JP2002097573A - Sliding member - Google Patents

Sliding member

Info

Publication number
JP2002097573A
JP2002097573A JP2000283326A JP2000283326A JP2002097573A JP 2002097573 A JP2002097573 A JP 2002097573A JP 2000283326 A JP2000283326 A JP 2000283326A JP 2000283326 A JP2000283326 A JP 2000283326A JP 2002097573 A JP2002097573 A JP 2002097573A
Authority
JP
Japan
Prior art keywords
hard carbon
carbon film
amorphous hard
film
sliding member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000283326A
Other languages
Japanese (ja)
Inventor
Masaki Moronuki
正樹 諸貫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Riken Corp
Original Assignee
Riken Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Riken Corp filed Critical Riken Corp
Priority to JP2000283326A priority Critical patent/JP2002097573A/en
Priority to DE60116407T priority patent/DE60116407T2/en
Priority to ES01110948T priority patent/ES2256110T3/en
Priority to EP01110948A priority patent/EP1154035B1/en
Priority to US09/850,192 priority patent/US6821497B2/en
Priority to KR10-2001-0025295A priority patent/KR100404006B1/en
Priority to CNB011212640A priority patent/CN1229517C/en
Priority to IDP00200100370D priority patent/ID30201A/en
Priority to ARP010102193A priority patent/AR028432A1/en
Priority to BRPI0101812-4A priority patent/BR0101812B1/en
Priority to TW090110922A priority patent/TWI268962B/en
Publication of JP2002097573A publication Critical patent/JP2002097573A/en
Pending legal-status Critical Current

Links

Landscapes

  • Rotary Pumps (AREA)
  • Details Of Reciprocating Pumps (AREA)
  • Sliding-Contact Bearings (AREA)
  • Chemical Vapour Deposition (AREA)
  • Fuel-Injection Apparatus (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a sliding member having an abrasion-resistant hard coating thereon, which is formed at a low temperature without requiring high temperatures and thereby without a reduction of dimension accuracy due to heat deformation and of a hardness of a base material. SOLUTION: The sliding member is characterized by forming an amorphous hard carbon film composed of carbon and hydrogen as a main composition and a metallic oxide, on a relatively abutting or sliding part to an opponent member.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、金属酸化物を含有
する非晶質硬質炭素膜を形成した自動車用、家電用など
の摺動部材に関する。本発明において「硬質」とはトラ
イボロジにおける一般的用法に沿っており(例えば「ト
ライボロジストVol44,No.9,1999、小特集硬質材
料」参照)、具体的には摺動相手材より硬さが高い性質
であり、特にHv1000以上、より好ましくはHv1
500以上を指す。非晶質硬質炭素皮膜についてはトラ
イボロジストVol41,No.9,1996, 760から771頁に適用例
が解説されている。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sliding member for automobiles, home appliances, etc., on which an amorphous hard carbon film containing a metal oxide is formed. In the present invention, “hard” is in accordance with the general usage in tribology (for example, see “Tribologist, Vol. 44, No. 9, 1999, a small special issue, hard materials”). High quality, especially Hv1000 or more, more preferably Hv1
Refers to 500 or more. An application example of the amorphous hard carbon film is described in Tribologist, Vol 41, No. 9, 1996, pp. 760 to 771.

【0002】[0002]

【従来の技術】自動車用内燃機関の摺動部材、例えばピ
ストンリングの外周面、内周面及び側面、ベーン、燃料
噴射ポンププランジャ外周面等は過酷な摺動条件に曝さ
れるため高度な耐摩耗性が要求されている。
2. Description of the Related Art Sliding members of an internal combustion engine for automobiles, for example, the outer peripheral surface, inner peripheral surface and side surfaces of a piston ring, vanes, and the outer peripheral surface of a fuel injection pump plunger are exposed to severe sliding conditions, so that they have high durability. Wear resistance is required.

【0003】従来、これらの部位の十分な摺動特性、特
に耐摩耗性を確保するために、高級な耐摩耗性材料を使
用し、窒化や浸炭などの硬質皮膜形成表面処理を行って
摺動機能を高めることにより耐摩耗性の向上が図られて
きた。しかしながら、従来の方向では使用材料が高価で
あることやまた硬質皮膜形成処理時に数百度から千度の
高温での処理が必要となることから、熱変形による寸法
精度の低下や硬度低下といった問題があった。
Conventionally, in order to ensure sufficient sliding characteristics of these parts, particularly, abrasion resistance, a high-grade abrasion-resistant material is used, and a hard coating forming surface treatment such as nitriding or carburizing is performed. Abrasion resistance has been improved by increasing the function. However, in the conventional direction, the materials used are expensive, and the treatment at a high temperature of several hundred degrees to 1,000 degrees is required during the formation of the hard film. there were.

【0004】燃料噴射ポンププランジャは潤滑性の悪い
ガソリン環境下で摺動でするため、硬質粒子を分散させ
た複合分散めっき皮膜が適用されているが、所定の皮膜
硬度を得るためには400℃程度の熱処理が必要となる
ためSKD11相当の高級材を基材に使用する必要があ
った。そこで、低温で耐摩耗性硬質皮膜を形成する処理
方法の開発が望まれていた。
[0004] Since the fuel injection pump plunger slides in a gasoline environment having poor lubricity, a composite dispersion plating film in which hard particles are dispersed is applied. However, in order to obtain a predetermined film hardness, 400 ° C is required. Since a high degree of heat treatment is required, it is necessary to use a high quality material equivalent to SKD11 for the base material. Therefore, development of a treatment method for forming a wear-resistant hard film at a low temperature has been desired.

【0005】特開平3−240957号では非晶質硬度
炭素−水素−珪素薄膜が摺動中に相手材表面に形成され
た珪素酸化物(SiO2)の薄膜が気体の吸着等による
所謂コンタミネーション潤滑を示して比較的低い摩擦係
数を示すことが開示されている。ここでいう珪素酸化物
は予め珪素を含んだ非晶質硬質炭素−水素−珪素薄膜が
相手材との摺動により相手材表面に形成されるものであ
る。この薄膜の摩擦係数は珪素酸化物が相手材表面に形
成されて初めて低くなる。
In Japanese Unexamined Patent Publication (Kokai) No. 3-240957, a thin film of silicon oxide (SiO 2 ) formed on the surface of a mating material during sliding of an amorphous hardness carbon-hydrogen-silicon thin film is a so-called contamination due to gas adsorption or the like. It is disclosed that it exhibits lubrication and exhibits a relatively low coefficient of friction. The silicon oxide referred to here is one in which an amorphous hard carbon-hydrogen-silicon thin film containing silicon in advance is formed on the surface of a mating material by sliding with the mating material. The coefficient of friction of this thin film becomes low only after silicon oxide is formed on the surface of the mating material.

