JP2004074330A - Fixed abrasive polishing tool, and method for manufacturing the same - Google Patents

Fixed abrasive polishing tool, and method for manufacturing the same Download PDF

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Publication number
JP2004074330A
JP2004074330A JP2002235976A JP2002235976A JP2004074330A JP 2004074330 A JP2004074330 A JP 2004074330A JP 2002235976 A JP2002235976 A JP 2002235976A JP 2002235976 A JP2002235976 A JP 2002235976A JP 2004074330 A JP2004074330 A JP 2004074330A
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Japan
Prior art keywords
resin
abrasive grains
polishing tool
coupling agent
abrasive
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JP2002235976A
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Japanese (ja)
Inventor
Kazuto Hirokawa
廣川 一人
Tomohiko Akatsuka
赤塚 朝彦
Akira Kodera
小寺 章
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Ebara Corp
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Ebara Corp
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Priority to JP2002235976A priority Critical patent/JP2004074330A/en
Priority to US10/638,312 priority patent/US20040033771A1/en
Publication of JP2004074330A publication Critical patent/JP2004074330A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28Resins or natural or synthetic macromolecular compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/34Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
    • B24D3/342Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
    • B24D3/344Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/02Wheels in one piece

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a fixed abrasive polishing tool in which free abrasives separated from fixed abrasives are favorably dispersed to increase the number of acting abrasives to a subject surface to be polished for achieving sufficient polishing speed and sharp polishing characteristics. <P>SOLUTION: This fixed abrasive polishing tool is composed of abrasives 11 and resin 15, and surface-treated with coupling agent. A combination of the coupling agent with the resin comprises a combination of organofunctional groups in the coupling agent with the resin that is naturally hard to be coupled with them. In the fixed abrasive polishing tool, composed of the abrasives and the resin, the resin is core shell type composite high polymer 13 comprising the abrasives as nuclei, and high polymer polymerized and coated around the abrasives. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、半導体ウェハ等の被加工物の表面を鏡面状に研磨する研磨工具に係り、特に砥粒をバインダ樹脂で保持した固定砥粒研磨工具に関する。
【0002】
【従来の技術】
研磨液(スラリ)を用いた化学機械研磨(CMP)装置においては、比較的柔らかな研磨布に研磨砥粒を多量に含む研磨液(スラリ)を供給しつつ研磨するので、パターン依存性に問題がある。パターン依存性とは研磨前に存在する半導体ウェハ上の凹凸パターンにより、研磨後にもその凹凸に起因した緩やかな凹凸が形成され、完全な平坦度が得られにくいことである。即ち、細かなピッチの凹凸の部分は研磨速度が速く、大きなピッチの凹凸の部分は研磨速度が遅くなり、これにより研磨速度の早い部分と研磨速度の遅い部分とで緩やかな凹凸が形成されるという問題である。
【0003】
近年、砥粒をバインダ樹脂で固定した固定砥粒研磨工具を用いた研磨プロセスが発表されている。固定砥粒研磨プロセスではその基本的特徴である高硬度のため、非常に高い平坦性が得られているが、一般に研磨液(スラリ)と研磨パッドとを用いた研磨に比べて研磨速度が遅く、半導体ウェハ等の研磨に際しては実用上スループットが低く、生産性が低下するという問題がある。
