JP2002097456A - Abrasive particle and its manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an abrasive particle capable of precisely abrading an object of abrasion with a high abrasive force, and a manufacturing method thereof. SOLUTION: The abrasive particle is composed of a mother particle and plural child particles adhered and fixed to the surface of the mother particle. As the mother particle, an elastic, spherical polymer particle having an average particle size of 1-100 μm is employed. As the child particles, hard particles having an average particle size 1/500 to 1/10 as large as that of the mother particle are employed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to abrasive particles used for polishing surfaces of metals, ceramics, plastics and the like, and a method for producing the same.

[0002]

2. Description of the Related Art Disc-shaped parts such as semiconductor wafers, spherical parts such as ball bearings, and various mechanical parts having complicated shapes such as irregularities and hollow parts. In order to achieve the performance and functions expected in the design stage, they must be finished to a surface that faithfully conforms to the design shape, and the polishing process of these parts is a very important process. ing.

[0003] For such polishing, fixed abrasive polishing or loose abrasive polishing is generally used. In fixed abrasive polishing, a polishing paint in which various types of particles such as metal oxides, metal nitrides, and diamonds are dispersed in a binder resin solution is applied to a plastic film, and the coated particles are dried and continuously or impregnated. The polishing is performed using a polishing film having a continuous polishing layer formed thereon, and the free abrasive polishing is performed using a polishing slurry in which polishing particles are dispersed in water or a water-based aqueous solution.

[0004] In addition, for polishing a corner portion of a plate-shaped component or a spherical component, barrel polishing (banrrel polis) is used.
hing) is used. Polishing of a corner portion of a polishing target such as a plate-shaped component is performed by inserting the plate-shaped polishing target into a container (barrel) into which abrasive particles are charged and vibrating the polishing target, and Polishing of a polishing object such as a spherical part is performed by putting abrasive particles and the polishing object into a cylindrical container (barrel) and rotating or vibrating the container.

Further, for polishing various mechanical parts having complicated shapes such as uneven portions and hollow portions, spray polishing (ab)
passive blasting) is used. Such polishing of the object to be polished is performed by blowing abrasive particles to the object to be polished with air or a liquid.

Generally, as the number of abrasive particles in contact with the object to be polished per unit area increases, the polishing can be accurately performed without damaging the object to be polished, and as the pressure of the abrasive particles against the object to be polished increases, The polishing power increases, and the polishing time can be reduced.

However, in order to increase the number of abrasive particles in contact with an object to be polished per unit area, the size of the abrasive particles is reduced (for example, 0.001 to 0.001).
0.5 μm) because the polishing amount of each particle is reduced.
Polishing power decreases. And, in order to improve the polishing power, when the pressure of the abrasive particles on the object to be polished is increased,
In the fixed abrasive polishing, there is a problem that the polishing target is damaged by the abrasive particles aggregated in the polishing paint, and in the free abrasive polishing, the abrasive particle aggregated in the polishing slurry is damaged.
In barrel polishing, the rotation speed of the barrel and the frequency of the object to be polished are increased, and in spray polishing, the fluid pressure is increased to increase the pressure of the abrasive particles colliding with the object to be polished. There is a problem that the mechanical equipment for realizing the rotation speed, high frequency and high fluid pressure is expensive.

[0008] The present invention has been made in view of these problems, and it is therefore an object of the present invention to provide abrasive particles capable of accurately polishing an object to be polished with a high polishing force and a method for producing the same. .

[0009]

The abrasive particles of the present invention for achieving the above object comprise base particles and a plurality of child particles adhered and fixed on the surface of the base particles.

As the base particles, an average particle size having elasticity of 1
Spherical polymer particles of １００100 μm are used.

[0011] As the child particles, 1 / of the average particle diameter of the base particles is used.
Hard particles with a size of 500 to 1/10 are used.

The abrasive particles of the present invention are produced by stirring mixed particles of base particles and child particles and applying a mechanical impact to the mixed particles during the stirring. By giving the mixed particles, a plurality of child particles are adhered and fixed to the surface of the base particles.

According to the present invention, the surface area of each abrasive particle is increased, and a plurality of fine particles (child particles) are adhered and fixed on the surface, so that the number of fine particles in contact with the object to be polished is increased. To increase the pressure of the abrasive particles against the pressure.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION <Abrasive Particle> The abrasive particle of the present invention comprises a base particle and a plurality of child particles adhered and fixed on the surface of the base particle.

As the base particles, one or two or more particles selected from spherical polymer particles having an average particle diameter of 1 to 100 μm and having elasticity, such as urethane, nylon, polyolefin, polyimide, polyester, and acrylic, are used. .

[0016] The child particles are 1/1 of the average particle size of the base particles.
One or more particles selected from hard particles such as silica, alumina, diamond, and cerium oxide having an average particle diameter of 500 to 1/10 are used.

A plurality of the child particles are fixed to the surface of the mother particles by stirring the mixed particles of the base particles and the child particles and mechanically applying an impact to the mixed particles during the stirring.