【0006】[0006]

【発明が解決しようとする課題】本発明はかかる問題点
を解決すべくなされたものであり、本発明の目的は、耐
摩耗性硬質皮膜の形成に高温を必要とせず、熱変形によ
る母材の寸法精度低下や硬度低下を生じることがなく、
低温で耐摩耗性硬質皮膜を形成させる方法により、摺動
部位に金属酸化物を含有する非晶質硬質炭素膜を形成し
た摺動部材を提供することにある。また、本発明は金属
酸化物を含有する非晶質硬質炭素膜を提供することによ
り、従来の非晶質硬質炭素皮膜では実現不可能であった
摺動初期から安定した低摩擦係数を得るものである。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above problems, and an object of the present invention is to provide a base material which does not require a high temperature for forming a wear-resistant hard film and which is thermally deformed. Without lowering of dimensional accuracy or lowering of hardness.
An object of the present invention is to provide a sliding member in which an amorphous hard carbon film containing a metal oxide is formed on a sliding portion by a method of forming a wear-resistant hard film at a low temperature. Further, the present invention provides an amorphous hard carbon film containing a metal oxide to obtain a stable low coefficient of friction from the beginning of sliding, which was impossible with a conventional amorphous hard carbon film. It is.

【0007】[0007]

【課題を解決するための手段】本発明は前記課題を解決
すべくなされたものであり、炭素と水素を主成分とする
非晶質硬質炭素膜に金属酸化物を含有せしめることによ
り、相手部材との摺動において低摩擦係数で良好な耐摩
耗性を達成する。この金属酸化物はSi,Ti,B及び
Wからなる群から選ばれた少なくとも1種以上の元素の
酸化物であることが好ましい。また、炭素中の酸素の含
有量は約0.1〜10原子%が好適である。
DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and a metal member is contained in an amorphous hard carbon film containing carbon and hydrogen as main components to form a mating member. And achieves good wear resistance with a low coefficient of friction in sliding. The metal oxide is preferably an oxide of at least one element selected from the group consisting of Si, Ti, B and W. Further, the content of oxygen in carbon is preferably about 0.1 to 10 atomic%.

【0008】本発明に係る非晶質硬質炭素膜の副成分
は、主として酸化物であり、若干量の酸化物として結合
していない酸素、金属元素の他にフッ素、臭素、塩素な
どの原料に起因する物質を含む。本発明において、主成
分である炭素と水素が構成する物質がArレーザーラマ
ン分光法で検出される非晶質構造をもち、これにより優
れた摺動特性を発揮する。一方酸化物は結晶質でも非晶
質でもよい。
The subcomponent of the amorphous hard carbon film according to the present invention is mainly an oxide, and is used as a raw material such as fluorine, bromine and chlorine in addition to a small amount of oxygen and metal element which are not bonded as an oxide. Including substances caused by. In the present invention, the substance composed of carbon and hydrogen as main components has an amorphous structure detected by Ar laser Raman spectroscopy, thereby exhibiting excellent sliding characteristics. On the other hand, the oxide may be crystalline or amorphous.

【0009】本発明において、相手部材とは、摺動部材
がピストンリングである場合は、鋳鉄、アルミニウム合
金製シリンダーもしくはシリンダーライナーであり、摺
動部材が圧縮機ベーンである場合は、アルミニウム合金
製もしくは鉄製ローター、ハウジングであり、摺動部材
が燃料噴射用プランジャである場合はSKD11相当材で
ある。これらは例示であり、本発明の摺動部材と相手材
は非晶質硬質炭素皮膜の特性を利用することができるあ
らゆる部材に適用される。
In the present invention, the mating member is a cylinder or a cylinder liner made of cast iron or an aluminum alloy when the sliding member is a piston ring, and is made of an aluminum alloy when the sliding member is a compressor vane. Alternatively, when the sliding member is a fuel injection plunger which is an iron rotor and a housing, the material is equivalent to SKD11. These are examples, and the sliding member and the counterpart material of the present invention are applied to all members that can utilize the characteristics of the amorphous hard carbon film.

【0010】本発明に係る非晶質硬質炭素膜の硬さは主
として膜中の水素含有量により決定されるが、ビッカー
ス硬度で1800以下では耐摩耗性が悪く、2500以
上では皮膜が欠けやすくなるため、Hv1800〜25
00が好ましい。より好ましくビッカース硬度でHv1
900〜2400の範囲が望ましい。また、皮膜の厚さ
は2μm未満では十分な耐摩耗性が得られず、15μm
以上では皮膜の応力により剥離し易くなるため、5〜1
0μmが好適である。続いて、各摺動部材毎の皮膜形成
部位は、ピストンリングの場合は少なくとも外周面、内
周面、側面及びスペーサ耳部の1箇所以上であり、圧縮
機ベーンの場合は、少なくともベーンの先端R面、側面
の1箇所以上であり、また燃料噴射ポンプ用プランジャ
の場合は少なくともプランジャの外周面である。これら
ピストンリング、ベーン、プランジャなどの基材は従来
から使用されている材料であってよい。非晶質硬質炭素
膜を摺動部材の必要な部位に形成する場合、下地金属上
に直接形成しても良いし、窒化層、Crめっき皮膜、窒
化珪素等の硬質粒子を分散させたNi−Co−P系複合
分散めっき皮膜、CrN、TiNなどのイオンプレーテ
ィング皮膜などの上に形成することも可能である。
The hardness of the amorphous hard carbon film according to the present invention is mainly determined by the hydrogen content in the film. When the Vickers hardness is 1800 or less, the abrasion resistance is poor, and when the Vickers hardness is 2500 or more, the film is easily chipped. Therefore, Hv1800-25
00 is preferred. More preferably Hv1 with Vickers hardness
A range of 900 to 2400 is desirable. If the thickness of the film is less than 2 μm, sufficient abrasion resistance cannot be obtained.
Above, it is easy to peel off due to the stress of the film.
0 μm is preferred. Subsequently, the film formation site for each sliding member is at least one of an outer peripheral surface, an inner peripheral surface, a side surface, and a spacer ear portion in the case of a piston ring, and at least a tip of the vane in the case of a compressor vane. At least one of the R surface and the side surface, and in the case of a plunger for a fuel injection pump, at least the outer peripheral surface of the plunger. The base material such as the piston ring, the vane and the plunger may be a conventionally used material. When the amorphous hard carbon film is formed at a necessary portion of the sliding member, the amorphous hard carbon film may be formed directly on the underlying metal, or may be formed of a Ni— layer in which hard particles such as a nitride layer, a Cr plating film, and silicon nitride are dispersed. It can also be formed on a Co-P-based composite dispersion plating film, an ion plating film of CrN, TiN, or the like.