【0004】
【発明が解決しようとする課題】
本発明は、固定砥粒から遊離する砥粒が良好に分散することで、研磨面に対する作用砥粒数をより多くし、十分な研磨速度を有すると共に、シャープな研磨特性を有する固定砥粒研磨工具を提供することを目的とする。
【0005】
【課題を解決するための手段】
本発明の固定砥粒研磨工具は、カップリング剤により表面処理された砥粒と、樹脂とで構成される固定砥粒研磨工具であって、前記カップリング剤と樹脂との組合わせは、前記カップリング剤がもつ有機官能基と、本来結合しにくい樹脂との組合せからなることを特徴とする。
【0006】
上記本発明によれば、砥粒を表面処理したカップリング剤が持つ有機官能基と、本来結合しにくい樹脂との組合せから固定砥粒研磨工具が構成されているので、研磨の進行に際してカップリング剤がこれを保持する樹脂から分離しやすい。これにより、固定砥粒から遊離する砥粒が良好に分散して、研磨面に対する作用砥粒数をより多くし、研磨速度を向上することができる。
【0007】
また、本発明の固定砥粒研磨工具は、砥粒と樹脂とで構成される固定砥粒研磨工具であって、前記樹脂は前記砥粒を核として、該砥粒の周囲に高分子が重合被覆されたコアシェル型複合高分子であることを特徴とする。また、砥粒と、前記砥粒を保持する第1の樹脂と、前記第1の樹脂をさらに結合させる第2の樹脂と、からなる固定砥粒研磨工具であって、前記第1の樹脂と第2の樹脂は、相互に接着力が低い(例えば、溶解性パラメータが3以上離れている)ことを特徴とする。
【0008】
上記本発明によれば、砥粒を核としてその周囲に樹脂を重合被覆することで、例えばその樹脂が研磨液により膨潤することで、砥粒のバインダ樹脂からの離脱が容易となる。これにより研磨面に対する作用砥粒数をより多くし、研磨速度の向上を図ることができる。
【0009】
【発明の実施の形態】
以下、本発明の実施形態について添付図面を参照しながら説明する。
【0010】
図1(a)は、砥粒11を示し、図1(b)は、砥粒11をカップリング剤により処理し、その表面にカップリング剤12による被膜を形成したことを示す。カップリング剤12は、砥粒11を構成する無機物に結合し、その表面を被覆する。固定砥粒研磨工具においては、砥粒がバインダ樹脂に保持され、砥粒とバインダ樹脂と気孔とが適当な比率で組み合わせて構成されている。カップリング剤には、樹脂と結合する有機官能基が含まれるが、本発明の固定砥粒研磨工具においては、カップリング剤が有する有機官能基と、その官能基に本来結合しにくい種類の樹脂との組合せにより構成されていることを特徴としている。
【0011】
固定砥粒研磨工具中の砥粒が、その製造段階の乾燥状態においても砥粒同士が凝集しない手段として、砥粒にカップリング剤や高分子をコーティングする表面改質方法を採用する。砥粒としては粒径0.5μm以下のシリカ系、アルミナ系、酸化セリウム系、二酸化マンガン系、微粒子ダイヤモンド、酸化チタン系などがある。
【0012】
カップリング剤は異質の材料同士、特に無機材料と有機材料を結合する際に、その結合力を向上する目的で使用され、無機材料と結びつく官能基と有機材料と結びつく官能基の両者を持っている。カップリング剤としては、クロム系、シラン系、チタン系、アルミニウム系、ジルコニウム系、また有機金属化合物がある。
【0013】
固定砥粒研磨工具の製造段階においては、図2(a)に示すように、砥粒同士が凝集して研磨工具中に砥粒が均一に分散しなくなるという問題がある。従って、図2(b)に示すようにカップリング剤により砥粒を表面処理しておくことで、その製造段階における砥粒同士の凝集を防止することができる。
【0014】
砥粒同士の接近である凝集を防止するためには、砥粒に吸着したカップリング剤同士が立体的に反発する立体障害効果を利用することができ、吸着層の厚さが厚いほどその効果が強く表れる。吸着層の厚さは、カップリング剤の分子鎖の長さによって決まる。その長さは100Å程であれば良いとされており、カップリング剤の選択の基準となる。
【0015】
製造後の研磨に使用する段階では、砥粒とバインダ樹脂との結合性は弱いことが好ましい。カップリング剤が有する有機官能基と本来結合しにくい樹脂との組合せを採用することにより、研磨に際して研磨面における固定砥粒研磨工具からの砥粒の遊離が起こり易く、これにより研磨速度を向上することができる。
【0016】
本発明の固定砥粒研磨工具に用いるカップリング剤は、特にシラン系カップリング剤およびチタン系カップリング剤であり、カップリング剤と固定砥粒のバインダ樹脂との結合性を弱める場合には、カップリング剤の有機官能基とバインダ樹脂との組合せを選択する必要がある。
【0017】
例えば、バインダ樹脂がポリアクリル系・ポリメタクリル系・ポリスチレン・ポリエチレン・ジアリルフタレート・エチレンプロピレンジエン三元共重合体等のように官能基にアルキル基を含む場合には、シラン系カップリング剤は有機官能基にエポキシ基やアミノ基、ハロゲン基、メルカプト基を含む3−グリシドキシプロピルトリメトキシシラン、2−(3,4−エポキシクロヘキシル)エチルトリメトキシシランやN−2−(アミノエチル)3−アミノプロピルトリメトキシシラン、3−クロロプロピルトリメトキシシラン、3−メルカプトプロピルトリメトキシシラン等が好適である。チタン系カップリング剤には、有機官能基にアミノ基やカルボキシル基を持つものが適当である。
【0018】
また、バインダ樹脂がエポキシ樹脂・フェノール樹脂・ウレタン樹脂・メラミン樹脂・ポリカーボネート・ポリ塩化ビニル・ポリイミド・スチレン−ブタジエン共重合体・天然ゴム等の場合には、シラン系カップリング剤は有機官能基にビニル基やアルコキシ基を持つビニルトリエトキシシラン、ビニルトリス(2−メトキシエトキシ)シラン等が好適であり、チタン系カップリング剤は上記同様、有機官能基にアミノ基やカルボキシル基を持つものが好適である。
【0019】
チタン系カップリング剤は、シラン系カップリング剤が樹脂と共有結合するのとは異なり、樹脂とファンデルワールス的な相互作用を示すために、その結合性は弱く、容易にバインダ樹脂より砥粒が遊離する。分子鎖の長いカップリング剤では、アルコキシ基を持つ例えば(C1733COO)SiCOCOC1733等が好適である。
【0020】
次に、固定砥粒研磨工具の製造方法の概要について図3を参照して説明する。まず、固定砥粒の原料を調整する。即ち、微細な砥粒と、樹脂材料および添加剤、すなわち界面活性剤などの砥粒分散剤、バッファーなどの加工安定化剤、KOHなどのPH調整剤に代表される加工促進剤、高分子剤などの鏡面性向上剤等を含む添加剤などからなる固定砥粒原料(粉)を所要量秤量する。これらの原料を混合し、必要に応じ、純水や溶剤を加え、混合液を製作する。この際、攪拌機、超音波分散器等の分散処理を行い、各原料の分散を十分に行う。
