CN103965832B - A kind of polish abrasive and preparation method thereof - Google Patents
A kind of polish abrasive and preparation method thereof Download PDFInfo
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- CN103965832B CN103965832B CN201310034978.5A CN201310034978A CN103965832B CN 103965832 B CN103965832 B CN 103965832B CN 201310034978 A CN201310034978 A CN 201310034978A CN 103965832 B CN103965832 B CN 103965832B
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- elastomerics
- abrasive material
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention provides a kind of polish abrasive, described abrasive material comprises silicon carbide, elastomerics, coupling agent and auxiliary agent; Described silicon carbide one end embeds in elastomerics, and the other end exposes elastomerics.Present invention also offers the preparation method of this polish abrasive.Elastomerics of the present invention can cushion the reactive force that abrasive material produces when abrasive material, and glass surface can be avoided to scratch, and overcomes the visual defects problem of traditional Si C polishing, and can reuse after abrasive material process, greatly reduce polishing cost.
Description
Technical field
The invention belongs to mobile phone and manufacture field, particularly relate to a kind of polish abrasive for handset viewing window glass polishing and preparation method thereof.
Background technology
As everyone knows, form at present on mobile phone particularly smart mobile phone more and more uses glass, and all large-scale commercials, the apparent requirement of high-end handsets to sight glass is more and more higher, the glass polishing material of high quality, low cost becomes the certainty of Market Selection, the abrasive material that current glass polishing mainly adopts is the particulates such as CeO2, SiC.
But because CeO2 abrasive material cost is higher, and be difficult to recycle, cause cost and environmental problem, and the SiC of relative low price is easy to cause glass scratch because its hardness is higher, product yield is very low.
Summary of the invention
The present invention is that to solve the cost of existing polish abrasive high, is easy to the technical problem causing product to scratch, and provides a kind of cost low and not easily polish abrasive scratching product and preparation method thereof.
The invention provides a kind of polish abrasive, described abrasive material comprises silicon carbide, elastomerics, coupling agent and auxiliary agent; Described silicon carbide one end embeds in elastomerics, and the other end exposes elastomerics.
Present invention also offers a kind of preparation method of polish abrasive, the method comprises the following steps:
S1, silicon carbide coupling
By SiC and silane coupling agent mix and blend, then carry out evaporate to dryness, oven dry obtains carbon modified SiClx;
S2, blending extrusion granulation
Elastomerics, auxiliary agent are mixed with carbon modified SiClx, extruding pelletization after melting.
This patent adopts SiC and elastomer composite to make polish abrasive, because one end of silicon carbide in this abrasive material embeds elastomerics, the other end exposes elastomerics and carries out polishing to polished thing, therefore elastomerics can cushion the reactive force that abrasive material produces when abrasive material, glass surface can be avoided to scratch, overcome the visual defects problem of traditional Si C polishing, and can reuse after abrasive material process, greatly reduce polishing cost.
Embodiment
In order to make technical problem solved by the invention, technical scheme and beneficial effect clearly understand, below in conjunction with embodiment, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
The invention provides a kind of polish abrasive, described abrasive material comprises silicon carbide, elastomerics, coupling agent and auxiliary agent; Described silicon carbide one end embeds in elastomerics, and the other end exposes elastomerics.
According to polish abrasive provided by the present invention, with the gross weight of abrasive material for benchmark, the content of described silicon carbide is 10-40wt%.
According to polish abrasive provided by the present invention, with the gross weight of abrasive material for benchmark, described elastomeric content is 55-85wt%, and the content of described coupling agent is 3-5wt%, and the content of described auxiliary agent is 0.5-2wt%.
The present invention adopts the complete coupling agent of silicon, and to make abrasive particle embed TPU inner extruding in the process of mixing, and abrasive particle forms island structure together with bridge joint with TPU under action of coupling agents.This island structure can have official Xiao Hong to act on when abrasive material, reduce or avoid the scuffing when grinding to product.Elastic grinding material in this content range, both ensure that stability prepared by abrasive material, can ensure polishing efficiency and quality of finish again in glass polishing.