【0011】このような炭素と水素を主成分とし、金属
酸化物を含有する非晶質硬質炭素膜は炭素原料、金属含
有原料及び酸素原料を摺動部材を設置した真空室内に導
入することにより摺動部材表面に形成することができ
る。その膜形成法としては、RFプラズマCVD法、イ
オンビーム蒸着法、イオンプレーティング法、真空アー
ク法などがあるが、以下RFプラズマCVD法の例を説
明する。
Such an amorphous hard carbon film containing carbon and hydrogen as main components and a metal oxide can be obtained by introducing a carbon material, a metal-containing material and an oxygen material into a vacuum chamber in which a sliding member is installed. It can be formed on the surface of the sliding member. Examples of the film forming method include an RF plasma CVD method, an ion beam evaporation method, an ion plating method, and a vacuum arc method. Hereinafter, an example of the RF plasma CVD method will be described.

【0012】炭素原料ガスとしてはメタン、アセチレン
などの炭化水素ガスを用いることができる。また、金属
含有原料ガスとしてはテトラメチルシラン、テトラエチ
ルシラン、テトラメトキシシラン、テトラエトキシシラ
ンやトリエトキシボロン、三フッ化ホウ素、テトラ−i
−プロポキシチタン、六フッ化タングステンなどを用い
ることができる。尚、成膜時に摺動部材の加熱は行わな
い。摺動部材はプラズマに曝されることにより、温度上
昇するが200℃以下である。
As the carbon source gas, a hydrocarbon gas such as methane and acetylene can be used. Examples of the metal-containing source gas include tetramethylsilane, tetraethylsilane, tetramethoxysilane, tetraethoxysilane, triethoxyboron, boron trifluoride, and tetra-i.
-Titanium propoxy, tungsten hexafluoride or the like can be used. Note that the sliding member is not heated during the film formation. The temperature of the sliding member rises due to exposure to the plasma, but is 200 ° C. or less.

【0013】[0013]

【作用】このようにして摺動部材表面に形成された金属
酸化物を含有する非晶質硬度炭素膜は摺動部材との密着
性も良好で、高硬度で低摩擦係数であるため、相手材と
の摺動において耐摩耗性にも優れた性能を示す。このよ
うな金属酸化物含有の非晶質硬質炭素膜を摺動部材の相
手材と当接又は摺接する部位に形成することにより、過
酷な摺動条件下でも十分な耐摩耗性を確保することがで
きる。
The amorphous carbon film containing the metal oxide formed on the surface of the sliding member in this manner has good adhesion to the sliding member, high hardness and low friction coefficient. Also shows excellent performance in abrasion resistance in sliding with materials. By forming such an amorphous hard carbon film containing a metal oxide at a position where the sliding member comes into contact with or slides against a mating material, sufficient wear resistance can be ensured even under severe sliding conditions. Can be.

【0014】特に本発明による非晶質硬度炭素膜では従
来の非晶質硬質炭素膜と異なり、金属酸化物を含有して
いるため、従来よりも低い摩擦係数が得られるという特
徴がある。この性質については以下のように考察した。
従来の例えば珪素を含んだ非晶質硬質炭素膜において膜
硬度や摩擦係数は皮膜中の炭素量及び結合状態や膜中水
素濃度に結合状態に依存すると考え、水素、珪素の組成
及びそれぞれの元素の結合状態に着目した。炭素は炭素
同士或いは水素と結合してsp2結合(グラファイト構
造)とsp3結合(ダイヤモンド構造)を形成する。本
発明による非晶質硬質炭素膜はArレーザーラマン分光
法による測定で1550cm−1付近のブロードなG
(Graphite)ピークをサブピークとする構造的な特徴を
持つことが確認されており、sp2結合とsp3結合、
すなわちグラファイト構造とダイヤモンド構造が混在し
た構造をとっている。
In particular, the amorphous hard carbon film according to the present invention has a feature that, unlike the conventional amorphous hard carbon film, it contains a metal oxide, so that a friction coefficient lower than that of the conventional hard carbon film can be obtained. This property was considered as follows.
For example, in a conventional amorphous hard carbon film containing silicon, the film hardness and the friction coefficient are considered to depend on the amount of carbon in the film and the bonding state and the bonding state depending on the hydrogen concentration in the film. We focused on the bonding state of Carbon forms sp2 bonds (graphite structure) and sp3 bonds (diamond structure) by bonding with each other or with hydrogen. The amorphous hard carbon film according to the present invention has a broad G around 1550 cm −1 as measured by Ar laser Raman spectroscopy.
(Graphite) has been confirmed to have structural features with the peak as a sub-peak, including sp2 and sp3 bonds,
That is, the structure has a mixture of a graphite structure and a diamond structure.

【0015】膜中での元素の結合状態に着目すると元素
状珪素は炭素と結合して安定な炭化物を形成するが、部
分的に未結合の電子がダングリングボンドとして残る可
能性があると考えられ、構造的に不安定となり、皮膜の
硬度、摩擦係数にも影響すると考えられる。膜内部にダ
ングリングボンドが存在する場合には摺動により摩滅が
進んで膜内部が雰囲気に曝されると雰囲気との相互作用
による化学反応、例えば酸化雰囲気であれば表面の酸化
反応が進み、表面が化学的に安定な状態に到達するまで
反応が進行するものと考えられる。そこで本発明では金
属元素を添加した非晶質硬質炭素膜を真空中のプラズマ
から生成させる時に微量の酸素を導入して、安全な炭化
物になりきっていない金属元素を酸素と結合させて酸化
物とすることにより安定な結合状態とすることに着眼し
た。以上珪素酸化物の例を説明したが、Tiなどの場合
はTiCとして炭素と化合していないTiを酸化物とす
ることにより同様の効果を期待することができる。
Focusing on the bonding state of the elements in the film, it is considered that elemental silicon bonds with carbon to form a stable carbide, but partially unbonded electrons may remain as dangling bonds. It is considered that the film becomes unstable structurally and affects the hardness and the coefficient of friction of the film. If there is a dangling bond inside the film, the abrasion proceeds by sliding and the inside of the film is exposed to the atmosphere, and when exposed to the atmosphere, a chemical reaction due to interaction with the atmosphere, for example, the oxidation reaction of the surface proceeds in an oxidizing atmosphere, It is believed that the reaction proceeds until the surface reaches a chemically stable state. Therefore, in the present invention, a small amount of oxygen is introduced when an amorphous hard carbon film to which a metal element is added is generated from plasma in a vacuum, and a metal element that has not become a safe carbide is combined with oxygen to form an oxide. The focus was on achieving a stable binding state by performing the following. Although the example of the silicon oxide has been described above, in the case of Ti or the like, the same effect can be expected by using Ti which is not combined with carbon as the oxide as TiC.

