JP2002090987A5 - - Google Patents

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Publication number
JP2002090987A5
JP2002090987A5 JP2001209543A JP2001209543A JP2002090987A5 JP 2002090987 A5 JP2002090987 A5 JP 2002090987A5 JP 2001209543 A JP2001209543 A JP 2001209543A JP 2001209543 A JP2001209543 A JP 2001209543A JP 2002090987 A5 JP2002090987 A5 JP 2002090987A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001209543A
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Japanese (ja)
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JP2002090987A (ja
JP4226808B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2001209543A priority Critical patent/JP4226808B2/ja
Priority claimed from JP2001209543A external-priority patent/JP4226808B2/ja
Publication of JP2002090987A publication Critical patent/JP2002090987A/ja
Publication of JP2002090987A5 publication Critical patent/JP2002090987A5/ja
Application granted granted Critical
Publication of JP4226808B2 publication Critical patent/JP4226808B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001209543A 2000-07-12 2001-07-10 ポジ型レジスト組成物 Expired - Fee Related JP4226808B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001209543A JP4226808B2 (ja) 2000-07-12 2001-07-10 ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-211642 2000-07-12
JP2000211642 2000-07-12
JP2001209543A JP4226808B2 (ja) 2000-07-12 2001-07-10 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2002090987A JP2002090987A (ja) 2002-03-27
JP2002090987A5 true JP2002090987A5 (cg-RX-API-DMAC10.html) 2006-01-19
JP4226808B2 JP4226808B2 (ja) 2009-02-18

Family

ID=26595896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001209543A Expired - Fee Related JP4226808B2 (ja) 2000-07-12 2001-07-10 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4226808B2 (cg-RX-API-DMAC10.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004004561A (ja) * 2002-02-19 2004-01-08 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP4606392B2 (ja) * 2002-04-01 2011-01-05 ダイセル化学工業株式会社 フォトレジスト用高分子化合物の製造法
KR100955989B1 (ko) 2002-04-01 2010-05-04 다이셀 가가꾸 고교 가부시끼가이샤 포토레지스트용 고분자 화합물의 제조법
KR100962452B1 (ko) * 2002-09-12 2010-06-14 스미또모 가가꾸 가부시끼가이샤 화학증폭형 레지스트 조성물
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
EP3253735B1 (en) 2015-02-02 2021-03-31 Basf Se Latent acids and their use
WO2026083948A1 (ja) * 2024-10-16 2026-04-23 Jsr株式会社 窒素含有膜形成用組成物及び半導体基板の製造方法

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