According to polish abrasive provided by the present invention, in order to better be combined and the shock absorption had with silicon carbide, preferably, described elastomerics is at least one in thermoplastic polyurethanes elastomer, styrenic elastomer TPS, olefin type elastomer TPO, polyvinyl chloride-base elastomerics (TPVC, TCPE), silicon copolymerizable thermosetting elastomerics TPSIV and polyvinyl acetate (PVA) EVA.Be more preferably Polyurethane Thermoplastic Elastomer.Described Polyurethane Thermoplastic Elastomer has good wear resistance and screen resilience.
According to polish abrasive provided by the present invention, preferably, the weight-average molecular weight of described Polyurethane Thermoplastic Elastomer is 50000-80000.The TPU hardness of this molecular weight is beneficial to polishing, and molecular weight is lower than 50000, and the elasticity mill material of synthesis is softer, and material polishing efficiency is lower; Molecular weight is higher than 80000, and elasticity is lower, and polishing easily causes glass surface to scratch.
According to polish abrasive provided by the present invention, preferably, the median size of described abrasive material is 200-400 order, and abrasive size is less than 200 orders, and particle is comparatively large, easily cause glass scratch, and particle diameter is greater than 400 orders during polishing, and shear action declines, and polishing efficiency is low.
According to polish abrasive provided by the present invention, preferably, the median size of described silicon carbide is 30000-80000 order, silicon carbide is less than 30000 orders, and particle is comparatively large, easily causes glass scratch during polishing, and silicon carbide is greater than 80000 orders, shear action declines, and polishing efficiency is low.
According to polish abrasive provided by the present invention, preferably, described auxiliary agent is dispersion agent and oxidation inhibitor.
Present invention also offers a kind of preparation method of polish abrasive, the method comprises the following steps:
S1, silicon carbide coupling
By SiC and silane coupling agent mix and blend, then carry out evaporate to dryness, oven dry obtains carbon modified SiClx;
S2, blending extrusion granulation
Elastomerics, auxiliary agent are mixed with carbon modified SiClx, extruding pelletization after melting.
According to preparation method provided by the present invention, in order to obtain the abrasive material of required particle diameter, preferably, required particle diameter is filtered out in grinding after being pulverized by abrasive material after described step S2.
According to preparation method provided by the present invention, preferably, the condition of described extruding pelletization is: melt temperature is 160-220 DEG C, extruder main screw speed 100-200r/min, feeding rotating speed 10-30r/min.
This patent adopts 6000 order SiC and elastomer blended method to prepare composite elastic abrasive material, simple to operate, production efficiency advantages of higher.Overcome the scuffing that the polishing of simple SiC particulate causes glass surface simultaneously, improve product yield.Because compounded abrasive is 6000 orders of 300 orders far above SiC, so the abrasive material after polishing recovery can reuse through simple Screening Treatment, the rate of recovery is up to 60%.
Below by specific embodiment, the present invention is described in further detail.
Embodiment 1
1, SiC coupling processing
A. get 5 weight parts silane coupling agent KH570 add in 95% ethanol and form solution a1, stir 30min;
B. be that 3000 object SiC add in solution a1 by 20 weight part median sizes, evaporate to dryness after use magnetic stirrer 4h, dries the SiC after evaporate to dryness and obtains carbon modified SiClx;
2, blending extrusion granulation
It is extruding pelletization after the copolymerizable thermosetting elastomerics of silicon of 50000,1 parts per weight dispersing agent, 1 weight part antioxidant and above-mentioned carbon modified SiClx mix and blend, melting by 73 weight part weight-average molecular weight.Condition is as follows:
A.TPU & SiC mixing material melt temperature: 190 DEG C
B. extruder main screw speed 200r/min
C. feeding rotating speed 16r/min
3, pulverize and mill
In cooled with liquid nitrogen pulverizing mill (Shanghai Gaoqiao machine works ,-70 DEG C), 300 order elastic granules are milled into after being pulverized by abrasive material;
4, abrasive material screening
Use 200 orders and 400 eye mesh screens screening elastic grinding material A1, make its D50 integrated distribution at 300 orders, also prevent the SiC particulate be stripped in mill processes to be mixed into abrasive material simultaneously.