【0016】このようにして、グラファイト構造による
低摩擦性とダイヤモンド構造、Si−C結合による硬質
性の両方の性質を兼ね備え、加えて微量の酸素添加によ
る安定な結合状態を持った非晶質硬質炭素膜で安定した
低摩擦性が得られる膜として本発明による金属酸化物を
含有する非晶質硬質炭素膜を考案するに至った。
As described above, the amorphous hard material having both the low friction property due to the graphite structure and the hard property due to the diamond structure and the Si—C bond, and having a stable bonding state by adding a small amount of oxygen. The present inventors have devised an amorphous hard carbon film containing a metal oxide according to the present invention as a film capable of obtaining stable low friction with a carbon film.

【0017】図7は珪素を含有する非晶質硬質炭素膜の
成膜中に酸素添加した被膜の摩擦係数低減効果について
示したものである。少量の酸素を添加することにより、
摩擦係数が低減されていることがわかる。このような被
膜についてX線光電子分光法(XPS)により膜中の珪素含
有量及び状態について調査した結果、珪素は4原子%以
下で、主として炭素と結合しSi−C結合となっている
が、一部の珪素は酸素と結合してSiOxの酸化物の形
態をとっていることが確認された。すなわち、このこと
から珪素を含有する非晶質硬質炭素膜において膜中で安
定した炭化物になっていない珪素を、酸素を添加して酸
化物とすることにより安定な結合状態とさせることによ
り、摩擦係数が低減されることが示された。
FIG. 7 shows the effect of reducing the coefficient of friction of a film obtained by adding oxygen during the formation of an amorphous hard carbon film containing silicon. By adding a small amount of oxygen,
It can be seen that the coefficient of friction has been reduced. As a result of examining the silicon content and the state of the film by X-ray photoelectron spectroscopy (XPS) for such a film, silicon is less than 4 atomic% and is mainly bonded to carbon to form a Si—C bond. It was confirmed that some silicon was bonded to oxygen to form an oxide of SiOx. In other words, from this fact, the silicon that is not stable carbide in the amorphous hard carbon film containing silicon is converted into an oxide by adding oxygen to form a stable bonding state, whereby the friction is increased. It was shown that the coefficient was reduced.

【0018】[0018]

【実施例】以下、ピストンリング、ベーンについての成
膜方法について説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a film forming method for a piston ring and a vane will be described.

【0019】実施例1(ピストンリング) 図1は本発明をピストンリングへ適用した実施例を示し
たものである。レール1の外周面1a、内周面1b及び
側面1cのそれぞれハッチング部に前述したようにRF
プラズマCVD法により金属酸化物を含有する非晶質硬
質炭素膜2を形成する。またスペーサ3がレール1と当
接する耳部4にも金属酸化物を含有する非晶質硬質炭素
膜2を形成する。
Embodiment 1 (Piston Ring) FIG. 1 shows an embodiment in which the present invention is applied to a piston ring. As described above, the hatched portions of the outer peripheral surface 1a, the inner peripheral surface 1b, and the side surface 1c of the rail 1
An amorphous hard carbon film 2 containing a metal oxide is formed by a plasma CVD method. Also, an amorphous hard carbon film 2 containing a metal oxide is formed on a lug 4 where the spacer 3 is in contact with the rail 1.

【0020】本発明に係る非晶質硬質炭素膜をピストン
リングに形成するために、真空室41(図41)内に予
め窒化され、洗浄しておいたピストンリング42をRF
電源43に接続された電極板44上に配設し、排気口4
5に接続された真空ポンプ(図示せず)により真空室1
内を5.25E-8Pa程度まで排気した。次に真空室41内を
連続的に排気しながら、ガス導入口46よりArガスを
導入して真空室41内の圧力を7.5E-5Pa程度に調節
し、RF電源43よりRF電力をピストンリング42に
加えてプラズマ放電を励起し、ピストンリング表面をク
リーニングした。続いて、Arガスの流入を止め、真空
室41内に炭素原料ガス、金属含有原料ガス及び酸素原
料ガスを導入して、再びRF電力を印加してプラズマ放
電を励起し、ピストンリング表面の窒化層上に金属酸化
物を含有する非晶質硬質炭素膜を10μmの膜厚に形成
した。炭素原料ガスとしてはアセチレンを用い、また、
金属含有原料ガスとしてはテトラメチルシランを用い
た。表1に比較例を含めた成膜条件を示した。
In order to form the amorphous hard carbon film according to the present invention on the piston ring, the piston ring 42 which has been nitrided and cleaned in a vacuum chamber 41 (FIG. 41) is subjected to RF.
An exhaust port 4 is provided on an electrode plate 44 connected to a power supply 43.
Vacuum chamber 1 by a vacuum pump (not shown) connected to
The inside was evacuated to about 5.25E-8Pa. Next, while continuously exhausting the inside of the vacuum chamber 41, Ar gas is introduced from the gas inlet 46 to adjust the pressure in the vacuum chamber 41 to about 7.5E-5Pa, and RF power is supplied from the RF power supply 43 to the piston. The plasma discharge was excited in addition to the ring 42 to clean the piston ring surface. Subsequently, the flow of Ar gas is stopped, a carbon source gas, a metal-containing source gas, and an oxygen source gas are introduced into the vacuum chamber 41, and RF power is applied again to excite plasma discharge, thereby nitriding the piston ring surface. An amorphous hard carbon film containing a metal oxide was formed on the layer to a thickness of 10 μm. Acetylene is used as the carbon source gas,
Tetramethylsilane was used as the metal-containing source gas. Table 1 shows film forming conditions including a comparative example.

【0021】[0021]

【表1】 [Table 1]

【0022】尚、成膜時にピストンリングの加熱は行わ
なかった。ピストンリングはプラズマに曝されることに
より、プラズマ中の電子やイオンの衝突による衝撃によ
り温度上昇するが表1に示したような条件下では200
℃以上の温度にまで加熱されることはなかった。ピスト
ンリング42を積み重ねて電極板44の上に置く図4の
場合には、ピストンリング外周面のみに非晶質硬質炭素
膜が形成される。一方、図5に示したように円筒状の治
具50に複数個のピストンリング42を一定間隔で配設
した場合にはピストンリングの外周面と側面に非晶質硬
質炭素膜を形成することができる。また、図6に示した
ように複数個のピストンリング42を一定間隔で3本の
支持棒60により内周側より支えるように配設すると、
ピストンリングの外周面、側面及び内周面(支持棒によ
り陰になる部分を除く)に非晶質硬質炭素膜を形成する
ことができる。
The piston ring was not heated during the film formation. When the piston ring is exposed to the plasma, the temperature of the piston ring rises due to the impact of the collision of electrons and ions in the plasma.
It was not heated to a temperature above ° C. In the case of FIG. 4 in which the piston rings 42 are stacked and placed on the electrode plate 44, an amorphous hard carbon film is formed only on the outer peripheral surface of the piston ring. On the other hand, when a plurality of piston rings 42 are arranged at regular intervals on a cylindrical jig 50 as shown in FIG. 5, an amorphous hard carbon film must be formed on the outer peripheral surface and side surfaces of the piston ring. Can be. In addition, as shown in FIG. 6, when the plurality of piston rings 42 are disposed so as to be supported from the inner peripheral side by three support rods 60 at regular intervals,
An amorphous hard carbon film can be formed on the outer peripheral surface, the side surface, and the inner peripheral surface (excluding a portion shaded by the support rod) of the piston ring.