【0021】
次に、スプレードライヤで代表される乾燥手法を用い、乾燥造粒を行い、各種原料が均一に混合された0.1μm〜数百μmの粉体(造粒粉)、望ましくは平均粒径が数〜数十μmの粉体(造粒粉)を製作する。または、上記乾燥手法の他にフリーズドライ後粉砕粉や凝集およびまたは沈殿作用を利用し、混合粒子を作成する方法を採ってもよい。上記粉体(造粒粉)製作は必要に応じて混合後、乾燥工程または乾燥後混合工程、またはこれらを適宜繰り返し行ってもよく、混合する材料により他の材料の乾燥粉体と直接混合する工程をとってもよい。
【0022】
次に、上記工程で得られた混合粉(造粒粉)に、必要に応じて適当な添加剤(薬剤)を加え、ホットプレスで代表される圧縮成形技術により成形し、固定砥粒研磨工具を得る。この際、成形するサイズにより圧縮成形機のサイズが決まる。このことから非分割構造の固定砥粒と比較し、分割構造、すなわちセグメント構造の固定砥粒を製作するほうが圧縮成形機のサイズが小さくて済む。さらに付帯する設備および後工程の設備も分割構造、すなわちセグメント構造の固定砥粒を製作するほうが小型の装置で済み、初期投資が少なく、製造コストを低く抑えることが可能である。
【0023】
固定砥粒の保護と研磨装置への装着を容易にするために、上記工程で得られた固定砥粒を金属またはエンジニアリングプラスチック等機械的強度のある支持体(ベース)に接着や溶着等で固定する。この際、多数の、または複雑な形状のセグメントからなる固定砥粒は、固定の際の位置決めが難しく、また、位置決めが不正確である場合、固定砥粒とベースを固定するための接着剤がセグメント間にはみ出すリスクがある。接着剤が固定砥粒研磨作用面上にある場合、研磨を阻害する、またはウェハにスクラッチを発生させるなど好ましくないため、正確な位置決めが必要である。
【0024】
上記製造工程において、砥粒をカップリング剤で表面処理するには、砥粒を溶媒中に分散させ、その溶媒中で処理できるカップリング剤を投入し、超音波分散装置等により溶媒中において砥粒及びカップリング剤を十分に分散させる。この時、カップリング剤は砥粒に対して0.1〜10wt%程度混合することが好ましい。なお、溶媒として水系を用いる場合には、カップリング剤は水中で処理できるものを用いることが好ましい。この超音波分散装置等によりカップリング剤を溶媒中で十分に分散させることで、砥粒の表面にカップリング剤の被膜が形成される。このカップリング剤の被膜により固定砥粒研磨工具の製造過程において砥粒の凝集を防止でき、完成して研磨工具中に砥粒を均一に分散できることは上述したとおりである。
【0025】
この後に、樹脂原料を上記溶媒中に分散し、噴霧乾燥法や凍結真空乾燥法等を用いて造粒粉を形成する。この造粒粉は、砥粒及び樹脂原料を含む溶媒が例えば霧状に噴霧されて高温の空気流により乾燥されて粉状に形成されたものであり、砥粒が凝集せずに分散を保った状態で得られる。
【0026】
次に、砥粒を核として砥粒の周囲に高分子樹脂が重合被覆されたコアシェル型複合高分子を用いた固定砥粒研磨工具について説明する。図4は、この固定砥粒研磨工具を模式的に示したものである。この実施形態においては、砥粒11を核として、その周囲に樹脂が重合被覆した被膜13が形成されている。そして、この単位となる砥粒11をコアとしたコアシェル型複合高分子が相互に結合して固定砥粒研磨工具が構成されている。ここで、砥粒の周囲にカップリング剤を介して高分子を重合させてコアシェル型複合高分子を形成するようにしても良い。
【0027】
このコアシェル型複合高分子の形成は、上記砥粒を含むスラリ中に、バインダ樹脂例えばポリアクリル系・ポリメタクリル系・ポリスチレン・SBR・NBR・MBR・ポリ酢酸ビニル・アクリルスチレン共重合体等のモノマーを添加し、乳化重合やソープフリー乳化重合を行い、砥粒の表面に重合体の被膜13を形成することができる。また、乳化重合用乳化剤、例えば、脂肪酸ナトリウム・カリウム、不均斉化ロジンナトリウム・カリウム、アルキルベンゼンスルホン酸ナトリウム、アルキルジフェニルエーテルジスルホン酸ナトリウム、スルホコハク酸ジアルキルエステルナトリウム、高級アルコール硫酸エステルナトリウム、アルキル(またはアルキルフェニル)エーテル硫酸エステルナトリウム・アンモニウム、部分けん化ポリビニルアルコール、アルキルフェノールエチレンオキサイド付加物、高級アルコールエチレンオキサイド付加物、ポリプロピレングリコールエチレンオキサイド付加物、第4級アンモニウム塩等を用いることができる。これらをカップリング剤に吸着させてから上記モノマーの重合を行うこともできる。
【0028】
また、ソープフリー乳化重合法の一つである反応性乳化剤を用いる方法は、乳化剤自体が重合性を持ち、砥粒表面上のカップリング剤に吸着させて重合させることができる。反応性乳化剤として、例えば、アリル・プロペニル誘導体、アクリル酸誘導体、イタコン酸誘導体、マレイン酸誘導体等があり、これらと他のモノマーとの共重合体も用いることができる。
【0029】
上記カップリング剤を用いない場合には、反応性乳化剤を直接砥粒表面に吸着させて重合もしくは他のモノマーとの共重合を行い、砥粒表面に被膜13を形成することができる。これらの砥粒表面に高分子被膜を形成したコアシェル型複合高分子原料を直接加熱圧縮成型することで、固定砥粒研磨工具を形成することができる。このようにして形成した固定砥粒研磨工具は砥粒自体に高分子被膜を備えているので、その他のバインダ樹脂を用いることなく固定砥粒研磨工具を形成することができる。
【0030】
一般に、コアシェル型樹脂は、例えばABS樹脂のように、コア部が樹脂でできているが、本発明の固定砥粒研磨工具においてはコア部に砥粒を用いていることを特徴としている。このため、樹脂同士でコアシェル型樹脂を形成しないように、高分子核の生成を抑制し、砥粒表面のみに高分子を成長するようにしている。即ち、砥粒表面と生成する核のエントロピーを調整し、均質溶液の下限臨界過飽和濃度以下に溶液を調整し、生成する核の成長を抑制する。即ち、過飽和濃度以上で下限臨界過飽和濃度以下に溶液濃度を調整する。そして、砥粒同士の凝集を押さえるため、等電位点をはずし、且つ塩濃度を低く抑える。また、非機械的ドレッシングによる等方的ドレッシング方法に適した高分子(シェル)を採用するようにしても良い。
【0031】
尚、コアシェル型複合高分子の製造方法には、以下の方法がある。
第一に、砥粒周囲に均質に高分子を成長させることが難しいため、砥粒表面に界面活性剤や有機高分子(官能基)の吸着処理を施す。そして、有機高分子(官能基)の吸着層にシェルとなる高分子被膜をカプセル重合する。尚、有機質・無機質の親和性向上がポイントとなる。
第二に、ヘテロ凝集を利用する。