This mechanical impact is described in, for example,
The mixed particles can be applied using the apparatus described in US Pat.

In this apparatus, a disk provided with a plurality of plates at intervals around the disk is rotated at a high speed, and the mixed particles thus input collide with the plates around the disk to give an impact to the mixed particles. In the present invention, preferably, a plurality of child particles are adhered and fixed to the surface of the base particles using such an apparatus.

<Production Method> The abrasive particles of the present invention are produced by stirring a mixed particle of a base particle and a child particle and applying a mechanical impact to the mixed particle during the stirring. By applying such a mechanical impact to the base particles, a plurality of child particles are attached and fixed to the surface of the base particles.

<Use> The abrasive particles of the present invention can be used not only as abrasive particles for barrel polishing and spray polishing, but also as abrasive particles for abrasive tapes or abrasive slurries.

<Example> Polyethylene spherical polymer particles (100 parts by weight) having an average particle size of 22 μm and an average particle size of 2 μm
m of alumina particles (30 parts by weight), and the mixed particles are stirred using a hybridization system (NHS-1, Nara Machinery) (rotation speed: 6400 rpm, operation time: 3 minutes). At this time, the abrasive particles of the examples were produced by giving a mechanical impact to the mixed particles.

As shown in the electron micrograph of FIG. 1, the abrasive particles of the examples are obtained by adhering and fixing a plurality of child particles (alumina particles) to the surface of spherical base particles (polyethylene spherical polymer particles).

<Polishing Test> A corner portion of a plate-like alumina piece was polished using the abrasive particles of the above example. FIG. 2 shows an electron micrograph of a corner of the alumina piece before polishing, and FIG. 3 shows an electron micrograph of a corner of the alumina piece after polishing. For comparison, FIG. 4 shows an electron micrograph of a corner portion of an alumina piece polished using alumina particles having an average particle size of 2 μm as abrasive particles.

Polishing of the alumina piece is performed by using a barrel type polishing apparatus 10 shown in FIG. 5, and a polishing object is attached to a clamp 13 at a tip end of an arm 12 connected to a piston / crank mechanism (not shown). The alumina piece 15 held by the holder 14 was adhesively fixed, and the alumina piece 15 was inserted into the abrasive particle group 16 placed in the container 11 and vibrated in the horizontal direction. Polishing test is 1300
This was performed at a frequency of 0 strokes / min for 20 minutes.

<Test Results> The average particle size of the abrasive particles was 2
When the alumina particles of μm are used, as shown in FIG. 4, the corner portions of the polished alumina pieces are not polished round, but when the abrasive particles of the above example are used, as shown in FIG. The corners of the alumina pieces were polished round.

[0027]

As the present invention is configured as described above,
According to the present invention, since a plurality of child particles are adhered and fixed on the surface of the base particles, the number of child particles per unit area in contact with the polishing target increases, and the polishing target can be polished with high accuracy.
Since the pressure of the abrasive particles on the object to be polished can be increased,
There is an effect that the polishing power can be increased. Also, in barrel polishing and spray polishing, there is no need to increase the number of rotations of the barrel, the frequency of the object to be polished, and the fluid pressure. This has the effect of being polished.

[Brief description of the drawings]

FIG. 1 is an electron micrograph of abrasive particles of an example.

FIG. 2 is an electron micrograph of a corner portion of an alumina piece before polishing.

FIG. 3 is an electron micrograph of a corner portion of an alumina piece subjected to barrel polishing using the abrasive particles of the example.

FIG. 4 is an electron micrograph of a corner portion of an alumina piece subjected to barrel polishing using alumina particles.

FIG. 5 shows a barrel-type polishing apparatus used for a polishing test.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... Barrel polishing apparatus 11 ... Container 12 ... Arm 13 ... Clamp 14 ... Holder 15 ... Plate-shaped alumina piece 16 ... Abrasive particle group

Claims (6)

[Claims] An abrasive particle comprising a base particle and a plurality of child particles adhered and fixed on the surface of the base particle. 2. The abrasive particles according to claim 1, wherein spherical polymer particles having an average particle size of 1 to 100 μm having elasticity are used as said base particles. 3. The spherical polymer particles include urethane,
The abrasive particles according to claim 2, wherein one or more particles selected from spherical polymer particles made of nylon, polyolefin, polyimide, polyester or acrylic are used. 4. The method according to claim 1, wherein one or more hard particles having an average particle diameter of 1/500 to 1/10 of the average particle diameter of the base particles are used as the child particles. Item 7. The abrasive particles according to Item 1. 5. The abrasive particles according to claim 4, wherein one or more hard particles of silica, alumina, diamond or cerium oxide are used as said hard particles. 6. A mixed particle of a base particle and a child particle is stirred, and a mechanical shock is applied to the mixed particle during the stirring, whereby a plurality of the child particles are brought to a surface of the base particle. A method for producing abrasive particles that is adhered and fixed.