【0023】図4に示したようにピストンリングを積み
重ねて、表1に示した条件で外周面に非晶質硬質炭素膜
を形成した。かくして表面処理されたピストンリングに
ついてモータリング試験により摩擦損失の測定を行っ
た。相手材はFC250のシリンダーライナーで、回転
数100rpm.オイルは低粘度油(40℃、5cS
t)で行った。その結果を図8に示した。
As shown in FIG. 4, the piston rings were stacked, and an amorphous hard carbon film was formed on the outer peripheral surface under the conditions shown in Table 1. The friction loss of the piston ring thus surface-treated was measured by a motoring test. The mating material is a FC250 cylinder liner with a rotation speed of 100 rpm. Oil is low viscosity oil (40 ℃, 5cS
t). The result is shown in FIG.

【0024】比較例1 比較のため実施例1で用いたのと同じ窒化ピストンリン
グにつき何ら皮膜形成表面処理なしで、実施例1と同じ
条件で摩擦損失を測定した。その結果を図8に併せて示
した。
Comparative Example 1 For comparison, the friction loss was measured under the same conditions as in Example 1 without using any film-forming surface treatment on the same nitrided piston ring used in Example 1. The results are also shown in FIG.

【0025】比較例2 比較のため実施例1で用いたのと同じ窒化したピストン
リングにクロムめっき層を約20μの厚さに形成したも
のにつき、実施例1と同じ条件で摩擦損失を比較した。
その結果を図8に併せて示した。
Comparative Example 2 For comparison, a friction loss was compared under the same conditions as in Example 1 except that a chromium plating layer was formed on the same nitrided piston ring used in Example 1 to a thickness of about 20 μm. .
The results are also shown in FIG.

【0026】比較例3 比較のため成膜中に酸素を添加せずに珪素が炭化物とし
てのみ存在する非晶質硬質炭素膜をピストンリング外周
面に約10μmの厚さに形成した。このような膜を形成
したピストンリングについて摩擦損失を測定した結果を
図8に併せて示した。図8から明らかなように、本実施
例1によるピストンリングでは窒化層のみの比較例1に
対して11.6%摩擦損失が低減されていることがわか
る。この値は比較例2の窒化+クロムめっきに対しても
約8%低い値となっている。また、酸素が添加されず珪
素が炭化物としてのみ存在する比較例3の非晶質硬質炭
素膜に対しても本実施例1の摩擦損失は約3.2%低減
されている。すなわち、この結果から、珪素を含有する
非晶質硬質炭素膜で酸素を微量添加することにより膜中
で完全な炭化物になっていない構造的に不安定な珪素を
酸化物とし、より安定な珪素酸化物とし、より安定な結
合状態とした本発明の非晶質硬質炭素膜はより低い摩擦
係数が実現できるため、酸化物が形成されていない非晶
質硬質炭素膜よりも摩擦損失が低減出来ることが示され
た。
Comparative Example 3 For comparison, an amorphous hard carbon film containing only silicon as a carbide without adding oxygen during film formation was formed on the outer peripheral surface of the piston ring to a thickness of about 10 μm. FIG. 8 also shows the result of measuring the friction loss of the piston ring having such a film formed thereon. As is clear from FIG. 8, the piston ring according to the first embodiment has a 11.6% reduction in friction loss as compared with the comparative example 1 having only the nitrided layer. This value is about 8% lower than that of the nitride + chromium plating of Comparative Example 2. Also, the friction loss of the first embodiment is reduced by about 3.2% with respect to the amorphous hard carbon film of the third comparative example in which silicon is present only as a carbide without adding oxygen. That is, from this result, by adding a small amount of oxygen to an amorphous hard carbon film containing silicon, structurally unstable silicon that is not completely carbide in the film is converted into an oxide, and more stable silicon is obtained. Since the amorphous hard carbon film of the present invention in the form of an oxide and in a more stable bonding state can realize a lower friction coefficient, the friction loss can be reduced as compared with the amorphous hard carbon film in which the oxide is not formed. It was shown that.

【0027】実施例2(ベーン) 図2(A)はコンプレッサー用ベーン20(母材材質は
SKH51)の斜視図である。図2(B)はベーン20
の断面を示した図であるが、先端R面20bと4つの側
面に前述と同様の方法でRFプラズマCVD法により珪
素酸化物を含有する非晶質硬質炭素膜2を形成した。表
2は実施例2とその比較例の作製条件について示したも
のである。
Embodiment 2 (Vane) FIG. 2A is a perspective view of a compressor vane 20 (base material is SKH51). FIG. 2 (B) shows the vane 20.
The amorphous hard carbon film 2 containing silicon oxide was formed on the tip R surface 20b and four side surfaces by RF plasma CVD in the same manner as described above. Table 2 shows the manufacturing conditions of Example 2 and Comparative Example.

【0028】[0028]

【表2】 [Table 2]

【0029】図2(B)に示したようにベーン20の底
面20cを除く面に非晶質硬質炭素膜を形成する場合に
は図4に示した装置において電極板44上にベーンを底
面を下にして一定間隔で立てて並べる。図2に示したよ
うな先端R面20bと4つの側面に金属酸化物を含有す
る非晶質硬質炭素膜をコーティングしたベーンの耐摩耗
性評価試験を行った。相手材はFC250材とし、荷重9
8.1N/mm、摺動速度0.5m/sec.で4時間
行った。図9はその結果を示したものである。
As shown in FIG. 2B, when an amorphous hard carbon film is formed on the surface of the vane 20 except for the bottom surface 20c, the vane is placed on the electrode plate 44 in the apparatus shown in FIG. Stand vertically at regular intervals. An abrasion resistance evaluation test of a vane in which an amorphous hard carbon film containing a metal oxide was coated on the tip R surface 20b and four side surfaces as shown in FIG. 2 was performed. The partner material is FC250 material, load 9
8.1 N / mm, sliding speed 0.5 m / sec. For 4 hours. FIG. 9 shows the result.

【0030】比較例4 比較のため実施例2で用いたのと同じSKH51に皮膜
形成の表面処理をしないベーンを用意し、耐摩耗性を比
較した。その結果を図9に併せて示した。
COMPARATIVE EXAMPLE 4 For comparison, a vane without the surface treatment for film formation was prepared on the same SKH51 as used in Example 2, and the wear resistance was compared. The results are also shown in FIG.