第三に、懸濁重合法、乳化重合法を採用する。
いずれの方法においても、複合微粒子のサイズ・粒度分布のコントロールが必要であり、配向等により固定砥粒研磨工具としての特性に大きく影響する。
【0032】
図5は、本発明の他の実施形態の固定砥粒研磨工具を示す。この実施形態の研磨工具においては、砥粒11と、その砥粒を保持する第1の樹脂13と、その第1の樹脂13をさらに結合させる第2の樹脂15とから構成されている。即ち、砥粒11を核としてその周囲に高分子13が重合被覆されたコアシェル型複合高分子が第2の樹脂15により結合されて固定砥粒研磨工具が構成されている。ここで第1の樹脂13と第2の樹脂15とは、結合性が低く、溶解性パラメータが3以上離れていることを特徴としている。なお、溶解性パラメータは6以上離れていることが好ましい。ここで、複数の砥粒11が第1の樹脂13内にのみ分散されていて、第2のバインダ樹脂15が第1のバインダ樹脂13を結合するようにしても良い。
【0033】
即ち、上述した固定砥粒研磨工具の製造工程で、固定砥粒研磨工具の原料である造粒粉を形成するに際して、バインダ樹脂13中に砥粒11を含む造粒粉を形成する。そして、溶解性パラメータが異なる第2の樹脂15を用いて砥粒を含む第1の樹脂を保持するようにしたものである。第1の樹脂13と第2の樹脂15との溶解性パラメータが3以上離れていることで、これらの樹脂相互間の接着力が低くなり、砥粒を分散保持した第1のバインダ樹脂13が容易に第2のバインダ樹脂15から遊離して、多くの作用砥粒が研磨面に放出され、これにより高速の研磨が可能となる。また、樹脂13,15間の接着力が低いことから、樹脂の研磨工具への再付着を防止することができる。
【0034】
第1のバインダ樹脂13と第2のバインダ樹脂15との間の結合性を低いものとすることは、例えば溶解性パラメータが3以上、好ましくは6以上異なる樹脂を用いることで実現できる。この時、砥粒を分散保持した第1あるいは第2のバインダ樹脂13,15の溶解性パラメータを研磨液のそれに近似することで、研磨液に溶解して研磨面に砥粒を分散して研磨を促進する。例えば水の溶解性パラメータ(23.4)に近似した樹脂として、水溶性樹脂・エラストマーが挙げられ、例えばポリビニルアルコール(23.4)等があり、これらを第1あるいは第2のバインダ樹脂として用い、第2あるいは第1のバインダ樹脂として、テフロン(6.2)、シリコンゴム(7.3)、天然ゴム(7.9)、ポリイソブチレン(8.0)、ポリブタジエン(8.4−8.6)、ポリブタジエンスチレン(8.1−8.6)、ポリスチレン(9.7)、ネオプレン(8.2−9.2)、ポリブタジエン−アクリロニトリル(9.4−9.5)、ポリ塩化ビニル(9.5−9.7)、ポリ酢酸ビニル(9.4)、ポリメタクリル酸メチル(9.5)、ポリエチレンテレフタレート(10.7)、ポリアクリロニトリル(15.4)、エポキシ樹脂やウレタン樹脂などの熱硬化性樹脂を用いることができる。
また、第1のバインダ樹脂内の砥粒は、より分散性を良好にするために上述のカップリング剤や高分子でコーティングするようにしてもよい。
【0035】
ここで第1の樹脂13として、研磨液に対して膨潤する性質を有する膨潤樹脂を用いることができる。研磨に際して、固定砥粒研磨工具の研磨面が研磨液に接触することで、樹脂13が膨潤軟化し、弾性を有するように変化する。
【0036】
図6に示すように、固定砥粒研磨工具17の表面は、被加工物の凸部接触時にある程度の剛性を有し、凹部接触時にフレキシビリティを有することが必要である。例えば半導体ウェハ等の被研磨物21の凸部21aが接触する部分では、膨潤した樹脂13aが押しつぶされ、高剛性が発揮され、加工圧力が大となり高い加工能率が発揮される。一方で、被研磨物21の凹部21bでは、膨潤した樹脂13bのため加工圧力が小さくなり、柔軟な性質を呈し砥粒11が介在してもスクラッチが発生しない。
【0037】
従って、固定砥粒研磨工具17の表面は被加工物の凸部接触時にある程度の剛性が発揮され、凹部接触時にフレキシビリティを呈することになる。従って、凸部のみを研磨可能にし、凹部を研磨し難くすることができ、シャープな研磨特性を維持することができる。即ち、研磨面が研磨液により樹脂13が膨潤軟化し、弾性を有するように変化し、被加工物の凸部研磨時には圧縮限界を迎え、弾性変形しないことにより大きな加工圧力で加工できるので、高速研磨が可能で且つシャープな研磨特性を発揮することができる。
【0038】
なお、この実施形態においては、樹脂13が研磨液を吸収して膨潤する例について述べたが、例えば光線の照射により樹脂が軟化して弾性化するような性質を有するものを用いても良い。これにより、同様に研磨の進行に伴い光線を照射することで、樹脂13を膨潤させ、これにより遊離砥粒の自生促進と共にシャープな研磨特性を得ることが可能である。
【0039】
尚、上記実施形態は本発明の実施例の一態様を述べたもので、本発明の趣旨を逸脱することなく種々の変形実施例が可能なことは勿論である。
【0040】
【発明の効果】
上述した本発明によれば、研磨加工時に研磨面に対する作用砥粒数をより多くし、固定砥粒研磨工具に十分な研磨速度を与えることができる。また、被加工物に対してシャープな研磨特性が得られる。
【図面の簡単な説明】
【図1】(a)は砥粒を示し、(b)は砥粒にカップリング剤の被膜を形成した状態を示す図である。
【図2】(a)は砥粒が凝集した状態を示す図であり、(b)はカップリング剤による表面処理を施して砥粒が分散した状態を示す図である。
【図3】固定砥粒研磨工具の製造工程の概要を示すフロー図である。
【図4】高分子被膜を備えた砥粒を結合して構成した固定砥粒研磨工具を模式的に示す図である。
【図5】砥粒を保持する第1の樹脂を第2の樹脂を用いて結合して構成した固定砥粒研磨工具を模式的に示す図である。
【図6】砥粒を保持する樹脂が膨潤性を有する場合の研磨時の状態を模式的に示す図である。
【符号の説明】
11   砥粒
12   カップリング剤による表面処理膜
13   コアシェル型複合高分子被膜(第1の樹脂)
13a,13b   膨潤樹脂
15   第2の樹脂
17   固定砥粒研磨工具
21   被加工物(半導体ウェハ)
21a   凸部
21b   凹部
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a polishing tool for polishing a surface of a workpiece such as a semiconductor wafer into a mirror surface, and more particularly to a fixed abrasive polishing tool in which abrasive grains are held by a binder resin.