Embodiment 2
1, SiC coupling processing
A. the silane coupling agent KH570 getting 3 weight parts adds in 95% ethanol and forms solution a2, stirs 30min;
B. be that 5000 object SiC add in solution a2 by 30 weight part median sizes, evaporate to dryness after use magnetic stirrer 4h, dries the SiC after evaporate to dryness and obtains carbon modified SiClx;
2, blending extrusion granulation
It is extruding pelletization after the polyvinyl acetate (PVA) of 70000,0.5 parts per weight dispersing agent, 0.5 weight part antioxidant and above-mentioned carbon modified SiClx mix and blend, melting by 66 weight part weight-average molecular weight.Condition is as follows:
A.TPU & SiC mixing material melt temperature: 160 DEG C
B. extruder main screw speed 180r/min
C. feeding rotating speed 10r/min
3, pulverize and mill
In cooled with liquid nitrogen pulverizing mill (Shanghai Gaoqiao machine works ,-70 DEG C), 300 order elastic granules are milled into after being pulverized by abrasive material;
4, abrasive material screening
Use 200 orders and 400 eye mesh screens screening elastic grinding material A2, make its D50 integrated distribution at 300 orders, also prevent the SiC particulate be stripped in mill processes to be mixed into abrasive material simultaneously.
Embodiment 3
1, SiC coupling processing
A. the silane coupling agent KH570 getting 5 weight parts adds in 95% ethanol and forms solution a3, stirs 30min;
B. be that 8000 object SiC add in solution a3 by 25 weight part median sizes, evaporate to dryness after use magnetic stirrer 4h, dries the SiC after evaporate to dryness and obtains carbon modified SiClx;
2, blending extrusion granulation
It is extruding pelletization after the thermoplastic polyurethane of 50000,0.5 parts per weight dispersing agent, 0.5 weight part antioxidant and above-mentioned carbon modified SiClx mix and blend, melting by 69 weight part weight-average molecular weight.Condition is as follows:
A.TPU & SiC mixing material melt temperature: 220 DEG C
B. extruder main screw speed 100r/min
C. feeding rotating speed 30r/min
3, pulverize and mill
In cooled with liquid nitrogen pulverizing mill (Shanghai Gaoqiao machine works ,-70 DEG C), 300 order elastic granules are milled into after being pulverized by abrasive material;
4, abrasive material screening
Use 200 orders and 400 eye mesh screens screening elastic grinding material A3, make its D50 integrated distribution at 300 orders, also prevent the SiC particulate be stripped in mill processes to be mixed into abrasive material simultaneously.
Embodiment 4
1, SiC coupling processing
A. the silane coupling agent KH570 getting 4 weight parts adds in 95% ethanol and forms solution a4, stirs 30min;
B. be that 6000 object SiC add in solution a4 by 10 weight part median sizes, evaporate to dryness after use magnetic stirrer 4h, dries the SiC after evaporate to dryness and obtains carbon modified SiClx;
2, blending extrusion granulation
It is extruding pelletization after the thermoplastic polyurethane of 80000,0.5 parts per weight dispersing agent, 0.5 weight part antioxidant and above-mentioned carbon modified SiClx mix and blend, melting by 85 weight part weight-average molecular weight.Condition is as follows:
A.TPU & SiC mixing material melt temperature: 200 DEG C
B. extruder main screw speed 150r/min
C. feeding rotating speed 20r/min
3, pulverize and mill
In cooled with liquid nitrogen pulverizing mill (Shanghai Gaoqiao machine works ,-70 DEG C), 300 order elastic granules are milled into after being pulverized by abrasive material;
4, abrasive material screening
Use 200 orders and 400 eye mesh screens screening elastic grinding material A4, make its D50 integrated distribution at 300 orders, also prevent the SiC particulate be stripped in mill processes to be mixed into abrasive material simultaneously.
Embodiment 5
1, SiC coupling processing
A. the silane coupling agent KH570 getting 3 weight parts adds in 95% ethanol and forms solution a5, stirs 30min;
B. be that 4000 object SiC add in solution a5 by 40 weight part median sizes, evaporate to dryness after use magnetic stirrer 4h, dries the SiC after evaporate to dryness and obtains carbon modified SiClx;
2, blending extrusion granulation
It is extruding pelletization after the thermoplastic polyurethane of 60000,1 parts per weight dispersing agent, 1 weight part antioxidant and above-mentioned carbon modified SiClx mix and blend, melting by 55 weight part weight-average molecular weight.Condition is as follows:
A.TPU & SiC mixing material melt temperature: 190 DEG C
B. extruder main screw speed 200r/min
C. feeding rotating speed 16r/min
3, pulverize and mill
In cooled with liquid nitrogen pulverizing mill (Shanghai Gaoqiao machine works ,-70 DEG C), 300 order elastic granules are milled into after being pulverized by abrasive material;
4, abrasive material screening
Use 200 orders and 400 eye mesh screens screening elastic grinding material A5, make its D50 integrated distribution at 300 orders, also prevent the SiC particulate be stripped in mill processes to be mixed into abrasive material simultaneously.