【0031】比較例5 比較のため実施例2で用いたのと同じSKH51にイオ
ンプレーティング法によりCrN膜を約5μmの膜厚で
形成したベーンを用意し、耐摩耗性を比較した。その結
果を図9に併せて示した。
Comparative Example 5 For comparison, a vane having a CrN film formed to a thickness of about 5 μm on the same SKH51 as used in Example 2 by an ion plating method was prepared, and the wear resistance was compared. The results are also shown in FIG.

【0032】比較例6 比較のため成膜中に酸素を添加せずに珪素が炭化物とし
てのみ存在する非晶質硬質炭素膜をベーンに約10μm
の厚さに形成した。このような膜を形成したベーンにつ
いて耐摩耗性を比較評価した結果を図9に併せて示し
た。
COMPARATIVE EXAMPLE 6 For comparison, an amorphous hard carbon film containing only silicon as a carbide without adding oxygen during film formation was applied to a vane by about 10 μm.
It was formed in thickness. FIG. 9 also shows the results of comparative evaluation of the wear resistance of the vane on which such a film was formed.

【0033】図9から明らかなように無処理のSKH5
1(比較例4)が最も摩耗量は大きく、ついで酸素無添
加の非晶質硬質炭素膜(比較例6)の摩耗量が2番目に
大きく、実施例2は比較例5のイオンプレーティングに
よるCrN膜と同等の非常に小さな摩耗量となっている
ことがわかる。さらに、表2に示したように摩擦係数に
着目すると実施例2は比較例に比べて低い摩擦係数とな
っている。すなわち、この結果から、珪素を含有する非
晶質硬質炭素膜に酸素を微量添加することにより、膜中
で完全な炭化物になっていない構造的に不安定な珪素を
酸化物とし、より安定な結合状態とした非晶質硬質炭素
膜は酸化物が形成されていない非晶質硬質炭素膜に比べ
て良好な耐摩耗性を示し、加えて低い摩擦係数が実現で
きることが示された。
As is clear from FIG. 9, unprocessed SKH5
1 (Comparative Example 4) had the largest abrasion loss, and the oxygen hardened amorphous hard carbon film (Comparative Example 6) had the second largest abrasion loss. Example 2 was based on the ion plating of Comparative Example 5. It can be seen that the wear amount is very small, equivalent to that of the CrN film. Further, focusing on the friction coefficient as shown in Table 2, Example 2 has a lower friction coefficient than the comparative example. That is, from this result, by adding a slight amount of oxygen to the amorphous hard carbon film containing silicon, the structurally unstable silicon that is not completely carbide in the film is converted into an oxide, and a more stable It was shown that the amorphous hard carbon film in the bonded state exhibited better wear resistance than the amorphous hard carbon film on which no oxide was formed, and in addition, a low friction coefficient could be realized.

【0034】実施例3(プランジャ) 図3は燃料噴射ポンププランジャー(材質SKD11相
当材)の断面図を示したものである。プランジャ30の
円筒外周部30aに前述と同様の方法でRFプラズマC
VD法により珪素酸化物を含有する非晶質硬質炭素膜2
を形成した。図4に示したような装置でプランジャーの
片端を保持して電極板44上に複数個一定間隔で整列さ
せ、実施例2と同様の条件により、プランジャーの外周
面に珪素酸化物を含有する非晶質硬質炭素膜を膜厚10
μm形成した。このようなプランジャーでガソリン潤滑
下での耐焼き付き性評価試験を行った。摺動速度8m/
sec、荷重条件max250MPaまで行った。表3
はその結果を示した。
Embodiment 3 (Plunger) FIG. 3 is a sectional view of a fuel injection pump plunger (material equivalent to SKD11). RF plasma C is applied to the outer peripheral portion 30a of the plunger 30 in the same manner as described above.
Amorphous hard carbon film 2 containing silicon oxide by VD method
Was formed. With the device shown in FIG. 4, one end of the plunger is held and a plurality of the plungers are aligned on the electrode plate 44 at a constant interval. Amorphous hard carbon film with a thickness of 10
μm was formed. A test for evaluating seizure resistance under gasoline lubrication was performed using such a plunger. Sliding speed 8m /
The operation was performed up to a load condition of max. Table 3
Showed the result.

【0035】[0035]

【表3】 [Table 3]

【0036】比較例7 比較のため実施例2で用いたのと同じSKD11に皮膜
形成表面処理をしないプランジャーの耐焼き付き性を実
施例2と同じ方法で試験した。その結果を表3に併せて
示した。
COMPARATIVE EXAMPLE 7 For the purpose of comparison, the same seizure resistance of the plunger which was not subjected to the film-forming surface treatment on SKD11 used in Example 2 was tested in the same manner as in Example 2. The results are shown in Table 3.

【0037】比較例8 比較のため実施例3で用いたのと同じSKD11に複合
分散めっき法により硼素を含有するNi−Co−P系め
っき膜を形成した製のプランジャーの耐焼き付き性を実
施例3と同じ方法で試験した。その結果を表3に併せて
示した。
Comparative Example 8 For the purpose of comparison, the seizure resistance of a plunger made of a Ni-Co-P-based plating film containing boron on the same SKD11 used in Example 3 by a composite dispersion plating method was implemented. Tested in the same manner as in Example 3. The results are shown in Table 3.

【0038】比較例9 比較のため成膜中に酸素を添加せずに珪素が炭化物とし
てのみ存在する非晶質硬質炭素膜炭素膜をプランジャー
に約10μmの厚さに形成した。このような膜を形成し
たプランジャーについて耐焼き付き性を比較評価した結
果を表3に併せて示した。
Comparative Example 9 For comparison, an amorphous hard carbon film in which silicon was present only as a carbide without adding oxygen during film formation was formed in a plunger to a thickness of about 10 μm. Table 3 also shows the results of comparative evaluation of the seizure resistance of the plunger having such a film formed thereon.

【0039】表3に示した焼き付き性荷重値から明らか
なようになんら皮膜形成表面処理をしていないSKD1
1のプランジャーでは10MPa付近で焼き付きが発生
する。また硼素を含有するNi−Co−P系めっき膜で
は約20MPa程度で焼き付きが発生する。さらに珪素
酸化物を含有しない非晶質硬質炭素膜では22MPa程
度で焼き付きが発生するが、珪素酸化物を含有する非晶
質硬質炭素膜は最大荷重である25MPaまで焼き付き
を発生しなかった。すなわち、このことから珪素を含有
する非晶質硬質炭素膜で酸素を微量添加することにより
膜中で完全な炭化物になっていない構造的に不安定な珪
素を酸化物とし、より安定な結合状態とした本発明の非
晶質硬質炭素膜が酸化物が形成されていない非晶質硬質
炭素膜に比べて良好な耐焼き付き性を実現できることが
示された。
As is clear from the seizure load values shown in Table 3, SKD1 without any film-forming surface treatment was used.
With the plunger No. 1, burn-in occurs near 10 MPa. Further, in a Ni—Co—P plating film containing boron, image sticking occurs at about 20 MPa. Further, in the amorphous hard carbon film containing no silicon oxide, seizure occurs at about 22 MPa, but in the amorphous hard carbon film containing silicon oxide, no seizure occurred up to the maximum load of 25 MPa. In other words, from this fact, by adding a small amount of oxygen to an amorphous hard carbon film containing silicon, structurally unstable silicon that is not completely carbide in the film is converted into an oxide, and a more stable bonding state is obtained. It has been shown that the amorphous hard carbon film of the present invention can achieve better seizure resistance than an amorphous hard carbon film having no oxide formed.

