JP2002169296A5 - - Google Patents
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- JP2002169296A5 JP2002169296A5 JP2001322359A JP2001322359A JP2002169296A5 JP 2002169296 A5 JP2002169296 A5 JP 2002169296A5 JP 2001322359 A JP2001322359 A JP 2001322359A JP 2001322359 A JP2001322359 A JP 2001322359A JP 2002169296 A5 JP2002169296 A5 JP 2002169296A5
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2000-068423 | 2000-11-17 | ||
KR1020000068423A KR20020038283A (ko) | 2000-11-17 | 2000-11-17 | 포토레지스트 단량체, 그의 중합체 및 이를 함유하는포토레지스트 조성물 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002169296A JP2002169296A (ja) | 2002-06-14 |
JP2002169296A5 true JP2002169296A5 (US20040106767A1-20040603-C00005.png) | 2005-04-07 |
JP4091285B2 JP4091285B2 (ja) | 2008-05-28 |
Family
ID=19699654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001322359A Expired - Lifetime JP4091285B2 (ja) | 2000-11-17 | 2001-10-19 | フォトレジスト単量体、フォトレジスト重合体、フォトレジスト組成物、フォトレジストパターン形成方法、及び半導体素子 |
Country Status (4)
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6534239B2 (en) * | 2001-04-27 | 2003-03-18 | International Business Machines Corporation | Resist compositions with polymers having pendant groups containing plural acid labile moieties |
KR20040039731A (ko) * | 2002-11-04 | 2004-05-12 | 주식회사 동진쎄미켐 | 디사이클로헥실이 결합된 펜던트 기를 가지는 화학적으로증폭된 고분자와 그 제조방법, 및 이를 포함하는 레지스트조성물 |
JP2006518476A (ja) * | 2003-02-21 | 2006-08-10 | エイゼット・エレクトロニック・マテリアルズ・ユーエスエイ・コーポレイション | 深紫外線リソグラフィ用のフォトレジスト組成物 |
US20040166434A1 (en) * | 2003-02-21 | 2004-08-26 | Dammel Ralph R. | Photoresist composition for deep ultraviolet lithography |
WO2008038682A1 (en) * | 2006-09-28 | 2008-04-03 | Asahi Glass Company, Limited | Novel fluorine-containing polymer |
US8852854B2 (en) * | 2007-02-21 | 2014-10-07 | Advanced Micro Devices, Inc. | Method for forming a photoresist pattern on a semiconductor wafer using oxidation-based catalysis |
JP4475435B2 (ja) * | 2007-07-30 | 2010-06-09 | 信越化学工業株式会社 | 含フッ素単量体、含フッ素高分子化合物、レジスト材料及びパターン形成方法 |
JP5155764B2 (ja) * | 2007-08-20 | 2013-03-06 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
WO2009142183A1 (ja) * | 2008-05-19 | 2009-11-26 | Jsr株式会社 | 新規化合物及び重合体並びに感放射線性組成物 |
KR20110010095A (ko) * | 2008-05-19 | 2011-01-31 | 제이에스알 가부시끼가이샤 | 액침 노광용 감방사선성 수지 조성물, 중합체 및 레지스트 패턴 형성 방법 |
JP5584894B2 (ja) * | 2008-06-11 | 2014-09-10 | ダイトーケミックス株式会社 | 含フッ素化合物および高分子化合物 |
JP5131488B2 (ja) | 2009-12-22 | 2013-01-30 | 信越化学工業株式会社 | 含フッ素単量体及び含フッ素高分子化合物 |
JP5403128B2 (ja) * | 2012-09-12 | 2014-01-29 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP6317095B2 (ja) * | 2013-11-29 | 2018-04-25 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、高分子化合物及び化合物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4027081A (en) * | 1972-07-28 | 1977-05-31 | Stanley Turner | Polymeric compositions containing hydrogen bonding compound |
DE3421511A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck |
JPS6449039A (en) * | 1987-08-20 | 1989-02-23 | Tosoh Corp | Method for forming positive resist pattern |
JPH01215812A (ja) * | 1988-02-25 | 1989-08-29 | Tosoh Corp | ポリアクリル酸誘導体 |
US5484822A (en) * | 1991-06-24 | 1996-01-16 | Polaroid Corporation | Process and composition for cladding optic fibers |
EP0583918B1 (en) * | 1992-08-14 | 1999-03-10 | Japan Synthetic Rubber Co., Ltd. | Reflection preventing film and process for forming resist pattern using the same |
DE69423641T2 (de) * | 1993-10-12 | 2000-10-19 | Clariant Finance (Bvi) Ltd., Road Town | Reflexionsvermindernde oberflächenbeschichtungen |
US6030747A (en) * | 1997-03-07 | 2000-02-29 | Nec Corporation | Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask |
JP2000298345A (ja) * | 1999-04-14 | 2000-10-24 | Toray Ind Inc | ポジ型感放射線性組成物 |
KR100589543B1 (ko) * | 2000-09-07 | 2006-06-13 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 폴리머, 레지스트조성물 및 패턴형성방법 |
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2000
- 2000-11-17 KR KR1020000068423A patent/KR20020038283A/ko not_active Application Discontinuation
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2001
- 2001-08-29 TW TW090121284A patent/TW594401B/zh not_active IP Right Cessation
- 2001-10-19 JP JP2001322359A patent/JP4091285B2/ja not_active Expired - Lifetime
- 2001-11-09 US US10/035,772 patent/US6686123B2/en not_active Expired - Fee Related