Embodiment 6
1, SiC coupling processing
A. the silane coupling agent KH570 getting 3 weight parts adds in 95% ethanol and forms solution a6, stirs 30min;
B. be that 4000 object SiC add in solution a6 by 40 weight part median sizes, evaporate to dryness after use magnetic stirrer 4h, dries the SiC after evaporate to dryness and obtains carbon modified SiClx;
2, blending extrusion granulation
It is extruding pelletization after the styrenic elastomer of 60000,1 parts per weight dispersing agent, 1 weight part antioxidant and above-mentioned carbon modified SiClx mix and blend, melting by 55 weight part weight-average molecular weight.Condition is as follows:
A.TPU & SiC mixing material melt temperature: 190 DEG C
B. extruder main screw speed 200r/min
C. feeding rotating speed 16r/min
3, pulverize and mill
In cooled with liquid nitrogen pulverizing mill (Shanghai Gaoqiao machine works ,-70 DEG C), 300 order elastic granules are milled into after being pulverized by abrasive material;
4, abrasive material screening
Use 200 orders and 400 eye mesh screens screening elastic grinding material A6, make its D50 integrated distribution at 300 orders, also prevent the SiC particulate be stripped in mill processes to be mixed into abrasive material simultaneously.
Comparative example 1
Adopt the cerium oxide (ocean, Chengdu Chemical Co., Ltd., model C P-2) be purchased as abrasive material CA1.
Comparative example 2
Adopt the silicon carbide (Shenzhen Micro-nami Super Skin Material Co., Ltd., model W1.5) be purchased as abrasive material CA2.
Embodiment 7-12
Add in the liquid bath of glass grinding polishing machine by the dilution of 1:10 ratios with water respectively by abrasive material A1-A6, carry out glass polishing process, polished glass is healthy and free from worry Gorilla glass.Setting speed of grinding plate 40rpm, pressure 0.2MPa, the polishing number of turns 3600, cleaning glass after completing, obtains polishing product B 1-B6.
Comparative example 3-4
According to the method being embodiment 7-12, polishing is carried out to healthy and free from worry Gorilla glass, obtain polishing products C B1 and CB2.Difference is: abrasive material used is respectively CA1 and CA2.
Testing method and result
1, outward appearance
Under respectively product B 1-B6 and CB1, CB2 being placed in opticmicroscope, amplify 100 times of observations, surface had both been non-defective unit without scratching trace, otherwise was defective products, the results are shown in Table 1.
2, roughness
Use the surfaceness of interference microscope difference product B 1-B6 and CB1, CB2, product B 1-B6 and CB1, CB2 are placed in microscope stage respectively, interference light is produced due to surface irregularity after using monochromatic light exposure, together by directly calculating sample Ra value to the measurement of interference light, surface roughness Ra, between 0.005-0.009um, had both been non-defective unit.The results are shown in Table 1.
3, polishing time
Record carries out the time of polishing respectively to 1 block of healthy and free from worry Gorilla glass with A1-A6 and CA1, the results are shown in Table 1.
Table 1
。
As can be seen from Table 1, abrasive material of the present invention carries out polishing to glass, and glass surface does not scratch or has shadow scratch, and the abrasive material of comparative example is that the polishing effect of cerium oxide is good, and the polishing that abrasive material is silicon carbide scratches very serious, can not satisfy the demand.Illustrate that the polishing carried out with abrasive material of the present invention is better than the polishing effect of simple silicon carbide, can reach or substantially reach the effect that cerium oxide reaches, but the price of cerium oxide is more than 10 times of abrasive material of the present invention, has saved cost.Carry out polishing with abrasive material of the present invention to glass, the roughness of glass surface meets the requirements, and the glass surface that simple silicon carbide carries out polishing to glass is more coarse, undesirable simultaneously.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (12)
1. a polish abrasive, is characterized in that: described abrasive material comprises silicon carbide, elastomerics, coupling agent and auxiliary agent; Described silicon carbide one end embeds in elastomerics, and the other end exposes elastomerics.