【0040】[0040]

【発明の効果】自動車用、家電用で過酷な摺動条件で使
用される摺動部材に、NiもしくはCo系のような高価
な耐熱材料を使用することなく、摺動部材の相手材と当
接又は摺接する部位に室温付近の低温雰囲気で金属酸化
物を含有する非晶質硬質炭素膜を形成することにより、
母材の熱変形による寸法精度の低下がなく、均一で密着
性の良い高高度の皮膜を容易に形成することができる。
これにより摺動部材の耐摩耗性、耐焼き付き性を大幅に
改善することができ、ピストンリング、ベーン、プラン
ジャの摺動部分を低摩擦係数で高硬度での皮膜でコーテ
ィングすることにより摩擦損失を低減し、耐摩耗性及び
耐焼き付き性が向上し、耐久性が改善される。また、予
め膜中に摩擦係数を低減させる金属酸化物が含まれてい
るため、酸化雰囲気で無い場合や真空中でも低摩擦係数
が得られる。
The sliding member used for severe sliding conditions for automobiles and home appliances does not use an expensive heat-resistant material such as a Ni or Co material and can be used as a mating material for the sliding member. By forming an amorphous hard carbon film containing a metal oxide in a low-temperature atmosphere near room temperature at the site where it contacts or slides,
There is no decrease in dimensional accuracy due to thermal deformation of the base material, and it is possible to easily form a uniform, high-adhesion film with good adhesion.
This greatly improves the wear resistance and seizure resistance of the sliding member, and reduces the friction loss by coating the sliding part of the piston ring, vane, and plunger with a film with low friction coefficient and high hardness. Reduced, abrasion and seizure resistance are improved, and durability is improved. In addition, since a metal oxide that reduces the coefficient of friction is contained in the film in advance, a low coefficient of friction can be obtained even in an oxidizing atmosphere or in a vacuum.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明を適用したピストンリングの断面図で
ある。
FIG. 1 is a sectional view of a piston ring to which the present invention is applied.

【図2】 図2(A)は本発明を適用したコンプレッサ
用ベーンの斜視図であり、図4(B)はベーンの断面図
である。
FIG. 2A is a perspective view of a compressor vane to which the present invention is applied, and FIG. 4B is a cross-sectional view of the vane.

【図3】 本発明を適用した燃料噴射ポンプ用プランジ
ャの断面図である。
FIG. 3 is a sectional view of a plunger for a fuel injection pump to which the present invention is applied.

【図4】 本発明による非晶質硬質炭素膜を形成するた
めのRFプラズマCVD装置の概要を示した図である。
FIG. 4 is a view showing an outline of an RF plasma CVD apparatus for forming an amorphous hard carbon film according to the present invention.

【図5】 本発明を適用したピストンリングで外周面、
側面に非晶質硬質炭素膜を形成する場合の方法について
示した図である。
FIG. 5 shows an outer peripheral surface of a piston ring to which the present invention is applied;
FIG. 4 is a diagram showing a method in a case where an amorphous hard carbon film is formed on a side surface.

【図6】 本発明を適用したピストンリング外周面、側
面、内周面に非晶質硬質炭素膜を形成する方法について
示した図である。
FIG. 6 is a view showing a method of forming an amorphous hard carbon film on the outer peripheral surface, the side surface, and the inner peripheral surface of the piston ring to which the present invention is applied.

【図7】 酸素流量と摩擦係数の関係を示すグラフであ
る。
FIG. 7 is a graph showing a relationship between an oxygen flow rate and a friction coefficient.

【図8】 実施例及び比較例の摩擦損失を示すグラフで
ある。
FIG. 8 is a graph showing frictional losses of Examples and Comparative Examples.

【図9】 実施例及び比較例のベーン摩耗量を示すグラ
フである。
FIG. 9 is a graph showing the amount of vane wear in Examples and Comparative Examples.

【符号の説明】[Explanation of symbols]

1・・レール 2・・金属酸化物を含有する非晶質硬質炭素膜 3・・スペーサ 4・・耳部 20・・ベーン 30・・プランジャ 1. Rail 2. Amorphous hard carbon film containing metal oxide 3. Spacer 4. Ears 20 Vane 30 Plunger

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // F02F 5/00 F04B 21/04 C Fターム(参考) 3G066 AA07 AB02 BA00 BA49 CA09 CD15 CD21 3H040 AA03 BB11 CC14 DD11 DD36 DD40 3H071 BB02 CC26 DD01 EE05 EE06 3J011 DA01 QA04 SE02 SE10 4K030 AA06 AA09 BA27 BB05 CA02 FA03 JA01 JA06 LA23 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // F02F 5/00 F04B 21/04 C F-term (Reference) 3G066 AA07 AB02 BA00 BA49 CA09 CD15 CD21 3H040 AA03 BB11 CC14 DD11 DD36 DD40 3H071 BB02 CC26 DD01 EE05 EE06 3J011 DA01 QA04 SE02 SE10 4K030 AA06 AA09 BA27 BB05 CA02 FA03 JA01 JA06 LA23