[0002]
[Prior art]
In a chemical mechanical polishing (CMP) apparatus using a polishing liquid (slurry), since polishing is performed while supplying a polishing liquid (slurry) containing a large amount of polishing grains to a relatively soft polishing cloth, there is a problem with pattern dependency. There is. The pattern dependency means that a gentle unevenness due to the unevenness is formed even after the polishing due to the unevenness pattern on the semiconductor wafer existing before the polishing, and it is difficult to obtain perfect flatness. That is, the polishing rate is high in the uneven portion with a fine pitch, and the polishing speed is low in the uneven portion with a large pitch, so that gentle unevenness is formed between a portion having a high polishing speed and a portion having a low polishing speed. That is the problem.
[0003]
In recent years, a polishing process using a fixed abrasive polishing tool in which abrasive grains are fixed with a binder resin has been announced. In the fixed-abrasive polishing process, very high flatness is obtained due to the high hardness, which is a fundamental feature of the polishing process. However, the polishing speed is generally lower than that of polishing using a polishing liquid (slurry) and a polishing pad. When polishing a semiconductor wafer or the like, there is a problem that the throughput is practically low and the productivity is reduced.
[0004]
[Problems to be solved by the invention]
In the present invention, the abrasive grains released from the fixed abrasive grains are dispersed well, thereby increasing the number of abrasive grains acting on the polished surface, having a sufficient polishing rate, and having a sharp polishing characteristic. The purpose is to provide tools.
[0005]
[Means for Solving the Problems]
The fixed abrasive polishing tool of the present invention is a fixed abrasive polishing tool composed of abrasive particles surface-treated with a coupling agent and a resin, wherein the combination of the coupling agent and the resin is It is characterized by being composed of a combination of an organic functional group of the coupling agent and a resin that is inherently difficult to bond.
[0006]
According to the present invention, the fixed abrasive polishing tool is composed of a combination of the organic functional group of the coupling agent having surface-treated abrasive grains and a resin that is inherently difficult to bond. The agent is easily separated from the resin holding it. Thereby, the abrasive grains released from the fixed abrasive grains are well dispersed, so that the number of abrasive grains acting on the polished surface can be increased and the polishing rate can be improved.
[0007]
Further, the fixed abrasive polishing tool of the present invention is a fixed abrasive polishing tool comprising an abrasive and a resin, wherein the resin has the abrasive as a nucleus and a polymer is polymerized around the abrasive. It is a core-shell type composite polymer coated. Further, a fixed abrasive polishing tool comprising abrasive grains, a first resin that holds the abrasive grains, and a second resin that further bonds the first resin, wherein the first resin The second resins are characterized by low adhesion to each other (eg, having a solubility parameter separated by 3 or more).
[0008]
According to the present invention described above, the resin is polymerized and coated around the abrasive grains as a nucleus. For example, the resin swells with the polishing liquid, so that the abrasive grains can be easily separated from the binder resin. As a result, the number of abrasive grains acting on the polished surface can be increased, and the polishing rate can be improved.
[0009]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
[0010]
FIG. 1A shows the abrasive grains 11, and FIG. 1B shows that the abrasive grains 11 have been treated with a coupling agent and a film of the coupling agent 12 has been formed on the surface thereof. The coupling agent 12 binds to the inorganic substance constituting the abrasive grains 11 and covers the surface thereof. In the fixed abrasive polishing tool, the abrasive grains are held in a binder resin, and the abrasive grains, the binder resin, and the pores are combined in an appropriate ratio. The coupling agent contains an organic functional group that binds to the resin. However, in the fixed abrasive polishing tool of the present invention, the organic functional group of the coupling agent and a resin of a type that is not easily bonded to the functional group. And a combination of the above.
[0011]
As a means for preventing the abrasive grains in the fixed abrasive polishing tool from agglomerating each other even in a dry state in the manufacturing stage, a surface modification method of coating the abrasive grains with a coupling agent or a polymer is employed. Examples of the abrasive grains include silica-based, alumina-based, cerium-oxide-based, manganese dioxide-based, fine-particle diamond, and titanium-oxide-based particles having a particle size of 0.5 μm or less.
[0012]
Coupling agents are used for the purpose of improving the bonding strength between dissimilar materials, especially between inorganic and organic materials, and have both a functional group associated with the inorganic material and a functional group associated with the organic material. I have. Examples of the coupling agent include chromium-based, silane-based, titanium-based, aluminum-based, zirconium-based, and organometallic compounds.
[0013]
In the manufacturing stage of the fixed abrasive polishing tool, as shown in FIG. 2A, there is a problem that the abrasive grains are aggregated and the abrasive grains are not uniformly dispersed in the polishing tool. Therefore, as shown in FIG. 2 (b), by subjecting the abrasive grains to a surface treatment with a coupling agent, it is possible to prevent agglomeration of the abrasive grains during the manufacturing stage.
[0014]
In order to prevent agglomeration, which is the approach between abrasive grains, it is possible to use the steric hindrance effect that the coupling agent adsorbed on the abrasive grains repels three-dimensionally. Appears strongly. The thickness of the adsorption layer is determined by the length of the molecular chain of the coupling agent. It is said that the length is only required to be about 100 mm, which is a reference for selecting a coupling agent.
[0015]
It is preferable that the bonding between the abrasive grains and the binder resin is weak at the stage of use for polishing after manufacturing. By employing a combination of the organic functional group of the coupling agent and a resin that is inherently difficult to bond, the abrasive grains are easily released from the fixed abrasive polishing tool on the polishing surface during polishing, thereby improving the polishing rate. be able to.
[0016]
The coupling agent used in the fixed abrasive polishing tool of the present invention is, in particular, a silane coupling agent and a titanium coupling agent, and when weakening the binding between the coupling agent and the binder resin of the fixed abrasive, It is necessary to select a combination of the organic functional group of the coupling agent and the binder resin.
[0017]
For example, when the binder resin contains an alkyl group as a functional group such as a polyacrylic / polymethacrylic / polystyrene / polyethylene / diallylphthalate / ethylene propylene diene terpolymer, the silane coupling agent is an organic compound. 3-glycidoxypropyltrimethoxysilane, 2- (3,4-epoxychlorohexyl) ethyltrimethoxysilane or N-2- (aminoethyl) 3 containing an epoxy group, an amino group, a halogen group or a mercapto group as a functional group -Aminopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane and the like are preferred. As the titanium-based coupling agent, those having an amino group or a carboxyl group in the organic functional group are suitable.