2. polish abrasive according to claim 1, is characterized in that, with the gross weight of abrasive material for benchmark, the content of described silicon carbide is 10-40wt%.
3. polish abrasive according to claim 1, is characterized in that, with the gross weight of abrasive material for benchmark, described elastomeric content is 55-85wt%, and the content of described coupling agent is 3-5wt%, and the content of described auxiliary agent is 0.5-2wt%.
4. polish abrasive according to claim 1, is characterized in that: described elastomerics is at least one in thermoplastic polyurethanes elastomerics, styrenic elastomer, olefin type elastomer, polyvinyl chloride-base elastomerics, the copolymerizable thermosetting elastomerics of silicon and polyvinyl acetate (PVA).
5. polish abrasive according to claim 4, is characterized in that: described elastomerics is Polyurethane Thermoplastic Elastomer.
6. polish abrasive according to claim 1, is characterized in that: described elastomeric weight-average molecular weight is 50000-80000.
7. polish abrasive according to claim 1, is characterized in that: the median size of described abrasive material is 200-400 order.
8. polish abrasive according to claim 1, is characterized in that: the median size of described silicon carbide is 3000-8000 order.
9. polish abrasive according to claim 1, is characterized in that: described auxiliary agent is dispersion agent and oxidation inhibitor.
10. a preparation method for polish abrasive according to claim 1, is characterized in that, the method comprises the following steps:
S1, silicon carbide coupling
By SiC and silane coupling agent mix and blend, then carry out evaporate to dryness, oven dry obtains carbon modified SiClx;
S2, blending extrusion granulation
Elastomerics, auxiliary agent are mixed with carbon modified SiClx, extruding pelletization after melting.
11. preparation methods according to claim 10, is characterized in that, after being pulverized by abrasive material after described step S2, grinding filters out required particle diameter again.
12. preparation methods according to claim 10, is characterized in that, the condition of described extruding pelletization is: melt temperature is 160-220 DEG C, extruder main screw speed 100-200r/min, feeding rotating speed 10-30r/min.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310034978.5A CN103965832B (en) | 2013-01-30 | 2013-01-30 | A kind of polish abrasive and preparation method thereof |
| PCT/CN2014/071456 WO2014117693A1 (en) | 2013-01-30 | 2014-01-26 | Abrasive and method of preparing the same |
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| CN201310034978.5A CN103965832B (en) | 2013-01-30 | 2013-01-30 | A kind of polish abrasive and preparation method thereof |
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| CN103965832B true CN103965832B (en) | 2015-09-02 |
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| CN106800888A (en) * | 2016-12-18 | 2017-06-06 | 苏州威力士精细化工有限公司 | Carrying magnetic polishing composite powder and preparation method thereof |
| CN107309814A (en) * | 2017-08-09 | 2017-11-03 | 安徽昌悌进出口贸易有限公司 | A kind of high grinding efficiency emery wheel |
| CN107674294A (en) * | 2017-10-17 | 2018-02-09 | 昆山纳诺新材料科技有限公司 | One kind polishing thermoplastic elastic abrasive material and preparation method thereof |
| CN107674304A (en) * | 2017-10-17 | 2018-02-09 | 昆山纳诺新材料科技有限公司 | Thermoplasticity abrasive material and its manufacture method are used in a kind of hard alloy polishing |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1469915A (en) * | 2000-10-16 | 2004-01-21 | 3M | Method of making an agglomerate particles |
| CN1524029A (en) * | 2001-05-22 | 2004-08-25 | 3M | Cellular abrasive article |
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| US5250085A (en) * | 1993-01-15 | 1993-10-05 | Minnesota Mining And Manufacturing Company | Flexible bonded abrasive articles, methods of production and use |
| DE10058305A1 (en) * | 2000-11-24 | 2002-06-06 | Wacker Siltronic Halbleitermat | Process for the surface polishing of silicon wafers |
| JP2004074330A (en) * | 2002-08-13 | 2004-03-11 | Ebara Corp | Fixed abrasive polishing tool, and method for manufacturing the same |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1469915A (en) * | 2000-10-16 | 2004-01-21 | 3M | Method of making an agglomerate particles |
| CN1524029A (en) * | 2001-05-22 | 2004-08-25 | 3M | Cellular abrasive article |
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