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 相手部材と相対的に当接または摺接する
部位に、炭素と水素を主成分とし、金属酸化物を含む非
晶質硬質炭素膜を形成したことを特徴とする摺動部材。
1. A sliding member characterized in that an amorphous hard carbon film containing carbon and hydrogen as main components and a metal oxide is formed on a portion which is relatively in contact with or slidingly contacts with a counterpart member.
【請求項2】 前記金属酸化物がSi,Ti,B及びW
からなる群より選ばれた少なくとも1種の元素の酸化物
であることを特徴とする請求項1記載の摺動部材。
2. The method according to claim 1, wherein the metal oxide is Si, Ti, B and W.
The sliding member according to claim 1, wherein the sliding member is an oxide of at least one element selected from the group consisting of:
【請求項3】 前記非晶質硬質炭素膜がビッカース硬度
で1800〜2500の硬さを有することを特徴とする
請求項1または2記載の摺動部材。
3. The sliding member according to claim 1, wherein the amorphous hard carbon film has a Vickers hardness of 1800 to 2500.
【請求項4】 前記非晶質硬質炭素膜の厚さが2〜15
μmであることを特徴とする請求項1から3までのいず
れか1項に摺動部材。
4. The amorphous hard carbon film having a thickness of 2 to 15
The sliding member according to any one of claims 1 to 3, wherein the thickness of the sliding member is μm.
【請求項5】 請求項1から4までのいずれか1項に記
載の非晶質硬質炭素膜を、少なくともピストンリングの
外周面、内周面、側面及びスペーサ耳部の1箇所以上に
形成したことを特徴とするピストンリング。
5. The amorphous hard carbon film according to claim 1, which is formed on at least one of an outer peripheral surface, an inner peripheral surface, a side surface, and a spacer ear of a piston ring. A piston ring characterized by the above-mentioned.
【請求項6】 請求項1から4までのいずれか1項に記
載の非晶質硬質炭素膜を、少なくともベーンの先端R
面、側面の1箇所以上に形成したことを特徴とする圧縮
機ベーン。
6. An amorphous hard carbon film according to any one of claims 1 to 4, wherein at least a tip R
A compressor vane formed at one or more locations on a surface and a side surface.
【請求項7】 請求項1から4までのいずれか1項に記
載の非晶質硬質炭素膜を、少なくとも外周面に形成した
ことを特徴とする燃料噴射ポンプ用プランジャ。
7. A plunger for a fuel injection pump, wherein the amorphous hard carbon film according to any one of claims 1 to 4 is formed at least on an outer peripheral surface.
JP2000283326A 2000-05-09 2000-09-19 Sliding member Pending JP2002097573A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP2000283326A JP2002097573A (en) 2000-09-19 2000-09-19 Sliding member
DE60116407T DE60116407T2 (en) 2000-05-09 2001-05-05 Amorphous oxide-containing carbon layer
ES01110948T ES2256110T3 (en) 2000-05-09 2001-05-05 AMORFO CARBON FILM CONTAINING OXIDE.
EP01110948A EP1154035B1 (en) 2000-05-09 2001-05-05 Amorphous carbon film containing oxide
US09/850,192 US6821497B2 (en) 2000-05-09 2001-05-08 Amorphous hard carbon film, mechanical parts and method for producing amorphous hard carbon film
KR10-2001-0025295A KR100404006B1 (en) 2000-05-09 2001-05-09 Amorphous hard carbon film, mechanical parts and method for producing amorphous hard carbon film
CNB011212640A CN1229517C (en) 2000-05-09 2001-05-09 Non-crystalline hard carbon film, mechanical part and method for producing non-crystalline hard carbon film
IDP00200100370D ID30201A (en) 2000-05-09 2001-05-09 HARD AMORF CARBON FILM, MECHANICAL PARTS AND METHODS TO PRODUCE HARD AMORF CARBON FILM
ARP010102193A AR028432A1 (en) 2000-05-09 2001-05-09 HARD CARBON FILM AND AMORFA, MECHANICAL PARTS AND METHODS TO PRODUCE A HARD CARBON FILM AND AMORFA
BRPI0101812-4A BR0101812B1 (en) 2000-05-09 2001-05-09 amorphous rigid carbon film and mechanical part containing it.
TW090110922A TWI268962B (en) 2000-05-09 2001-05-24 Amorphous hard carbon film and mechanical parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000283326A JP2002097573A (en) 2000-09-19 2000-09-19 Sliding member

Publications (1)

Publication Number Publication Date
JP2002097573A true JP2002097573A (en) 2002-04-02

Family

ID=18767704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000283326A Pending JP2002097573A (en) 2000-05-09 2000-09-19 Sliding member

Country Status (1)

Country Link
JP (1) JP2002097573A (en)

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JP2006349019A (en) * 2005-06-15 2006-12-28 Teikoku Piston Ring Co Ltd Combined oil ring
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JP2009138674A (en) * 2007-12-07 2009-06-25 Tocalo Co Ltd Compressor blade, method for manufacturing thr same, and gas turbine for thermal power generation
JP2011047052A (en) * 2010-10-01 2011-03-10 Tocalo Co Ltd Method of manufacturing member for semiconductor machining device
JP2012201170A (en) * 2011-03-24 2012-10-22 Honda Motor Co Ltd Attachment structure for output sprocket
JP2013529249A (en) * 2010-03-09 2013-07-18 フェデラル−モグル・ブルシャイト・ゲーエムベーハー Method for coating at least inner surface of piston ring and piston ring
KR20160000302A (en) * 2014-06-24 2016-01-04 엘지전자 주식회사 A linear compressor
JP2016500794A (en) * 2012-10-11 2016-01-14 フェデラル−モーグル コーポレイション Chemical vapor deposition of wear resistant coatings on the piston ring operating surface, side and inner diameter in a single coating run
JP2016052986A (en) * 2010-03-03 2016-04-14 太陽誘電ケミカルテクノロジー株式会社 Method for immobilization to layer made of noncrystalline carbon film, and laminate
WO2016121937A1 (en) * 2015-01-29 2016-08-04 株式会社ジェイテクト Low-friction coating production method and sliding method
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JPH04272468A (en) * 1991-02-26 1992-09-29 Toyota Central Res & Dev Lab Inc Plunger of injection pump for alcoholic fuel
JPH10130865A (en) * 1996-09-06 1998-05-19 Sanyo Electric Co Ltd Substrate with hard carbon film and its forming method
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JP2016052986A (en) * 2010-03-03 2016-04-14 太陽誘電ケミカルテクノロジー株式会社 Method for immobilization to layer made of noncrystalline carbon film, and laminate
JP2013529249A (en) * 2010-03-09 2013-07-18 フェデラル−モグル・ブルシャイト・ゲーエムベーハー Method for coating at least inner surface of piston ring and piston ring
JP2011047052A (en) * 2010-10-01 2011-03-10 Tocalo Co Ltd Method of manufacturing member for semiconductor machining device
JP2012201170A (en) * 2011-03-24 2012-10-22 Honda Motor Co Ltd Attachment structure for output sprocket
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US9909210B2 (en) 2012-10-11 2018-03-06 Federal-Mogul Llc Chemical vapor deposition of wear resistant coatings onto piston ring running face, side face, and inner diameter in one coating run
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US20180023016A1 (en) 2015-01-29 2018-01-25 Jtekt Corporation Amorphous hydrocarbon based film, and sliding member and sliding system provided with said film
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US10329509B2 (en) 2015-01-29 2019-06-25 Jtekt Corporation Amorphous hydrocarbon based film, and sliding member and sliding system with said film
US10450527B2 (en) 2015-01-29 2019-10-22 Jtekt Corporation Low-friction coating production method and sliding method
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WO2016121937A1 (en) * 2015-01-29 2016-08-04 株式会社ジェイテクト Low-friction coating production method and sliding method
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