[0018]
When the binder resin is an epoxy resin, a phenol resin, a urethane resin, a melamine resin, a polycarbonate, a polyvinyl chloride, a polyimide, a styrene-butadiene copolymer, a natural rubber, or the like, the silane-based coupling agent is converted to an organic functional group. Vinyl triethoxysilane and vinyl tris (2-methoxyethoxy) silane having a vinyl group or an alkoxy group are preferable, and a titanium-based coupling agent having an amino group or a carboxyl group in an organic functional group is preferable as described above. is there.
[0019]
Titanium-based coupling agents, unlike silane-based coupling agents that covalently bond with resin, exhibit a van der Waals-like interaction with the resin, and therefore have a weaker bond, and are more readily abrasive than binder resin. Is released. As the coupling agent having a long molecular chain, (C 17 H 33 COO) 3 SiC 3 H 6 OCOC 17 H 33 having an alkoxy group is preferable.
[0020]
Next, an outline of a method for manufacturing a fixed abrasive polishing tool will be described with reference to FIG. First, the raw material of the fixed abrasive is adjusted. That is, fine abrasive grains, resin materials and additives, ie, abrasive dispersants such as surfactants, processing stabilizers such as buffers, processing accelerators represented by pH adjusters such as KOH, and polymer agents A required amount of a fixed abrasive raw material (powder) composed of an additive containing a specularity improver or the like is weighed. These raw materials are mixed, and if necessary, pure water and a solvent are added to prepare a mixed solution. At this time, a dispersion process using a stirrer, an ultrasonic disperser or the like is performed to sufficiently disperse each raw material.
[0021]
Next, using a drying method represented by a spray dryer, dry granulation is performed, and a powder (granulated powder) of 0.1 μm to several hundred μm in which various raw materials are uniformly mixed, preferably having an average particle diameter of A powder (granulated powder) of several to several tens μm is manufactured. Alternatively, in addition to the above-described drying method, a method of producing a mixed particle by utilizing a pulverized powder after freeze-drying and an agglomeration and / or precipitation action may be employed. The above-mentioned powder (granulated powder) may be produced by mixing, if necessary, a drying step or a mixing step after drying, or these steps may be repeated as appropriate. Depending on the material to be mixed, the powder is directly mixed with a dry powder of another material. A step may be taken.
[0022]
Next, if necessary, an appropriate additive (agent) is added to the mixed powder (granulated powder) obtained in the above step, and the mixture is molded by a compression molding technique represented by a hot press. Get. At this time, the size of the compression molding machine is determined by the size to be molded. For this reason, the size of the compression molding machine can be reduced by manufacturing fixed abrasive grains having a divided structure, that is, a segment structure, as compared with fixed abrasive grains having a non-divided structure. Further, the auxiliary equipment and the equipment in the post-process also require a smaller apparatus to manufacture fixed abrasive grains having a divided structure, that is, a segment structure, so that the initial investment is small and the production cost can be reduced.
[0023]
In order to protect the fixed abrasive grains and facilitate mounting on the polishing device, the fixed abrasive grains obtained in the above process are fixed to a metal or engineering plastic support (base) such as metal or engineering plastic by bonding or welding. I do. At this time, fixed abrasive grains composed of many or complex shaped segments are difficult to position at the time of fixing, and if the positioning is incorrect, an adhesive for fixing the fixed abrasive grains and the base is used. There is a risk of protruding between segments. When the adhesive is on the fixed abrasive polishing surface, it is not preferable to hinder polishing or generate scratches on the wafer, so that accurate positioning is required.
[0024]
In the above manufacturing process, in order to surface-treat the abrasive grains with a coupling agent, the abrasive grains are dispersed in a solvent, a coupling agent capable of being treated in the solvent is charged, and the abrasive grains are ground in the solvent using an ultrasonic dispersion device or the like. Disperse the particles and coupling agent well. At this time, it is preferable that the coupling agent is mixed in an amount of about 0.1 to 10 wt% with respect to the abrasive grains. When an aqueous solvent is used as the solvent, it is preferable to use a coupling agent that can be treated in water. By sufficiently dispersing the coupling agent in the solvent using the ultrasonic dispersion device or the like, a film of the coupling agent is formed on the surface of the abrasive grains. As described above, the coating of the coupling agent can prevent the agglomeration of the abrasive grains in the manufacturing process of the fixed abrasive polishing tool, and can uniformly disperse the abrasive grains in the polishing tool.
[0025]
Thereafter, the resin raw material is dispersed in the solvent, and a granulated powder is formed by using a spray drying method, a freeze vacuum drying method, or the like. The granulated powder is formed by spraying a solvent containing abrasive grains and a resin raw material into, for example, a mist and drying by a high-temperature air stream to form a powder. Obtained in the state.
[0026]
Next, a description will be given of a fixed abrasive polishing tool using a core-shell composite polymer in which a polymer is polymer-coated around the abrasive with the abrasive as a core. FIG. 4 schematically shows the fixed abrasive polishing tool. In this embodiment, a coating 13 formed by polymerizing a resin around the abrasive grains 11 as a nucleus is formed. Then, the core-shell type composite polymer having the abrasive grains 11 as a unit as a core is bonded to each other to form a fixed abrasive polishing tool. Here, the core-shell type composite polymer may be formed by polymerizing a polymer around the abrasive grains via a coupling agent.
[0027]
The core-shell type composite polymer is formed by adding a binder resin such as a polyacrylic / polymethacrylic / polystyrene / SBR / NBR / MBR / polyvinyl acetate / acrylstyrene copolymer or the like to a slurry containing the abrasive grains. , And emulsion polymerization or soap-free emulsion polymerization is performed to form a polymer film 13 on the surface of the abrasive grains. Also, emulsifiers for emulsion polymerization, for example, sodium / potassium fatty acid, sodium / potassium disproportionated rosin, sodium alkyl benzene sulfonate, sodium alkyl diphenyl ether disulfonate, sodium dialkyl sulfosuccinate, sodium sulfate higher alcohol, alkyl (or alkyl phenyl) ) Sodium / ammonium ether sulfate, partially saponified polyvinyl alcohol, alkylphenol ethylene oxide adduct, higher alcohol ethylene oxide adduct, polypropylene glycol ethylene oxide adduct, quaternary ammonium salt and the like can be used. After adsorbing these to the coupling agent, the polymerization of the above monomer can be carried out.
