semiconductor light emitting device, wherein a portion is formed on a light emitting surface exposed to the outside.
金属層が設けられ、基板の上面に接着シートが設けられ
た状態で所定の位置にスルーホールが形成されており、
さらに、接着シートに電極部を構成する金属箔が貼り付
けられてスルーホールがふさがれてなる構造を有してい
る請求項1記載の半導体発光装置。2. The substrate and the electrode portion, wherein a metal layer is provided on a lower surface of the substrate, and a through hole is formed at a predetermined position in a state where an adhesive sheet is provided on an upper surface of the substrate.
2. The semiconductor light emitting device according to claim 1, further comprising a structure in which a metal foil constituting an electrode portion is attached to the adhesive sheet and the through hole is closed.
部分が、前記樹脂部から露出した第2の発光面として形
成されている請求項1または2記載の半導体発光装置。3. The semiconductor light emitting device according to claim 1, wherein a portion of said transparent resin portion facing said light emitting surface is formed as a second light emitting surface exposed from said resin portion.
3種の発光素子チップが搭載されている請求項1、2ま
たは3記載の半導体発光装置。4. The semiconductor light emitting device according to claim 1, wherein two or three types of light emitting element chips having different emission colors are mounted on the substrate.
部上に第1発光素子チップを搭載し、第2電極部上に第
2発光素子チップを搭載し、第1発光素子チップを金属
線を用いて第3電極部にワイヤボンディングし、第2発
光素子チップを金属線を用いて第4電極部にワイヤボン
ディングする工程と、 液状の透明樹脂を塗布または注入し硬化させることによ
って、少なくとも隣り合う第1発光素子チップおよび第
2発光素子チップを覆う1つの透明樹脂部を形成する工
程と、 遮光性および反射性を有する樹脂を塗布または注入し硬
化させることによって、光透過性樹脂部表面を覆う遮光
性および反射性を有する樹脂部を形成する工程と、 隣り合う第1発光素子チップと第2発光素子チップとを
個々に切り離すために、透明樹脂部を2分割する工程と
からなる半導体発光装置の製造方法。5. A first light emitting device chip comprising: a plurality of electrode portions provided on a substrate; a first light emitting device chip mounted on a first electrode portion; a second light emitting device chip mounted on a second electrode portion; By wire bonding to the third electrode portion using a metal wire, and wire bonding the second light emitting element chip to the fourth electrode portion using a metal wire, and by applying or injecting and curing a liquid transparent resin. Forming at least one transparent resin portion that covers at least the adjacent first light emitting element chip and second light emitting element chip; A step of forming a resin part having a light-shielding property and a reflective property covering the surface of the part, and dividing the transparent resin part into two in order to separate the adjacent first and second light-emitting element chips individually. And a method for manufacturing a semiconductor light emitting device.
クリーン印刷方式が用いられている請求項5記載の半導
体発光装置の製造方法。6. The method according to claim 5, wherein a screen printing method is used as a method for forming the transparent resin portion.
ッティング方式が用いられている請求項5記載の半導体
発光装置の製造方法。7. The method according to claim 5, wherein a potting method is used as a method for forming the transparent resin portion.
を形成する方法としてスクリーン印刷方式が用いられて
いる請求項5記載の半導体発光装置の製造方法。8. The method for manufacturing a semiconductor light emitting device according to claim 5, wherein a screen printing method is used as a method for forming the resin portion having a light shielding property and a reflective property.
を形成する方法としてトランスファーモールド方式が用
いられている請求項5記載の半導体発光装置の製造方
法。9. The method for manufacturing a semiconductor light emitting device according to claim 5, wherein a transfer molding method is used as a method for forming the resin portion having a light-shielding property and a reflective property.
られるメタルマスクの開口部の形状が、楕円形状をベー
スとし、さらにこの楕円形状の両端部の曲線部分をカッ
トしたものである請求項6記載の半導体発光装置の製造
方法。10. The semiconductor light emitting device according to claim 6, wherein the shape of the opening of the metal mask used in the screen printing method is based on an elliptical shape, and the curved portions at both ends of the elliptical shape are cut. Device manufacturing method.
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JP2000367494A JP2002170998A (en) | 2000-12-01 | 2000-12-01 | Semiconductor light emitting device and its manufacturing method |
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JP2005019838A (en) * | 2003-06-27 | 2005-01-20 | Nippon Leiz Co Ltd | Light source device and method for manufacturing the same |
JPWO2004066398A1 (en) * | 2003-01-20 | 2006-05-18 | シャープ株式会社 | Transparent resin composition for optical sensor filter, optical sensor and manufacturing method thereof |
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