JP2002123190A5 - - Google Patents
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- JP2002123190A5 JP2002123190A5 JP2001169394A JP2001169394A JP2002123190A5 JP 2002123190 A5 JP2002123190 A5 JP 2002123190A5 JP 2001169394 A JP2001169394 A JP 2001169394A JP 2001169394 A JP2001169394 A JP 2001169394A JP 2002123190 A5 JP2002123190 A5 JP 2002123190A5
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- JP
- Japan
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001169394A JP4741110B2 (ja) | 2000-06-05 | 2001-06-05 | 検査装置、発光装置の作製方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000168143 | 2000-06-05 | ||
JP2000-168143 | 2000-06-05 | ||
JP2000168143 | 2000-06-05 | ||
JP2001169394A JP4741110B2 (ja) | 2000-06-05 | 2001-06-05 | 検査装置、発光装置の作製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002123190A JP2002123190A (ja) | 2002-04-26 |
JP2002123190A5 true JP2002123190A5 (enrdf_load_stackoverflow) | 2008-05-29 |
JP4741110B2 JP4741110B2 (ja) | 2011-08-03 |
Family
ID=26593349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001169394A Expired - Fee Related JP4741110B2 (ja) | 2000-06-05 | 2001-06-05 | 検査装置、発光装置の作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4741110B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI272556B (en) | 2002-05-13 | 2007-02-01 | Semiconductor Energy Lab | Display device |
JP4791023B2 (ja) | 2004-11-08 | 2011-10-12 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Tftの検査装置および検査方法 |
KR102350618B1 (ko) * | 2021-05-31 | 2022-01-13 | 유정구 | 통합 led모듈 검사장치 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4575676A (en) * | 1983-04-04 | 1986-03-11 | Advanced Research And Applications Corporation | Method and apparatus for radiation testing of electron devices |
DE3342531A1 (de) * | 1983-11-24 | 1985-06-05 | Max Planck Gesellschaft | Verfahren und einrichtung zum erzeugen von kurz dauernden, intensiven impulsen elektromagnetischer strahlung im wellenlaengenbereich unter etwa 100 nm |
JPH0614259B2 (ja) * | 1984-03-21 | 1994-02-23 | 株式会社半導体エネルギ−研究所 | 表示装置 |
US5179279A (en) * | 1991-01-25 | 1993-01-12 | Rensselaer Polytechnic Institute | Non-contact electrical pathway |
JPH05109484A (ja) * | 1991-10-17 | 1993-04-30 | Tohoku Pioneer Kk | Elデイスプレイユニツト |
US5202623A (en) * | 1992-02-26 | 1993-04-13 | Digital Equipment Corporation | Laser-activated plasma chamber for non-contact testing |
JPH07140209A (ja) * | 1993-09-20 | 1995-06-02 | Fujitsu Ltd | 回路配線基板の検査装置およびその検査方法 |
JP2002513157A (ja) * | 1998-04-27 | 2002-05-08 | エクサイト エレクトロ−オプティカル システムズ リミテッド | 相互接続回路網の試験装置及び試験方法 |
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2001
- 2001-06-05 JP JP2001169394A patent/JP4741110B2/ja not_active Expired - Fee Related