[0028]
In a method using a reactive emulsifier, which is one of the soap-free emulsion polymerization methods, the emulsifier itself has polymerizability, and can be polymerized by being adsorbed by a coupling agent on the surface of the abrasive grains. Examples of the reactive emulsifier include allyl / propenyl derivatives, acrylic acid derivatives, itaconic acid derivatives, and maleic acid derivatives. Copolymers of these with other monomers can also be used.
[0029]
When the above-mentioned coupling agent is not used, the reactive emulsifier can be directly adsorbed on the surface of the abrasive grains and polymerized or copolymerized with another monomer to form the coating 13 on the surface of the abrasive grains. A fixed abrasive polishing tool can be formed by directly heating and compression molding a core-shell composite polymer raw material having a polymer film formed on the surface of these abrasive grains. Since the fixed abrasive polishing tool formed in this way has a polymer film on the abrasive grains itself, the fixed abrasive polishing tool can be formed without using other binder resin.
[0030]
In general, the core-shell type resin has a core portion made of a resin, such as an ABS resin. However, the fixed abrasive polishing tool of the present invention is characterized in that abrasive grains are used in the core portion. For this reason, the generation of the polymer nucleus is suppressed so that the core-shell type resin is not formed between the resins, and the polymer is grown only on the surface of the abrasive grains. That is, the entropy of the abrasive grain surface and the generated nucleus is adjusted, and the solution is adjusted to be equal to or lower than the lower critical supersaturation concentration of the homogeneous solution to suppress the growth of the generated nucleus. That is, the solution concentration is adjusted to be equal to or higher than the supersaturated concentration and equal to or lower than the lower critical supersaturated concentration. Then, in order to suppress agglomeration of the abrasive grains, the equipotential point is removed, and the salt concentration is kept low. Further, a polymer (shell) suitable for an isotropic dressing method using non-mechanical dressing may be adopted.
[0031]
The following methods are available for producing the core-shell composite polymer.
First, since it is difficult to grow a polymer uniformly around the abrasive grains, the surface of the abrasive grains is subjected to an adsorption treatment of a surfactant or an organic polymer (functional group). Then, a polymer film serving as a shell is formed on the adsorption layer of the organic polymer (functional group) by capsule polymerization. The point is to improve the affinity between organic and inorganic substances.
Second, it utilizes heteroaggregation.
Third, a suspension polymerization method and an emulsion polymerization method are employed.
In either method, it is necessary to control the size and particle size distribution of the composite fine particles, and the orientation or the like greatly affects the characteristics as a fixed abrasive polishing tool.
[0032]
FIG. 5 shows a fixed abrasive polishing tool according to another embodiment of the present invention. The polishing tool according to this embodiment includes abrasive grains 11, a first resin 13 for holding the abrasive grains, and a second resin 15 for further bonding the first resin 13. That is, a core-shell type composite polymer in which the polymer 13 is polymer-coated around the abrasive grain 11 as a nucleus is combined with the second resin 15 to form a fixed abrasive grain polishing tool. Here, the first resin 13 and the second resin 15 are characterized by low bonding properties and a solubility parameter separated by 3 or more. Note that the solubility parameters are preferably separated by 6 or more. Here, the plurality of abrasive grains 11 may be dispersed only in the first resin 13, and the second binder resin 15 may bond the first binder resin 13.
[0033]
That is, in the above-described manufacturing process of the fixed abrasive polishing tool, when forming the granulated powder that is the raw material of the fixed abrasive polishing tool, the granulated powder containing the abrasive grains 11 in the binder resin 13 is formed. Then, the first resin containing abrasive grains is held by using the second resin 15 having a different solubility parameter. Since the solubility parameters of the first resin 13 and the second resin 15 are separated by 3 or more, the adhesive force between these resins is reduced, and the first binder resin 13 in which the abrasive grains are dispersed and held becomes Many working abrasive grains are easily released from the second binder resin 15 and are released to the polishing surface, thereby enabling high-speed polishing. Further, since the adhesive force between the resins 13 and 15 is low, it is possible to prevent the resin from re-adhering to the polishing tool.
[0034]
Reducing the bonding property between the first binder resin 13 and the second binder resin 15 can be realized by using, for example, resins having different solubility parameters by 3 or more, preferably 6 or more. At this time, by making the solubility parameter of the first or second binder resin 13 and 15 in which the abrasive grains are dispersed and held close to that of the polishing liquid, the abrasive grains are dissolved in the polishing liquid and the abrasive grains are dispersed on the polishing surface to polish. To promote. For example, as a resin having a water solubility parameter (23.4) which is close to the water solubility resin / elastomer, for example, polyvinyl alcohol (23.4) and the like can be used as the first or second binder resin. As the second or first binder resin, Teflon (6.2), silicone rubber (7.3), natural rubber (7.9), polyisobutylene (8.0), polybutadiene (8.4-8. 6), polybutadiene styrene (8.1-8.6), polystyrene (9.7), neoprene (8.2-9.2), polybutadiene-acrylonitrile (9.4-9.5), polyvinyl chloride ( 9.5-9.7), polyvinyl acetate (9.4), polymethyl methacrylate (9.5), polyethylene terephthalate (10.7), polyacrylonitrile (15 4), it can be used thermosetting resins such as epoxy resins and urethane resins.
Further, the abrasive grains in the first binder resin may be coated with the above-described coupling agent or polymer in order to further improve the dispersibility.
[0035]
Here, as the first resin 13, a swelling resin having a property of swelling with respect to the polishing liquid can be used. During polishing, when the polishing surface of the fixed-abrasive polishing tool comes into contact with the polishing liquid, the resin 13 swells and softens and changes to have elasticity.
[0036]
As shown in FIG. 6, the surface of the fixed abrasive polishing tool 17 needs to have a certain degree of rigidity at the time of contact with the convex portion of the workpiece and flexibility at the time of contact with the concave portion. For example, the swollen resin 13a is crushed in a portion where the convex portion 21a of the object 21 to be polished such as a semiconductor wafer comes into contact, high rigidity is exerted, processing pressure is increased, and high processing efficiency is exhibited. On the other hand, in the concave portion 21b of the object 21 to be polished, the processing pressure is reduced due to the swollen resin 13b, the material has a soft property, and no scratch occurs even when the abrasive grains 11 are interposed.
[0037]
Therefore, the surface of the fixed abrasive polishing tool 17 exhibits a certain degree of rigidity when the workpiece comes into contact with the convex portion, and exhibits flexibility when contacting the concave portion. Therefore, only the convex portions can be polished, and the concave portions can be hardly polished, and sharp polishing characteristics can be maintained. That is, the resin 13 swells and softens due to the polishing liquid and changes so as to have elasticity. When the convex portion of the workpiece is polished, it reaches the compression limit, and since it does not deform elastically, it can be processed with a large processing pressure. Polishing is possible and sharp polishing characteristics can be exhibited.
[0038]
In this embodiment, an example has been described in which the resin 13 absorbs the polishing liquid and swells. However, for example, a resin having such a property that the resin is softened and elasticized by irradiation with a light beam may be used. In this way, similarly, by irradiating light with the progress of polishing, the resin 13 is swollen, whereby it is possible to promote self-generation of free abrasive grains and obtain sharp polishing characteristics.
[0039]
It should be noted that the above-described embodiment describes one mode of the embodiment of the present invention, and it is needless to say that various modifications can be made without departing from the spirit of the present invention.
[0040]
【The invention's effect】
According to the present invention described above, the number of abrasive grains acting on the polished surface during the polishing process can be increased, and a sufficient polishing rate can be given to the fixed abrasive polishing tool. In addition, sharp polishing characteristics can be obtained for the workpiece.
[Brief description of the drawings]
FIG. 1A is a view showing abrasive grains, and FIG. 1B is a view showing a state in which a coating of a coupling agent is formed on the abrasive grains.
FIG. 2A is a diagram showing a state where abrasive grains are aggregated, and FIG. 2B is a view showing a state where abrasive grains are dispersed by performing a surface treatment with a coupling agent.
FIG. 3 is a flowchart showing an outline of a manufacturing process of a fixed abrasive polishing tool.
FIG. 4 is a view schematically showing a fixed abrasive polishing tool formed by combining abrasive grains provided with a polymer film.
FIG. 5 is a view schematically showing a fixed abrasive polishing tool formed by combining a first resin holding abrasive grains by using a second resin.
FIG. 6 is a diagram schematically showing a state at the time of polishing when a resin holding abrasive grains has swelling properties.
[Explanation of symbols]
Reference Signs List 11 Abrasive grains 12 Surface treatment film with coupling agent 13 Core-shell type composite polymer film (first resin)
13a, 13b Swelling resin 15 Second resin 17 Fixed abrasive polishing tool 21 Workpiece (semiconductor wafer)
21a convex part 21b concave part

Claims (7)

カップリング剤により表面処理された砥粒と、樹脂とで構成される固定砥粒研磨工具であって、前記カップリング剤と樹脂との組合わせは、前記カップリング剤がもつ有機官能基と、本来結合しにくい樹脂との組合せからなることを特徴とする固定砥粒研磨工具。Abrasive grains surface-treated with a coupling agent, and a fixed abrasive polishing tool composed of a resin, wherein the combination of the coupling agent and the resin is an organic functional group of the coupling agent, A fixed-abrasive polishing tool characterized by being made of a combination with a resin that is inherently difficult to bond. 砥粒をカップリング剤により表面処理し、該砥粒を樹脂により固定保持する固定砥粒研磨工具の製造方法であって、前記カップリング剤と樹脂との組合わせは、前記カップリング剤がもつ有機官能基と、本来結合しにくい樹脂との組合せからなることを特徴とする固定砥粒研磨工具の製造方法。A method for producing a fixed abrasive polishing tool in which abrasive grains are surface-treated with a coupling agent and the abrasive grains are fixedly held by a resin, wherein the combination of the coupling agent and the resin has the coupling agent. A method for producing a fixed abrasive polishing tool, comprising a combination of an organic functional group and a resin that is inherently difficult to bond. 砥粒と樹脂とで構成される固定砥粒研磨工具であって、前記樹脂は前記砥粒を核として、該砥粒の周囲に高分子が重合被覆されたコアシェル型複合高分子であることを特徴とする固定砥粒研磨工具。A fixed-abrasive polishing tool composed of abrasive grains and a resin, wherein the resin is a core-shell composite polymer in which a polymer is polymer-coated around the abrasive grains with the abrasive grains as a nucleus. Characterized fixed abrasive polishing tool. 砥粒を核として、その周囲に樹脂を重合させ、前記砥粒をコアとしたコアシェル型複合高分子原料を形成し、前記コアシェル型複合高分子原料を成形して研磨工具を形成することを特徴とする固定砥粒研磨工具の製造方法。A resin is polymerized around the abrasive grains as a nucleus, a core-shell type composite polymer material having the abrasive grains as a core is formed, and a polishing tool is formed by molding the core-shell type composite polymer material. Manufacturing method of a fixed abrasive polishing tool. 前記樹脂が膨潤樹脂であることを特徴とする請求項4記載の固定砥粒研磨工具の製造方法。The method according to claim 4, wherein the resin is a swelling resin. 砥粒と、
前記砥粒を保持する第1の樹脂と、
前記第1の樹脂をさらに結合させる第2の樹脂と、からなる固定砥粒研磨工具であって、
前記第1の樹脂と第2の樹脂は、相互に接着力が低いことを特徴とする固定砥粒研磨工具。
Abrasive grains,
A first resin that holds the abrasive grains;
A second resin that further binds the first resin, a fixed abrasive polishing tool comprising:
The fixed abrasive polishing tool, wherein the first resin and the second resin have a low adhesive strength to each other.
前記第1の樹脂と第2の樹脂は、溶解性パラメータが3以上、好ましくは6以上離れていることを特徴とする請求項6記載の固定砥粒研磨工具。7. The fixed abrasive polishing tool according to claim 6, wherein the first resin and the second resin are separated by a solubility parameter of 3 or more, preferably 6 or more.
JP2002235976A 2002-08-13 2002-08-13 Fixed abrasive polishing tool, and method for manufacturing the same Pending JP2004074330A (en)

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